Статті в журналах з теми "Photolithographie UV"
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Ballandras, S., and D. Hauden. "Applications aux microtechniques de la photolithographie profonde par UV et par rayonnement synchrotron." Annales de Physique 19 (October 1994): C1–73—C1–85. http://dx.doi.org/10.1051/anphys/1994022.
Повний текст джерелаCasalboni, M., L. Dominici, V. Foglietti, F. Michelotti, E. Orsini, C. Palazzesi, F. Stella, and P. Prosposito. "Bragg Grating Optical Filters by UV Nanoimprinting." Journal of Nanomaterials 2012 (2012): 1–5. http://dx.doi.org/10.1155/2012/186429.
Повний текст джерелаGuijt, Rosanne M., and Michael C. Breadmore. "Maskless photolithography using UV LEDs." Lab on a Chip 8, no. 8 (2008): 1402. http://dx.doi.org/10.1039/b800465j.
Повний текст джерелаNoniewicz, Konrad, Zbigniew K. Brzozowski, and Irmina Zadrozna. "UV-sensitive polyarylates as photolithographic emulsions." Journal of Applied Polymer Science 60, no. 7 (May 16, 1996): 1071–82. http://dx.doi.org/10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3.
Повний текст джерелаMagklaras, Aris, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, and Alexios Birbas. "A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography." Information 14, no. 8 (July 28, 2023): 428. http://dx.doi.org/10.3390/info14080428.
Повний текст джерелаGordillo, H., I. Suárez, R. Abargues, P. Rodríguez-Cantó, S. Albert, and J. P. Martínez-Pastor. "Polymer/QDs Nanocomposites for Waveguiding Applications." Journal of Nanomaterials 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/960201.
Повний текст джерелаWu, Chun-Ying, Heng Hsieh, and Yung-Chun Lee. "Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask." Micromachines 10, no. 8 (August 18, 2019): 547. http://dx.doi.org/10.3390/mi10080547.
Повний текст джерелаCritchley, Kevin, Lixin Zhang, Hitoshi Fukushima, Masaya Ishida, Tatsuya Shimoda, Richard J. Bushby, and Stephen D. Evans. "Soft-UV Photolithography using Self-Assembled Monolayers." Journal of Physical Chemistry B 110, no. 34 (August 2006): 17167–74. http://dx.doi.org/10.1021/jp0630370.
Повний текст джерелаHoriuchi, S., T. Fujita, T. Hayakawa, and Y. Nakao. "Micropatterning of Metal Nanoparticles via UV Photolithography." Advanced Materials 15, no. 17 (September 3, 2003): 1449–52. http://dx.doi.org/10.1002/adma.200305270.
Повний текст джерелаZaki, M., Uda Hashim, Mohd Khairuddin Md Arshad, M. Nurfaiz, M. F. M. Fathil, A. H. Azman та R. M. Ayub. "Optimization on Conventional Photolithography Process of 0.98 μm Gap Design for Micro Gap Biosensor Application". Applied Mechanics and Materials 754-755 (квітень 2015): 524–29. http://dx.doi.org/10.4028/www.scientific.net/amm.754-755.524.
Повний текст джерелаLowe, Jimmy, Carl Bartels, and Steven Holdcroft. "Synthesis and properties of a sterically encumbered poly(thienylene vinylene): poly[E-1,2-(4,4prime-dihexyl-2,2prime-dithienyl)ethylene]." Canadian Journal of Chemistry 76, no. 11 (November 1, 1998): 1524–29. http://dx.doi.org/10.1139/v98-110.
Повний текст джерелаGoodall, F., RA Lawes, and PH Sharp. "Excimer lasers as deep UV sources for photolithographic system." Microelectronic Engineering 5, no. 1-4 (December 1986): 445–52. http://dx.doi.org/10.1016/0167-9317(86)90075-4.
Повний текст джерелаRoth, S., L. Dellmann, G.-A. Racine, and N. F. de Rooij. "High aspect ratio UV photolithography for electroplated structures." Journal of Micromechanics and Microengineering 9, no. 2 (January 1, 1999): 105–8. http://dx.doi.org/10.1088/0960-1317/9/2/001.
Повний текст джерелаMontague, Martha F., and Craig J. Hawker. "Secondary Patterning of UV Imprint Features by Photolithography." Chemistry of Materials 19, no. 3 (February 2007): 526–34. http://dx.doi.org/10.1021/cm0622102.
