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Автор: Grafiati
Опубліковано: 6 вересня 2023

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Статті в журналах з теми "Molybdenum Thin Films"

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Navrátil, Vladislav, and Tomáš Šikola. "Microhardness of thin molybdenum films." Materials Science and Engineering: A 234-236 (August 1997): 390–92. http://dx.doi.org/10.1016/s0921-5093(97)00158-5.

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2

Gurbanova, U. M., Z. S. Safaraliyeva, N. R. Abishova, R. G. Huseynova, and D. B. Tagiyev. "MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS." Azerbaijan Chemical Journal, no. 3 (September 28, 2021): 6–11. http://dx.doi.org/10.32737/0005-2531-2021-3-6-11.

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To avoid the numerous experiments for determining optimal conditions and electrolyte composition at co-deposition of two metals we have cleated the regression equation. Mathematical calculations have been carried out using the Optum ME package program with the study of some factors as current density, concentration of main components, temperature, etc. which effect on the co-deposition process. Three independent variables have been selected. The amount of molybdenum in the deposit has been chosen as the dependent variable. The developed regression equation quite adequately describes the co-deposition process of nickel with molybdenum and can be used at planning the works on obtaining alloys with the required composition by the electrochemical method
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Uno, Takehiko, and Kota Onuki. "Properties of Molybdenum Trioxide Thin Films." Japanese Journal of Applied Physics 24, S2 (January 1, 1985): 419. http://dx.doi.org/10.7567/jjaps.24s2.419.

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4

Bosworth, D., S. L. Sahonta, R. H. Hadfield, and Z. H. Barber. "Amorphous molybdenum silicon superconducting thin films." AIP Advances 5, no. 8 (August 2015): 087106. http://dx.doi.org/10.1063/1.4928285.

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Mattern, N., W. Pitschke, and S. Doyle. "Structure of molybdenum sulphide thin films." Acta Crystallographica Section A Foundations of Crystallography 49, s1 (August 21, 1993): c327—c328. http://dx.doi.org/10.1107/s010876737809087x.

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6

Divigalpitiya, W. M. Ranjith, S. Roy Morrison, and R. F. Frindt. "Thin oriented films of molybdenum disulphide." Thin Solid Films 186, no. 1 (April 1990): 177–92. http://dx.doi.org/10.1016/0040-6090(90)90511-b.

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7

Wang, Zhouling, Wenwu Wang, Ya Yang, Wei Li, Lianghuan Feng, Jingquan Zhang, Lili Wu, and Guanggen Zeng. "The Structure and Stability of Molybdenum Ditelluride Thin Films." International Journal of Photoenergy 2014 (2014): 1–6. http://dx.doi.org/10.1155/2014/956083.

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Molybdenum-tellurium alloy thin films were fabricated by electron beam evaporation and the films were annealed in different conditions in N2ambient. The hexagonal molybdenum ditelluride thin films with well crystallization annealed at 470°C or higher were obtained by solid state reactions. Thermal stability measurements indicate the formation of MoTe2took place at about 350°C, and a subtle weight-loss was in the range between 30°C and 500°C. The evolution of the chemistry for Mo-Te thin films was performed to investigate the growth of the MoTe2thin films free of any secondary phase. And the effect of other postdeposition treatments on the film characteristics was also investigated.
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Chen, Shih-Fan, Shea-Jue Wang, Win-Der Lee, Ming-Hong Chen, Chao-Nan Wei, and Huy-Yun Y. Bor. "Preparation and Characterization of Molybdenum Thin Films by Direct-Current Magnetron Sputtering." Atlas Journal of Materials Science 2, no. 1 (June 14, 2017): 54–59. http://dx.doi.org/10.5147/ajms.v2i1.123.

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The back contact electrode with molybdenum (Mo) thin film is crucial to the performance of Cu(In, Ga)Se2 solar cells. In this research, Mo thin films were fabricated by direct current sputtering to attain low-resistivity molybdenum films on soda-lime glass substrates with good adhesion. The films were sputtered onto substrates in 500 nm thickness and nominally held at room temperature with deposition conditions of power and working pressure. Low resistivity (17-25 μΩ∙cm) of bi-layer molybdenum thin films were achieved with combination of top layer films deposited at 300 W with different working pressure, and bottom fixing layer film deposited at 300 W with 2.5 mTorr which adhered well on glass. Films were characterized the electrical properties, structure, residual stress, morphology by using the Hall-effect Measurement, X-ray Diffraction, and Field-Emission Scanning Electron Microscopy, respectively, to optimize the deposition conditions.
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Krishnan, Rahul, Michael Riley, Sabrina Lee, and Toh-Ming Lu. "Vertically aligned biaxially textured molybdenum thin films." Journal of Applied Physics 110, no. 6 (September 15, 2011): 064311. http://dx.doi.org/10.1063/1.3638452.

