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Статті в журналах з теми "Nanospheres Lithography"

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Автор: Grafiati

Опубліковано: 14 березня 2023

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1

Inns, Daniel, Patrick Campbell, and Kylie Catchpole. "Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells." Advances in OptoElectronics 2007 (July 31, 2007): 1–4. http://dx.doi.org/10.1155/2007/32707.

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A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surface charge is applied to a wafer surface by dipping in a solution of aluminum nitrate. Dipping the positive-coated wafer into a solution of negatively charged silica beads (nanospheres) results in the spheres becoming electrostatically attracted to the wafer surface. These nanospheres form an etch mask for RIE. After RIE texturing, the reflection of the surface is reduced as effectively as any other nanosphere lithography method, while this batch process used for masking is much faster, making it more industrially relevant.

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2

Kasmi, Sofiane, Jeanne Solard, Inga Tijunelyte, Alexis P. A. Fischer, Marc Lamy de la Chapelle, and Nathalie Lidgi-Guigui. "Tunable Multilayers of Self-Organized Silica Nanospheres by Spin Coating." Journal of Nanomaterials 2018 (2018): 1–6. http://dx.doi.org/10.1155/2018/6075610.

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The coating of fused silica by an organized layer of silica nanospheres (NS) is an important issue for the design of optical and topographic properties especially for lithography techniques such as nanosphere lithography (NSL) or nanosphere photolithography (NSPL). Here, the spin coating of NS dispersed in N,N-dimethylformamide (DMF) is studied. The role of the NS diameter, the spin-coating acceleration, and the volume fraction are the parameters to take into account for the formation and organization of NS in single or double closely packed layers. We propose an explanation for this behavior based on the transition between sedimentation and a viscous regime on the basis of the silica NS organization.

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3

Ai, Bin, and Yiping Zhao. "Glancing angle deposition meets colloidal lithography: a new evolution in the design of nanostructures." Nanophotonics 8, no. 1 (October 6, 2018): 1–26. http://dx.doi.org/10.1515/nanoph-2018-0105.

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AbstractThe combination of colloidal lithography and glancing angle deposition facilitates a new powerful fabrication technique – shadow sphere lithography (SSL), which can greatly expand the variety and complexity of nanostructures fabricated using simple evaporation and colloidal monolayer templates. Their applications have been widely investigated in plasmonics and associated fields. Here, we present an overview of the principle of SSL, followed by different strategies of utilizing SSL to design various nanostructures by changing the nanosphere monolayer masks, deposition configurations, different ways to combine deposition and etching, etc. Typical nanostructures fabricated by SSL, including nanorods on nanospheres, patchy nanospheres, nanotriangles, nanoring, nanocrescents, etc., are introduced. Recent optical applications of these plasmonic nanostructures are also summarized. It is expected that this review will inspire more ingenious designs of plasmonic nanostructures by SSL for advanced and smart applications.

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4

Colson, Pierre, Catherine Henrist, and Rudi Cloots. "Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials." Journal of Nanomaterials 2013 (2013): 1–19. http://dx.doi.org/10.1155/2013/948510.

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The never-ending race towards miniaturization of devices induced an intense research in the manufacturing processes of the components of those devices. However, the complexity of the process combined with high equipment costs makes the conventional lithographic techniques unfavorable for many researchers. Through years, nanosphere lithography (NSL) attracted growing interest due to its compatibility with wafer-scale processes as well as its potential to manufacture a wide variety of homogeneous one-, two-, or three-dimensional nanostructures. This method combines the advantages of both top-down and bottom-up approaches and is based on a two-step process: (1) the preparation of a colloidal crystal mask (CCM) made of nanospheres and (2) the deposition of the desired material through the mask. The mask is then removed and the layer keeps the ordered patterning of the mask interstices. Many groups have been working to improve the quality of the CCMs. Throughout this review, we compare the major deposition techniques to manufacture the CCMs (focusing on 2D polystyrene nanospheres lattices), with respect to their advantages and drawbacks. In traditional NSL, the pattern is usually limited to triangular structures. However, new strategies have been developed to build up more complex architectures and will also be discussed.

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5

Li, Jie, Yongxu Hu, Li Yu, Lin Li, Deyang Ji, Liqiang Li, Wenping Hu, and Harald Fuchs. "Nanospheres Lithography: Recent Advances of Nanospheres Lithography in Organic Electronics (Small 28/2021)." Small 17, no. 28 (July 2021): 2170145. http://dx.doi.org/10.1002/smll.202170145.