Повний текст джерелаLamprecht, B., E. Kraker, G. Weirum, H. Ditlbacher, G. Jakopic, G. Leising, and J. R. Krenn. "Organic optoelectronic device fabrication using standard UV photolithography." physica status solidi (RRL) – Rapid Research Letters 2, no. 1 (January 2008): 16–18. http://dx.doi.org/10.1002/pssr.200701250.
Повний текст джерелаTam, Joyce, and Ozlem Yasar. "Multi Material 3D Scaffold Printing with Maskless Photolithography." MRS Advances 2, no. 24 (2017): 1303–8. http://dx.doi.org/10.1557/adv.2017.21.
Повний текст джерелаAraki, Hitoshi, Akira Shimada, Hisashi Ogasawara, Masaya Jukei, Takenori Fujiwara, and Masao Tomikawa. "Low Temperature Curable Low Dk & Df Polyimide for Antenna in Package." International Symposium on Microelectronics 2021, no. 1 (October 1, 2021): 000130–35. http://dx.doi.org/10.4071/1085-8024-2021.1.000130.
Повний текст джерелаTyagi, Pawan, Edward Friebe, Beachrhell Jacques, Tobias Goulet, Stanley Travers, and Francisco J. Garcia-Moreno. "Taguchi Design of Experiment Enabling the Reduction of Spikes on the Sides of Patterned Thin Films for Tunnel Junction Fabrication." MRS Advances 2, no. 52 (2017): 3025–30. http://dx.doi.org/10.1557/adv.2017.456.
Повний текст джерелаKaltashov, Alexander, Prabu Karthick Parameshwar, Nicholas Lin, and Christopher Moraes. "Accessible, large-area, uniform dose photolithography using a moving light source." Journal of Micromechanics and Microengineering 32, no. 2 (December 20, 2021): 027001. http://dx.doi.org/10.1088/1361-6439/ac4005.
Повний текст джерелаLin, Hung Yi, Yong Shan Sun, Shih Liang Chen, and Mao Kuo Wei. "Microlens Array Fabrication by 3D Diffuser Lithography for Light Enhancement of Organic Light-Emitting Devices." Key Engineering Materials 625 (August 2014): 430–36. http://dx.doi.org/10.4028/www.scientific.net/kem.625.430.
Повний текст джерелаReynolds, David Eun, Olivia Lewallen, George Galanis, and Jina Ko. "A Customizable and Low-Cost Ultraviolet Exposure System for Photolithography." Micromachines 13, no. 12 (December 1, 2022): 2129. http://dx.doi.org/10.3390/mi13122129.
Повний текст джерелаLIAO, K. J., W. L. WANG, C. Z. CAI, X. S. WANG, and C. Y. KONG. "UV PHOTODETECTORS OF c-BN FILMS." International Journal of Modern Physics B 16, no. 06n07 (March 20, 2002): 1115–19. http://dx.doi.org/10.1142/s0217979202010968.
Повний текст джерелаToyama, Yoshisuke, and Hirokazu Ikeda. "13‐2: Invited Paper: Advanced Patterning Method Exceeding a Limitation of Lithography with Resolution Enhancement Technology (RET)." SID Symposium Digest of Technical Papers 54, no. 1 (June 2023): 158–61. http://dx.doi.org/10.1002/sdtp.16513.
Повний текст джерелаBeck, Anthony, Franziska Obst, Mathias Busek, Stefan Grünzner, Philipp Mehner, Georgi Paschew, Dietmar Appelhans, Brigitte Voit, and Andreas Richter. "Hydrogel Patterns in Microfluidic Devices by Do-It-Yourself UV-Photolithography Suitable for Very Large-Scale Integration." Micromachines 11, no. 5 (May 2, 2020): 479. http://dx.doi.org/10.3390/mi11050479.
Повний текст джерелаPrashad, Ramesh, and Ozlem Yasar. "Three-Dimensional Scaffold Fabrication with Inverse Photolithography." MRS Advances 2, no. 19-20 (December 15, 2016): 1071–75. http://dx.doi.org/10.1557/adv.2016.620.
Повний текст джерелаSuwandi, Dedi, Yudan Whulanza, and Jos Istiyanto. "Visible Light Maskless Photolithography for Biomachining Application." Applied Mechanics and Materials 493 (January 2014): 552–57. http://dx.doi.org/10.4028/www.scientific.net/amm.493.552.
