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Статті в журналах з теми "Nanofabrication, growth and self assembly"
Zhang, Q., Y. J. Shin, F. Hua, L. V. Saraf, and D. W. Matson. "Fabrication of Transparent Capacitive Structure by Self-Assembled Thin Films." Journal of Nanoscience and Nanotechnology 8, no. 6 (June 1, 2008): 3008–12. http://dx.doi.org/10.1166/jnn.2008.075.
Повний текст джерелаBetz-Güttner, Erik, Martina Righi, Silvestro Micera, and Alessandro Fraleoni-Morgera. "Directional Growth of cm-Long PLGA Nanofibers by a Simple and Fast Wet-Processing Method." Materials 15, no. 2 (January 17, 2022): 687. http://dx.doi.org/10.3390/ma15020687.
Повний текст джерелаAkil, Suzanna, Rana Omar, Dmitry Kuznetsov, Vladimir Shur, Aotmane En Naciri, and Safi Jradi. "Advanced Large-Scale Nanofabrication Route for Ultrasensitive SERS Platforms Based on Precisely Shaped Gold Nanostructures." Nanomaterials 11, no. 7 (July 12, 2021): 1806. http://dx.doi.org/10.3390/nano11071806.
Повний текст джерелаRivero, Pedro, Javier Goicoechea, and Francisco Arregui. "Layer-by-Layer Nano-assembly: A Powerful Tool for Optical Fiber Sensing Applications." Sensors 19, no. 3 (February 7, 2019): 683. http://dx.doi.org/10.3390/s19030683.
Повний текст джерелаOzin, Geoffrey A., Kun Hou, Bettina V. Lotsch, Ludovico Cademartiri, Daniel P. Puzzo, Francesco Scotognella, Arya Ghadimi, and Jordan Thomson. "Nanofabrication by self-assembly." Materials Today 12, no. 5 (May 2009): 12–23. http://dx.doi.org/10.1016/s1369-7021(09)70156-7.
Повний текст джерелаKajbafvala, Amir, Hamed Bahmanpour, Mohammad H. Maneshian, and Minghang Li. "Self-Assembly Techniques for Nanofabrication." Journal of Nanomaterials 2013 (2013): 1–3. http://dx.doi.org/10.1155/2013/158517.
Повний текст джерелаLi, Hanying, Joshua D. Carter, and Thomas H. LaBean. "Nanofabrication by DNA self-assembly." Materials Today 12, no. 5 (May 2009): 24–32. http://dx.doi.org/10.1016/s1369-7021(09)70157-9.
Повний текст джерелаChoi, Young Joo, Hyeong Min Jin, Bong Hoon Kim, Ju Young Kim, and Sang Ouk Kim. "Self-Assembly Nanofabrication via Mussel-Inspired Interfacial Engineering." Applied Mechanics and Materials 229-231 (November 2012): 2749–52. http://dx.doi.org/10.4028/www.scientific.net/amm.229-231.2749.
Повний текст джерелаRoss, Caroline A., Karl K. Berggren, Joy Y. Cheng, Yeon Sik Jung, and Jae-Byum Chang. "Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly." Advanced Materials 26, no. 25 (April 6, 2014): 4386–96. http://dx.doi.org/10.1002/adma.201400386.
Повний текст джерелаZheng, Yuanhui, Lorenzo Rosa, Thibaut Thai, Soon Hock Ng, Daniel E. Gómez, Hiroyuki Ohshima, and Udo Bach. "Asymmetric gold nanodimer arrays: electrostatic self-assembly and SERS activity." Journal of Materials Chemistry A 3, no. 1 (2015): 240–49. http://dx.doi.org/10.1039/c4ta05307a.
Повний текст джерелаДисертації з теми "Nanofabrication, growth and self assembly"
Zin, Melvin T. "Self-assembly and nanofabrication approaches towards photonics and plasmonics /." Thesis, Connect to this title online; UW restricted, 2007. http://hdl.handle.net/1773/15502.
Повний текст джерелаJung, Yeon Sik. "Templated self-assembly of siloxane block copolymers for nanofabrication." Thesis, Massachusetts Institute of Technology, 2009. http://hdl.handle.net/1721.1/52791.
Повний текст джерелаThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student submitted PDF version of thesis.
Includes bibliographical references.