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6

Wang, Zhenming, Jianxun Liu, Xiaoguo Fang, Jiawei Wang, Zhen Yin, Huilin He, Shouzhen Jiang, et al. "Plasmonically enhanced photoluminescence of monolayer MoS2 via nanosphere lithography-templated gold metasurfaces." Nanophotonics 10, no. 6 (March 24, 2021): 1733–40. http://dx.doi.org/10.1515/nanoph-2020-0672.

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Abstract We demonstrate a simple, cost-effective method to enhance the photoluminescence intensity of monolayer MoS2. A hexagonal symmetric Au metasurface, made by polystyrene nanosphere lithography and metal coating, is developed to enhance the photoluminescence intensity of monolayer MoS2. By using nanospheres of different sizes, the localized surface plasmon resonances of the Au metasurfaces can be effectively tuned. By transferring monolayer MoS2 onto the Au metasurface, the photoluminescence signal of the monolayer MoS2 can be significantly enhanced up to 12-fold over a square-centimeter area. The simple, large-area, cost-effective fabrication technique could pave a new way for plasmon-enhanced light-mater interactions of atomically thin two-dimensional materials.

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7

Domonkos, Mária, and Alexander Kromka. "Nanosphere Lithography-Based Fabrication of Spherical Nanostructures and Verification of Their Hexagonal Symmetries by Image Analysis." Symmetry 14, no. 12 (December 14, 2022): 2642. http://dx.doi.org/10.3390/sym14122642.

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Nanosphere lithography (NSL) is a cost- and time-effective technique for the fabrication of well-ordered large-area arrays of nanostructures. This paper reviews technological challenges in NSL mask preparation, its modification, and quality control. Spin coating with various process parameters (substrate wettability, solution properties, spin coating operating parameters) are discussed to create a uniform monolayer from monodisperse polystyrene (PS) nanospheres with a diameter of 0.2–1.5 μm. Scanning electron microscopy images show that the PS nanospheres are ordered into a hexagonal close-packed monolayer. Verification of sphere ordering and symmetry is obtained using our open-source software HEXI, which can recognize and detect circles, and distinguish between hexagonal ordering and defect configurations. The created template is used to obtain a wide variety of tailor-made periodic structures by applying additional treatments, such as plasma etching (isotropic and anisotropic), deposition, evaporation, and lift-off. The prepared highly ordered nanopatterned arrays (from circular, triangular, pillar-shaped structures) are applicable in many different fields (plasmonics, photonics, sensorics, biomimetic surfaces, life science, etc.).

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8

Li, Jie, Yongxu Hu, Li Yu, Lin Li, Deyang Ji, Liqiang Li, Wenping Hu, and Harald Fuchs. "Recent Advances of Nanospheres Lithography in Organic Electronics." Small 17, no. 28 (May 21, 2021): 2100724. http://dx.doi.org/10.1002/smll.202100724.

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9

Cara, Eleonora, Federico Ferrarese Lupi, Matteo Fretto, Natascia De Leo, Mauro Tortello, Renato Gonnelli, Katia Sparnacci, and Luca Boarino. "Directed Self-Assembly of Polystyrene Nanospheres by Direct Laser-Writing Lithography." Nanomaterials 10, no. 2 (February 7, 2020): 280. http://dx.doi.org/10.3390/nano10020280.

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In this work, we performed a systematic study on the effect of the geometry of pre-patterned templates and spin-coating conditions on the self-assembling process of colloidal nanospheres. To achieve this goal, large-scale templates, with different size and shape, were generated by direct laser-writer lithography over square millimetre areas. When deposited over patterned templates, the ordering dynamics of the self-assembled nanospheres exhibits an inverse trend with respect to that observed for the maximisation of the correlation length ξ on a flat surface. Furthermore, the self-assembly process was found to be strongly dependent on the height (H) of the template sidewalls. In particular, we observed that, when H is 0.6 times the nanospheres diameter and spinning speed 2500 rpm, the formation of a confined and well ordered monolayer is promoted. To unveil the defects generation inside the templates, a systematic assessment of the directed self-assembly quality was performed by a novel method based on Delaunay triangulation. As a result of this study, we found that, in the best deposition conditions, the self-assembly process leads to well-ordered monolayer that extended for tens of micrometres within the linear templates, where 96.2% of them is aligned with the template sidewalls.

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10

Zhou, Xiaodong, Selven Virasawmy, Wolfgang Knoll, Kai Yu Liu, Man Siu Tse, and Li Wei Yen. "Fabrication of Gold Nanocrescents by Angle Deposition with Nanosphere Lithography for Localized Surface Plasmon Resonance Applications." Journal of Nanoscience and Nanotechnology 8, no. 7 (July 1, 2008): 3369–78. http://dx.doi.org/10.1166/jnn.2008.147.

