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Статті в журналах з теми "Inductive plasma"

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Автор: Grafiati

Опубліковано: 17 вересня 2022

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1

Keller, John H. "Inductive plasmas for plasma processing." Plasma Sources Science and Technology 5, no. 2 (May 1, 1996): 166–72. http://dx.doi.org/10.1088/0963-0252/5/2/008.

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2

Vinogradov, Georgy K., and Shimao Yoneyama. "Balanced Inductive Plasma Sources." Japanese Journal of Applied Physics 35, Part 2, No. 9A (September 1, 1996): L1130—L1133. http://dx.doi.org/10.1143/jjap.35.l1130.

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3

Isupov, M. V. "Distributed ferromagnetic enhanced inductive plasma source for plasma processing." Journal of Physics: Conference Series 2119, no. 1 (December 1, 2021): 012115. http://dx.doi.org/10.1088/1742-6596/2119/1/012115.

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Анотація:

Abstract New experimental data on the plasma density profiles have been obtained for a low-frequency (100 kHz) distributed ferromagnetic enhanced inductive plasma source at different locations of inductive discharges. An ability to control the plasma density profiles in a large gas discharge chamber in order to achieve a uniform treatment of a substrate is demonstrated. The differences between the obtained results and literature data for a distributed ferromagnetic enhanced inductive plasma source combined with a radio-frequency inductive discharge are discussed.

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4

BURM, K. T. A. L. "The electronic identity of inductive and capacitive plasmas." Journal of Plasma Physics 74, no. 2 (April 2008): 155–61. http://dx.doi.org/10.1017/s0022377807006654.

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AbstractAn electronic identity relation, relating capacitively coupled plasma sources to corresponding inductively coupled plasma sources, has been derived, starting from the Maxwell relations for matter and the characteristics of a capacitor and of an inductor. Furthermore, the breakdown conditions for both capacitively coupled plasmas and for inductively coupled plasmas as well as their optimal operation frequency ranges are discussed.

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5

Godyak, Valery. "Plasma phenomena in inductive discharges." Plasma Physics and Controlled Fusion 45, no. 12A (November 17, 2003): A399—A424. http://dx.doi.org/10.1088/0741-3335/45/12a/026.

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6

Godyak, Valery. "Ferromagnetic enhanced inductive plasma sources." Journal of Physics D: Applied Physics 46, no. 28 (June 25, 2013): 283001. http://dx.doi.org/10.1088/0022-3727/46/28/283001.

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7

Tuszewski, M., I. Henins, M. Nastasi, W. K. Scarborough, K. C. Walter, and D. H. Lee. "Inductive plasma sources for plasma implantation and deposition." IEEE Transactions on Plasma Science 26, no. 6 (1998): 1653–60. http://dx.doi.org/10.1109/27.747883.

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8

Gudmundsson, J. T., and M. A. Lieberman. "Magnetic induction and plasma impedance in a cylindrical inductive discharge." Plasma Sources Science and Technology 6, no. 4 (November 1, 1997): 540–50. http://dx.doi.org/10.1088/0963-0252/6/4/012.

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9

Gudmundsson, J. T., and M. A. Lieberman. "Magnetic induction and plasma impedance in a planar inductive discharge." Plasma Sources Science and Technology 7, no. 2 (May 1, 1998): 83–95. http://dx.doi.org/10.1088/0963-0252/7/2/002.

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10

Lho, T., N. Hershkowitz, G. H. Kim, W. Steer, and J. Miller. "Asymmetric plasma potential fluctuation in an inductive plasma source." Plasma Sources Science and Technology 9, no. 1 (January 7, 2000): 5–11. http://dx.doi.org/10.1088/0963-0252/9/1/302.

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11

Bournonville, B., and E. Meillot. "CHLOROFORM DESTRUCTION BY INDUCTIVE PLASMA PROCESS." High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) 11, no. 2 (2007): 245–56. http://dx.doi.org/10.1615/hightempmatproc.v11.i2.80.

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12

Vinogradov, G. K. "Transmission line balanced inductive plasma sources." Plasma Sources Science and Technology 9, no. 3 (July 19, 2000): 400–412. http://dx.doi.org/10.1088/0963-0252/9/3/318.

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13

BURM, K. T. A. L. "Examination of aluminium and zinc plasmas from an inductive furnace by spectroscopy." Journal of Plasma Physics 79, no. 1 (July 17, 2012): 25–31. http://dx.doi.org/10.1017/s0022377812000645.

