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1

Shinde, Deodatta, Stefan Fritze, Mattias Thuvander, Paulius Malinovskis, Lars Riekehr, Ulf Jansson, and Krystyna Stiller. "Elemental Distribution in CrNbTaTiW-C High Entropy Alloy Thin Films." Microscopy and Microanalysis 25, no. 2 (February 4, 2019): 489–500. http://dx.doi.org/10.1017/s1431927618016264.

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AbstractThe microstructure and distribution of the elements have been studied in thin films of a near-equimolar CrNbTaTiW high entropy alloy (HEA) and films with 8 at.% carbon added to the alloy. The films were deposited by magnetron sputtering at 300°C. X-ray diffraction shows that the near-equimolar metallic film crystallizes in a single-phase body centered cubic (bcc) structure with a strong (110) texture. However, more detailed analyses with transmission electron microscopy (TEM) and atom probe tomography (APT) show a strong segregation of Ti to the grain boundaries forming a very thin Ti–Cr rich interfacial layer. The effect can be explained by the large negative formation enthalpy of Ti–Cr compounds and shows that CrNbTaTiW is not a true HEA at lower temperatures. The addition of 8 at.% carbon leads to the formation of an amorphous structure, which can be explained by the limited solubility of carbon in bcc alloys. TEM energy-dispersive X-ray spectroscopy indicated that all metallic elements are randomly distributed in the film. The APT investigation, however, revealed that carbide-like clusters are present in the amorphous film.
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2

Babonneau, D., A. Naudon, D. Thiaudière, and S. Lequien. "Morphological characterization of ion-sputtered C–Ag, C/C–Ag and Ag/C films by GISAXS." Journal of Applied Crystallography 32, no. 2 (April 1, 1999): 226–33. http://dx.doi.org/10.1107/s0021889898011996.

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A carbon–silver thin film (33 at.% Ag and thickness of 2100 Å) has been synthesized by co-sputtering of a C–Ag target and characterized by grazing-incidence small-angle X-ray scattering (GISAXS), a technique that gives a considerably enhanced surface sensitivity. Experiments have been carried out at or near the critical angle of the layer. It is shown that, because C and Ag show no mutual solubility, a demixing occurs during the co-deposition process and silver clusters form within an amorphous carbon matrix. Using different incident angles of the X-ray beam, it is demonstrated that two populations of clusters are present in the layer: some large and nearly spherical on the surface, others smaller and elongated along the direction of the growth of the thin film in the bulk. In the case of a C/C–Ag bilayer, the surface diffusion is avoided just after the co-deposition process and it is shown that only the small and elongated clusters in the bulk are formed. In the case of a very thin Ag/C layer, there is only surface diffusion and it is shown that large silver islands are formed on the carbon surface. Such experiments demonstrate that the growth mechanism that takes place during the co-deposition process involves mainly a surface diffusion of silver and carbon atoms, as opposed to a volume diffusion.
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3

Watanabe, Yoshihisa, Yoshikazu Nakamura, Shigekazu Hirayama, and Yoshimasa Yamaguchi. "Thermally stimulated exoelectron emission from hydrogenated amorphous carbon films." Journal of Materials Research 7, no. 7 (July 1992): 1805–8. http://dx.doi.org/10.1557/jmr.1992.1805.

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Hydrogenated amorphous carbon (a–C:H) films on stainless steel (AISI430) substrate oxidized in air at 1273 K were prepared from a gas mixture of methane and hydrogen by an rf plasma chemical vapor deposition, and thermally stimulated exoelectron emission (TSEE) was studied for the x-ray irradiated a–C:H films. Glow curves and energy distributions of TSEE from the 80- and 280-nm a–C:H films and from the AISI430 substrate have been measured under ultrahigh vacuum conditions. It was found that the glow curve from the 80-nm a–C:H film was similar to that from the AISI430 substrate, but it was quite different from that from the 280-nm film; the values of the mean energy of exoelectrons at the glow peak temperatures from the 80-nm a–C:H film are almost the same as those from the substrate but are much lower than those of the 280-nm film. The surfaces of 80- and 280-nm a–C:H films are observed with the scanning electron microscope (SEM). Observations by SEM show that the 80-nm film has relatively large-sized clusters of films and the stainless steel substrate still appears in some places, but the surface of the 280-nm film is completely covered by the carbon films. From these results, we propose that TSEE from the 80-nm film originates mainly from the oxide films on the stainless steel substrate and TSEE from the 280-nm film originates from the film itself. Thus, TSEE can be applied to characterize the surface of thin films.
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4

Alekseeva, Olga, Artem Mikhalev, Elena Lutikova, Vladimir Porembsky, Mikhail Presnyakov, Vladimir Fateev, Boris Shapir, and Sergey Grigoriev. "Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering." Catalysts 8, no. 12 (December 18, 2018): 665. http://dx.doi.org/10.3390/catal8120665.

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This article is devoted to further development of magnetron sputtering technology for catalysts and catalysts layer production for fuel cells and other electrochemical devices. Platinum-carbon films with Pt content up to 95–97 wt % were deposited using different sputtering regimes—DC (direct current) sputtering with and without application of a pulse negative bias voltage to the titanium substrate and also bipolar pulse sputtering with frequency of 10 kHz and 100 kHz. Composite platinum carbon targets were used for sputtering. Characteristics of platinum-carbon films were compared with those of platinum films deposited using the same regimes. The main methods of investigation were scanning transmission electron microscopy (STEM) with energy dispersive X-ray spectroscopy; potentiostatic and potentiodynamic methods. The catalytic activity of platinum-carbon films increased with platinum content and at a platinum concentration of 95–97 wt % became higher than that of platinum films sputtered in the same regimes. It was proposed that carbon atoms deposited on the substrate limited the mobility of the deposited platinum species and inhibited Pt cluster growth. Platinum-carbon films produced by pulsed DC magnetron sputtering with pulsed frequency 100 kHz consisted of narrow Pt columns with dome nanotops forming a well-developed surface. The porosity and specific surface of these columnar nanopillar films were higher compared with those of pure platinum films deposited under the same conditions. Moreover, the platinum-carbon films deposited using a bipolar pulse regime with a frequency of 100 kHz had the highest specific surface, porosity (30%) and catalytic activity in hydrogen and oxygen evolution due to a high ion current density and reduced pulse duration which inhibited the growth of large platinum globules.
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5

Fonseca, Alexandre F., Tao Liang, Difan Zhang, Kamal Choudhary, Simon R. Phillpot, and Susan B. Sinnott. "Titanium-Carbide Formation at Defective Curved Graphene-Titanium Interfaces." MRS Advances 3, no. 8-9 (2018): 457–62. http://dx.doi.org/10.1557/adv.2018.115.

