Добірка наукової літератури з теми "Métal déposé"
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Статті в журналах з теми "Métal déposé":
Delair, J. "Electrodes pour soudage à l’arc. Caractéristiques, maniabilité, prix du métal déposé. Comparaison des procédés de soudage." Matériaux & Techniques 85, no. 7-8 (1997): 31–37. http://dx.doi.org/10.1051/mattech/199785070031.
Delair, J. "Electrodes pour soudage à l’arc. Caractéristiques, maniabilité, prix du métal déposé. Comparaison des procédés de soudage." Matériaux & Techniques 85, no. 9-10 (1997): 47–55. http://dx.doi.org/10.1051/mattech/199785090047.
Bernard-Granger, Chloé, and Sarah Gebeile-Chauty. "Fêlures amélaires : influence des procédures orthodontiques." L'Orthodontie Française 85, no. 3 (August 28, 2014): 245–51. http://dx.doi.org/10.1051/orthodfr/2014017.
Дисертації з теми "Métal déposé":
Pointet, John. "Elaboration et caractérisation de structures métal-isolant-métal à base de TiO2 déposé par Atomic Layer Deposition." Thesis, Université Grenoble Alpes (ComUE), 2015. http://www.theses.fr/2015GREAT089/document.
The requirements for future dynamic random access memory (DRAM) capacitors are summarized in the International Technology Roadmap for Semiconductors. For sub-22 nm node, performances like equivalent oxide thickness (EOT) < 0.5 nm and leakage current density < 1.10-7 A/cm² at 0.8 V are required but are difficult to meet. Titanium dioxide (TiO2) is an attractive dielectric material for such application regarding its high dielectric constant (k). Depending on its growth conditions, TiO2 can be prepared in amorphous, anatase or rutile phase. From the structural point of view, it is generally preferred that TiO2 remains amorphous throughout a complete technological process to minimize leakage transport along grain boundaries. However, the rutile phase exhibits very high dielectric constant ranging from 90 to 170, depending on the lattice orientation. Due to this high dielectric constant, TiO2 rutile phase is considered as a promising material for capacitors in future generations of Dynamic Random Access Memories (DRAMs). A key issue is how to control the high leakage current of rutile phase while keeping the highest dielectric constant in order to get the best electrical performances. In this work, we investigate the growth of high dielectric constant rutile TiO2 films in Metal - Insulator - Metal (MIM) structures deposited on different substrates such as RuO2/Ru or Pt electrodes using ALD (Atomic Layer Deposition). A study of physico-chemical properties of TiO2 layer and influence of bottom electrodes on TiO2's crystalline structure is proposed. Different compositions of dielectrics are processed using flexibility of ALD deposition technique, including Al-doped TiO2 layers and pure TiO2 layers. Electrical properties in terms of leakage current or capacitance density of MIM structures embedding that kind of dielectrics and comparison between these MIM structures in terms of electrical performances is proposed in order to determine the best dielectric film composition to meet the requirements for next generation of DRAM capacitors
Hickel, Probst Sonia Maria. "Propriétés catalytiques et caractérisation de catalyseurs au nickel déposé sur oxydes de terre rare : influence de l'intéraction métal-support." Poitiers, 1989. http://www.theses.fr/1989POIT2296.
Barou, Anaïs. "Contribution de l'hydrogène à l'endommagement en milieu REP à basse température de l'alliage 82 sous forme de métal déposé." Electronic Thesis or Diss., Université de Toulouse (2023-....), 2024. http://www.theses.fr/2024TLSEP041.