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Baskaran, R., A. V. Thanikai Arasu, E. P. Amaladass, L. S. Vaidhyanathan, and D. K. Baisnab. "Superconducting fluctuations in molybdenum nitride thin films." Physica C: Superconductivity and its Applications 545 (February 2018): 5–9. http://dx.doi.org/10.1016/j.physc.2017.11.006.

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Дисертації з теми "Molybdenum Thin Films"

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Rickman, Sarah. "Growth and characterization of molybdenum disulfide, molybdenum diselenide, and molybdenum(sulfide, selenide) formed between molybdenum and copper indium(sulfide, selenide) during growth." Access to citation, abstract and download form provided by ProQuest Information and Learning Company; downloadable PDF file 0.94 Mb., 85 p, 2006. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&res_dat=xri:pqdiss&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&rft_dat=xri:pqdiss:1435848.

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Kaye, Simon Peter. "Ion-assisted deposition of molybdenum disulphide films." Thesis, University of Salford, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.238835.

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Wang, Yimin. "Reactive Sputter Deposition of Molybdenum Nitride Thin Films." University of Cincinnati / OhioLINK, 2002. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1025108562.

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Gross, Carl Morris III. "Growth and Characterization of Molybdenum Disulfide Thin Films." Wright State University / OhioLINK, 2016. http://rave.ohiolink.edu/etdc/view?acc_num=wright1464363549.

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Cormier, Pierre Richard Sébastien. "Secondary electron emission properties of molybdenum disulfide thin films." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 1998. http://www.collectionscanada.ca/obj/s4/f2/dsk3/ftp04/mq31189.pdf.

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Guimond, Sebastien. "Vanadium and molybdenum oxide thin films on Au(111)." Doctoral thesis, Humboldt-Universität zu Berlin, Mathematisch-Naturwissenschaftliche Fakultät I, 2009. http://dx.doi.org/10.18452/15999.

