Готові списки джерел за темами / Nanoscaled films

Добірка наукової літератури з теми "Nanoscaled films"

Автор: Grafiati
Опубліковано: 30 травня 2022
Оновлено: 31 травня 2022

Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями

Оберіть тип джерела:

Зміст

Ознайомтеся зі списками актуальних статей, книг, дисертацій, тез та інших наукових джерел на тему "Nanoscaled films".

Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.

Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.

Статті в журналах з теми "Nanoscaled films"

1

Wu, Wan Yu, Chia Wei Hsu, and Jyh Ming Ting. "Nanoscaled C, Ni, Pt Thin Films." Journal of Nano Research 6 (June 2009): 29–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.6.29.

Повний текст джерела
Анотація:
We have investigated the growth and characteristics of nanoscaled thin films of carbon, nickel, and platinum. The nanoscaled thin films were deposited on Si and quartz substrates with or without a surface layer of carbon, nickel, or platinum using a DC magnetron sputter deposition technique. The thicknesses, which were determined using ellipsometry, are all less than 10 nm. The film structures were examined using glazing angle incident x-ray diffractometry and Raman spectroscopy. The electrical and optical properties were determined using a four point probe technique and UV-VIS-IR spectrometry, respectively.
Стилі APA, Harvard, Vancouver, ISO та ін.
2

Cheng, Ching Hsuang, Wan Yu Wu, and Jyh Ming Ting. "Nanoscaled Multilayer Thin Films Based on GZO." Journal of Nano Research 2 (August 2008): 61–67. http://dx.doi.org/10.4028/www.scientific.net/jnanor.2.61.

Повний текст джерела
Анотація:
Nanoscaled gallium-doped ZnO (GZO) thin films, bi-layer Pt/GZO thin films, and tri-layer GZO/Pt/GZO thin films were prepared and their characteristics were investigated. These films were deposited on glass substrates using either rf or dc magnetron sputter deposition. The deposition time and the target-to-substrate distance were varied to obtain different total film thicknesses and layer thicknesses. Effects of total film and layer thicknesses on the optical properties and the electrical properties were studied. Theoretical calculations were performed to discuss effect of the thickness on the optical transmittance of the GZO film. As-deposited GZO films show high electrical resistivity, which was greatly reduced by 2 to 3 orders of magnitude due to the introduction of a surface layer of Pt film. However, the optical transmittance was also reduced. This was improved by using an addition anti-refractive GZO surface layer on the Pt/GZO. A GZO/Pt/GZO film exhibiting visible light transmittance greater than 75% and electrical resistivity in the order of 10-4 ohm-cm was obtained.
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Leistner, K., H. Schlörb, J. Thomas, L. Schultz, and S. Fähler. "Remanence enhancement in nanoscaled electrodeposited FePt films." Applied Physics Letters 92, no. 5 (February 4, 2008): 052502. http://dx.doi.org/10.1063/1.2836944.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
4

Mukhortov, V. M., E. M. Sova, V. B. Shirokov, Yu I. Golovko, N. V. Lyanguzov, and Yu I. Yuzyuk. "Polarization switching in nanoscaled barium strontium titanate films." Nanotechnologies in Russia 9, no. 1-2 (January 2014): 45–50. http://dx.doi.org/10.1134/s1995078014010091.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
5

Kumar, Bhupendra, Hao Gong, Nitya Nand Gosvami, Ramam Akkipeddi, and Sean J. O’Shea. "Nanoscaled electrical homogeneity of indium zinc oxide films." Applied Physics Letters 88, no. 9 (February 27, 2006): 093111. http://dx.doi.org/10.1063/1.2175494.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
6

Qin, Meng, Kui Yao, and Yung C. Liang. "High efficient photovoltaics in nanoscaled ferroelectric thin films." Applied Physics Letters 93, no. 12 (September 22, 2008): 122904. http://dx.doi.org/10.1063/1.2990754.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
7

Vila-Fungueiriño, José Manuel, Andrés Gómez, Jordi Antoja-Lleonart, Jaume Gázquez, César Magén, Beatriz Noheda, and Adrián Carretero-Genevrier. "Direct and converse piezoelectric responses at the nanoscale from epitaxial BiFeO3 thin films grown by polymer assisted deposition." Nanoscale 10, no. 43 (2018): 20155–61. http://dx.doi.org/10.1039/c8nr05737k.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
8

Стрелецкий, О. А., И. А. Завидовский, О. Ю. Нищак, А. Н. Щеголихин та Н. Ф. Савченко. "Структурные свойства тонких пленок, полученных магнетронным распылением полидиацетилена". Физика твердого тела 62, № 11 (2020): 1936. http://dx.doi.org/10.21883/ftt.2020.11.50073.113.

