Добірка наукової літератури з теми "Photolithographie UV"
Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями
Ознайомтеся зі списками актуальних статей, книг, дисертацій, тез та інших наукових джерел на тему "Photolithographie UV".
Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.
Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.
Статті в журналах з теми "Photolithographie UV"
Ballandras, S., and D. Hauden. "Applications aux microtechniques de la photolithographie profonde par UV et par rayonnement synchrotron." Annales de Physique 19 (October 1994): C1–73—C1–85. http://dx.doi.org/10.1051/anphys/1994022.
Повний текст джерелаCasalboni, M., L. Dominici, V. Foglietti, F. Michelotti, E. Orsini, C. Palazzesi, F. Stella, and P. Prosposito. "Bragg Grating Optical Filters by UV Nanoimprinting." Journal of Nanomaterials 2012 (2012): 1–5. http://dx.doi.org/10.1155/2012/186429.
Повний текст джерелаGuijt, Rosanne M., and Michael C. Breadmore. "Maskless photolithography using UV LEDs." Lab on a Chip 8, no. 8 (2008): 1402. http://dx.doi.org/10.1039/b800465j.
Повний текст джерелаNoniewicz, Konrad, Zbigniew K. Brzozowski, and Irmina Zadrozna. "UV-sensitive polyarylates as photolithographic emulsions." Journal of Applied Polymer Science 60, no. 7 (May 16, 1996): 1071–82. http://dx.doi.org/10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3.
Повний текст джерелаMagklaras, Aris, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, and Alexios Birbas. "A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography." Information 14, no. 8 (July 28, 2023): 428. http://dx.doi.org/10.3390/info14080428.
Повний текст джерелаGordillo, H., I. Suárez, R. Abargues, P. Rodríguez-Cantó, S. Albert, and J. P. Martínez-Pastor. "Polymer/QDs Nanocomposites for Waveguiding Applications." Journal of Nanomaterials 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/960201.
Повний текст джерелаWu, Chun-Ying, Heng Hsieh, and Yung-Chun Lee. "Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask." Micromachines 10, no. 8 (August 18, 2019): 547. http://dx.doi.org/10.3390/mi10080547.
Повний текст джерелаCritchley, Kevin, Lixin Zhang, Hitoshi Fukushima, Masaya Ishida, Tatsuya Shimoda, Richard J. Bushby, and Stephen D. Evans. "Soft-UV Photolithography using Self-Assembled Monolayers." Journal of Physical Chemistry B 110, no. 34 (August 2006): 17167–74. http://dx.doi.org/10.1021/jp0630370.
Повний текст джерелаHoriuchi, S., T. Fujita, T. Hayakawa, and Y. Nakao. "Micropatterning of Metal Nanoparticles via UV Photolithography." Advanced Materials 15, no. 17 (September 3, 2003): 1449–52. http://dx.doi.org/10.1002/adma.200305270.
Повний текст джерелаZaki, M., Uda Hashim, Mohd Khairuddin Md Arshad, M. Nurfaiz, M. F. M. Fathil, A. H. Azman та R. M. Ayub. "Optimization on Conventional Photolithography Process of 0.98 μm Gap Design for Micro Gap Biosensor Application". Applied Mechanics and Materials 754-755 (квітень 2015): 524–29. http://dx.doi.org/10.4028/www.scientific.net/amm.754-755.524.
Повний текст джерелаДисертації з теми "Photolithographie UV"
Regagnon, Théo. "Modélisation in vitro du muscle sur membrane silicone microstructurée par photolithographie UV." Electronic Thesis or Diss., Université de Montpellier (2022-....), 2023. http://www.theses.fr/2023UMONS073.