Повний текст джерелаSEKIGUCHI, Ten, Ryo ICHIGE, Hidetaka UENO, and Takaaki SUZUKI. "Shape Evaluation of UV-PDMS Microstructures Made by Using Photolithography." Proceedings of the Conference on Information, Intelligence and Precision Equipment : IIP 2022 (2022): IIP1R1—E06. http://dx.doi.org/10.1299/jsmeiip.2022.iip1r1-e06.
Повний текст джерелаLiu, Junbo, Shaolin Zhou, Song Hu, Hongtao Gao, Yu He, and Yiguang Cheng. "Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF." IEEE Photonics Technology Letters 27, no. 20 (October 15, 2015): 2201–4. http://dx.doi.org/10.1109/lpt.2015.2456184.
Повний текст джерелаHemanth, Suhith, Thomas A. Anhøj, Claudia Caviglia, and Stephan S. Keller. "Suspended microstructures of epoxy based photoresists fabricated with UV photolithography." Microelectronic Engineering 176 (May 2017): 40–44. http://dx.doi.org/10.1016/j.mee.2017.01.026.
Повний текст джерелаLu, Yang, Jinbao Guo, Hao Wang, and Jie Wei. "Flexible Bistable Smectic-A Liquid Crystal Device Using Photolithography and Photoinduced Phase Separation." Advances in Condensed Matter Physics 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/843264.
Повний текст джерелаFantino, Erika, Alessandra Vitale, Marzia Quaglio, Matteo Cocuzza, Candido F. Pirri, and Roberta Bongiovanni. "Blue and UV combined photolithographic polymerization for the patterning of thick structures." Chemical Engineering Journal 267 (May 2015): 65–72. http://dx.doi.org/10.1016/j.cej.2014.12.088.
Повний текст джерелаGupta, Ishi, Manika Choudhury, G. Harish Gnanasambanthan, and Debashis Maji. "Optimization of Microstructure Patterning for Flexible Bioelectronics Application." International Journal of Electrical and Electronics Research 11, no. 3 (September 20, 2023): 738–42. http://dx.doi.org/10.37391/ijeer.110315.
Повний текст джерелаKang, Myeongwoo, Jae Hwan Byun, Sangcheol Na, and Noo Li Jeon. "Fabrication of functional 3D multi-level microstructures on transparent substrates by one step back-side UV photolithography." RSC Advances 7, no. 22 (2017): 13353–61. http://dx.doi.org/10.1039/c6ra28812j.
Повний текст джерелаSun, Ke, Gai Wu, Kang Liang, Bin Sun, and Jian Wang. "Investigation into Photolithography Process of FPCB with 18 µm Line Pitch." Micromachines 14, no. 5 (May 10, 2023): 1020. http://dx.doi.org/10.3390/mi14051020.
Повний текст джерелаNaggay, Benjamin K., Kerstin Frey, Markus Schneider, Kiriaki Athanasopulu, Günter Lorenz, and Ralf Kemkemer. "Low-cost photolithography system for cell biology labs." Current Directions in Biomedical Engineering 7, no. 2 (October 1, 2021): 550–53. http://dx.doi.org/10.1515/cdbme-2021-2140.
Повний текст джерелаLi, Bo. "Low-stress ultra-thick SU-8 UV photolithography process for MEMS." Journal of Micro/Nanolithography, MEMS, and MOEMS 4, no. 4 (October 1, 2005): 043008. http://dx.doi.org/10.1117/1.2117108.
Повний текст джерелаKim, Pan Kyeom, Sung-Il Chung, Tae-Gyu Ha, and Myung Yung Jeong. "The Fabrication of a Cylindrical Nano Mold Based on UV Photolithography." Science of Advanced Materials 12, no. 3 (March 1, 2020): 407–11. http://dx.doi.org/10.1166/sam.2020.3652.
Повний текст джерелаWhitfield, Michael D., Stuart P. Lansley, Olivier Gaudin, Robert D. McKeag, Nadeem Rizvi, and Richard B. Jackman. "Diamond photodetectors for next generation 157-nm deep-UV photolithography tools." Diamond and Related Materials 10, no. 3-7 (March 2001): 693–97. http://dx.doi.org/10.1016/s0925-9635(00)00518-5.