Повний текст джерела
Анотація:
In the work we studied films synthesized by RF-sputtering of monocrystalline polydiacetylene (PDA). Investigations of the structure were carried out by Raman spectroscopy, transmission electron microscopy, X-ray photoelectron spectroscopy. We showed that obtained films had heterogeneous structure containing nanoscaled inclusions of initial PDA and irregularly distributed sp/sp2 fragments of carbon chains.
Стилі APA, Harvard, Vancouver, ISO та ін.
9

Kliem, H., M. Kuehn, and N. Farag. "Electrode Effects and Coercive Fields in Nanoscaled Ferroelectric Films." Ferroelectrics 375, no. 1 (December 3, 2008): 107–14. http://dx.doi.org/10.1080/00150190802437936.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
10

Mitra, S., A. Mandal, S. Banerjee, A. Datta, S. Bhattacharya, A. Bose, and D. Chakravorty. "Template based growth of nanoscaled films: a brief review." Indian Journal of Physics 85, no. 5 (May 2011): 649–66. http://dx.doi.org/10.1007/s12648-011-0067-x.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
Більше джерел

Дисертації з теми "Nanoscaled films"

1

Peters, Christoph. "Grain-size effects in nanoscaled electrolyte and cathode thin films for solid oxide fuel cells (SOFC)." Karlsruhe Univ.-Verl. Karlsruhe, 2008. http://d-nb.info/994202105/04.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
2

Leuning, Tessa Martine [Verfasser]. "Atomic Layer Deposition: Fabrication of nanoscaled films and heterostructures from mono- and bimetallic precursors / Tessa Martine Leuning." München : Verlag Dr. Hut, 2014. http://d-nb.info/1049363167/34.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Hatton, Hilary J. "Magnetic and structural studies of nanoscale multilayer and granular alloy systems of Ag and FeCo." Thesis, University of Sheffield, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.286916.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
4

Brittle, Stuart A. "Selective vapur sensing using nanoscale porphyrin films." Thesis, University of Sheffield, 2009. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.521897.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
5

Bommel, Sebastian. "Unravelling nanoscale molecular processes in organic thin films." Doctoral thesis, Humboldt-Universität zu Berlin, Mathematisch-Naturwissenschaftliche Fakultät, 2015. http://dx.doi.org/10.18452/17315.

