Статті в журналах з теми "Metal-Assisted chemical etching of silicon"
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Li, Yu Ping, Xiu Hua Chen, Wen Hui Ma, Shao Yuan Li, Ping Bi, Xue Mei Liu, and Fu Wei Xiang. "Research on Preparation of Porous Silicon Powders from Metallurgical Silicon Material." Materials Science Forum 847 (March 2016): 97–102. http://dx.doi.org/10.4028/www.scientific.net/msf.847.97.
Повний текст джерелаCao, Dao Tran, Cao Tuan Anh, and Luong Truc Quynh Ngan. "Vertical-Aligned Silicon Nanowire Arrays with Strong Photoluminescence Fabricated by Metal-Assisted Electrochemical Etching." Journal of Nanoelectronics and Optoelectronics 15, no. 1 (January 1, 2020): 127–35. http://dx.doi.org/10.1166/jno.2020.2684.
Повний текст джерелаSt John, Christopher, Christian L. Arrington, Jonathan Coleman, Mason Risley, and David Bruce Burckel. "Metasurface Optic Features Using Metal-Assisted Chemical Etching (MACE)." ECS Meeting Abstracts MA2024-02, no. 16 (November 22, 2024): 1652. https://doi.org/10.1149/ma2024-02161652mtgabs.
Повний текст джерелаZhang, Lansheng, Xiaoyang Chu, Feng Tian, Yang Xu, and Huan Hu. "Bio-Inspired Hierarchical Micro-/Nanostructures for Anti-Icing Solely Fabricated by Metal-Assisted Chemical Etching." Micromachines 13, no. 7 (July 7, 2022): 1077. http://dx.doi.org/10.3390/mi13071077.
Повний текст джерелаChoi, Keorock, Yunwon Song, Ilwhan Oh, and Jungwoo Oh. "Catalyst feature independent metal-assisted chemical etching of silicon." RSC Advances 5, no. 93 (2015): 76128–32. http://dx.doi.org/10.1039/c5ra15745e.
Повний текст джерелаLi, Liyi, Colin M. Holmes, Jinho Hah, Owen J. Hildreth, and Ching P. Wong. "Uniform Metal-assisted Chemical Etching and the Stability of Catalysts." MRS Proceedings 1801 (2015): 1–8. http://dx.doi.org/10.1557/opl.2015.574.
Повний текст джерелаBerezhanskyi, Ye I., S. I. Nichkalo, V. Yu Yerokhov, and A. A. Druzhynin. "Nanotexturing of Silicon by Metal-Assisted Chemical Etching." Фізика і хімія твердого тіла 16, no. 1 (March 15, 2015): 140–44. http://dx.doi.org/10.15330/pcss.16.1.140-144.
Повний текст джерелаYang, Xiaoyu, Ling Tong, Lin Wu, Baoguo Zhang, Zhiyuan Liao, Ao Chen, Yilai Zhou, Ying Liu, and Ya Hu. "Research progress of silicon nanostructures prepared by electrochemical etching based on galvanic cells." Journal of Physics: Conference Series 2076, no. 1 (November 1, 2021): 012117. http://dx.doi.org/10.1088/1742-6596/2076/1/012117.
Повний текст джерелаLai, Chang Quan, Wen Zheng, W. K. Choi, and Carl V. Thompson. "Metal assisted anodic etching of silicon." Nanoscale 7, no. 25 (2015): 11123–34. http://dx.doi.org/10.1039/c5nr01916h.
Повний текст джерелаIatsunskyi, Igor, Valentin Smyntyna, Nykolai Pavlenko, and Olga Sviridova. "Peculiarities of Photoluminescence in Porous Silicon Prepared by Metal-Assisted Chemical Etching." ISRN Optics 2012 (November 1, 2012): 1–6. http://dx.doi.org/10.5402/2012/958412.
Повний текст джерелаPérez-Díaz, Oscar, and Enrique Quiroga-González. "Silicon Conical Structures by Metal Assisted Chemical Etching." Micromachines 11, no. 4 (April 11, 2020): 402. http://dx.doi.org/10.3390/mi11040402.
Повний текст джерелаXia, Weiwei, Jun Zhu, Haibo Wang, and Xianghua Zeng. "Effect of catalyst shape on etching orientation in metal-assisted chemical etching of silicon." CrystEngComm 16, no. 20 (2014): 4289–97. http://dx.doi.org/10.1039/c4ce00006d.
Повний текст джерелаSkrypnyk, I. I., S. I. Nichkalo, and N. O. Shtangret. "The effect of clustering of Si nanowires produced by the metal-assisted chemical etching method on their anti-reflecting properties." Physics and Chemistry of Solid State 25, no. 4 (December 15, 2024): 903–9. https://doi.org/10.15330/pcss.25.4.903-909.
