Статті в журналах з теми "NAND Flash Interface"
Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями
Ознайомтеся з топ-31 статей у журналах для дослідження на тему "NAND Flash Interface".
Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.
Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.
Переглядайте статті в журналах для різних дисциплін та оформлюйте правильно вашу бібліографію.
Myramuru, Shanmukha Sai Nikhil, Dr S. Chandra Mohan Reddy, and Dr Gannera Mamatha. "Design and Integration of NAND Flash Memory Controller for Open Power-based Fabless SoC." International Journal of Engineering and Advanced Technology 12, no. 2 (December 30, 2022): 137–44. http://dx.doi.org/10.35940/ijeat.d3470.1212222.
Повний текст джерелаLiu, Hai Ke, Shun Wang, Xin Gna Kang, and Jin Liang Wang. "Realization of NAND FLASH Control Glueless Interface Circuit." Advanced Materials Research 1008-1009 (August 2014): 659–62. http://dx.doi.org/10.4028/www.scientific.net/amr.1008-1009.659.
Повний текст джерелаLiu, Gen Xian, and Dong Sheng Wang. "Low Cost Wear Leveling for High-Density SPI NAND Flash in Memory Constrained Embedded System." Applied Mechanics and Materials 427-429 (September 2013): 1277–80. http://dx.doi.org/10.4028/www.scientific.net/amm.427-429.1277.
Повний текст джерелаHung, Ji Jun, Kai Bu, Zhao Lin Sun, Jie Tao Diao, and Jian Bin Liu. "PCI Express-Based NVMe Solid State Disk." Applied Mechanics and Materials 464 (November 2013): 365–68. http://dx.doi.org/10.4028/www.scientific.net/amm.464.365.
Повний текст джерелаMissimer, Katherine, Manos Athanassoulis, and Richard West. "Telomere: Real-Time NAND Flash Storage." ACM Transactions on Embedded Computing Systems 21, no. 1 (January 31, 2022): 1–24. http://dx.doi.org/10.1145/3479157.
Повний текст джерелаYan, Chin-Rung, Jone F. Chen, Ya-Jui Lee, Yu-Jie Liao, Chung-Yi Lin, Chih-Yuan Chen, Yin-Chia Lin, and Huei-Haurng Chen. "Extraction and Analysis of Interface States in 50-nm nand Flash Devices." IEEE Transactions on Electron Devices 60, no. 3 (March 2013): 992–97. http://dx.doi.org/10.1109/ted.2013.2240458.
Повний текст джерелаKim, Geukchan, Hyejin Kim, and Sunghoon Chun. "A New Package for High Speed and High Density eStorage Using the Frequency Boosting Chip." International Symposium on Microelectronics 2015, no. 1 (October 1, 2015): 000220–24. http://dx.doi.org/10.4071/isom-2015-wa22.
Повний текст джерелаLi, Qing, Shan Qing Hu, Yang Feng, and Teng Long. "The Design and Implementation of a High-Speed and Large-Capacity NAND Flash Storage System." Applied Mechanics and Materials 543-547 (March 2014): 568–71. http://dx.doi.org/10.4028/www.scientific.net/amm.543-547.568.
Повний текст джерелаJeong, Jun-Kyo, Jae-Young Sung, Woon-San Ko, Ki-Ryung Nam, Hi-Deok Lee, and Ga-Won Lee. "Physical and Electrical Analysis of Poly-Si Channel Effect on SONOS Flash Memory." Micromachines 12, no. 11 (November 15, 2021): 1401. http://dx.doi.org/10.3390/mi12111401.
Повний текст джерелаYi, Hyun Ju, and Tae Hee Han. "Adaptive Design Techniques for High-speed Toggle 2.0 NAND Flash Interface Considering Dynamic Internal Voltage Fluctuations." Journal of the Institute of Electronics Engineers of Korea 49, no. 9 (September 25, 2012): 251–58. http://dx.doi.org/10.5573/ieek.2012.49.9.251.
