Статті в журналах з теми "Plasma Circuits"
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Bierer, P., A. W. Holt, A. D. Bersten, J. L. Plummer, and A. H. Chalmers. "Haemolysis Associated with Continuous Venovenous Renal Replacement Circuits." Anaesthesia and Intensive Care 26, no. 3 (June 1998): 272–75. http://dx.doi.org/10.1177/0310057x9802600307.
Повний текст джерелаBerry, Lee A. "Plasma processing for integrated circuits." Journal of Fusion Energy 12, no. 4 (December 1993): 365–69. http://dx.doi.org/10.1007/bf01054814.
Повний текст джерелаMathad, G. S., D. W. Hess, and M. Meyyappan. "Plasma Processing for Silicon-Based Integrated Circuits." Electrochemical Society Interface 8, no. 2 (June 1, 1999): 34–40. http://dx.doi.org/10.1149/2.f07992if.
Повний текст джерелаYoshizaki, T., N. Tabuchi, W. Van Oeveren, A. Shibamiya, T. Koyama, and M. Sunamori. "PMEA Polymer-Coated PVC Tubing Maintains Anti-Thrombogenic Properties during in vitro Whole Blood Circulation." International Journal of Artificial Organs 28, no. 8 (August 2005): 834–40. http://dx.doi.org/10.1177/039139880502800809.
Повний текст джерелаRaveu, Nathalie, Gaetan Prigent, Thierry Callegari, and Henri Baudrand. "WCIP APPLIED TO ACTIVE PLASMA CIRCUITS." Progress In Electromagnetics Research Letters 21 (2011): 89–98. http://dx.doi.org/10.2528/pierl11010703.
Повний текст джерелаTikhonov, V. N., S. A. Gorbatov, I. A. Ivanov, and A. V. Tikhonov. "A new type of non-thermal atmospheric pressure plasma source based on a waveguide bridge." Journal of Physics: Conference Series 2064, no. 1 (November 1, 2021): 012131. http://dx.doi.org/10.1088/1742-6596/2064/1/012131.
Повний текст джерелаPai, Pradeep, and Massood Tabib-Azar. "Plasma interconnects and circuits for logic gates and computer sub-circuits." Applied Physics Letters 104, no. 24 (June 16, 2014): 244104. http://dx.doi.org/10.1063/1.4884421.
Повний текст джерелаLepla, Keith C., and Gary Horlick. "Photodiode Array Systems for Inductively Coupled Plasma-Atomic Emission Spectrometry." Applied Spectroscopy 43, no. 7 (September 1989): 1187–95. http://dx.doi.org/10.1366/0003702894203462.
Повний текст джерелаGottscho, Richard A., Maria E. Barone, and Joel M. Cook. "Use of Plasma Processing in Making Integrated Circuits and Flat-Panel Displays." MRS Bulletin 21, no. 8 (August 1996): 38–42. http://dx.doi.org/10.1557/s0883769400035697.
Повний текст джерелаMeyyappan, M., and T. R. Govindan. "Plasma Process Modeling for Integrated Circuits Manufacturing." VLSI Design 6, no. 1-4 (January 1, 1998): 409–12. http://dx.doi.org/10.1155/1998/27636.
Повний текст джерелаHu, Ye Lin, Zhi Wen Du, and Zhao Quan Chen. "Development of a Pulsed DC Power Supply for Generating Cold Plasma Jet." Advanced Materials Research 791-793 (September 2013): 1841–44. http://dx.doi.org/10.4028/www.scientific.net/amr.791-793.1841.
Повний текст джерелаLindberg, L. "High-frequency probe circuits for plasma diagnostics." Journal of Physics E: Scientific Instruments 18, no. 3 (March 1985): 214–17. http://dx.doi.org/10.1088/0022-3735/18/3/011.
Повний текст джерелаArmacost, M., P. D. Hoh, R. Wise, W. Yan, J. J. Brown, J. H. Keller, G. A. Kaplita, et al. "Plasma-etching processes for ULSI semiconductor circuits." IBM Journal of Research and Development 43, no. 1.2 (January 1999): 39–72. http://dx.doi.org/10.1147/rd.431.0039.
