Добірка наукової літератури з теми "Polycrystalline Oxides"
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Статті в журналах з теми "Polycrystalline Oxides"
Mukhin, N. V., K. G. Elanskaia, V. M. Pukhova, S. A. Tarasov, K. A. Vorotilov, M. V. Rudenko, and A. V. Ermachikhin. "Formation Mechanisms for Hetero-Phase Ferroelectric Films of Lead Zirconate Titanate." Journal of the Russian Universities. Radioelectronics, no. 2 (June 5, 2018): 26–36. http://dx.doi.org/10.32603/1993-8985-2018-21-2-26-36.
Повний текст джерелаPezzotti, Giuseppe. "Internal friction of polycrystalline ceramic oxides." Physical Review B 60, no. 6 (August 1, 1999): 4018–29. http://dx.doi.org/10.1103/physrevb.60.4018.
Повний текст джерелаVahidi, Hasti, Komal Syed, Huiming Guo, Xin Wang, Jenna Laurice Wardini, Jenny Martinez, and William John Bowman. "A Review of Grain Boundary and Heterointerface Characterization in Polycrystalline Oxides by (Scanning) Transmission Electron Microscopy." Crystals 11, no. 8 (July 28, 2021): 878. http://dx.doi.org/10.3390/cryst11080878.
Повний текст джерелаShang, H. M., Ying Wang, and Guo Zhong Cao. "Growth of Oxide Nanorod, Nanotube and Nanocable Arrays through Template-Based Sol Electrophoretic Deposition." Key Engineering Materials 336-338 (April 2007): 2122–27. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.2122.
Повний текст джерелаAfonin, N. N., and V. A. Logacheva. "Modeling of the reaction interdiffusion in the polycrystalline systems with limited component solubility." Industrial laboratory. Diagnostics of materials 85, no. 9 (September 28, 2019): 35–41. http://dx.doi.org/10.26896/1028-6861-2019-85-9-35-41.
Повний текст джерелаTsoga, A., D. Sotiropoulou, and P. Nikolopoulos. "Grain Boundary Grooving in Polycrystalline Oxides and Surface Diffusion Coefficient in Polycrystalline Alumina." Materials Science Forum 207-209 (February 1996): 565–68. http://dx.doi.org/10.4028/www.scientific.net/msf.207-209.565.
Повний текст джерелаHilson, Gabrielle, Keith R. Hallam, and Peter E. J. Flewitt. "The Measurement of Stresses within Oxides Produced on Austenitic and Ferritic Steels Using Raman Spectroscopy." Materials Science Forum 524-525 (September 2006): 957–62. http://dx.doi.org/10.4028/www.scientific.net/msf.524-525.957.
Повний текст джерелаLee, J. C., and C. Hu. "Polarity asymmetry of oxides grown on polycrystalline silicon." IEEE Transactions on Electron Devices 35, no. 7 (July 1988): 1063–70. http://dx.doi.org/10.1109/16.3365.
Повний текст джерелаPobol, Igor, Inessa Gontcharova, and Jaroslaw Rajczyk. "Nanostructured Metallic Coatings for Protection of Materials against Mould Attack." Advanced Materials Research 1020 (October 2014): 55–59. http://dx.doi.org/10.4028/www.scientific.net/amr.1020.55.
Повний текст джерелаNguyen, Viet Huong, Ulrich Gottlieb, Anthony Valla, Delfina Muñoz, Daniel Bellet, and David Muñoz-Rojas. "Electron tunneling through grain boundaries in transparent conductive oxides and implications for electrical conductivity: the case of ZnO:Al thin films." Materials Horizons 5, no. 4 (2018): 715–26. http://dx.doi.org/10.1039/c8mh00402a.
Повний текст джерелаДисертації з теми "Polycrystalline Oxides"
Song, Dengyuan Centre for Photovoltaic Engineering UNSW. "Zinc oxide TCOs (Transparent Conductive Oxides) and polycrystalline silicon thin-films for photovoltaic applications." Awarded by:University of New South Wales. Centre for Photovoltaic Engineering, 2005. http://handle.unsw.edu.au/1959.4/29371.
Повний текст джерелаVeitch, Charles D. "The preparation of polycrystalline mixed-metal oxide phases from metal-organic precursors." Thesis, Glasgow Caledonian University, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.335019.
Повний текст джерелаTran, Duc Khanh. "Experimental and numerical study of crack bridging in polycrystalline ceramics at room and elevated temperatures /." Thesis, Connect to this title online; UW restricted, 1999. http://hdl.handle.net/1773/7042.
