Добірка наукової літератури з теми "Focused Ion Beam machining"
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Статті в журналах з теми "Focused Ion Beam machining"
Allen, D. M., P. Shore, R. W. Evans, C. Fanara, W. O’Brien, S. Marson, and W. O’Neill. "Ion beam, focused ion beam, and plasma discharge machining." CIRP Annals 58, no. 2 (2009): 647–62. http://dx.doi.org/10.1016/j.cirp.2009.09.007.
Повний текст джерелаHung, N. P., Y. Q. Fu, and M. Y. Ali. "Focused ion beam machining of silicon." Journal of Materials Processing Technology 127, no. 2 (September 2002): 256–60. http://dx.doi.org/10.1016/s0924-0136(02)00153-x.
Повний текст джерелаYoung, Richard J. "Micro-machining using a focused ion beam." Vacuum 44, no. 3-4 (March 1993): 353–56. http://dx.doi.org/10.1016/0042-207x(93)90182-a.
Повний текст джерелаChen, Yan, Li Bao An, and Xiao Xia Yang. "Recent Development of Focused Ion Beam System and Application." Advanced Materials Research 753-755 (August 2013): 2578–81. http://dx.doi.org/10.4028/www.scientific.net/amr.753-755.2578.
Повний текст джерелаSun, Ji Ning, Xi Chun Luo, Wen Long Chang, and James M. Ritchie. "Fabrication of Freeform Micro Optics by Focused Ion Beam." Key Engineering Materials 516 (June 2012): 414–19. http://dx.doi.org/10.4028/www.scientific.net/kem.516.414.
Повний текст джерелаAtiqah, N., I. H. Jaafar, Mohammad Yeakub Ali, and B. Asfana. "Application of Focused Ion Beam Micromachining: A Review." Advanced Materials Research 576 (October 2012): 507–10. http://dx.doi.org/10.4028/www.scientific.net/amr.576.507.
Повний текст джерелаTaniguchi, Jun, Shin-ichi Satake, Takaki Oosumi, Akihisa Fukushige, and Yasuo Kogo. "Dwell time adjustment for focused ion beam machining." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 307 (July 2013): 248–52. http://dx.doi.org/10.1016/j.nimb.2013.02.039.
Повний текст джерелаKitamura, Masaru, Eijiro Koike, Noboru Takasu, and Tetsuro Nishimura. "Focused Ion Beam Machining for Optical Microlens Fabrication." Japanese Journal of Applied Physics 41, Part 1, No. 6A (June 15, 2002): 4019–21. http://dx.doi.org/10.1143/jjap.41.4019.
Повний текст джерелаDavies, ST, and B. Khamsehpour. "Focused ion beam machining and deposition for nanofabrication." Vacuum 47, no. 5 (May 1996): 455–62. http://dx.doi.org/10.1016/0042-207x(95)00235-9.
Повний текст джерелаJiang, Xiao Xiao, Feng Wen Wang, Zhen He Ma, Qiong Chan Gu, Jiang Tao Lv, and Guang Yuan Si. "Arbitrary Structures Fabricated by Focused Ion Beam Milling." Advanced Materials Research 661 (February 2013): 66–69. http://dx.doi.org/10.4028/www.scientific.net/amr.661.66.
Повний текст джерелаДисертації з теми "Focused Ion Beam machining"
Evans, R. "Focused ion beam machining of hard materials for micro engineering applications." Thesis, Cranfield University, 2009. http://dspace.lib.cranfield.ac.uk/handle/1826/4417.
Повний текст джерелаChitsaz, Charandabi Sahand. "Development of a Lorentz force drive system for a torsional paddle microresonator using Focused Ion Beam machining." Thesis, University of Birmingham, 2014. http://etheses.bham.ac.uk//id/eprint/4872/.
Повний текст джерелаZhang, Haoyu. "Application of focused ion beam for micro-machining and controlled quantum dot formation on patterned GaAs substrate." Thesis, University of Sheffield, 2013. http://etheses.whiterose.ac.uk/6408/.