Повний текст джерелаBrunner, Robert J. "Oxygen-Plasma Cleaning of Hybrid Integrated Circuits." AT&T Technical Journal 71, no. 2 (March 4, 1992): 52–58. http://dx.doi.org/10.1002/j.1538-7305.1992.tb00158.x.
Повний текст джерелаSkogby, Maria, Lars Göran Friberg, Lilian Tengborn, Hans Wadenvik, and Karin Mellgren. "The Influence of a Serine Protease Inhibitor, Nafamostat Mesilate, on Plasma Coagulation, and Platelet Activation during Experimental Extracorporeal Life Support (ECLS)." Thrombosis and Haemostasis 79, no. 02 (1998): 342–47. http://dx.doi.org/10.1055/s-0037-1614989.
Повний текст джерелаLaw, V. J., and S. D. Anghel. "Compact atmospheric pressure plasma self-resonant drive circuits." Journal of Physics D: Applied Physics 45, no. 7 (February 1, 2012): 075202. http://dx.doi.org/10.1088/0022-3727/45/7/075202.
Повний текст джерелаHakki, A., and N. F. Kashapov. "Isolated Ignition circuits for High Power DC Plasma." Journal of Physics: Conference Series 1588 (July 2020): 012067. http://dx.doi.org/10.1088/1742-6596/1588/1/012067.
Повний текст джерелаYoshizako, Yuji, and Daisuke Matsuno. "Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes." Materials Science Forum 512 (April 2006): 239–42. http://dx.doi.org/10.4028/www.scientific.net/msf.512.239.
Повний текст джерелаVOSHCHENKOV, A. M. "PLASMA ETCHING PROCESSES FOR GIGAHERTZ SILICON INTEGRATED CIRCUITS (Part 2)." International Journal of High Speed Electronics and Systems 02, no. 01n02 (March 1991): 45–88. http://dx.doi.org/10.1142/s0129156491000041.
Повний текст джерелаLawson, D. Scott, Derek Eilers, Suzanne Osorio Lujan, Maria Bortot, and James Jaggers. "Hemolysis generation from a novel, linear positive displacement blood pump for cardiopulmonary bypass on a six kilogram piglet: a preliminary report." Perfusion 32, no. 4 (November 18, 2016): 264–68. http://dx.doi.org/10.1177/0267659116679881.
Повний текст джерелаWeerwind, P. W., F. H. Van Der Veen, T. Lindhout, D. S. De Jong, and P. T. Cahalan. "Ex Vivo Testing of Heparin-Coated Extracorporeal Circuits: Bovine Experiments." International Journal of Artificial Organs 21, no. 5 (May 1998): 291–98. http://dx.doi.org/10.1177/039139889802100511.
Повний текст джерелаJohnson, Raymond F., Norman Herman, Timothy L. Arney, Herbert Gonzalez, Vernetta H. Johnson, and John W. Downing. "Bupivacaine Transfer across the Human Term Placenta." Anesthesiology 82, no. 2 (February 1, 1995): 459–68. http://dx.doi.org/10.1097/00000542-199502000-00016.
Повний текст джерелаPrincipe, E. L., Navid Asadizanjani, Domenic Forte, Mark Tehranipoor, Robert Chivas, Michael DiBattista, and Scott Silverman. "Plasma FIB Deprocessing of Integrated Circuits from the Backside." EDFA Technical Articles 19, no. 4 (November 1, 2017): 36–44. http://dx.doi.org/10.31399/asm.edfa.2017-4.p036.
Повний текст джерелаZheng, K., D. Kowsari, N. J. Thobaben, X. Du, X. Song, S. Ran, E. A. Henriksen, D. S. Wisbey, and K. W. Murch. "Nitrogen plasma passivated niobium resonators for superconducting quantum circuits." Applied Physics Letters 120, no. 10 (March 7, 2022): 102601. http://dx.doi.org/10.1063/5.0082755.
Повний текст джерелаAleksandrov, A. F., M. V. Kuzelev, and A. A. Rukhadze. "On the theory of electric circuits with plasma elements." Journal of Communications Technology and Electronics 55, no. 7 (July 2010): 773–90. http://dx.doi.org/10.1134/s1064226910070089.
Повний текст джерелаHarding, Angus S., and John F. Hancock. "Using plasma membrane nanoclusters to build better signaling circuits." Trends in Cell Biology 18, no. 8 (August 2008): 364–71. http://dx.doi.org/10.1016/j.tcb.2008.05.006.