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ABSTRACTPhysical and chemical properties of graphene-metal interfaces have been largely examined with the objective of producing nanostructured carbon-based electronic devices. Although electronic properties are key to such devices, appropriate structural, thermal and mechanical properties are important for device performance as well. One of the most studied is the graphene-titanium (G-Ti) interface. Titanium is a low density, high strength versatile metal that can form alloys with desirable properties for applications ranging from aerospace to medicine. Small clusters and thin films of titanium deposited on graphene have also been examined. However, while some experiments show that thin films of titanium on graphene can be removed without damaging graphene hexagonal structure, others reported the formation of titanium-carbide (TiC) at G-Ti interfaces. In a previous work [ACS Appl. Mater. Interfaces, 2017, 9 (38), pp 33288-33297], we have shown that pristine G-Ti interfaces are resilient to large thermal fluctuations even when G-Ti structures lie on curved or kinked substrates. Here, using classical molecular dynamics with the third-generation Charge Optimized Many Body (COMB3) potential, we show that di-interstitial defective G-Ti structures on a copper substrate with a relatively large curvature kink, present signs of TiC formation. This result might help explain the different experimental results mentioned above.
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6

Milani, P., M. Ferretti, P. Piseri, C. E. Bottani, A. Ferrari, A. Li Bassi, G. Guizzetti, and M. Patrini. "Synthesis and characterization of cluster-assembled carbon thin films." Journal of Applied Physics 82, no. 11 (December 1997): 5793–98. http://dx.doi.org/10.1063/1.366446.

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7

Buzio, R., E. Gnecco, C. Boragno, U. Valbusa, P. Piseri, E. Barborini, and P. Milani. "Self-affine properties of cluster-assembled carbon thin films." Surface Science 444, no. 1-3 (January 2000): L1—L6. http://dx.doi.org/10.1016/s0039-6028(99)01066-3.

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8

Ferrari, A. C., B. S. Satyanarayana, J. Robertson, W. I. Milne, E. Barborini, P. Piseri, and P. Milani. "Electron field emission from cluster-assembled carbon thin films." Europhysics Letters (EPL) 46, no. 2 (April 15, 1999): 245–50. http://dx.doi.org/10.1209/epl/i1999-00251-7.

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9

MÉLINON, P., V. PAILLARD, V. DUPUIS, J. P. PEREZ, J. TUAILLON, A. PEREZ, B. BARBARA, L. THOMAS, and M. BOUDEULLE. "CORRELATION BETWEEN FREE-CLUSTER PROPERTIES AND THIN FILMS ELABORATED BY LOW-ENERGY CLUSTER-BEAM DEPOSITION." Surface Review and Letters 03, no. 01 (February 1996): 1007–11. http://dx.doi.org/10.1142/s0218625x96001807.

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The properties of thin films obtained by low-energy cluster-beam deposition are reviewed. The main characteristics are the nanoscale granular structure and the memory effect of the free-cluster properties. The first point is evidenced by the specific magnetic properties of transition-metal films, which are intermediate between amorphous and bulk phases, while the second point is illustrated from carbon films exhibiting the electronic structure of the free carbon cluster.
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10

Piseri, P., E. Barborini, M. Marino, P. Milani, C. Lenardi, L. Zoppi, and L. Colombo. "Hydrogen Uptake in Cluster-Assembled Carbon Thin Films: Experiment and Computer Simulation." Journal of Physical Chemistry B 108, no. 17 (April 2004): 5157–60. http://dx.doi.org/10.1021/jp037146f.

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11

Namba, Yoshikatsu, Jin Wei, Toshio Mohri, and E. A. Heidarpour. "Large grain size thin films of carbon with diamond structure." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7, no. 1 (January 1989): 36–39. http://dx.doi.org/10.1116/1.575764.

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12

Creasy, William R., and J. T. Brenna. "Formation of high mass carbon cluster ions from laser ablation of polymers and thin carbon films." Journal of Chemical Physics 92, no. 4 (February 15, 1990): 2269–79. http://dx.doi.org/10.1063/1.458019.

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13

KHAN, R. U. A., and S. R. P. SILVA. "ELECTRONIC CONDUCTION IN ION IMPLANATED AMORPHOUS CARBON THIN FILMS." International Journal of Modern Physics B 14, no. 02n03 (January 30, 2000): 195–205. http://dx.doi.org/10.1142/s0217979200000194.

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The electronic conduction mechanism occuring in amorphous thin films is quite complicated. In amorphous carbon films it is further exacerbated by the rich diversity of its microstructure as well as the large number of gap states present in the films. One of the main reasons for the tunability of the optical band gaps of these films not being exploited in active devices, has been the inability firstly to reduce the gap states to an acceptable level, and secondly finding suitable dopants that are electrically active at room temperature. The large number of gap states in the films further exacerbates its problems by not allowing suitable barriers (eg. Schottky) to be formed on to the amorphous carbon films. In this paper we hope to first divide the amorphous carbon thin films into two main categories. Namely, diamond-like carbon films which have a high precentage of C-C sp 3 bonding, and polymer-like carbon films that also have a high percentage of sp 3 bonding which is a mixture of C-C and C-H bonds, and have a high percentage of hydrogen as well as large optical band gaps. Recent results based on ion implantation using ions such as N, B, C will be contrasted to in-situ dopant incorporation via a gaseous source., and is shown to be a very powerful technique of modifying the conduction properties. It will be shown that in the diamond-like films the conduction properties are usually controlled via Poole-Frenkel type defect conduction, while for the polymer-like films it is more a space charge based bulk and possibly, barrier controlled process. But, due to the large band gaps of these films it is difficult to distinguish between the bulk effects and the barrier effects.
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14

Levenson, L. L., M. Stan, and K. B. Bhasin. "Properties of large area ErBa2Cu3O7−x thin films deposited by ionized cluster beams." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9, no. 3 (May 1991): 405–8. http://dx.doi.org/10.1116/1.577422.

