Статті в журналах з теми "RF Plasma CVD"
Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями
Ознайомтеся з топ-50 статей у журналах для дослідження на тему "RF Plasma CVD".
Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.
Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.
Переглядайте статті в журналах для різних дисциплін та оформлюйте правильно вашу бібліографію.
Hay, Stephen O., Ward C. Roman, and Meredith B. Colket. "CVD diamond deposition processes investigation: CARS diagnostics/modeling." Journal of Materials Research 5, no. 11 (November 1990): 2387–97. http://dx.doi.org/10.1557/jmr.1990.2387.
Повний текст джерелаYAMAMOTO, Masaoki, Masayuki FUKUI, and Takayuki SHIBATA. "Properties of carbonous films synthesized by RF plasma CVD." Journal of the Japan Society for Precision Engineering 55, no. 12 (1989): 2222–27. http://dx.doi.org/10.2493/jjspe.55.2222.
Повний текст джерелаMannan, Md Abdul, Masamitsu Nagano, Norie Hirao, and Yuji Baba. "Hexagonal BCN Films Prepared by RF Plasma-enhanced CVD." Chemistry Letters 37, no. 1 (January 5, 2008): 96–97. http://dx.doi.org/10.1246/cl.2008.96.
Повний текст джерелаTSAKADZE, E., K. OSTRIKOV, Z. TSAKADZE, N. JIANG, R. AHMAD, and S. XU. "CONTROL AND DIAGNOSTICS OF INDUCTIVELY COUPLED PLASMAS FOR CHEMICAL VAPOUR DEPOSITION ON NANOCOMPOSITE CARBON NITRIDE-BASED FILMS." International Journal of Modern Physics B 16, no. 06n07 (March 20, 2002): 1143–47. http://dx.doi.org/10.1142/s0217979202011019.
Повний текст джерелаInao, Takuro, Masahiko Kumadaki, Kohki Satoh, Masaki Yoshino, and Hidenori Itoh. "Deposition of Boron Nitride Films using RF Plasma CVD Method." IEEJ Transactions on Fundamentals and Materials 134, no. 6 (2014): 397–401. http://dx.doi.org/10.1541/ieejfms.134.397.
Повний текст джерелаKashem, Abul, Masaki Matsushita, and Shinzo Morita. "RF Plasma CVD of C-S Compound under Hydrogen Dilution." Journal of Photopolymer Science and Technology 13, no. 1 (2000): 47–49. http://dx.doi.org/10.2494/photopolymer.13.47.
Повний текст джерелаJie, Jiang, and Liu Chenzan. "Diamond-like carbon thin films prepared by rf-plasma CVD." Vacuum 42, no. 16 (1991): 1058. http://dx.doi.org/10.1016/0042-207x(91)91327-k.
Повний текст джерелаMITSUI, Akira, and Akio KATO. "Preparation of SiC Powders by CVD Method Using RF-Plasma." Journal of the Ceramic Association, Japan 94, no. 1089 (1986): 517–20. http://dx.doi.org/10.2109/jcersj1950.94.1089_517.
Повний текст джерелаMitomo, Tohru, Tomohiro Ohta, Hiroaki Sasaki, Kenichi Ohtsuka, and Yasuhiro Habu. "Deposition of amorphous-carbon films by RF plasma CVD method." KAGAKU KOGAKU RONBUNSHU 17, no. 2 (1991): 305–12. http://dx.doi.org/10.1252/kakoronbunshu.17.305.
Повний текст джерелаMitsui, Akira, and Akio Kato. "Preparation of SiC powders by CVD method using RF-plasma." International Journal of High Technology Ceramics 3, no. 1 (January 1987): 85. http://dx.doi.org/10.1016/0267-3762(87)90071-3.
Повний текст джерелаKim, Y. T., B. Hong, G. E. Jang, S. J. Suh, and D. H. Yoon. "Characterization of a-SiC:H Films Deposited by RF Plasma CVD." Crystal Research and Technology 37, no. 2-3 (February 2002): 219–24. http://dx.doi.org/10.1002/1521-4079(200202)37:2/3<219::aid-crat219>3.0.co;2-9.
Повний текст джерелаSuzuki, Keigo, and Kazunori Kijima. "Phase transformation of BaTiO3 nanoparticles synthesized by RF-plasma CVD." Journal of Alloys and Compounds 419, no. 1-2 (August 2006): 234–42. http://dx.doi.org/10.1016/j.jallcom.2005.08.075.
