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Статті в журналах з теми "Thickness gage"
Bruver, V. I., and A. P. Budanov. "X-ray thickness gage." Metallurgist 33, no. 12 (December 1989): 242–43. http://dx.doi.org/10.1007/bf00750278.
Повний текст джерелаDmitriev, Sergey, Vladimir Malikov, and Anatoly Sagalakov. "Subminiature eddy current transducers for thickness measurement." MATEC Web of Conferences 224 (2018): 03007. http://dx.doi.org/10.1051/matecconf/201822403007.
Повний текст джерелаMalikov, Vladimir N., Nikolay D. Tihonskii, and Alexey V. Ishkov. "Thin Ni/Al Metal Films Characterization Using a High-Frequency Electromagnetic Field." Key Engineering Materials 910 (February 15, 2022): 893–901. http://dx.doi.org/10.4028/p-digld4.
Повний текст джерелаHager, J. M., S. Simmons, D. Smith, S. Onishi, L. W. Langley, and T. E. Diller. "Experimental Performance of a Heat Flux Microsensor." Journal of Engineering for Gas Turbines and Power 113, no. 2 (April 1, 1991): 246–50. http://dx.doi.org/10.1115/1.2906555.
Повний текст джерелаLudwick, S. J., H. E. Jenkins, and T. R. Kurfess. "Design and Implementation of a Tube Wall Thickness Measurement System." Journal of Manufacturing Science and Engineering 120, no. 2 (May 1, 1998): 471–75. http://dx.doi.org/10.1115/1.2830149.
Повний текст джерелаKIMURA, Kazuyoshi, Tsuyoshi NUNOKAWA, Motoi HONJYO, and Ryoichi TAKAHASHI. "Development of Gage Control System with Interstand Thickness Gage for Hot Strip Mill." Tetsu-to-Hagane 77, no. 4 (1991): 528–35. http://dx.doi.org/10.2355/tetsutohagane1955.77.4_528.
Повний текст джерелаKorotkevich, A. M., V. B. Nemtinov, and A. N. Subin. "Diffraction Laser-Electronic Fourier Thickness Gage for Monitoring the Thickness of a Large Diameter Lens." Measurement Techniques 48, no. 10 (October 2005): 978–85. http://dx.doi.org/10.1007/s11018-006-0007-x.
Повний текст джерелаTomlinson, K., and D. G. Schroen. "Using an Interferometric Profiler and Gage Block to Determine Sample Thickness." Fusion Science and Technology 63, no. 2 (April 2013): 288–95. http://dx.doi.org/10.13182/fst13-a16352.
Повний текст джерелаYashin, Vasiliy V., Evgenii V. Aryshenskii, Erkin D. Beglov, Maksim S. Tepterev, and Anna F. Grechnikova. "Development of a Mathematical Model of Plate Rolling on Hot Reversing Mills." Key Engineering Materials 746 (July 2017): 48–55. http://dx.doi.org/10.4028/www.scientific.net/kem.746.48.
Повний текст джерелаWang, Jenn-Chyuan, Catey Bunce, and Hung-Ming Lee. "Intraoperative Corneal Thickness Measurement Using Optical Coherence Pachymetry and Corneo-Gage Plus Ultrasound Pachymetry." Journal of Refractive Surgery 24, no. 6 (June 1, 2008): 610–14. http://dx.doi.org/10.3928/1081597x-20080601-10.
Повний текст джерелаДисертації з теми "Thickness gage"
Десятниченко, Алексей Владимирович. "Электромагнитно-акустический толщиномер для контроля металлоизделий с диэлектрическими покрытиями". Thesis, НТУ "ХПИ", 2015. http://repository.kpi.kharkov.ua/handle/KhPI-Press/17117.