Повний текст джерелаOur aim was to propose an in vitro model of differentiated and aligned human skeletal myotubes. To this end, we describe the micropatterning on a PDMS [poly(dimethylsiloxane)] substrate of EETMOS [2-(3,4 epoxycyclohexylethyltrimethoxysilane)] an organic-inorganic hybrid polymer to produce a network of parallel lines that can be stretchable to optimize differenciation.The EETMOS-based resin was synthesized by sol-gel process and polymerized using UV-photolithography. Human primary myoblasts were seeded onto the microstructurated substrate to be, after proliferation, stretched to differentiate into aligned myotubes.The effect of the spacing between the parallel lines and their height was assessed by immunofluorescence. After an optimization of the model, we ended up with 30µm large myotubes reached with a 75µm spacing and 8 µm high microstructures. Then we functionalized the silicone with the use of silylated peptide ligands derived from extracellular matrix adhesion proteins to avoid detachment of the myotubes from their support. A stretching protocol was then optimized (10% from L0, 1Hz, two cycles of 1h stretching / 2h rest / 1h stretching with 20h rest in between). An improvement in the expression of sarcomere proteins and myogenic regulatory factors (MyoG) was observed with stretching in relation to better differentiation of the myogenic progeniteur. The in vitro model that we propose would be a very useful tool to evaluate in a patient, from a microbiopsy, his muscular responses to mechanical stress
Stehlin, Fabrice. "Photolithographie UV-profond d'oxoclusters métalliques : Des processus photochimiques aux applications en nanofabrication." Phd thesis, Université de Haute Alsace - Mulhouse, 2013. http://tel.archives-ouvertes.fr/tel-01067489.
Повний текст джерелаStehlin, Fabrice. "Photolithographie UV-profond d’oxoclusters métalliques : Des processus photochimiques aux applications en nanofabrication." Thesis, Mulhouse, 2013. http://www.theses.fr/2013MULH8376/document.
Повний текст джерелаThe main purpose of this thesis is to provide a material precursor of metal oxides (ZrO2, TiO2, HfO2) compatible with DUV interference photolithography technique. Transition metal oxoclusters (MOC) obtained by complexation of an organic ligand and a partial hydrolysis have been proposed as building blocks. DUV irradiation (193 nm) allows a direct excitation of the MOC, which leads a photo-induced crosslinking and gives to the material a negative photoresist character. A detailed spectroscopic study allowed proposing a mechanism of photocrosslinking. This study relied primarily on in situ techniques to follow the photochemical reaction by spectroscopic ellipsometry and RT-FTIR. The nanostructuring was performed by interferometric DUV lithography at 193 nm and could be extended to 2-photon stereolithography. DUV-IL was chosen for its potential to write nanostructures on relatively large areas, in standard atmosphere and temperature conditions. Furthermore, in the case of TiOC, the nanostructures can be fully mineralised at room temperature by an additionnal photochemical treatment. For ZrOC and HfOC, an additional thermal annealing step allows to obtain a crystalline structure MO2
Liu, Xiyuan. "Design, analysis and fabrication of micro optical systems involving UV-deep lithography - with an application in atomic physics." [S.l. : s.n.], 2008. http://nbn-resolving.de/urn:nbn:de:bsz:180-madoc-21393.
Повний текст джерелаServera, Marc. "Etude d'un système de masquage pour microlithographie sensible en UV profond et développable par plasma d'oxygène." Montpellier 2, 1990. http://www.theses.fr/1990MON20092.
Повний текст джерелаYeh, Chun-Cheng. "ZnO micro- and nanostructures from Deep-UV photosensitive solutions for electronic and magnetic applications." Thesis, Mulhouse, 2017. http://www.theses.fr/2017MULH1359/document.
Повний текст джерелаIn this thesis, an in-depth investigation to the photosensitive zinc methacrylate (ZnMAA) precursor was made. Zinc methacrylate can be crosslinked under DUV (193 nm) irradiation. The photo-induced solidification is attributed to the partial decomposition of the ZnMAA complex, which gives rise to the following hydrolysis-condensation reactions and the formation of Zn-O-Zn networks. The bonding variation and decomposition of organic species caused by DUV irradiation were carefully investigated by FTIR, XPS and ellipsometry and discussed in Chapter III. DUV irradiation provokes clivage of MAA ligands from zinc cations. However, the intensity of MAA ligands can only be reduced to ~2/3 of its initial intensity regardless the extension of irradiation time, implying only a small amount oxide network can be induced by DUV irradiation. The small amount of Zn-O-Zn networks inside the photo-irradiated regions can effectively decrease the solubility of photo-irradiated regions in polar solvents, which makes ZnMAA precursor just like a negative tone resist and able to be patterned into two-dimensional structures by DUV lithography. Due to good photosensitivity to DUV light (193 nm), the dimension of DUV-patterned ZnMAA structures can be decreased to sub-micro by using binary masks and the effects of each pattering step including (i) DUV exposure, (ii) prebaking and (iii) development on the size and shape of DUV-patterned ZnMAA structures are discussed in Chapter IV. In order to fabricate nanoscale ZnMAA structures, a home-made DUV interference system was used to pattern ZnMAA precursor and 300 nm periodic lines were successfully made. Applications as TFT transistor, gaz sensor and magnetic materials are shown
Liu, Chao. "Optical modeling and resist metrology for deep-UV photolithography." Texas A&M University, 2005. http://hdl.handle.net/1969.1/4233.