Повний текст джерелаСоловйова, Олександра Омелянівна, Александра Емельяновна Соловьева, and Oleksandra Omelianivna Soloviova. "Simulation of the Mechanism of Defect Structure Formation in Polycrystalline Indium Oxide Under Ion Irradiation." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35411.
Повний текст джерелаFreeman, Craig John. "Use of sol chemistry and fine grained precursors in the production of controlled microstructural polycrystalline continuous oxide fibres." Thesis, University of Wolverhampton, 2005. http://hdl.handle.net/2436/111546.
Повний текст джерелаAl-Ahmadi, Ahmad Aziz. "Fabrication and characterization of ZnO film by spray pyrolysis and ZnO polycrystalline sintered pellets doped with rear earth ions." Ohio : Ohio University, 2003. http://www.ohiolink.edu/etd/view.cgi?ohiou1175017625.
Повний текст джерелаSaint, Martin Almeida Renato [Verfasser], Kurosch [Akademischer Betreuer] Rezwan, Kurosch [Gutachter] Rezwan, and Dietmar [Gutachter] Koch. "Long-term behavior of polycrystalline oxide fibers at elevated temperatures / Renato Saint Martin Almeida ; Gutachter: Kurosch Rezwan, Dietmar Koch ; Betreuer: Kurosch Rezwan." Bremen : Staats- und Universitätsbibliothek Bremen, 2017. http://d-nb.info/1149219955/34.
Повний текст джерелаSoloviova, A. E. "Modeling of the Mechanism of Influence of the Defect Structure in a Polycrystalline Scandi-um Oxide on the Properties of the Thermal and Electrical Effects in Vacuum." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35390.
Повний текст джерелаLee, Hung-Chang, and 李宏昌. "Characterization of Titanium Oxide as Gate Oxides on Polycrystalline Silicon and Amorphous Silicon Thin Film Transistors." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/njp27n.
Повний текст джерела國立中山大學
電機工程學系研究所
96
The purpose of this study is using titanium dioxide (TiO2) as gate oxide on thin film transistor (TFT) and discussed with their physical, chemical and electrical properties. Amorphous silicon (a-Si) and polycrystalline silicon (poly-Si) are used as substrates. The metal-organic chemical vapor deposition (MOCVD) and the liquid phase deposition (LPD) are used as the TiO2 growth methods. About the LPD growth method, ammonium hexafluoro-titanate ((NH4)2TiF6) and hexafluorotitanic acid (H2TiF6) are used as Ti sources. We are interested in two parts: (1) the growth mechanisms, physics properties, chemical properties and electrical properties of MOS structure; (2) the fabrication processes and electrical properties of devices. In the first part, we discuss the thin films characteristics on a-Si and poly-Si substrates. For the MOCVD growth method, the MOCVD-TiO2 film tends to form the poly structure. Poly structure has a higher dielectric constant, however, higher traps and dangling bonds also exist at the grain boundaries. Thus, poly structure of TiO2 film has a higher leakage current. For the LPD growth method, the film tends to form the amorphous structure. Amorphous structure has lower leakage current but also has lower dielectric constant. The film that grown from the (NH)2TiF6 source is called LPD-TiO2 film. The film that grown from the (NH)2TiF6 source is called LPD-TixSi(1-x)Oy film. Both films are incorporated with OH and F ions during the growth, the OH and F ions can be outgassed during the low temperature annealing process. In addition, appropriate F ions in the film can passivate the traps and dangling bonds. The low temperature treatments in N2 or O2 ambient and post-metallization annealing (PMA) are adopted to improve the film characteristics. On the other hand, the substrate is not a prefect structure (not a single structure). Thus the film may be influenced by substrate during the annealing treatment. In the second part, the electrical properties of TFT devices were discussed under the coplanar structure. There are several differences of the operation principle in TFT and MOSFET. A-Si and poly-Si are the un-doped substrates with many traps in the bulk. The channel should be occurred through the full depletion mode. The full depletion region is the substrate that under the gate electrode. Thus, the key point is kept the suitable thickness. Too thick, the channel can not appear. Too thin, the substrate may be over-etched. For ion implantation, due to the thinner active layer, the ion implantation energy should be lowed. In addition, the activation temperature and activation time should be adjusted suitable. We have fabricated the TFT devices with the MOCVD-TiO2 as gate oxide on poly-Si substrate. From the I-V characteristics, the Kink effect can be observed. However, the Ion/Ioff ratio is still low. We must further study how to increase the Ion/Ioff ratio.
