Статті в журналах з теми "[SiH4 + CO2 + He] plasma"
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Samanta, Arup, and Debajyoti Das. "Structural investigation of nC-Si/SiOx:H thin films from He diluted (SiH4+CO2) plasma at low temperature." Applied Surface Science 259 (October 2012): 477–85. http://dx.doi.org/10.1016/j.apsusc.2012.07.070.
Повний текст джерелаSamanta, Arup, and Debajyoti Das. "Studies on the structural properties of SiO:H films prepared from (SiH4+CO2+He) plasma in RF-PECVD." Solar Energy Materials and Solar Cells 93, no. 5 (May 2009): 588–96. http://dx.doi.org/10.1016/j.solmat.2008.12.005.
Повний текст джерелаSobajima, Yasushi, Shota Kinoshita, Shinnosuke Kakimoto, Ryoji Okumoto, Chitose Sada, Akihisa Matsuda, and Hiroaki Okamoto. "Control of growth process for obtaining high-quality a-SiO:H." Canadian Journal of Physics 92, no. 7/8 (July 2014): 582–85. http://dx.doi.org/10.1139/cjp-2013-0558.
Повний текст джерелаJo, Sanghyun, Suik Kang, Kyungjun Lee, and Ho Jun Kim. "Helium Metastable Distributions and Their Effect on the Uniformity of Hydrogenated Amorphous Silicon Depositions in He/SiH4 Capacitively Coupled Plasmas." Coatings 12, no. 9 (September 15, 2022): 1342. http://dx.doi.org/10.3390/coatings12091342.
Повний текст джерелаErshov, I. A., V. I. Pustovoy, V. I. Krasovskii, A. N. Orlov, S. I. Rasmagin, L. D. Iskhakova, F. O. Milovich, M. N. Kirichenko, L. L. Chaikov, and E. A. Konstantinova. "Synthesis and properties of silicon carbide nanoparticles obtained by laser pyrolysis method." Physics and Chemistry of Materials Treatment 1 (2021): 51–57. http://dx.doi.org/10.30791/0015-3214-2021-1-51-57.
Повний текст джерелаPark, Hwanyeol, and Ho Jun Kim. "Theoretical Analysis of Si2H6 Adsorption on Hydrogenated Silicon Surfaces for Fast Deposition Using Intermediate Pressure SiH4 Capacitively Coupled Plasma." Coatings 11, no. 9 (August 29, 2021): 1041. http://dx.doi.org/10.3390/coatings11091041.
Повний текст джерелаJia, Haijun, and Michio Kondo. "High rate synthesis of crystalline silicon films from SiH4+He using high density microwave plasma." Journal of Applied Physics 105, no. 10 (May 15, 2009): 104903. http://dx.doi.org/10.1063/1.3129321.
Повний текст джерелаDas, Debajyoti, Madhusudan Jana та A. K. Barua. "Characterization of undoped μc-SiO:H films prepared from (SiH4+CO2+H2)-plasma in RF glow discharge". Solar Energy Materials and Solar Cells 63, № 3 (липень 2000): 285–97. http://dx.doi.org/10.1016/s0927-0248(00)00035-0.
Повний текст джерелаLee, Sung‐Woo, Du‐Chang Heo, Jin‐Kyu Kang, Young‐Bae Park, and Shi‐Woo Rhee. "Microcrystalline Silicon Film Deposition from H 2 ‐ He ‐ SiH4 Using Remote Plasma Enhanced Chemical Vapor Deposition." Journal of The Electrochemical Society 145, no. 8 (August 1, 1998): 2900–2904. http://dx.doi.org/10.1149/1.1838733.
Повний текст джерелаDian, J., J. Valenta, J. Hála, A. Poruba, P. Horváth, K. Luterová, I. Gregora, and I. Pelant. "Visible photoluminescence in hydrogenated amorphous silicon grown in microwave plasma from SiH4 strongly diluted with He." Journal of Applied Physics 86, no. 3 (August 1999): 1415–19. http://dx.doi.org/10.1063/1.370904.