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Анотація:

AbstractThe production of aluminium and zinc plasmas for the deposition of coatings upon steel strip is monitored by optical emission spectroscopy measurements. The plasma is created from an inductive source. The atom and the ion densities as well as the electron temperature are obtained such that the plasma can be characterized. It will be shown that the obtained plasmas are typically highly ionized and deviate from thermal equilibrium.

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14

Abeele, David Vanden, and Gerard Degrez. "Efficient Computational Model for Inductive Plasma Flows." AIAA Journal 38, no. 2 (February 2000): 234–42. http://dx.doi.org/10.2514/2.977.

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15

Turner, Matthew W., Clark W. Hawk, and Ron J. Litchford. "Inductive Measurement of Plasma Jet Electrical Conductivity." Journal of Propulsion and Power 21, no. 5 (September 2005): 900–907. http://dx.doi.org/10.2514/1.12077.

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16

Tuszewski, M., and R. R. White. "Instabilities of Ar/SF6 inductive plasma discharges." Journal of Applied Physics 94, no. 5 (September 2003): 2858–63. http://dx.doi.org/10.1063/1.1600830.

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17

Martin, Adam, and Richard Eskridge. "Electrical coupling efficiency of inductive plasma accelerators." Journal of Physics D: Applied Physics 38, no. 23 (November 17, 2005): 4168–79. http://dx.doi.org/10.1088/0022-3727/38/23/005.

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18

Croccolo, F., R. Barni, S. Zanini, A. Palvarini, and C. Riccardi. "Material surface modifications with an inductive plasma." Journal of Physics: Conference Series 100, no. 6 (March 1, 2008): 062023. http://dx.doi.org/10.1088/1742-6596/100/6/062023.

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19

Scholze, F., M. Tartz, and H. Neumann. "Inductive coupled radio frequency plasma bridge neutralizer." Review of Scientific Instruments 79, no. 2 (2008): 02B724. http://dx.doi.org/10.1063/1.2802587.

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20

Vanden Abeele, David, and Gerard Degrez. "Efficient computational model for inductive plasma flows." AIAA Journal 38 (January 2000): 234–42. http://dx.doi.org/10.2514/3.14402.

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21

Vieira, Robson, Sergey Balashov, and Stanislav Moshkalev. "Modeling of the Inductive Coupled Plasma Discharges." ECS Transactions 31, no. 1 (December 17, 2019): 409–15. http://dx.doi.org/10.1149/1.3474186.

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22

Teske, C., J. Jacoby, W. Schweizer, and J. Wiechula. "Thyristor stack for pulsed inductive plasma generation." Review of Scientific Instruments 80, no. 3 (March 2009): 034702. http://dx.doi.org/10.1063/1.3095686.

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23

Kral'kina, E. A. "Low-pressure radio-frequency inductive discharge and possibilities of optimizing inductive plasma sources." Physics-Uspekhi 51, no. 5 (May 31, 2008): 493–512. http://dx.doi.org/10.1070/pu2008v051n05abeh006422.

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24

KAWATA, Hiroaki, Hidetomo IYANAGA, Takashi MATSUNAGA, Masaaki YASUDA, and Kenji MURATA. "Relations between Antenna Coil Current and Plasma Parameters for Inductive Coupled Plasmas." SHINKU 44, no. 3 (2001): 260–63. http://dx.doi.org/10.3131/jvsj.44.260.

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25

Bottin, Benoit, David Vanden Abeele, Mario Carbonaro, Gerard Degrez, and Gabbita S. R. Sarma. "Thermodynamic and Transport Properties for Inductive Plasma Modeling." Journal of Thermophysics and Heat Transfer 13, no. 3 (July 1999): 343–50. http://dx.doi.org/10.2514/2.6444.

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26

Alemany, C., C. Trassy, B. Pateyron, K. I. Li, and Y. Delannoy. "Refining of metallurgical-grade silicon by inductive plasma." Solar Energy Materials and Solar Cells 72, no. 1-4 (April 2002): 41–48. http://dx.doi.org/10.1016/s0927-0248(01)00148-9.

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27

Folio, F. "Centrifugal dispersion of metallic barstock in inductive plasma." Metal Powder Report 51, no. 1 (January 1997): 38. http://dx.doi.org/10.1016/s0026-0657(97)80130-0.

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28

Kontogeorgos, A. A., D. P. Korfiatis, K. A. Th Thoma, and J. C. Vardaxoglou. "Plasma generation in silicon-based inductive grid arrays." Optics and Lasers in Engineering 47, no. 11 (November 2009): 1195–98. http://dx.doi.org/10.1016/j.optlaseng.2009.06.006.

