Статті в журналах з теми "Plasma immersion ion implantation"
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Mantese, Joseph V., Ian G. Brown, Nathan W. Cheung, and George A. Collins. "Plasma-Immersion Ion Implantation." MRS Bulletin 21, no. 8 (August 1996): 52–56. http://dx.doi.org/10.1557/s0883769400035727.
Thomae, Rainer W. "Plasma-immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 139, no. 1-4 (April 1998): 37–42. http://dx.doi.org/10.1016/s0168-583x(97)00952-x.
MIREAULT, N., and G. G. ROSS. "MODIFICATION OF WETTING PROPERTIES OF PMMA BY IMMERSION PLASMA ION IMPLANTATION." Surface Review and Letters 15, no. 04 (August 2008): 345–54. http://dx.doi.org/10.1142/s0218625x08011470.
Lieberman, M. A. "Model of plasma immersion ion implantation." Journal of Applied Physics 66, no. 7 (October 1989): 2926–29. http://dx.doi.org/10.1063/1.344172.
Kondyurin, A., V. Karmanov, and R. Guenzel. "Plasma immersion ion implantation of polyethylene." Vacuum 64, no. 2 (November 2001): 105–11. http://dx.doi.org/10.1016/s0042-207x(01)00381-5.
López-Callejas, R., R. Valencia-Alvarado, A. E. Muñoz-Castro, O. G. Godoy-Cabrera, and J. L. Tapia-Fabela. "Instrumentation for plasma immersion ion implantation." Review of Scientific Instruments 73, no. 12 (December 2002): 4277–82. http://dx.doi.org/10.1063/1.1517144.
Collins, G. A., R. Hutchings, and J. Tendys. "Plasma immersion ion implantation of steels." Materials Science and Engineering: A 139 (July 1991): 171–78. http://dx.doi.org/10.1016/0921-5093(91)90613-r.
Mändl, S., J. Brutscher, R. Günzel, and W. Möller. "Ion energy distribution in plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (September 1997): 234–37. http://dx.doi.org/10.1016/s0257-8972(97)00051-0.
Kenny, M. J., L. S. Wielunski, J. Tendys, and G. A. Collins. "A comparison of plasma immersion ion implantation with conventional ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 80-81 (June 1993): 262–66. http://dx.doi.org/10.1016/0168-583x(93)96120-2.
Yankov, Rossen A., and Stephan Mändl. "Plasma immersion ion implantation for silicon processing." Annalen der Physik 513, no. 4 (February 26, 2001): 279–98. http://dx.doi.org/10.1002/andp.20015130401.
Linder, B. P., and N. W. Cheung. "Plasma immersion ion implantation with dielectric substrates." IEEE Transactions on Plasma Science 24, no. 6 (1996): 1383–88. http://dx.doi.org/10.1109/27.553205.
Brutscher, Jörg, Reinhard Günzel, and Wolfhard Möller. "Sheath dynamics in plasma immersion ion implantation." Plasma Sources Science and Technology 5, no. 1 (February 1, 1996): 54–60. http://dx.doi.org/10.1088/0963-0252/5/1/007.
Chen, S. M., R. M. Gwilliam, and B. J. Sealy. "Computer simulation of Plasma Immersion Ion Implantation." Radiation Effects and Defects in Solids 141, no. 1-4 (June 1997): 149–59. http://dx.doi.org/10.1080/10420159708211566.
Zeng, Xuchu, Ricky K. Y. Fu, Dixon T. K. Kwok, and Paul K. Chu. "Quasi-direct current plasma immersion ion implantation." Applied Physics Letters 79, no. 19 (November 5, 2001): 3044–46. http://dx.doi.org/10.1063/1.1415404.
Oliveira, R. M., M. Ueda, J. O. Rossi, B. Diaz, and K. Baba. "Plasma Immersion Ion Implantation With Lithium Atoms." IEEE Transactions on Plasma Science 36, no. 5 (October 2008): 2572–76. http://dx.doi.org/10.1109/tps.2008.2004229.
Huber, P., G. Keller, J. W. Gerlach, S. Mändl, W. Assmann, and B. Rauschenbach. "Trench homogeneity in plasma immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 161-163 (March 2000): 1085–89. http://dx.doi.org/10.1016/s0168-583x(99)00825-3.
Schiller, T. L., D. Sheeja, D. R. McKenzie, D. G. McCulloch, D. S. P. Lau, S. Burn, and B. K. Tay. "Plasma immersion ion implantation of poly(tetrafluoroethylene)." Surface and Coatings Technology 177-178 (January 2004): 483–88. http://dx.doi.org/10.1016/s0257-8972(03)00916-2.