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15

Muller, David A. "Electron-diffraction studies of amorphous carbon thin films." Proceedings, annual meeting, Electron Microscopy Society of America 51 (August 1, 1993): 1100–1101. http://dx.doi.org/10.1017/s0424820100151337.

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The sp2 rich amorphous carbons have a wide variety of microstructures ranging from flat sheetlike structures such as glassy carbon to highly curved materials having similar local ordering to the fullerenes. These differences are most apparent in the region of the graphite (0002) reflection of the energy filtered diffracted intensity obtained from these materials (Fig. 1). All these materials consist mainly of threefold coordinated atoms. This accounts for their similar appearance above 0.8 Å-1. The fullerene curves (b,c) show a string of peaks at distance scales corresponding to the packing of the large spherical and oblate molecules. The beam damaged C60 (c) shows an evolution to the sp2 amorphous carbons as the spherical structure is destroyed although the (220) reflection in fee fcc at 0.2 Å-1 does not disappear completely. This 0.2 Å-1 peak is present in the 1960 data of Kakinoki et. al. who grew films in a carbon arc under conditions similar to those needed to form fullerene rich soots.
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16

Awang, Rozidawati, Nurul Izzati Azman, and Noorain Purhanudin. "Influence of Deposition Time on Bonding and Morphology of Amorphous Carbon Nitride Thin Films." Materials Science Forum 846 (March 2016): 657–62. http://dx.doi.org/10.4028/www.scientific.net/msf.846.657.

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Amorphous carbon nitride (a-CNx) is a well-known material that can be used in various applications such as coating for hard disk, wear resistant, humidity sensor and others. In this research, a-CNx thin films have been deposited by using radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) with the mixing of pure methane (CH4) and nitrogen (N2). The gas ratio of CH4/N2, electrode distance, pressure and temperature of deposition is kept constant while deposition time is allowed to vary from 30 to 150 minutes. Raman spectroscopy and field emission scanning electron microscopy (FESEM) have been used to study the bonding and morphology of these films respectively. An increase in deposition time resulted with thedecrease in sp2 content in the a-CNx thin films. Theincrease in the Id/Ig intensity ratio with the increase in deposition time can be explained by the reducing size of graphitic cluster. Long deposition time retarded the growth rate of a-CNx thin films due to etching effects. Longer exposure to the etching effect resultingin the creation of small graphitic cluster with the formation of spongy-like porous features.
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17

Bettini, Luca Giacomo, Flavio Della Foglia, Paolo Milani, and Paolo Piseri. "Nanostructured carbon substrate improves the photoelectrochemical water splitting activity of cluster-assembled TiO2 thin films." International Journal of Hydrogen Energy 40, no. 18 (May 2015): 6013–20. http://dx.doi.org/10.1016/j.ijhydene.2015.03.071.

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18

Carroll, D. L., M. Wagner, M. Rühle, and D. A. Bonnell. "The Thermal Stability of Thin Copper Films Deposited on TiO2(110) Studied by Scanning Tunneling Microscopy." Journal of Materials Research 12, no. 4 (April 1997): 975–83. http://dx.doi.org/10.1557/jmr.1997.0138.

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The morphology of Cu thin films is strongly dependent on the temperature of the substrate during and after deposition. Films grown at temperatures between 300 °C and 400 °C form clusters distributed in close packed domains and isolated clusters across the surface. Increased substrate temperatures result in cluster shape evolution indicative of mass flow and sintering. Deposition of Cu at substrate temperatures higher than 500 °C results in a completely different morphology of the film and the suppression of cluster formation. Annealing these Cu films to temperatures of 700 °C allows the system to relax into an equilibrium state characterized by large facets in the film and large areas of exposed surface. These observations are discussed in terms of basic thermodynamic data for bulk Cu oxidation and surface tensions for this system.
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19

Wei, B., and K. Komvopoulos. "Friction and Wear Micromechanisms of Amorphous Carbon Thin Films." Journal of Tribology 119, no. 4 (October 1, 1997): 823–29. http://dx.doi.org/10.1115/1.2833892.

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The friction and wear micromechanisms of amorphous hydrogenated carbon films were investigated experimentally using commercially available thin-film rigid disks with sputtered carbon overcoats and Al2O3TiC magnetic recording heads. Continuous sliding tests demonstrated the existence of two distinct friction and wear regimes characterized by different dominant micromechanisms. Scanning electron microscopy and Raman spectroscopy revealed that the evolution of friction in the first regime is due to changes of the surface microtopography and the film structure from amorphous carbon to polycrystalline graphite. Atomic force microscopy showed that the topography changes result from asperity nanofracture leading to the gradual removal of carbon material and the generation of ultrafine wear debris. The friction behavior in the second regime is due to various wear processes arising on the carbon film surface. High friction promotes surface micropitting and the formation of significantly deeper and wider texture marks. The erratic fluctuations of the friction force and microplowing of the carbon film at steady state are attributed to the relatively large wear particles generated by micropitting.
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20

Kim, Young, Nina Baule, Maheshwar Shrestha, Bocong Zheng, Thomas Schuelke, and Qi Hua Fan. "Single-beam plasma source deposition of carbon thin films." Review of Scientific Instruments 93, no. 11 (November 1, 2022): 113908. http://dx.doi.org/10.1063/5.0102605.