Повний текст джерелаRai, Sadhna, Rabina Bhujel, Manas Kumar Mondal, Bibhu Prasad Swain, and Joydeep Biswas. "Study of the morphological, optical, structural and electrical properties of silicon nanowires at varying concentrations of the catalyst precursor." Materials Advances 3, no. 6 (2022): 2779–85. http://dx.doi.org/10.1039/d1ma01145f.
Повний текст джерелаLipinski, M., J. Cichoszewski, R. P. Socha, and T. Piotrowski. "Porous Silicon Formation by Metal-Assisted Chemical Etching." Acta Physica Polonica A 116, Supplement (December 2009): S—117—S—119. http://dx.doi.org/10.12693/aphyspola.116.s-117.
Повний текст джерелаHildreth, Owen J., and Daniel R. Schmidt. "Vapor Phase Metal-Assisted Chemical Etching of Silicon." Advanced Functional Materials 24, no. 24 (March 14, 2014): 3827–33. http://dx.doi.org/10.1002/adfm.201304129.
Повний текст джерелаHuang, Zhipeng, Nadine Geyer, Peter Werner, Johannes de Boor, and Ulrich Gösele. "Metal-Assisted Chemical Etching of Silicon: A Review." Advanced Materials 23, no. 2 (September 21, 2010): 285–308. http://dx.doi.org/10.1002/adma.201001784.
Повний текст джерелаHuang, Zhipeng, Nadine Geyer, Peter Werner, Johannes de Boor, and Ulrich Goesele. "ChemInform Abstract: Metal-Assisted Chemical Etching of Silicon." ChemInform 42, no. 14 (March 14, 2011): no. http://dx.doi.org/10.1002/chin.201114223.
Повний текст джерелаZhang, Shiying, Zhenhua Li, and Qingjun Xu. "A systematic study of silicon nanowires array fabricated through metal-assisted chemical etching." European Physical Journal Applied Physics 92, no. 3 (December 2020): 30402. http://dx.doi.org/10.1051/epjap/2020200289.
Повний текст джерелаAkan, Rabia, and Ulrich Vogt. "Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures." Nanomaterials 11, no. 11 (October 22, 2021): 2806. http://dx.doi.org/10.3390/nano11112806.
Повний текст джерелаXu, Zhiyang, Hao Zhang, Chao Chen, Gohar Aziz, Jie Zhang, Xiaoxia Zhang, Jinxiang Deng, Tianrui Zhai, and Xinping Zhang. "A silicon-based quantum dot random laser." RSC Advances 9, no. 49 (2019): 28642–47. http://dx.doi.org/10.1039/c9ra04650j.
Повний текст джерелаOh, Ilwhan. "Silicon Nanostructures Fabricated by Metal-Assisted Chemical Etching of Silicon." Journal of the Korean Electrochemical Society 16, no. 1 (February 28, 2013): 1–8. http://dx.doi.org/10.5229/jkes.2013.16.1.1.
Повний текст джерелаVolovlikova, Olga V., S. A. Gavrilov, P. I. Lazarenko, A. V. Kukin, A. A. Dudin, and A. K. Tarhanov. "Influence of Etching Regimes on the Reflectance of Black Silicon Films Formed by Ni-Assisted Chemical Etching." Key Engineering Materials 806 (June 2019): 24–29. http://dx.doi.org/10.4028/www.scientific.net/kem.806.24.
Повний текст джерелаLin, Hao, Ming Fang, Ho-Yuen Cheung, Fei Xiu, SenPo Yip, Chun-Yuen Wong, and Johnny C. Ho. "Hierarchical silicon nanostructured arrays via metal-assisted chemical etching." RSC Adv. 4, no. 91 (2014): 50081–85. http://dx.doi.org/10.1039/c4ra06172a.
Повний текст джерелаDong, Gangqiang, Yurong Zhou, Hailong Zhang, Fengzhen Liu, Guangyi Li, and Meifang Zhu. "Passivation of high aspect ratio silicon nanowires by using catalytic chemical vapor deposition for radial heterojunction solar cell application." RSC Advances 7, no. 71 (2017): 45101–6. http://dx.doi.org/10.1039/c7ra08343b.
Повний текст джерелаArafat, Mohammad Yasir, Mohammad Aminul Islam, Ahmad Wafi Bin Mahmood, Fairuz Abdullah, Mohammad Nur-E-Alam, Tiong Sieh Kiong, and Nowshad Amin. "Fabrication of Black Silicon via Metal-Assisted Chemical Etching—A Review." Sustainability 13, no. 19 (September 28, 2021): 10766. http://dx.doi.org/10.3390/su131910766.
