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Статті в журналах з теми "Electron microscopy Methodology":

1

Iha, Luiz Cesar Nakao, Andre Aguillera, Flavio Faria, Cristiane Akemi Kasse, Oswaldo Laercio Mendonça Cruz, and Edna Frey Muller. "R147: Scanning Electron Microscopy: Alternatives in Methodology." Otolaryngology–Head and Neck Surgery 135, no. 2_suppl (August 2006): P156. http://dx.doi.org/10.1016/j.otohns.2006.06.901.

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2

Downing, Kenneth H. "Instrumentation and methodology for electron crystallography." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 420–21. http://dx.doi.org/10.1017/s0424820100086404.

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The determination of three-dimensional structures of macromolecules at atomic resolution remains one oμf the great promises of electron microscopy. Instrumental problems which had to be overcome in order to achieve single-atom resolution have long been recognized and to a large extent overcome. It is interesting to note that most of the instrumental developments were already incorporated in a microscope under construction over 20 years ago. However, the application of techniques to circumvent limitations imposed by the sensitivity of organic specimen to radiation damage are still developing. Electron crystallography, which takes advantage of the ability to obtain useful information from images taken at very low exposure, is close to realizing the potential. The state of electron crystallography has advanced rapidly during the last few years. The structure of one protein, bacteriorhodopsin, has been determined from EM data, and several other structures are advanced to the point of fitting the peptide chain to a high-resolution density map.
3

Liang, Alice F., Chris Petzold, Kristen Dancel-Manning, Yan Deng, and Michael Cammer. "Methodology Development at NYULMC Microscopy Core - Correlative Light and Electron Microscopy Applications." Microscopy and Microanalysis 21, S3 (August 2015): 879–80. http://dx.doi.org/10.1017/s143192761500519x.

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4

Leppard, GG, A. Heissenberger, and GJ Herndl. "Ultrastructure of marine snow. I. Transmission electron microscopy methodology." Marine Ecology Progress Series 135 (1996): 289–98. http://dx.doi.org/10.3354/meps135289.

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5

Danev, Radostin, Haruaki Yanagisawa, and Masahide Kikkawa. "Cryo-Electron Microscopy Methodology: Current Aspects and Future Directions." Trends in Biochemical Sciences 44, no. 10 (October 2019): 837–48. http://dx.doi.org/10.1016/j.tibs.2019.04.008.

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6

Sicignano, A., and M. Vaez Iravani. "Methodology and practice of in situ differential scanning electron microscopy." Scanning 12, no. 2 (1990): 61–68. http://dx.doi.org/10.1002/sca.4950120203.

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7

Asher, Lucas, and Jessica Hata. "Platelet Electron Microscopy: Utilizing LEAN Methodology to Optimize Laboratory Workflow." Pediatric and Developmental Pathology 23, no. 5 (May 19, 2020): 356–61. http://dx.doi.org/10.1177/1093526620915361.

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Background Platelet electron microscopy (PEM) is the gold standard methodology for diagnosing storage pool disorder, defined as a paucity of delta granules, alpha granules, or both. PEM literature is limited with few published resources and without well-developed interlaboratory standardization for the preparation and examination of platelet samples. Methods Whole mount (WM) dense body (DB) counts for 300 pediatric cases were reviewed to determine whether counting fewer platelets could yield the same results. For 6 cases, DB average was determined on the day of WM preparation and on 2 consecutive days. Both WM and thin section (TS) preparations were examined for all cases. Results Employing LEAN methodology, an algorithm was developed to markedly decrease the number of platelets counted and still ensure accurate results. WMs decay with time; a statistically significant difference in DB counts was noted between day 0 and day 1 ( p < .1). Twelve of 300 cases required both WM and TS preparations for a complete diagnosis. Conclusion It is possible to maintain accuracy and decrease 100 platelet DB counts by >75%. WMs must be counted on the day they are prepared to avoid false paucity of DB secondary to sample decay. An accurate evaluation of platelet morphology requires both the WM and TS techniques.
8

Kammers, A. D., and S. Daly. "Digital Image Correlation under Scanning Electron Microscopy: Methodology and Validation." Experimental Mechanics 53, no. 9 (July 11, 2013): 1743–61. http://dx.doi.org/10.1007/s11340-013-9782-x.

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9

Menteş, T. O., G. Zamborlini, A. Sala, and A. Locatelli. "Cathode lens spectromicroscopy: methodology and applications." Beilstein Journal of Nanotechnology 5 (October 27, 2014): 1873–86. http://dx.doi.org/10.3762/bjnano.5.198.