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In der vorliegenden Arbeit wurden das Wachstum und die Oberflächenstruktur von definier-ten V2O3-, V2O5- und MoO3-Filmen auf Au(111) sowie deren Einsatz als Modellsysteme zur Untersuchung von Elementarreaktionen auf Vanadiumoxid- und Molybdänoxid-basierten selektiven Oxidationskatalysatoren untersucht. Im Falle von V2O3(0001) befindet sich an der Oberfläche der Filme eine Lage von Vanadylgruppen, welche kein Bestandteil der Kristall-struktur sind. Die O Atome der Vanadylgruppen können durch Elektronenbeschuss definiert entfernt werden, wodurch eine partiell oder vollständig V-terminierte Oberfläche erzeugt werden kann. Der Grad der Oberflächenreduktion wird durch die Elektronendosis festgelegt. Dieses ermöglicht eine Untersuchung des Einflusses der Vanadylgruppen und der unterkoor-dinierten V-Ionen auf die Reaktivität der Modellkatalysatoren. Die Präparation von defektar-men V2O5(001)- und MoO3(010)-Filmen ist erstmals in der vorliegenden Arbeit dokumen-tiert. Diese Filme wurden mittels Oxidation in einer Hochdruckzelle bei einem Sauerstoffdruck von 50 mbar hergestellt. Anders als in vielen Publikationen berichtet sind diese hochkristallinen Schichten unter UHV-Bedingungen weitgehend reduktionsbeständig. Oberflächenverunreinigungen und Defekte scheinen aber einen großen Einfluss auf die Redu-zierbarkeit zu haben. Die von den Strukturen der regulären Oxide abweichenden Strukturen der Koinzidenzgitter von V2O5- und MoO3-Monolagen werden durch die Wechselwirkung mit der Au(111)-Unterlage stabilisiert, was vermutlich durch die einfache Verschiebbarkeit von Koordinationseinheiten in V und Mo-Oxiden erleichtert wird. Für beide Oxide beginnt das Wachstum regulärer Oxidstrukturen erst nach Vollendung der zweiten Lage. Die für geträgerte V2O5-Katalysatoren häufig vorgebrachte Annahme, dass V2O5-Kristallkeimbildung direkt auf einer Monolage stattfindet, sollte somit mit Vorsicht betrachtet werden.
The growth and the surface structure of well-ordered V2O3, V2O5 and MoO3 thin films have been investigated in this work. These films are seen as model systems for the study of ele-mentary reaction steps occurring on vanadia and molybdena-based selective oxidation cata-lysts. It is shown that well-ordered V2O3(0001) thin films can be prepared on Au(111). The films are terminated by vanadyl groups which are not part of the V2O3 bulk structure. Elec-tron irradiation specifically removes the oxygen atoms of the vanadyl groups, resulting in a V-terminated surface. The fraction of removed vanadyl groups is controlled by the electron dose. Such surfaces constitute interesting models to probe the relative role of both the vanadyl groups and the undercoordinated V ions at the surface of vanadia catalysts. The growth of well-ordered V2O5(001) and MoO3(010) thin films containing few point defects is reported here for the first time. These films were grown on Au(111) by oxidation under 50 mbar O2 in a dedicated high pressure cell. Contrary to some of the results found in the literature, the films are not easily reduced by annealing in UHV. This evidences the contribution of radiation and surface contamination in some of the reported thermal reduction experiments. The growth of ultrathin V2O5 and MoO3 layers on Au(111) results in formation of interface-specific monolayer structures. These layers are coincidence lattices and they do not correspond to any known oxide bulk structure. They are assumed to be stabilized by electronic interaction with Au(111). Their formation illustrates the polymorphic character and the ease of coordination units rearrangement which are characteristic of both oxides. The formation of a second layer apparently precedes the growth of bulk-like crystallites for both oxides. This observation is at odds with a common assumption that crystals nucleate as soon as a monolayer is formed dur-ing the preparation of supported vanadia catalysts.
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Tashiro, Hidenori. "Time-resolved infrared studies of superconducting molybdenum-germanium thin films." [Gainesville, Fla.] : University of Florida, 2004. http://purl.fcla.edu/fcla/etd/UFE0008001.

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Bragg, Donald. "Photocatalytic Oxidation of Carbon Monoxide Using Sputter Deposited Molybdenum Oxide Thin Films on a Silicon Dioxide Substrate." Fogler Library, University of Maine, 2007. http://www.library.umaine.edu/theses/pdf/BraggD2007.pdf.

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Golub, A. S., N. D. Lenenko, E. P. Krinichnaya, O. P. Ivanova, I. V. Klimenko, and T. S. Zhuravleva. "Nanostructured Films of Semiconducting Molybdenum Disulfide Obtained Through Exfoliation-Restacking Method." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35055.

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Preparing MoS2 films in mild conditions, using deposition of suspended MoS2 nanoplatelets onto the substrate is described. For this purpose, the nanosized MoS2 particles were obtained via restacking of MoS2 single layers produced by chemical exfoliation of bulk MoS2 crystals in liquid media. X-Ray diffraction study of the films showed that the basal planes of MoS2 crystallites are mainly oriented in the plane paral-lel to the substrate. Atomic force microscopy examination revealed the dependence of the film surface to-pography, as well as the roughness characteristics on the film thickness, which varied in the range of 0.03-2.2 m. Optical absorption spectra of the obtained MoS2 films were found to contain the same absorption bands as the spectra of thin natural MoS2 single crystals. Dark conductivity of the films was determined to be ~ 10–3 S∙сm–1 at 300 K. The present MoS2 films were found to be photosensitive in the range of 300-800 nm, providing the maximum value of photocurrent under photoexcitation at ~ 440 nm. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35055
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Ashraf, Sobia. "Aerosol assisted chemical vapour deposition of tungsten and molybdenum oxide thin films." Thesis, University College London (University of London), 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.498322.

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Книги з теми "Molybdenum Thin Films"

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National Renewable Energy Laboratory (U.S.) and IEEE Photovoltaic Specialists Conference (37th : 2011 : Seattle, Wash.), eds. Density profiles in sputtered molybdenum thin films and their effects on sodium diffusion in Cu(InxGa1-x)Se2 photovoltaics: Preprint. Golden, CO]: National Renewable Energy Laboratory, 2011.

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2

Talivaldis, Spalvins, Lewis Research Center, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Division., eds. Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films. [Washington, D.C.]: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Division, 1990.