Повний текст джерелаKang, K. ‐T, S. ‐Y Kim, and K. ‐Y Lee. "Open‐loop per‐pin skew compensation with lock fault detector for parallel NAND flash memory interface." Electronics Letters 54, no. 6 (March 2018): 346–48. http://dx.doi.org/10.1049/el.2017.4341.
Повний текст джерелаKang, Ho-Jung, Sung-Ho Bae, Min-Kyu Jeong, Sung-Min Joe, Byung-Gook Park, and Jong-Ho Lee. "Extraction of Interface Trap Density in the Region Between Adjacent Wordlines in NAND Flash Memory Strings." IEEE Electron Device Letters 36, no. 1 (January 2015): 53–55. http://dx.doi.org/10.1109/led.2014.2367025.
Повний текст джерелаRamesh, Sivaramakrishnan, Arjun Ajaykumar, Lars-Åke Ragnarsson, Laurent Breuil, Gabriel El Hajjam, Ben Kaczer, Attilio Belmonte, et al. "Understanding the Origin of Metal Gate Work Function Shift and Its Impact on Erase Performance in 3D NAND Flash Memories." Micromachines 12, no. 9 (September 8, 2021): 1084. http://dx.doi.org/10.3390/mi12091084.
Повний текст джерелаLee, Jun Gyu, and Tae Whan Kim. "Effects of the Grain Boundary and Interface Traps on the Electrical Characteristics of 3D NAND Flash Memory Devices." Journal of Nanoscience and Nanotechnology 18, no. 3 (March 1, 2018): 1944–47. http://dx.doi.org/10.1166/jnn.2018.15000.
Повний текст джерелаKim, Chulbum, Jinho Ryu, Taesung Lee, Hyunggon Kim, Jaewoo Lim, Jaeyong Jeong, Seonghwan Seo, et al. "A 21 nm High Performance 64 Gb MLC NAND Flash Memory With 400 MB/s Asynchronous Toggle DDR Interface." IEEE Journal of Solid-State Circuits 47, no. 4 (April 2012): 981–89. http://dx.doi.org/10.1109/jssc.2012.2185341.
Повний текст джерелаGillingham, Peter, David Chinn, Eric Choi, Jin-Ki Kim, Don Macdonald, Hakjune Oh, Hong-Beom Pyeon, and Roland Schuetz. "800 MB/s DDR NAND Flash Memory Multi-Chip Package With Source-Synchronous Interface for Point-to-Point Ring Topology." IEEE Access 1 (2013): 811–16. http://dx.doi.org/10.1109/access.2013.2294433.
Повний текст джерелаZou, Xingqi, Lei Jin, Liang Yan, Yu Zhang, Di Ai, Chenglin Zhao, Feng Xu, Chunlong Li, and Zongliang Huo. "The influence of grain boundary interface traps on electrical characteristics of top select gate transistor in 3D NAND flash memory." Solid-State Electronics 153 (March 2019): 67–73. http://dx.doi.org/10.1016/j.sse.2018.12.007.
Повний текст джерелаAn, Ho-Myoung, Hee-Dong Kim, and Tae Geun Kim. "Analysis of the energy distribution of interface traps related to tunnel oxide degradation using charge pumping techniques for 3D NAND flash applications." Materials Research Bulletin 48, no. 12 (December 2013): 5084–87. http://dx.doi.org/10.1016/j.materresbull.2013.05.008.
Повний текст джерелаChu, Kai-Chun, Kuo-Chi Chang, Hsiao-Chuan Wang, Yuh-Chung Lin, and Tsui-Lien Hsu. "Field-Programmable Gate Array-Based Hardware Design of Optical Fiber Transducer Integrated Platform." Journal of Nanoelectronics and Optoelectronics 15, no. 5 (May 1, 2020): 663–71. http://dx.doi.org/10.1166/jno.2020.2835.