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The implementation of imaging techniques with low-energy electrons at synchrotron laboratories allowed for significant advancement in the field of spectromicroscopy. The spectroscopic photoemission and low energy electron microscope, SPELEEM, is a notable example. We summarize the multitechnique capabilities of the SPELEEM instrument, reporting on the instrumental aspects and the latest developments on the technical side. We briefly review applications, which are grouped into two main scientific fields. The first one covers different aspects of graphene physics. In particular, we highlight the recent work on graphene/Ir(100). Here, SPELEEM was employed to monitor the changes in the electronic structure that occur for different film morphologies and during the intercalation of Au. The Au monolayer, which creeps under graphene from the film edges, efficiently decouples the graphene from the substrate lowering the Dirac energy from 0.42 eV to 0.1 eV. The second field combines magnetism studies at the mesoscopic length scale with self-organized systems featuring ordered nanostructures. This example highlights the possibility to monitor growth processes in real time and combine chemical characterization with X-ray magnetic circular dichroism–photoemission electron microscopy (XMCD–PEEM) magnetic imaging by using the variable photon polarization and energy available at the synchrotron source.
10

Yang, Jinfeng, and Yoichi Yoshida. "Relativistic Ultrafast Electron Microscopy: Single-Shot Diffraction Imaging with Femtosecond Electron Pulses." Advances in Condensed Matter Physics 2019 (May 2, 2019): 1–6. http://dx.doi.org/10.1155/2019/9739241.

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We report on a single-shot diffraction imaging methodology using relativistic femtosecond electron pulses generated by a radio-frequency acceleration-based photoemission gun. The electron pulses exhibit excellent characteristics, including a root-mean-square (rms) illumination convergence of 31 ± 2 μrad, a spatial coherence length of 5.6 ± 0.4 nm, and a pulse duration of approximately 100 fs with (6.3 ± 0.6) × 106 electrons per pulse at 3.1 MeV energy. These pulses facilitate high-quality diffraction images of gold single crystals with a single shot. The rms spot width of the diffracted beams was obtained as 0.018 ± 0.001 Å−1, indicating excellent spatial resolution.

Дисертації з теми "Electron microscopy Methodology":

1

Distasi, Matthew R. "The 3D characterization of the annulate lamellae : the development of a new methodology incorporating 3D-anaglyph techniques and serial transmission electron microscopy." Virtual Press, 2003. http://liblink.bsu.edu/uhtbin/catkey/1266020.

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2

Zhou, Dan [Verfasser], Peter A. van [Akademischer Betreuer] Aken, and Christoph T. [Akademischer Betreuer] Koch. "Aberration-Corrected Analytical Transmission Electron Microscopy of Light Elements in Complex Oxides: Application and Methodology / Dan Zhou. Betreuer: Peter A. van Aken ; Christoph T. Koch." Darmstadt : Universitäts- und Landesbibliothek Darmstadt, 2016. http://d-nb.info/1112044884/34.

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3

Jespersson, Niklas, and Torbjörn Sandberg. "Evaluation of different non-metallic inclusions in steel chips by using electrolytic extraction : Evaluation of a methodology for electrolytic extraction and scanning electron microscopy - energy dispersive spectroscopy (SEM-EDS) analysis." Thesis, KTH, Materialvetenskap, 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-298419.

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Analysing non-metallic inclusions (NMI) by conventional microscopy is prone to errors.  Better imaging can be achieved by using electrolytic extraction (EE) to effectively dissolve the metal matrix, freeing the inclusions so that they can be collected on a filter.  This method of studying NMI was tested on a 157C steel chip, with EE taking place three times on the same surface with increasing levels of  charge  applied.  The  relationship  between  charge  and  extracted  layer depth was examined, so as to facilitate the targeting of NMI from specific depths.  A selection of the extracted inclusions were micrographed with scanning electron microscopy (SEM) and had their compositions measured with energy dispersive spectroscopy (EDS). Based on this data, two methods of classifying NMI were briefly  examined:  manual  classification,  mostly  based  on images,  and  a  semi-automated process based on a sorting algorithm applied to the compositions. The study implies that it is possible to dissolve a 157C steel to a desired depth by applying a charge proportional to it, but the current method introduces an error which might limit the resolution of depth by a significant amount.  Also in the current method, there was no systematic way to select NMI for micrography, and no solution to this problem was found.  The semi-automated classification algorithm  was  compromised  by  inaccurate  readings  of  compositions  from the EDS, and could not be thoroughly tested.
Konventionell  mikroskopi  kan  lätt  ge  felaktig  information  vid  analys  av icke- metalliska  inneslutningar  (NMI),  men  bättre  resultat  kan  uppnås  om  metall- matrisen  löses  upp  med  elektrolytisk  extraktion  (EE),  så  att inneslutningarna frigörs och kan samlas upp på ett filter.  Denna metod att studera NMI testades på ett spån av 157C-stål, med trefaldig EE på samma yta och successivt ökande maximal laddning.  Sambandet mellan laddning och upplöst lagerdjup undersöktes för att möjliggöra extraktion av NMI från givna djup.  Ett urval av de frigjorda inneslutningarna  fotograferades  i  ett  SEM  och  sammansättningarna fastslogs av  EDS.  Dessa  data  låg  till  grund  för  en  undersökning  av  två klassifikationsmetoder  för  NMI:  manuell  klassificering,  till  största  del bildbaserad,  och  en halvautomatisk klassificering där en algoritm sorterar efter sammansättningar. Denna studie antyder att ett 157C-stål kan lösas upp till önskat djup genom  att åläggas en laddning proportionell mot djupet, men den nuvarande metoden introducerar  ett  fel  som  kan  ha  betydande  påverkan  på  noggrannheten.   Den aktuella  metoden  saknar  ett  systematiskt  sätt  att  välja  NMI  för mikroskopfotografi, och ingen lösning har kunnat framföras på detta problem. Den halvautomatiska  klassifikationsalgoritmen  rubbades  av  störningar  i  EDS-resultaten och kunde inte undersökas till fullo.
4