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The gold nanostructures fabricated on a substrate yield localized surface plasmon resonance. We describe the fabrication and characterization of nanocrescents on a silicon substrate, which are fabricated by depositing a gold film at an oblique angle through nanosphere lithography. Following the etching of the gold perpendicular to the substrate and the removal of the nanospheres by dissolution, nanocrescents with fine nanostructures are generated. By varying the deposition angle of the gold film from 0° to 72°, nanorings, 2D and 3D nanocrescents can be obtained. During the nanocrescent fabrication, we also compared the deposition angle difference between the e-beam and thermal evaporators for oblique depositions of the gold. The 3D nanocrescents fabricated in our experiments are expected to have improved sensitivity in localized surface plasmon resonance measurements when compared to the previously reported 2D nanocrescents, which enable broader biosensor applications. Simulations of the profiles of these 3D nanocrescents using solid geometry show good consistency with the fabricated ones.

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11

Riedl, Thomas, and Jörg K. N. Lindner. "Automated SEM Image Analysis of the Sphere Diameter, Sphere-Sphere Separation, and Opening Size Distributions of Nanosphere Lithography Masks." Microscopy and Microanalysis 28, no. 1 (December 27, 2021): 185–95. http://dx.doi.org/10.1017/s1431927621013866.

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AbstractColloidal nanosphere monolayers—used as a lithography mask for site-controlled material deposition or removal—offer the possibility of cost-effective patterning of large surface areas. In the present study, an automated analysis of scanning electron microscopy (SEM) images is described, which enables the recognition of the individual nanospheres in densely packed monolayers in order to perform a statistical quantification of the sphere size, mask opening size, and sphere-sphere separation distributions. Search algorithms based on Fourier transformation, cross-correlation, multiple-angle intensity profiling, and sphere edge point detection techniques allow for a sphere detection efficiency of at least 99.8%, even in the case of considerable sphere size variations. While the sphere positions and diameters are determined by fitting circles to the spheres edge points, the openings between sphere triples are detected by intensity thresholding. For the analyzed polystyrene sphere monolayers with sphere sizes between 220 and 600 nm and a diameter spread of around 3% coefficients of variation of 6.8–8.1% for the opening size are found. By correlating the mentioned size distributions, it is shown that, in this case, the dominant contribution to the opening size variation stems from nanometer-scale positional variations of the spheres.

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12

Yonghui Zhang, Yonghui Zhang, Zihui Zhang Zihui Zhang, Chong Geng Chong Geng, Shu Xu Shu Xu, Tongbo Wei Tongbo Wei, and and Wen'gang Bi and Wen'gang Bi. "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography." Chinese Optics Letters 15, no. 6 (2017): 062201–62205. http://dx.doi.org/10.3788/col201715.062201.

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13

Li, Shuhong, Zheng Yang, Zhiyou Zhang, Fuhua Gao, Jinglei Du, and Sijie Zhang. "Study of nanospheres lithography technology with super-lens for fabricating nano holes." Journal of Applied Physics 113, no. 18 (May 14, 2013): 183102. http://dx.doi.org/10.1063/1.4803845.

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14

Park, Jinyoung, and Haiwon Lee. "Specific immobilization of nanospheres on template fabricated by using atomic force microscope lithography." Colloids and Surfaces A: Physicochemical and Engineering Aspects 257-258 (May 2005): 133–35. http://dx.doi.org/10.1016/j.colsurfa.2004.10.111.

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15

Schleunitz, Arne, Christian Spreu, JaeJong Lee, and Helmut Schift. "Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 28, no. 6 (November 2010): C6M41—C6M44. http://dx.doi.org/10.1116/1.3498762.

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16

Zhao, Xiaoyu, Aonan Zhu, Yaxin Wang, Yongjun Zhang, and Xiaolong Zhang. "Sunflower-Like Nanostructure with Built-In Hotspots for Alpha-Fetoprotein Detection." Molecules 26, no. 4 (February 23, 2021): 1197. http://dx.doi.org/10.3390/molecules26041197.

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In the present study, a sunflower-like nanostructure array composed of a series of synaptic nanoparticles and nanospheres was manufactured through an efficient and low-cost colloidal lithography technique. The primary electromagnetic field contribution generated by the synaptic nanoparticles of the surface array structures was also determined by a finite-difference time-domain software to simulate the hotspots. This structure exhibited high repeatability and excellent sensitivity; hence, it was used as a surface-enhanced Raman spectroscopy (SERS) active substrate to achieve a rapid detection of ultra-low concentrations of Alpha-fetoprotein (AFP). This study demonstrates the design of a plasmonic structure with strong electromagnetic coupling, which can be used for the rapid detection of AFP concentration in clinical medicine.

