Статті в журналах з теми "Ni-Cr Thin Films"
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Sethuraman, A. R., R. J. De Angelis, and P. J. Reucroft. "Diffraction studies on Ni–Co and Ni–Cr alloy thin films." Journal of Materials Research 6, no. 4 (April 1991): 749–54. http://dx.doi.org/10.1557/jmr.1991.0749.
Повний текст джерелаYAN, JIANWU, and JICHENG ZHOU. "THE OXIDATION AND THE ELECTRICAL PROPERTIES OF Ni–Cr THIN FILM AFTER RAPID THERMAL ANNEALING." International Journal of Modern Physics B 21, no. 26 (October 20, 2007): 4561–74. http://dx.doi.org/10.1142/s0217979207037934.
Повний текст джерелаLin, Ruei-Cheng, Tai-Kuang Lee, Der-Ho Wu, and Ying-Chieh Lee. "A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy." Advances in Materials Science and Engineering 2015 (2015): 1–7. http://dx.doi.org/10.1155/2015/847191.
Повний текст джерелаStearns, M. B., and C. H. Lee. "Dimensional effects in Ni‐Cr multilayered thin films." Journal of Applied Physics 61, no. 8 (April 15, 1987): 4064–66. http://dx.doi.org/10.1063/1.338528.
Повний текст джерелаVollaro, M. B., and D. I. Potter. "Phase formation in coevaporated NiCr thin films." Thin Solid Films 239, no. 1 (February 1994): 37–46. http://dx.doi.org/10.1016/0040-6090(94)90105-8.
Повний текст джерелаCho, Ki-Hyun, and Youngman Kim. "Elastic modulus measurement of multilayer metallic thin films." Journal of Materials Research 14, no. 5 (May 1999): 1996–2001. http://dx.doi.org/10.1557/jmr.1999.0269.
Повний текст джерелаZhou, Ji Cheng, and Jian Wu Yan. "Microstructure and Electrical Properties of Nano Ni-Cr Thin-Films Fabricated by Magnetron Co-Sputtering Techniques." Materials Science Forum 561-565 (October 2007): 1201–4. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.1201.
Повний текст джерелаCho, Nam Ihn, Se Jong Lee, Yo Seung Song, and Deuk Yong Lee. "Thermal Properties of Cr- and Ni- Silicide Thin Films." Solid State Phenomena 124-126 (June 2007): 189–94. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.189.
Повний текст джерелаPetley, Vijay, S. Sathishkumar, K. H. Thulasi Raman, G. Mohan Rao, and U. Chandrasekhar. "Microstructural and mechanical characteristics of Ni–Cr thin films." Materials Research Bulletin 66 (June 2015): 59–64. http://dx.doi.org/10.1016/j.materresbull.2015.02.002.
Повний текст джерелаVinayak, Seema, H. P. Vyas, and V. D. Vankar. "Microstructure and electrical characteristics of Ni–Cr thin films." Thin Solid Films 515, no. 18 (June 2007): 7109–16. http://dx.doi.org/10.1016/j.tsf.2007.03.011.
Повний текст джерелаAbdul-Razzaq, W., and M. Amoruso. "Electron transport properties of Ni and Cr thin films." Physica B: Condensed Matter 253, no. 1-2 (October 1998): 47–51. http://dx.doi.org/10.1016/s0921-4526(98)00382-2.
Повний текст джерелаKlein, I. E., M. Hershkovich, and I. A. Goldberg. "The mechanism of oxidation of thin Ni−Cr films." Microelectronics Journal 19, no. 6 (November 1988): 17–23. http://dx.doi.org/10.1016/s0026-2692(88)80005-3.
Повний текст джерелаPetrovic, S., N. Bundaleski, M. Radovic, Z. Ristic, G. Gligoric, D. Perusko, and S. Zec. "Structure and surface composition of NiCr sputtered thin films." Science of Sintering 38, no. 2 (2006): 155–60. http://dx.doi.org/10.2298/sos0602155p.
Повний текст джерелаRai, A. K., and R. S. Bhattacharya. "Sputter-deposited and ion-mixed NiTi and NiCr thin films." Materials Science and Engineering 85 (January 1987): 139–45. http://dx.doi.org/10.1016/0025-5416(87)90475-7.