Ihiawakrim, Dris. "Etude par les techniques avancées de microscopie électronique en transmission de matériaux fragiles." Thesis, Strasbourg, 2019. http://www.theses.fr/2019STRAE005/document.

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Le travail présenté dans ce manuscrit a montré l’importance du développement méthodologique et technique pour identifier et débloquer les verrous empêchant l’analyse de matériaux hybrides et complexes qui se dégradent sous irradiation par un faisceau d’électrons. Nous avons mis en évidence que des dégâts sur l’échantillon produits par les électrons n’apparaissent qu’au-dessus d'un certain seuil de densité de courant électronique qui dépend de la nature du matériau et de ses caractéristiques morphologiques et structurales. Ces développements couplés à la Cryo-EM, nous ont permis de mettre en évidence l’architecture des matériaux hybrides à base de carbone, la variation de la distance lamellaire dans une pérovskite en fonction de la molécule insérée et le positionnement du métal, d’identifier les interactions à l’interface entre deux cristaux moléculaires et la quantification 3D de la fonctionnalisation d’un MOF. Dans la dernière partie, nous avons mis en évidence les processus de nucléation et de croissance d’oxyde de fer par MET in-situ en phase liquide
The present manuscript shows the importance of methodological and technical development to identify and to unblock locks preventing the analysis of hybrid and complex materials that undergo degradation under electron beam irradiation. We have shown that beam-induced damage to the sample only appears above some specific threshold of current density. Such a threshold depends on the nature of the material and on its morphological and structural characteristics. These developments in synergy with the use of Cryo-EM, allowed us to expose the architecture of carbon-based hybrid materials, measure the variation of the lamellar distance in a perovskite according to the molecular spacer and to the positioning of the metal, identify the interactions at the interface between two molecular crystals, and the 3D quantification of the functionalization within a MOF. Lastly, we brought to light the processes of nucleation and growth of iron oxide by in-situ liquid phase TEM
5

Andrikopoulos, Pavlos. "Direct electric field visualization in semiconductor planar structures." Thesis, Monterey, Calif. : Naval Postgraduate School, 2006. http://bosun.nps.edu/uhtbin/hyperion.exe/06Dec%5FAndrikopoulos.pdf.

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Thesis (M.S. in Applied Physics and M.S. in Systems Engineering)--Naval Postgraduate School, December 2006.
Thesis Advisor(s): Nancy M. Haegel, David Jenn. "December 2006." Includes bibliographical references (p. 125). Also available in print.
6

Avery, Meredith Ryan. "Multivariate Analysis of Volcanic Particle Morphology: Methodology and Application of a Quantitative System of Fragmentation Mechanism Classification." Bowling Green State University / OhioLINK, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=bgsu1428939377.

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7

Zhou, Dan. "Aberration-Corrected Analytical Transmission Electron Microscopy of Light Elements in Complex Oxides: Application and Methodology." Phd thesis, 2016. https://tuprints.ulb.tu-darmstadt.de/5236/1/Dan%20PhD%20thesis%202016%20January%2013.pdf.