Monolayer patterns of block copolymer (BCP) microdomains have been pursued for applications in below sub-30 nm nanolithography. BCP selfassembly processing is scalable and low cost, and is well-suited for integration with existing semiconductor fabrication techniques. The two critical issues are how to obtain reliable long-range ordering of features with minimum defect densities and how to successfully transfer the patterns into other functional materials. Exceptionally well-ordered and robust nanoscale patterns can be made from poly(styrene-b-dimethylsiloxane) (PS-PDMS) BCPs, which have a very large Flory-Huggins interaction parameter between the blocks compared to other commonly used BCPs. Cylinder- or sphere-forming BCP films were spincoated over silicon substrates patterned with shallow steps using optical lithography or nanoscale posts made by electron-beam lithography, and solvent-annealed to induce ordering. This generates patterns with a correlation length of at least several micrometers. The annealed film was treated with plasma to obtain oxidized PDMS patterns with a lateral dimension of 14 - 18 nm. These can be used as an etch mask or an easily removable template for patterning functional materials. Solvent vapor treatments can tune the pattern dimension and morphology. Different degrees of solvent uptake in BCP films during solvent-annealing can manipulate the interfacial interaction between the two blocks, and a mixed solvent vapor can change the effective volume fraction of each block. The self-assembled patterns can be transferred into various kinds of functional materials.
(cont.) For example, arrays of parallel lines were used as a mask to pattern poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) conducting polymer thin films. The resulting PEDOT:PSS nanowire array was used as an chemiresistive-type ethanol-sensing device. Metallic films such as Ti, Pt, Ta, W, and magnetic Co and Ni were structured using a pattern-reversal process. Coercivity enhancements were observed for the fabricated ferromagnetic nanostructures such as wires, rings, and antidots. These functional nanostructures can be utilized for a variety of devices such as high-density and high performance sensor or memory devices.
by Yeon Sik Jung.
Ph.D.
Do, Hyung Wan. "Three-dimensional nanofabrication by electron-beam lithography and directed self-assembly." Thesis, Massachusetts Institute of Technology, 2014. http://hdl.handle.net/1721.1/93778.
Повний текст джерелаThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references.
In this thesis, we investigated three-dimensional (3D) nanofabrication using electron-beam lithography (EBL), block copolymer (BCP) self-assembly, and capillary force-induced self-assembly. We first developed new processes for fabricating 3D nanostructures using a hydrogen silsesquioxane (HSQ) and poly(methylmeth-acrylate) (PMMA) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures. Next, we used the 3D nanostructures as topographical templates guiding the self-assembly of polystyrene-b-polydimethylsiloxane (PS-b-PDMS) block copolymer thin films. We observed parallel cylinders, mesh-shaped structures, and bar-shaped structures in PDMS. Finally, we studied capillary force-induced self-assembly of linear nanostructures using a spin drying process. We developed a computation schema based on the pairwise collapse of nanostructures. We achieved propagation of information and built a proof of concept logic gate.
by Hyung Wan Do.
S.M.
Perl, András. "Multivalent self-assembly at interfaces from fundamental kinetic aspects to applications in nanofabrication /." Enschede : University of Twente [Host], 2008. http://doc.utwente.nl/60316.
Повний текст джерелаGates, Elisabeth Pound. "Self-Assembled DNA Origami Templates for the Fabrication of Electronic Nanostructures." BYU ScholarsArchive, 2013. https://scholarsarchive.byu.edu/etd/4000.
Повний текст джерелаPinto, Gómez Christian. "Directed self-assembly of block copolymers for the fabrication of nanomechanical structures." Doctoral thesis, Universitat Autònoma de Barcelona, 2021. http://hdl.handle.net/10803/671972.
Повний текст джерелаEl principal objetivo de esta tesis, titulada "Autoensamblaje dirigido de copolímeros de bloque para la fabricación de estructuras nanomecánicas", es demostrar la posibilidad de fabricar estructuras nanomecánicas funcionales mediante el autoensamblaje dirigido (DSA) de copolímeros de bloque (BCPs) como técnica de nanoestructuración. El DSA es una técnica de nanolitografía bottom-up basada en la capacidad que tienen los BCPs de segregarse en dominios de escala micro/nanométrica. Gracias a su alta resolución, alto rendimiento y bajo coste, esta técnica ha sido muy estudiada por la industria de semiconductores para nanoelectrónica, pero también ha sido aplicada en otros campos que requieren de una alta densidad de elementos a escala nanométrica. En esta tesis presentamos un proceso novedoso basado en DSA que demuestra ser apto para la fabricación de sistemas nanomecánicos. Demostramos la fabricación de membranas de silicio suspendidas ancladas por matrices de gran número de nanohilos de silicio empleando la grafoepitaxia de poliestireno-b-polimetilmetacrilato (PS-b-PMMA), uno de los BCP más extendidos. Los dispositivos obtenidos pueden desarrollarse para construir sensores de masa de alta sensibilidad basados en resonadores nanomecánicos.