Повний текст джерелаBarcellona, Concetta, Arturo Buscarino, Claudia Corradino, and Luigi Fortuna. "Hybrid circuits to model and control fusion plasma instabilities." IFAC-PapersOnLine 51, no. 33 (2018): 27–31. http://dx.doi.org/10.1016/j.ifacol.2018.12.080.
Повний текст джерелаAllen, Stephen, William T. McBride, Ian S. Young, Simon W. MacGowan, Terence J. McMurray, Sachin Prabhu, S. Prasad Penugonda, and Marilyn A. Armstrong. "A clinical, renal and immunological assessment of Surface Modifying Additive Treated (SMART™) cardiopulmonary bypass circuits." Perfusion 20, no. 5 (September 2005): 255–62. http://dx.doi.org/10.1191/0267659105pf815oa.
Повний текст джерелаPeek, Giles J., Richard Scott, Hilliary M. Killer, and Richard K. Firmin. "An in vitro method for comparing biocompatibility of materials for extracorporeal circulation." Perfusion 17, no. 2 (March 2002): 125–32. http://dx.doi.org/10.1191/0267659102pf546oa.
Повний текст джерелаHerr, Quentin, Alex Braun, Andrew Brownfield, Ed Rudman, Dan Dosch, Trent Josephsen, and Anna Herr. "Measurement and data-assisted simulation of bit error rate in RQL circuits." Superconductor Science and Technology 35, no. 2 (January 14, 2022): 025017. http://dx.doi.org/10.1088/1361-6668/ac45a1.
Повний текст джерелаKocsis, E., A. Lukács, and I. Szalai. "Impact of plasma treatment on solderability of printed circuit boards." IOP Conference Series: Materials Science and Engineering 1246, no. 1 (August 1, 2022): 012013. http://dx.doi.org/10.1088/1757-899x/1246/1/012013.
Повний текст джерелаWile, A. G., E. A. Stemmer, P. A. Andrews, M. P. Murphy, I. S. Abramson, and S. B. Howell. "Pharmacokinetics of 5-fluorouracil during hyperthermic pelvic isolation-perfusion." Journal of Clinical Oncology 3, no. 6 (June 1985): 849–52. http://dx.doi.org/10.1200/jco.1985.3.6.849.
Повний текст джерелаSeo, Hojun, Sang Yeon Lee, Jeongsu Lee, Sunjin Kim, Onejae Sul, Hyungtak Seo, and Seung-Beck Lee. "Low-temperature n-type doping of insulating ultrathin amorphous indium oxide using H plasma-assisted annealing." Nanotechnology 33, no. 20 (February 21, 2022): 205201. http://dx.doi.org/10.1088/1361-6528/ac51ac.
Повний текст джерелаZushi, Takahiro, Hirotsugu Kojima, and Hiroshi Yamakawa. "One-chip analog circuits for a new type of plasma wave receiver on board space missions." Geoscientific Instrumentation, Methods and Data Systems 6, no. 1 (March 31, 2017): 159–67. http://dx.doi.org/10.5194/gi-6-159-2017.
Повний текст джерелаCovaci, Mihnea Antoniu, and Lorant Andras Szolga. "Low-Voltage Plasma Generator Based on Standing Wave Voltage Magnification." Sustainability 14, no. 5 (March 2, 2022): 2890. http://dx.doi.org/10.3390/su14052890.
Повний текст джерелаLi, Jie, Xiaoying He, Shen Xu, and Weifeng Sun. "A Review of Energy Recovery Circuits for Plasma Display Panels." IETE Technical Review 28, no. 1 (2011): 40. http://dx.doi.org/10.4103/0256-4602.74504.
Повний текст джерелаKwak, Sangshin. "An overview of entire driving circuits for plasma display panels." IEEE Transactions on Consumer Electronics 55, no. 4 (November 2009): 2114–21. http://dx.doi.org/10.1109/tce.2009.5373776.
Повний текст джерелаVoshchenkov, Alexander M. "Plasma etching: An enabling technology for gigahertz silicon integrated circuits." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11, no. 4 (July 1993): 1211–20. http://dx.doi.org/10.1116/1.578495.