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The advent of aberration correctors for electron optical lenses at the end of 20th century has brought atomic resolution analysis of the materials into a new era. In this thesis, the new possibilities of application and methodology on aberration-corrected analytical transmission electron microscopy (TEM) of light elements in complex oxides are explored by experiments and image simulations, with the emphasis on annular bright-field (ABF) imaging. The arrangement and bonding of light elements, like lithium (Li) and oxygen (O), in complex oxides plays a crucial rule in the material’s properties, however the characterization of the materials remains challenging. In recent years ABF imaging has become a popular imaging technique owing to its ability to map both light and heavy elements. I start from the application of ABF on qualitatively determining O’s distribution in ZrO2-La2/3Sr1/3MnO3 (LSMO) pillar–matrix thin films, together with the application of high-angle annular dark-field (HAADF) and electron energy-loss spectroscopy (EELS) to obtain a fuller picture of the investigated complex oxide. After that, the methodology study of ABF imaging, concerning the quantitative determination of atom column position and concentration, is presented. The accuracy of atom column position determination is of great importance for investigating atomic structure defects like elastic and plastic strains. Atomic-scale control of the synthesis of complex oxide materials envisages the atomic-scale properties and requires the knowledge of atomic-scale characterization. The ZrO2-LSMO pillar–matrix thin films were found to show anomalous magnetic and electron transport properties controlled by the amount of ZrO2. With the application of an aberration–corrected analytical transmission electron microscope (TEM), structure and interfacial chemistry of the system, especially of the pillar–matrix interface were revealed at atomic resolution. In addition, three types of Mn segregated antiphase boundaries (APBs) connecting ZrO2 pillars were investigated by HAADF and ABF imaging. The local atomic structure, chemical composition, cation valence and electric field were determined at atomic-scale. These results provide detailed information for future studies of macroscopic properties of these materials. Moreover, a consequence of aberration correctors is the high electron dose rate in the scanning mode. This can lead to radiation-induced modifications of materials. I studied the electron beam induced reconstruction of three types of APBs. With the utilization of HAADF scanning transmission electron microscopy (STEM), ABF STEM and EELS, the motion of both heavy and light element columns under moderate electron beam irradiation are revealed at atomic resolution. Besides, Mn segregated in the APBs was found to have reduced valence states, which can be directly correlated with oxygen loss. Charge states of the APBs are finally discussed based on these experimental results. This study provides support for the design of radiation engineering solid-oxide fuel cell materials. The determination of atom positions from atomically resolved transmission electron micrographs is fundamental for the analysis of crystal defects and strain. Contrast formation in ABF is partially governed by the phase of the electron wave, which renders the technique more sensitive to the tilt of the electron beam with respect to the crystal zone axis than in high-angle annular dark-field (HAADF) imaging. I show this sensitivity experimentally and use image simulations to quantify this effect. This is essential for future quantitative ABF studies including error estimation. Another aspect of quantification is the number of atoms in an atom column. The attempt to quantify Li concentration by ABF imaging has been done by simulations. The influences of convergence semi-angle, collection semi-angle, and defocus are explored, while direct correlation with experimental results need more theoretical investigations in this area. Semi-quantification of the Li amount was studied by EELS in case of the particle-size dependent delithiation process of LiFePO4. From the core-loss region and low-loss region analysis it is found that the sample with particle size of 25 nm delithiates homogeneously over the whole particle, whereas the 70 nm and 150 nm particles form an FePO4 core and a LiFePO4 shell. The practical considerations, like radiation damage, delocalization, interface effects and so on are also discussed.
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"Study of Chinese antique objects by surface science techniques =: 中國古物之表面科學技術硏究". 1999. http://library.cuhk.edu.hk/record=b5890150.