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17

Yousif, Bedir B., and Ahmed S. Samra. "Modeling of Optical Nanoantennas." Physics Research International 2012 (November 8, 2012): 1–10. http://dx.doi.org/10.1155/2012/321075.

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The optical properties of plasmonic nanoantennas are investigated in detail using the finite integration technique (FIT). The validity of this technique is verified by comparison to the exact solution generalized Mie method (GMM). The influence of the geometrical parameters (antenna length, gap dimension, and shapes) on the antenna field enhancement and spectral response is discussed. Localized surface plasmon resonances of Au (gold) dimers nanospheres, bowtie, and aperture bowtie nanoantennas are modeled. The enhanced field is equivalent to a strong light spot which can lead to the resolution improvement of the microscopy and optical lithography, thus increasing the optical data storage capacity. Furthermore, the sensitivity of the antennas to index changes of the environment and substrate is investigated in detail for biosensing applications. We confirm that our approach yields an exact correspondence with GMM theory for Au dimers nanospheres at gap dimensions 5 nm and 10 nm but gives an approximation error of less than 1.37% for gap dimensions 1 nm and 2 nm with diameters approaching 80 nm. In addition, the far-field characteristics of the aperture bowtie nanoantenna such as directivity and gain are studied. The promising results of this study may have useful potential applications in near-field sample detection, optical microscopy, and so forth.

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18

Sparnacci, Katia, Diego Antonioli, Simone Deregibus, Michele Laus, Giampaolo Zuccheri, Luca Boarino, Natascia De Leo, and Davide Comoretto. "Preparation, Properties, and Self-Assembly Behavior of PTFE-Based Core-Shell Nanospheres." Journal of Nanomaterials 2012 (2012): 1–15. http://dx.doi.org/10.1155/2012/980541.

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Nanosized PTFE-based core-shell particles can be prepared by emulsifier-free seed emulsion polymerization technique starting from spherical or rod-like PTFE seeds of different size. The shell can be constituted by the relatively high Tg polystyrene and polymethylmethacrylate as well as by low Tg polyacrylic copolymers. Peculiar thermal behavior of the PTFE component is observed due to the high degree of PTFE compartmentalization. A very precise control over the particle size can be exerted by properly adjusting the ratio between the monomers and the PTFE seed. In addition, the particle size distribution self-sharpens as the ratio monomer/PTFE increases. Samples with uniformity ratios suited to build 2D and 3D colloidal crystals are easily prepared. In particular, 2D colloidal crystal of spheres leads to very small 2D nanostructuration, useful for the preparation of masks with a combination of nanosphere lithography and reactive ion etching. 3D colloidal crystals were also obtained featuring excellent opal quality, which is a direct consequence of the monodispersity of colloids used for their growth.

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19

Purwidyantri, A., C.-H. Hsu, B. A. Prabowo, C.-M. Yang, and C.-S. Lai. "SERS hotspots growth by mild annealing on Au film over nanospheres, a natural lithography approach." IOP Conference Series: Earth and Environmental Science 277 (June 11, 2019): 012034. http://dx.doi.org/10.1088/1755-1315/277/1/012034.

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20

Oh, Jeong Rok, Jung Ho Moon, Hoo Keun Park, Jae Hyoung Park, Haegeun Chung, Jinhoo Jeong, Woong Kim, and Young Rag Do. "Wafer-scale colloidal lithography based on self-assembly of polystyrene nanospheres and atomic layer deposition." Journal of Materials Chemistry 20, no. 24 (2010): 5025. http://dx.doi.org/10.1039/b927532k.

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21

Xia, Deying, Zahyun Ku, Dong Li, and S. R. J. Brueck. "Formation of Hierarchical Nanoparticle Pattern Arrays Using Colloidal Lithography and Two-Step Self-Assembly: Microspheres atop Nanospheres." Chemistry of Materials 20, no. 5 (March 2008): 1847–54. http://dx.doi.org/10.1021/cm702644c.

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22

Yue, Wenkai, Peixian Li, Xiaowei Zhou, Yanli Wang, Jinxing Wu, and Junchun Bai. "Improvement in the Output Power of Near-Ultraviolet LEDs of p-GaN Nanorods through SiO2 Nanosphere Mask Lithography with the Dip-Coating Method." Nanomaterials 11, no. 8 (August 5, 2021): 2009. http://dx.doi.org/10.3390/nano11082009.