Повний текст джерелаCastro, Olivier de. "Development of a Versatile High-Brightness Electron Impact Ion Source for Nano-Machining, Nano-Imaging and Nano-Analysis." Thesis, Université Paris-Saclay (ComUE), 2016. http://www.theses.fr/2016SACLS468/document.
Повний текст джерелаHigh brightness low energy spread (ΔE) ion sources are needed for focused ion beam nano-applications in order to get a high lateral resolution while having sufficiently high ion beam currents to obtain reasonable erosion rates and large secondary electron/ion yields. The objectives of this thesis are: the design of an electron impact ion source, a reduced brightness Br of 10³ – 10⁴ A m⁻² sr⁻ ¹ V⁻ ¹ with an energy distribution spread ΔE ≲ 1 eV and a versatile ion species choice. In a first evaluated concept an electron beam is focussed in between two parallel plates spaced by ≲1 mm. A micron sized ionisation volume is created above an extraction aperture of a few tens of µm. By using a LaB₆ electron emitter and the ionisation region with a pressure around 0.1 mbar, Br is close to 2.10² A m⁻² sr ⁻ ¹ V ⁻ ¹ with source sizes of a few µm, ionic currents of a few nA for Ar⁺/Xe⁺/O₂ ⁺ and the energy spread being ΔE < 0.5 eV. The determined Br value is still below the minimum targeted value and furthermore the main difficulty is that the needed operation pressure for the LaB₆ emitter cannot be achieved across the compact electron column and therefore a prototype has not been constructed. The second evaluated source concept is based on the idea to obtain a high current ion beam having a source size and half-opening beam angle similar to the first concept, but changing the electron gas interaction and the ion collection. Theoretical and experimental studies are used to evaluate the performance of this second source concept and its usefulness for focused ion beam nano-applications
Latif, Adnan. "Nanofabrication using focused ion beam." Thesis, University of Cambridge, 2000. https://www.repository.cam.ac.uk/handle/1810/34605.
Повний текст джерелаNaik, Jay Prakash. "Nanowires fabricated by Focused Ion Beam." Thesis, University of Birmingham, 2013. http://etheses.bham.ac.uk//id/eprint/4638/.
Повний текст джерелаWong, Ka Chun. "Focused Ion Beam Nanomachining of Thermoplastic Polymers." Thesis, North Carolina State University, 2013. http://pqdtopen.proquest.com/#viewpdf?dispub=3538536.
Повний текст джерелаCommercially available Ga+ focused ion beam (FIB) instruments with nanometer size probe allows for in situ materials removal (sputtering) and addition (deposition) on a wide range of material. These spatially precise processes have enabled a wide range of nanofacbrication operations (e.g. specimen preparation for analysis by scanning electron microscope, transmission electron microscope, and secondary ion mass spectrometer). While there exists an established knowledge of FIB methods for sample preparation of hard materials, but FIB methodology remain underdeveloped for soft materials such as biological and polymeric materials.
As FIB is increasingly utilized for specimen preparation of polymeric materials, it is becoming necessary to formulate an information base that will allow established FIB techniques to be generalized to this spectrum of materials. A thorough understanding of the fundamental ion-solid interactions that govern the milling process can be instrumental. Therefore, in an effort to make the existing procedures more universally applicable, the interrelationships between target material, variable processing parameters, and process efficiency of the milling phenomena are examined. The roles of beam current, distance (i.e. step size) between successive FIB beam dwell and the time it spent at each dwell point (i.e. pixel dwell time) are considered as applied to FIB nanomachining of four different thermoplastic polymers: 1. low density polyethylene (LDPE), 2. high density polyethylene (HDPE), 3. Polystyrene (PS), and 4. nylon 6 (PA6). Careful characterization of such relationships is used to explain observed phenomena and predict expected milling behaviors, thus allowing the FIB to be used more efficiently with reproducible results. Applications involving different types of polymer composite fiber are presented.
Sabouri, Aydin. "Nanofabrication by means of focused ion beam." Thesis, University of Birmingham, 2015. http://etheses.bham.ac.uk//id/eprint/5987/.
Повний текст джерелаDella, Ratta Anthony D. (Anthony David). "Focused ion beam induced deposition of copper." Thesis, Massachusetts Institute of Technology, 1993. http://hdl.handle.net/1721.1/12418.