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3

Weber, Frank John. Changes in structure and stress in Mo/a-Si thin films upon annealing. 1995.

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4

Advanced Technologies for Next Generation Integrated Circuits. Institution of Engineering & Technology, 2020.

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Частини книг з теми "Molybdenum Thin Films"

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Shen, Yao Gen. "Microstresses in Molybdenum Nitride Thin Films Deposited by Reactive DC Magnetron Sputtering." In Materials Science Forum, 589–94. Stafa: Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-969-5.589.

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Strane, Jay, Jian Li, S. W. Russell, and J. W. Mayer. "Thermal Stability of Titanium-Molybdenum and Titanium-Copper Bilayer Thin Films on Alumina." In Crucial Issues in Semiconductor Materials and Processing Technologies, 321–25. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-011-2714-1_31.

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3

Hixson, Earl C., C. Suryanarayana, Graham G. W. Mustoe, and John J. Moore. "Modeling Thermal Stresses and Measuring Thin Film CTE in MoSi2and MoSi2+SiC Composite Coatings on Molybdenum." In Elevated Temperature Coatings, 109–18. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118787694.ch8.

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Panin, Sergey V., Lyudmila A. Kornienko, Nguyen Duc Anh, Vladislav O. Alexenko, Dmitry G. Buslovich, and Svetlana A. Bochkareva. "Three-Component Wear-Resistant PEEK-Based Composites Filled with PTFE and MoS2: Composition Optimization, Structure Homogenization, and Self-lubricating Effect." In Springer Tracts in Mechanical Engineering, 275–99. Cham: Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-60124-9_13.

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AbstractThe aim of this work was to design and optimize compositions of three-component composites based on polyetheretherketone (PEEK) with enhanced tribological and mechanical properties. Initially, two-component PEEK-based composites loaded with molybdenum disulfide (MoS2) and polytetrafluoroethylene (PTFE) were investigated. It was shown that an increase in dry friction mode tribological characteristics in metal-polymer and ceramic-polymer tribological contacts was attained by loading with lubricant fluoroplastic particles. In addition, molybdenum disulfide homogenized permolecular structure and improved matrix strength properties. After that, a methodology for identifying composition of multicomponent PEEK-based composites having prescribed properties which based on a limited amount of experimental data was proposed and implemented. It was shown that wear rate of the “PEEK + 10% PTFE + 0.5% MoS2” composite decreased by 39 times when tested on the metal counterpart, and 15 times on the ceramic one compared with neat PEEK. However, in absolute terms, wear rate of the three-component composite on the metal counterpart was 1.5 times higher than on the ceramic one. A three-fold increase in wear resistance during friction on both the metal and ceramic counterparts was achieved for the “PEEK + 10% PTFE + 0.5% MoS2” three-component composite compared with the “PEEK + 10% PTFE”. Simultaneous loading with two types of fillers slightly deteriorated the polymer composite structure compared with neat PEEK. However, wear rate was many times reduced due to facilitation of transfer film formation. For this reason, there was no microabrasive wear on both metal and ceramic counterpart surfaces.
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Zulkifli, Muhammad Nubli, and Sabarina Abdul Hamid. "Electrical Characterization of Ultrasonic Aluminum Bond on Molybdenum Back Contact of the Thin-Film Solar Module Using Micro-Ohmmeter." In Springer Proceedings in Physics, 115–22. Singapore: Springer Nature Singapore, 2023. http://dx.doi.org/10.1007/978-981-19-9267-4_13.

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Perry, A. J., A. W. Baouchi, J. H. Petersen, and S. D. Pozder. "Crystal structure of molybdenum nitride films made by reactive cathodic arc evaporation." In Metallurgical Coatings and Thin Films 1992, 261–65. Elsevier, 1992. http://dx.doi.org/10.1016/b978-0-444-89900-2.50048-8.

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Jankowski, A. F., and L. R. Schrawyer. "Working gas pressure and flow effects on reactively sputtered molybdenum oxide thin films." In Metallurgical Coatings and Thin Films 1992, 349–54. Elsevier, 1992. http://dx.doi.org/10.1016/b978-0-444-89900-2.50063-4.

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Robinson Azariah John Chelliah, Cyril, and Rajesh Swaminathan. "Binary Metal Oxides Thin Films Prepared from Pulsed Laser Deposition." In Practical Applications of Laser Ablation. IntechOpen, 2021. http://dx.doi.org/10.5772/intechopen.96161.