Повний текст джерелаSritharathikhun, Jaran, Taweewat Krajangsang, Apichan Moollakorn, Sorapong Inthisang, Amornrat Limmanee, Aswin Hongsingtong, Nattaphong Boriraksantikul, Tianchai Taratiwat, Nirod Akarapanjavit та Kobsak Sriprapha. "Effect of the CO2/SiH4Ratio in the p-μc-SiO:H Emitter Layer on the Performance of Crystalline Silicon Heterojunction Solar Cells". International Journal of Photoenergy 2014 (2014): 1–5. http://dx.doi.org/10.1155/2014/872849.
Повний текст джерелаZhang, Yan, Rui Juan Liu, Zhong Xuan Shang, Yin Ding Lv, and Biao Gu. "The Surface Hydrophilicity of Polypropylene Non-Woven Treated by Atmospheric Glow Plasma." Advanced Materials Research 328-330 (September 2011): 1413–16. http://dx.doi.org/10.4028/www.scientific.net/amr.328-330.1413.
Повний текст джерелаDas, Debajyoti, Debnath Raha, Wei-Chao Chen, Kuei-Hsien Chen, Chien-Ting Wu, and Li-Chyong Chen. "Effect of substrate bias on the promotion of nanocrystalline silicon growth from He-diluted SiH4 plasma at low temperature." Journal of Materials Research 27, no. 9 (February 16, 2012): 1303–13. http://dx.doi.org/10.1557/jmr.2012.4.
Повний текст джерелаKim, Ho Jun. "Importance of Dielectric Elements for Attaining Process Uniformity in Capacitively Coupled Plasma Deposition Reactors." Coatings 12, no. 4 (March 28, 2022): 457. http://dx.doi.org/10.3390/coatings12040457.
Повний текст джерелаDas, Debajyoti, Debnath Raha, and Koyel Bhattacharya. "Evolution of nc-Si Network and the Control of Its Growth by He/H2 Plasma Assistance in SiH4 at PECVD." Journal of Nanoscience and Nanotechnology 9, no. 9 (September 1, 2009): 5614–21. http://dx.doi.org/10.1166/jnn.2009.1151.
Повний текст джерелаSohn, Hong Lae, Young Tae Cho, and Bong Ju Lee. "Measurement of Carboxyl Group Separated from a Thin Film Copolymerized by Low-Temperature Plasma at Atmospheric Pressure of C2H2 and CO2." Key Engineering Materials 321-323 (October 2006): 1332–35. http://dx.doi.org/10.4028/www.scientific.net/kem.321-323.1332.
Повний текст джерелаWang, Xu-Cheng, Ji-Xin Bai, Tai-Heng Zhang, Ying Sun, and Yuan-Tao Zhang. "Comprehensive study on discharge characteristics in pulsed dielectric barrier discharges with atmospheric He and CO2." Physics of Plasmas 29, no. 8 (August 2022): 083503. http://dx.doi.org/10.1063/5.0096172.
Повний текст джерелаTakahashi, Hidemi, Minoru Kimura, Reiji Sano, Yoshio Nagayama, and Kenro Miyamoto. "Heterodyne interferometer of coaxial CO2 and He–Ne lasers for plasma density measurements." Review of Scientific Instruments 57, no. 7 (July 1986): 1286–89. http://dx.doi.org/10.1063/1.1138644.
Повний текст джерелаKim, Ho Jun, and Jung Hwan Yoon. "Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor." Coatings 11, no. 8 (August 23, 2021): 1004. http://dx.doi.org/10.3390/coatings11081004.
Повний текст джерелаSantato, Clara, Giorgio Mattei, Wu Ruihua, and Federico Mecarini. "In situmicro Raman investigation of the laser crystallization in Si thin films plasma enhanced chemical vapor deposition-grown from He-diluted SiH4." Journal of Applied Physics 95, no. 10 (May 15, 2004): 5366–72. http://dx.doi.org/10.1063/1.1699506.
Повний текст джерелаKim, Ho Jun. "Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor." Coatings 11, no. 8 (August 21, 2021): 999. http://dx.doi.org/10.3390/coatings11080999.
