Статті в журналах з теми "Large Carbon Cluster Thin Films"
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Shinde, Deodatta, Stefan Fritze, Mattias Thuvander, Paulius Malinovskis, Lars Riekehr, Ulf Jansson, and Krystyna Stiller. "Elemental Distribution in CrNbTaTiW-C High Entropy Alloy Thin Films." Microscopy and Microanalysis 25, no. 2 (February 4, 2019): 489–500. http://dx.doi.org/10.1017/s1431927618016264.
Повний текст джерелаBabonneau, D., A. Naudon, D. Thiaudière, and S. Lequien. "Morphological characterization of ion-sputtered C–Ag, C/C–Ag and Ag/C films by GISAXS." Journal of Applied Crystallography 32, no. 2 (April 1, 1999): 226–33. http://dx.doi.org/10.1107/s0021889898011996.
Повний текст джерелаWatanabe, Yoshihisa, Yoshikazu Nakamura, Shigekazu Hirayama, and Yoshimasa Yamaguchi. "Thermally stimulated exoelectron emission from hydrogenated amorphous carbon films." Journal of Materials Research 7, no. 7 (July 1992): 1805–8. http://dx.doi.org/10.1557/jmr.1992.1805.
Повний текст джерелаAlekseeva, Olga, Artem Mikhalev, Elena Lutikova, Vladimir Porembsky, Mikhail Presnyakov, Vladimir Fateev, Boris Shapir, and Sergey Grigoriev. "Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering." Catalysts 8, no. 12 (December 18, 2018): 665. http://dx.doi.org/10.3390/catal8120665.
Повний текст джерелаFonseca, Alexandre F., Tao Liang, Difan Zhang, Kamal Choudhary, Simon R. Phillpot, and Susan B. Sinnott. "Titanium-Carbide Formation at Defective Curved Graphene-Titanium Interfaces." MRS Advances 3, no. 8-9 (2018): 457–62. http://dx.doi.org/10.1557/adv.2018.115.
Повний текст джерелаMilani, P., M. Ferretti, P. Piseri, C. E. Bottani, A. Ferrari, A. Li Bassi, G. Guizzetti, and M. Patrini. "Synthesis and characterization of cluster-assembled carbon thin films." Journal of Applied Physics 82, no. 11 (December 1997): 5793–98. http://dx.doi.org/10.1063/1.366446.
Повний текст джерелаBuzio, R., E. Gnecco, C. Boragno, U. Valbusa, P. Piseri, E. Barborini, and P. Milani. "Self-affine properties of cluster-assembled carbon thin films." Surface Science 444, no. 1-3 (January 2000): L1—L6. http://dx.doi.org/10.1016/s0039-6028(99)01066-3.
Повний текст джерелаFerrari, A. C., B. S. Satyanarayana, J. Robertson, W. I. Milne, E. Barborini, P. Piseri, and P. Milani. "Electron field emission from cluster-assembled carbon thin films." Europhysics Letters (EPL) 46, no. 2 (April 15, 1999): 245–50. http://dx.doi.org/10.1209/epl/i1999-00251-7.
Повний текст джерелаMÉLINON, P., V. PAILLARD, V. DUPUIS, J. P. PEREZ, J. TUAILLON, A. PEREZ, B. BARBARA, L. THOMAS, and M. BOUDEULLE. "CORRELATION BETWEEN FREE-CLUSTER PROPERTIES AND THIN FILMS ELABORATED BY LOW-ENERGY CLUSTER-BEAM DEPOSITION." Surface Review and Letters 03, no. 01 (February 1996): 1007–11. http://dx.doi.org/10.1142/s0218625x96001807.
Повний текст джерелаPiseri, P., E. Barborini, M. Marino, P. Milani, C. Lenardi, L. Zoppi, and L. Colombo. "Hydrogen Uptake in Cluster-Assembled Carbon Thin Films: Experiment and Computer Simulation." Journal of Physical Chemistry B 108, no. 17 (April 2004): 5157–60. http://dx.doi.org/10.1021/jp037146f.
Повний текст джерелаNamba, Yoshikatsu, Jin Wei, Toshio Mohri, and E. A. Heidarpour. "Large grain size thin films of carbon with diamond structure." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7, no. 1 (January 1989): 36–39. http://dx.doi.org/10.1116/1.575764.
Повний текст джерелаCreasy, William R., and J. T. Brenna. "Formation of high mass carbon cluster ions from laser ablation of polymers and thin carbon films." Journal of Chemical Physics 92, no. 4 (February 15, 1990): 2269–79. http://dx.doi.org/10.1063/1.458019.