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The semiconductor industry flourished from a simple Si-based metal oxide semiconductor field effect transistor to an era of MOSFET-based smart materials. In recent decades, researchers have been replacing all the materials required for the MOSFET device. They replaced the substrate with durable materials, lightweight materials, translucent materials and so on. They have came up with the possibility of replacing dielectric silicon dioxide material with high-grade dielectric materials. Even then the channel shift in the MOSFET was the new trend in MOSFET science. From the bulk to the atomic level, transistors have been curiously researched across the globe for the use of electronic devices. This research was also inspired by the different semiconductor materials relevant to the replacement of the dielectric channel/gate. Study focuses on diverse materials such as zinc oxides (ZnO), electrochromic oxides such as molybdenum oxides (including MoO3 and MoO2) and other binary oxides using ZnO and MoO3. The primary objective of this research is to study pulsed laser deposited thin films such as ZnO, MoO3, binary oxides such as binary ZnO /MoO3, ZnO /TiO2 and ZnO/V2O5 and to analyse their IV properties for FET applications. To achieve the goal, the following working elements have been set: investigation of pulsed laser deposited thin film of metal oxides and thin film of binary metal oxide nanostructures with effects of laser repetition and deposition temperatures.
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HILTUNEN, L., M. LESKELÄ, M. MÄKELÄ, L. NIINISTÖ, E. NYKÄNEN, and P. SOININEN. "NITRIDES OF TITANIUM, NIOBIUM, TANTALUM AND MOLYBDENUM GROWN AS THIN FILMS BY THE ATOMIC LAYER EPITAXY METHOD." In Metallurgical Coatings 1988, 149–54. Elsevier, 1988. http://dx.doi.org/10.1016/b978-1-85166-985-1.50019-4.

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Rocha, Lizandra Viana Maurat da, Paulo Sergio Rangel Cruz da Silva, and Maria Inês Bruno Tavares. "Comparative Study Of Poly (Butylene Adipate Co-Terephthalate) Nanocomposites With Zinc And Molybdenum Oxides." In COLLECTION OF INTERNATIONAL TOPICS IN HEALTH SCIENCE- V1. Seven Editora, 2023. http://dx.doi.org/10.56238/colleinternhealthscienv1-122.

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studies on nanocomposites of biodegradable polymers such as polybutylene adipate co-terephthalate (PBAT) are justified. This polymer is certified for composting; it is printable, suitable for food contact, water resistant, and performs similarly to polyethylene[1, 2] . Metal oxide nanoparticles (NPs) such as MoO3 and ZnO are potential fillers to, in addition to improving mechanical properties, confer antimicrobial, anti-UV activity and modulate the biodegradability of polymer matrices such as that of PBAT[3, 4, 5] . The effects of different concentrations of ZnONPs were observed and compared to MoO3 NPs, whose relevant properties still lack further study. In this work, seven films prepared by casting with CHCl solvent evaporation were studied3 . The tags PBAT, Z1, Z3, Z5, M1, M3 and M5 correspond to the pure polymer samples and their combinations with 0.1; 0.3 and 0.5 % of zinc and molybdenum oxide NPs, by mass, respectively. The Fourier transform infrared spectroscopy (FTIR) ratified the total removal of the solvent and the maintenance of the bands of the main functional groups of the polymeric matrix, even after the incorporation of the NPS. In the thermogravimetric analysis (TGA), only one degradation event was observed for all samples; in M1 and especially in M3 the thermal resistance increased, while, with the addition of zinc oxide, especially in Z5 and Z3, this property was reduced. There was no expressive change in the degradation onset temperature (Tonset ) of M5 in relation to PBAT, suggesting that this concentration of MoO₃ cannot promote increment in the thermal property of this matrix. The X-ray diffraction (XRD) results of M1 and M3 suggested a better dispersion than M5, the only composite in which there was no increase in the degree of crystallinity in relation to pure PBAT, indicating possible agglomeration. In time domain nuclear magnetic resonance (TD-NMR) analysis, the curves of M3 present a narrower base, indicating greater homogeneity and especially good dispersion in this system, corroborating the other analyses. The reduced return time of the magnetization to the longitudinal axis (T1 H) of M5 and the increased molecular mobility of this system were associated with the crystalline rearrangement. When measuring the water activity (aw ) thinking in the application of these films as active packaging, Z3 and M1 stood out, with lower propensity to microbiological attack, and a linear trend (R² > 0.9) was observed for this property with the incorporation of molybdenum nanotrioxide in poly(butylene adipate co-terephthalate). The worst aw data were observed in Z1, with M3 and M5 being similar to Z5. Still, all observed aw values were below the recommended value for food packaging, 0.7 (the value at which susceptibility becomes most relevant). Thus, it was shown to be possible to incorporate zinc and molybdenum metal oxides in the PBAT matrix, via casting, with good distribution and better dispersion of fillers in the range of 0.3% by mass. Moreover, it was observed that different types and proportions of particles resulted in different effects on the microstructure of the matrix (thermal resistance, crystallinity, molecular mobility and water activity), without causing interaction capable of affecting the molecular composition of the material, at levels detectable by FTIR-ATR.
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Тези доповідей конференцій з теми "Molybdenum Thin Films"

