Статті в журналах з теми "Microwave-Assisted Deposition"
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Kang, In-Je, Chang-Hyun Cho, Hyonu Chang, Soo-Ouk Jang, Hyun-Jae Park, Dae-Gun Kim, Kyung-Min Lee, and Ji-Hun Kim. "Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition." Nanomaterials 11, no. 7 (June 29, 2021): 1705. http://dx.doi.org/10.3390/nano11071705.
Повний текст джерелаVANDENBULCKE, L., P. BOU, R. HERBIN, V. CHOLET, and C. BENY. "MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND." Le Journal de Physique Colloques 50, no. C5 (May 1989): C5–177—C5–188. http://dx.doi.org/10.1051/jphyscol:1989525.
Повний текст джерелаZhou, Huan, Maryam Nabiyouni, and Sarit B. Bhaduri. "Microwave assisted apatite coating deposition on Ti6Al4V implants." Materials Science and Engineering: C 33, no. 7 (October 2013): 4435–43. http://dx.doi.org/10.1016/j.msec.2013.06.043.
Повний текст джерелаWu, Yong Qiang, and Si Kai Sun. "Microwave Assisted Eletroless Copper Plating on Carbon Nanotubes." Advanced Materials Research 399-401 (November 2011): 741–46. http://dx.doi.org/10.4028/www.scientific.net/amr.399-401.741.
Повний текст джерелаKumar, Rajesh, Rajesh Kumar Singh, Alfredo R. Vaz, and Stanislav A. Moshkalev. "Microwave-assisted synthesis and deposition of a thin ZnO layer on microwave-exfoliated graphene: optical and electrochemical evaluations." RSC Advances 5, no. 83 (2015): 67988–95. http://dx.doi.org/10.1039/c5ra09936f.
Повний текст джерелаSATO, Yoichiro. "Diamond film grown by microwave plasma-assisted vapor deposition." Journal of the Japan Society for Precision Engineering 53, no. 10 (1987): 1511–14. http://dx.doi.org/10.2493/jjspe.53.1511.
Повний текст джерелаIbiyemi, Abideen A., Ayodeji O. Awodugba, Olusola Akinrinola, and Abass A. Faremi. "Zinc-doped CdS nanoparticles synthesized by microwave-assisted deposition." Journal of Semiconductors 38, no. 9 (September 2017): 093002. http://dx.doi.org/10.1088/1674-4926/38/9/093002.
Повний текст джерелаChaudhuri, TapasK, and Anjana Kothari. "Microwave-Assisted Chemical Bath Deposition of Nanostructured ZnO Particles." Journal of Nanoscience and Nanotechnology 9, no. 9 (September 1, 2009): 5578–85. http://dx.doi.org/10.1166/jnn.2009.1119.
Повний текст джерелаLaimer, J., and S. Matsumoto. "Pulsed microwave plasma-assisted chemical vapour deposition of diamond." International Journal of Refractory Metals and Hard Materials 14, no. 1-3 (January 1996): 179–84. http://dx.doi.org/10.1016/0263-4368(96)83432-9.
Повний текст джерелаNdiege, Nicholas, Mark Shannon, and Richard I. Masel. "Silicon Nanowires Synthesized via Microwave-Assisted Chemical Vapor Deposition." Electrochemical and Solid-State Letters 10, no. 11 (2007): K55. http://dx.doi.org/10.1149/1.2774970.
Повний текст джерелаMa, Jeng-Shin, Subrata Das, and Chung-Hsin Lu. "Microwave-assisted chemical bath deposition process to fabricate CdS buffer layers used in Cu(In,Ga)Se2 solar cells." RSC Advances 6, no. 109 (2016): 107886–93. http://dx.doi.org/10.1039/c6ra19227k.
Повний текст джерелаLi, Wei-Jin, Ji-Fei Feng, Zu-Jin Lin, Ying-Long Yang, Yan Yang, Xu-Sheng Wang, Shui-Ying Gao, and Rong Cao. "Patterned growth of luminescent metal–organic framework films: a versatile electrochemically-assisted microwave deposition method." Chemical Communications 52, no. 20 (2016): 3951–54. http://dx.doi.org/10.1039/c6cc00519e.
Повний текст джерелаBisht, Atul, S. Chockalingam, O. S. Panwar, A. K. Kesarwani, B. P. Singh, and V. N. Singh. "Growth of dense CNT on the multilayer graphene film by the microwave plasma enhanced chemical vapor deposition technique and their field emission properties." RSC Advances 5, no. 109 (2015): 90111–20. http://dx.doi.org/10.1039/c5ra16917h.