Повний текст джерелаKHAN, R. U. A., and S. R. P. SILVA. "ELECTRONIC CONDUCTION IN ION IMPLANATED AMORPHOUS CARBON THIN FILMS." International Journal of Modern Physics B 14, no. 02n03 (January 30, 2000): 195–205. http://dx.doi.org/10.1142/s0217979200000194.
Повний текст джерелаLevenson, L. L., M. Stan, and K. B. Bhasin. "Properties of large area ErBa2Cu3O7−x thin films deposited by ionized cluster beams." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9, no. 3 (May 1991): 405–8. http://dx.doi.org/10.1116/1.577422.
Повний текст джерелаMuller, David A. "Electron-diffraction studies of amorphous carbon thin films." Proceedings, annual meeting, Electron Microscopy Society of America 51 (August 1, 1993): 1100–1101. http://dx.doi.org/10.1017/s0424820100151337.
Повний текст джерелаAwang, Rozidawati, Nurul Izzati Azman, and Noorain Purhanudin. "Influence of Deposition Time on Bonding and Morphology of Amorphous Carbon Nitride Thin Films." Materials Science Forum 846 (March 2016): 657–62. http://dx.doi.org/10.4028/www.scientific.net/msf.846.657.
Повний текст джерелаBettini, Luca Giacomo, Flavio Della Foglia, Paolo Milani, and Paolo Piseri. "Nanostructured carbon substrate improves the photoelectrochemical water splitting activity of cluster-assembled TiO2 thin films." International Journal of Hydrogen Energy 40, no. 18 (May 2015): 6013–20. http://dx.doi.org/10.1016/j.ijhydene.2015.03.071.
Повний текст джерелаCarroll, D. L., M. Wagner, M. Rühle, and D. A. Bonnell. "The Thermal Stability of Thin Copper Films Deposited on TiO2(110) Studied by Scanning Tunneling Microscopy." Journal of Materials Research 12, no. 4 (April 1997): 975–83. http://dx.doi.org/10.1557/jmr.1997.0138.
Повний текст джерелаWei, B., and K. Komvopoulos. "Friction and Wear Micromechanisms of Amorphous Carbon Thin Films." Journal of Tribology 119, no. 4 (October 1, 1997): 823–29. http://dx.doi.org/10.1115/1.2833892.
Повний текст джерелаKim, Young, Nina Baule, Maheshwar Shrestha, Bocong Zheng, Thomas Schuelke, and Qi Hua Fan. "Single-beam plasma source deposition of carbon thin films." Review of Scientific Instruments 93, no. 11 (November 1, 2022): 113908. http://dx.doi.org/10.1063/5.0102605.
Повний текст джерелаKim, Woo Jin, Taekoo Oh, Jeongkeun Song, Eun Kyo Ko, Yangyang Li, Junsik Mun, Bongju Kim, et al. "Strain engineering of the magnetic multipole moments and anomalous Hall effect in pyrochlore iridate thin films." Science Advances 6, no. 29 (July 2020): eabb1539. http://dx.doi.org/10.1126/sciadv.abb1539.
Повний текст джерелаD'Urso, Luisa, A. Alessandro Scalisi, Corinna Altamore, and Giuseppe Compagnini. "Formation, evolution, and degradation of nanostructured covalent thin films deposited by low-energy cluster beam deposition." Journal of Materials Research 21, no. 7 (July 1, 2006): 1638–44. http://dx.doi.org/10.1557/jmr.2006.0216.
Повний текст джерелаHernandez, Leonardo F., Roberto R. Lima, Edson Pecoraro, Esteban Rosim-Fachini, and Maria L. P. da Silva. "Composite Thin Film Obtained Using Tetraethoxysilane and Aimed at VOCs Detection." Materials Science Forum 730-732 (November 2012): 185–90. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.185.
Повний текст джерелаJEONG, SEUNG YOL, BHARVIN PAREKH, VARUN GUPTA, GIOVANNI FANCHINI, and MANISH CHHOWALLA. "ROOM TEMPERATURE DEPOSITION OF SINGLE-WALLED CARBON NANOTUBE THIN FILMS." Nano 05, no. 05 (October 2010): 319–24. http://dx.doi.org/10.1142/s1793292010002220.
Повний текст джерелаGao, Hongjun, Geoffrey S. Canright, Shijin Pang, Ilya M. Sandler, Zengquan Xue, and Zhenyu Zhang. "Unique Dendritic Patterns in Organic Thin Films." Fractals 06, no. 04 (December 1998): 337–50. http://dx.doi.org/10.1142/s0218348x98000390.