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29

Guittienne, Ph, S. Lecoultre, P. Fayet, J. Larrieu, A. A. Howling, and Ch Hollenstein. "Resonant planar antenna as an inductive plasma source." Journal of Applied Physics 111, no. 8 (April 15, 2012): 083305. http://dx.doi.org/10.1063/1.4705978.

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30

Tuszewski, M., and R. R. White. "Equilibrium properties of Ar/SF6 inductive plasma discharges." Plasma Sources Science and Technology 11, no. 3 (August 1, 2002): 338–50. http://dx.doi.org/10.1088/0963-0252/11/3/317.

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31

Bandari, Anashe. "Plasma simulations reveal important parameters affecting inductive discharges." Scilight 2020, no. 36 (September 4, 2020): 361106. http://dx.doi.org/10.1063/10.0001957.

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32

Polzin, K. A., and E. Y. Choueiri. "Performance optimization criteria for pulsed inductive plasma acceleration." IEEE Transactions on Plasma Science 34, no. 3 (June 2006): 945–53. http://dx.doi.org/10.1109/tps.2006.875732.

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33

Godyak, V. A., R. B. Piejak, B. M. Alexandrovich, and V. I. Kolobov. "Hot plasma and nonlinear effects in inductive discharges." Physics of Plasmas 6, no. 5 (May 1999): 1804–12. http://dx.doi.org/10.1063/1.873438.

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34

Godyak, V., B. Alexandrovich, R. Piejak, and A. Smolyakov. "Nonlinear radio-frequency potential in an inductive plasma." Plasma Sources Science and Technology 9, no. 4 (October 31, 2000): 541–44. http://dx.doi.org/10.1088/0963-0252/9/4/309.

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35

Cheng Yu-Guo and Xia Guang-Qing. "Numerical investigation on the plasma acceleration of the inductive pulsed plasma thruster." Acta Physica Sinica 66, no. 7 (2017): 075204. http://dx.doi.org/10.7498/aps.66.075204.

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36

Cheng, Yuguo, and Guangqing Xia. "Numerical investigation of flow properties of the pulsed inductive thruster considering plasma electrical characteristics." Proceedings of the Institution of Mechanical Engineers, Part G: Journal of Aerospace Engineering 233, no. 11 (November 26, 2018): 4106–14. http://dx.doi.org/10.1177/0954410018813439.

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Анотація:

The pulsed inductive thruster accelerates the propellant by the repulsion between inductive coil and current sheet. To accurately investigate the acceleration characteristics in the first half period of pulsed inductive discharge and the energy needed to generate effective impulse, an unsteady magnetohydrodynamics model is developed, in which the coil-plasma boundary condition is improved by plasma electrical model, and the electrical conductivity is calculated using gas kinetic method. The analysis of plasma electrical characteristics shows confining of particles in the beginning and acceleration of the current sheet after ionization process is completed, leaving behind the low-density residual plasma, with negligible contribution to the total impulse. The impulse at high voltage decreases monotonically after peak value is reached, showing effective impulse generation in the first half period, especially before the decoupling distance is reached.

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37

Serbin, Sergey, and Аnna Mostipanenko. "INFLUENCE OF MODE AND GEOMETRIC CHRATERISTICS ON HIGHT-FREQUENCY INDUCTIVE PLASMA TORCH WITH REVERSE VORTEX FLOW." Science Journal Innovation Technologies Transfer, no. 2019-1 (February 2, 2019): 77–82. http://dx.doi.org/10.36381/iamsti.1.2019.77-82.

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Анотація:

The analysis of aerodynamic and heat structure of flow in high-frequency inductive plasma torch has been carried out. The range of plasma torch power is measured in dozens of kilowatts. The numerical simulation methods of the turbulent flow in the plasma torch affected by high frequency electromagnetic field without considering the chemical kinetics are used during the research. The data of temperature field and induced current density in the plasma torch depending on current amperage and frequency are obtained. Also, these data are obtained depending on the flow scheme in the operated on argon and air plasma torches. The inductive plasma torches can be applied to solve a wide range of tasks such as activation of coal-dust mixture with its further gasification, coating process for the stabilization of combustion processes as well as for the recycling processes at the mobile seaport recycling complexes. The calculations demonstrated convincingly the advantage of the operation of plasma torches with reverse vortex flow over plasma torches with “direct” vortex flow. Moreover the obtained data allow executing the assessment of thermal efficiency of inductive plasma jet and obtaining its optimal operational modes.