The main goal of this dissertation, entitled "irected self-assembly of block copolymers for the fabrication of nanomechanical structures", is to demonstrate the possibility of fabricating nanomechanical functional structures by employing the directed self-assembly (DSA) of block copolymers (BCPs) as a nanopatterning tool. DSA is a bottom-up nanolithography technique based on the ability of BCPs to segregate into domains at the micro/nanoscale, and it has attracted high interest due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. Thanks to these characteristics, the technique has been heavily studied by the semiconductor industry for nanoelectronics, and also applied to alternate fields that might require from the definition of high-density nanoscale features. In this thesis we present a novel fabrication route based on DSA that proves to be suitable for the fabrication of nanomechanical systems. Here, we demonstrate the fabrication of suspended silicon membranes clamped by high-density arrays of silicon nanowires by using a DSA approach based on the graphoepitaxy of polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA), a well-known diblock copolymer. Obtained devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators.
Universitat Autònoma de Barcelona. Programa de Doctorat en Enginyeria Electrònica i de Telecomunicació
Jespersen, Michael L. 1979. "Engineering the macro-nano interface: Designing the directed self-assembly and interfacial interactions of gold nanoparticle monolayers." Thesis, University of Oregon, 2008. http://hdl.handle.net/1794/7504.
Повний текст джерелаGold nanoparticles in the 1-2 mn core diameter size regime have generated a great deal of interest due to their size-dependent electronic, optical, and catalytic properties. A number of proof-of-concept experiments have demonstrated that small metal nanoparticles can be integrated into single electron transistors and optical waveguides. Still, reliable incorporation of gold nanoparticles into devices requires practical methods for their assembly on surfaces. Additionally, surface modification methods must be developed in order to control interparticle interactions and nanoparticle-environment interactions for use in sensing and catalysis. In this research, nanoparticle-substrate interactions were utilized to assemble surface-bound gold nanoparticle monolayers with interesting electronic and catalytic properties. Gold nanoparticles (1.5 nm diameter) with a thiol ligand shell containing phosphonic acid terminal functionality were synthesized and assembled selectively onto hafnium-modified silicon dioxide substrates through bonding of the terminal phosphonate to Hf(IV) surface groups. By increasing the surface coverage of Hf, it was possible to assemble monolayers of gold nanoparticles dense enough to exhibit nonlinear current-voltage properties across a 5-μm electrode gap at room temperature. Moreover, by taking advantage of the selectivity of this ligand shell for ZnO over SiO 2 , small gold nanoparticles were utilized as catalysts for selective growth of patterned, vertical ZnO nanowire arrays. In addition to engineering nanoparticle-substrate interactions, new surface modification methods were introduced to manipulate the interaction of the as-deposited gold nanoparticle monolayers with the environment. For example, thiol-thiol ligand exchange reactions were carried out on the surface-bound nanoparticle monolayers by immersion in dilute thiol solutions. Contact angle and XPS measurements indicate that the upper, surface-exposed phosphonic acid ligands are replaced by incoming thiol ligands. TEM measurements indicate that nanoparticle monolayers remain surface-bound and are stable to this exchange process, as the average particle size and surface coverage are preserved. As another example, the ligand shell can be partially removed by UV/ozone treatment to expose bare gold cores to the surrounding environment. On metal oxide substrates, this approach activates the particles for room temperature oxidation of carbon monoxide to carbon dioxide. This dissertation includes both my previously published and my co-authored materials.
Adviser: James E. Hutchison
Cruz, Daniel Alejandro. "Hierarchical Self-Assembly and Substitution Rules." Scholar Commons, 2019. https://scholarcommons.usf.edu/etd/7770.
Повний текст джерелаGottlieb, Steven. "High-resolution guiding patterns for the directed self-assembly of block copolymers." Doctoral thesis, Universitat Autònoma de Barcelona, 2018. http://hdl.handle.net/10803/669854.
Повний текст джерелаMolnar, G., L. Dozsa, Z. Vertesy, and Z. J. Horvath. "Thickness Dependent Growth of Epitaxial Iron Silicide Nanoobjects on Si (001)." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35180.
Повний текст джерелаКниги з теми "Nanofabrication, growth and self assembly"
J, Dixon Charles, and Curtines Ollin W, eds. Nanotechnology: Nanofabrication, patterning, and self assembly. Hauppauge, NY: Nova Science Publishers, 2009.