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A single-beam plasma source was developed and used to deposit hydrogenated amorphous carbon ( a-C:H) thin films at room temperature. The plasma source was excited by a combined radio frequency and direct current power, which resulted in tunable ion energy over a wide range. The plasma source could effectively dissociate the source hydrocarbon gas and simultaneously emit an ion beam to interact with the deposited film. Using this plasma source and a mixture of argon and C2H2 gas, a-C:H films were deposited at a rate of ∼26 nm/min. The resulting a-C:H film of 1.2 µm thick was still highly transparent with a transmittance of over 90% in the infrared range and an optical bandgap of 2.04 eV. Young’s modulus of the a-C:H film was ∼80 GPa. The combination of the low-temperature high-rate deposition of transparent a-C:H films with moderately high Young’s modulus makes the single-beam plasma source attractive for many coatings applications, especially in which heat-sensitive and soft materials are involved. The single-beam plasma source can be configured into a linear structure, which could be used for large-area coatings.
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21

Kim, Woo Jin, Taekoo Oh, Jeongkeun Song, Eun Kyo Ko, Yangyang Li, Junsik Mun, Bongju Kim, et al. "Strain engineering of the magnetic multipole moments and anomalous Hall effect in pyrochlore iridate thin films." Science Advances 6, no. 29 (July 2020): eabb1539. http://dx.doi.org/10.1126/sciadv.abb1539.

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The recent observation of the anomalous Hall effect (AHE) without notable magnetization in antiferromagnets has suggested that ferromagnetic ordering is not a necessary condition. Thus, recent theoretical studies have proposed that higher-rank magnetic multipoles formed by clusters of spins (cluster multipoles) can generate the AHE without magnetization. Despite such an intriguing proposal, controlling the unconventional AHE by inducing these cluster multipoles has not been investigated. Here, we demonstrate that strain can manipulate the hidden Berry curvature effect by inducing the higher-rank cluster multipoles in spin-orbit–coupled antiferromagnets. Observing the large AHE on fully strained antiferromagnetic Nd2Ir2O7 thin films, we prove that strain-induced cluster T1-octupoles are the only source of observed AHE. Our results provide a previously unidentified pathway for generating the unconventional AHE via strain-induced magnetic structures and establish a platform for exploring undiscovered topological phenomena via strain in correlated materials.
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22

D'Urso, Luisa, A. Alessandro Scalisi, Corinna Altamore, and Giuseppe Compagnini. "Formation, evolution, and degradation of nanostructured covalent thin films deposited by low-energy cluster beam deposition." Journal of Materials Research 21, no. 7 (July 1, 2006): 1638–44. http://dx.doi.org/10.1557/jmr.2006.0216.

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Low-energy cluster beam deposition (LECBD) is considered an intriguing technique for obtaining thin layers with well-defined structures at the nano- and mesoscale levels, allowing novel optical, electronic, and magnetic properties. The produced layers are highly porous and extremely reactive due to the high surface to volume ratio and must be characterized with in situ techniques to study their original composition and their evolution once exposed to reactive gases. In this work, we present a general overview and some results on the formation, evolution, and deposition of silicon and carbon cluster beams produced using a laser vaporization source.
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23

Hernandez, Leonardo F., Roberto R. Lima, Edson Pecoraro, Esteban Rosim-Fachini, and Maria L. P. da Silva. "Composite Thin Film Obtained Using Tetraethoxysilane and Aimed at VOCs Detection." Materials Science Forum 730-732 (November 2012): 185–90. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.185.

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The aim of this work was production of tetraethoxysilane (TEOS) plasma polymerized thin films and optimization of their physical-chemical characteristic for sensor development. The films were analyzed using several techniques. It was possible to produce composites (graphite clusters imbibed by silicon oxide film) made from only one reactant (TEOS). Deposition rate can vary significantly, reaching a maximum of 30 nm/min; cluster formation and their size widely depending on deposition parameters. The film surface was hydrophobic but can be wetted by organic compounds, probably due to carbon radicals. These films are good candidates for sensor development.
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24

JEONG, SEUNG YOL, BHARVIN PAREKH, VARUN GUPTA, GIOVANNI FANCHINI, and MANISH CHHOWALLA. "ROOM TEMPERATURE DEPOSITION OF SINGLE-WALLED CARBON NANOTUBE THIN FILMS." Nano 05, no. 05 (October 2010): 319–24. http://dx.doi.org/10.1142/s1793292010002220.

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A simple method for direct deposition of single-walled carbon nanotube (SWNT) networks on flexible substrates at room temperature is reported. Deposition of thin films was carried out using a two-zone tube furnace where the nucleation and growth of SWNTs occur in vapor phase in the hot zone and condense onto substrates in the cold zone. Raman spectroscopy and scanning electron microscopy reveal individual, uniformly distributed SWNTs over large areas (several cm2). The coverage density of the SWNTs on flexible substrates can be controlled by the location of the substrates within the cold zone. The opto-electronic properties of the thin films indicated that they can be transparent and conducting with sheet resistances ranging from 4 to 21 kΩ/sq at corresponding transparencies of 51 to 87%, respectively.
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25

Gao, Hongjun, Geoffrey S. Canright, Shijin Pang, Ilya M. Sandler, Zengquan Xue, and Zhenyu Zhang. "Unique Dendritic Patterns in Organic Thin Films." Fractals 06, no. 04 (December 1998): 337–50. http://dx.doi.org/10.1142/s0218348x98000390.

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We present the formation of unique and striking dendritic "seahorse" patterns in the growth of fullerene-tetracyanoquinodimethane ( C 60-TCNQ) or pune TCNQ thin films. The films were fabricated by an ionized-cluster-beam deposition method. Energetic neutral and charged clusters were deposited on amorphous carbon substrates. Transmission electron microscopy reveals that the elemental pattern is a "seahorse" — that is, an S-shaped form, with "fins" on the outer edges of the curved arms forming the S. Such forms possess an approximate symmetry under rotations by π, but strongly break two-dimensional inversion symmetry. A novel formation mechanism is proposed, involving the aggregatio of neutral and charged clusters, such that some electrostatic charge is trapped on each growing island. This charge gives rise to a long-range field which biases the growth in a nontrivial way. The broken symmetry arises from the strong amplification of noise in the diffusive aggregation process by the effects of the electro-static field — that is, the symmetry breaking is spontaneous. This picture is tested by applying a transverse electric field during growth: for sufficiently strong fields, the S-shaped "seahorses" lose their curvature, while retaining the feature of having two main arms. These results demonstrate the importance of electrostatic effects in the growth process, and are consistent with the growth mechanism described here.
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26

Borghi, Francesca, Matteo Milani, Luca Giacomo Bettini, Alessandro Podestà, and Paolo Milani. "Quantitative characterization of the interfacial morphology and bulk porosity of nanoporous cluster-assembled carbon thin films." Applied Surface Science 479 (June 2019): 395–402. http://dx.doi.org/10.1016/j.apsusc.2019.02.066.