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In this paper, the conditions of the dip-coating method of SiO2 nanospheres are optimized, and a neatly arranged single-layer SiO2 array is obtained. On this basis, a “top-down” inductively coupled plasma (ICP) technique is used to etch the p-GaN layer to prepare a periodic triangular nanopore array. After the etching is completed, the compressive stress in the epitaxial wafer sample is released to a certain extent. Then, die processing is performed on the etched LED epitaxial wafer samples. The LED chip with an etching depth of 150 nm has the highest overall luminous efficiency. Under a 100 mA injection current, the light output power (LOP) of the etched 150 nm sample is 23.61% higher than that of the original unetched sample.

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23

Domonkos, Mária, Pavel Demo, and Alexander Kromka. "Nanosphere Lithography for Structuring Polycrystalline Diamond Films." Crystals 10, no. 2 (February 14, 2020): 118. http://dx.doi.org/10.3390/cryst10020118.

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This paper deals with the structuring of polycrystalline diamond thin films using the technique of nanosphere lithography. The presented multistep approaches relied on a spin-coated self-assembled monolayer of polystyrene spheres, which served as a lithographic mask for the further custom nanofabrication steps. Various arrays of diamond nanostructures—close-packed and non-close-packed monolayers over substrates with various levels of surface roughness, noble metal films over nanosphere arrays, ordered arrays of holes, and unordered pores—were created using reactive ion etching, chemical vapour deposition, metallization, and/or lift-off processes. The size and shape of the lithographic mask was altered using oxygen plasma etching. The periodicity of the final structure was defined by the initial diameter of the spheres. The surface morphology of the samples was characterized using scanning electron microscopy. The advantages and limitations of the fabrication technique are discussed. Finally, the potential applications (e.g., photonics, plasmonics) of the obtained nanostructures are reviewed.

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24

Rundqvist, Jonas, Jan H. Hoh, and David B. Haviland. "Directed Immobilization of Protein-Coated Nanospheres to Nanometer-Scale Patterns Fabricated by Electron Beam Lithography of Poly(ethylene glycol) Self-Assembled Monolayers." Langmuir 22, no. 11 (May 2006): 5100–5107. http://dx.doi.org/10.1021/la052306v.

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25

Krupinski, Michal, Arkadiusz Zarzycki, Yevhen Zabila, and Marta Marszałek. "Weak Antilocalization Tailor-Made by System Topography in Large Scale Bismuth Antidot Arrays." Materials 13, no. 15 (July 22, 2020): 3246. http://dx.doi.org/10.3390/ma13153246.

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Using a two-carriers model and the Hikami-Larkin-Nagaoka (HLN) theory, we investigate the influence of large area patterning on magnetotransport properties in bismuth thin films with a thickness of 50 nm. The patterned systems have been produced by means of nanospheres lithography complemented by RF-plasma etching leading to highly ordered antidot arrays with the hexagonal symmetry and a variable antidot size. Simultaneous measurements of transverse and longitudinal magnetoresistance in a broad temperature range provided comprehensive data on transport properties and enabled us to extract the values of charge carrier densities and mobilities. Weak antilocalization signatures observed at low temperatures provided information on spin-orbit scattering length ranging from 20 to 30 nm, elastic scattering length of approx. 60 nm, and strong dependence on temperature phase coherence length. We show that in the absence of antidots the charge carrier transport follow 2-dimensional behavior and the dimensionality for phase-coherent processes changes from two to three dimensions at temperature higher than 10 K. For the antidot arrays, however, a decrease of the power law dephasing exponent is observed which is a sign of the 1D-2D crossover caused by the geometry of the system. This results in changes of scattering events probability and phase coherence lengths depending on the antidot diameters, which opens up opportunity to tailor the magnetotransport characteristics.

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26

Colombelli, Adriano, Elisabetta Primiceri, Silvia Rizzato, Anna Grazia Monteduro, Giuseppe Maruccio, Roberto Rella, and Maria Grazia Manera. "Nanoplasmonic Biosensing Approach for Endotoxin Detection in Pharmaceutical Field." Chemosensors 9, no. 1 (January 4, 2021): 10. http://dx.doi.org/10.3390/chemosensors9010010.

