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Статті в журналах з теми "Inductive plasma"
Keller, John H. "Inductive plasmas for plasma processing." Plasma Sources Science and Technology 5, no. 2 (May 1, 1996): 166–72. http://dx.doi.org/10.1088/0963-0252/5/2/008.
Повний текст джерелаVinogradov, Georgy K., and Shimao Yoneyama. "Balanced Inductive Plasma Sources." Japanese Journal of Applied Physics 35, Part 2, No. 9A (September 1, 1996): L1130—L1133. http://dx.doi.org/10.1143/jjap.35.l1130.
Повний текст джерелаIsupov, M. V. "Distributed ferromagnetic enhanced inductive plasma source for plasma processing." Journal of Physics: Conference Series 2119, no. 1 (December 1, 2021): 012115. http://dx.doi.org/10.1088/1742-6596/2119/1/012115.
Повний текст джерелаBURM, K. T. A. L. "The electronic identity of inductive and capacitive plasmas." Journal of Plasma Physics 74, no. 2 (April 2008): 155–61. http://dx.doi.org/10.1017/s0022377807006654.
Повний текст джерелаGodyak, Valery. "Plasma phenomena in inductive discharges." Plasma Physics and Controlled Fusion 45, no. 12A (November 17, 2003): A399—A424. http://dx.doi.org/10.1088/0741-3335/45/12a/026.
Повний текст джерелаGodyak, Valery. "Ferromagnetic enhanced inductive plasma sources." Journal of Physics D: Applied Physics 46, no. 28 (June 25, 2013): 283001. http://dx.doi.org/10.1088/0022-3727/46/28/283001.
Повний текст джерелаTuszewski, M., I. Henins, M. Nastasi, W. K. Scarborough, K. C. Walter, and D. H. Lee. "Inductive plasma sources for plasma implantation and deposition." IEEE Transactions on Plasma Science 26, no. 6 (1998): 1653–60. http://dx.doi.org/10.1109/27.747883.
Повний текст джерелаGudmundsson, J. T., and M. A. Lieberman. "Magnetic induction and plasma impedance in a cylindrical inductive discharge." Plasma Sources Science and Technology 6, no. 4 (November 1, 1997): 540–50. http://dx.doi.org/10.1088/0963-0252/6/4/012.
Повний текст джерелаGudmundsson, J. T., and M. A. Lieberman. "Magnetic induction and plasma impedance in a planar inductive discharge." Plasma Sources Science and Technology 7, no. 2 (May 1, 1998): 83–95. http://dx.doi.org/10.1088/0963-0252/7/2/002.
Повний текст джерелаLho, T., N. Hershkowitz, G. H. Kim, W. Steer, and J. Miller. "Asymmetric plasma potential fluctuation in an inductive plasma source." Plasma Sources Science and Technology 9, no. 1 (January 7, 2000): 5–11. http://dx.doi.org/10.1088/0963-0252/9/1/302.
Повний текст джерелаДисертації з теми "Inductive plasma"
Magin, Thierry. "A model for inductive plasma wind tunnels." Doctoral thesis, Universite Libre de Bruxelles, 2004. http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/211179.
Повний текст джерелаequilibrium are computed from the semi-classical statistical mechanics.
The electromagnetic and hydrodynamic fields of an inductive wind tunnel is presented. A total pressure measurement technique is thoroughly investigated by means of numerical simulations.
Doctorat en sciences appliquées
info:eu-repo/semantics/nonPublished
Rax, Jean-Marcel. "Études sur la génération non inductive de courant dans un plasma." Paris 11, 1987. http://www.theses.fr/1987PA112032.
Повний текст джерелаPopelier, Lara. "Développement du propulseur PEGASES : source inductive à haute performance et accélération successive de faisceaux d'ions positifs et d'ions négatifs." Phd thesis, Ecole Polytechnique X, 2012. http://tel.archives-ouvertes.fr/tel-00793098.
Повний текст джерелаMarx, Jean-Marcel. "Etudes sur la génération non inductive de courant dans un plasma." Grenoble 2 : ANRT, 1987. http://catalogue.bnf.fr/ark:/12148/cb37609211r.