Повний текст джерелаShedd, Gordon M. 1954. "Focused ion beam assisted deposition of gold." Thesis, Massachusetts Institute of Technology, 1986. http://hdl.handle.net/1721.1/14947.
Повний текст джерелаMICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.
Bibliography: leaves 75-76.
by Gordon M. Shedd.
M.S.
Книги з теми "Focused Ion Beam machining"
Foster, C. P. J. A comparison of electro discharge machining, laser & focused ion beam micromachining technologies. Cambridge: TWI, 1998.
Знайти повний текст джерелаYao, Nan, ed. Focused Ion Beam Systems. Cambridge: Cambridge University Press, 2007. http://dx.doi.org/10.1017/cbo9780511600302.
Повний текст джерелаNan, Yao, ed. Focused ion beam systems: Basics and applications. Cambridge: Cambridge University Press, 2007.
Знайти повний текст джерелаBachmann, Maja D. Manipulating Anisotropic Transport and Superconductivity by Focused Ion Beam Microstructuring. Cham: Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-51362-7.
Повний текст джерелаCórdoba Castillo, Rosa. Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-02081-5.
Повний текст джерелаOrloff, Jon. High Resolution Focused Ion Beams: FIB and its Applications: The Physics of Liquid Metal Ion Sources and Ion Optics and Their Application to Focused Ion Beam Technology. Boston, MA: Springer US, 2003.
Знайти повний текст джерела1934-, Swanson Lynwood, and Utlaut Mark William 1949-, eds. High resolution focused ion beams: FIB and its applications : the physics of liquid metal ion sources and ion optics and their application to focused ion beam technology. New York: Kluwer Academic/Plenum Publishers, 2003.
Знайти повний текст джерелаOrloff, Jon. High resolution focused ion beams: FIB and its applications ; the physics of liquid metal ion sources and ion optics and their application to focused ion beam technology. New York, NY: Kluwer Academic/Plenum Publishers, 2003.
Знайти повний текст джерелаFernandez-Pacheco, Amalio. Studies of Nanoconstrictions, Nanowires and Fe₃O₄ Thin Films: Electrical Conduction and Magnetic Properties. Fabrication by Focused Electron/Ion Beam. Berlin, Heidelberg: Springer-Verlag Berlin Heidelberg, 2011.
Знайти повний текст джерелаJapan-U.S. Seminar on Focused Ion Beam Technology and Applications (1987 Osaka, Japan and Mie-ken, Japan). Proceedings of the Japan-U.S. Seminar on Focused Ion Beam Technology and Applications: 15-19 November 1987, Senri Hankyu Hotel, Osaka, and 20 November 1987, Shima Kanko Hotel, Mie Prefect, Japan. Edited by Harriott Lloyd R, Nihon Gakujutsu Shinkōkai, National Science Foundation (U.S.), and American Vacuum Society. New York: Published for the American Vacuum Society by the American Institute of Physics, 1988.
Знайти повний текст джерелаЧастини книг з теми "Focused Ion Beam machining"
Kamaliya, Bhaveshkumar, and Rakesh G. Mote. "Nanofabrication Using Focused Ion Beam." In Advanced Machining Science, 229–48. Boca Raton: CRC Press, 2022. http://dx.doi.org/10.1201/9780429160011-9.
Повний текст джерелаBachmann, Maja D. "Focused Ion Beam Micro-machining." In Manipulating Anisotropic Transport and Superconductivity by Focused Ion Beam Microstructuring, 5–33. Cham: Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-51362-7_2.
Повний текст джерелаFu, Yongqi, and Lumin Wang. "Focused Ion Beam Machining and Deposition." In Ion Beams in Nanoscience and Technology, 265–90. Berlin, Heidelberg: Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-00623-4_20.
Повний текст джерелаCampbell, L. C. I., D. T. Foord, and C. J. Humphreys. "‘Nano-machining’ using a focused ion beam." In Electron Microscopy and Analysis 1997, 657–60. Boca Raton: CRC Press, 2022. http://dx.doi.org/10.1201/9781003063056-170.