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The outer membrane of Gram-negative bacteria contains bacterial endotoxins known as Lipopolysaccharides (LPS). Owing to the strong immune responses induced in humans and animals, these large molecules have a strong toxic effect that can cause severe fever, hypotension, shock, and death. Endotoxins are often present in the environment and medical implants and represent undesirable contaminations of pharmaceutical preparations and medical devices. To overcome the limitations of the standard technique, novel methods for early and sensitive detection of LPS will be of crucial importance. In this work, an interesting approach for the sensitive detection of LPS has been realized by exploiting optical features of nanoplasmonic transducers supporting Localized Surface Plasmon Resonances (LSPRs). Ordered arrays of gold nano-prisms and nano-disks have been realized by nanospheres lithography. The realized transducers have been integrated into a simple and miniaturized lab-on-a-chip (LOC) platform and functionalized with specific antibodies as sensing elements for the detection of LPS. Interactions of specific antibodies anchored on protein A-modified sensor chips with the investigated analyte resulted in a spectral shift in the plasmonic resonance peak of the transducers. A good linear relationship between peak shifts and the LPS concentration has been demonstrated for the fabricated nano-structures with a detection limit down to 5 ng/mL. Integration with a proper microfluidic platform demonstrates the possibility of yielding a prototypal compact device to be used as an analytical test for quality determination of pharmaceutical products.

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27

Ganguly, Arnab, and Gobind Das. "Combining Azimuthal and Polar Angle Resolved Shadow Mask Deposition and Nanosphere Lithography to Uncover Unique Nano-Crystals." Nanomaterials 12, no. 19 (October 4, 2022): 3464. http://dx.doi.org/10.3390/nano12193464.

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In this article, we present a systematic investigation on a multistep nanosphere lithography technique to uncover its potential in fabricating a wide range of two- and three-dimensional nanostructures. A tilted (polar angle) electron beam shower on a nanosphere mask results in an angled shadow mask deposition. The shape of the shadow also depends on the azimuthal angle of the mask sitting on top of the substrate. We performed angled shadow mask depositions with systematic variation of these two angular parameters, giving rise to complex nanostructures (down to 50 nm), repeated over a large area without defect. In this article, nanosphere lithography with two- and four-fold azimuthal symmetry was studied at constant tilt angles followed by variations in tilt without azimuthal rotation of the substrate. Finally, both angular parameters were simultaneously varied. The structure of shadow crystals was explained using Matlab simulation. This work stretches the horizons of nanosphere lithography, opening up new scopes in plasmonic and magnonic research.

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28

Chen, Kai, Bharath Bangalore Rajeeva, Zilong Wu, Michael Rukavina, Thang Duy Dao, Satoshi Ishii, Masakazu Aono, Tadaaki Nagao, and Yuebing Zheng. "Moiré Nanosphere Lithography." ACS Nano 9, no. 6 (June 2, 2015): 6031–40. http://dx.doi.org/10.1021/acsnano.5b00978.

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29

Vakalopoulou, Efthymia, Thomas Rath, Fernando Gustavo Warchomicka, Francesco Carraro, Paolo Falcaro, Heinz Amenitsch, and Gregor Trimmel. "Honeycomb-structured copper indium sulfide thin films obtained via a nanosphere colloidal lithography method." Materials Advances 3, no. 6 (2022): 2884–95. http://dx.doi.org/10.1039/d2ma00004k.

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Honeycomb structured copper indium sulfide layers are successfully realized via a nanosphere lithography route employing polystyrene nanosphere array templates and metal xanthates or a nanocrystal ink.

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30

Brassat, Katharina, Daniel Kool, Julius Bürger, and Jörg K. N. Lindner. "Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography." Nanoscale 10, no. 21 (2018): 10005–17. http://dx.doi.org/10.1039/c8nr01397g.

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31

Luo, Lingpeng, Eser Metin Akinoglu, Lihua Wu, Tyler Dodge, Xin Wang, Guofu Zhou, Michael J. Naughton, Krzysztof Kempa, and Michael Giersig. "Nano-bridged nanosphere lithography." Nanotechnology 31, no. 24 (March 26, 2020): 245302. http://dx.doi.org/10.1088/1361-6528/ab7c4c.

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32

Wang, Hai Peng, Chong Wang, Jie Yu, Jie Yang, and Yu Yang. "Advance in the Growth of Ordered Ge/Si Quantum Dots." Applied Mechanics and Materials 320 (May 2013): 168–75. http://dx.doi.org/10.4028/www.scientific.net/amm.320.168.

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Recent progress in the growth of ordered Ge/Si quantum dots (QDs) is reviewed. We focus on the detailed progresses of the Ge/Si multiple layers QDs and the preparation of Ge/Si QDs by ion beam irradiation. In addition, the growth of Ge/Si QDs on patterned substrate by using different preparation methods are also well discussed, such as nanosphere lithography technology, extreme ultra-violet interference lithography technology, nanoimprint lithography technology, etc.