Повний текст джерелаKim, Ho Jun, and Hae June Lee. "Analysis of intermediate pressure SiH4/He capacitively coupled plasma for deposition of an amorphous hydrogenated silicon film in consideration of thermal diffusion effects." Plasma Sources Science and Technology 26, no. 8 (July 17, 2017): 085003. http://dx.doi.org/10.1088/1361-6595/aa78b4.
Повний текст джерелаWillems, Gert, Ante Hecimovic, Kerstin Sgonina, Emile Carbone, and Jan Benedikt. "Mass spectrometry of neutrals and positive ions in He/CO2 non-equilibrium atmospheric plasma jet." Plasma Physics and Controlled Fusion 62, no. 3 (February 10, 2020): 034005. http://dx.doi.org/10.1088/1361-6587/ab6b4c.
Повний текст джерелаJantarang, Salina, Simone Ligori, Jonathan Horlyck, Emma C. Lovell, Tze Hao Tan, Bingqiao Xie, Rose Amal, and Jason Scott. "Plasma-Induced Catalyst Support Defects for the Photothermal Methanation of Carbon Dioxide." Materials 14, no. 15 (July 28, 2021): 4195. http://dx.doi.org/10.3390/ma14154195.
Повний текст джерелаMurata, Tatsunori, Yoshihiro Miyagawa, Masazumi Matsuura, Koyu Asai, and Hiroshi Miyatake. "Effect of N2Gas Flow Ratio in Plasma-Enhanced Chemical Vapor Deposition with SiH4–NH3–N2–He Gas Mixture on Stress Relaxation of Silicon Nitride." Japanese Journal of Applied Physics 49, no. 8 (August 20, 2010): 08JF08. http://dx.doi.org/10.1143/jjap.49.08jf08.
Повний текст джерелаMijatović, Z., R. Kobilarov, S. Djurović, and M. Stevanov. "Use of He(I) 447.1-nm Line with Forbidden Component for Electron Density Determination in Plasmas." Applied Spectroscopy 51, no. 3 (March 1997): 396–400. http://dx.doi.org/10.1366/0003702981940269.
Повний текст джерелаKhumaeni, Ali, Wahyu S. Budi, Asep Y. Wardaya, Hideaki Niki, Kazuyoshi Kurihara, and Kiichiro Kagawa. "Emission Characteristics of Hydrogen and Carbon in Various Ambient Gases using Pulsed-CO2 Laser-Induced Breakdown Spectroscopy." Current Analytical Chemistry 16, no. 3 (May 15, 2020): 234–40. http://dx.doi.org/10.2174/1573411014666181115121139.
Повний текст джерелаWu, Qiang, Lan Ying Xu, and Yong Mao. "Melted Characteristics Effects of Shielding Gas on Laser Deep Penetration Welding." Key Engineering Materials 620 (August 2014): 116–21. http://dx.doi.org/10.4028/www.scientific.net/kem.620.116.
Повний текст джерелаRamli, Muliadi, Nasrullah Idris, Kenichi Fukumoto, Hideaki Niki, Fujio Sakan, Tadashi Maruyama, Koo Hendrik Kurniawan, Tjung Jie Lie, and Kiichiro Kagawa. "Hydrogen analysis in solid samples by utilizing He metastable atoms induced by TEA CO2 laser plasma in He gas at 1 atm." Spectrochimica Acta Part B: Atomic Spectroscopy 62, no. 12 (December 2007): 1379–89. http://dx.doi.org/10.1016/j.sab.2007.10.007.
Повний текст джерелаCamacho, J. J., L. Díaz, M. Santos, and J. M. L. Poyato. "Time-resolved optical emission spectroscopic measurements of He plasma induced by a high-power CO2 pulsed laser." Spectrochimica Acta Part B: Atomic Spectroscopy 66, no. 1 (January 2011): 57–66. http://dx.doi.org/10.1016/j.sab.2010.12.001.
Повний текст джерелаLie, Zener Sukra, Ali Khumaeni, Tadashi Maruyama, Ken-ichi Fukumoto, Hideaki Niki, and Kiichiro Kagawa. "Hydrogen analysis in metal samples by selective detection method utilizing TEA CO2 laser-induced He gas plasma." Applied Physics A 101, no. 3 (July 21, 2010): 555–58. http://dx.doi.org/10.1007/s00339-010-5897-4.