Blawert, C., and B. L. Mordike. "Industrial applications of plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (September 1997): 274–79. http://dx.doi.org/10.1016/s0257-8972(97)00060-1.
Möller, Wolfhard, Stefano Parascandola, Olaf Kruse, Reinhard Günzel, and Edgar Richter. "Plasma-immersion ion implantation for diffusive treatment." Surface and Coatings Technology 116-119 (September 1999): 1–10. http://dx.doi.org/10.1016/s0257-8972(99)00144-9.
Cheung, Nathan W. "Processing considerations with plasma immersion ion implantation." Surface and Coatings Technology 156, no. 1-3 (July 2002): 24–30. http://dx.doi.org/10.1016/s0257-8972(02)00068-3.
Kondyurin, A., P. Volodin, and J. Weber. "Plasma immersion ion implantation of Pebax polymer." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 251, no. 2 (October 2006): 407–12. http://dx.doi.org/10.1016/j.nimb.2006.06.026.
Zeng, Zhaoming, Ricky K. Y. Fu, Xiubo Tian, and Paul K. Chu. "Plasma immersion ion implantation of industrial gears." Surface and Coatings Technology 186, no. 1-2 (August 2004): 260–64. http://dx.doi.org/10.1016/j.surfcoat.2004.02.048.
Tian, X. B., K. Y. Fu, P. K. Chu, and S. Q. Yang. "Plasma immersion ion implantation of insulating materials." Surface and Coatings Technology 196, no. 1-3 (June 2005): 162–66. http://dx.doi.org/10.1016/j.surfcoat.2004.08.166.
Ueda, M., I. H. Tan, R. S. Dallaqua, J. O. Rossi, J. J. Barroso, and M. H. Tabacniks. "Aluminum plasma immersion ion implantation in polymers." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 206 (May 2003): 760–66. http://dx.doi.org/10.1016/s0168-583x(03)00844-9.
Günzel, R., and J. Brutscher. "Sheath dynamics in plasma immersion ion implantation." Surface and Coatings Technology 85, no. 1-2 (November 1996): 98–104. http://dx.doi.org/10.1016/0257-8972(96)02883-6.
Chu, Paul K. "Semiconductor applications of plasma immersion ion implantation." Plasma Physics and Controlled Fusion 45, no. 5 (March 26, 2003): 555–70. http://dx.doi.org/10.1088/0741-3335/45/5/304.
Cheung, N. W. "Plasma immersion ion implantation for semiconductor processing." Materials Chemistry and Physics 46, no. 2-3 (November 1996): 132–39. http://dx.doi.org/10.1016/s0254-0584(97)80006-5.
Chu, Paul K., and Nathan W. Cheung. "Microcavity engineering by plasma immersion ion implantation." Materials Chemistry and Physics 57, no. 1 (November 1998): 1–16. http://dx.doi.org/10.1016/s0254-0584(98)00211-9.
Ensinger, W. "Semiconductor processing by plasma immersion ion implantation." Materials Science and Engineering: A 253, no. 1-2 (September 1998): 258–68. http://dx.doi.org/10.1016/s0921-5093(98)00734-5.
Jones, Erin C., Barry P. Linder, and Nathan W. Cheung. "Plasma Immersion Ion Implantation for Electronic Materials." Japanese Journal of Applied Physics 35, Part 1, No. 2B (February 28, 1996): 1027–36. http://dx.doi.org/10.1143/jjap.35.1027.
Cheung, Nathan W. "Plasma immersion ion implantation for ULSI processing." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 55, no. 1-4 (April 1991): 811–20. http://dx.doi.org/10.1016/0168-583x(91)96285-s.
Yankov, Rossen A., and Stephan Mändl. "Plasma immersion ion implantation for silicon processing." Annalen der Physik 10, no. 4 (April 2001): 279–98. http://dx.doi.org/10.1002/1521-3889(200104)10:4<279::aid-andp279>3.0.co;2-r.
Chu, Paul K. "Progress in direct-current plasma immersion ion implantation and recent applications of plasma immersion ion implantation and deposition." Surface and Coatings Technology 229 (August 2013): 2–11. http://dx.doi.org/10.1016/j.surfcoat.2012.03.073.
Collins, G. A., R. Hutchings, K. T. Short, and J. Tendys. "Ion-assisted surface modification by plasma immersion ion implantation." Surface and Coatings Technology 103-104 (May 1998): 212–17. http://dx.doi.org/10.1016/s0257-8972(98)00395-8.
Tian, X. B., and Paul K. Chu. "Multiple ion-focusing effects in plasma immersion ion implantation." Applied Physics Letters 81, no. 20 (November 11, 2002): 3744–46. http://dx.doi.org/10.1063/1.1520716.