Повний текст джерелаMcAdams, Christopher Lee. "Polymers and photoactive compounds for non-chemically amplified deep-UV photoresists /." Full text (PDF) from UMI/Dissertation Abstracts International, 2000. http://wwwlib.umi.com/cr/utexas/fullcit?p3004335.
Повний текст джерелаKAOU, LARBI NEILA. "Conception et realisation d'un dispositif en silicium permettant une connexion passive entre un circuit d'optique integree et un ruban de fibres optiques." Besançon, 1999. http://www.theses.fr/1999BESA2045.
Повний текст джерелаArbring, Theresia. "The impact of geometrical variations on the transport properties of organic electronic ion pumps." Thesis, Linköpings universitet, Fysik och elektroteknik, 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-94544.
Повний текст джерелаТези доповідей конференцій з теми "Photolithographie UV"
Harned, Noreen. "Deep-UV photolithography cluster performance." In SPIE's 1994 Symposium on Microlithography, edited by Timothy A. Brunner. SPIE, 1994. http://dx.doi.org/10.1117/12.175487.
Повний текст джерелаBauer, Harry H., Matthias Heller, and Norbert Kaiser. "Optical coatings for UV photolithography systems." In Optical Instrumentation & Systems Design. SPIE, 1996. http://dx.doi.org/10.1117/12.246823.
Повний текст джерелаDunn, Diana D., Katherine C. Norris, and Linda K. Somerville. "0.5-um deep-UV photolithography manufacturing." In SPIE's 1994 Symposium on Microlithography, edited by Timothy A. Brunner. SPIE, 1994. http://dx.doi.org/10.1117/12.175464.
Повний текст джерелаRuff, Bruce, Elizabeth Tai, and Robert Brown. "Broadband Deep-UV High NA Photolithography System." In 1989 Microlithography Conferences, edited by Burn J. Lin. SPIE, 1989. http://dx.doi.org/10.1117/12.953173.
Повний текст джерелаDunn, Diana D., James A. Bruce, and Michael S. Hibbs. "Deep-UV photolithography linewidth variation from reflective substrates." In Optical/Laser Microlithography IV, edited by Victor Pol. SPIE, 1991. http://dx.doi.org/10.1117/12.44770.
Повний текст джерелаYapici, Murat Kaya, and Ilyas Farhat. "UV-LED exposure system for low-cost photolithography." In SPIE Advanced Lithography, edited by Kafai Lai and Andreas Erdmann. SPIE, 2014. http://dx.doi.org/10.1117/12.2046123.
Повний текст джерелаMontemezzani, G., St Pfändler, and P. Günter. "Photorefractive properties of Bi4Ge3O12 crystals in the ultraviolet spectral range." In Photorefractive Materials, Effects, and Devices II. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/pmed.1991.ma5.
Повний текст джерелаDu, Liqun, Shenmiao Zhu, Jiang Qin, and Chong Liu. "Numerical and experimental study on SU-8 UV photolithography." In 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, edited by Li Yang, Yaolong Chen, Ernst-Bernhard Kley, and Rongbin Li. SPIE, 2007. http://dx.doi.org/10.1117/12.783364.
Повний текст джерелаK M, Dhivakar, and Anshu Sarje. "A Versatile, Low-Cost UV Exposure System for Photolithography." In 2021 Smart Technologies, Communication and Robotics (STCR). IEEE, 2021. http://dx.doi.org/10.1109/stcr51658.2021.9588848.
Повний текст джерелаZhang, Lidan, Shengyuan Chang, Xi Chen, Yimin Ding, Md Tarek Rahman, Yao, Duan, Pavel Terekhov, and Xingjie Ni. "Wafer-scale single-aperture near-infrared metalens fabricated by deep UV photolithography." In CLEO: QELS_Fundamental Science. Washington, D.C.: Optica Publishing Group, 2022. http://dx.doi.org/10.1364/cleo_qels.2022.ff2d.4.
Повний текст джерела