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33

Karadan, Prajith, Aji A. Anappara, V. H. S. Moorthy, Chandrabhas Narayana, and Harish C. Barshilia. "Improved broadband and omnidirectional light absorption in silicon nanopillars achieved through gradient mesoporosity induced leaky waveguide modulation." RSC Advances 6, no. 110 (2016): 109157–67. http://dx.doi.org/10.1039/c6ra20467h.

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34

Gómez-Castaño, Mayte, Hanbin Zheng, Juan Luis García-Pomar, Renaud Vallée, Agustín Mihi, and Serge Ravaine. "Tunable index metamaterials made by bottom-up approaches." Nanoscale Advances 1, no. 3 (2019): 1070–76. http://dx.doi.org/10.1039/c8na00250a.

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35

Tang, Maureen H., Pongkarn Chakthranont, and Thomas F. Jaramillo. "Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting." RSC Advances 7, no. 45 (2017): 28350–57. http://dx.doi.org/10.1039/c7ra02937c.

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36

Zheng, Peng, Scott K. Cushing, Savan Suri, and Nianqiang Wu. "Tailoring plasmonic properties of gold nanohole arrays for surface-enhanced Raman scattering." Physical Chemistry Chemical Physics 17, no. 33 (2015): 21211–19. http://dx.doi.org/10.1039/c4cp05291a.

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37

Lin, Hao, Ming Fang, Ho-Yuen Cheung, Fei Xiu, SenPo Yip, Chun-Yuen Wong, and Johnny C. Ho. "Hierarchical silicon nanostructured arrays via metal-assisted chemical etching." RSC Adv. 4, no. 91 (2014): 50081–85. http://dx.doi.org/10.1039/c4ra06172a.

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Hierarchically configured nanostructures, such as nanograss and nanowalls, have been fabricatedviaa low-cost approach that combines metal-assisted chemical etching (MaCE), nanosphere lithography and conventional photolithography.

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38

Graniel, Octavio, Igor Iatsunskyi, Emerson Coy, Christophe Humbert, Grégory Barbillon, Thierry Michel, David Maurin, Sébastien Balme, Philippe Miele, and Mikhael Bechelany. "Au-covered hollow urchin-like ZnO nanostructures for surface-enhanced Raman scattering sensing." Journal of Materials Chemistry C 7, no. 47 (2019): 15066–73. http://dx.doi.org/10.1039/c9tc05929f.

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Au-covered hollow urchin-like ZnO nanostructures were prepared with controlled size by combining nanosphere lithography (NSL), atomic layer deposition (ALD), electrodeposition, and electron beam (e-beam) evaporation.

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39

Brinkert, Katharina, Matthias H. Richter, Ömer Akay, Michael Giersig, Katherine T. Fountaine, and Hans-Joachim Lewerenz. "Advancing semiconductor–electrocatalyst systems: application of surface transformation films and nanosphere lithography." Faraday Discussions 208 (2018): 523–35. http://dx.doi.org/10.1039/c8fd00003d.

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We demonstrate that shadow nanosphere lithography (SNL) is an auspicious tool to systematically create three-dimensional electrocatalyst nanostructures on the semiconductor photoelectrode through controlling their morphology and optical properties.

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40

Larson, Steven, Daniel Carlson, Bin Ai, and Yiping Zhao. "The extraordinary optical transmission and sensing properties of Ag/Ti composite nanohole arrays." Physical Chemistry Chemical Physics 21, no. 7 (2019): 3771–80. http://dx.doi.org/10.1039/c8cp07729k.

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Ag/Ti composite nanohole arrays were fabricated through a combination of nanosphere lithography, reactive ion etching, and co-deposition. The sensing performances were improved by the tunable dispersion of the Ag/Ti composites.

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41

Cowley, A., J. A. Steele, D. Byrne, R. K. Vijayaraghavan, and P. J. McNally. "Fabrication and characterisation of GaAs nanopillars using nanosphere lithography and metal assisted chemical etching." RSC Advances 6, no. 36 (2016): 30468–73. http://dx.doi.org/10.1039/c5ra23621e.

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We present a low-cost fabrication procedure for the production of nanoscale periodic GaAs nanopillar arrays, using the nanosphere lithography technique as a templating mechanism and the electrochemical metal assisted etch process (MacEtch).

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42

Colombelli, Adriano, Daniela Lospinoso, Antonietta Taurino, and Maria Grazia Manera. "Tailoring a periodic metal nanoantenna array using low cost template-assisted lithography." Journal of Materials Chemistry C 7, no. 44 (2019): 13818–28. http://dx.doi.org/10.1039/c9tc03701b.