Повний текст джерелаJonas, Stanisława, Karol Kyzioł, Jerzy Lis, and Katarzyna Tkacz-Śmiech. "Stability of a-C:N:H Layers Deposited by RF Plasma Enhanced CVD." Solid State Phenomena 147-149 (January 2009): 738–43. http://dx.doi.org/10.4028/www.scientific.net/ssp.147-149.738.
Повний текст джерелаOng, Si Ci, Usman Ilyas, and Rajdeep Singh Rawat. "Nanofabrication using home-made RF plasma coupled chemical vapour deposition system." International Journal of Modern Physics: Conference Series 32 (January 2014): 1460342. http://dx.doi.org/10.1142/s2010194514603421.
Повний текст джерелаTsai, C., J. Nelson, W. W. Gerberich, J. Heberlein, and E. Pfender. "Metal reinforced thermal plasma diamond coatings." Journal of Materials Research 7, no. 8 (August 1992): 1967–69. http://dx.doi.org/10.1557/jmr.1992.1967.
Повний текст джерелаKURAMASU, Keizaburo, Tetsuhiro KORECHIKA, Masatoshi KITAGAWA, and Takashi HIRAO. "Mechanical Properties of SiOxNy Films Deposited by RF Plasma-Enhanced CVD." Journal of the Ceramic Society of Japan 105, no. 1218 (1997): 161–65. http://dx.doi.org/10.2109/jcersj.105.161.
Повний текст джерелаBerghaus, J. O., J. L. Meunier, and F. Gitzhofer. "Direct current bias effects in RF induction thermal plasma diamond CVD." IEEE Transactions on Plasma Science 30, no. 1 (February 2002): 442–49. http://dx.doi.org/10.1109/tps.2002.1003894.
Повний текст джерелаKim, Dong-Sun, and Tae-Won Kang. "Deposition of Amorphous Carbon Thin Films by Pulsed RF Plasma CVD." JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 38, no. 8 (2005): 593–99. http://dx.doi.org/10.1252/jcej.38.593.
Повний текст джерелаKejun, Liao, and Wang Wanlu. "Cubic Boron Nitride Films Formed by Thermally Assisted rf Plasma CVD." Chinese Physics Letters 12, no. 1 (January 1995): 58–60. http://dx.doi.org/10.1088/0256-307x/12/1/016.
Повний текст джерелаSachdev, H., and P. Scheid. "Formation of silicon carbide and silicon carbonitride by RF-plasma CVD." Diamond and Related Materials 10, no. 3-7 (March 2001): 1160–64. http://dx.doi.org/10.1016/s0925-9635(00)00575-6.
Повний текст джерелаBaldwin, S. K., T. G. Owano, and C. H. Kruger. "Growth rate studies of CVD diamond in an RF plasma torch." Plasma Chemistry and Plasma Processing 14, no. 4 (December 1994): 383–406. http://dx.doi.org/10.1007/bf01570203.
Повний текст джерелаItoh, Naomi, Kiyotaka Kato, and Isamu Kato. "Fabrication of sin thin films by rf biased microwave plasma CVD." Electronics and Communications in Japan (Part II: Electronics) 74, no. 7 (1991): 101–6. http://dx.doi.org/10.1002/ecjb.4420740711.
Повний текст джерелаShimizu, Hideki, Setsuo Nakao, Hiroshi Kusakabe, and Mikio Noda. "Microstructures of hydrogenated amorphous carbon films prepared by rf plasma CVD." Journal of Non-Crystalline Solids 114 (December 1989): 196–98. http://dx.doi.org/10.1016/0022-3093(89)90111-7.
Повний текст джерелаTakenaka, Kosuke, Yusuke Okumura, and Yuichi Setsuhara. "Characterization of inductively coupled RF plasmas for plasma-assisted mist CVD of ZnO films." Journal of Physics: Conference Series 379 (August 7, 2012): 012031. http://dx.doi.org/10.1088/1742-6596/379/1/012031.
Повний текст джерелаSaha, Sucharita, and Debajyoti Das. "Diamond-Like Carbon Thin Films from Low-Pressure and High-Density CH4 Plasma." IOP Conference Series: Materials Science and Engineering 1221, no. 1 (March 1, 2022): 012037. http://dx.doi.org/10.1088/1757-899x/1221/1/012037.
Повний текст джерелаFantoni, R., M. Giorgi, A. G. G. Moliterni, W. C. M. Berden, V. Lazic, O. Martini, and F. Polla Mattiot. "On-line gas-phase optical diagnostics in plasma CVD deposition of carbon films." Journal of Materials Research 7, no. 5 (May 1992): 1204–14. http://dx.doi.org/10.1557/jmr.1992.1204.