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Анотація:
by Yeung Sau Lai Catherine.
Thesis (M.Phil.)--Chinese University of Hong Kong, 1999.
Includes bibliographical references.
Text in English; abstracts in English and Chinese.
by Yeung Sau Lai Catherine.
Acknowledgments --- p.i
Abstract --- p.ii
Table of Contents --- p.iv
List of Figures --- p.vii
List of Tables --- p.ix
Chapter Chapter1 --- Introduction to the Study of Chinese antique objects using surface science techniques
Chapter 1.1 --- Surface Science --- p.1
Chapter 1.2 --- Surface Science Techniques --- p.1
Chapter 1.3 --- Study of Antiques Objects --- p.2
Chapter 1.4 --- Chinese Antique --- p.4
Chapter 1.5 --- Aims of the current study --- p.4
Chapter 1.6 --- Reference --- p.7
Chapter Chapter 2 --- Silicon on Chinese Bronze Seals
Chapter 2.1 --- Introduction --- p.8
Chapter 2.2 --- Basic Principles of the analytical techniques --- p.9
Chapter 2.2.1 --- Scanning electron microscopy (SEM) --- p.9
Chapter 2.2.2 --- Energy dispersive x-ray analysis (EDX) --- p.9
Chapter 2.2.3 --- X-ray Photoelectron spectroscopy (XPS) --- p.13
Chapter 2.3 --- Sample --- p.16
Chapter 2.4 --- Experimental --- p.18
Chapter 2.4.1 --- Instrument --- p.18
Chapter 2.4.2 --- Sampling --- p.18
Chapter 2.5 --- Results and Discussion --- p.20
Chapter 2.5.1 --- Chemical Composition --- p.20
Chapter 2.5.2 --- Silicon content --- p.21
Chapter 2.5.3 --- Sources of silicon --- p.21
Chapter 2.5.4 --- Implication of high silicon content --- p.25
Chapter 2.6 --- Conclusion --- p.28
Chapter 2.7 --- Related studies --- p.28
Chapter 2.8 --- Reference --- p.29
Chapter Chapter 3 --- Surface analysis of Chinese Jade using Fourier Transform Infrared Spectroscopy with fixed angle reflectance technique
Chapter 3.1 --- Introduction --- p.30
Chapter 3.2 --- principles of FTIR and specular reflectance technique --- p.31
Chapter 3.2.1 --- General principles --- p.31
Chapter 3.2.2 --- IR spectrometer --- p.31
Chapter 3.2.3 --- Specular (External) Reflectance Technique --- p.33
Chapter 3.2.4 --- Kramers-Kronig Transformation --- p.33
Chapter 3.3 --- Sample (Chinese Jade from the Liang-zhu Culture) --- p.36
Chapter 3.3.1 --- Background on use of Jade in China --- p.36
Chapter 3.3.2 --- Nomenclature --- p.39
Chapter 3.3.3 --- Mineralogy of Jade --- p.39
Chapter 3.3.4 --- Liang-zhu Culture --- p.40
Chapter 3.4 --- Experimental --- p.40
Chapter 3.4.1 --- Instrument --- p.40
Chapter 3.4.2 --- Sampling --- p.44
Chapter 3.4.3 --- Data Treatment --- p.44
Chapter 3.5 --- Results and Discussion --- p.44
Chapter 3.5.1 --- Characteristic of Specular reflectance spectrum of Nephrite --- p.44
Chapter 3.5.2 --- Reflectance spectrum of Liangzhu samples --- p.57
Chapter 3.5.2.1 --- Comparison within sample --- p.57
Chapter 3.5.2.2 --- Comparison among sample --- p.57
Chapter 3.5.3 --- "Reflectance spectrum of heirloom pieces from the Art Museum, CUHK" --- p.58
Chapter 3.5.4 --- Absorption peaks at 3000-2800cm-1 --- p.58
Chapter 3.6 --- Conclusion --- p.58
Chapter 3.7 --- Related studies --- p.61
Chapter 3.8 --- Reference --- p.61
Chapter Chapter 4 --- SIMS and TIMS Analysis on Lead Isotopes Ratio in Ancient Chinese Metallic Artifacts
Chapter 4.1 --- Introduction --- p.63
Chapter 4.2 --- Background --- p.64
Chapter 4.2.1 --- Lead isotope --- p.64
Chapter 4.2.2 --- Aims of this study --- p.66
Chapter 4.3 --- Basic principle of TIMS and SIMS --- p.67
Chapter 4.4 --- Experimental --- p.68
Chapter 4.4.1 --- Sample --- p.68
Chapter 4.4.2 --- Instrument --- p.68
Chapter 4.4.2.1 --- Thermal Ionisation mass spectrometry --- p.68
Chapter 4.4.2.2 --- Secondary ion mass spectroscopy --- p.70
Chapter 4.5 --- Results and Discussion --- p.72
Chapter 4.5.1 --- Data Interpretation --- p.72
Chapter 4.5.2 --- Standard deviation of SIMS data --- p.74
Chapter 4.5.3 --- Possible use of SIMS data --- p.74
Chapter 4.6 --- Conclusion --- p.76
Chapter 4.7 --- References --- p.76
Chapter Chapter 5 --- Analysis by Particle Induced X-ray emission technique
Chapter 5.1 --- Introduction --- p.79
Chapter 5.2 --- Basic principle --- p.80
Chapter 5.2.1 --- General principle --- p.80
Chapter 5.2.2 --- Fundamental Set up --- p.80
Chapter 5.2.3 --- Data analysis --- p.82
Chapter 5.3 --- Experimental --- p.82
Chapter 5.3.1 --- PIXE --- p.82
Chapter 5.3.2 --- Sample --- p.82
Chapter 5.4 --- Result --- p.85
Chapter 5.5 --- Further studies --- p.85
Chapter 5.6 --- Reference --- p.85
Chapter Chapter 6 --- Conclusion
Chapter 6.1 --- Conclusion --- p.88
Chapter 6.2 --- Further studies --- p.89

Книги з теми "Electron microscopy Methodology":

1

Schatten, Heide. Scanning electron microscopy for the life sciences. Cambridge: Cambridge University Press, 2012.

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2

Ayache, Jeanne. Sample preparation handbook for transmission electron microscopy: Methodology. New York: Springer, 2010.

