Статті в журналах з теми "STED lithography"
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Ознайомтеся з топ-50 статей у журналах для дослідження на тему "STED lithography".
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Lee, Won-Sup, Hyunmin Cho, and Won-Seok Chang. "Analytical Description of Digital Mask Based STED Lithography." Journal of the Korean Society for Precision Engineering 39, no. 11 (November 30, 2022): 863–68. http://dx.doi.org/10.7736/jkspe.022.072.
Повний текст джерелаKlar, Thomas A., Richard Wollhofen, and Jaroslaw Jacak. "Sub-Abbe resolution: from STED microscopy to STED lithography." Physica Scripta T162 (September 1, 2014): 014049. http://dx.doi.org/10.1088/0031-8949/2014/t162/014049.
Повний текст джерелаKlar, Thomas A., Richard Wollhofen, Johannes Kreutzer, Bianca Buchegger, Christine Eder, and Jaroslaw Jacak. "Sub-Diffraction STED Lithography using Orthogonally Functionalized Resins." Biophysical Journal 112, no. 3 (February 2017): 157a. http://dx.doi.org/10.1016/j.bpj.2016.11.864.
Повний текст джерелаPuthukodan, Sujitha, Eljesa Murtezi, Jaroslaw Jacak, and Thomas A. Klar. "Localization STED (LocSTED) microscopy with 15 nm resolution." Nanophotonics 9, no. 4 (February 28, 2020): 783–92. http://dx.doi.org/10.1515/nanoph-2019-0398.
Повний текст джерелаMüller, Patrick, Rouven Müller, Larissa Hammer, Christopher Barner-Kowollik, Martin Wegener, and Eva Blasco. "STED-Inspired Laser Lithography Based on Photoswitchable Spirothiopyran Moieties." Chemistry of Materials 31, no. 6 (January 15, 2019): 1966–72. http://dx.doi.org/10.1021/acs.chemmater.8b04696.
Повний текст джерелаGlubokov, D. A., V. V. Sychev, Alexey G. Vitukhnovsky, and A. E. Korol'kov. "Photonic crystal fibre-based light source for STED lithography." Quantum Electronics 43, no. 6 (June 30, 2013): 588–90. http://dx.doi.org/10.1070/qe2013v043n06abeh015059.
Повний текст джерелаWiesbauer, Moritz, Richard Wollhofen, Borislav Vasic, Kurt Schilcher, Jaroslaw Jacak, and Thomas A. Klar. "Nano-Anchors with Single Protein Capacity Produced with STED Lithography." Nano Letters 13, no. 11 (October 16, 2013): 5672–78. http://dx.doi.org/10.1021/nl4033523.
Повний текст джерелаWollhofen, Richard, Julia Katzmann, Calin Hrelescu, Jaroslaw Jacak, and Thomas A. Klar. "120 nm resolution and 55 nm structure size in STED-lithography." Optics Express 21, no. 9 (April 25, 2013): 10831. http://dx.doi.org/10.1364/oe.21.010831.
Повний текст джерелаKaschke, Johannes, and Martin Wegener. "Gold triple-helix mid-infrared metamaterial by STED-inspired laser lithography." Optics Letters 40, no. 17 (August 20, 2015): 3986. http://dx.doi.org/10.1364/ol.40.003986.
Повний текст джерелаВитухновский, А. Г., Р. Д. Звагельский, Д. А. Колымагин, А. В. Писаренко та Д. А. Чубич. "Двухволновая лазерная стереолитография для создания ИК сенсоров для поверхностно-усиленной спектроскопии-=SUP=-*-=/SUP=-". Журнал технической физики 126, № 1 (2019): 63. http://dx.doi.org/10.21883/os.2019.01.47055.271-18.
Повний текст джерелаElmeranta, Marjukka, Giuseppe Vicidomini, Martí Duocastella, Alberto Diaspro, and Gustavo de Miguel. "Characterization of nanostructures fabricated with two-beam DLW lithography using STED microscopy." Optical Materials Express 6, no. 10 (September 19, 2016): 3169. http://dx.doi.org/10.1364/ome.6.003169.