Повний текст джерелаYang, Hongyi, and Svetan Rachev. "Focused Ion Beam Micro Machining and Micro Assembly." In Precision Assembly Technologies and Systems, 81–86. Berlin, Heidelberg: Springer Berlin Heidelberg, 2010. http://dx.doi.org/10.1007/978-3-642-11598-1_9.
Повний текст джерелаPatil, Deepak. "Focused Ion Beam Machining as a Technology for Long Term Sustainability." In Smart Technologies for Improved Performance of Manufacturing Systems and Services, 181–91. New York: CRC Press, 2023. http://dx.doi.org/10.1201/9781003346623-12.
Повний текст джерелаKawasegi, Noritaka. "Ion Beam Machining." In Toxinology, 1–26. Dordrecht: Springer Netherlands, 2018. http://dx.doi.org/10.1007/978-981-10-6588-0_16-1.
Повний текст джерелаKawasegi, Noritaka. "Ion Beam Machining." In Toxinology, 1–26. Dordrecht: Springer Netherlands, 2018. http://dx.doi.org/10.1007/978-981-10-6588-0_16-2.
Повний текст джерелаFang, Fengzhou, and Zong Wei Xu. "Ion Beam Machining." In CIRP Encyclopedia of Production Engineering, 1–12. Berlin, Heidelberg: Springer Berlin Heidelberg, 2018. http://dx.doi.org/10.1007/978-3-642-35950-7_6485-4.
Повний текст джерелаKawasegi, Noritaka. "Ion Beam Machining." In Micro/Nano Technologies, 529–54. Singapore: Springer Singapore, 2018. http://dx.doi.org/10.1007/978-981-13-0098-1_16.
Повний текст джерелаТези доповідей конференцій з теми "Focused Ion Beam machining"
Tan, Shida, Richard H. Livengood, Yuval Greenzweig, Yariv Drezner, Roy Hallstein, and Chris Scheffler. "Characterization of Ion Beam Current Distribution Influences on Nanomachining." In ISTFA 2012. ASM International, 2012. http://dx.doi.org/10.31399/asm.cp.istfa2012p0436.
Повний текст джерелаTihanyi, P., D. K. Wagner, H. J. Vollmer, A. J. Roza, C. M. Harding, R. J. Davis, and E. D. Wolf. "High Power Laser with a Chemically Assisted Ion Beam Etched Mirror." In Semiconductor Lasers. Washington, D.C.: Optica Publishing Group, 1987. http://dx.doi.org/10.1364/sla.1987.wa5.
Повний текст джерелаKim, Sang-Jae, and Koji Iwasaki. "Development of focused-ion-beam (FIB) machining systems for fabricating 3-D micro- and nano- structures." In 2007 Digest of papers Microprocesses and Nanotechnology. IEEE, 2007. http://dx.doi.org/10.1109/imnc.2007.4456202.
Повний текст джерелаTan, Shida, Richard H. Livengood, Roy Hallstein, Darryl Shima, Yuval Greenzweig, John Notte, and Shawn McVey. "Neon Ion Microscope Nanomachining Considerations." In ISTFA 2011. ASM International, 2011. http://dx.doi.org/10.31399/asm.cp.istfa2011p0040.
Повний текст джерелаZhou, Jack, and Guoliang Yang. "Modeling and Simulation of Focused Ion Beam Based Single Digital Nano Hole Fabrication for DNA and Macromolecule Characterization." In ASME 2008 International Manufacturing Science and Engineering Conference collocated with the 3rd JSME/ASME International Conference on Materials and Processing. ASMEDC, 2008. http://dx.doi.org/10.1115/msec_icmp2008-72033.
Повний текст джерелаNonaka, Shinri, Tastuhiro Mori, Yasuyuki Takata, and Masamichi Kohno. "The Effect of the Laser Beam Wavelength and Pulse Width on Micro Grooving: Comparison of Nanosecond and Femtosecond Laser." In ASME 2012 10th International Conference on Nanochannels, Microchannels, and Minichannels collocated with the ASME 2012 Heat Transfer Summer Conference and the ASME 2012 Fluids Engineering Division Summer Meeting. American Society of Mechanical Engineers, 2012. http://dx.doi.org/10.1115/icnmm2012-73135.