Повний текст джерелаYu, Xin Gang, Hong Wen Ma, Fei Long, Hui Feng Zhao, Wenrue Bi, Wu Wen Luo, Li Wang, and Nanyun Liu. "XPS Studies on Composite TiO2-SiO2 Thin Films Deposited on Metal Substrate by Sol-Gel." Materials Science Forum 475-479 (January 2005): 1647–50. http://dx.doi.org/10.4028/www.scientific.net/msf.475-479.1647.
Повний текст джерелаMengucci, P., M. Costato, and G. Majni. "Substrate effect on texturized microstructures in NiCr thin films." Thin Solid Films 209, no. 1 (March 1992): 67–72. http://dx.doi.org/10.1016/0040-6090(92)90011-y.
Повний текст джерелаBelu-Marian, A., R. Mǎnǎilǎ, G. Korony, C. Constantin, and A. Devenyi. "Electrical properties and structural defects of Ni-Cr thin films." Thin Solid Films 139, no. 1 (May 1986): 15–24. http://dx.doi.org/10.1016/0040-6090(86)90043-x.
Повний текст джерелаHuang, T. C., and J. K. Howard. "Characterization of Ni-Cr thin films by X-ray analysis." Thin Solid Films 148, no. 2 (April 1987): 209–18. http://dx.doi.org/10.1016/0040-6090(87)90159-3.
Повний текст джерелаAu, C. L., M. A. Jackson, and W. A. Anderson. "Structural and electrical properties of stable ni/cr thin films." Journal of Electronic Materials 16, no. 4 (July 1987): 301–6. http://dx.doi.org/10.1007/bf02653370.
Повний текст джерелаGoldsmith, C. C., and C. Van Buskirk. "Residual Stress Measurements on Cr/Ni Pads Evaporated on Polyimide Thin Films." Advances in X-ray Analysis 36 (1992): 203–12. http://dx.doi.org/10.1154/s0376030800018802.
Повний текст джерелаBanovec, A., and A. Zalar. "Investigation of sliding contact resistance of Ni-Cr/Au and Ni-Cr/Au-SiO2 thin resistive films." Thin Solid Films 164 (October 1988): 129–33. http://dx.doi.org/10.1016/0040-6090(88)90122-8.
Повний текст джерелаZhao, Di, Xuezheng An, Yaxian Sun, Guihua Li, Hongyan Liu, and Aichang Li. "Photocatalytic properties of p-n heterojunction Ag2CO3/Ag3PO4/Ni thin films under visible light." Functional Materials Letters 12, no. 06 (December 2019): 1950085. http://dx.doi.org/10.1142/s1793604719500851.
Повний текст джерелаSuzuki, Tsuneo, Jun Inoue, Hiroki Asami, Tomoya Ibi, Tadachika Nakayama, Hisayuki Suematsu, and Koichi Niihara. "Material Design of Transition Metal Nitrides for Hard Coatings by Metal and Nonmetal Atom Substitution." Key Engineering Materials 373-374 (March 2008): 122–25. http://dx.doi.org/10.4028/www.scientific.net/kem.373-374.122.
Повний текст джерелаHono, K., B. G. Demczyk, and D. E. Laughlin. "Electron microdiffraction of faulted regions in Co‐Cr and Co‐Ni‐Cr thin films." Applied Physics Letters 55, no. 3 (July 17, 1989): 229–31. http://dx.doi.org/10.1063/1.101915.
Повний текст джерелаDanışman, M., and N. Cansever. "Effect of Cr content on mechanical and electrical properties of Ni–Cr thin films." Journal of Alloys and Compounds 493, no. 1-2 (March 2010): 649–53. http://dx.doi.org/10.1016/j.jallcom.2009.12.180.
Повний текст джерелаKalnicky, Dennis J. "EDXRF Analysis of Thin Films and Coatings Using a Hybrid Alphas Approach." Advances in X-ray Analysis 29 (1985): 403–11. http://dx.doi.org/10.1154/s037603080001051x.
Повний текст джерелаSchippel, E. "Ternary alloy films of Ni-Cr-Al for thin film resistors." Thin Solid Films 146, no. 2 (January 1987): 133–38. http://dx.doi.org/10.1016/0040-6090(87)90214-8.