Повний текст джерелаPyatilova, Olga V., Sergey A. Gavrilov, Alexey A. Dronov, Yana S. Grishina, and Alexey N. Belov. "Role of Ag+ Ion Concentration on Metal-Assisted Chemical Etching of Silicon." Solid State Phenomena 213 (March 2014): 103–8. http://dx.doi.org/10.4028/www.scientific.net/ssp.213.103.
Повний текст джерелаKara, S. A., A. Keffous, A. M. Giovannozzi, A. M. Rossi, E. Cara, L. D'Ortenzi, K. Sparnacci, L. Boarino, N. Gabouze, and S. Soukane. "Fabrication of flexible silicon nanowires by self-assembled metal assisted chemical etching for surface enhanced Raman spectroscopy." RSC Advances 6, no. 96 (2016): 93649–59. http://dx.doi.org/10.1039/c6ra20323j.
Повний текст джерелаChen, Chia-Yun, and Yu-Rui Liu. "Exploring the kinetics of ordered silicon nanowires with the formation of nanogaps using metal-assisted chemical etching." Phys. Chem. Chem. Phys. 16, no. 48 (2014): 26711–14. http://dx.doi.org/10.1039/c4cp04237a.
Повний текст джерелаQuiroga-González, Enrique, Miguel Ángel Juárez-Estrada, and Estela Gómez-Barojas. "(Invited) Light Enhanced Metal Assisted Chemical Etching of Silicon." ECS Transactions 86, no. 1 (July 20, 2018): 55–63. http://dx.doi.org/10.1149/08601.0055ecst.
Повний текст джерелаLi, Meicheng, Yingfeng Li, Wenjian Liu, Luo Yue, Ruike Li, Younan Luo, Mwenya Trevor, et al. "Metal-assisted chemical etching for designable monocrystalline silicon nanostructure." Materials Research Bulletin 76 (April 2016): 436–49. http://dx.doi.org/10.1016/j.materresbull.2016.01.006.
Повний текст джерелаLeng, Xidu, Chengyong Wang, and Zhishan Yuan. "Progress in metal-assisted chemical etching of silicon nanostructures." Procedia CIRP 89 (2020): 26–32. http://dx.doi.org/10.1016/j.procir.2020.05.114.
Повний текст джерелаSandu, Georgiana, Jonathan Avila Osses, Marine Luciano, Darwin Caina, Antoine Stopin, Davide Bonifazi, Jean-François Gohy, et al. "Kinked Silicon Nanowires: Superstructures by Metal-Assisted Chemical Etching." Nano Letters 19, no. 11 (October 8, 2019): 7681–90. http://dx.doi.org/10.1021/acs.nanolett.9b02568.
Повний текст джерелаHan, Hee, Zhipeng Huang, and Woo Lee. "Metal-assisted chemical etching of silicon and nanotechnology applications." Nano Today 9, no. 3 (June 2014): 271–304. http://dx.doi.org/10.1016/j.nantod.2014.04.013.
Повний текст джерелаChartier, C., S. Bastide, and C. Lévy-Clément. "Metal-assisted chemical etching of silicon in HF–H2O2." Electrochimica Acta 53, no. 17 (July 2008): 5509–16. http://dx.doi.org/10.1016/j.electacta.2008.03.009.
Повний текст джерелаMatsumoto, Ayumu, Hikoyoshi Son, Makiho Eguchi, Keishi Iwamoto, Yuki Shimada, Kyohei Furukawa, and Shinji Yae. "General corrosion during metal-assisted etching of n-type silicon using different metal catalysts of silver, gold, and platinum." RSC Advances 10, no. 1 (2020): 253–59. http://dx.doi.org/10.1039/c9ra08728a.
Повний текст джерелаBlayney, G. J., C. Zaradzki, Y. Liu, M. A. Mohd-Azmi, and Owen J. Guy. "Anti-Reflective Porous Silicon Features by Substrate Conformal Imprint Lithography for Silicon Photovoltaic Applications." Materials Science Forum 806 (October 2014): 109–13. http://dx.doi.org/10.4028/www.scientific.net/msf.806.109.
Повний текст джерелаЖарова, Ю. А., В. А. Толмачев, А. И. Бедная та С. И. Павлов. "Поверхностные наноструктуры, формирующиеся на ранних стадиях металл-стимулированного химического травления кремния. Оптические свойства наночастиц серебра". Физика и техника полупроводников 52, № 3 (2018): 333. http://dx.doi.org/10.21883/ftp.2018.03.45617.8684.