Повний текст джерелаCanturk, Mehmet. "Modeling Of Helically Applied Current To The Inductively Coupled Radio Frequency Plasma Torch In Two Dimensions." Phd thesis, METU, 2004. http://etd.lib.metu.edu.tr/upload/3/12604691/index.pdf.
Повний текст джерела40 MHz). The applied power is coupled into the plasma inductively called inductively coupled plasma (ICP). RF ICP technique has achieved significance importance in a diversity of research and industrial applications for over the last threes decades. It is still required to undertake both theoretical and experimental research. In this work, RF ICP technique is applied on the torch modeling in 2D. Based on extended electromagnetic vector potential representation, an axisymmetric model in 2D is proposed for the calculations of the electromagnetic fields in an RF ICP torch. The influence of axial vector potential is included to the vector potential formulations. This is achieved by imposing a helical current carrying wire configuration. The corresponding governing equations are solved numerically by applying finite element method (FEM) using commercial partial differential equation solver (Flex PDE3). Based on this model, the plasma behavior and properties are examined in terms of plasma parameters. Besides, a comparative iii analysis is made between proposed model called helical configuration and the one currently available in the literature called circular configuration. This study shows relatively little difference between temperature fields predicted by two models. However, significant difference is observed between corresponding flows and electromagnetic fields. Especially, tangential flow which is observed in helical configuration vanishes in circular configuration. The proposed model offers an effective means of accounting for the variations of the helical coil geometry on the flow and temperature fields and achieving a better representation of the electromagnetic fields in the discharge. Finally, it is concluded that minimum number of turns (n = 2) yields significant difference between two models whereas, maximum allowable number of turns yield no distinctions on the results of two models in terms of azimuthally applied current. However, axial effect of current still exists but very small with respect to the result obtained with minimum number of turns.
Ndzogha, Cyrille. "Etudes des phénomènes d’échange dans la purification du silicium par plasma et induction." Grenoble INPG, 2005. https://theses.hal.science/tel-01340596.
Повний текст джерелаThis thesis focuses on a plasma process of purification of silicon for photovoltaic applications. It is applied to two types of materials: metallurgical silicon and recycling products from sawing sludge ingots and from wafers of photovoltaic industry. Platelet sawing sludge consist mainly of cutting fluid, SiC particles (abrasive), silicon microparticles and iron micro-particles from the cutting wire. Silicon sludge is a high-purity silicon, which is already of photovoltaic quality. It can represent 60% of the original weight of the ingot. The present process comprises a SiC phase separation by centrifugation, followed by chemical elimination phase of the iron, then a reactive plasma treatment for removing residual SiC. This work deals with this last phase. A more complex treatment than originally planned was made necessary by the existence in the SiC particles of sawing sludge from the initial breaking of the abrasive grains. Separation of SiC is incomplete, the plasma treatment had to remove much larger quantities than originally planned. This required a significant modification of the original process, and the setting of a pre-treatment phase point intended to make it usable by the product of the plasma separation. This work combines theoretical studies, numerical modeling and experimentation. Thermodynamic modeling to determine the best conditions for the removal of pollutants (adapted reactive gases, flow rates, temperatures, pressures) whereas modeling the electromagnetic measurement brewing efficiency renewing the surface of the liquid bath during treatment
Guglielmi, Alexandre. "Propulseur à courant de Hall double étage à source RF inductive : étude expérimentale du fonctionnement et des instabilités basses fréquences." Thesis, Toulouse 3, 2020. http://www.theses.fr/2020TOU30243.