Повний текст джерелаThesis for granting the Degree of Candidate of Technical sciences in speciality 05.11.13 – Devices and methods of testing and materials structure determination. – National technical university "Kharkiv Politechnical Institute", Kharkiv, 2015. Thesis is devoted to solution of important theoretical and practical task to ensure ultrasound control of the metal products thickness by using electromagnetic-acoustical method in cases of dielectric coatings (gaps) with thickness up to 10 mm. Work includes analysis of existing acoustic methods and devices for thickness measurement, their main advantages and disadvantages are reviewed. Based on the results of analysis of the given disadvantages, the most advanced ways was set off - electromagnetic-acoustical (EMA) method. The problems of selection of the optimal signal agitate sonorous vibrations by EMA method were reviewed. Calculations of the taken energy are given for the analysis of the practicability to use variants of probing signal. Electric model of amplifier output stage of probing signal and sensor is reviewed, peculiarities of its operation are described. Results of researches and developments dedicated to increase thickness measurement quality and efficiency are given. Matters to build of the transmitting and receiving analog tracts are reviewed. The signal level dependence on voltage research on sensor's transmitting winding are conducted. Impact of a gap on the signal level was examined. Results of the dependence of dead spot length on a gap and methods to its reduction are given. Factors affecting accuracy of control are determined. EMA thickness gauge was designed. The main factors of design are examined. The digital processing algorithm of the received data was reviewed. Metrological characteristics of the developed device were made.
Десятніченко, Олексій Володимирович. "Електромагнітно-акустичний товщиномір для контролю металовиробів з діелектричними покриттями". Thesis, НТУ "ХПІ", 2015. http://repository.kpi.kharkov.ua/handle/KhPI-Press/17045.
Повний текст джерелаThesis for granting the Degree of Candidate of Technical sciences in speciality 05.11.13 – Devices and methods of testing and materials structure determination. – National technical university "Kharkiv Politechnical Institute", Kharkiv, 2015. Thesis is devoted to solution of important theoretical and practical task to ensure ultrasound control of the metal products thickness by using electromagnetic-acoustical method in cases of dielectric coatings (gaps) with thickness up to 10 mm. Work includes analysis of existing acoustic methods and devices for thickness measurement, their main advantages and disadvantages are reviewed. Based on the results of analysis of the given disadvantages, the most advanced ways was set off - electromagnetic-acoustical (EMA) method. The problems of selection of the optimal signal agitate sonorous vibrations by EMA method were reviewed. Calculations of the taken energy are given for the analysis of the practicability to use variants of probing signal. Electric model of amplifier output stage of probing signal and sensor is reviewed, peculiarities of its operation are described. Results of researches and developments dedicated to increase thickness measurement quality and efficiency are given. Matters to build of the transmitting and receiving analog tracts are reviewed. The signal level dependence on voltage research on sensor's transmitting winding are conducted. Impact of a gap on the signal level was examined. Results of the dependence of dead spot length on a gap and methods to its reduction are given. Factors affecting accuracy of control are determined. EMA thickness gauge was designed. The main factors of design are examined. The digital processing algorithm of the received data was reviewed. Metrological characteristics of the developed device were made.
Bhuiya, Md Omar F. "DESIGN AND OPTIMIZATION OF A STRIPLINE RESONATOR SENSOR FOR MEASUREMENT OF RUBBER THICKNESS IN A MOVING WEB." University of Akron / OhioLINK, 2006. http://rave.ohiolink.edu/etdc/view?acc_num=akron1164650416.
Повний текст джерелаBerggren, Amanda. "Long-term results regarding healing andcomplications after 25-gauge pars planavitrectomy for large full-thickness macularholes." Thesis, Örebro universitet, Institutionen för medicinska vetenskaper, 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:oru:diva-93339.
Повний текст джерелаRennie, Michael. "Characterisation of molecular nitrogen implanted silicon for multiple thicknesses of gate oxide in a 0.5μm CMOS process". Thesis, University of Edinburgh, 1996. http://hdl.handle.net/1842/11294.
Повний текст джерелаCivín, Adam. "Stanovení zbytkové napjatosti metodou vrtání otvoru s využitím MKP." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2008. http://www.nusl.cz/ntk/nusl-228325.
Повний текст джерелаHénaux, Stéphane. "Contribution à l'amélioration des méthodes de caractérisation électrique des matériaux Silicium Sur Isolant (SOI)." Université Joseph Fourier (Grenoble), 1998. http://www.theses.fr/1998GRE10116.
Повний текст джерелаFan, Kung Ming, and 范恭鳴. "Multiple-gate-oxide-thickness Process Development by NH3 Plasma Nitridation." Thesis, 2002. http://ndltd.ncl.edu.tw/handle/61329243704455919302.