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3

Hayat, M. A. Negative staining. New York: McGraw-Hill Pub. Co., 1990.

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4

Ayache, Jeanne, Luc Beaunier, Jacqueline Boumendil, Gabrielle Ehret, and Danièle Laub. Sample Preparation Handbook for Transmission Electron Microscopy: Methodology. Springer, 2014.

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5

Ayache, Jeanne, Luc Beaunier, and Jacqueline Boumendil. Sample Preparation Handbook for Transmission Electron Microscopy: Methodology. Springer, 2011.

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6

(Editor), Prajna Das Gupta, and Hiroshi Yamamoto (Editor), eds. Electron Microscopy in Medicine and Biology. Science Publishers, 2000.

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7

J, Sommerville, and Scheer U, eds. Electron microscopy in molecular biology: A practical approach. Oxford, England: IRL Press, 1987.

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8

(Editor), J. Sommerville, and U. Scheer (Editor), eds. Electron Microscopy in Molecular Biology: A Practical Approach. Oxford University Press, USA, 1986.

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9

Handbook of cryo-preparation methods for electron microscopy. Boca Raton: CRC Press, 2008.

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10

(Editor), Annie Cavalier, Daniele Spehner (Editor), and Bruno M. Humbel (Editor), eds. Handbook of Cryopreparation Methods for Electron Microscopy (Methods in Visualization). CRC, 2008.

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Частини книг з теми "Electron microscopy Methodology":

1

Ayache, Jeanne, Luc Beaunier, Jacqueline Boumendil, Gabrielle Ehret, and Danièle Laub. "Methodology: General Introduction." In Sample Preparation Handbook for Transmission Electron Microscopy, 1–2. New York, NY: Springer New York, 2010. http://dx.doi.org/10.1007/978-0-387-98182-6_1.

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2

Zemlin, F. "Cryoelectron Microscopy of Protein Crystals. Some Remarks on the Methodology." In Electron Crystallography of Organic Molecules, 305–8. Dordrecht: Springer Netherlands, 1991. http://dx.doi.org/10.1007/978-94-011-3278-7_25.

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3

Afsari, Bijan, and Gregory S. Chirikjian. "A Methodology for Deblurring and Recovering Conformational States of Biomolecular Complexes from Single Particle Electron Microscopy." In Lecture Notes in Computer Science, 643–53. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-25040-3_69.

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4

Morel, Gérard, Annie Cavalier, and Lynda Williams. "Principles of Methodology." In in situ Hybridization in Electron Microscopy, 47–64. CRC Press, 2001. http://dx.doi.org/10.1201/9781420042504-2.

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5

YONG, S. C. "PREPARATION, PROCESSING, SECTIONING AND STAINING FOR ELECTRON MICROSCOPY." In Research Methodology in Orthopaedics and Reconstructive Surgery, 161–70. WORLD SCIENTIFIC, 2002. http://dx.doi.org/10.1142/9789812778338_0009.

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6

Mortimer, Catherine, and Martin Stoney. "A Methodology for Punchmark Analysis Using Electron Microscopy." In Archaeological Sciences 1995, 119–22. Oxbow Books, 2017. http://dx.doi.org/10.2307/j.ctvh1dtz1.23.

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7

N. Hattori, Azusa, and Ken Hattori. "Creation and Evaluation of Atomically Ordered Side- and Facet-Surface Structures of Three-Dimensional Silicon Nano-Architectures." In 21st Century Surface Science - a Handbook. IntechOpen, 2020. http://dx.doi.org/10.5772/intechopen.92860.

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The realization of three-dimensional (3D)-architected nanostructures, that is, the transformation from novel two-dimensional (2D) film-based devices to 3D complex nanodevices, is of crucial importance with the progress of scaling down devices to nanometer order. However, little attention has been devoted to controlling the atomic ordering and structures of side-surfaces on 3D structures, while techniques for controlling and investigating 2D surfaces, namely, surface science, have been established only for planar 2D surfaces. We have established an original methodology that enables atomic orderings and arrangements of surfaces with arbitrary directions to be observed on 3D figured structures by developing diffraction and microscopy techniques. An original technique, namely, directly and quantitatively viewing the side- and facet-surfaces at the atomic scale by reflection high-energy electron diffraction (RHEED) and low-energy electron diffraction (LEED), can be used to determine process parameters in etching. This chapter introduces methods of evaluation by RHEED and LEED based on a reciprocal space map and methods of creating various atomically flat 111 and {100} side-surfaces of 3D Si nano-architectures and tilted 111 facet-surfaces fabricated by lithography dry and wet etching processes, followed by annealing treatment in vacuum.
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Allen, Jessica L., Cari L. Johnson, Matthew J. Heumann, Jared Gooley, and William Gallin. "New technology and methodology for assessing sandstone composition: A preliminary case study using a quantitative electron microscope scanner (QEMScan)." In Mineralogical and Geochemical Approaches to Provenance. Geological Society of America, 2012. http://dx.doi.org/10.1130/2012.2487(11).

