Статті в журналах з теми "Tin-oxygen"
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Okamoto, H. "O-Sn (Oxygen-Tin)." Journal of Phase Equilibria & Diffusion 27, no. 2 (April 1, 2006): 202. http://dx.doi.org/10.1361/154770306x97740.
Повний текст джерелаOkamoto, H. "O−Sn (Oxygen-Tin)." Journal of Phase Equilibria and Diffusion 27, no. 2 (March 2006): 202. http://dx.doi.org/10.1007/s11669-006-0063-6.
Повний текст джерелаWang, Sheng, and Teruo Hori. "Oxygen evolution sensitized by tin porphyrin in microheterogeneous system and membrane systems." Journal of Porphyrins and Phthalocyanines 07, no. 01 (January 2003): 37–41. http://dx.doi.org/10.1142/s1088424603000069.
Повний текст джерелаRaghavan, V. "Fe-O-Sn (Iron-Oxygen-Tin)." Journal of Phase Equilibria and Diffusion 31, no. 4 (April 21, 2010): 372. http://dx.doi.org/10.1007/s11669-010-9715-7.
Повний текст джерелаIvanov A. F., Egorov F. S., Platonov N. D., Matukhin V. L., and Terukov E. I. "Influence of the oxygen during the deposition of an indium tin oxide thin film by magnetron sputtering for heterojunction solar cells." Semiconductors 56, no. 3 (2022): 225. http://dx.doi.org/10.21883/sc.2022.03.53063.9747.
Повний текст джерелаWu, Xiao Wen, Jian Xin Zhang, Yang Wang, and Amin Huang. "Structure and Properties of Ti/TiN/Sb-SnO2 Electrodes with Plasma Sprayed TiN Interlayer." Advanced Materials Research 602-604 (December 2012): 1613–16. http://dx.doi.org/10.4028/www.scientific.net/amr.602-604.1613.
Повний текст джерелаLaimböck, Paul. "In-Line Oxygen Sensors for the Glass Melt and the Float Bath." Advanced Materials Research 39-40 (April 2008): 443–46. http://dx.doi.org/10.4028/www.scientific.net/amr.39-40.443.
Повний текст джерелаReuter, Hans, and Hilko Wilberts. "On the structural diversity anions coordinate to the butterfly-shaped [(R2Sn)3O(OH)2]2+ cations and vice versa." Canadian Journal of Chemistry 92, no. 6 (June 2014): 496–507. http://dx.doi.org/10.1139/cjc-2013-0517.
Повний текст джерелаMoatti, A., R. Bayati, S. Singamaneni, and J. Narayan. "Epitaxial integration of TiO2 with Si(100) through a novel approach of oxidation of TiN/Si(100) epitaxial heterostructure." MRS Advances 1, no. 37 (2016): 2629–34. http://dx.doi.org/10.1557/adv.2016.463.
Повний текст джерелаBeensh-Marchwicka, Grazyna, and Lubomila Krol-Stepniewska. "Reproducibility of Properties of SnOxThin Films Prepared by Reactive Sputtering." ElectroComponent Science and Technology 11, no. 4 (1985): 271–80. http://dx.doi.org/10.1155/apec.11.271.
Повний текст джерелаChoi, Jaewon, Wonjin Jeon, Dongjin Kang, Doowon Kang, and Jungyol Jo. "Hydrogen-Assisted Sputtering Growth of TiN on Ceramic Substrates." Coatings 9, no. 4 (April 17, 2019): 255. http://dx.doi.org/10.3390/coatings9040255.
Повний текст джерелаLyutov, Dimitar, Plamen V. Petkov, Nasko Gorunski, Boyan Todorov, and Hristo Iliev. "Investigation of selected materials stability for future application in development of small fast modular reactors (SFMR)." MATEC Web of Conferences 387 (2023): 05002. http://dx.doi.org/10.1051/matecconf/202338705002.
Повний текст джерелаHuang, Amin, Jian Xin Zhang, Xiao Wen Wu, and Yang Wang. "Structure and Performance of Ti/TiN/PbO2 Electrodes with Plasma-Sprayed TiN Interlayer." Applied Mechanics and Materials 325-326 (June 2013): 40–42. http://dx.doi.org/10.4028/www.scientific.net/amm.325-326.40.
Повний текст джерелаAgbede, Oluseye O., G. H. Kelsall, and K. Hellgardt. "A novel molten tin reformer: Kinetics of oxygen dissolution in molten tin." Chemical Engineering Science 231 (February 2021): 116273. http://dx.doi.org/10.1016/j.ces.2020.116273.
