Добірка наукової літератури з теми "Hot-Carrier Degradation (HCD)"
Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями
Ознайомтеся зі списками актуальних статей, книг, дисертацій, тез та інших наукових джерел на тему "Hot-Carrier Degradation (HCD)".
Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.
Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.
Статті в журналах з теми "Hot-Carrier Degradation (HCD)":
Макаров, А. А., С. Э. Тягинов, B. Kaczer, M. Jech, A. Chasin, A. Grill, G. Hellings, М. И. Векслер, D. Linten та T. Grasser. "Анализ особенностей деградации, вызываемой горячими носителями, в транзисторах с каналом в форме плавника". Физика и техника полупроводников 52, № 10 (2018): 1177. http://dx.doi.org/10.21883/ftp.2018.10.46457.8820.
Yu, Zhuoqing, Zhe Zhang, Zixuan Sun, Runsheng Wang, and Ru Huang. "On the Trap Locations in Bulk FinFETs After Hot Carrier Degradation (HCD)." IEEE Transactions on Electron Devices 67, no. 7 (July 2020): 3005–9. http://dx.doi.org/10.1109/ted.2020.2994171.
Tyaginov, Stanislav, Erik Bury, Alexander Grill, Zhuoqing Yu, Alexander Makarov, An De Keersgieter, Mikhail Vexler, et al. "Compact Physics Hot-Carrier Degradation Model Valid over a Wide Bias Range." Micromachines 14, no. 11 (October 30, 2023): 2018. http://dx.doi.org/10.3390/mi14112018.
Kim, Jongsu, Kyushik Hong, Hyewon Shim, HwaSung Rhee, and Hyungcheol Shin. "Comparative Analysis of Hot Carrier Degradation (HCD) in 10-nm Node nMOS/pMOS FinFET Devices." IEEE Transactions on Electron Devices 67, no. 12 (December 2020): 5396–402. http://dx.doi.org/10.1109/ted.2020.3031246.
Makarov, Alexander, Philippe Roussel, Erik Bury, Michiel Vandemaele, Alessio Spessot, Dimitri Linten, Ben Kaczer, and Stanislav Tyaginov. "Correlated Time-0 and Hot-Carrier Stress Induced FinFET Parameter Variabilities: Modeling Approach." Micromachines 11, no. 7 (June 30, 2020): 657. http://dx.doi.org/10.3390/mi11070657.
Liu, Minghao, Zixuan Sun, Haoran Lu, Cong Shen, Lining Zhang, Runsheng Wang, and Ru Huang. "A Coupling Mechanism between Flicker Noise and Hot Carrier Degradations in FinFETs." Nanomaterials 13, no. 9 (April 28, 2023): 1507. http://dx.doi.org/10.3390/nano13091507.
Kuo, Ting-Tzu, Ying-Chung Chen, Ting-Chang Chang, Kai-Chun Chang, Chien-Hung Yeh, Fong-Min Ciou, Yu-Shan Lin, et al. "Abnormal trend in hot carrier degradation with fin profile in short channel FinFET devices at 14 nm node." Semiconductor Science and Technology 37, no. 4 (February 25, 2022): 045010. http://dx.doi.org/10.1088/1361-6641/ac557f.
Sun, Zixuan, Sihao Chen, Lining Zhang, Ru Huang, and Runsheng Wang. "The Understanding and Compact Modeling of Reliability in Modern Metal–Oxide–Semiconductor Field-Effect Transistors: From Single-Mode to Mixed-Mode Mechanisms." Micromachines 15, no. 1 (January 12, 2024): 127. http://dx.doi.org/10.3390/mi15010127.
Chang, Hao, Guilei Wang, Hong Yang, Qianqian Liu, Longda Zhou, Zhigang Ji, Ruixi Yu, et al. "Insight into over Repair of Hot Carrier Degradation by GIDL Current in Si p-FinFETs Using Ultra-Fast Measurement Technique." Nanomaterials 13, no. 7 (April 3, 2023): 1259. http://dx.doi.org/10.3390/nano13071259.
Diaz-Fortuny, Javier, Pablo Saraza-Canflanca, Erik Bury, Robin Degraeve, and Ben Kaczer. "An In-Depth Study of Ring Oscillator Reliability under Accelerated Degradation and Annealing to Unveil Integrated Circuit Usage." Micromachines 15, no. 6 (June 8, 2024): 769. http://dx.doi.org/10.3390/mi15060769.
Дисертації з теми "Hot-Carrier Degradation (HCD)":
Mazzoli, Andrea. "TCAD analysis of hot-carrier-stress degradation in p-channel LDMOS power devices." Master's thesis, Alma Mater Studiorum - Università di Bologna, 2021.