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27

Balázsi, Katalin, Marta Vandrovcová, Lucie Bačáková, Csaba Balázsi, Imre Bertóti, François Davin, and György Z. Radnóczi. "Mechanical Behavior of Bioactive TiC Nanocomposite Thin Films." Materials Science Forum 729 (November 2012): 296–301. http://dx.doi.org/10.4028/www.scientific.net/msf.729.296.

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Carbon-based nanocomposite thin films have large application potential because they possess unique mechanical properties, especially high hardness, high elasticity, and a low widely adjustable friction coefficient. In this work, relatively easy preparation of the nanocomposite Ti and C system with good mechanical properties and bioactivity was showed. Formation of physical and mechanical processes, relationship between the evolving structure and other properties of TiC films were studied. The films were deposited on oxidized silicon substrates by dc magnetron sputtering of Ti and C targets in argon and nitrogen at different temperatures between 25°C and 800°C. The composite films consisted of metallic nanocrystalls embedded in a carbon matrix. Highest hardness ~ 18 GPa and reduced modulus of elasticity ~ 205 GPa were obtained when the crystalline nanoparticles were separated by 2-3 nm thin carbon matrix consisting of amorphous and graphite-like carbon phases. In these films the H/E ratio in the both cases is ~ 0,1. Bioactivity studies were carried out on human osteoblast-like cell line MG-63. The number of initially adhering cells on day 7 after seeding was significantly higher on the TiC surface than on the control culture dishes. Good biocompatibility and bioadhesion of these surfaces are attained by a favourable combination of surface roughness and chemistry.
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28

Li, Huaping. "Electronically Pure Single Chirality Semiconducting Single-Walled Carbon Nanotube for Large Scale Electronic Devices." MRS Advances 2, no. 02 (2017): 83–88. http://dx.doi.org/10.1557/adv.2017.15.

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Abstract Carbon nanotube thin film transistors (TFTs) with characteristics resembling those of TFTs constructed on amorphous silicon, low-temperature polycrystalline silicon and metal oxides were fabricated on (6,5) single chirality single-walled carbon nanotube (SWCNT) thin film deposited from electronically pure semiconducting (6,5) single chirality single-walled carbon nanotube (SWCNT) ink. This ink was extracted in industrial scale from raw SWCNTs produced using high pressure carbon monoxide conversion, and deposited on pretreated substrates to form uniform and consistent (6,5) HiPCO SWCNT thin film using solution process. The (6,5) HiPCO SWCNT thin films were characterized as pure semiconductor without metallic impurities showing classic nonlinear current-bias curves in Schottky-type diodes. Both N-type and P-type (6,5) HiPCO SWCNT TFTs were fabricated with femto Ampere off-current and ION/IOFF ratio of 108 by depositing SiNx and HfO2 dielectrics on the top of (6,5) HiPCO SWCNT thin films, respectively. The (6,5) HiPCO SWCNT inverter with voltage gain of 52 was also demonstrated by wire-bonding one P-type HiPCO SWCNT TFT to one N-type HiPCO SWCNT TFT.
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29

Srinath, S., and K. P. J. Reddy. "Large carbon cluster thin film gauges for measuring aerodynamic heat transfer rates in hypersonic shock tunnels." Measurement Science and Technology 26, no. 2 (January 7, 2015): 025901. http://dx.doi.org/10.1088/0957-0233/26/2/025901.

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30

Urban, Frank K. "Study of zinc thin films formed using large clusters in the ionized cluster beam deposition technique." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 11, no. 5 (September 1993): 1916. http://dx.doi.org/10.1116/1.586522.

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31

LIN, P. H., C. R. LIN, K. H. CHEN, and L. C. CHEN. "LOW TEMPERATURE GROWTH OF ALIGNED CARBON NANOTUBES IN LARGE AREA." International Journal of Modern Physics B 16, no. 06n07 (March 20, 2002): 853–59. http://dx.doi.org/10.1142/s0217979202010506.

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We have synthesized well-aligned, uniform carbon nanotubes (CNTs) in large area at low temperature of 500°C using microwave plasma- enhanced chemical vapor deposition on silicon and Corning glass 7059. This is a two-step process in that ion beam sputtering deposition was used to deposit iron catalyst thin films and followed by hydrogen plasma pretreatment to form nano-size Fe particles before the CNTs growth at the second step. The thickness of Fe catalyst thin film was found to be the most important factor in the low temperature CNTs growth process. Systematic control of the length, diameter, and alignment of the CNTs has been achieved by changing the deposition parameters such us microwave power, pressure, temperature and the thickness of Fe catalyst. High resolution SEM and TEM were used to characterize the morphology and structure of the nanotubes. Field emission measurement showed a low turn on field (6.2 V/m) and high emission current density (0.1 mA/cm2 at 9 V/m) for the films grown at low temperature of 500°C.
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32

Saleemi, Awais, Ali Abdullah, Muhammad Saeed, M. Anis-ur-Rehman, Ayyaz Mahmood, Karim Khan, Maryam Kiani, and Shern-long Lee. "Structural and Magnetoresistance Properties of Transfer-Free Amorphous Carbon Thin Films." Crystals 9, no. 3 (February 28, 2019): 124. http://dx.doi.org/10.3390/cryst9030124.