Повний текст джерелаKarami, Hassan, and Somayyeh Babaei. "Application of Tin Sulfide-Tin Dioxide Nanocomposite as Oxygen Gas-Sensing Agent." International Journal of Electrochemical Science 8, no. 11 (November 2013): 12078–87. http://dx.doi.org/10.1016/s1452-3981(23)13245-7.
Повний текст джерелаWen, Shijie, G. Campet, and J. Portier. "Influence of Thermal Treatment Under Various Oxygen Pressures on The Electronic Properties of Ceramics and Single Crystals of Pure and Tin-Doped Indium Oxide." Active and Passive Electronic Components 14, no. 4 (1992): 191–98. http://dx.doi.org/10.1155/1992/56168.
Повний текст джерелаZhu, Dongsheng, Wanli Kang, Dewen Dong, Qun Liu, and Lin Xu. "A Novel Macrocyclic Dimeric Dicarboxylato Distannoxane Assembled from a Flexible Dicarboxylic Acid." Journal of Chemical Research 2007, no. 10 (October 2007): 577–79. http://dx.doi.org/10.3184/030823407x255524.
Повний текст джерелаItoh, Satoshi, Hiroki Osamura, and Kimihiko Komada. "Thermodynamics of Indium-Tin-Oxygen Ternary System." MATERIALS TRANSACTIONS 52, no. 6 (2011): 1192–99. http://dx.doi.org/10.2320/matertrans.m-m2011806.
Повний текст джерелаKhirunenko, Lyudmila I., Yu V. Pomozov, and Mikhail G. Sosnin. "Oxygen Precipitation in Silicon Doped with Tin." Solid State Phenomena 82-84 (November 2001): 111–14. http://dx.doi.org/10.4028/www.scientific.net/ssp.82-84.111.
Повний текст джерелаKamp, B., R. Merkle, and J. Maier. "Chemical diffusion of oxygen in tin dioxide." Sensors and Actuators B: Chemical 77, no. 1-2 (June 2001): 534–42. http://dx.doi.org/10.1016/s0925-4005(01)00694-3.
Повний текст джерелаHARRISON, P. G. "ChemInform Abstract: Transformations Involving Tin-Oxygen Bonds." ChemInform 23, no. 42 (August 21, 2010): no. http://dx.doi.org/10.1002/chin.199242256.
Повний текст джерелаUngureanu, Ana-Maria, Ovidiu Oprea, Bogdan Vasile, Corina Andronescu, Georgeta Voicu, and Ioana Jitaru. "Temperature effect over structure and photochemical properties of nanostructured SnO2 powders." Open Chemistry 12, no. 9 (September 1, 2014): 909–17. http://dx.doi.org/10.2478/s11532-013-0400-7.
Повний текст джерелаHan, Dongsuk, Jaehyung Park, Minsoo Kang, Hyeongtag Jeon, and Jongwan Park. "Improvement in the Positive Bias Temperature Stability of SnOx-Based Thin Film Transistors by Hf and Zn Doping." Journal of Nanoscience and Nanotechnology 15, no. 10 (October 1, 2015): 7606–10. http://dx.doi.org/10.1166/jnn.2015.11155.
Повний текст джерелаAbdul Basyir, Abdul Basyir, Robby Kurnia Robby Kurnia, Cherly Firdharini Cherly Firdharini, Didik Aryanto Didik Aryanto, Wahyu Bambang Widayatno Wahyu Bambang Widayatno, and Agus Sukarto Wismogroho Agus Sukarto Wismogroho. "Investigation of Effect of Various Hot Gas Atomisation and Melting Pot Temperatures on Tin Alloy Powder Product." Sains Malaysiana 51, no. 9 (September 30, 2022): 3027–41. http://dx.doi.org/10.17576/jsm-2022-5109-23.
Повний текст джерелаЧувенкова, Ольга Александровна, Николай Игоревич Бойков, Станислав Викторович Рябцев, Елена Владимировна Паринова, Ратибор Григорьевич Чумаков, Алексей Михайлович Лебедев, Дмитрий Смирнов, et al. "Electronic structure and composition of tin oxide thin epitaxial and magnetron layers according to synchrotron XANES studies." Конденсированные среды и межфазные границы 26, no. 1 (February 28, 2024): 153–60. http://dx.doi.org/10.17308/kcmf.2024.26/11897.
Повний текст джерелаGeoffroy, C., G. Campet, F. Menil, J. Portier, J. Salardenne, and G. Couturier. "Optical and Electrical Properties of SnO2:F Thin Films Obtained by R.F. Sputtering With Various Targets." Active and Passive Electronic Components 14, no. 3 (1991): 111–18. http://dx.doi.org/10.1155/1991/85965.