Повний текст джерела
Анотація:
Dünne Filme aus konjugierten Molekülen werden vermehrt in der organischen Optoelektronik, Bio-Sensorik und Oberflächenmodifikationen eingesetzt. Jedoch steckt das nanoskopische Verständnis von elementaren Prozessen bzgl. des molekularen Wachstums, der Film-Stabilität und thermisch-mechanischer Eigenschaften noch in den Kinderschuhen. Im ersten Teil dieser Arbeit nutzen wir Echtzeit in situ spekulare und diffuse Röntgenstreuung in Kombination mit Kinetik-Monte-Carlo Simulationen, um die Nukleation und das Multilagen-Wachstum von C60 zu studieren. Wir quantifizieren einen konsistenten Satz von Energieparametern, die die Oberflächenprozesse während des Wachstums beschreiben: eine effektive Ehrlich-Schwoebel Barriere von EES = 110 meV, eine Oberflächendiffusions-Barriere von ED = 540 meV und die Bindungsenergie von EB = 130 meV. Durch die Analyse der Teilchendynamiken finden wir, dass die laterale Diffusion ähnlich derer von Kolloiden ist, jedoch weist die Stufenkanten-Diffusion eine atom-ähnlichen Schwoebel-Barriere auf. Außerdem haben wir für die erste Monolage ein thermisch-aktiviertes Dewetting nach dem Wachstum von C60 auf Mica mit einer effektiven Aktivierungsbarriere von (0.33 ± 0.14) eV für die Aufwärts-Diffusion beobachtet. Im zweiten Teil der Arbeit untersuchen wir die thermomechanischen Eigenschaften der supra-molekularen Anordnung von dem organischen Halbleiter PTCDI-C8. Temperaturabhängige GIXD-Experimente decken einen außergewöhnlich großen positiven und negativen thermischen Expansionskoeffizienten der Kristallstruktur auf. Die Moleküle vollführen kooperative rotierende Bewegungen als Reaktion auf die Temperaturänderung, die zu dieser anomalen thermischen Expansion führen. Unsere Beschreibung der Bewegungen einzelner adsorbierter Moleküle während des Wachstums und der kooperativen Bewegungen einzelner Moleküle in supra-molekularen Ensembles auf der molekularen Skala wird die weitere Arbeit auf dem Weg zu funktionalen molekularen dünnen Filmen beleben.
Thin films of conjugated molecules are increasingly used in organic optoelectronics, biosensing and surface modification. However, nanoscopic understanding of elementary processes regarding the molecular film growth, the stability of these films and regarding the thermal and mechanical properties of supra-molecular assemblies are in its infancy. In the first part of this thesis we use real-time in situ specular and diffuse X-ray scattering in combination with kinetic Monte Carlo simulations to study C60 nucleation and multilayer growth. We quantify a consistent set of energy parameters, which describe the surface processes during growth, yielding an effective Ehrlich-Schwoebel barrier of EES = 110 meV, a surface diffusion barrier of ED = 540 meV and a binding energy of EB = 130 meV. Analysing the particle-resolved dynamics, we find that the lateral diffusion is similar to colloids, but step-edge crossing is characterized by an atom-like Schwoebel barrier. Furthermore, a thermally-activated post-growth dewetting for C60 on mica has been observed for the first monolayer with an effective activation barrier for upward interlayer transport of (0.33 ± 0.14) eV. In the second part we investigate the thermomechanical properties of the supra-molecular assembly of the organic semiconductor PTCDI-C8. Temperature-dependent Grazing Incidence X-ray Diffraction (GIXD) experiments reveal extraordinary large positive and, surprisingly, negative thermal expansion coefficients of the thin film crystal structure. The molecules perform temperature-controlled cooperative rotational motions leading to the change of the molecular crystal structure at different temperatures. We hope that our molecular scale picture of the movement of single ad-molecules during growth and the cooperative motions of single molecules in supra-molecular ensembles will stimulate further work towards the optimized, rational design of functional molecular thin films and nanomaterials.
Стилі APA, Harvard, Vancouver, ISO та ін.
6

Braic, Laurentiu. "Nanoscale films for near infrared active plasmonic devices." Thesis, Imperial College London, 2015. http://hdl.handle.net/10044/1/59245.