Повний текст джерела長庚大學
半導體研究所
90
Abstract According to the ITRS prediction, the equivalent oxide thickness (EOT) will be scale to 0.9-1.4nm in the 90nm technology node. As the oxide thickness less than 3nm, the gate leakage current and boron penetration through oxide are more seriously. Replace the SiO2 by High-k dielectric materials and nitrogen implant in the silicon surface or dielectrics are the most popular approaches to overcome these two issues. SOC is the current trend for the future CMOS processes, but it increases the process complexity, one of these challenges is the multiple gate oxide thickness, which in order to have lower power consumption, high speed and circuit stability. Oxidation growth rate can be reduced by nitrogen implant in the silicon substrate and have being widely employed. In this thesis, nitrogen incorporated in the silicon surface by NH3 plasma. We discussed its oxidation growth rate and electrical characteristics of MOS capacitors. The oxidation growth rate can be reduced maximum about 80﹪compare to the control sample. Besides, we improved its oxide quality by NH3 plasma treatment compared to the direct rapid thermal (RT) N2O oxidation. We find that the low charge trapping, low bulk trap densities, higher immunity to SILC and higher charge to soft-breakdown by NH3 plasma treatment before RT N2O oxidation. In this experiment, gate voltage shift has a minimum value of 10 mV in constant current stress and negligible hysteresis effects of C-V characteristic, the flatband voltage shift is 8.5 mV. This process could achieve both multiple gate oxide thickness and improve oxide reliability.
Yen, Yuh-Ren, and 顏育仁. "Study on Thickness Uniformity of Rapid Thermal Thin Gate Oxide." Thesis, 2000. http://ndltd.ncl.edu.tw/handle/49874845421521239969.
Повний текст джерела國立臺灣大學
電機工程學研究所
89
Two main topics are discussed in this thesis. One is about the electrical characteristics of MOS capacitor with non-uniform gate oxide and the other is the uniformity improvement of gate oxide prepared by Rapid Thermal Processor(RTP). In order to investigate the influence of non-uniform gate oxide on the electrical characteristics of MOS capacitors, we intentionally grow a non-uniform thickness oxide by putting a quartz ring beneath the monitored wafer. A thinner oxide is grown on the regions contacted with the quartz ring since heat is conducted by the contact quartz. The result oxide is a hill-shape structure. The Si beneath the thinner and thicker oxide of this structure was found to sense a tensile stress while a compressive stress exists on the Si beneath the moderate thickness oxide. We adopt this oxide structure as the gate oxides of our MOS capacitors. The measured I-V curves of these MOS capacitors show that there is a relation between the stress on Si and the reverse-saturation current. The MOS capacitor with a tensile stress on Si will have a lower revers-saturation current. This is quite important to the thin gate oxide reliability in ULSI. The reason why tensile stress leads to lower reverse-saturation current is also given in this thesis. With the ability to perform heat cycles on a wafer rapidly and with low thermal budget, RTP has become a key technology in the fabrication of advanced semiconductor devices. However, the most common criticisms of RTP are about the thermal non-uniformity, and this problem becomes earnest as oxide thickness shrinks for the need of ULSI devices. A great deal of effort has been put into improvement of radiant uniformity. For high thermal uniformity systems, however, heat convection does play an important role. From simulation result of flow filed, we see that the cold gas flow toward the wafer surface where exhibits a lower pressure due to the flow away of gas by the buoyancy at the wafer center. Our work is to suppress the upward gas flow by putting a quartz cap above the monitored wafer. Since this setting prevents the cold gas drawn form wafer edge to wafer center gas, we suppose that the temperature uniformity can be improved. This supposition is proven to be true from both simulation and experimental results. Furthermore, since natural convection tends to balance the temperature variation, the non-uniform temperature is self-compensated by the gas flowing in the gap between the wafer and the cap.
Kun, Huang Tao, and 黃道坤. "The impact of poly gate sidewall oxide thickness on MOSFET’s gate-induced drain leakage behavior." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/12981841264445016012.