Повний текст джерелаYuan, Chenyu, Jukun Liu, Tianqing Jia, Kan Zhou, Hongxin Zhang, Jia Pan, Donghai Feng, and Zhenrong Sun. "Super resolution direct laser writing in ITX resist inspired by STED microscopy." Journal of Nonlinear Optical Physics & Materials 23, no. 02 (June 2014): 1450015. http://dx.doi.org/10.1142/s0218863514500155.
Повний текст джерелаLiu, Fan, Guo Dong Gu, Chun Hong Zeng, Hai Jun Li, Wei Wang, Bao Shun Zhang, and Jin She Yuan. "Fabrication of 50nm T-Gate on GaN Substrate." Advanced Materials Research 482-484 (February 2012): 2341–44. http://dx.doi.org/10.4028/www.scientific.net/amr.482-484.2341.
Повний текст джерелаFang, Bin, Jiafeng Feng, Hongxiang Wei, Xiufeng Han, Baoshun Zhang, and Zhongming Zeng. "Fabrication of Spin-Transfer Nano-Oscillator by Colloidal Lithography." Journal of Nanomaterials 2015 (2015): 1–6. http://dx.doi.org/10.1155/2015/973957.
Повний текст джерелаShamsuddin, Liyana, Khairudin Mohamed, and Alsadat Rad Maryam. "The Investigation of Microstructures Fabrication on Quartz Substrate Employing Electron Beam Lithography (EBL) and ICP-RIE Process." Advanced Materials Research 980 (June 2014): 69–73. http://dx.doi.org/10.4028/www.scientific.net/amr.980.69.
Повний текст джерелаLiu Jiahong, 刘佳红, 张方 Zhang Fang та 黄惠杰 Huang Huijie. "步进扫描投影光刻机照明系统技术研究进展". Laser & Optoelectronics Progress 59, № 9 (2022): 0922011. http://dx.doi.org/10.3788/lop202259.0922011.
Повний текст джерелаFan, Xi Qiu. "Nanoimprint Lithography: A Promising Candidate for Next-Generation Lithography." Advanced Materials Research 139-141 (October 2010): 1558–61. http://dx.doi.org/10.4028/www.scientific.net/amr.139-141.1558.
Повний текст джерелаLee, Jae Jong, Seung Woo Lee, Hyun Taek Cho, Gee Hong Kim, and Kee Bong Choi. "Single-Step UV Nanoimprinting Lithography with Multi-Head Imprinting System and Its Applications." Key Engineering Materials 326-328 (December 2006): 441–44. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.441.
Повний текст джерелаResnick, Douglas J., S. V. Sreenivasan, and C. Grant Willson. "Step & flash imprint lithography." Materials Today 8, no. 2 (February 2005): 34–42. http://dx.doi.org/10.1016/s1369-7021(05)00700-5.
Повний текст джерелаAcevedo, Diego F., Evelina Frontera, Martín F. Broglia, Frank Mücklich, María C. Miras, and César A. Barbero. "One Step Lithography of Polypyrrole." Advanced Engineering Materials 13, no. 5 (January 20, 2011): 405–10. http://dx.doi.org/10.1002/adem.201000295.
Повний текст джерелаJiang, Youwei, Bingqing Luo, and Xing Cheng. "Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography." Materials 12, no. 3 (February 12, 2019): 545. http://dx.doi.org/10.3390/ma12030545.
Повний текст джерелаKIGAMI, Hiroshi, Noriyuki UNNO, Yuta SHINONAGA, Tatsuya HAYASHI, and Jun TANIGUCHI. "1305 Fabrication of Silicon Mold for Eight-step Diffractive Optical Element using Liquid Transfer Imprint Lithography." Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21 2015.8 (2015): _1305–1_—_1305–4_. http://dx.doi.org/10.1299/jsmelem.2015.8._1305-1_.
Повний текст джерелаLeong, Eunice Sok Ping, Jie Deng, Eng Huat Khoo, Siji Wu, Wee Kee Phua, and Yan Jun Liu. "Fabrication of suspended, three-dimensional chiral plasmonic nanostructures with single-step electron-beam lithography." RSC Advances 5, no. 117 (2015): 96366–71. http://dx.doi.org/10.1039/c5ra17705g.
Повний текст джерелаSEWELL, HARRY. "250nm Lithography with Step and Scan." Journal of Photopolymer Science and Technology 6, no. 1 (1993): 161–70. http://dx.doi.org/10.2494/photopolymer.6.161.