Повний текст джерелаBing, Chu Yih, Ajay Achath Mohanan, Tridib Saha, Ramakrishnan Nagasundara Ramanan, R. Parthiban, and N. Ramakrishnan. "Microfabrication of surface acoustic wave device using UV LED photolithography technique." Microelectronic Engineering 122 (June 2014): 9–12. http://dx.doi.org/10.1016/j.mee.2014.03.011.
Повний текст джерелаShao, Dongbing, and Shaochen Chen. "Surface plasmon assisted contact scheme nanoscale photolithography using an UV lamp." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 26, no. 1 (2008): 227. http://dx.doi.org/10.1116/1.2834688.
Повний текст джерелаSekiguchi, Ten, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi, and Takaaki Suzuki. "UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials." Sensors and Materials 35, no. 6 (June 27, 2023): 1995. http://dx.doi.org/10.18494/sam4351.
Повний текст джерелаHuang, Wenhai, Taige Liu, Zhe Wang, Xiangdong Yuan, Bo Zhang, Chai Hu, Kewei Liu, Jiashuo Shi, and Xinyu Zhang. "Flexible refractive and diffractive micro-optical films shaped by fitting aspherical microprofiles with featured aperture and depth and their spatial arrangement for imaging applications." Journal of Vacuum Science & Technology B 40, no. 2 (March 2022): 022804. http://dx.doi.org/10.1116/6.0001586.
Повний текст джерелаNothdurft, Philipp, Jörg Schauberger, Gisbert Riess, and Wolfgang Kern. "Preparation of a Water-Based Photoreactive Azosulphonate-Doped Poly(Vinyl Alcohol) and the Investigation of Its UV Response." Polymers 11, no. 1 (January 18, 2019): 169. http://dx.doi.org/10.3390/polym11010169.
Повний текст джерелаLiang, Banglong, Zili Wang, Cheng Qian, Yi Ren, Bo Sun, Dezhen Yang, Zhou Jing, and Jiajie Fan. "Investigation of Step-Stress Accelerated Degradation Test Strategy for Ultraviolet Light Emitting Diodes." Materials 12, no. 19 (September 25, 2019): 3119. http://dx.doi.org/10.3390/ma12193119.
Повний текст джерелаHu, Haikun, Zhou Lu, Jiasheng Li, and Zongtao Li. "P‐11.3: Manufacturing Quantum Dot Pixel Array via Self‐Assembling on Hydrophobic‐Hydrophilic Transformation Substrate." SID Symposium Digest of Technical Papers 54, S1 (April 2023): 836–40. http://dx.doi.org/10.1002/sdtp.16428.
Повний текст джерелаKasi, Dhanesh G., Mees N. S. de Graaf, Paul A. Motreuil-Ragot, Jean-Phillipe M. S. Frimat, Michel D. Ferrari, Pasqualina M. Sarro, Massimo Mastrangeli, Arn M. J. M. van den Maagdenberg, Christine L. Mummery, and Valeria V. Orlova. "Rapid Prototyping of Organ-on-a-Chip Devices Using Maskless Photolithography." Micromachines 13, no. 1 (December 29, 2021): 49. http://dx.doi.org/10.3390/mi13010049.
Повний текст джерелаWu, Yu, and Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities." Highlights in Science, Engineering and Technology 5 (July 7, 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Повний текст джерелаNiu, Xi-Zhi, Richard D. Pepel, Rodrigo Paniego, Jim A. Field, Jon Chorover, Leif Abrell, A. Eduardo Sáez, and Reyes Sierra-Alvarez. "Photochemical fate of sulfonium photoacid generator cations under photolithography relevant UV irradiation." Journal of Photochemistry and Photobiology A: Chemistry 416 (July 2021): 113324. http://dx.doi.org/10.1016/j.jphotochem.2021.113324.
Повний текст джерелаYasar, Ozlem, and Binil Starly. "Fabrication of Lindenmayer System-Based Designed Engineered Scaffolds Using UV-Maskless Photolithography." MRS Advances 1, no. 11 (2016): 749–54. http://dx.doi.org/10.1557/adv.2016.223.
Повний текст джерелаThackeray, James W., George W. Orsula, Dianne Canistro, and Amanda K. Berry. "Evaluation of deep UV ANR photoresists for 248.4 nm. excimer laser photolithography." Journal of Photopolymer Science and Technology 2, no. 3 (1989): 429–43. http://dx.doi.org/10.2494/photopolymer.2.429.
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