Повний текст джерела
Анотація:
As optoelectronic components become nano-dimensional, controlling the coupling between light and matter at the nanoscale has become a major technological challenge, as well as the subject of theoretical studies. The aim of this work is threefold. First, to assess the suitability of ferroelectric thin films - Barium Strontium Titanate (BST), and Strontium Barium Niobate (SBN), as active media for plasmonic devices. Second, to find suitable thin film electrodes for such devices, by exploring and optimizing the plasmonic behaviour of already known conductive materials, conductive oxides (Strontium Ruthenate - SRO), and transitional metal nitrides (Titanium nitride - TiN). Third, to optimize the deposition process of metallic (Silver – Ag) films, so as to improve their smoothness, and thus their suitability for plasmonic applications and lithography in general. SBN ceramic targets were sintered. SBN and BST films were deposited by PLD and ellipsometry and normal incidence reflectometry were used to examine their optical tunability. Ellipsometry was further used to measure the effects of the residual strain of the BST thin films on their optical properties. BST and SBN films were found to exhibit a birefringence under bias along the direction of growth. A residual strain variation along the films’ direction of growth was inferred from an observed non-linear change in the refractive index of BST films along that same direction. SRO and TiN films were fabricated using PLD and reactive magnetron sputtering, respectively. The effects of the deposition pressure upon structure, charge carrier concentration and mobility, and optical properties were studied using X-ray diffraction (XRD), Hall-effect measurements, and ellipsometry. The optical properties of SRO were explained based on electron concentration and structure. SRO was confirmed as a promising plasmonic material, for applications in the near infrared range and at elevated temperatures. The influence of the deposition temperature upon the optical properties of TiN films was shown. Films grown at high temperature (800oC) had quasi-metallic optical properties, while films grown at room temperature exhibited well defined plasmon bandwidth, between two distinct Epsilon-near-zero (ENZ) frequencies, which has been linked to the uniform oxidation of the samples). Finally, Ag thin films were deposited using magnetron sputtering, in an Ar/He atmosphere. The effect of the sputtering gas ratio on the films structure, morphology and reflectivity was studied using XRD, Atomic force microscopy (AFM) and visual-range normal incidence reflectometry. The addition of Helium to the sputtering atmosphere was found to reduce the roughness of Ag films and improve their reflectivity, due to the Penning effect present in the Ar-He plasma. The work undertaken has, by developing new plasmonic materials (SRO, oxidized TiN), and expanding the knowledge of the behaviour (BST) and fabrication (Ag) here has paved the way for the development of active plasmonic devices.
Стилі APA, Harvard, Vancouver, ISO та ін.
7

Scott, William Walter. "Micro/nanoscale differential wear and corrosion of multiphase materials /." Connect to this title online, 2001. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu994420446.

Повний текст джерела
Анотація:
Thesis (Ph. D.)--Ohio State University, 2001.
Advisor: Bharat Bhushan, Dept. of Mechanical Engineering. Includes bibliographical references (leaves 145-152). Available online vai OhioLINK's ETD center.
Стилі APA, Harvard, Vancouver, ISO та ін.
8

Sines, Paul B. "Fabrication of thin film nanoscale alumina templates." Morgantown, W. Va. : [West Virginia University Libraries], 2001. http://etd.wvu.edu/templates/showETD.cfm?recnum=2183.

Повний текст джерела
Анотація:
Thesis (M.S.)--West Virginia University, 2001.
Title from document title page. Document formatted into pages; contains vii, 44 p. : ill. (some col.). Vita. Includes abstract. Includes bibliographical references (p. 35-37).
Стилі APA, Harvard, Vancouver, ISO та ін.
9

Ma, Zhengkun. "Nanoscale behavior of 90 degree domains in ferroelectric films." College Park, Md. : University of Maryland, 2005. http://hdl.handle.net/1903/3097.

Повний текст джерела
Анотація:
Thesis (Ph. D.) -- University of Maryland, College Park, 2005.
Thesis research directed by: Material Science and Engineering. Title from t.p. of PDF. Includes bibliographical references. Published by UMI Dissertation Services, Ann Arbor, Mich. Also available in paper.
Стилі APA, Harvard, Vancouver, ISO та ін.
10

Yu, Samuel Shing Chi. "Covalent Attachment of Nanoscale Organic Films to Carbon Surfaces." Thesis, University of Canterbury. Chemistry, 2008. http://hdl.handle.net/10092/4083.