Cheng-Sen, Liu, Wang De-Zhen, Fan Yu-Jia, Zhang Nan, Guan Li, and Yao Yuan. "Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation." Chinese Physics Letters 27, no. 7 (July 2010): 075201. http://dx.doi.org/10.1088/0256-307x/27/7/075201.
Qian, X. Y., N. W. Cheung, M. A. Lieberman, R. Brennan, M. I. Current, and N. Jha. "Conformal implantation for trench doping with plasma immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 55, no. 1-4 (April 1991): 898–901. http://dx.doi.org/10.1016/0168-583x(91)96303-3.
Zhi-Neng Fan, Qing-Chuan Chen, P. K. Chu, and Chung Chan. "Low pressure plasma immersion ion implantation of silicon." IEEE Transactions on Plasma Science 26, no. 6 (1998): 1661–68. http://dx.doi.org/10.1109/27.747884.
Chen, S. M., R. M. Gwilliam, and B. J. Sealy. "MOS device fabrication via plasma immersion ion implantation." Solid-State Electronics 41, no. 4 (April 1997): 535–37. http://dx.doi.org/10.1016/s0038-1101(96)00218-3.
Tan, I. H., M. Ueda, R. S. Dallaqua, J. O. Rossi, A. F. Beloto, and E. Abramof. "Magnesium plasma immersion ion implantation on silicon wafers." Surface and Coatings Technology 169-170 (June 2003): 379–83. http://dx.doi.org/10.1016/s0257-8972(03)00053-7.
Shao, Jiqun, Erin C. Jones, and Nathan W. Cheung. "Shallow junction formation by plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (September 1997): 254–57. http://dx.doi.org/10.1016/s0257-8972(97)00055-8.
Davis, J., K. Short, R. Wuhrer, M. Phillips, and K. Whittle. "Plasma Immersion Ion Implantation of Stainless Steel 316." Microscopy and Microanalysis 17, S2 (July 2011): 1886–87. http://dx.doi.org/10.1017/s1431927611010300.
Thorwarth, G., S. Mändl, and B. Rauschenbach. "Plasma immersion ion implantation of cold-work steel." Surface and Coatings Technology 125, no. 1-3 (March 2000): 94–99. http://dx.doi.org/10.1016/s0257-8972(99)00605-2.
Mändl, S., D. Krause, G. Thorwarth, R. Sader, F. Zeilhofer, H. H. Horch, and B. Rauschenbach. "Plasma immersion ion implantation treatment of medical implants." Surface and Coatings Technology 142-144 (July 2001): 1046–50. http://dx.doi.org/10.1016/s0257-8972(01)01066-0.
Mändl, Stephan, and Darina Manova. "Modification of metals by plasma immersion ion implantation." Surface and Coatings Technology 365 (May 2019): 83–93. http://dx.doi.org/10.1016/j.surfcoat.2018.04.039.
Kondyurin, A., B. K. Gan, M. M. M. Bilek, D. R. McKenzie, K. Mizuno, and R. Wuhrer. "Argon plasma immersion ion implantation of polystyrene films." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 266, no. 7 (April 2008): 1074–84. http://dx.doi.org/10.1016/j.nimb.2008.02.063.
Ueda, M., M. M. Silva, C. M. Lepienski, P. C. Soares, J. A. N. Gonçalves, and H. Reuther. "High temperature plasma immersion ion implantation of Ti6Al4V." Surface and Coatings Technology 201, no. 9-11 (February 2007): 4953–56. http://dx.doi.org/10.1016/j.surfcoat.2006.07.074.
Yankov, R. A., N. Shevchenko, A. Rogozin, M. F. Maitz, E. Richter, W. Möller, A. Donchev, and M. Schütze. "Reactive plasma immersion ion implantation for surface passivation." Surface and Coatings Technology 201, no. 15 (April 2007): 6752–58. http://dx.doi.org/10.1016/j.surfcoat.2006.09.010.
Valcheva, E., S. Dimitrov, D. Manova, S. Mändl, and S. Alexandrova. "AlN nanoclusters formation by plasma ion immersion implantation." Surface and Coatings Technology 202, no. 11 (February 2008): 2319–22. http://dx.doi.org/10.1016/j.surfcoat.2007.08.051.
Collins, G. A., R. Hutchings, and J. Tendys. "Plasma immersion ion implantation—the role of diffusion." Surface and Coatings Technology 59, no. 1-3 (October 1993): 267–73. http://dx.doi.org/10.1016/0257-8972(93)90095-6.