Знайти повний текст джерелаA, Golovin A., Nepomni͡ashchiĭ A. A, and NATO Public Diplomacy Division, eds. Self-assembly, pattern formation and growth phenomena in nano-systems. Dordrecht: Springer, 2006.
Знайти повний текст джерелаBader, Samuel D., Robert Hull, Eric H. Chason, and Eric A. Stach. Current Issues in Heteropitaxial Growth Vol. 696: Stress Relaxation and Self Assembly. University of Cambridge ESOL Examinations, 2014.
Знайти повний текст джерелаVvedensky, Dimitri D. Quantum dots: Self-organized and self-limiting assembly. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.6.
Повний текст джерела(Editor), Eric A. Stach, Eric A. Chason (Editor), Robert Hull (Editor), and Samuel D. Bader (Editor), eds. Current Issues in Heteroepitaxial Growth--Stress Relaxation and Self Assembly: Symposium held November 26-29, 2001, Boston Massachusetts, U.S.A. (Materials Research Society Symposia Proceedings). Materials Research Society, 2002.
Знайти повний текст джерелаNepomnyashchy, Alexander A., and Alexander A. Golovin. Self-Assembly, Pattern Formation and Growth Phenomena in Nano-Systems: Proceedings of the NATO Advanced Study Institute, held in St. Etienne de Tinee, ... 11, 2004. Springer, 2014.
Знайти повний текст джерелаWang, X. S., S. S. Kushvaha, X. Chu, H. Zhang, Z. Yan, and W. Xiao. Selective self-assembly of semi-metal straight and branched nanorods on inert substrates. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533053.013.15.
Повний текст джерела(Editor), Alexander A. Golovin, and Alexander A. Nepomnyashchy (Editor), eds. Self-Assembly, Pattern Formation and Growth Phenomena in Nano-Systems: Proceedings of the NATO Advanced Study Institute, held in St. Etienne de Tinee, ... II: Mathematics, Physics and Chemistry). Springer, 2006.
Знайти повний текст джерела(Editor), Alexander A. Golovin, and Alexander A. Nepomnyashchy (Editor), eds. Self-Assembly, Pattern Formation and Growth Phenomena in Nano-Systems: Proceedings of the NATO Advanced Study Institute, held in St. Etienne de Tinee, ... II: Mathematics, Physics and Chemistry). Springer, 2006.
Знайти повний текст джерелаWright Rigueur, Leah. Exorcising the Ghost of Richard Nixon. Princeton University Press, 2017. http://dx.doi.org/10.23943/princeton/9780691159010.003.0006.
Повний текст джерелаЧастини книг з теми "Nanofabrication, growth and self assembly"
Cui, Zheng. "Nanofabrication by Self-Assembly." In Nanofabrication, 365–99. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-39361-2_10.
Повний текст джерелаCui, Zheng. "Nanofabrication by Self-Assembly." In Nanofabrication, 295–333. Boston, MA: Springer US, 2008. http://dx.doi.org/10.1007/978-0-387-75577-9_8.
Повний текст джерелаGatzen, Hans H., Volker Saile, and Jürg Leuthold. "Nanofabrication by Self-Assembly." In Micro and Nano Fabrication, 409–23. Berlin, Heidelberg: Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-662-44395-8_8.
Повний текст джерелаZhang, Wujie. "Nanofabrication III: Self-Assembly." In Nanotechnology for Bioengineers, 23–35. Cham: Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-031-01668-4_4.
Повний текст джерелаGowd, E. Bhoje, Mallikarjuna Shroff Rama, and Manfred Stamm. "Nanostructures Based on Self-Assembly of Block Copolymers." In Nanofabrication, 191–216. Vienna: Springer Vienna, 2011. http://dx.doi.org/10.1007/978-3-7091-0424-8_8.
Повний текст джерелаWilbur, James L., and George M. Whitesides. "Self-Assembly and Self-Assembled Monolayers in Micro- and Nanofabrication." In Nanotechnology, 331–69. New York, NY: Springer New York, 1999. http://dx.doi.org/10.1007/978-1-4612-0531-9_8.
Повний текст джерелаPapadopoulos, Christo. "Direct-Growth and Self-assembly." In SpringerBriefs in Materials, 45–61. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-31742-7_7.
Повний текст джерелаHeller, Michael J., Benjamin Sullivan, Dietrich Dehlinger, Paul Swanson, and Dalibor Hodko. "Next-Generation DNA Hybridization and Self-Assembly Nanofabrication Devices." In Springer Handbook of Nanotechnology, 389–401. Berlin, Heidelberg: Springer Berlin Heidelberg, 2010. http://dx.doi.org/10.1007/978-3-642-02525-9_13.