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The control of the morphologies and thus the optical, electrical, and magnetic effect of 2D thin films is a challenging task for the development of cost-efficient devices. In particular, the angular dependent magnetoresistance (MR) of surface thin films up to room temperature is an interesting phenomenon in materials science. Here, we report amorphous carbon thin films fabricated through chemical vapor deposition at a SiO2 substrate. Their structural and angular magnetoresistance properties were investigated by several analytical tools. Specifically, we used a physical property measurement system to estimate the magnitude of the angular MR of these as-prepared sample thin films from 2 K to 300 K. An angular MR magnitude of 1.6% for the undoped a-carbon thin films was found up to 300 K. Under the magnetic field of 7 T, these films possessed an angular MR of 15% at a low temperature of 2 K. A high disorder degree leads to a large magnitude of MR. The grain boundary scattering model was used to interpret the mechanism of this angular MR.
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33

Podlesny, Blazej, Bogumila Kumanek, Angana Borah, Ryohei Yamaguchi, Tomohiro Shiraki, Tsuyohiko Fujigaya, and Dawid Janas. "Thermoelectric Properties of Thin Films from Sorted Single-Walled Carbon Nanotubes." Materials 13, no. 17 (August 28, 2020): 3808. http://dx.doi.org/10.3390/ma13173808.

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Single-walled carbon nanotubes (SWCNTs) remain one of the most promising materials of our times. One of the goals is to implement semiconducting and metallic SWCNTs in photonics and microelectronics, respectively. In this work, we demonstrated how such materials could be obtained from the parent material by using the aqueous two-phase extraction method (ATPE) at a large scale. We also developed a dedicated process on how to harvest the SWCNTs from the polymer matrices used to form the biphasic system. The technique is beneficial as it isolates SWCNTs with high purity while simultaneously maintaining their surface intact. To validate the utility of the metallic and semiconducting SWCNTs obtained this way, we transformed them into thin free-standing films and characterized their thermoelectric properties.
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34

Lu, Chung Hsin, Jen Hsien Huang, Hsieh Hsin Chen, and Po Hsiung Huang. "Preparation and Characterization of Titania Thin Films." Key Engineering Materials 317-318 (August 2006): 569–72. http://dx.doi.org/10.4028/www.scientific.net/kem.317-318.569.

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TiO2 sol with steady suspension and high photocatalytic activity was prepared via a precipitation-peptization method. The XRD results indicate that the TiO2 sol exhibited an anatase structure. TiO2 films on woven fabrics (carbon, PET and Nylon), prepared via dip-coating with TiO2 sol, were characterized by XRD and SEM analysis. The dependence of the woven fabrics properties on the amount of TiO2 coated and photocatalytic activity were also studied. When the diameter of fibers is smalle, large quantity of TiO2 is coated on woven fabrics leading to an improvement in the photocatalytic activity. It is observed that the photocatalytic activity of TiO2 film coated on woven fabrics exceeds that of TiO2 film coated on common glass substrate with the same surface area.
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35

Dai, Xiao, Jiang Wu, Zhicheng Qian, Haiyan Wang, Jie Jian, Yingjie Cao, Mark H. Rummeli, Qinghua Yi, Huiyun Liu, and Guifu Zou. "Ultra-smooth glassy graphene thin films for flexible transparent circuits." Science Advances 2, no. 11 (November 2016): e1601574. http://dx.doi.org/10.1126/sciadv.1601574.

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Large-area graphene thin films are prized in flexible and transparent devices. We report on a type of glassy graphene that is in an intermediate state between glassy carbon and graphene and that has high crystallinity but curly lattice planes. A polymer-assisted approach is introduced to grow an ultra-smooth (roughness, <0.7 nm) glassy graphene thin film at the inch scale. Owing to the advantages inherited by the glassy graphene thin film from graphene and glassy carbon, the glassy graphene thin film exhibits conductivity, transparency, and flexibility comparable to those of graphene, as well as glassy carbon–like mechanical and chemical stability. Moreover, glassy graphene–based circuits are fabricated using a laser direct writing approach. The circuits are transferred to flexible substrates and are shown to perform reliably. The glassy graphene thin film should stimulate the application of flexible transparent conductive materials in integrated circuits.
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36

Kim, Seojin, You Young Byun, InYoung Lee, Woohyeon Cho, Gyungho Kim, Mario Culebras, Junho Jang, and Chungyeon Cho. "Organic Thermoelectric Nanocomposites Assembled via Spraying Layer-by-Layer Method." Nanomaterials 13, no. 5 (February 25, 2023): 866. http://dx.doi.org/10.3390/nano13050866.

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Thermoelectric (TE) materials have been considered as a promising energy harvesting technology for sustainably providing power to electronic devices. In particular, organic-based TE materials that consist of conducting polymers and carbon nanofillers make a large variety of applications. In this work, we develop organic TE nanocomposites via successive spraying of intrinsically conductive polymers such as polyaniline (PANi) and poly(3,4-ethylenedioxy- thiophene):poly(styrenesulfonate) (PEDOT:PSS) and carbon nanofillers, and single-walled carbon nanotubes (SWNT). It is found that the growth rate of the layer-by-layer (LbL) thin films, which comprise a PANi/SWNT-PEDOT:PSS repeating sequence, made by the spraying method is greater than that of the same ones assembled by traditional dip coating. The surface structure of multilayer thin films constructed by the spraying approach show excellent coverage of highly networked individual and bundled SWNT, which is similarly to what is observed when carbon nanotubes-based LbL assemblies are formed by classic dipping. The multilayer thin films via the spray-assisted LbL process exhibit significantly improved TE performances. A 20-bilayer PANi/SWNT-PEDOT:PSS thin film (~90 nm thick) yields an electrical conductivity of 14.3 S/cm and Seebeck coefficient of 76 μV/K. These two values translate to a power factor of 8.2 μW/m·K2, which is 9 times as large as the same films fabricated by a classic immersion process. We believe that this LbL spraying method will open up many opportunities in developing multifunctional thin films for large-scaled industrial use due to rapid processing and the ease with which it is applied.
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37

Pannu, Compesh, Udai B. Singh, Dinesh C. Agarwal, Saif A. Khan, Sunil Ojha, Ramesh Chandra, Hiro Amekura, Debdulal Kabiraj, and Devesh K. Avasthi. "A study on the consequence of swift heavy ion irradiation of Zn–silica nanocomposite thin films: electronic sputtering." Beilstein Journal of Nanotechnology 5 (October 1, 2014): 1691–98. http://dx.doi.org/10.3762/bjnano.5.179.