Повний текст джерелаSun, Dawei, Yan Cai, Yonggui Wang, Yue Wu, and Yixiong Wu. "Effect of He–Ar ratio of side assisting gas on plasma 3D formation during CO2 laser welding." Optics and Lasers in Engineering 56 (May 2014): 41–49. http://dx.doi.org/10.1016/j.optlaseng.2013.12.009.
Повний текст джерелаDucatte, Gerald R., and Gary L. Long. "Effect of Carbon Dioxide and Hydrogen on Nonmetal Emission Intensities in a Helium Microwave-Induced Plasma." Applied Spectroscopy 48, no. 4 (April 1994): 493–501. http://dx.doi.org/10.1366/000370294775268866.
Повний текст джерелаde Morais Gouvêa Lima, Gabriela, Celina Faig Lima Carta, Aline Chiodi Borges, Thalita Mayumi Castaldelli Nishime, Cézar Augusto Villela da Silva, Marcelo Vidigal Caliari, Marcia Pinto Alves Mayer, Konstantin Georgiev Kostov, and Cristiane Yumi Koga-Ito. "Cold Atmospheric Pressure Plasma Is Effective against P. gingivalis (HW24D-1) Mature Biofilms and Non-Genotoxic to Oral Cells." Applied Sciences 12, no. 14 (July 19, 2022): 7247. http://dx.doi.org/10.3390/app12147247.
Повний текст джерелаHossack, A. C., K. D. Morgan, C. J. Hansen, and D. A. Sutherland. "A multi-chord, two-color interferometer using Hilbert transform phase detection for measuring electron density in spheromak plasmas." Review of Scientific Instruments 93, no. 9 (September 1, 2022): 093501. http://dx.doi.org/10.1063/5.0097459.
Повний текст джерелаTyczkowski, Jacek, Hanna Kierzkowska-Pawlak, Jan Sielski, and Iwona Krawczyk-Kłys. "Low-Temperature Plasma Modification of Styrene–Butadiene Block Copolymer Surfaces for Improved Adhesion—A Kinetic Approach." Polymers 12, no. 4 (April 17, 2020): 935. http://dx.doi.org/10.3390/polym12040935.
Повний текст джерелаMAGUNOV, A. I., A. YA FAENOV, I. YU SKOBELEV, T. A. PIKUZ, S. DOBOSZ, M. SCHMIDT, M. PERDRIX, et al. "X-ray spectra of fast ions generated from clusters by ultrashort laser pulses." Laser and Particle Beams 21, no. 1 (January 2003): 73–79. http://dx.doi.org/10.1017/s0263034603211149.
Повний текст джерелаDawei, Sun, Cai Yan, Wu Yue, Zhu Junjie, and Wu Yixiong. "Investigation into the effect of Ar ratio in He-Ar mixture side assisting gas on plasma properties during CO2 laser welding based on 3D reconstruction." Journal of Laser Applications 27, no. 1 (February 2015): 012001. http://dx.doi.org/10.2351/1.4898015.
Повний текст джерелаKhumaeni, Ali, Zener Sukra Lie, Hideaki Niki, Ken-ichi Fukumoto, Tadashi Maruyama, and Kiichiro Kagawa. "A novel double-pulse laser plasma spectroscopic technique for H analysis in metal samples utilizing transversely excited atmospheric-pressure CO2 laser-induced metastable He atoms." Optical Review 17, no. 3 (May 2010): 285–89. http://dx.doi.org/10.1007/s10043-010-0050-3.
Повний текст джерелаSun, Jintao, Qi Chen, Baoming Zhao, Caohui Guo, Jianyu Liu, Mingming Zhang, and Decai Li. "Temperature-dependent ion chemistry in nanosecond discharge plasma-assisted CH4 oxidation." Journal of Physics D: Applied Physics 55, no. 13 (January 4, 2022): 135203. http://dx.doi.org/10.1088/1361-6463/ac45ac.