Повний текст джерелаCho, Chung-Woo, Byungyou Hong, and Young-Ze Lee. "Wear life evaluation of diamond-like carbon films deposited by microwave plasma-enhanced CVD and RF plasma-enhanced CVD method." Wear 259, no. 1-6 (July 2005): 789–94. http://dx.doi.org/10.1016/j.wear.2005.02.007.
Повний текст джерелаJeong, Chaehwan, Seongjae Boo, Minsung Jeon, and Koichi Kamisako. "Characterization of Intrinsic a-Si:H Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition for Solar Cell Applications." Journal of Nanoscience and Nanotechnology 7, no. 11 (November 1, 2007): 4169–73. http://dx.doi.org/10.1166/jnn.2007.064.
Повний текст джерелаFouad, Osama A., Nizam Uddin, Masaaki Yamazato, and Masamitsu Nagano. "RF-plasma enhanced CVD of TiSi2 thin films: effects of TiCl4 flow rate and RF power." Journal of Crystal Growth 257, no. 1-2 (September 2003): 153–60. http://dx.doi.org/10.1016/s0022-0248(03)01419-2.
Повний текст джерелаPrzetakiewicz, Karol, Katarzyna Tkacz-Śmiech, Piotr Boszkowicz, and Stanisława Jonas. "Polymer-Surface Modification with a-C:N:H Layers Plasma Chemically Deposited in RF CVD and MW CVD Systems." Solid State Phenomena 165 (June 2010): 159–64. http://dx.doi.org/10.4028/www.scientific.net/ssp.165.159.
Повний текст джерелаPark, Yonggyun, Pengzhan Liu, Seunghwan Lee, Jinill Cho, Eric Joo, Hyeong-U. Kim, and Taesung Kim. "Diagnosing Time-Varying Harmonics in Low-k Oxide Thin Film (SiOF) Deposition by Using HDP CVD." Sensors 23, no. 12 (June 14, 2023): 5563. http://dx.doi.org/10.3390/s23125563.
Повний текст джерелаSleptsova, Anastasia A., Sergey V. Chernykh, Dmitry A. Podgorny, and Ilya A. Zhilnikov. "Optimization of passivation in AlGaN/GaN heterostructure microwave transistor fabrication by ICP CVD." Modern Electronic Materials 6, no. 2 (July 15, 2020): 71–75. http://dx.doi.org/10.3897/j.moem.6.2.58860.
Повний текст джерелаSaitoh, Hidetoshi, Yoshihiko Hirotsu, and Yukio Ichinose. "Conditions for Formation of BN Film by Thermally Assisted RF Plasma CVD." Journal of the Japan Institute of Metals 54, no. 2 (1990): 186–92. http://dx.doi.org/10.2320/jinstmet1952.54.2_186.
Повний текст джерелаISHIGURO, Takashi, Hidetoshi SAITOH, and Yukio ICHINOSE. "Synthesis of cubic boron nitride film by an RF plasma CVD method." Journal of the Japan Society for Precision Engineering 53, no. 10 (1987): 1527–31. http://dx.doi.org/10.2493/jjspe.53.1527.
Повний текст джерелаKumadaki, Masahiko, Masaki Yoshino, Kohki Sato, and Hidenori Itoh. "Low-temperature Deposition of SiCN Thin Films by RF Plasma CVD Method." IEEJ Transactions on Fundamentals and Materials 134, no. 10 (2014): 538–44. http://dx.doi.org/10.1541/ieejfms.134.538.
Повний текст джерелаNAKAYAMA, Masatoshi, Kunihiro UEDA, Masanori SHIBAHARA, Kazunori MARUYAMA, and Kiichiro KAMATA. "Bias Effect on the Formation of Carbon Films by RF-Plasma CVD." Journal of the Ceramic Society of Japan 98, no. 1138 (1990): 597–600. http://dx.doi.org/10.2109/jcersj.98.597.
Повний текст джерелаOkuyama, Hideo, Kazuhiro Honnma, and Satoru Ohno. "Synthesis of Composite Metal Particles Modified UFP Using the RF-plasma CVD." Journal of the Japan Society of Powder and Powder Metallurgy 47, no. 9 (2000): 993–98. http://dx.doi.org/10.2497/jjspm.47.993.