Повний текст джерелаBorghi, Francesca, Matteo Milani, Luca Giacomo Bettini, Alessandro Podestà, and Paolo Milani. "Quantitative characterization of the interfacial morphology and bulk porosity of nanoporous cluster-assembled carbon thin films." Applied Surface Science 479 (June 2019): 395–402. http://dx.doi.org/10.1016/j.apsusc.2019.02.066.
Повний текст джерелаBalázsi, Katalin, Marta Vandrovcová, Lucie Bačáková, Csaba Balázsi, Imre Bertóti, François Davin, and György Z. Radnóczi. "Mechanical Behavior of Bioactive TiC Nanocomposite Thin Films." Materials Science Forum 729 (November 2012): 296–301. http://dx.doi.org/10.4028/www.scientific.net/msf.729.296.
Повний текст джерелаLi, Huaping. "Electronically Pure Single Chirality Semiconducting Single-Walled Carbon Nanotube for Large Scale Electronic Devices." MRS Advances 2, no. 02 (2017): 83–88. http://dx.doi.org/10.1557/adv.2017.15.
Повний текст джерелаSrinath, S., and K. P. J. Reddy. "Large carbon cluster thin film gauges for measuring aerodynamic heat transfer rates in hypersonic shock tunnels." Measurement Science and Technology 26, no. 2 (January 7, 2015): 025901. http://dx.doi.org/10.1088/0957-0233/26/2/025901.
Повний текст джерелаUrban, Frank K. "Study of zinc thin films formed using large clusters in the ionized cluster beam deposition technique." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 11, no. 5 (September 1993): 1916. http://dx.doi.org/10.1116/1.586522.
Повний текст джерелаLIN, P. H., C. R. LIN, K. H. CHEN, and L. C. CHEN. "LOW TEMPERATURE GROWTH OF ALIGNED CARBON NANOTUBES IN LARGE AREA." International Journal of Modern Physics B 16, no. 06n07 (March 20, 2002): 853–59. http://dx.doi.org/10.1142/s0217979202010506.
Повний текст джерелаSaleemi, Awais, Ali Abdullah, Muhammad Saeed, M. Anis-ur-Rehman, Ayyaz Mahmood, Karim Khan, Maryam Kiani, and Shern-long Lee. "Structural and Magnetoresistance Properties of Transfer-Free Amorphous Carbon Thin Films." Crystals 9, no. 3 (February 28, 2019): 124. http://dx.doi.org/10.3390/cryst9030124.
Повний текст джерелаPodlesny, Blazej, Bogumila Kumanek, Angana Borah, Ryohei Yamaguchi, Tomohiro Shiraki, Tsuyohiko Fujigaya, and Dawid Janas. "Thermoelectric Properties of Thin Films from Sorted Single-Walled Carbon Nanotubes." Materials 13, no. 17 (August 28, 2020): 3808. http://dx.doi.org/10.3390/ma13173808.
Повний текст джерелаLu, Chung Hsin, Jen Hsien Huang, Hsieh Hsin Chen, and Po Hsiung Huang. "Preparation and Characterization of Titania Thin Films." Key Engineering Materials 317-318 (August 2006): 569–72. http://dx.doi.org/10.4028/www.scientific.net/kem.317-318.569.
Повний текст джерелаDai, Xiao, Jiang Wu, Zhicheng Qian, Haiyan Wang, Jie Jian, Yingjie Cao, Mark H. Rummeli, Qinghua Yi, Huiyun Liu, and Guifu Zou. "Ultra-smooth glassy graphene thin films for flexible transparent circuits." Science Advances 2, no. 11 (November 2016): e1601574. http://dx.doi.org/10.1126/sciadv.1601574.
Повний текст джерелаKim, Seojin, You Young Byun, InYoung Lee, Woohyeon Cho, Gyungho Kim, Mario Culebras, Junho Jang, and Chungyeon Cho. "Organic Thermoelectric Nanocomposites Assembled via Spraying Layer-by-Layer Method." Nanomaterials 13, no. 5 (February 25, 2023): 866. http://dx.doi.org/10.3390/nano13050866.
Повний текст джерелаPannu, Compesh, Udai B. Singh, Dinesh C. Agarwal, Saif A. Khan, Sunil Ojha, Ramesh Chandra, Hiro Amekura, Debdulal Kabiraj, and Devesh K. Avasthi. "A study on the consequence of swift heavy ion irradiation of Zn–silica nanocomposite thin films: electronic sputtering." Beilstein Journal of Nanotechnology 5 (October 1, 2014): 1691–98. http://dx.doi.org/10.3762/bjnano.5.179.