Повний текст джерелаBecker, Martin, Angelika Polity, Davar Feili, and Bruno K. Meyer. "Deposition of tin oxides by Ion-Beam-Sputtering." MRS Proceedings 1494 (2012): 153–58. http://dx.doi.org/10.1557/opl.2012.1650.
Повний текст джерелаWang, Qi, Zhi Jian Peng, Yang Wang, and Xiu Li Fu. "Deposition and Electrical Resistivity of Oxygen-Deficient Tin Oxide Films Prepared by RF Magnetron Sputtering at Different Powers." Solid State Phenomena 281 (August 2018): 504–9. http://dx.doi.org/10.4028/www.scientific.net/ssp.281.504.
Повний текст джерелаLin, Yichao, Minghui Guo, Jin Liu, Laijin Tian, and Xicheng Liu. "Synthesis and structural characterization of the complexes of 2-(menthoxycarbonyl)ethyltin chloride." Main Group Metal Chemistry 42, no. 1 (May 25, 2019): 37–45. http://dx.doi.org/10.1515/mgmc-2019-0003.
Повний текст джерелаMukhamedshina, D. M., A. I. Fedosimova, E. A. Dmitriyeva, I. A. Lebedev, E. A. Grushevskaya, S. A. Ibraimova, K. A. Mit’, and A. S. Serikkanov. "Influence of Plasma Treatment on Physical Properties of Thin SnO2 Films Obtained from SnCl4 Solutions with Additions of NH4F and NH4OH." Eurasian Chemico-Technological Journal, no. 1 (February 20, 2019): 57. http://dx.doi.org/10.18321/ectj791.
Повний текст джерелаIngold, K. U., and Gino A. DiLabio. "Is the oxygen “side-on”, or “end-on” and fluctional, in peroxyl radicals with magnetically equivalent oxygen atoms?" Canadian Journal of Chemistry 88, no. 11 (November 2010): 1053–56. http://dx.doi.org/10.1139/v10-071.
Повний текст джерелаWan, C. F., R. D. McGrath, W. F. Keenan, and S. N. Frank. "LPCVD of Tin Oxide from Tetramethyltin and Oxygen." Journal of The Electrochemical Society 136, no. 5 (May 1, 1989): 1459–63. http://dx.doi.org/10.1149/1.2096941.
Повний текст джерелаTompkins, Harland G., and James A. Sellers. "Oxidation of TiN in an oxygen plasma asher." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12, no. 4 (July 1994): 2446–50. http://dx.doi.org/10.1116/1.579191.
Повний текст джерелаSeidel, F., H. R. Stock, and P. Mayr. "Carbon, nitrogen and oxygen implantation into TiN coatings." Surface and Coatings Technology 108-109 (October 1998): 271–75. http://dx.doi.org/10.1016/s0257-8972(98)00562-3.
Повний текст джерелаRaghavan, V. "Fe-O-Sn-Zn (Iron-Oxygen-Tin-Zinc)." Journal of Phase Equilibria and Diffusion 31, no. 4 (April 21, 2010): 387–88. http://dx.doi.org/10.1007/s11669-010-9722-8.
Повний текст джерелаRaghavan, V. "ChemInform Abstract: Fe-O-Sn (Iron-Oxygen-Tin)." ChemInform 42, no. 6 (January 13, 2011): no. http://dx.doi.org/10.1002/chin.201106217.
Повний текст джерелаAmato-Wierda, Carmela, and Derk A. Wierda. "Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant." Journal of Materials Research 15, no. 11 (November 2000): 2414–24. http://dx.doi.org/10.1557/jmr.2000.0347.
Повний текст джерелаMortazavi, S. Mohammad Reza, Fereshteh Rashchi, and Rasoul Khayyam Nekouei. "Characterization of Nano-Structured Tin Oxide Film Prepared by Anodic Oxidation Process." Advanced Materials Research 829 (November 2013): 366–70. http://dx.doi.org/10.4028/www.scientific.net/amr.829.366.
Повний текст джерелаPaskaleva, Albena, Boris Hudec, Peter Jancovic, Karol Fröhlich, and Dencho Spassov. "The influence of technology and switching parameters on resistive switching behavior of Pt/HfO2/TiN MIM structures." Facta universitatis - series: Electronics and Energetics 27, no. 4 (2014): 621–30. http://dx.doi.org/10.2298/fuee1404621p.
Повний текст джерелаCzerwiński, Andrzej, Agata Skwarek, Mariusz Płuska, Jacek Ratajczak, and Krzysztof Witek. "Tin Pest and Tin Oxidation on Tin-Rich Lead-Free Alloys Investigated by Electron Microscopy Methods." Solid State Phenomena 186 (March 2012): 275–78. http://dx.doi.org/10.4028/www.scientific.net/ssp.186.275.