1

Yadav, P. K., M. Nayak, G. S. Lodha, and S. Rai. "Growth study of ion assisted evaporated molybdenum thin films." In INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE AND TECHNOLOGY. AIP, 2012. http://dx.doi.org/10.1063/1.4732395.

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2

Anand, T. Joseph S., T. Mahalingam, C. Sanjeevi Raja, M. Jayachandran, and Mary J. Chockalingam. "Molybdenum diselenide thin films prepared by electrodeposition technique." In SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, edited by Carl M. Lampert and Claes-Goeran Granqvist. SPIE, 1999. http://dx.doi.org/10.1117/12.367559.

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3

Baskaran, R., A. V. Thanikai Arasu, and E. P. Amaladass. "Magnetoresistance measurements of superconducting molybdenum nitride thin films." In DAE SOLID STATE PHYSICS SYMPOSIUM 2015. Author(s), 2016. http://dx.doi.org/10.1063/1.4948112.

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4

"Increasing the Oxidation-Resistance of Molybdenum Thin Films." In SVC TechCon 2016. Society of Vacuum Coaters, 2016. http://dx.doi.org/10.14332/svc16.proc.0047.

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5

Dominguez, A., Ateet Dutt, O. de Melo, and G. Santana. "Molybdenum oxide thin films for heterojunction solar cells." In 2017 IEEE 44th Photovoltaic Specialists Conference (PVSC). IEEE, 2017. http://dx.doi.org/10.1109/pvsc.2017.8366104.

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6

Yuan, Y. F., and Oliver S. Heavens. "Transition and switching properties of the blue potassium molybdenum bronze thin films." In Thin Film Physics and Applications: Second International Conference, edited by Shixun Zhou, Yongling Wang, Yi-Xin Chen, and Shuzheng Mao. SPIE, 1994. http://dx.doi.org/10.1117/12.190758.

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7

Khalate, S. A., R. S. Kate та R. J. Deokate. "Studies on nanosized molybdenum trioxide (α-MoO3) thin films". У DAE SOLID STATE PHYSICS SYMPOSIUM 2016. Author(s), 2017. http://dx.doi.org/10.1063/1.4980506.

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8

Bhatia, Shally, and Atul Khanna. "Structural and optical properties of molybdenum trioxide thin films." In NANOFORUM 2014. AIP Publishing LLC, 2015. http://dx.doi.org/10.1063/1.4917961.

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9

Kwok, Chee Y., Tom Puzzer, Kwang M. Lin, and Jafar Haji-Babaei. "DC magnetron-sputtered molybdenum thin films for micromechanical structures." In Far East and Pacific Rim Symposium on Smart Materials, Structures, and MEMS, edited by Alex Hariz, Vijay K. Varadan, and Olaf Reinhold. SPIE, 1997. http://dx.doi.org/10.1117/12.293487.

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10

Lee, Jonghoon, Gary Kedziora, Nicholas Glavin, and Ajit Roy. "Cluster formation and charge transfer in molecular doping of molybdenum disulfide." In International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, edited by Guru Subramanyam, Partha Banerjee, Akhlesh Lakhtakia, and Nian X. Sun. SPIE, 2023. http://dx.doi.org/10.1117/12.2644983.

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Звіти організацій з теми "Molybdenum Thin Films"

1

Olson, K. Laser photodeposition of molybdenum oxide thin films from organometallic precursors. Office of Scientific and Technical Information (OSTI), January 1990. http://dx.doi.org/10.2172/7186114.

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