Повний текст джерелаLi, J., J. N. Sun, M. M. Miliar, J. M. Ritchie, X. Luo, R. R. J. Maier, D. P. Hand, and W. N. MacPherson. "Focussed ion beam machining of an in-fibre 45° mirror for fibre end sensors." In Fifth European Workshop on Optical Fibre Sensors, edited by Leszek R. Jaroszewicz. SPIE, 2013. http://dx.doi.org/10.1117/12.2025714.
Повний текст джерелаScheffler, Christopher M., Richard H. Livengood, Haripriya E. Prakasam, Michael W. Phaneuf, and Ken Lagarec. "Patterning in an Imperfect World—Limitations of Focused Ion Beam Systems and Their Effects on Advanced Applications at the 14 nm Process Node." In ISTFA 2016. ASM International, 2016. http://dx.doi.org/10.31399/asm.cp.istfa2016p0382.
Повний текст джерелаJarausch, Konrad, John F. Richards, Lloyd Denney, Alex Guichard, and Phillip E. Russell. "Site Specific 2-D Implant Profiling Using FIB Assisted SCM." In ISTFA 2002. ASM International, 2002. http://dx.doi.org/10.31399/asm.cp.istfa2002p0467.
Повний текст джерелаLorut, Frédéric, Alexia Valéry, Nicolas Chevalier, and Denis Mariolle. "FIB-Based Sample Preparation for Localized SCM and SSRM." In ISTFA 2018. ASM International, 2018. http://dx.doi.org/10.31399/asm.cp.istfa2018p0209.
Повний текст джерелаЗвіти організацій з теми "Focused Ion Beam machining"
Melngailis, John. Focused Ion Beam Implantation. Fort Belvoir, VA: Defense Technical Information Center, March 1992. http://dx.doi.org/10.21236/ada249662.
Повний текст джерелаJiang, X., Q. Ji, A. Chang, and K. N. Leung. Mini RF-driven ion source for focused ion beam system. Office of Scientific and Technical Information (OSTI), August 2002. http://dx.doi.org/10.2172/802041.
Повний текст джерелаPellerin, J. G., D. Griffis, and P. E. Russell. Development of a focused ion beam micromachining system. Office of Scientific and Technical Information (OSTI), December 1988. http://dx.doi.org/10.2172/476649.
Повний текст джерелаTegtmeier, Eric, Mary Hill, Daniel Rios, and Juan Duque. Focused Ion Beam analysis of non radioactive samples. Office of Scientific and Technical Information (OSTI), February 2021. http://dx.doi.org/10.2172/1766960.
Повний текст джерелаHarmer, M. P. A Focused-Ion Beam (FIB) Nano-Fabrication and Characterization Facility. Fort Belvoir, VA: Defense Technical Information Center, November 2002. http://dx.doi.org/10.21236/ada408750.
Повний текст джерелаMayer, Thomas Michael, David Price Adams, V. Carter Hodges, and Michael J. Vasile. Focused ion beam techniques for fabricating geometrically-complex components and devices. Office of Scientific and Technical Information (OSTI), March 2004. http://dx.doi.org/10.2172/918768.
Повний текст джерелаLamartine, B. C. Liquid metal focused ion beam etch sensitization and related data transmission processes. Office of Scientific and Technical Information (OSTI), December 1998. http://dx.doi.org/10.2172/562504.
Повний текст джерелаDolph, Melissa C., and Christopher Santeufemio. Exploring Cryogenic Focused Ion Beam Milling as a Group III-V Device Fabrication Tool. Fort Belvoir, VA: Defense Technical Information Center, September 2013. http://dx.doi.org/10.21236/ada597233.
Повний текст джерелаMiller, J. D., R. F. Schneider, D. J. Weidman, H. S. Uhm, and K. T. Nguyen. Plasma Wakefield Effects On High-Current Relativistic Electron Beam Transport In The Ion-Focused Regime. Fort Belvoir, VA: Defense Technical Information Center, January 1992. http://dx.doi.org/10.21236/ada338876.
Повний текст джерела