Повний текст джерелаKong, Xianqi, and T. Bruce Grindley. "Control of regioselectivity in reactions of dialkylstannylene acetals. Part I. A dramatic reversal of regioselectivity in mono-p-toluenesulfonation reactions." Canadian Journal of Chemistry 72, no. 12 (December 1, 1994): 2396–404. http://dx.doi.org/10.1139/v94-306.
Повний текст джерелаPanjan, Peter, Aljaž Drnovšek, Pal Terek, Aleksandar Miletić, Miha Čekada, and Matjaž Panjan. "Comparative Study of Tribological Behavior of TiN Hard Coatings Deposited by Various PVD Deposition Techniques." Coatings 12, no. 3 (February 22, 2022): 294. http://dx.doi.org/10.3390/coatings12030294.
Повний текст джерелаMoskalewicz, Tomasz, Maciej Warcaba, Sławomir Zimowski, and Alicja Łukaszczyk. "Improvement of the Ti-6Al-4V Alloy’s Tribological Properties and Electrochemical Corrosion Resistance by Nanocomposite TiN/PEEK708 Coatings." Metallurgical and Materials Transactions A 50, no. 12 (October 10, 2019): 5914–24. http://dx.doi.org/10.1007/s11661-019-05484-7.
Повний текст джерелаZeinati, Aseel, Durga Misra, Dina H. Triyoso, Sophia Rogalskyj, K. Imakita, Kandabara Tapily, Steven Consiglio, Cory S. Wajda, and Gert J. Leusink. "Impact of Bottom Electrode in HfO2-Based Rram Devices on Switching Characteristics." ECS Meeting Abstracts MA2023-01, no. 29 (August 28, 2023): 1783. http://dx.doi.org/10.1149/ma2023-01291783mtgabs.
Повний текст джерелаHerzog, Thomas, Naomi Weitzel, and Sebastian Polarz. "Oxygen vacancy injection-induced resistive switching in combined mobile and static gradient doped tin oxide nanorods." Nanoscale 12, no. 35 (2020): 18322–32. http://dx.doi.org/10.1039/d0nr03734f.
Повний текст джерелаHoleček, Jaroslav, Karel Handlíř, Antonín Lyčka, T. K. Chattopadhyay, B. Majee, and A. K. Kumar. "Preparation and infrared and 13C, 17O, and 119Sn NMR spectra of some substituted di- and tri(1-butyl)tin phenoxyacetates and phenylthioacetates." Collection of Czechoslovak Chemical Communications 51, no. 5 (1986): 1100–1111. http://dx.doi.org/10.1135/cccc19861100.
Повний текст джерелаZhang, Chun Min, Xiao Yong Liu, Lin Qing Zhang, Hong Liang Lu, Peng Fei Wang, and David Wei Zhang. "Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing." Materials Science Forum 815 (March 2015): 8–13. http://dx.doi.org/10.4028/www.scientific.net/msf.815.8.
Повний текст джерелаABDULSATTAR, MUDAR AHMED, ADEEBH L. RESNE, SHROK ABDULLAH, RIYADH J. MOHAMMED, NOON KADHUM ALARED, and ELHAM HANIE NASER. "CHLORINE GAS SENSING OF SnO2 NANOCLUSTERS AS A FUNCTION OF TEMPERATURE: A DFT STUDY." Surface Review and Letters 26, no. 04 (May 2019): 1850172. http://dx.doi.org/10.1142/s0218625x1850172x.
Повний текст джерелаDmitriyeva, E. A., I. A. Lebedev, E. A. Grushevskaya, D. O. Murzalinov, A. S. Serikkanov, N. M. Tompakova, A. I. Fedosimova, and A. T. Temiraliev. "The effect of three-minute exposure of oxygen plasma on the properties of tin oxide films." Bulletin of the Karaganda University. "Physics" Series 99, no. 3 (September 30, 2020): 38–45. http://dx.doi.org/10.31489/2020ph3/38-45.
Повний текст джерелаSong, Seok-Kyun, Daeil Kim, Steven Kim, Seok-Keun Koh, Hyung-Jin Jung, Jeong-Young Lee, and Hong-Koo Baik. "Structure and chemical characteristics of tin oxide films prepared by reactive-ion-assisted deposition as a function of oxygen ion beam energy." Journal of Materials Research 15, no. 9 (September 2000): 1911–21. http://dx.doi.org/10.1557/jmr.2000.0277.
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