Повний текст джерелаUnlike chemical thrusters, electric Hall current thrusters are small motors used for station keeping, orbiting, and interplanetary missions. Often characterized by low thrusts, they have the advantage of having a very high ejection speed and specific impulse. The principle is based on the ionization of a rare gas (Xe, Kr) by a potential difference applied through a magnetic barrier. The locally weaker electronic conductivity in the barrier leads to the creation of an electric field in this region. The ions are then subjected to this field and are therefore accelerated to speeds which may exceed several tens of km/s. The electric field at this barrier is then responsible for the acceleration of the ions and therefore, simultaneously, for the thrust and the specific impulse. In order to modify independently these two parameters, a double stage Hall thruster (ID-Hall, Inductive Double stage HALL thruster)) has been developed. The first stage is the ionization stage, consisting of an independent plasma source (ICP source), and the second stage is the acceleration region with the magnetic barrier. Using different diagnostics (ionic flux probe, retarding potential analyzer, high speed camera, current-voltage probes, segmented anode, etc.) and a numerical model (HALLIS), we were able to characterize the plasma, its instabilities, and thruster performance. Despite the singular magnetic mapping of this thruster, the characteristics in single stage operation are comparable to those of conventional Hall current thrusters. In dual-stage operation, the RF source significantly affects the transport of electrons in the thruster. In addition, other double-stage results show that at low discharge voltages, the discharge current is lower than at single stage. The energy of the extracted ions is higher in double stage and the ion current decreases with increasing RF power but remains close to the ion current in single stage. This study was carried out in Xenon and Argon. Low-frequency oscillations of large amplitudes (Breathing Mode) were observed experimentally, analyzed by time-resolved probe and compared to results obtained by the model. Other azimuthal instabilities (Rotating Spokes) have also been identified as well as studied electrically and by imaging. As soon as the source is active, at low RF power, these previous instabilities are strongly attenuated, while at higher power, other azimuthal instabilities appear (Striations). These azimutals instabilities were also studied around the source alone, by imaging in different gases and using a PIC-MCC model
Besseler, Edmilson. "Construção e caracterização de um reator indutivo : ICP para corrosão de materiais." [s.n.], 2008. http://repositorio.unicamp.br/jspui/handle/REPOSIP/259745.
Повний текст джерелаDissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Eletrica e de Computação
Made available in DSpace on 2018-08-11T19:17:46Z (GMT). No. of bitstreams: 1 Besseler_Edmilson_M.pdf: 3143419 bytes, checksum: 2715af82a31f1728537a14b1764455a6 (MD5) Previous issue date: 2008
Resumo: Esta dissertação apresenta as etapas do trabalho de construção de um Reator ICP destinado a processos de micro fabricação, mais precisamente, destinado a corrosões profundas de Silício a taxas de corrosões elevadas. O modelamento e as caracterizações do reator ICP foram feitas através de um protótipo e depois aplicadas a um equipamento da LAM Research que funcionava em modo RIE. Este foi adaptado para trabalhar em modo ICP, de acordo com os parâmetros obtidos no protótipo. Para isso, foi necessário a instalação do Equipamento e fornecer toda a infra-estrutura que este necessitava para seu funcionamento. Foram desenvolvidos casadores de impedância para ligação dos geradores de RF à bobina do ICP e do eletrodo de polarização da amostra, controladores de fluxo de gases, chaveadores manuais para válvulas pneumáticas, sistemas de refrigeração e tubulação de vácuo. O plasma foi caracterizado e alguns processos foram realizados com o intuído de mostrar o comportamento com relação à variação de parâmetros como pressão, potência, polarização da amostra, fluxo de gases, tempo de processo, área da lâmina exposta ao plasma e também o comportamento de diferentes tipos de máscaras. O Equipamento também foi preparado para que seja possível a comutação de gases, que futuramente será automática, de modo que se possa realizar corrosões e polimerizações consecutivas, como ocorre em processos Bosch.
Abstract: This dissertation shows the steps to building an ICP Reactor dedicated to micro fabrication process, further to deep etching of Silicon on high rates. The modeling and characterization of ICP Reactor has been done in a prototype and after applied on an RIE equipment from LAM Research, that was adapted to work in ICP mode like the prototype. To do it was necessary equipment installation and give it the infra structure needed to it works. A network matching was developed to connect the RF generator to ICP coil and to the electrode of wafer polarization, such as gas flow controllers, manual switches for pneumatic valves, cooling systems and vacuum pipes. The plasma was characterized and some processes has been realized in order to show the trends against some parameters variation as pressure, power, sample polarization (bias), gas flow, process time, wafer area exposed to the plasma and also the behavior of different kind of masks. The equipment is ready to switch some gases, which will be automatic in the future, to corrosion and polymerization consecutive process as at a Bosch process.