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Тези доповідей конференцій з теми "Electron microscopy Methodology":

1

Toh, Suey Li, and Rong Ji. "Maximizing the Electron Microscopy Contrasts for Analysis." In ISTFA 2017. ASM International, 2017. http://dx.doi.org/10.31399/asm.cp.istfa2017p0345.

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Abstract To characterize materials or devices in the next generation cutting-edge technologies, it is becoming more essential to carry out comprehensive characterization of the samples with a system that can provide a wealth of various contrast information. By analyzing the different signals detected at different angular scattering distribution, it can reveal tremendous information from the samples. Coupled with the superior detection capability, we have demonstrated the capability to enhance the fault isolation methodology of memory devices or media grain size analysis by optimizing various parameter settings. The effects of conditions (accelerating voltage, working distance, detector, probe current etc.) that can influence the trajectory pathways or yield of the different emitted signals would be discussed in the paper
2

Kang, H. C., J. T. Lim, J. S. Choi, T. Y. Lee, B. H. Lee, S. B. Chin, and D. H. Cho. "Methodology and mechanism study on high aspect ratio (HAR) contact bottom image in scanning electron microscopy." In Microlithography 2005, edited by Richard M. Silver. SPIE, 2005. http://dx.doi.org/10.1117/12.596832.

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3

Courbon, Franck, Sergei Skorobogatov, and Christopher Woods. "Direct Charge Measurement in Floating Gate Transistors of Flash EEPROM Using Scanning Electron Microscopy." In ISTFA 2016. ASM International, 2016. http://dx.doi.org/10.31399/asm.cp.istfa2016p0327.

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Abstract We present a characterization methodology for fast direct measurement of the charge accumulated on Floating Gate (FG) transistors of Flash EEPROM cells. Using a Scanning Electron Microscope (SEM) in Passive Voltage Contrast (PVC) mode we were able to distinguish between '0' and '1' bit values stored in each memory cell. Moreover, it was possible to characterize the remaining charge on the FG; thus making this technique valuable for Failure Analysis applications for data retention measurements in Flash EEPROM. The technique is at least two orders of magnitude faster than state-of-the-art Scanning Probe Microscopy (SPM) methods. Only a relatively simple backside sample preparation is necessary for accessing the FG of memory transistors. The technique presented was successfully implemented on a 0.35 μm technology node microcontroller and a 0.21 μm smart card integrated circuit. We also show the ease of such technique to cover all cells of a memory (using intrinsic features of SEM) and to automate memory cells characterization using standard image processing technique.
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Lai, Li-Lung, HungLing Chen, and Huimin Gao. "Methodology and Application of Backside Physical Failure Analysis." In ISTFA 2011. ASM International, 2011. http://dx.doi.org/10.31399/asm.cp.istfa2011p0428.

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Abstract There are some advantages to performing physical failure analysis from the backside as opposed to normal frontside analysis. However, there are challenges to be overcome with regard to sample preparation and scanning electron microscopy. Thus, we introduce this unusual technique to overcome the barrier of difficulty. This technique can eventually lead to the development of a versatile methodology that can be used in actual applications for failure analysis.
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Yu, Huisheng, Shuqing Duan, Ming Li, Qihua Zhang, and Wei-Ting Kary Chien. "Productive Polishing TEM Sample Preparation Methodology Development." In ISTFA 2014. ASM International, 2014. http://dx.doi.org/10.31399/asm.cp.istfa2014p0420.

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Abstract In this paper, three productive polishing transmission electron microscopy (TEM) sample preparation methods are reported. The methods are studied to improve the efficiency and expand the application fields. Method 1 and 2 address expanding conventional polishing method application on same or similar pattern samples. Method 1 used a laser mark to identify one of the sample; and method 2 used a Pt coated glass inserted between samples or a direct deposition of Pt on one of the samples. Method 3 was developed facilitate stacking three or more samples into a single, batch process block and improved the efficiency greatly.
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Lee, Tan-Chen, Jui-Yen Huang, Li-Chien Chen, Ruey-Lian Hwang, and David Su. "Methodology for TEM Analysis of Barrier Profiles." In ISTFA 2002. ASM International, 2002. http://dx.doi.org/10.31399/asm.cp.istfa2002p0689.