Повний текст джерелаZhao, Dongxue, Zhiliang Xia, Linchun Wu, Tao Yang, Dongyu Fan, Yuancheng Yang, Lei Liu, Wenxi Zhou, and Zongliang Huo. "Optimization of Bump Defect at High-Concentration In-Situ Phosphorus Doped Polysilicon/TEOS Oxide Interface for 3D NAND Flash Memory Application." IEEE Journal of the Electron Devices Society 9 (2021): 1243–47. http://dx.doi.org/10.1109/jeds.2021.3123844.
Повний текст джерелаSon, C. I., S. Yoon, S. W. Chung, C. I. Park, and E. Y. Chung. "Variability-insensitive scheme for NAND flash memory interfaces." Electronics Letters 42, no. 23 (2006): 1335. http://dx.doi.org/10.1049/el:20062239.
Повний текст джерелаKang, Jing, Fei Liu, Ya Hai, and Yongshan Wang. "A Wide-Range Four-Phase All-Digital DLL with De-Skew Circuit." Electronics 12, no. 7 (March 29, 2023): 1610. http://dx.doi.org/10.3390/electronics12071610.
Повний текст джерелаDeng, He Lian, and You Gang Xiao. "Development of General Embedded Intelligent Monitoring System for Tower Crane." Applied Mechanics and Materials 103 (September 2011): 394–98. http://dx.doi.org/10.4028/www.scientific.net/amm.103.394.
Повний текст джерелаKurinjimalar, Ramu, Selvam Manjula, M. Ramachandran, and RajKumar Sangeetha. "A Review on Solid state Drives transformer concept A new era in power supply." Electrical and Automation Engineering 2, no. 1 (March 1, 2023): 104–10. http://dx.doi.org/10.46632/eae/2/1/15.
Повний текст джерелаSong, Wan Soo, Ju Eun Kang, and Sang Jeen Hong. "Spectroscopic Analysis of CF4/O2 Plasma Mixed with N2 for Si3N4 Dry Etching." Coatings 12, no. 8 (July 27, 2022): 1064. http://dx.doi.org/10.3390/coatings12081064.
Повний текст джерелаRui, Ying, Meng-Hsien Chen, Sumeet Pandey, and Lan Li. "Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning." Journal of Vacuum Science & Technology A 41, no. 2 (March 2023): 022601. http://dx.doi.org/10.1116/6.0002139.
Повний текст джерела"LSI joins open NAND Flash Interface Working Group." Microelectronics International 25, no. 3 (July 25, 2008). http://dx.doi.org/10.1108/mi.2008.21825cab.012.
Повний текст джерелаChoi, Saeyan, Seungsob Kim, Seain Bang, Jungchun Kim, Dong Geun Park, Seunghee Jin, Min Jung Kim, Eunmee Kwon, and Jae Woo Lee. "Interface engineering of 9X stacked 3D NAND flash memory using hydrogen post-treatment annealing." Nanotechnology, October 5, 2022. http://dx.doi.org/10.1088/1361-6528/ac97a1.
Повний текст джерелаHou, Tuo-Hung, Jaegoo Lee, Jonathan T. Shaw, and Edwin C. Kan. "Flash Memory Scaling: From Material Selection to Performance Improvement." MRS Proceedings 1071 (2008). http://dx.doi.org/10.1557/proc-1071-f02-01.
Повний текст джерелаLiu, Liwei, Yibo Sun, Xiaohe Huang, Chunsen Liu, Zhaowu Tang, Senfeng Zeng, David Wei Zhang, Shaozhi Deng, and Peng Zhou. "Ultrafast Flash Memory with Large Self-Rectifying Ratio Based on Atomically Thin MoS2-Channel Transistor." Materials Futures, May 17, 2022. http://dx.doi.org/10.1088/2752-5724/ac7067.
Повний текст джерелаCacciato, Antonio, Laurent Breuil, Geert Van den bosch, Olivier Richard, Aude Rothschild, Arnaud Furnémont, Hugo Bender, Jorge A. Kittl, and Jan Van Houdt. "Effect of Top Dielectric Morphology and Gate Material on the Performance of Nitride-based FLASH Memory Cells." MRS Proceedings 1071 (2008). http://dx.doi.org/10.1557/proc-1071-f02-08.
Повний текст джерела