Mestrado
Eletrônica, Microeletrônica e Optoeletrônica
Mestre em Engenharia Elétrica
Plihon, Nicolas. "Stabilité et structure électrique d'une décharge inductive en gaz électronégatif." Phd thesis, Ecole Polytechnique X, 2006. http://tel.archives-ouvertes.fr/tel-00083948.
Повний текст джерелаDehbi, Leila. "Study of a radio-frequency inductive plasma discharge used to deposit an amorphous hydrogenated carbon thin film." Doctoral thesis, Universite Libre de Bruxelles, 1998. http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/212056.
Повний текст джерелаКниги з теми "Inductive plasma"
Practical inductively coupled plasma spectroscopy. Hoboken, NJ: Wiley, 2005.
Знайти повний текст джерелаDean, John R. Practical Inductively Coupled Plasma Spectroscopy. Chichester, UK: John Wiley & Sons, Ltd, 2005. http://dx.doi.org/10.1002/047009351x.
Повний текст джерелаOkpalugo, Osmund A. Characteristics of argon-chlorine inductively coupled plasmas for plasma surface modification and etching. [S.l: The author], 2003.
Знайти повний текст джерелаChen, Hsin-Yi. Inductively coupled plasma etching of InP. Ottawa: National Library of Canada, 2000.
Знайти повний текст джерелаNelms, Simon M. Inductively coupled plasma mass spectrometry handbook. Oxford: Blackwell Pub., 2005.
Знайти повний текст джерелаNelms, Simon M., ed. Inductively Coupled Plasma Mass Spectrometry Handbook. Oxford, UK: Blackwell Publishing Ltd., 2005. http://dx.doi.org/10.1002/9781444305463.
Повний текст джерелаThompson, Michael, and J. Nicholas Walsh. Handbook of Inductively Coupled Plasma Spectrometry. Boston, MA: Springer US, 1989. http://dx.doi.org/10.1007/978-1-4613-0697-9.
Повний текст джерелаMichael, Thompson. Handbook of inductively coupled plasma spectrometry. 2nd ed. Glasgow: Blackie, 1989.
Знайти повний текст джерелаMichael, Thompson. Handbook of inductively coupled plasma spectrometry. 2nd ed. Glasgow: Blackie, 1989.
Знайти повний текст джерелаL, Gray A., and Houk R. S, eds. Handbook of inductively coupled plasma mass spectrometry. London: Blackie Academic & Professional, 1992.
Знайти повний текст джерелаЧастини книг з теми "Inductive plasma"
Miyamoto, Kenro. "Wave Heatings and Non-Inductive Current Drives." In Plasma Physics for Controlled Fusion, 225–58. Berlin, Heidelberg: Springer Berlin Heidelberg, 2016. http://dx.doi.org/10.1007/978-3-662-49781-4_11.
Повний текст джерелаBoswell, R. W., A. Ellingboe, A. Degeling, M. Lieberman, and J. Derouard. "The Transition from Capacitive to Inductive to Wave Sustained Discharges." In Plasma Processing of Semiconductors, 181–86. Dordrecht: Springer Netherlands, 1997. http://dx.doi.org/10.1007/978-94-011-5884-8_10.
Повний текст джерелаHewett, Dennis W. "Elimination of Electromagnetic Radiation in Plasma Simulation: The Darwin or Magneto Inductive Approximation." In Space Plasma Simulations, 29–40. Dordrecht: Springer Netherlands, 1985. http://dx.doi.org/10.1007/978-94-009-5454-0_3.
Повний текст джерелаFouladgar, Javad, and Jean-Pierre Ploteau. "Simplified Model of a Radiofrequency Inductive Thermal Plasma Installation." In Electrothermics, 39–84. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118562673.ch2.
Повний текст джерелаSuzuki, T., S. Sato, M. Kusunoki, M. Mukaida, and S. Ohshima. "Microwave Surface Resistance of YBa2Cu3Oy Thin Films Prepared by Inductive Coupled Plasma Sputtering." In Advances in Superconductivity XII, 1048–50. Tokyo: Springer Japan, 2000. http://dx.doi.org/10.1007/978-4-431-66877-0_311.