CHEN, JUN-YUAN, and 陳俊元. "Study of the characteristics of the thermal oxides grown on singlecrystalline and polycrystalline silicon." Thesis, 1991. http://ndltd.ncl.edu.tw/handle/24852166599262742834.
Повний текст джерелаКниги з теми "Polycrystalline Oxides"
Center, NASA Glenn Research, ed. High temperature mechanical behavior of polycrystalline alumina from mixed nanometer and micrometer powders. [Cleveland, Ohio]: National Aeronautics and Space Administration, Glenn Research Center, 2001.
Знайти повний текст джерелаMunro, R. G. Elastic moduli data for polycrystalline oxide ceramics. Gaithersburg, MD: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 2002.
Знайти повний текст джерелаC, Goldsby Jon, and United States. National Aeronautics and Space Administration., eds. Tensile creep behavior of polycrystalline alumina fibers. [Washington, DC]: National Aeronautics and Space Administration, 1993.
Знайти повний текст джерелаC, Goldsby J., and United States. National Aeronautics and Space Administration., eds. Tensile creep behavior of polycrystalline alumina fibers. [Washington, DC]: National Aeronautics and Space Administration, 1993.
Знайти повний текст джерелаЧастини книг з теми "Polycrystalline Oxides"
Gordon, Ronald S. "Diffusional Creep Phenomena in Polycrystalline Oxides." In Point Defects in Minerals, 132–40. Washington, D. C.: American Geophysical Union, 2013. http://dx.doi.org/10.1029/gm031p0132.
Повний текст джерелаNedkov, I. "Magnetic Behaviour of Polycrystalline Magnetite Thin Films with Nano-Sized Crystallites." In Nano-Crystalline and Thin Film Magnetic Oxides, 43–58. Dordrecht: Springer Netherlands, 1999. http://dx.doi.org/10.1007/978-94-011-4493-3_3.
Повний текст джерелаZhang, Yue Bin, and Sean Li. "Ferromagnetic Homogeneous Polycrystalline Zn1-xCoxO Oxides." In Advances in Science and Technology, 2520–27. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908158-01-x.2520.
Повний текст джерелаYue, Xinyan, Rong Tu, Takashi Goto, and Hongqiang Ru. "Effect of Alkaline Earth Oxides on Dielectric Properties of Polycrystalline BaTi2 O5 ), Prepared by ARC Melting." In Ceramic Transactions Series, 485–91. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470640845.ch70.
Повний текст джерелаZhang, Yue Bin, Thirumany Sritharan, and Sean Li. "Isolated and Grouped Co Spins in Polycrystalline Zn1-xCoxO Oxides." In Advances in Science and Technology, 27–30. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908158-08-7.27.
Повний текст джерелаJayaraman, N., and Partha Rangaswamy. "Oxide Scale Stresses in Polycrystalline Cu/Cu2O System." In Advances in X-Ray Analysis, 421–32. Boston, MA: Springer US, 1997. http://dx.doi.org/10.1007/978-1-4615-5377-9_46.
Повний текст джерелаBarbier, Françoise, Jean Bernardini, Fernand Moya, and Michel Déchamps. "Grain Boundary Diffusion Artefacts in Polycrystalline Nickel Oxide Grown by High Temperature Oxidation." In Ceramic Microstructures ’86, 549–54. Boston, MA: Springer US, 1987. http://dx.doi.org/10.1007/978-1-4613-1933-7_56.
Повний текст джерелаYoshida, Hidehiro, Koji Morita, Byung Nam Kim, Keijiro Hiraga, Takahisa Yamamoto, Yuichi Ikuhara, and Taketo Sakuma. "High Temperature Plastic Flow and Ductility in Polycrystalline Oxide Ceramics: Doping Effect and Related Phenomena." In Advances in Science and Technology, 1620–25. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908158-01-x.1620.
Повний текст джерелаSalaün, A.-C., H. Lhermite, B. Fortin, and O. Bonnaud. "A 2-D modeling of Metal-Oxide-Polycrystalline Silicon-Silicon (MOPS) structures for the determination of interface state and grain boundary state distributions." In Simulation of Semiconductor Devices and Processes, 428–31. Vienna: Springer Vienna, 1995. http://dx.doi.org/10.1007/978-3-7091-6619-2_103.