Повний текст джерелаRiley, Paul E. "Plasma Etching of Aluminum Metallizations for Ultralarge Scale Integrated Circuits." Journal of The Electrochemical Society 140, no. 5 (May 1, 1993): 1518–22. http://dx.doi.org/10.1149/1.2221589.
Повний текст джерелаScholz, Tim, Rigmor Solberg, Cecilie Okkenhaug, Vibeke Videm, Michael J. Gallimore, Øystein Mathisen, Tom E. Mollnes, et al. "The significance of heparin-coated veno-venous bypass circuits in liver transplantation." Perfusion 17, no. 1 (January 2002): 45–50. http://dx.doi.org/10.1191/0267659102pf523oa.
Повний текст джерелаOngaro, C., A. Betti, B. Zardin, V. Siciliani, L. Orazi, J. Bertacchini, and M. Borghi. "An Alternative Solution for Microfluidic Chip Fabrication." Journal of Physics: Conference Series 2385, no. 1 (December 1, 2022): 012029. http://dx.doi.org/10.1088/1742-6596/2385/1/012029.
Повний текст джерелаPeng, Shanglong, Desheng Wang, Fuhua Yang, Zhanguo Wang, and Fei Ma. "Grown Low-Temperature Microcrystalline Silicon Thin Film by VHF PECVD for Thin Films Solar Cell." Journal of Nanomaterials 2015 (2015): 1–5. http://dx.doi.org/10.1155/2015/327596.
Повний текст джерелаPopović, I., and M. Zlatanović. "Equivalent Circuits of Unipolar Pulsed Plasma System for Electrical and Optical Signal Analysis." Materials Science Forum 555 (September 2007): 89–94. http://dx.doi.org/10.4028/www.scientific.net/msf.555.89.
Повний текст джерелаLee, Jeongsu, and Sangjeen Hong. "Dual-Frequency RF Impedance Matching Circuits for Semiconductor Plasma Etch Equipment." Electronics 10, no. 17 (August 27, 2021): 2074. http://dx.doi.org/10.3390/electronics10172074.
Повний текст джерелаKornev, V. I., N. M. Kalinina, D. A. Shelukhin, and O. N. Startseva. "Fibrinolysis system indicators during aorto-coronary bypass surgery in terms of cardiopulmonary bypass with minimized circuit." Medical alphabet 1, no. 4 (February 6, 2019): 58–65. http://dx.doi.org/10.33667/2078-5631-2019-1-4(379)-58-62.
Повний текст джерелаMurmantsev, A., A. Veklich, V. Boretskij, A. Shapovalov, and A. Kalenyuk. "Optical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma." PLASMA PHYSICS AND TECHNOLOGY 6, no. 1 (2019): 87–90. http://dx.doi.org/10.14311/ppt.2019.1.87.
Повний текст джерелаNikitović, Željka, O. Šašić, Z. Lj Petrović, G. N. Malović, A. Strinić, S. Dujko, Z. Raspopović, and M. Radmilović-Radjenović. "Data Bases for Modeling Plasma Devices for Processing of Integrated Circuits." Materials Science Forum 453-454 (May 2004): 15–20. http://dx.doi.org/10.4028/www.scientific.net/msf.453-454.15.
Повний текст джерелаMillard, D. L., K. R. Umstadter, and R. C. Block. "Noncontact testing of circuits via a laser-induced plasma electrical pathway." IEEE Design & Test of Computers 9, no. 1 (March 1992): 55–63. http://dx.doi.org/10.1109/54.124517.
Повний текст джерелаThompson, Kyle, Jennifer Zirnheld, Kevin Burke, and Shoshanna N. Zucker. "Comparison of circuits for generating nonthermal plasma to treat melanoma cells." IEEE Transactions on Dielectrics and Electrical Insulation 24, no. 4 (2017): 2241–47. http://dx.doi.org/10.1109/tdei.2017.006288.
Повний текст джерелаJung, Sun-Tae, Hyung-Seung Song, Dong-Su Kim, and Hyoun-Soo Kim. "Inductively coupled plasma etching of SiO2 layers for planar lightwave circuits." Thin Solid Films 341, no. 1-2 (March 1999): 188–91. http://dx.doi.org/10.1016/s0040-6090(98)01553-3.
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