Повний текст джерела長庚大學
電子工程研究所
93
The leakage in the drain region is a crucial issue for scaling of the MOSFET. The off-state gate-induced drain leakage (GIDL) current is one of the major contributors to the overall MOSFET leakage. GIDL is induced by band-to-band tunneling (BTBT) effect in the depletion region and generated in the gate to drain overlap region with high electric field. GIDL leakage is a function of many process parameters such as spacer material, spacer width, gate oxide thickness, doped concentration; anneal temperature, and poly re-oxidation conditions etc. Devices used in this work consist of a gate oxide of 4nm or 6nm, and a spacer width of 25nm. Three different poly re-oxidation conditions result in 3 gate sidewall oxide thicknesses of 4nm, 6nm, and 8nm, measured on the shallow trench isolation processed wafers in the experiments. The impact of different gate sidewall oxide thicknesses (4nm, 6nm and 8nm) on device threshold voltage (Vt), overlap capacitance (Cgd), and off-state GIDL leakage current was investigated. This study shows that the use of thin sidewall oxidation thickness further increases GIDL leakage current, getting high overlap capacitance, and decrease threshold voltage (Vt). Finally, a comparison of GIDL behavior in n-poly gate surface-channel NMOS and n-poly gate buried channel PMOS is summarized.
Книги з теми "Thickness gage"
Yoshio, Ishida. All About Thickness. Ishi Pr, 1990.
Знайти повний текст джерелаЧастини книг з теми "Thickness gage"
Gooch, Jan W. "Film, Thickness Gauge." In Encyclopedic Dictionary of Polymers, 304. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_4936.
Повний текст джерелаSzudarek, Maciej, Michał Nowicki, Filip Wierzbicki, and Marcin Safinowski. "Static Field Magnetic Flux Thickness Gauge." In Advances in Intelligent Systems and Computing, 650–56. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-13273-6_60.
Повний текст джерелаHiruta, Y., H. Oyamatsu, H. S. Momose, H. Iwai, and K. Maeguchi. "Gate Oxide Thickness Dependence of Hot Carrier Induced Degradation on PMOSFETs." In ESSDERC ’89, 732–35. Berlin, Heidelberg: Springer Berlin Heidelberg, 1989. http://dx.doi.org/10.1007/978-3-642-52314-4_154.
Повний текст джерелаJamwal, Deepika, Devi Dass, Rakesh Prasher, and Rakesh Vaid. "Impact of Scaling Gate Oxide Thickness on the Performance of Silicon Based Triple Gate Rectangular Nwfet." In Physics of Semiconductor Devices, 581–84. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_146.
Повний текст джерелаTakebe, Hidenori, Kenichi Mori, Kazuhiro Takahashi, and Kdeki Fujii. "Effects of Thickness and Grain Size on Tensile Properties of Pure Titanium Thin Gauge Sheets." In Proceedings of the 13th World Conference on Titanium, 491–94. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2016. http://dx.doi.org/10.1002/9781119296126.ch77.
Повний текст джерелаSrishti, Yamini Pandey, A. K. Baliga, and Brijesh Kumar. "Impact of Gate Thickness Variation and Dielectric on the Performance of Vertical Organic Thin Film Transistor." In Proceeding of International Conference on Intelligent Communication, Control and Devices, 1065–72. Singapore: Springer Singapore, 2016. http://dx.doi.org/10.1007/978-981-10-1708-7_126.
Повний текст джерелаGhazali, Nor Azlin, Mohamed Fauzi Packeer Mohamed, Muhammad Firdaus Akbar, and Harold M. H. Chong. "Effect of Gate Dielectric Thickness on the Performance of Top-Down ZnO Nanowire Field-Effect Transistors." In Lecture Notes in Electrical Engineering, 690–96. Singapore: Springer Singapore, 2022. http://dx.doi.org/10.1007/978-981-16-8129-5_105.
Повний текст джерелаGupta, Richa, Devi Dass, Rakesh Prasher, and Rakesh Vaid. "Impact of Silicon Body Thickness on the Performance of Gate-all-around Silicon Nanowire Field Effect Transistor." In Physics of Semiconductor Devices, 689–92. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_177.
Повний текст джерелаJethwa, Mayank Kumar, Hardiki Mukesh Devre, Yash Agrawal, and Rutu Parekh. "A Comparative Study of MOSFET (Single and Double Gate), Silicon Nanowire FET, and CNTFET by Varying the Oxide Thickness." In Lecture Notes in Electrical Engineering, 205–16. Singapore: Springer Singapore, 2021. http://dx.doi.org/10.1007/978-981-16-0275-7_17.