Повний текст джерелаKim, Je-Deok, Hiroyuki Sugimura, and Osamu Takai. "Water-repellency of a-C:H films deposited by rf plasma-enhanced CVD." Vacuum 66, no. 3-4 (August 2002): 379–83. http://dx.doi.org/10.1016/s0042-207x(02)00158-6.
Повний текст джерелаGarci´a, A., V. Bellido, N. Flan˜o, and J. I. On˜ate. "Submicron characterization of B-C:H thin films produced by RF plasma CVD." Diamond and Related Materials 1, no. 2-4 (March 1992): 350–54. http://dx.doi.org/10.1016/0925-9635(92)90056-t.
Повний текст джерелаDehning, C., A. Holländer, A.-M. Leventi-Peetz, and K. Silmy. "Simulation of a Plasma Enhanced µ-jet-CVD Process." NAFEMS International Journal of CFD Case Studies 5 (April 2006): 51–56. http://dx.doi.org/10.59972/8ptzprew.
Повний текст джерелаGaisin, I. R., R. M. Valeeva, and N. I. Maksimov. "Cardiorenal continuum in hypertensive pregnancy." "Arterial’naya Gipertenziya" ("Arterial Hypertension") 15, no. 5 (October 28, 2009): 590–97. http://dx.doi.org/10.18705/1607-419x-2009-15-5-590-597.
Повний текст джерелаZarchi, Meysam, and Shahrokh Ahangarani. "A Comparison between Thin-Film Transistors Deposited by Hot-Wire Chemical Vapor Deposition and PECVD." Metallurgical and Materials Engineering 21, no. 1 (March 31, 2015): 7–14. http://dx.doi.org/10.30544/128.
Повний текст джерелаYasuoka, Yuki, Toru Harigai, Jun-Seok Oh, Hiroshi Furuta, Akimitsu Hatta, Tsuneo Suzuki, and Hidetoshi Saitoh. "Diamond-like carbon films from CO source gas by RF plasma CVD method." Japanese Journal of Applied Physics 54, no. 1S (November 10, 2014): 01AD04. http://dx.doi.org/10.7567/jjap.54.01ad04.
Повний текст джерелаShimada, Y., K. Kobayashi, N. Mutsukura, and Y. Machi. "Synthesis of diamond on substrate with mechanical treatment by RF plasma CVD method." Plasma Sources Science and Technology 2, no. 1 (February 1, 1993): 18–22. http://dx.doi.org/10.1088/0963-0252/2/1/005.
Повний текст джерелаMaemura, Yoko, Hiroshi Fujiyama, Tomoko Takagi, Ryo Hayashi, Wataru Futako, Michio Kondo, and Akihisa Matsuda. "Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD." Thin Solid Films 345, no. 1 (May 1999): 80–84. http://dx.doi.org/10.1016/s0040-6090(99)00100-5.
Повний текст джерелаDeb, B., B. Bhattacharjee, A. Ganguli, S. Chaudhuri, and A. K. Pal. "Boron nitride films synthesized by RF plasma CVD of borane–ammonia and nitrogen." Materials Chemistry and Physics 76, no. 2 (August 2002): 130–36. http://dx.doi.org/10.1016/s0254-0584(01)00524-7.
Повний текст джерелаNanbu, Toshikazu, Mikio Takemoto, and Toshitsugu Fukai. "Corrosion Resistance of TiN Coating Deposited on Quartz by RF Plasma-Assisted CVD." Zairyo-to-Kankyo 41, no. 11 (1992): 734–40. http://dx.doi.org/10.3323/jcorr1991.41.734.
Повний текст джерелаMATSUI, ISAO. "CVD Material Processing. Effect of O2 on Formation of Ar-O2 RF Plasma." KAGAKU KOGAKU RONBUNSHU 26, no. 6 (2000): 792–97. http://dx.doi.org/10.1252/kakoronbunshu.26.792.
Повний текст джерелаHozumi, Atsushi, Hiroki Sekoguchi, Nobuhisa Sugimoto, and Osamu Takai. "Transparent Water-repellent Films Containing Fluoro-alkyl Functions by RF Plasma-enhanced CVD." Transactions of the IMF 76, no. 2 (January 1998): 51–53. http://dx.doi.org/10.1080/00202967.1998.11871194.
Повний текст джерелаTóth, A., M. Mohai, T. Ujvári, and I. Bertóti. "Surface and nanomechanical properties of Si:C:H films prepared by RF plasma beam CVD." Diamond and Related Materials 14, no. 3-7 (March 2005): 954–58. http://dx.doi.org/10.1016/j.diamond.2005.01.017.
Повний текст джерела