Повний текст джерела
Анотація:
Modification of planar graphitic carbon surfaces by the attachment of molecular films has been investigated in this work. Molecular layers have been grafted to glassy carbon (GC) and pyrolyzed photoresist film (PPF) by employing a range of techniques, which involved electrochemically and photochemically assisted procedures. Modification methods involve the electrochemical reduction of aryldiazonium salt, electrochemical oxidation of arylcarboxylate and photolysis of alkene, alkyne and azide on carbon surfaces. For these methods, it is proposed that reactive species are generated by the procedures, which leads to the grafting of modifiers to the carbon surfaces. A selection of molecular species was grafted to GC and PPF by these method containing different terminal R-functional groups that include —COOH, -NO₂, -NH₂, and —NCS. The grafted R-functional groups permit for further chemical reactions on the surface. Electrochemically and photochemically grafted films were examined with a combination of water contact angle measurements, cyclic voltammetry, X-ray electron spectroscopy XPS, optical microscopy, scanning electron microscopy SEM and atomic force microscopy AFM. Film properties such as surface concentration, film thickness, wettability, chemical composition and reactivity were characterized by the above mentioned techniques. Films electrochemically prepared from aryldiazonium salts and arylcarboxylates, under the conditions applied in this work, formed loosely packed multilayers with typical film thicknesses of les than 5 nm. Photochemically grafted films prepared from alkenes and azides, in general, formed loosely packed monolayers with film thicknesses of less than 2 nm. Loosely packed multilayers were also prepared from alkene and alkyne by photochemical procedures. ii Chemical reactions on grafted films were demonstrated and analyzed by a combination of the above mentioned characterization techniques. In particular, the reduction of nitrophenyl (NP)films, amine-coupling reactions, photoactivation of grafted films with oxalyl chloride and electrostatic assembly of anionic gold nanoparticles were investigated. Selected chemical reactions permitted identification and evaluation of the grafted layers, and demonstrated the ability to control the immobilization of chemical species. Microscale chemical patterning of two different types of modifiers on carbon surfaces was demonstrated using photolithographical techniques that utilized photochemical reactions with azides. Patterns of line-arrays with line widths of hundreds of micrometers to 10 µm were formed.
Стилі APA, Harvard, Vancouver, ISO та ін.
Більше джерел

Книги з теми "Nanoscaled films"

1

Born, Philip G. Crystallization of Nanoscaled Colloids. Heidelberg: Springer International Publishing, 2013.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
2

Peters, Christoph. Grain-size effects in nanoscaled electrolyte and cathode thin films for solid oxide fuel cells (SOFC). Karlsruhe: Univ.-Verl. Karlsruhe, 2008.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Symposium, A. on Microstructuring and Microsystems (1995 Strasbourg France). Small scale structures: Proceedings of Symposium A on Microstructuring and Microsystems, Symposium B on Materials for Sensors: Functional Nanoscaled Structures, and Symposium E on Structure and Properties of Metallic Thin Films and Multilayers of the 1995 E-MRS Spring Conference, Strasbourg, France, May 22-26, 1995. Amsterdam: Elsevier, 1996.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
4

Hong, Seungbum, ed. Nanoscale Phenomena in Ferroelectric Thin Films. Boston, MA: Springer US, 2004. http://dx.doi.org/10.1007/978-1-4419-9044-0.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
5

Gnecco, Enrico. Nanoscale processes on insulating surfaces. Singapore: World Scientific, 2009.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
6

Marek, Szymoński, ed. Nanoscale processes on insulating surfaces. Singapore: World Scientific, 2009.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
7

Pogrebnjak, Alexander D., and Oleksandr Bondar, eds. Microstructure and Properties of Micro- and Nanoscale Materials, Films, and Coatings (NAP 2019). Singapore: Springer Singapore, 2020. http://dx.doi.org/10.1007/978-981-15-1742-6.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
8

Mucha-Kruczyński, Marcin. Theory of Bilayer Graphene Spectroscopy. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
9

service), SpringerLink (Online, ed. Graphene Nanoelectronics: Metrology, Synthesis, Properties and Applications. Berlin, Heidelberg: Springer Berlin Heidelberg, 2012.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
10

Scherer, Maik Rudolf Johann. Double-Gyroid-Structured Functional Materials: Synthesis and Applications. Heidelberg: Springer International Publishing, 2013.

Знайти повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
Більше джерел

Частини книг з теми "Nanoscaled films"

1

Fedosyuk, V. M. "Nanoscaled Magnetic Electrodeposited Structures on the Basis of Ion Group Metals: Preparation, Structure, Magnetic and Magnetoresistive Properties." In Nanostructured Films and Coatings, 85–102. Dordrecht: Springer Netherlands, 2000. http://dx.doi.org/10.1007/978-94-011-4052-2_8.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
2

Fridkin, Vladimir, and Stephen Ducharme. "Ultrathin Ferroelectric Films." In Ferroelectricity at the Nanoscale, 29–65. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013. http://dx.doi.org/10.1007/978-3-642-41007-9_4.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Wormeester, Herbert, and Thomas W. H. Oates. "Thin Films of Nanostructured Noble Metals." In Ellipsometry at the Nanoscale, 225–56. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013. http://dx.doi.org/10.1007/978-3-642-33956-1_6.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
4