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Zn–silica nanocomposite thin films with varying Zn metal content, deposited by atom beam sputtering technique were subjected to 100 MeV Ag ion irradiation. Rutherford backscattering spectrometry reveals the loss of Zn with irradiation, which is observed to be greater from thin films with lower Zn content. The sputtered species collected on carbon-coated transmission electron microscopy (TEM) grids consist of Zn nanoparticles of sizes comparable to those present in the nanocomposite thin film. The process of size-dependent electronic sputtering of Zn is explained on the basis of an inelastic thermal spike model. The possibility of direct cluster emission is explained by pressure spike built inside the track, initiated by a temperature spike.
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38

Hernandez, Leonardo F., Roberto R. Lima, Edson Pecoraro, Esteban Rosim-Fachini, and Maria L. P. da Silva. "Tetraethylortossilicate Plasma Thin Film with Hydrophilic and Hydrophobic Characteristics: Use on Passive Mixers." Materials Science Forum 730-732 (November 2012): 245–50. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.245.

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This work aims to obtain plasma thin film composites with hydrophobic/hydrophilic alternated regions, which are useful for the production of miniaturized mixers. These regions were acquired by two different strategies: either the codeposition of TEOS and HFE plasma thin films or the exposition of TEOS plasma films to ultraviolet radiation (UVA and UVC). These films were characterized by several chemical and physical techniques. The refractive indexes vary from 1.4 to 1.7; infrared and photoelectron spectroscopy detect Si-O-Si and CHn species. Silicone-like structures with high or low number of amorphous carbon microparticles and with fluorinated organic clusters were produced. Cluster dimensions were in the 1-5 mm range and they are made of graphite or COF (carbon/oxygen/fluorine) compounds. Scanning electron and optical microscopy showed rough surfaces. Water contact angles were 90º; however, for TEOS films that value changed after 6 hr of UVC exposure. Moreover, after UV exposure, organic polar compounds could be adsorbed in those films and water was not. The passive mixer performance was simulated using the FemLab 3.2® program and was tested with 20 nm thick films on a silicon wafer, showing the capacity of these films to be used in such devices.
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39

Deyneka-Dupriez, N., U. Herr, H.-J. Fecht, A. Pfrang, Th Schimmel, B. Reznik, and D. Gerthsen. "Interfacial adhesion and friction of pyrolytic carbon thin films on silicon substrates." Journal of Materials Research 23, no. 10 (October 2008): 2749–56. http://dx.doi.org/10.1557/jmr.2008.0339.

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Frictional behavior and interfacial adhesion of differently textured pyrolytic carbon layers on Si substrate were investigated by indentation and scratch testing. A large amount of elastic recovery and a low coefficient of friction (μ = 0.05 to 0.09) were observed. Elastic/plastic and frictional behaviors of the coatings are strongly influenced by the microstructure of the pyrolytic carbon films, especially by the texture. The critical load at which the first abrupt increase in the normal displacement occurs was used to characterize interfacial adhesive strength. A pyrolytic carbon film deposited at higher residence time from a gas mixture containing 3% oxygen exhibited higher critical loads than film deposited at lower residence time without oxygen. The results can be understood if one assumes that the gas phase composition during deposition significantly influences the bonding strength at the interface. Failure mechanisms are discussed for both types of films.
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40

Gupta, S., B. R. Weiner, and G. Morell. "Role of sp2 C cluster size on the field emission properties of sulfur-incorporated nanocomposite carbon thin films." Applied Physics Letters 80, no. 8 (February 25, 2002): 1471–73. http://dx.doi.org/10.1063/1.1451985.

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41

Fukasawa, Naoki, Yuuto Takeuchi, Yuuki Shimura, Masahiro Matsubara, and Eiichi Kondoh. "20302 An approach to large area deposition of copper thin films using supercritical carbon dioxide." Proceedings of Conference of Kanto Branch 2010.16 (2010): 101–2. http://dx.doi.org/10.1299/jsmekanto.2010.16.101.

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42

Kim, Young-Kwan, and Dal-Hee Min. "Durable Large-Area Thin Films of Graphene/Carbon Nanotube Double Layers as a Transparent Electrode." Langmuir 25, no. 19 (October 6, 2009): 11302–6. http://dx.doi.org/10.1021/la9029744.

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43

Tani, Hiroshi, Renguo Lu, Shinji Koganezawa, and Norio Tagawa. "Evaluating the Elastic Moduli of Ultra-Thin Liquid Perfluoropolyether Lubricant Films on Diamond-Like Carbon Films Using Ar-Gas Cluster Ion Beams." Tribology Online 16, no. 4 (December 31, 2021): 309–16. http://dx.doi.org/10.2474/trol.16.309.

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44

Iwase, Akihiro, Yuichi Saitoh, Atsuya Chiba, Fuminobu Hori, and Norito Ishikawa. "Effects of Energetic Carbon-Cluster Ion Irradiation on Lattice Structures of EuBa2Cu3O7−x Oxide Superconductor." Quantum Beam Science 6, no. 2 (May 25, 2022): 21. http://dx.doi.org/10.3390/qubs6020021.

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C-axis-oriented EuBa2Cu3O7−x oxide films that were 100 nm thick were irradiated with 0.5 MeV C monoatomic ions, 2 MeV C4 cluster ions and 4 MeV C8 cluster ions at room temperature. Before and after the irradiation, X-ray diffraction (XRD) measurement was performed using Cu-Ka X-ray. The c-axis lattice constant increased almost linearly as a function of numbers of irradiating carbon ions, but it rarely depended on the cluster size. Cluster size effects were observed in the XRD peak intensity and the XRD peak width. With increasing the cluster size, the decrease in peak intensity becomes more remarkable and the peak width increases. The experimental result implies that the cluster ions with a larger size provide a more localized energy deposition in a sample, and cause larger and more inhomogeneous lattice disordering. As such, local and large lattice disordering acts as a pinning center for quantum vortex; energetic carbon-cluster ion irradiation will be effective for the increment in the critical current of EuBa2Cu3O7−x superconductors.
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45

Krakow, W., N. M. Rivera, R. A. Roy, and J. J. Cuomo. "High-resolution TEM of C60 thin films." Proceedings, annual meeting, Electron Microscopy Society of America 50, no. 1 (August 1992): 108–9. http://dx.doi.org/10.1017/s0424820100120941.