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Tailoring the optical response of metal nanoparticles by controlling their morphology is a key topic in the field of nano-optics. Here, a simple approach for the fabrication of tunable plasmonic nanostructures by nanosphere lithography is presented.

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43

Shinotsuka, Kei. "Nano Dot Array by Nanosphere Lithography." Seikei-Kakou 23, no. 6 (May 20, 2011): 324–29. http://dx.doi.org/10.4325/seikeikakou.23.324.

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44

Cortalezzi, Maria. "Nanostructured Biosensors Produced by Nanosphere Lithography." MRS Bulletin 29, no. 7 (July 2004): 435–36. http://dx.doi.org/10.1557/mrs2004.134.

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45

Yu, C. C., Y. D. Yao, S. C. Chou, and Y. Liou. "Magnetic Nanostructures Fabricated through Nanosphere Lithography." Transactions of the Magnetics Society of Japan 5, no. 1 (2005): 9–12. http://dx.doi.org/10.3379/tmjpn2001.5.9.

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46

Cheung, C. L., R. J. Nikolić, C. E. Reinhardt, and T. F. Wang. "Fabrication of nanopillars by nanosphere lithography." Nanotechnology 17, no. 5 (February 10, 2006): 1339–43. http://dx.doi.org/10.1088/0957-4484/17/5/028.

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47

Laurvick, Tod V., Ronald A. Coutu, James M. Sattler, and Robert A. Lake. "Surface feature engineering through nanosphere lithography." Journal of Micro/Nanolithography, MEMS, and MOEMS 15, no. 3 (August 17, 2016): 031602. http://dx.doi.org/10.1117/1.jmm.15.3.031602.

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48

Kosiorek, A., W. Kandulski, P. Chudzinski, K. Kempa, and M. Giersig. "Shadow Nanosphere Lithography: Simulation and Experiment." Nano Letters 4, no. 7 (July 2004): 1359–63. http://dx.doi.org/10.1021/nl049361t.

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49

Xin, Zheng Hang, Chong Wang, Feng Qiu, Rong Fei Wang, Chen Li, and Yu Yang. "Advance in the Fabrication of Ordered Ge/Si Nanostructure Array on Si Patterned Substrate by Nanosphere Lithography." Materials Science Forum 852 (April 2016): 283–92. http://dx.doi.org/10.4028/www.scientific.net/msf.852.283.

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The recent process in the fabrication of the ordered Ge/Si quantum dots (QDs) is reviewed. The fabrication step generally started on the preparation of patterned substrate prepared in advance by using several interesting methods, such as photo lithography, focus ion beam (FIB), reactive ion etching (RIE), and extreme ultraviolet lithography (EUV-IL) et al, which are introduced briefly in this article. Here, we’d like to focus on the detailed process of nanosphere lithography (NSL) which has the advantages of less cost and higher product compared with the referred methods. The ordered Ge nanostructures always show as Hexagonal close-packed array on the patterned Si substrate and have the advantages of potential applications in electronic and optoelectronic devices.

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50

Kasani, Sujan, Kathrine Curtin, and Nianqiang Wu. "A review of 2D and 3D plasmonic nanostructure array patterns: fabrication, light management and sensing applications." Nanophotonics 8, no. 12 (October 4, 2019): 2065–89. http://dx.doi.org/10.1515/nanoph-2019-0158.

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AbstractThis review article discusses progress in surface plasmon resonance (SPR) of two-dimensional (2D) and three-dimensional (3D) chip-based nanostructure array patterns. Recent advancements in fabrication techniques for nano-arrays have endowed researchers with tools to explore a material’s plasmonic optical properties. In this review, fabrication techniques including electron-beam lithography, focused-ion lithography, dip-pen lithography, laser interference lithography, nanosphere lithography, nanoimprint lithography, and anodic aluminum oxide (AAO) template-based lithography are introduced and discussed. Nano-arrays have gained increased attention because of their optical property dependency (light-matter interactions) on size, shape, and periodicity. In particular, nano-array architectures can be tailored to produce and tune plasmonic modes such as localized surface plasmon resonance (LSPR), surface plasmon polariton (SPP), extraordinary transmission, surface lattice resonance (SLR), Fano resonance, plasmonic whispering-gallery modes (WGMs), and plasmonic gap mode. Thus, light management (absorption, scattering, transmission, and guided wave propagation), as well as electromagnetic (EM) field enhancement, can be controlled by rational design and fabrication of plasmonic nano-arrays. Because of their optical properties, these plasmonic modes can be utilized for designing plasmonic sensors and surface-enhanced Raman scattering (SERS) sensors.

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