Tyunina, Marina. "Ferroelectric Phase Transitions in Epitaxial Perovskite Films." In Nanoscale Ferroelectrics and Multiferroics, 617–44. Chichester, UK: John Wiley & Sons, Ltd, 2016. http://dx.doi.org/10.1002/9781118935743.ch19.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
5

Geoghegan, Mark, and Richard A. L. Jones. "Macromolecules at Interfaces and Structured Organic Films." In Nanoscale Science and Technology, 377–418. Chichester, UK: John Wiley & Sons, Ltd, 2005. http://dx.doi.org/10.1002/0470020873.ch8.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
6

Nagarajan, Valanoor, Chandan S. Ganpule, and Ramamoorthy Ramesh. "Nanoscale Phenomena in Ferroelectric Thin Films." In Topics in Applied Physics, 47–70. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-540-45163-1_4.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
7

Kong, L. B., and H. Huang. "Thin Film Gas Sensors Based on Nanocarbon Materials." In Nanoscale Sensors, 189–223. Cham: Springer International Publishing, 2013. http://dx.doi.org/10.1007/978-3-319-02772-2_7.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
8

Steiner, Ullrich. "Structure Formation in Polymer Films From Micrometer to the sub-100 nm Length Scales." In Nanoscale Assembly, 1–24. Boston, MA: Springer US, 2005. http://dx.doi.org/10.1007/0-387-25656-3_1.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
9

Gutkin, M. Yu, and E. C. Aifantist. "Nanoscale Elastic Properties of Dislocations and Disclinations." In Nanostructured Films and Coatings, 247–54. Dordrecht: Springer Netherlands, 2000. http://dx.doi.org/10.1007/978-94-011-4052-2_21.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
10

Jamison, Andrew C., Pawilai Chinwangso, and T. Randall Lee. "Self-Assembled Monolayers: the Development of Functional Nanoscale Films." In Functional Polymer Films, 151–217. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2011. http://dx.doi.org/10.1002/9783527638482.ch5.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.

Тези доповідей конференцій з теми "Nanoscaled films"

1

"Nanoscaled chalcogenide films for optical applications." In 1st International Symposium on Dielectric Materials and Applications. Materials Research Forum LLC, 2016. http://dx.doi.org/10.21741/9781945291197-30.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
2

Ju, Heng-yi, Shu-yi Zhang, Zhe Li, Di Ma, Xiu-ji Shui, Donald O. Thompson, and Dale E. Chimenti. "THERMAL PROPERTIES OF NANOSCALED MULTILAYER FILMS DEPOSITED ON SUBSTRATES CHARACTERIZED BY TRANSIENT GRATING TECHNIQUE." In REVIEW OF PROGRESS IN QUANTITATIVE NONDESTRUCTIVE EVALUATION: Proceedings of the 35th Annual Review of Progress in Quantitative Nondestructive Evaluation. AIP, 2009. http://dx.doi.org/10.1063/1.3114086.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Zhou, Wei, Yue Wang, Jie Hou, Lianwei Fan, and Jinfeng Liu. "Nanoscaled free volume holes and slow release of urea for poly(vinyl alcohol)/urea composite films." In 3rd China-Japan Joint Workshop on Positron Science (JWPS2017). Japan Society of Applied Physics, 2018. http://dx.doi.org/10.7567/jjapcp.7.011204.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
4

Didari, Azadeh, and M. Pinar Menguc. "Biomimicry designs for passive optical solutions for nanoscale radiative cooling applications." In Nanostructured Thin Films XI, edited by Tom G. Mackay and Akhlesh Lakhtakia. SPIE, 2018. http://dx.doi.org/10.1117/12.2320504.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
5

Pattamatta, Arvind, and Cyrus K. Madnia. "Electron-Phonon Non-Equilibrium in Nanoscale Gold Films." In ASME 2008 International Mechanical Engineering Congress and Exposition. ASMEDC, 2008. http://dx.doi.org/10.1115/imece2008-66218.