Повний текст джерела"Film, thickness gauge." In Encyclopedic Dictionary of Polymers, 405. New York, NY: Springer New York, 2007. http://dx.doi.org/10.1007/978-0-387-30160-0_4853.
Повний текст джерелаТези доповідей конференцій з теми "Thickness gage"
Hager, J. M., S. Simmons, D. Smith, S. Onishi, L. W. Langley, and T. E. Diller. "Experimental Performance of a Heat Flux Microsensor." In ASME 1990 International Gas Turbine and Aeroengine Congress and Exposition. American Society of Mechanical Engineers, 1990. http://dx.doi.org/10.1115/90-gt-256.
Повний текст джерелаWhite, Jeffrey S., Frederick P. LaPlant, John W. Dixon, Donaldson J. Emch, and Vince P. Datillo. "Non-Contact Real-Time Film Thickness Gage for Automotive Body Painting Applications." In International Body Engineering Conference & Exposition. 400 Commonwealth Drive, Warrendale, PA, United States: SAE International, 1998. http://dx.doi.org/10.4271/982313.
Повний текст джерелаSengupta-Deo, Indrani, and Mukund V. Karwe. "Effect of Dimensions and Thermal Properties of Heat Flux Gage on Local Heat Flux." In ASME 1998 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 1998. http://dx.doi.org/10.1115/imece1998-0781.
Повний текст джерелаMukerji, Debjit, John K. Eaton, and Robert J. Moffat. "A New Correlation for Temperature Rise Correction of Heat Flux Gages." In ASME 1998 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 1998. http://dx.doi.org/10.1115/imece1998-0785.
Повний текст джерелаJonnalagadda, Krishna, and Ioannis Chasiotis. "Effect of Film Thickness on Fracture Toughness of Amorphous Diamond-Like Carbon." In ASME 2005 International Mechanical Engineering Congress and Exposition. ASMEDC, 2005. http://dx.doi.org/10.1115/imece2005-81631.
Повний текст джерелаKoganti, Ramakrishna, Sergio Angotti, Ron Cooper, Dan Houston, Asif Waheed, and T. H. Topper. "Material Characterization of Uncoated Boron Steel for Automotive Body Structure Applications." In ASME 2008 International Manufacturing Science and Engineering Conference collocated with the 3rd JSME/ASME International Conference on Materials and Processing. ASMEDC, 2008. http://dx.doi.org/10.1115/msec_icmp2008-72193.
Повний текст джерелаNikhare, Chetan P. "Effect of Metal-Composite Layer Thickness on Springback After U-Bending." In ASME 2020 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2020. http://dx.doi.org/10.1115/imece2020-23155.
Повний текст джерелаSunami, Yuta, and Hiromu Hashimoto. "Optimization of Thin-Film Winding Conditions Considering Viscoelastic Property and Thickness Variation and its Experimental Verification." In ASME-JSME 2018 Joint International Conference on Information Storage and Processing Systems and Micromechatronics for Information and Precision Equipment. American Society of Mechanical Engineers, 2018. http://dx.doi.org/10.1115/isps-mipe2018-8563.
Повний текст джерелаPeabody, Hume L., and Thomas E. Diller. "Evaluation of an Insert Heat Flux Gage in a Transonic Turbine Cascade." In ASME 1998 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 1998. http://dx.doi.org/10.1115/imece1998-0784.
Повний текст джерелаZhao, Libo, Yulong Zhao, and Zhuangde Jiang. "Design and Fabrication of a High Temperature Pressure Sensor." In 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems. ASMEDC, 2007. http://dx.doi.org/10.1115/mnc2007-21517.
Повний текст джерелаЗвіти організацій з теми "Thickness gage"
Kim, J. S. The effect of the gate oxide thickness on the speed of MOS integrated circuits. Gaithersburg, MD: National Bureau of Standards, 1987. http://dx.doi.org/10.6028/nbs.ir.87-3668.
Повний текст джерелаEvans, James, James Tallent, Richard Brown, Anton Netchaev, and Clayton Thurmer. Determining miter gate plate corrosion and thickness of anti-corrosion coatings; and development of a Mobile Sensor Inspection Platform. Engineer Research and Development Center (U.S.), April 2019. http://dx.doi.org/10.21079/11681/32568.
Повний текст джерела