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38

Volynets, V. N., Wontaek Park, Yu N. Tolmachev, V. G. Pashkovsky, and Jinwoo Yoo. "Spatial variation of plasma parameters and ion acceleration in an inductive plasma system." Journal of Applied Physics 99, no. 4 (February 15, 2006): 043302. http://dx.doi.org/10.1063/1.2170419.

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39

Gehring, Tim, Qihao Jin, Fabian Denk, Santiago Eizaguirre, David Karcher, and Rainer Kling. "Reducing the Transition Hysteresis of Inductive Plasmas by a Microwave Ignition Aid." Plasma 2, no. 3 (August 16, 2019): 341–47. http://dx.doi.org/10.3390/plasma2030026.

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Анотація:

Inductive plasma discharge has been a part of continuous investigations since it was discovered. Especially the E- to H-mode transition and the hysteresis behavior have been topics of research in the last few decades. In this paper, we demonstrate a way to reduce the hysteresis behavior by the usage of a microwave ignition system. With this system, a significant decrease of the needed coil current for the ignition of the inductive driven plasma is realized. For the microwave generation, a magnetron as in a conventional microwave oven is used, which offers a relatively inexpensive way for microwave ignition aid. At the measured pressure of 7.5 Pa, it was possible to reduce the needed coil current for the inductive mode transition by a factor of 3.75 compared to the mode transition current without the ignition aid. This was achieved by initiating the transition by a few seconds of microwave coupling. The performed simulations suggested that the factor can be further increased at higher pressures. That is especially interesting for plasmas that are hard to ignite or for RF-sources that cannot deliver high enough currents or frequencies for the ignition.

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40

Lim, Jong Hyeuk, Kyong Nam Kim, and Geun Young Yeom. "Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing." Solid State Phenomena 124-126 (June 2007): 271–74. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.271.

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An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.

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41

Anderson, M., V. Bystritskii, and J. K. Walters. "Double and multi-pulsed operations of inductive plasma sources." Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 545, no. 3 (June 2005): 578–92. http://dx.doi.org/10.1016/j.nima.2005.02.030.

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42

Jian, Zhe (Ashley), Yuichi Oshima, Shawn Wright, Kevin Owen та Elaheh Ahmadi. "Chlorine-based inductive coupled plasma etching of α-Ga2O3". Semiconductor Science and Technology 34, № 3 (31 січня 2019): 035006. http://dx.doi.org/10.1088/1361-6641/aafeb2.

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43

Godyak, V., R. Piejak, B. Alexandrovich, and A. Smolyakov. "Observation of the ponderomotive effect in an inductive plasma." Plasma Sources Science and Technology 10, no. 3 (July 18, 2001): 459–62. http://dx.doi.org/10.1088/0963-0252/10/3/310.

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44

Polzin, K. A. "Scaling and Systems Considerations in Pulsed Inductive Plasma Thrusters." IEEE Transactions on Plasma Science 36, no. 5 (October 2008): 2189–98. http://dx.doi.org/10.1109/tps.2008.2003537.

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45

Henry, D., J. M. Francou, and A. Inard. "Resonant inductive plasma etching evaluation of an industrial prototype." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10, no. 6 (November 1992): 3426–29. http://dx.doi.org/10.1116/1.577796.

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46

Mouzouris, Y., and J. E. Scharer. "Modeling of profile effects for inductive helicon plasma sources." IEEE Transactions on Plasma Science 24, no. 1 (1996): 152–60. http://dx.doi.org/10.1109/27.491753.

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47

Vinogradov, G. K., V. M. Menagarishvili, and S. Yoneyama. "Characterization of a novel lambda balanced inductive plasma source." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 6 (November 1998): 3164–69. http://dx.doi.org/10.1116/1.581515.

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48

Tuszewski, M. "Ion and gas temperatures of 0.46MHz inductive plasma discharges." Journal of Applied Physics 100, no. 5 (September 2006): 053301. http://dx.doi.org/10.1063/1.2337167.

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49

Zobnin, A. V., A. D. Usachev, O. F. Petrov, and V. E. Fortov. "Dust-acoustic instability in an inductive gas-discharge plasma." Journal of Experimental and Theoretical Physics 95, no. 3 (September 2002): 429–39. http://dx.doi.org/10.1134/1.1513815.

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50

Kang, Hyun-Ju, Yu-Sin Kim, and Chin-Wook Chung. "Relatively high plasma density in low pressure inductive discharges." Physics of Plasmas 22, no. 9 (September 2015): 093517. http://dx.doi.org/10.1063/1.4931470.

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