Дисертації з теми "STED lithography"
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Ознайомтеся з топ-28 дисертацій для дослідження на тему "STED lithography".
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Müller, Patrick [Verfasser], and M. [Akademischer Betreuer] Wegener. "Molecular Photoswitches for STED-inspired Laser Lithography / Patrick Müller ; Betreuer: M. Wegener." Karlsruhe : KIT-Bibliothek, 2019. http://d-nb.info/1177147297/34.
Повний текст джерелаKaschke, Johannes Michael [Verfasser], and M. [Akademischer Betreuer] Wegener. "Complex Helical Metamaterials fabricated via STED-inspired Laser Lithography / Johannes Michael Kaschke. Betreuer: M. Wegener." Karlsruhe : KIT-Bibliothek, 2015. http://d-nb.info/1080701001/34.
Повний текст джерелаMüller, Rouven [Verfasser], and C. [Akademischer Betreuer] Barner-Kowollik. "Spatially resolved immobilization of metallopolymers – Spiropyrans for light sensitive metal complexes and STED-inspired laser lithography / Rouven Müller ; Betreuer: C. Barner-Kowollik." Karlsruhe : KIT-Bibliothek, 2019. http://d-nb.info/1197138900/34.
Повний текст джерелаColburn, Matthew Earl. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithography /." Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3025205.
Повний текст джерелаKim, Eun Jung. "Surface Microtopography Modulation of Biomaterials for Bone Tissue Engineering Applications." Cleveland State University / OhioLINK, 2010. http://rave.ohiolink.edu/etdc/view?acc_num=csu1273557062.
Повний текст джерелаCheng, Zhe Annie. "Biological multi-functionalization and surface nanopatterning of biomaterials." Thesis, Bordeaux 1, 2013. http://www.theses.fr/2013BOR15202/document.
Повний текст джерелаThe aim of biomaterials design is to create an artificial environment that mimics the in vivo extracellular matrix for optimized cell interactions. A precise synergy between the scaffolding material, bioactivity, and cell type must be maintained in an effective biomaterial. In this work, we present a technique of nanofabrication that creates chemically nanopatterned bioactive silicon surfaces for cell studies. Using nanoimprint lithography, RGD and mimetic BMP-2 peptides were covalently grafted onto silicon as nanodots of various dimensions, resulting in a nanodistribution of bioactivity. To study the effects of spatially distributed bioactivity on cell behavior, mesenchymal stem cells (MSCs) were cultured on these chemically modified surfaces, and their adhesion and differentiation were studied. MSCs are used in regenerative medicine due to their multipotent properties, and well-controlled biomaterial surface chemistries can be used to influence their fate. We observe that peptide nanodots induce differences in MSC behavior in terms of cytoskeletal organization, actin stress fiber arrangement, focal adhesion (FA) maturation, and MSC commitment in comparison with homogeneous control surfaces. In particular, FA area, distribution, and conformation were highly affected by the presence of peptide nanopatterns. Additionally, RGD and mimetic BMP-2 peptides influenced cellular behavior through different mechanisms that resulted in changes in cell spreading and FA maturation. These findings have remarkable implications that contribute to the understanding of cell-extracellular matrix interactions for clinical biomaterials applications
Cheng, Zhe. "Biological multi-functionalization and surface nanopatterning of biomaterials." Phd thesis, Université Sciences et Technologies - Bordeaux I, 2013. http://tel.archives-ouvertes.fr/tel-01016695.
Повний текст джерелаColburn, Matthew Earl 1974. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithograph." 2001. http://hdl.handle.net/2152/10298.
Повний текст джерелаJacobsson, Borje Michael. "Materials development for step and flash imprint lithography." Thesis, 2011. http://hdl.handle.net/2152/ETD-UT-2011-08-4239.
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Tsung-LunWen and 溫宗倫. "Fabrication of Seamless Roller Mold Using Curved Surface Beam Pen Lithography and Step-and-Rotate Lithography." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/64860854775135705951.
Повний текст джерелаJohnson, Stephen Christopher Willson C. G. "Step and flash imprint lithography materials and process development /." 2005. http://repositories.lib.utexas.edu/bitstream/handle/2152/1582/johnsons07006.pdf.
Повний текст джерелаJohnson, Stephen Christopher. "Step and flash imprint lithography: materials and process development." Thesis, 2005. http://hdl.handle.net/2152/1582.
Повний текст джерелаSchuetter, Scott D. "Modeling template distortion during step-and-flash imprint lithography." 2005. http://catalog.hathitrust.org/api/volumes/oclc/58538867.html.
Повний текст джерелаJen, Wei-Lun Kane. "Materials and processes for advanced lithography applications." 2009. http://hdl.handle.net/2152/9703.
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Wu, Kai. "Interface study for template release in step and flash imprint lithography." Thesis, 2006. http://hdl.handle.net/2152/3002.
Повний текст джерелаReddy, Shravanthi. "Fluid and solid mechanics in the step and flash imprint lithography process." Thesis, 2006. http://hdl.handle.net/2152/2624.