Various components in the primary circuit of pressurised water reactors (PWRs) include welded zones, some of which use nickel-based alloy 82 (designated as ERNICr-3 in the RCC-M code) as filler metal. These welded zones are subjected to prolonged exposure to PWR primary water; i.e., a chemically controlled environment containing dissolved hydrogen. The literature reports that, under specific conditions of exposure to primary water, and at low temperatures (<100 °C), a reduction in mechanical properties and ductile tearing resistance, in particular, occurs for alloy 82. According to the literature, hydrogen is responsible for this embrittlement, but its role has not yet been clearly demonstrated in conditions close to a PWR environment. This thesis is part of a research project developed by Framatome to identify the role of hydrogen and assess the operating situations that are potentially at risk. The aim of this thesis is to evaluate the most detrimental conditions by simulating the primary environment in an autoclave and to propose ways to better understand the effect of hydrogen on damage. The alloy 82 weld deposit studied was prepared by Framatome; its microstructure was studied at different scales to describe the different microstructural parameters likely to be involved in the mechanism of embrittlement. A highly heterogeneous microstructure was revealed, so that the direction and depth at which samples were taken from the weld deposit have to be controlled. Mechanical tensile properties of the deposit were studied in a primary environment simulated in an autoclave considering different testing conditions; they were compared to tensile properties determined in air. The damage resulting from these tests was characterised, and a hydrogen-assisted embrittlement mechanism was proposed. To verify the hypotheses put forward regarding the effect of hydrogen on the material studied, further tensile tests were carried out on cathodically hydrogen-precharged samples. The results obtained provided further insights into the influence of hydrogen on the mechanical properties of the alloy 82 weld deposit in a simulated primary environment. Electrochemical measurements and SKPFM analyses were also carried out on cathodically hydrogen-precharged samples and samples pre-exposed to the simulated PWR environment to investigate the influence of hydrogen on the electrochemical behaviour of the deposit and to study the hydrogen distribution inside the weld deposit. Interactions between hydrogen and some microstructural parameters of the material were thus highlighted
VALAUD, MIREILLE. "Liaison céramique-métal : comportement en frottement à sec de matériaux céramiques déposés sur un substrat métallique." Limoges, 1989. http://www.theses.fr/1989LIMO0048.
Guillermet, Olivier. "Étude de films ultra-minces de PTCDI et Pd(Pc)déposés sur les surfaces Pt(001), Pt(111) et Au(001) :application à l'hétérostructure métal/PTCDI/Pd(Pc)/métal." Phd thesis, Université de la Méditerranée - Aix-Marseille II, 2006. http://tel.archives-ouvertes.fr/tel-00124783.
A l'aide des cinétiques de dépôt réalisées par spectroscopie d'électrons Auger (AES) et de la microscopie à effet tunnel (STM), nous avons identifié les modes de croissance des deux types de molécule en films minces. Nous montrons que PTCDI et Pd(Pc), déposés sur un substrat de platine (Pt(111) et Pt(001)) à différentes températures, croissent suivant le mode Stransky-Krastanov : après la formation d'une première couche désordonnée, les molécules se regroupent dans des îlots cristallins. Les propriétés électroniques de films moléculaires de différentes épaisseurs déposés sur Pt(001) ont pu être déduites par spectroscopie de pertes d'énergie d'électrons lents en mode réflexion (REELS) montrant une lente ouverture du gap. Nous observons la formation de monocouches désordonnées en raison d'une forte interaction molécule-platine comparativement à l'interaction molécule-molécule. Ce résultat étant en opposition avec notre critère initial d'obtention de couches ultraminces ordonnées, nous nous sommes donc intéressés au substrat Au(001). Dans ce cas, il a été démontré que les couches déposées donnent généralement des surstructures organisées.
Nous avons utilisés les vitesses de dépôt précédemment déterminées dans le cadre des dépôt sur platine afin d'étudier par AES et STM les monocouches de PTCDI et Pd(Pc) sur la face (001) de l'or. La monocouche de Pd(Pc) déposée à température ambiante s'ordonne en fonction de la quantité adsorbée en une maille carrée ou rectangulaire, orientée suivant les directions <110> et < 10> du substrat. Le film de PTCDI forme une maille rectangulaire dont les paramètres sont proches de ceux obtenus par diffraction des rayons X sur des monocristaux de PTCDI.
Finalement, le dépôt d'une fraction de monocouche de PTCDI sur la surstructure carrée de Pd(Pc) adsorbée sur Au(001) conduit à la formation d'une maille de PTCDI commensurable avec la maille de Pd(Pc). Les courbes I-V obtenues par STS pour le système W / PTCDI / Pd(Pc) / Au(100) sont semblables à une caractéristique de diode (coefficient redresseur compris entre 13 et 24), mais l'origine de cet effet reste pour le moment à déterminer.
Guillermet, Olivier. "Etude de films ultra-minces de PTCDI et Pd(Pc) déposés sur les surfaces Pt(001), Pt(111) et Au(001) : application à l'hétérostructure métal/PTCDI/Pd(Pc)/métal." Aix-Marseille 2, 2006. http://theses.univ-amu.fr.lama.univ-amu.fr/2006AIX22042.pdf.