Повний текст джерелаRHODES, W. H. "Phase Chemistry in the Development of Transparent Polycrystalline Oxides." In Phase Diagrams in Advanced Ceramics, 1–41. Elsevier, 1995. http://dx.doi.org/10.1016/b978-012341834-0/50002-7.
Повний текст джерелаТези доповідей конференцій з теми "Polycrystalline Oxides"
Klein, Andreas, Christoph Körber, André Wachau, Robert Schafranek, Yvonne Gassenbauer, Frank Säuberlich, and Gutlapalli Venkata Rao. "Surface Properties of Polycrystalline Transparent Conducting Oxides." In 2008 MRS Fall Meetin. Materials Research Society, 2008. http://dx.doi.org/10.1557/proc-1109-b01-06.
Повний текст джерелаDuncan, Donald D., Charles H. Lange, and David J. Fischer. "Imaging performance of crystalline and polycrystalline oxides." In San Dieg - DL Tentative, edited by Paul Klocek. SPIE, 1990. http://dx.doi.org/10.1117/12.22482.
Повний текст джерелаPierron, O. N., and C. L. Muhlstein. "Fatigue of polycrystalline silicon films with thin surface oxides." In MOEMS-MEMS 2006 Micro and Nanofabrication, edited by Danelle M. Tanner and Rajeshuni Ramesham. SPIE, 2006. http://dx.doi.org/10.1117/12.646468.
Повний текст джерелаEM. VAMVAKAS, V., D. N. KOUVATSOS, and D. DAVAZOGLOU. "POLYCRYSTALLINE SILICON THIN FILM TRANSISTORS HAVING GATE OXIDES DEPOSITED USING TEOS." In Papers Presented at MMN 2000. WORLD SCIENTIFIC, 2001. http://dx.doi.org/10.1142/9789812810861_0023.
Повний текст джерелаAvadhani, S. S., S. K. Viswanathan, and B. S. V. Gopalam. "Angle-resolved XPS studies of thermal oxides on polycrystalline GaAs thin films." In Madras - DL tentative. SPIE, 1992. http://dx.doi.org/10.1117/12.57034.
Повний текст джерелаAvadhani, S. S., S. K. Viswanathan, and B. S. V. Gopalam. "Growth and XPS depth profiling of thermal oxides on polycrystalline GaAs thin films." In Madras - DL tentative. SPIE, 1992. http://dx.doi.org/10.1117/12.56996.
Повний текст джерелаMunshi, Amit H., Adam H. Danielson, Anna Kindvall, Kurt Barth, and Walajabad Sampath. "Investigation of Sputtered Oxides and p+ Back-contact for Polycrystalline CdTe and CdSeTe Photovoltaics." In 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC). IEEE, 2018. http://dx.doi.org/10.1109/pvsc.2018.8548203.
Повний текст джерелаVasyliev, A. V., and I. A. Melnichuk. "Influence of surface potential pattern formed by destruction of weak links on the remagnetization of polycrystalline HTSC oxides." In 2012 IEEE International Conference on Oxide Materials for Electronic Engineering (OMEE). IEEE, 2012. http://dx.doi.org/10.1109/omee.2012.6464871.
Повний текст джерелаSouche, D., S. Fisson, V. Nguyen Van, G. Vuye, Y. Wang-Leprince, F. Abelès, and J. Rivory. "Relationship between mixed TiO2-SiO2 films and TiO2/SiO2 interfaces. A combination of spectroscopic ellipsometry and photoemission spectroscopy." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.tua.6.
Повний текст джерелаFonte, Matthew, and Anil Saigal. "Crystallographic Texture of Nitinol and its Effects on Macrophage." In ASME 2010 International Mechanical Engineering Congress and Exposition. ASMEDC, 2010. http://dx.doi.org/10.1115/imece2010-37109.
Повний текст джерелаЗвіти організацій з теми "Polycrystalline Oxides"
Munro, R. G. Elastic moduli data for polycrystalline oxide ceramics. Gaithersburg, MD: National Institute of Standards and Technology, 2002. http://dx.doi.org/10.6028/nist.ir.6853.
Повний текст джерелаBudai, J. D. Advanced Photon Source Activity Report 2002 at Argonne National Laboratory, Argonne, IL, December 2003 - contribution title:"Microdiffraction Study of Epitaxial Growth and Lattice Tilts in Oxide Films on Polycrystalline Metal Substrates". Office of Scientific and Technical Information (OSTI), March 2004. http://dx.doi.org/10.2172/885661.
Повний текст джерела