Sicre, Mathieu. "Study of the noise aging mechanisms in single-photon avalanche photodiode for time-of-flight imaging." Electronic Thesis or Diss., Lyon, INSA, 2023. http://www.theses.fr/2023ISAL0104.
Single-Photon Avalanche Diode (SPAD) are used for Time-of-Flight (ToF) sensors to determine distance from a target by measuring the travel time of an emitted pulsed signal. These photodetectors work by triggering an avalanche of charge carriers upon photon absorption, resulting in a substantial amplification which can be detected. However, they are subject to spurious triggering by parasitic generated charge carriers, quantified as Dark Count Rate (DCR), which can compromise the accuracy of the measured distance. Therefore, it is crucial to identify and eliminate the potential source of DCR. To tackle this issue, a simulation methodology has been implemented to assess the DCR. This is achieved by simulating the avalanche breakdown probability, integrated with the carrier generation rate from defects. The breakdown probability can be simulated either in a deterministically, based on electric-field streamlines, or stochastically, by means of drift-diffusion simulation of the random carrier path. This methodology allows for the identification of the potential sources of pre-stress DCR by comparing simulation results to experimental data over a wide range of voltage and temperature. To ensure the accuracy of distance range measurements over time, it is necessary to predict the DCR level under various operating conditions. The aforementioned simulation methodology is used to identify the potential sources of post-stress DCR by comparing simulation results to stress experiments that evaluate the principal stress factors, namely temperature, voltage and irradiance. Furthermore, a Monte-Carlo study has been conducted to examine the device-to-device variation along stress duration. For an accurate Hot-Carrier Degradation (HCD) kinetics model, it is essential to consider not only the carrier energy distribution function but also the distribution of Si−H bond dissociation energy distribution at the Si/SiO2 interface. The number of available hot carriers is estimated from the carrier current density according to the carrier energy distribution simulated by means of a full-band Monte-Carlo method. The impact-ionization dissociation probability is employed to model the defect creation process, which exhibits sub-linear time dependence due to the gradual exhaustion of defect precursors. Accurate distance ranging requires distinguishing the signal from ambient noise and the DCR floor, and ensuring the target’s accumulated photon signal dominates over other random noise sources. An analytical formula allows to estimate the maximum distance ranging using the maximum signal strength, ambient noise level, and confidence levels. The impact of DCR can be estimated by considering the target’s reflectance and the ambient light conditions. In a nutshell, this work makes use of a in-depth characterization and simulation methodology to predict DCR in SPAD devices along stress duration, thereby allowing the assessment of its impact on distance range measurements
Arfaoui, Wafa. "Fiabilité Porteurs Chauds (HCI) des transistors FDSOI 28nm High-K grille métal." Thesis, Aix-Marseille, 2015. http://www.theses.fr/2015AIXM4335.
As the race towards miniaturization drives the industrial requirements to more performances on less area, MOSFETs reliability has become an increasingly complex topic. To maintain a continuous miniaturization pace, conventional transistors on bulk technologies were replaced by new MOS architectures allowing a better electrostatic integrity such as the FDSOI technology with high-K dielectrics and metal gate. Despite all the architecture innovations, degradation mechanisms remains increasingly pronounced with technological developments. One of the most critical issues of advanced technologies is the hot carrier degradation mechanism (HCI) and Bias Temperature Instability (BTI) effects. To ensure a good performance reliability trade off, it is necessary to characterize and model the different failure mechanisms at device level and the interaction with Bias Temperature Instability (BTI) that represents a strong limitation of scaled CMOS nodes. This work concern hot carrier degradation mechanisms on 28nm transistors of the FDSOI technology. Based on carrier’s energy, the energy driven model proposed in this manuscript can predict HC degradation taking account of substrate bias dependence (VB) including the channel length effects (L), gate oxide thickness (TOX) , back oxide BOX (TBox) and silicon film thickness (TSI ). This thesis opens up new perspectives of the model Integration into a circuit simulator, to anticipate the reliability of future technology nodes and check out circuit before moving on to feature design steps
Ndiaye, Cheikh. "Etude de la fiabilité de type negative bias temperature instability (NBTI) et par porteurs chauds (HC) dans les filières CMOS 28nm et 14nm FDSOI." Thesis, Aix-Marseille, 2017. http://www.theses.fr/2017AIXM0182/document.