Повний текст джерелаQuesnel, François, Gervais Soucy, Jocelyn Veilleux, Pierre Hovington, Wen Zhu, and Karim Zaghib. "Characterization of the Phase Composition of Nanosized Lithium Titanates Synthesized by Inductive Thermal Plasma." In Characterization of Minerals, Metals, and Materials 2015, 393–400. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2015. http://dx.doi.org/10.1002/9781119093404.ch48.
Повний текст джерелаQuesnel, François, Gervais Soucy, Jocelyn Veilleux, Pierre Hovington, Wen Zhu, and Karim Zaghib. "Characterization of the Phase Composition of Nanosized Lithium Titanates Synthesized by Inductive Thermal Plasma." In Characterization of Minerals, Metals, and Materials 2015, 393–400. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-48191-3_48.
Повний текст джерелаLim, Jong Hyeuk, Kyong Nam Kim, and Geun Young Yeom. "Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing." In Solid State Phenomena, 271–74. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-31-0.271.
Повний текст джерелаKnecht, J. "Inductively coupled plasma." In Springer Reference Medizin, 1244–45. Berlin, Heidelberg: Springer Berlin Heidelberg, 2019. http://dx.doi.org/10.1007/978-3-662-48986-4_1570.
Повний текст джерелаKnecht, J. "Inductively coupled plasma." In Lexikon der Medizinischen Laboratoriumsdiagnostik, 1–2. Berlin, Heidelberg: Springer Berlin Heidelberg, 2018. http://dx.doi.org/10.1007/978-3-662-49054-9_1570-1.
Повний текст джерелаТези доповідей конференцій з теми "Inductive plasma"
Wessel, F. J., N. Bolte, V. Kiyashko, M. Morehouse, T. Roche, and M. Slepchenkov. "Pulsed-inductive-plasma thruster." In 2013 IEEE 40th International Conference on Plasma Sciences (ICOPS). IEEE, 2013. http://dx.doi.org/10.1109/plasma.2013.6633290.
Повний текст джерелаWessel, F. J., N. Bolte, V. Kiyashko, M. Morehouse, T. Roche, and M. Slepchenkov. "Pulsed-inductive thruster." In 2013 IEEE Pulsed Power and Plasma Science Conference (PPPS 2013). IEEE, 2013. http://dx.doi.org/10.1109/ppc.2013.6627441.
Повний текст джерелаTurner, Matthew, Clark Hawk, and Ron Litchford. "Inductive measurement of plasma jet electrical conductivity." In 36th AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit. Reston, Virigina: American Institute of Aeronautics and Astronautics, 2000. http://dx.doi.org/10.2514/6.2000-3369.
Повний текст джерелаCavenago, Marco. "Notes on Radiofrequency and Plasma Coupling in Inductive Plasma Ion Sources." In 2020 XXXIIIrd General Assembly and Scientific Symposium of the International Union of Radio Science (URSI GASS). IEEE, 2020. http://dx.doi.org/10.23919/ursigass49373.2020.9232182.
Повний текст джерелаHallock, A. K., and K. A. Polzin. "Effect of inductive coil geometry on the operating characteristics of an inductive pulsed plasma thruster." In 2012 IEEE 39th International Conference on Plasma Sciences (ICOPS). IEEE, 2012. http://dx.doi.org/10.1109/plasma.2012.6384011.
Повний текст джерелаFreund, H. P., W. Miner, J. Verboncoeur, and J. Pasour. "Time-Domain Simulation of Inductive Output Tubes." In 2007 IEEE Pulsed Power Plasma Science Conference. IEEE, 2007. http://dx.doi.org/10.1109/ppps.2007.4345973.
Повний текст джерелаVande, David, and Gerard Degrez. "An efficient computational model for inductive plasma flows." In 29th AIAA, Plasmadynamics and Lasers Conference. Reston, Virigina: American Institute of Aeronautics and Astronautics, 1998. http://dx.doi.org/10.2514/6.1998-2825.