Повний текст джерелаEdwards, C., and J. Sawicki. "Step out of the light [lithography]." Engineering & Technology 5, no. 17 (November 13, 2010): 34–35. http://dx.doi.org/10.1049/et.2010.1720.
Повний текст джерелаJiang, Nan, Gary Hembree, and John C. H. Spence. "Electron Lithography In Glasses by STEM." Microscopy and Microanalysis 9, S02 (July 19, 2003): 300–301. http://dx.doi.org/10.1017/s1431927603441500.
Повний текст джерелаLi, Chunyu, Xixian Wang, Jian Xu, and Bo Ma. "One-step liquid molding based modular microfluidic circuits." Analyst 145, no. 21 (2020): 6813–20. http://dx.doi.org/10.1039/d0an01134g.
Повний текст джерелаJun Cheng, Jun Cheng, and Nan Yan Nan Yan. "Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator." Chinese Optics Letters 13, no. 8 (2015): 082201–82205. http://dx.doi.org/10.3788/col201513.082201.
Повний текст джерелаLaun, Joachim, Yana De Smet, Emma Van de Reydt, Alexander Krivcov, Vanessa Trouillet, Alexander Welle, Hildegard Möbius, Christopher Barner-Kowollik, and Tanja Junkers. "2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization." Chemical Communications 54, no. 7 (2018): 751–54. http://dx.doi.org/10.1039/c7cc08444g.
Повний текст джерелаYesilkoy, F., V. Flauraud, M. Rüegg, B. J. Kim, and J. Brugger. "3D nanostructures fabricated by advanced stencil lithography." Nanoscale 8, no. 9 (2016): 4945–50. http://dx.doi.org/10.1039/c5nr08444j.
Повний текст джерелаZhang, W., M. P. Tullier, K. Patel, A. Carranza, J. A. Pojman, and A. D. Radadia. "Microfluidics using a thiol–acrylate resin for fluorescence-based pathogen detection assays." Lab on a Chip 15, no. 21 (2015): 4227–31. http://dx.doi.org/10.1039/c5lc00971e.
Повний текст джерелаXin, Zheng Hang, Chong Wang, Feng Qiu, Rong Fei Wang, Chen Li, and Yu Yang. "Advance in the Fabrication of Ordered Ge/Si Nanostructure Array on Si Patterned Substrate by Nanosphere Lithography." Materials Science Forum 852 (April 2016): 283–92. http://dx.doi.org/10.4028/www.scientific.net/msf.852.283.
Повний текст джерелаZhang, Kui, Zhimin Chen, Jingsong Wei, Tao Wei, Youyong Geng, Yang Wang, and Yiqun Wu. "A study on one-step laser nanopatterning onto copper–hydrazone-complex thin films and its mechanism." Physical Chemistry Chemical Physics 19, no. 20 (2017): 13272–80. http://dx.doi.org/10.1039/c7cp00477j.
Повний текст джерелаJiang, Zheng, Hao Zhu, Qingqing Sun, and Davidwei Zhang. "Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask." Electronics 10, no. 20 (October 15, 2021): 2512. http://dx.doi.org/10.3390/electronics10202512.
Повний текст джерелаDai, Jian Feng, Qing Wang, Wei Xue Li, Yong Fu Cui, Feng Zhang, and Henry I. Smith. "The Fabrication of 2-D Global Fiducial Grid with High Resolution for Spatial Phase Locked e-Beam Lithography." Materials Science Forum 575-578 (April 2008): 1252–57. http://dx.doi.org/10.4028/www.scientific.net/msf.575-578.1252.
Повний текст джерелаLai, Chung-Jui, Hui-Ping Tsai, Ju-Yu Chen, Mei-Xuan Wu, You-Jie Chen, Kun-Yi Lin, and Hong-Ta Yang. "Single-Step Fabrication of Longtail Glasswing Butterfly-Inspired Omnidirectional Antireflective Structures." Nanomaterials 12, no. 11 (May 29, 2022): 1856. http://dx.doi.org/10.3390/nano12111856.
Повний текст джерелаJun Cheng, Jun Cheng, and Duk-Yong Choi Duk-Yong Choi. "Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator-corrigendum." Chinese Optics Letters 14, no. 4 (2016): 043501–43501. http://dx.doi.org/10.3788/col201614.043501.