Повний текст джерела
Анотація:
Ultrashort-pulsed laser irradiation on metals creates a thermal non-equilibrium between electrons and the phonons. Previous computational studies used the two-temperature model and its variants to model this non-equilibrium. However, when the laser pulse duration is smaller than the relaxation time of the energy carriers or when the carriers mean free path is larger than the material dimension, these macroscopic models fail to capture the physics accurately. In this paper, the non-equilibrium between energy carriers is modeled via numerical solution of the Boltzmann Transport Model (BTM) for electrons and phonons which is applicable over a wide range of length and time scales. The BTM is solved using the Discontinuous Galerkin Finite Element Method for spatial discretization and the three-step Runge Kutta temporal discretization. Temperature dependant electron-phonon coupling factor and electron heat capacity are used due to the strong electron-phonon non-equilibrium considered in this study. The results from the proposed model is compared with existing experimental studies on laser heating of macroscale materials. The model is then used to study laser heating of gold films, by varying parameters such as the film thickness, laser fluence and pulse duration. It is found that the temporal evolution of electron and phonon temperatures in nanometer size gold films are very different from the macroscale films. For a given laser fluence and pulse duration, the peak electron temperature increases with a decrease in the thickness of the gold film. Both film size as well as laser fluence significantly affect the melting time. For a fluence of 5000 J/m2, and a pulse duration of 75 fs, gold films of thickness smaller than 200 nm melt before reaching electron-phonon equilibrium. However, for the film thickness of 2000 nm, even with the highest laser fluence examined, the electrons and phonons reach equilibrium and the gold film does not melt.
Стилі APA, Harvard, Vancouver, ISO та ін.
6

Bygrave, Faye, Tim P. Comyn, and Andrew J. Bell. "Interdiffusion at the substrate-film interface of BiFeO3-PbTiO3 thin films on Pt/Si substrates." In Nanoscale Phenomena in Polar Materials. IEEE, 2011. http://dx.doi.org/10.1109/isaf.2011.6014128.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
7

Samuel, B. S., A. V. Desai, and M. A. Haque. "Relaxation in Nanoscale Freestanding Gold Films Using MEMS." In ASME 2005 International Mechanical Engineering Congress and Exposition. ASMEDC, 2005. http://dx.doi.org/10.1115/imece2005-82833.

Повний текст джерела
Анотація:
We present experimental results to describe the stress relaxation behavior of thin (125 nm) freestanding gold films at room temperature. The experiments were performed inside a field emission scanning microscope using a MEMS-based test bed which is only 3mm × 10mm in size. The effect of stress relaxation on the young’s modulus of gold thin films is observed. The thin film specimen used in the experiment is co-fabricated with the micromechanical loading device and hence eliminates problems of alignment and gripping. Freestanding thin films provide us with information about the mechanical behavior of thin films in the absence of substrate effects.
Стилі APA, Harvard, Vancouver, ISO та ін.
8

Huang, Rui, Se Hyuk Im, and Yaoyu Pang. "Understanding Surface Instability Patterns in Nanoscale Thin Films." In ASME 4th Integrated Nanosystems Conference. ASMEDC, 2005. http://dx.doi.org/10.1115/nano2005-87046.

Повний текст джерела
Анотація:
Thin films of nanoscale thickness are common in integrated systems and devices. Subjected to interactions of diverse physical origins, the nanoscale thin films often undergo structural and/or morphological instability and develop a variety of surface patterns. Two examples are discussed in this paper. An epitaxial thin film undergoes surface roughening and form self-assembled quantum dots [1]. A thin metal film bonded to a polymer substrate develops various wrinkle patterns [2]. We develop nonlinear models and numerical methods to simulate the evolution processes. The results reveal very rich dynamics of surface pattern formation and suggest potential means for the control and making of ordered patterns.
Стилі APA, Harvard, Vancouver, ISO та ін.
9

Kaul, Pankaj B., and Vikas Prakash. "Thickness and Temperature Dependent Thermal Conductivity of Nanoscale Tin Films." In ASME 2011 International Mechanical Engineering Congress and Exposition. ASMEDC, 2011. http://dx.doi.org/10.1115/imece2011-65576.