The subject of this thesis developed on four chapters, aims the development of advanced CMOS technology nodes fabricated by STMicroelectronics in terms of speed performance and reliability. The main reliability issues as Bias Temperature Instability (BTI) and Hot-Carriers (HC) degradation mechanisms have been studied in the most recent 28nm and 14nm FDSOI technologies nodes. In the first chapter, we presents the evolution of transistor architecture from the low-power 130-40nm CMOS nodes on silicon substrate to the recent FDSOI technology for 28nm and 14nm CMOS nodes. The second chapter presents the specificity of BTI and HCI degradation mechanisms involved in 28nm and 14nm FDSOI technology nodes. In the third chapter, we have studied the impact of layout effects on device performance and reliability comparing symmetrical and asymmetrical geometries. Finally the trade-off between performance and reliability is studied in the fourth chapter using elementary circuits. The benefit of using double gate configuration with the use of back bias VB in FDSOI devices to digital cells, allows to compensate partially or totally the aging in ring oscillators (ROs) observed by the frequency reduction. This new compensation technique allows to extend device and circuit lifetime offering a new way to guaranty high frequency performance and long-term reliability
Ndiaye, Cheikh. "Etude de la fiabilité de type negative bias temperature instability (NBTI) et par porteurs chauds (HC) dans les filières CMOS 28nm et 14nm FDSOI." Electronic Thesis or Diss., Aix-Marseille, 2017. http://www.theses.fr/2017AIXM0182.
The subject of this thesis developed on four chapters, aims the development of advanced CMOS technology nodes fabricated by STMicroelectronics in terms of speed performance and reliability. The main reliability issues as Bias Temperature Instability (BTI) and Hot-Carriers (HC) degradation mechanisms have been studied in the most recent 28nm and 14nm FDSOI technologies nodes. In the first chapter, we presents the evolution of transistor architecture from the low-power 130-40nm CMOS nodes on silicon substrate to the recent FDSOI technology for 28nm and 14nm CMOS nodes. The second chapter presents the specificity of BTI and HCI degradation mechanisms involved in 28nm and 14nm FDSOI technology nodes. In the third chapter, we have studied the impact of layout effects on device performance and reliability comparing symmetrical and asymmetrical geometries. Finally the trade-off between performance and reliability is studied in the fourth chapter using elementary circuits. The benefit of using double gate configuration with the use of back bias VB in FDSOI devices to digital cells, allows to compensate partially or totally the aging in ring oscillators (ROs) observed by the frequency reduction. This new compensation technique allows to extend device and circuit lifetime offering a new way to guaranty high frequency performance and long-term reliability
Тези доповідей конференцій з теми "Hot-Carrier Degradation (HCD)":
Zhang, Jiayang, Zixuan Sun, Runsheng Wang, Zhuoqing Yu, Pengpeng Ren, and Ru Huang. "Body Bias Dependence of Hot Carrier Degradation (HCD) in Advanced FinFET Technology." In 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM). IEEE, 2018. http://dx.doi.org/10.1109/edtm.2018.8421470.
Sun, Zixuan, Yongkang Xue, Haoran Lu, Pengpeng Ren, Zirui Wang, Zhigang Ji, Runsheng Wang, and Ru Huang. "Investigation of Interplays between Body Biasing and Hot Carrier Degradation (HCD) in Advanced NMOS FinFETs." In 2024 IEEE International Reliability Physics Symposium (IRPS). IEEE, 2024. http://dx.doi.org/10.1109/irps48228.2024.10529482.
Yu, Zhuoqing, Runsheng Wang, Peng Hao, Shaofeng Guo, Pengpeng Ren, and Ru Huang. "Non-Universal Temperature Dependence of Hot Carrier Degradation (HCD) in FinFET: New Observations and Physical Understandings." In 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM). IEEE, 2018. http://dx.doi.org/10.1109/edtm.2018.8421469.
Yu, Zhuoqing, Jiayang Zhang, Runsheng Wang, Shaofeng Guo, Changze Liu, and Ru Huang. "New insights into the hot carrier degradation (HCD) in FinFET: New observations, unified compact model, and impacts on circuit reliability." In 2017 IEEE International Electron Devices Meeting (IEDM). IEEE, 2017. http://dx.doi.org/10.1109/iedm.2017.8268344.
Varghese, Dhanoop, Muhammad Ashraful Alam, and Bonnie Weir. "A generalized, IB-independent, physical HCI lifetime projection methodology based on universality of hot-carrier degradation." In 2010 IEEE International Reliability Physics Symposium. IEEE, 2010. http://dx.doi.org/10.1109/irps.2010.5488666.
Changze Liu, Kyong Taek Lee, Sangwoo Pae, and Jongwoo Park. "New observations on hot carrier induced dynamic variation in nano-scaled SiON/poly, HK/MG and FinFET devices based on on-the-fly HCI technique: The role of single trap induced degradation." In 2014 IEEE International Electron Devices Meeting (IEDM). IEEE, 2014. http://dx.doi.org/10.1109/iedm.2014.7047170.