Повний текст джерелаOgawa, Shumpei, Tatsuya Kuroda, Ryuga Koike, and Hiroki Ishizaki. "Fabrication of Nitride Thin Films on Si Substrates by Atomic Layer Deposition Technique." MRS Advances 3, no. 3 (2018): 165–70. http://dx.doi.org/10.1557/adv.2018.224.
Повний текст джерелаSalvadori, M. C., V. P. Mammana, O. G. Martins, and F. T. Degasperi. "Plasma-assisted chemical vapour deposition in a tunable microwave cavity." Plasma Sources Science and Technology 4, no. 3 (August 1, 1995): 489–94. http://dx.doi.org/10.1088/0963-0252/4/3/019.
Повний текст джерелаSilva, F., K. Hassouni, X. Bonnin, and A. Gicquel. "Microwave engineering of plasma-assisted CVD reactors for diamond deposition." Journal of Physics: Condensed Matter 21, no. 36 (August 19, 2009): 364202. http://dx.doi.org/10.1088/0953-8984/21/36/364202.
Повний текст джерелаKuo, Teng-Fan, Zhen-Yu Juang, Chuen-Horng Tsai, You-Ming Tsau, Hsiu-Fung Cheng, and I.-Nan Lin. "Microwave-assisted chemical vapor deposition process for synthesizing carbon nanotubes." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 19, no. 3 (2001): 1030. http://dx.doi.org/10.1116/1.1352722.
Повний текст джерелаZhang, Liu-Xue, Peng Liu, and Zhi-Xing Su. "Facile Microwave Assisted Liquid Phase Deposition Process to TiO2 Nanocrystallines." Chinese Journal of Chemistry 24, no. 1 (January 2006): 19–21. http://dx.doi.org/10.1002/cjoc.200690016.
Повний текст джерелаShi, Yulong, Minhui Tan та X. Jiang. "Deposition of diamond/β–SiC Gradient Composite Films by Microwave Plasma-assisted Chemical Vapor Deposition". Journal of Materials Research 17, № 6 (червень 2002): 1241–43. http://dx.doi.org/10.1557/jmr.2002.0184.
Повний текст джерелаJang, Soo Ouk, Changhyun Cho, Ji Hun Kim, In Je Kang, Hyonu Chang, Hyunjae Park, Kyungmin Lee, Dae Gun Kim та Hye Won Seok. "Microwave Plasma Assisted Aerosol Deposition (μ-PAD) for Ceramic Coating Applications". Ceramics 5, № 4 (2 грудня 2022): 1174–84. http://dx.doi.org/10.3390/ceramics5040083.
Повний текст джерелаEddy, C. R., D. L. Youchison, B. D. Sartwell, and K. S. Grabowski. "Deposition of diamond onto aluminum by electron cyclotron resonance microwave plasma-assisted CVD." Journal of Materials Research 7, no. 12 (December 1992): 3255–59. http://dx.doi.org/10.1557/jmr.1992.3255.
Повний текст джерелаZhao, Guozheng, Qingwei Tan, Changbo Li, Liyan Shang, Daihang Zhang, Xuanxuan Lu, and Feng Qiu. "Silver/silver halide supported on mesoporous ceria particles and photo-CWPO degradation under visible light for organic compounds in acrylonitrile wastewater." RSC Advances 11, no. 43 (2021): 26791–99. http://dx.doi.org/10.1039/d1ra04465f.
Повний текст джерелаMalwal, Deepika, and P. Gopinath. "Enhanced photocatalytic activity of hierarchical three dimensional metal oxide@CuO nanostructures towards the degradation of Congo red dye under solar radiation." Catalysis Science & Technology 6, no. 12 (2016): 4458–72. http://dx.doi.org/10.1039/c6cy00128a.
Повний текст джерелаNdiege, Nicholas, Vaidyanathan Subramanian, Mark A. Shannon, and Richard I. Masel. "Rapid synthesis of tantalum oxide dielectric films by microwave microwave-assisted atmospheric chemical vapor deposition." Thin Solid Films 516, no. 23 (October 2008): 8307–14. http://dx.doi.org/10.1016/j.tsf.2008.03.049.
Повний текст джерелаSONG RU-AN, CHENG XIAN-AN, and ZHOU ZHONG-YI. "MAGNETIC FIELD ASSISTED MICROWAVE PLASMA AND LARGE AREA DIAMOND FILM DEPOSITION." Acta Physica Sinica 39, no. 10 (1990): 1635. http://dx.doi.org/10.7498/aps.39.1635.