Повний текст джерелаLianto, Prayudi, Sihang Yu, Jiaxin Wu, C. V. Thompson, and W. K. Choi. "Vertical etching with isolated catalysts in metal-assisted chemical etching of silicon." Nanoscale 4, no. 23 (2012): 7532. http://dx.doi.org/10.1039/c2nr32350h.
Повний текст джерелаDusheiko, M. G., V. M. Koval, and T. Yu Obukhova. "Silicon nanowire arrays synthesized using the modified MACE process: Integration into chemical sensors and solar cells." Semiconductor Physics, Quantum Electronics and Optoelectronics 25, no. 1 (March 24, 2022): 58–67. http://dx.doi.org/10.15407/spqeo25.01.058.
Повний текст джерелаMa, Guo Feng, Heng Ye, Hong Lin Zhang, Chun Lin He, and Li Na Sun. "Influence of Hf and H2O2 on Morphology of Silicon Formed by Ag Assisted Chemical Etching." Advanced Materials Research 953-954 (June 2014): 1045–48. http://dx.doi.org/10.4028/www.scientific.net/amr.953-954.1045.
Повний текст джерелаHu, Ya, Chensheng Jin, Ying Liu, Xiaoyu Yang, Zhiyuan Liao, Baoguo Zhang, Yilai Zhou, et al. "Metal Particle Evolution Behavior during Metal Assisted Chemical Etching of Silicon." ECS Journal of Solid State Science and Technology 10, no. 8 (August 1, 2021): 084002. http://dx.doi.org/10.1149/2162-8777/ac17be.
Повний текст джерелаHuang, Weiye, Junyi Wu, Wenxin Li, Guojin Chen, Changyong Chu, Chao Li, Yucheng Zhu, Hui Yang, and Yan Chao. "Fabrication of Silicon Nanowires by Metal-Assisted Chemical Etching Combined with Micro-Vibration." Materials 16, no. 15 (August 5, 2023): 5483. http://dx.doi.org/10.3390/ma16155483.
Повний текст джерелаJanavicius, Lukas L., Julian A. Michaels, Clarence Chan, Dane J. Sievers, and Xiuling Li. "Programmable vapor-phase metal-assisted chemical etching for versatile high-aspect ratio silicon nanomanufacturing." Applied Physics Reviews 10, no. 1 (March 2023): 011409. http://dx.doi.org/10.1063/5.0132116.
Повний текст джерелаLeonardi, Antonio Alessio, Maria José Lo Faro, and Alessia Irrera. "Silicon Nanowires Synthesis by Metal-Assisted Chemical Etching: A Review." Nanomaterials 11, no. 2 (February 3, 2021): 383. http://dx.doi.org/10.3390/nano11020383.
Повний текст джерелаSt John, Christopher, Christian L. Arrington, Jonathan Coleman, Mason Risley, and David Bruce Burckel. "Tuning Machine Learning Hyperparameters of a Metal-Assisted Chemical Etching (MACE) Process." ECS Meeting Abstracts MA2024-02, no. 13 (November 22, 2024): 1576. https://doi.org/10.1149/ma2024-02131576mtgabs.
Повний текст джерелаChetibi L., Hamana D., and Achour S. "Metal assisted chemical etching of silicon and solution synthesis of Cu-=SUB=-2-=/SUB=-O/Si radial nanowire array heterojunctions." Semiconductors 57, no. 2 (2023): 112. http://dx.doi.org/10.21883/sc.2023.02.55956.3390.
Повний текст джерелаJiang, Bing, Meicheng Li, Yu Liang, Yang Bai, Dandan Song, Yingfeng Li, and Jian Luo. "Etching anisotropy mechanisms lead to morphology-controlled silicon nanoporous structures by metal assisted chemical etching." Nanoscale 8, no. 5 (2016): 3085–92. http://dx.doi.org/10.1039/c5nr07327h.
Повний текст джерелаBalderas-Valadez, R. F., V. Agarwal, and C. Pacholski. "Fabrication of porous silicon-based optical sensors using metal-assisted chemical etching." RSC Advances 6, no. 26 (2016): 21430–34. http://dx.doi.org/10.1039/c5ra26816h.
Повний текст джерелаSchweizer, S. L., X. Li, J. Wang, A. Sprafke, and R. B. Wehrspohn. "Silicon Nanowires Self-Purification By Metal-Assisted Chemical Etching of Metallurgical Silicon." ECS Transactions 69, no. 2 (October 2, 2015): 241–48. http://dx.doi.org/10.1149/06902.0241ecst.
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