Повний текст джерелаIida, Atsuko, and Shin-ichi Nakamura. "Orientation of Ni-Cr Thin Films with an Underlying Ti Layer." Japanese Journal of Applied Physics 35, Part 2, No. 3A (March 1, 1996): L335—L337. http://dx.doi.org/10.1143/jjap.35.l335.
Повний текст джерелаYedong, He, and F. H. Stott. "The selective oxidation of Ni-15%Cr and Ni-10%Cr alloys promoted by surface-applied thin oxide films." Corrosion Science 36, no. 11 (November 1994): 1869–84. http://dx.doi.org/10.1016/0010-938x(94)90024-8.
Повний текст джерелаDang, Nhat, Zhao-Ying Wang, Ti-Yuan Wu, Tra Nguyen, and Ming-Tzer Lin. "Measurement of Effects of Different Substrates on the Mechanical Properties of Submicron Titanium Nickel Shape Memory Alloy Thin Film Using the Bulge Test." Micromachines 12, no. 1 (January 15, 2021): 85. http://dx.doi.org/10.3390/mi12010085.
Повний текст джерелаKim, Tae-Yoo, Hwa-Jin Son, Seung-Kyu Lim, Kwang-Keun Lee, and Su-Jeong Suh. "Electrical and Structural Properties of Ni-60%Cr Thin Film in an Embedded Resistor." Korean Journal of Metals and Materials 52, no. 2 (February 5, 2014): 143–47. http://dx.doi.org/10.3365/kjmm.2014.52.2.143.
Повний текст джерелаMeena, S. P., and R. Ashokkumar. "Effect of different Current density on Properties of Electrodeposited Ni-Co-Cr Thin Films." Oriental Journal of Chemistry 34, no. 4 (July 31, 2018): 1884–89. http://dx.doi.org/10.13005/ojc/3404023.
Повний текст джерелаBenzitouni, Sara, Mourad Zaabat, Jean Ebothé, Abdelhakim Mahdjoub, and Meriem Guemini. "Effect of Transition Metals on the Mechanical Properties of ZnO Thin Films, Prepared by Sol-Gel Method." Journal of Nano Research 65 (December 2020): 27–38. http://dx.doi.org/10.4028/www.scientific.net/jnanor.65.27.
Повний текст джерелаYAN, JIANWU, and JICHENG ZHOU. "STRAIN SENSITIVITY AND TEMPERATURE INFLUENCE OF NICHROME (80/20 wt.%) THIN FILM FABRICATED BY MAGNETRON SPUTTERING." International Journal of Modern Physics B 21, no. 21 (August 20, 2007): 3719–31. http://dx.doi.org/10.1142/s0217979207037636.
Повний текст джерелаGenut, M., and Y. Komem. "Diffusional processes in thin films of Au/CeO2 on NiCr superalloy." Thin Solid Films 144, no. 2 (November 1986): 211–22. http://dx.doi.org/10.1016/0040-6090(86)90414-1.
Повний текст джерелаBoubeker, B., J. P. Eymery, M. F. Denanot, and E. L. H. Sayouty. "A TEM and CEMS study of bcc Fe-Ni-Cr thin films." Journal of Magnetism and Magnetic Materials 133, no. 1-3 (May 1994): 470–73. http://dx.doi.org/10.1016/0304-8853(94)90598-3.
Повний текст джерелаProtsenko, I. Yu, O. V. Shovkoplyas, Yu M. Ovcharenko, and N. M. Opanasyuk. "The electrophysical properties of thin polycrystalline Cr, Cu, Ni and Ti films." Journal of Physical Studies 2, no. 1 (1998): 105–8. http://dx.doi.org/10.30970/jps.02.105.
Повний текст джерелаBohne, Yvonne, Darina Manova, Stephan Mändl, Horst Neumann, and Bernd Rauschenbach. "Influence of Microstructure on Nitrogen Diffusion in Fe-Cr-Ni Thin Films." Plasma Processes and Polymers 4, S1 (April 2007): S660—S663. http://dx.doi.org/10.1002/ppap.200731605.
Повний текст джерелаZalar, A., and S. Hofmann. "Redeposition in AES sputter depth profiling of multilayer Cr/Ni thin films." Surface and Interface Analysis 12, no. 2 (July 1988): 83–86. http://dx.doi.org/10.1002/sia.740120204.