Повний текст джерелаChauhan, Siddharth. "Modeling and defect analysis of step and flash imprint lithography and photolithography." Thesis, 2010. http://hdl.handle.net/2152/ETD-UT-2010-08-2029.
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Caldorera-Moore, Mary. "Development and optimization of shape-specific, stimuli-responsive drug delivery nanocarriers using Step and Flash Imprint Lithography." Thesis, 2010. http://hdl.handle.net/2152/ETD-UT-2010-05-833.
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Bailey, Todd Christopher. "Imprint template advances and surface modification, and defect analysis for step and flash imprint lithography." Thesis, 2003. http://wwwlib.umi.com/cr/utexas/fullcit?p3116257.
Повний текст джерелаPalmieri, Frank Louis 1980. "Step and flash imprint lithography : materials and applications for the manufacture of advanced integrated circuits." 2008. http://hdl.handle.net/2152/17975.
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Lin, Michael Wayne 1980. "Simulation and design of planarizing materials and interfacial adhesion studies for step and flash imprint lithography." 2008. http://hdl.handle.net/2152/17933.
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Bassett, Derek William. "Fluid management in immersion and imprint microlithography." Thesis, 2010. http://hdl.handle.net/2152/ETD-UT-2010-12-2043.
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Jhurani, Chetan Kumar. "Multiscale modeling using goal-oriented adaptivity and numerical homogenization." 2009. http://hdl.handle.net/2152/6545.
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Chu, Yung-Chin, and 朱永欽. "Design and Analysis of Rotary Step-and-Flash Lithography System for Seamless Micro/Nanoimprint Roller Mold Fabrication." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/88720964436249039498.
Повний текст джерелаZweber, Amy Elizabeth. "Enhancement of the lithographic process using supercritical carbon dioxide in the development step." 2006. http://www.lib.ncsu.edu/theses/available/etd-03242007-101023/unrestricted/etd.pdf.
Повний текст джерелаChen, Yung-Pin, and 陳永彬. "Stitching Submicron Periodic Patterns over a Planar Substrate and a Roller by Utilizing Step-and-Align Interference Lithography." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/70754231052777783458.
Повний текст джерела國立臺灣大學
光電工程學研究所
99
A Step-and-Align Interference Lithography (SAIL) system is developed for fabricating continuous submicron periodic patterns over a silicon wafer with diameter of 100 mm and a metal roller with radius of curvature 25 mm. By utilizing two-beam interference lithography to expose submicron periodic patterns in a small square area and the position stages with high precision control system to stepwise move or rotate the substrate, the small exposure regions are stitched to be large-area submicron periodic patterns. The SAIL system is composed of two fabrication modes; plane mode and roller mode, which can be used to fabricate and stitch the interference patterns on a planar sub-strate and a roller, respectively. A flip bending mirror is used to control the propagation direction of laser beam, and then the interference patterns exposed in the plane or roller mode can be switched conveniently. The optical module in each mode has three functions; beam stabilization function to trace and stabilize the laser beam’s drifting from the argon ion laser placed on a separate table, beam expansion function to expand a small laser beam to a large-area collimated Gaussian beam, and two-beam interference function to have two beams interfered with equal intensity by splitting the expanded beam via a beamsplitter on the substrate coated with photoresist. To obtain uniform exposure dose distribution over the whole large area after step-wise stitching the small exposure regions, a beam profile is designed to have the unit ex-posure area with designed dose distribution. However, there is no beam shaper to trans-form the laser beam into the designed beam. A metal mask with a square open window set up before the substrate is used to truncate the central region of the expanded Gaussian beam whose intensity distribution is more uniform to be the unit exposure area. The Gaussian intensity distribution is smoother in the small region of the expanded beam, which has large tolerance for the overlapping misalignment of two incident beams. Even though the overlapping misalignment is about 2 mm, the interference contrast in the overlapping area could still be higher than 0.99. The interference patterns with period about 700 nm and 800 nm are stitched suc-cessfully over the wafer and the roller. There are about 90 unit exposure areas stitched over the wafer and 120 unit exposure areas stitched over the roller, which take half an hour and an hour, respectively. The process times are much shorter than those of other fabrication methods for making submicron periodic patterns such as e-beam lithography. Although the reflectance spectra of the fringes in the single interference regions and the overlapping regions vary owing to some disturbances, the connection of the submicron periodic fringes and the continuity of fringes for a long distance are verified by utilizing the OM and the SEM. The one- and two-dimensional patterns with the period smaller than 300 nm can be fabricated in the single interference regions without stitching by uti-lizing the optical interference lithography module.
Collister, Elizabeth Ann. "Studies of nontraditional high resolution thin film patterning techniques." 2009. http://hdl.handle.net/2152/17295.
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Chao, Huang-Lin. "Electromigration enhanced kinetics of Cu-Sn intermetallic compounds in Pb free solder joints and Cu low-k dual damascene processing using step and flash imprint lithography." 2009. http://hdl.handle.net/2152/7607.
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