Повний текст джерела
Анотація:
Thin films in general exhibit different thermal properties compared to bulk due to size effect [1–3]. In this study, the thermal conductivity of sputtered Sn films of thickness 500 nm ± 50 nm and 100 nm ± 20 nm are obtained from 55K to 300K and from 40K to 310K, respectively, using the three omega method. The thermal conductivity of 500 nm thin film at room temperature is 46.2 ±4.2 W/m-K, which is lower when compared to its bulk value of 63 W/m-K, and increases gradually as the temperature is lowered to 55K. In contrast, the thermal conductivity of the 100 nm thin film exhibits even reduced thermal conductivity, 36 ± 2.88 W/m-K at 300K, when compared to the 500 nm film, and decreases as the temperature is lowered. The reduction in thermal conductivity of Sn thin film may be due to the pronounced effects of electron scattering at the grain boundaries as well as the twin boundaries in addition to the scattering from the boundary surface at lower temperatures. These experimentally determined thermal conductivities are compared to models that take into account size effects on thermal conductivity of metallic films based on electronic scattering as proposed by Fuchs-Sondheimer (FS), Mayadas-Shatzkes (MS) and Qiu and Tien (QT). The experimentally measured thermal conductivity of Sn films is in good agreement with the MS model indicating the importance of the grain boundary scattering. Thickness measurements are obtained by ellipsometry and profilometer. The estimation of the mean grain size in both films and the evidence of twin boundaries are obtained by Atomic Force Microscopy.
Стилі APA, Harvard, Vancouver, ISO та ін.
10

Yao, Da-Jeng, Wei-Chih Lai, and Heng-Chieh Chien. "Temperature Dependence of Thermal Conductivity for Silicon Dioxide." In ASME 2008 First International Conference on Micro/Nanoscale Heat Transfer. ASMEDC, 2008. http://dx.doi.org/10.1115/mnht2008-52052.

Повний текст джерела
Анотація:
Heat transport of dielectric thin films in 30–300 nm thick is characterized in the temperature range of 74–300 K using the 3ω method, which is a simple method to measure the cross-plane thermal conductivity of dielectric thin films. Dielectric film samples of two kinds, deposited on Si substrates using plasma enhanced chemical vapor deposition (PECVD) and grown by thermal oxidation, were measured. In order to broaden the application of 3ω method, 3ω method system was combined with cryogenics system to measure temperature dependent material property. SiO2 films, prepared by thermal oxidation and PECVD, have been put and measured in the cryogenics system. The apparent thermal conductivity, intrinsic thermal conductivity, and interface resistance have been analyzed in different temperature. For this experiment, we discovered the thermal conductivity of PECVD SiO2 films is smaller than the thermal conductivity of SiO2 grown by thermal oxidation, because the porosity of thermal SiO2 is smaller than PECVD SiO2. The apparent thermal conductivity of SiO2 film decreases with film thickness. The thickness dependent thermal conductivity is interpreted in terms of a small interface thermal resistance RI. For SiO2 films, the thermal conductivity decreases if the temperature decreases, because the mean free path of heater carriers increases.
Стилі APA, Harvard, Vancouver, ISO та ін.

Звіти організацій з теми "Nanoscaled films"

1

Xi, Xiaoxing. Lattice Dynamical Properties of Ferroelectric Thin Films at the Nanoscale. Office of Scientific and Technical Information (OSTI), January 2014. http://dx.doi.org/10.2172/1114213.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
2

McKenna, Gregory B. Robust Polymer Films: Nanoscale Stiffening as a Route to Strong Materials. Fort Belvoir, VA: Defense Technical Information Center, October 2011. http://dx.doi.org/10.21236/ada579266.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Toney, Michael F. Nanoscale Phase Separation in Fe3O4(111) Films on Sapphire(0001) and Phase Stability of Fe3O4(001) Films on MgO(001) Grown by Oxygen-Plasma-Assisted Molecular Beam Epitaxy. Office of Scientific and Technical Information (OSTI), June 2003. http://dx.doi.org/10.2172/813273.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
Також вас можуть зацікавити розширені добірки на тему "Nanoscaled films" для конкретних типів джерел:
Статті в журналах Дисертації Книги
Ми пропонуємо знижки на всі преміум-плани для авторів, чиї праці увійшли до тематичних добірок літератури. Зв'яжіться з нами, щоб отримати унікальний промокод!

До бібліографії