Rahmoune, Mohammed. "Etude de films minces de fer déposés sur l'arseniure de gallium ; rôle de l'interface ; effets de la température et du mélange ionique." Poitiers, 1995. http://www.theses.fr/1995POIT2304.
Bortolussi, Vincent. "Etude expérimentale et numérique de la conductivité de revêtements composites métal-polymère déposés par projection dynamique par gaz froid sur substrat composite à matrice organique." Thesis, Paris Sciences et Lettres (ComUE), 2016. http://www.theses.fr/2016PSLEM075/document.
The Cold Spray process allows to manufacture metallic coatings onto Carbon Fiber-Reinforced Composite (CFRP). This process relies on the spraying of high-velocity powder particles to result in high deformation and build up to form a dense coating. However, forming a coating made of copper particles onto a substrate containing carbon fibers was achieved out only by mixing metallic powder with a polymer powder. Although the polymer allow to build up the coating onto CFRP, it is highly electrically insulating. It would therefore decrease the electrical conductivity of the coating drastically. Investigations were carried out on the influence of the coatings microstructure on electrical conductivity. Various copper powders, with different morphologies, granulometry and oxygen contents were mixed with PEEK powder, i.e. a thermoplastic polymer. Cold spray of these powders leads to homogeneous coatings onto CFRP. The characteristics of these coatings were studied as a function of the influence of powder characteristics and spraying parameters. The deformation of the PEEK was also investigated as it governed the build up of the coating. Mechanical testing of PEEK samples and in-situ spraying measurements were performed to feed impact simulations. Then, simulated and experimental impact morphologies of copper particles onto PEEK were compared. The PEEK behavior under impact also prevented sound contacts between copper particles, which decreased the coatings electrical conductivity significantly. A morphological model of the microstructure of the coating was developed to reproduce microstructures in 3D numerically. It allows to investigate numerically the influence of the copper phase morphology on coating conductivity. This conductivity was measured experimentally for various starting copper powders. A carefully selected blend of copper and PEEK powders and optimized spraying parameters lead to homogeneous coatings onto CFRP with an acceptable electrical conductivity but still below bulk copper conductivity
Rul, Sébastien. "Synthèse de composites nanotubes de carbone - métal - oxyde à partir de mousses céramiques." Toulouse 3, 2002. http://www.theses.fr/2002TOU30189.
Thery, Virginie. "Etude de la microstructure et des transitions de phases électroniques et cristallines de couches épitaxiales de VO₂ déposées sur différents substrats." Thesis, Limoges, 2017. http://www.theses.fr/2017LIMO0059/document.
The research presented in this manuscript deals the study of the effect of strain (epitaxial or thermal) on the structural and the electrical transitions of vanadium dioxide. VO₂ thin films have been synthesized by e-beam deposition and Pulsed Laser Deposition methods. The strain geometry is controlled by modifying, on the one hand, the nature of the substrates and, on the other hand, the thickness of thin films. In the case of (001) sapphire substrates (Al₂ O₃ ), the important lattice mismatch leads to a domain matching epitaxial growth mechanism, so that the residual strain solely result from the film/substrate thermal expansion mismatch. The study of the structural phase transition, using X-ray diffraction, and the study of the metal-insulator transition, using a 4-probes device, showed that the tensile strain along the cᵣ axis leads to an increase of the transition temperature (> 68◦ C). The appearance of an intermediate phase was demonstrated during the study of the structural phase transition. Growth on (001)- and (111)-TiO₂ substrates is characterized by a weaker lattice mismatch (∼ 1%), with a critical thickness of 4 nm, from which dislocations are created to relax the elastic energy. The study of electrical and structural transitions has shown that the evolution of transitions results from a competition between epitaxial distorsion, thermal distorsions and the presence of oxygen vacancies at the interface
Частини книг з теми "Métal déposé":
KUREK, Mia, and Mario ŠČETAR. "Additifs, auxiliaires et revêtements pour les matériaux d’emballage." In Matériaux et procédés d’emballage pour les industries alimentaires, cosmétiques et pharmaceutiques, 261–84. ISTE Group, 2022. http://dx.doi.org/10.51926/iste.9039.ch10.