Повний текст джерелаCampargue, A., M. Chenevier, L. Fayette, B. Marcus, M. Mermoux, and A. J. Ross. "Fourier transform diagnostics of gaseous species during microwave assisted diamond deposition." Applied Physics Letters 62, no. 2 (January 11, 1993): 134–36. http://dx.doi.org/10.1063/1.109349.
Повний текст джерелаFu, Y., B. Yan, N. L. Loh, C. Q. Sun, and P. Hing. "Hydrogen embrittlement of titanium during microwave plasma assisted CVD diamond deposition." Surface Engineering 16, no. 4 (August 2000): 355–60. http://dx.doi.org/10.1179/026708400101517251.
Повний текст джерелаZhang, Qing, S. F. Yoon, J. Ahn, Bo Gan, Rusli, and Ming-Bin Yu. "Synthesis of Carbon Tubes Using Microwave Plasma-assisted Chemical Vapor Deposition." Journal of Materials Research 15, no. 8 (August 2000): 1749–53. http://dx.doi.org/10.1557/jmr.2000.0252.
Повний текст джерелаHuang, Haowen, Shufeng Zhang, Li Qi, Xiao Yu, and Yi Chen. "Microwave-assisted deposition of uniform thin gold film on glass surface." Surface and Coatings Technology 200, no. 14-15 (April 2006): 4389–96. http://dx.doi.org/10.1016/j.surfcoat.2005.02.203.
Повний текст джерелаXin, Mudi, KunWei Li, and Hao Wang. "Synthesis of CuS thin films by microwave assisted chemical bath deposition." Applied Surface Science 256, no. 5 (December 2009): 1436–42. http://dx.doi.org/10.1016/j.apsusc.2009.08.104.
Повний текст джерелаCholet, V., R. Herbin, and L. Vandenbulcke. "Low temperature boron coatings by microwave plasma assisted chemical vapour deposition." Thin Solid Films 192, no. 2 (November 1990): 235–51. http://dx.doi.org/10.1016/0040-6090(90)90069-p.
Повний текст джерелаObaid, A. S., M. A. Mahdi, Z. Hassan, and M. Bououdina. "PbS nanocrystal solar cells fabricated using microwave-assisted chemical bath deposition." International Journal of Hydrogen Energy 38, no. 2 (January 2013): 807–15. http://dx.doi.org/10.1016/j.ijhydene.2012.10.046.
Повний текст джерелаYoshida, Suguru, and Masahito Sano. "Microwave-assisted chemical modification of carbon nanohorns: Oxidation and Pt deposition." Chemical Physics Letters 433, no. 1-3 (December 2006): 97–100. http://dx.doi.org/10.1016/j.cplett.2006.09.074.
Повний текст джерелаBrewer, M. A., I. G. Brown, M. R. Dickinson, J. E. Galvin, R. A. MacGill, and M. C. Salvadori. "Simple, safe, and economical microwave plasma‐assisted chemical vapor deposition facility." Review of Scientific Instruments 63, no. 6 (June 1992): 3389–93. http://dx.doi.org/10.1063/1.1142557.
Повний текст джерелаSheldon, Brian W., Roseann Csencsits, Janet Rankin, Rachel E. Boekenhauer, and Yuzo Shigesato. "Bias‐enhanced nucleation of diamond during microwave‐assisted chemical vapor deposition." Journal of Applied Physics 75, no. 10 (May 15, 1994): 5001–8. http://dx.doi.org/10.1063/1.355792.
Повний текст джерелаWu, Chung-Shu, Chung-Yang Lee, Jem-Kun Chen, Shiao-Wei Kuo, Shih-Kang Fan, Chih-Chia Cheng, Feng-Chih Chang, and Fu-Hsiang Ko. "Microwave-assisted Electroless Deposition of Silver Nanoparticles onto Multiwalled Carbon Nanotubes." International Journal of Electrochemical Science 7, no. 5 (2012): 4133–42. http://dx.doi.org/10.1016/s1452-3981(23)19526-5.
Повний текст джерелаNishitani-Gamo, Mikka, Isao Sakaguchi, Tomohide Takami, Katsunori Suzuki, Isao Kusunoki, and Toshihiro Ando. "Homoepitaxial (111) diamond grown by temperature-controlled chemical vapor deposition." Journal of Materials Research 14, no. 9 (September 1999): 3518–24. http://dx.doi.org/10.1557/jmr.1999.0476.