Повний текст джерелаHernandez, Leonardo F., Roberto R. Lima, Edson Pecoraro, Esteban Rosim-Fachini, and Maria L. P. da Silva. "Tetraethylortossilicate Plasma Thin Film with Hydrophilic and Hydrophobic Characteristics: Use on Passive Mixers." Materials Science Forum 730-732 (November 2012): 245–50. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.245.
Повний текст джерелаDeyneka-Dupriez, N., U. Herr, H.-J. Fecht, A. Pfrang, Th Schimmel, B. Reznik, and D. Gerthsen. "Interfacial adhesion and friction of pyrolytic carbon thin films on silicon substrates." Journal of Materials Research 23, no. 10 (October 2008): 2749–56. http://dx.doi.org/10.1557/jmr.2008.0339.
Повний текст джерелаGupta, S., B. R. Weiner, and G. Morell. "Role of sp2 C cluster size on the field emission properties of sulfur-incorporated nanocomposite carbon thin films." Applied Physics Letters 80, no. 8 (February 25, 2002): 1471–73. http://dx.doi.org/10.1063/1.1451985.
Повний текст джерелаFukasawa, Naoki, Yuuto Takeuchi, Yuuki Shimura, Masahiro Matsubara, and Eiichi Kondoh. "20302 An approach to large area deposition of copper thin films using supercritical carbon dioxide." Proceedings of Conference of Kanto Branch 2010.16 (2010): 101–2. http://dx.doi.org/10.1299/jsmekanto.2010.16.101.
Повний текст джерелаKim, Young-Kwan, and Dal-Hee Min. "Durable Large-Area Thin Films of Graphene/Carbon Nanotube Double Layers as a Transparent Electrode." Langmuir 25, no. 19 (October 6, 2009): 11302–6. http://dx.doi.org/10.1021/la9029744.
Повний текст джерелаTani, Hiroshi, Renguo Lu, Shinji Koganezawa, and Norio Tagawa. "Evaluating the Elastic Moduli of Ultra-Thin Liquid Perfluoropolyether Lubricant Films on Diamond-Like Carbon Films Using Ar-Gas Cluster Ion Beams." Tribology Online 16, no. 4 (December 31, 2021): 309–16. http://dx.doi.org/10.2474/trol.16.309.
Повний текст джерелаIwase, Akihiro, Yuichi Saitoh, Atsuya Chiba, Fuminobu Hori, and Norito Ishikawa. "Effects of Energetic Carbon-Cluster Ion Irradiation on Lattice Structures of EuBa2Cu3O7−x Oxide Superconductor." Quantum Beam Science 6, no. 2 (May 25, 2022): 21. http://dx.doi.org/10.3390/qubs6020021.
Повний текст джерелаKrakow, W., N. M. Rivera, R. A. Roy, and J. J. Cuomo. "High-resolution TEM of C60 thin films." Proceedings, annual meeting, Electron Microscopy Society of America 50, no. 1 (August 1992): 108–9. http://dx.doi.org/10.1017/s0424820100120941.
Повний текст джерелаLipka, J. J., J. F. Hainfeld, and J. S. Wall. "Heavy Atom Cluster Labeling of Biological Specimens." Proceedings, annual meeting, Electron Microscopy Society of America 43 (August 1985): 718–19. http://dx.doi.org/10.1017/s042482010012028x.
Повний текст джерелаClemens, Bruce M., and Robert Sinclair. "Metastable Phase Formation in Thin Films and Multilayers." MRS Bulletin 15, no. 2 (February 1990): 19–28. http://dx.doi.org/10.1557/s0883769400060425.
Повний текст джерелаChowdhury, A. K. M. S., D. C. Cameron, M. S. J. Hashmi та J. M. Gregg. "Evidence for continuous areas of crystalline β–C3N4 in sputter-deposited thin films". Journal of Materials Research 14, № 6 (червень 1999): 2359–63. http://dx.doi.org/10.1557/jmr.1999.0314.
Повний текст джерелаAREKAT, SAFWAN R. "UV–VISIBLE, FTIR AND RAMAN SPECTRA FROM LARGE BAND-GAP HYDROFLUORINATED AMORPHOUS SILICON–CARBON THIN FILMS." International Journal of Nanoscience 09, no. 06 (December 2010): 605–8. http://dx.doi.org/10.1142/s0219581x10007344.
Повний текст джерелаNakajima,, Katsunori, Ken-ichi Onisawa, Ken-ichi Chahara, Tetsuroh Minemura, Mitsuhiro Kamei, and Eiji Setoyama. "Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550×650mm) substrates." Vacuum 51, no. 4 (December 1998): 761–64. http://dx.doi.org/10.1016/s0042-207x(98)00286-3.
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