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Abstract Device shrinkage has resulted in thinner barriers and smaller vias. Transmission Electron Microscopy (TEM) has become a common technique for barrier profile analysis because of its high image resolution. TEM sample preparation and image interpretation becomes difficult when the size of the small cylindrical via is close to the TEM sample thickness. Effects of different sample thickness and specimen preparation methods, therefore, have been investigated. An automatic FIB program has been shown to be useful in via sample preparation. Techniques for imaging a TEM specimen will be discussed in the paper. Conventional TEM bright field (BF) image is adequate to examine the barrieronly via; however, other techniques are more suitable for a Cu filled via.
7

Younan, Hua, Shen Yue, Chen Yixin, Fu Chao, and Li Xiaomin. "Studies on a Qualification Method (OSSD) for Microchip Al Bondpads." In ISTFA 2015. ASM International, 2015. http://dx.doi.org/10.31399/asm.cp.istfa2015p0295.

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Abstract In authors’ previous paper, an OSAT [Optical, SEM (Scanning Electron Microscopy), Auger (Auger Electron Spectroscopy) and TEM (Transmission Electron Microscopy)] methodology was developed for qualification of microchip aluminum (Al) bondpads. Using the OSAT methodology, one can qualify microchip Al bondpads. In this paper, we will further study the NSOP (Non-Stick On Pad) problem on microchip Al bondpads. A new qualification methodology, OSSD [(Optical, SEM, and Surface and Depth profiling X-ray Photoelectron Spectroscopy (XPS)] will be proposed, in which XPS surface analysis is used to check the contamination level of fluorine and carbon on bondpad surfaces instead of Auger analysis. XPS depth profiling analysis will also be used to measure Al oxide thickness instead of TEM analysis. By using OSSD, Al bondpads can be qualified with both reduced costs and shortened turnaround times versus OSAT.
8

Shen, Cha-Ming, Tsan-Chen Chuang, Shi-Chen Lin, Lian-Fon Wen, and Chen-May Huang. "Combining the Nano-Probing Technique with Mathematics to Model and Identify Non-Visual Failures." In ISTFA 2007. ASM International, 2007. http://dx.doi.org/10.31399/asm.cp.istfa2007p0214.

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Abstract In this paper, we focus on how to identify non-visual failures by way of electrical analysis because some special failures cannot be observed by SEM (scanning electron microscopy) or TEM (transmission electron microscopy) even when they are precisely located by other analytical instrumentation or are symptomatic of an authentic or single suspect. The methodology described here was developed to expand the capabilities of nano-probing via C-AFM (conductive atomic forced microscopy), which can acquire detailed electrical data, and combining the technique with reasoned simulation using various mathematic models emulating all of the significant failure characteristics. Finally, a case study is presented to verify that such defect modes can be identified even when general PFA (physical failure analysis) cannot be implemented for investigating non-visual failure mechanisms.
9

Liu, Chin Kai, Chi Jen. Chen, Jeh Yan.Chiou, and David Su. "A Methodology to Reduce Ion Beam Induced Damage in TEM Specimens Prepared by FIB." In ISTFA 2002. ASM International, 2002. http://dx.doi.org/10.31399/asm.cp.istfa2002p0313.

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Abstract Focused ion beam (FIB) has become a useful tool in the Integrated Circuit (IC) industry, It is playing an important role in Failure Analysis (FA), circuit repair and Transmission Electron Microscopy (TEM) specimen preparation. In particular, preparation of TEM samples using FIB has become popular within the last ten years [1]; the progress in this field is well documented. Given the usefulness of FIB, “Artifact” however is a very sensitive issue in TEM inspections. The ability to identify those artifacts in TEM analysis is an important as to understanding the significance of pictures In this paper, we will describe how to measure the damages introduced by FIB sample preparation and introduce a better way to prevent such kind of artifacts.
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Cowan, J., and T. Taylor. "SEM Equipment Capabilities Evaluated for Sub-Half Micron Semiconductor Applications." In ISTFA 1997. ASM International, 1997. http://dx.doi.org/10.31399/asm.cp.istfa1997p0329.

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Abstract Evaluation of Scanning Electron Microscopes (SEMs) was initiated for the purpose of purchasing a SEM that would improve the productivity of scanning electron microscopy during the cycle of analysis and deprocessing of semiconductor devices in a failure analysis lab. In addition to the need for high image resolution at low electron acceleration voltages, an accurate motorized stage is a major evaluation factor. It is necessary for the analyst to drive directly to a known location such as a memory cell with a high assurance that the site of interest was found. There are two main areas of focus in this paper. First, our SEM evaluation methodology will be presented along with the results of our evaluation. Second, the technology associated with motorized stages will be discussed in light of our requirements for a motorized, highly accurate stage. As a byproduct of this evaluation, this paper is presented so as to push the SEM industry to offer a SEM with an accurate stage for subhalfmicron products at reasonable cost.

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