Повний текст джерелаPhan, Van, Quan Nguyen, Vien Phan, Feyza Erenler, and Anastassios Pittas. "LBSUN292 Learning Lesson From A Case of Fulminant Type 1 Diabetes Mellitus Shortly After Pembrolizumab Treatment." Journal of the Endocrine Society 6, Supplement_1 (November 1, 2022): A291. http://dx.doi.org/10.1210/jendso/bvac150.600.
Повний текст джерелаTrinh, Ngo Binh, Giang Huong Tran, and Hoang Trung Hieu. "Penile porokeratosis mimicking annular lichen planus." Our Dermatology Online 13, no. 1 (January 3, 2022): 109–10. http://dx.doi.org/10.7241/ourd.20221.30.
Повний текст джерелаTakallooBakhtiari, Asieh, Julio Piedra Butina, Sheri A. Gillis Funderburk, and Hari V. Brundavanam. "Euglycemic DKA Associated With SGLT2 Inhibitors." Journal of the Endocrine Society 5, Supplement_1 (May 1, 2021): A382. http://dx.doi.org/10.1210/jendso/bvab048.778.
Повний текст джерелаDevine, Alma, and Silvia Bercovici. "PSAT007 Pheochromocytoma Presenting With Small Bowel Obstruction." Journal of the Endocrine Society 6, Supplement_1 (November 1, 2022): A89. http://dx.doi.org/10.1210/jendso/bvac150.183.
Повний текст джерелаCiesla, M., K. Kwasniak, and B. Kolarz. "AB0050 EVALUATION OF THE ASSOCIATION BETWEEN CIRCULATING NON-CODING RNA CIRC_0005567 AND DISEASE ACTIVITY IN PATIENTS WITH RHEUMATOID ARTHRITIS AND ITS BIOLOGICAL FUNCTION IN THE CELL LINE MODEL." Annals of the Rheumatic Diseases 82, Suppl 1 (May 30, 2023): 1204.1–1204. http://dx.doi.org/10.1136/annrheumdis-2023-eular.3667.
Повний текст джерелаGaboury, Damien, Dominique Genna, Jacques Trottier, Maxime Bouchard, Jérôme Augustin, and Kelly Malcolm. "The Perron Gold Deposit, Archean Abitibi Belt, Canada: Exceptionally High-Grade Mineralization Related to Higher Gold-Carrying Capacity of Hydrocarbon-Rich Fluids." Minerals 11, no. 10 (September 29, 2021): 1066. http://dx.doi.org/10.3390/min11101066.
Повний текст джерелаvan den Kerkhof, Alfons M., Graciela M. Sosa, Thomas Oberthür, Frank Melcher, Tobias Fusswinkel, Andreas Kronz, Klaus Simon, and István Dunkl. "The hydrothermal Waterberg platinum deposit, Mookgophong (Naboomspruit), South Africa. Part II: Quartz chemistry, fluid inclusions and geochronology." Mineralogical Magazine 82, no. 3 (April 12, 2018): 751–78. http://dx.doi.org/10.1180/mgm.2018.80.
Повний текст джерелаTerekhov, Vladimir A., Evgeny I. Terukov, Yury K. Undalov, Konstantin A. Barkov, Igor E. Zanin, Oleg V. Serbin, and Irina N. Trapeznikova. "Structural Rearrangement of a-SiOx:H Films with Pulse Photon Annealing." Kondensirovannye sredy i mezhfaznye granitsy = Condensed Matter and Interphases 22, no. 4 (December 15, 2020): 489–95. http://dx.doi.org/10.17308/kcmf.2020.22/3119.
Повний текст джерелаJeung, J.-H., Hak-Gue Lee, Lihong Teng, and W. A. Anderson. "Microwave Plasma CVD of Silicon Nanocrystalline and Amorphous Silicon as a Function of Deposition Conditions." MRS Proceedings 703 (2001). http://dx.doi.org/10.1557/proc-703-v9.25.
Повний текст джерелаKang, Su-hyuk, Min-Cheol Lee, Kook-Chul Moon, and Min-koo Han. "The Characteristics of Silicon Dioxide Deposited by Inductively Coupled Plasma Chemical Vapor Deposition at 150°C." MRS Proceedings 769 (2003). http://dx.doi.org/10.1557/proc-769-h6.18.
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