Повний текст джерелаPersichetti, L., A. Capasso, A. Sgarlata, M. Fanfoni, N. Motta, and A. Balzarotti. "Towards a Controlled Growth of Self-assembled Nanostructures: Shaping, Ordering, and Localization in Ge/Si Heteroepitaxy." In Self-Assembly of Nanostructures, 201–63. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4614-0742-3_4.
Повний текст джерелаBaryshnikov, Yuliy, Ed Coffman, Nadrian Seeman, and Teddy Yimwadsana. "Self-correcting Self-assembly: Growth Models and the Hammersley Process." In DNA Computing, 1–11. Berlin, Heidelberg: Springer Berlin Heidelberg, 2006. http://dx.doi.org/10.1007/11753681_1.
Повний текст джерелаТези доповідей конференцій з теми "Nanofabrication, growth and self assembly"
Shiu, Jau-Ye, Chun-Wen Kuo, and Peilin Chen. "Actively controlled self-assembly of colloidal crystals in microfluidic networks." In MOEMS-MEMS Micro & Nanofabrication, edited by Ian Papautsky and Isabelle Chartier. SPIE, 2005. http://dx.doi.org/10.1117/12.590497.
Повний текст джерелаShuhua Wei and Jing Zhang. "Research on programmable capillary-force self-assembly nanofabrication." In 2013 8th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS). IEEE, 2013. http://dx.doi.org/10.1109/nems.2013.6559796.
Повний текст джерелаRothemund, Paul W. K. "Beyond Watson and Crick: Programming DNA self-assembly for nanofabrication." In 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS). IEEE, 2012. http://dx.doi.org/10.1109/nems.2012.6196703.
Повний текст джерелаWei, Shuhua, Minglong Qin, and Jing Zhang. "Mechanism and application of capillary-force self-assembly micro/nanofabrication." In 2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO). IEEE, 2016. http://dx.doi.org/10.1109/3m-nano.2016.7824940.
Повний текст джерелаHe, J. H., S. Q. Sun, Y. F. Li, J. S. Ye, J. M. Kong, Y. L. Cai, C. W. H. Li, T. M. Lim, and W. C. Hui. "Micro-cantilever resonance sensor for biomolecular detection by using self-assembly nano-particles." In MOEMS-MEMS 2006 Micro and Nanofabrication, edited by Ian Papautsky and Wanjun Wang. SPIE, 2006. http://dx.doi.org/10.1117/12.647310.
Повний текст джерелаLu, Wei. "Guided Self-Assembly via Designed Strain Field." In 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems. ASMEDC, 2007. http://dx.doi.org/10.1115/mnc2007-21614.
Повний текст джерелаFrechette, Stephen, Yong Bin Kim, and F. Lombardi. "Checkpointing of Rectilinear Growth in DNA Self-Assembly." In 2008 23rd IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (DFTVS). IEEE, 2008. http://dx.doi.org/10.1109/dft.2008.10.
Повний текст джерелаWang, Benzhong, and Soo-Jin Chua. "Self-organized growth of InP on GaAs substrate by MOCVD." In International Symposium on Microelectronics and Assembly, edited by H. Barry Harrison, Andrew T. S. Wee, and Subhash Gupta. SPIE, 2000. http://dx.doi.org/10.1117/12.405393.
Повний текст джерелаMasoud Hashempour, Zahra Mashreghian Arani, and Fabrizio Lombardi. "Robust self-assembly of interconnects by parallel DNA growth." In 2007 IEEE International Symposium on Nanoscale Architectures. IEEE, 2007. http://dx.doi.org/10.1109/nanoarch.2007.4400860.
Повний текст джерелаChandramohan, Abhishek, Nikolai Sibirev, Vladimir G. Dubrovskii, Budhika Mendis, Mike C. Petty, Andrew J. Gallant, and Dagou A. Zeze. "Self-assembly based nanometer-scale patterning for nanowire growth." In SPIE Nanoscience + Engineering, edited by Eva M. Campo, Elizabeth A. Dobisz, and Louay A. Eldada. SPIE, 2015. http://dx.doi.org/10.1117/12.2188016.
Повний текст джерелаЗвіти організацій з теми "Nanofabrication, growth and self assembly"
Hsu, Julia W. P. Nanolithography Directed Materials Growth and Self-Assembly. Office of Scientific and Technical Information (OSTI), October 2006. http://dx.doi.org/10.2172/1137213.
Повний текст джерела