Повний текст джерелаDell'Anna, Rossana, Cecilia Masciullo, Erica Iacob, Mario Barozzi, Damiano Giubertoni, Roman Böttger, Marco Cecchini, and Giancarlo Pepponi. "Multiscale structured germanium nanoripples as templates for bioactive surfaces." RSC Advances 7, no. 15 (2017): 9024–30. http://dx.doi.org/10.1039/c6ra28531g.
Повний текст джерелаHamidovic, Medina, and Ferenc Ender. "A Novel Method for Fabricating Microfluidic Devices Containing Immobilized Biological Specimens." Periodica Polytechnica Electrical Engineering and Computer Science 63, no. 2 (March 28, 2019): 85–93. http://dx.doi.org/10.3311/ppee.13523.
Повний текст джерелаColson, Pierre, Catherine Henrist, and Rudi Cloots. "Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials." Journal of Nanomaterials 2013 (2013): 1–19. http://dx.doi.org/10.1155/2013/948510.
Повний текст джерелаNiepel, Marcus S., Bhavya K. Ekambaram, Christian E. H. Schmelzer, and Thomas Groth. "Polyelectrolyte multilayers of poly (l-lysine) and hyaluronic acid on nanostructured surfaces affect stem cell response." Nanoscale 11, no. 6 (2019): 2878–91. http://dx.doi.org/10.1039/c8nr05529g.
Повний текст джерелаHermosa, Javier, Aurelio Hierro-Rodríguez, Carlos Quirós, María Vélez, Andrea Sorrentino, Lucía Aballe, Eva Pereiro, Salvador Ferrer, and José I. Martín. "Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy." Micromachines 13, no. 2 (January 28, 2022): 204. http://dx.doi.org/10.3390/mi13020204.
Повний текст джерелаMontero-Pancera, Sabrina, Vanessa Trouillet, Andre Petershans, Dagmar Fichtner, Andrey Lyapin, Michael Bruns, Thomas Schimmel, et al. "Design of Chemically Activated Polymer Microwells by One-Step UV-Lithography for Stem Cell Adhesion." Langmuir 26, no. 3 (February 2, 2010): 2050–56. http://dx.doi.org/10.1021/la902563d.
Повний текст джерелаJohnson, Stephen C. "Nanofabrication with step and flash imprint lithography." Journal of Micro/Nanolithography, MEMS, and MOEMS 4, no. 1 (January 1, 2005): 011002. http://dx.doi.org/10.1117/1.1862650.
Повний текст джерелаLiu, H. Z., Bing Heng Lu, Y. C. Ding, D. C. Li, Yi Ping Tang, and T. Jin. "A Measurement System for Step Imprint Lithography." Key Engineering Materials 295-296 (October 2005): 107–12. http://dx.doi.org/10.4028/www.scientific.net/kem.295-296.107.
Повний текст джерелаBuckley, Jere D. "Step-and-scan lithography using reduction optics." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 7, no. 6 (November 1989): 1607. http://dx.doi.org/10.1116/1.584499.
Повний текст джерелаSpence, J. C. H., and U. Weierstall. "Tomographic Diffractive Imaging. STEM Lithography for Nanorings." Microscopy and Microanalysis 9, S02 (August 2003): 6–7. http://dx.doi.org/10.1017/s1431927603440671.
Повний текст джерелаBailey, T., B. Smith, B. J. Choi, M. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. "Step and flash imprint lithography: Defect analysis." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 19, no. 6 (2001): 2806. http://dx.doi.org/10.1116/1.1420203.
Повний текст джерелаHuang, XuHai, Karina Torres-Castro, Walter Varhue, Armita Salahi, Ahmed Rasin, Carlos Honrado, Audrey Brown, Jennifer Guler, and Nathan S. Swami. "Self-aligned sequential lateral field non-uniformities over channel depth for high throughput dielectrophoretic cell deflection." Lab on a Chip 21, no. 5 (2021): 835–43. http://dx.doi.org/10.1039/d0lc01211d.
Повний текст джерелаShahin Shahidan, Muhammad Faris, Jingchao Song, Timothy D. James, and Ann Roberts. "Multilevel nanoimprint lithography with a binary mould for plasmonic colour printing." Nanoscale Advances 2, no. 5 (2020): 2177–84. http://dx.doi.org/10.1039/d0na00038h.
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