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The ability to fabricate buckminsterfullerenes, C60 molecules, in reasonably large quantities has made possible studies of the structural properties of this form of carbon when it is in a crystalline state. At room temperature, x-ray diffraction from three-dimensional bulk C60 crystals shows that the molecules are centered on sites of a face-centered-cubic Bravais lattice, A∘ = 14.2Å. Somewhat earlier in time, a study of C60/C70 bulk material using electron diffraction and high resolution electron microscopy has revealed a hexagonal phase. It is now believed that this phase is a simple cubic structure rather than a hexagonal structure. Since it is reasonable to expect that highly ordered C60 thin films will have superior properties to bulk material, several studies have been undertaken to understand the early stages of C60 thin film growth. Monolayer growth on GaAs has been studied by scanning tunneling microscopy., and on mica at room temperature using helium scattering. Along similar lines we have grown thin films of C60 molecules on mica and NaCl and characterized the crystallinity and local structural arrangements. Here we present some of our results of the electron microscope examination of these materials.
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46

Lipka, J. J., J. F. Hainfeld, and J. S. Wall. "Heavy Atom Cluster Labeling of Biological Specimens." Proceedings, annual meeting, Electron Microscopy Society of America 43 (August 1985): 718–19. http://dx.doi.org/10.1017/s042482010012028x.

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The Brookhaven STEM is capable of resolving single heavy atoms deposited on thin carbon films with a beam dose > 103 el Å-2 Single heavy atoms, therefore, are unsuitable as fiducial markers on unordered biological specimens because of the high beam dose required for direct visualization. Heavy metal-clusters or heavy metal-containing complexes have been resolved at much lower beam doses, as low as 30 el Å-2, and therefore may be useful as directly visible labels.The polyamine undecagold (11-Au) cluster ion, [(p-H2NCH2C6H4)3P]7 Au113+, has been used to covalently label the carbohydrate sites of the glycoprotein complex of human haptoglobin hemoglobin (Hp˙Hb) by a route which should be general for any glycoprotein with oxidizable carbohydrate residues. Proteins with reactive lysine residues have been covalently 11-Au labeled by the reactions noted in Scheme 1.
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47

Clemens, Bruce M., and Robert Sinclair. "Metastable Phase Formation in Thin Films and Multilayers." MRS Bulletin 15, no. 2 (February 1990): 19–28. http://dx.doi.org/10.1557/s0883769400060425.

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It is well known that thin-film technology relies increasingly on multilayered structures. As dimensions become smaller, the interfacial or contact region assumes a larger and often dominant role in the performance or properties. Many examples come readily to mind. In magnetic hard disks, the active cobaltalloy layer, itself only about 50 nm thick, is grown either on a crystalline chromium thin film or directly onto amorphous nickel-phosphorous, and capped with a protective carbon or chromium-carbon coating (see Figure 1). The recording head “flies” at 90 mph and about 0.1 ü above this combination, which is expected to be mechanically durable and magnetically reliable for thousands of recordings. Atomic-scale multilayers are being investigated to provide the ability to “tune” the magnetic properties of the active recording layer or head materials. Exchange coupled magneto-optical media consisting of a few tens of angstroms of cobalt or nickel layers on amorphous TbFeCo alloys are showing promise for improving magneto-optical coupling while maintaining perpendicular anisotropy. In microelectronic circuits, aluminum or silicide contacts to silicon are essential to any device, and multilevel integration involving a series of metal, alloy, silicon (amorphous, poly- or monocrystalline) and dielectric layers (some of which might be 1-10 nm thick) are increasingly required to achieve large-scale integration. Metal-metalloid (e.g., MoSi, W-C) multilayers are used for x-ray optical elements. Artificially produced metallic superlattices and multilayers are being used to probe the fundamental magnetic, electronic, mechanical, and structural properties of metal-metal interfaces.
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48

Chowdhury, A. K. M. S., D. C. Cameron, M. S. J. Hashmi та J. M. Gregg. "Evidence for continuous areas of crystalline β–C3N4 in sputter-deposited thin films". Journal of Materials Research 14, № 6 (червень 1999): 2359–63. http://dx.doi.org/10.1557/jmr.1999.0314.

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Carbon nitride films have been deposited using Penning-type opposed target dc reactive sputtering. These films show large (>10 μm2) continuous areas of nanocrystalline material in an amorphous matrix. Electron diffraction shows the nanocrystalline areas to have crystallography consistent with the β–C3N4 phase. Film chemistry analysis using Rutherford backscattering and Raman spectroscopy indicates that only carbon, nitrogen, and trace levels of hydrogen are present. Given this film chemistry and the fit of diffraction data to that predicted for the β–C3N4 structure, it seems likely that the sputtering parameters used have, indeed, produced continuous regions of the elusive β–C3N4 phase.
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49

AREKAT, SAFWAN R. "UV–VISIBLE, FTIR AND RAMAN SPECTRA FROM LARGE BAND-GAP HYDROFLUORINATED AMORPHOUS SILICON–CARBON THIN FILMS." International Journal of Nanoscience 09, no. 06 (December 2010): 605–8. http://dx.doi.org/10.1142/s0219581x10007344.

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Hydrofluorinated amorphous silicon–carbon alloy films (a-Si,C:H,F) were grown by a CVD glow-discharge method. The samples were prepared from SiH4 , H2 and CF4 source gas mixtures. The structural and bonding characterstics of the materials were studied using FTIR and Raman spectroscopy. In addition to hydrogen passivation, the inclusion of fluorine in the films is found to further suppress undesirable disorder states. The optical band gap E opt of the materials was determined from the Tauc relation for the optical absorption spectra. They were found to increase from about 2 eV to 3.5 eV with increasing carbon content in the samples.
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50

Nakajima,, Katsunori, Ken-ichi Onisawa, Ken-ichi Chahara, Tetsuroh Minemura, Mitsuhiro Kamei, and Eiji Setoyama. "Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550×650mm) substrates." Vacuum 51, no. 4 (December 1998): 761–64. http://dx.doi.org/10.1016/s0042-207x(98)00286-3.

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