Повний текст джерелаDraper, C. W., J. P. Franey, J. M. Gibson, T. E. Graedel, D. C. Jacobson, G. W. Kammlott, and J. M. Poate. "Microstructure and behavior of laser-mixed Cr/Ni films on Cu alloys." Journal of Materials Research 2, no. 1 (February 1987): 35–45. http://dx.doi.org/10.1557/jmr.1987.0035.
Повний текст джерелаChoi, J.-H., C. M. Sung, K. H. Shin, and L. F. Allard. "Effect of Pt content on compositional segregation in Co-Cr-P-Pt/Cr magnetic thin films." Proceedings, annual meeting, Electron Microscopy Society of America 54 (August 11, 1996): 1022–23. http://dx.doi.org/10.1017/s0424820100167573.
Повний текст джерелаHou, Yang Lu, Xing Hua Fu, Wen Hong Tao, and Xin Jin. "Structure and Dielectric Properties of Mg, Cr-Doped LaSrFeO3 Films." Applied Mechanics and Materials 538 (April 2014): 11–14. http://dx.doi.org/10.4028/www.scientific.net/amm.538.11.
Повний текст джерелаHE, Y., and F. H. STOTT. "ChemInform Abstract: Selective Oxidation of Ni-15% Cr and Ni-10% Cr Alloys Promoted by Surface-Applied Thin Oxide Films." ChemInform 26, no. 5 (August 18, 2010): no. http://dx.doi.org/10.1002/chin.199505022.
Повний текст джерелаKrabac, Lubomir, Vladimir Pejaković, Vladislav Drinek, Nicole Dörr, and Ewald Badisch. "Tribology of Ge thin films on stainless steel." Industrial Lubrication and Tribology 69, no. 2 (March 13, 2017): 182–89. http://dx.doi.org/10.1108/ilt-06-2016-0128.
Повний текст джерелаRatner, E., A. Appelbaum, R. Brener, and M. Eizenberg. "Interactions of Thin Al Films with Ni–Cr Alloy and Bilayer Films Deposited on Si." physica status solidi (a) 94, no. 1 (March 16, 1986): 61–69. http://dx.doi.org/10.1002/pssa.2210940106.
Повний текст джерелаLee, Seung-Woo, Soad Ahmed, Tao Wang, Yeawon Park, Sota Matsuzaki, Shinichi Tatsumi, Shigekiyo Matsumoto, Sergiy Korposh, and Steve James. "Label-Free Creatinine Optical Sensing Using Molecularly Imprinted Titanium Dioxide-Polycarboxylic Acid Hybrid Thin Films: A Preliminary Study for Urine Sample Analysis." Chemosensors 9, no. 7 (July 17, 2021): 185. http://dx.doi.org/10.3390/chemosensors9070185.
Повний текст джерелаTsirlina, T., V. Lyakhovitskaya, S. Fiechter, and R. Tenne. "Study on preparation, growth mechanism, and optoelectronic properties of highly oriented WSe2 thin films." Journal of Materials Research 15, no. 12 (December 2000): 2636–46. http://dx.doi.org/10.1557/jmr.2000.0378.
Повний текст джерелаMartín-Palma, R. J., and J. M. Martínez-Duart. "Ni–Cr passivation of very thin Ag films for low-emissivity multilayer coatings." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17, no. 6 (November 1999): 3449–51. http://dx.doi.org/10.1116/1.582081.
Повний текст джерелаSato, Yuichi, Masaya Watanabe, and Susumu Sato. "Electrical Properties of Ni–Cr–N Thin Films Deposited by Multitarget Reactive Sputtering." Japanese Journal of Applied Physics 40, Part 1, No. 8 (August 15, 2001): 5091–94. http://dx.doi.org/10.1143/jjap.40.5091.
Повний текст джерелаLee, Ying-Chieh, Voon Choong Yen, Christian Pithan, and Jhen-Hau Jan. "Study of Ni–Cr / CrN bilayer thin films resistor prepared by magnetron sputtering." Vacuum 213 (July 2023): 112085. http://dx.doi.org/10.1016/j.vacuum.2023.112085.
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