Повний текст джерелаImam, M. Ashraf, Arne W. Fliflet, Ralph W. Bruce, C. R. Feng, Chad Stephenson, A. K. Kinkead, and Steven H. Gold. "Recent Advances in Microwave, Millimeter-Wave and Plasma-Assisted Processing of Materials." Materials Science Forum 638-642 (January 2010): 2052–57. http://dx.doi.org/10.4028/www.scientific.net/msf.638-642.2052.
Повний текст джерелаJung, S. C. "The microwave-assisted photo-catalytic degradation of organic dyes." Water Science and Technology 63, no. 7 (April 1, 2011): 1491–98. http://dx.doi.org/10.2166/wst.2011.393.
Повний текст джерелаZhu, Guangyan, Qian Peng, Ting Luo, Hao Pan, Yuehong Wang, and Zhiwei Peng. "Synthesis of Ti6Al4V/SrFHA Composites by Microwave-Assisted Liquid Phase Deposition and Calcination." Materials 15, no. 18 (September 7, 2022): 6206. http://dx.doi.org/10.3390/ma15186206.
Повний текст джерелаPaosawatyanyong, Boonchoat, K. Honglertsakul, and D. K. Reinhard. "DLC-Film Schottky Barrier Diodes." Solid State Phenomena 107 (October 2005): 75–80. http://dx.doi.org/10.4028/www.scientific.net/ssp.107.75.
Повний текст джерелаSantos, J. A., V. F. Neto, D. Ruch, and J. Grácio. "The Deposition of Nanocrystalline Diamond by HFCVD in Different Materials." Journal of Nano Research 18-19 (July 2012): 227–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.18-19.227.
Повний текст джерелаWeimer, W. A., F. M. Cerio, and C. E. Johnson. "Examination of the chemistry involved in microwave plasma assisted chemical vapor deposition of diamond." Journal of Materials Research 6, no. 10 (October 1991): 2134–44. http://dx.doi.org/10.1557/jmr.1991.2134.
Повний текст джерелаPurniawan, Agung, E. Hamzah, and M. R. M. Toff. "Surface Roughness and Morphology Analysis Using an Atomic Force Microscopy of Polycrystalline Diamond Coated Si3N4 Deposited by Microwave Plasma Assisted Chemical Vapor Deposition." Solid State Phenomena 136 (February 2008): 153–60. http://dx.doi.org/10.4028/www.scientific.net/ssp.136.153.
Повний текст джерелаHuang, Su Yong, and Kai Fu Li. "Antibacterial Property of Chinese fir/TiO2 Composite." Advanced Materials Research 194-196 (February 2011): 1663–66. http://dx.doi.org/10.4028/www.scientific.net/amr.194-196.1663.
Повний текст джерелаXu, HaiYan, Hao Wang, TouNan Jin, and Hui Yan. "Rapid fabrication of luminescent Eu:YVO4 films by microwave-assisted chemical solution deposition." Nanotechnology 16, no. 1 (December 3, 2004): 65–69. http://dx.doi.org/10.1088/0957-4484/16/1/014.
Повний текст джерелаHsieh, Chien-Te, Dong-Ying Tzou, Ching Pan, and Wei-Yu Chen. "Microwave-assisted deposition, scalable coating, and wetting behavior of silver nanowire layers." Surface and Coatings Technology 207 (August 2012): 11–18. http://dx.doi.org/10.1016/j.surfcoat.2012.02.026.
Повний текст джерелаAsmussen, J., T. A. Grotjohn, T. Schuelke, M. F. Becker, M. K. Yaran, D. J. King, S. Wicklein, and D. K. Reinhard. "Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis." Applied Physics Letters 93, no. 3 (July 21, 2008): 031502. http://dx.doi.org/10.1063/1.2961016.
Повний текст джерелаCerio, F. M., and W. A. Weimer. "Electrostatic probe measurements for microwave plasma‐assisted chemical vapor deposition of diamond." Applied Physics Letters 59, no. 26 (December 23, 1991): 3387–89. http://dx.doi.org/10.1063/1.105683.
Повний текст джерелаKothari, Anjana, and Tapas K. Chaudhuri. "One-minute microwave-assisted chemical bath deposition of nanostructured ZnO rod-arrays." Materials Letters 65, no. 5 (March 2011): 847–49. http://dx.doi.org/10.1016/j.matlet.2010.12.017.
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