Повний текст джерелаMagin, Thierry, David Vanden Abeele, and Gerard Degrez. "An implicit multiblock solver for inductive plasma flows." In Fluids 2000 Conference and Exhibit. Reston, Virigina: American Institute of Aeronautics and Astronautics, 2000. http://dx.doi.org/10.2514/6.2000-2480.
Повний текст джерелаMatsui, Makoto, Kimiya Komurasaki, Georg Herdrich, and Monika Auweter-Kurtz. "Laser Absorption Spectroscopy in Inductive Plasma Generator Flows." In 42nd AIAA Aerospace Sciences Meeting and Exhibit. Reston, Virigina: American Institute of Aeronautics and Astronautics, 2004. http://dx.doi.org/10.2514/6.2004-1222.
Повний текст джерелаPolzin, Kurt, and Edgar Choueiri. "Performance Optimization Criteria for Pulsed Inductive Plasma Acceleration." In 41st AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit. Reston, Virigina: American Institute of Aeronautics and Astronautics, 2005. http://dx.doi.org/10.2514/6.2005-3694.
Повний текст джерелаЗвіти організацій з теми "Inductive plasma"
Kinsey, J., and D. A. Ehst. Inductive currents in an rf driven plasma. Office of Scientific and Technical Information (OSTI), August 1991. http://dx.doi.org/10.2172/5218308.
Повний текст джерелаRaman, R., T. Jarboe, B. Nelson, M. Bell, M. Ono, T. Bigelow, R. Kaita, et al. Non-inductive Solenoid-less Plasma Current Start-up in NSTX Using Transient CHI. Office of Scientific and Technical Information (OSTI), May 2007. http://dx.doi.org/10.2172/963549.
Повний текст джерелаWonho Choe, Jayhyun Kim, and Masayuki Ono. Optimization of Outer Poloidal Field (PF) Coil Configurations for Inductive PF Coil-only Plasma Start-up on Spherical Tori. Office of Scientific and Technical Information (OSTI), April 2004. http://dx.doi.org/10.2172/827828.
Повний текст джерелаTaylor, G., C. E. Kessel, B. P. LeBlanc, D. Mueller, D. K. Phillips, E. J. Valeo, J. R. Wilson, P. M. Ryan, P. T. Bonoli, and J. C. Wright. Generation Of High Non-inductive Plasma Current Fraction H-mode Discharges By High-harmonic Last Wave Heating In The National Spherical Torus Experiment. Office of Scientific and Technical Information (OSTI), February 2012. http://dx.doi.org/10.2172/1037992.
Повний текст джерелаMishra, Umesh K. Inductively Coupled Plasma System (ICP). Fort Belvoir, VA: Defense Technical Information Center, January 2001. http://dx.doi.org/10.21236/ada420671.
Повний текст джерелаHickman, D. P., S. Maclean, D. Shepley, and R. K. Shaw. Inductively Coupled Plasma Mass Spectrometry Uranium Error Propagation. Office of Scientific and Technical Information (OSTI), July 2001. http://dx.doi.org/10.2172/15006257.
Повний текст джерелаAuthor, Not Given. Energetic material conversion using an inductively coupled plasma. Office of Scientific and Technical Information (OSTI), January 1996. http://dx.doi.org/10.2172/10129847.
Повний текст джерелаChen, Xiaoshan. Matrix effects in inductively coupled plasma mass spectrometry. Office of Scientific and Technical Information (OSTI), July 1995. http://dx.doi.org/10.2172/108087.
Повний текст джерелаFuruta, Naoki, Curtis A. Monnig, Pengyuan Yang, and Gary M. Hieftje. Noise Characteristics of an Inductively Coupled Plasma-Mass Spectrometer. Fort Belvoir, VA: Defense Technical Information Center, February 1989. http://dx.doi.org/10.21236/ada205686.
Повний текст джерелаDeborah Figg, Alex Martinez, Lawrence Drake, and Chris Brink. Inductively Coupled Plasma--Mass Spectrometry Analysis of Plutonium Samples. Office of Scientific and Technical Information (OSTI), October 2000. http://dx.doi.org/10.2172/766949.
Повний текст джерела