Готові списки джерел за темами / High-throughput nanolithography

Добірка наукової літератури з теми "High-throughput nanolithography"

Автор: Grafiati
Опубліковано: 10 грудня 2022
Оновлено: 29 січня 2023

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Статті в журналах з теми "High-throughput nanolithography"

1

Neumann, Hendrikje R., and Christine Selhuber-Unkel. "High-throughput micro-nanostructuring by microdroplet inkjet printing." Beilstein Journal of Nanotechnology 9 (September 4, 2018): 2372–80. http://dx.doi.org/10.3762/bjnano.9.222.

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Анотація:
The production of micrometer-sized structures comprised of nanoparticles in defined patterns and densities is highly important in many fields, ranging from nano-optics to biosensor technologies and biomaterials. A well-established method to fabricate quasi-hexagonal patterns of metal nanoparticles is block copolymer micelle nanolithography, which relies on the self-assembly of metal-loaded micelles on surfaces by a dip-coating or spin-coating process. Using this method, the spacing of the nanoparticles is controlled by the size of the micelles and by the coating conditions. Whereas block copolymer micelle nanolithography is a high-throughput method for generating well-ordered nanoparticle patterns at the nanoscale, so far it has been inefficient in generating a hierarchical overlay structure at the micrometer scale. Here, we show that by combining block copolymer micelle nanolithography with inkjet printing, hierarchical patterns of gold nanoparticles in the form of microstructures can be achieved in a high-throughput process. Inkjet printing was used to generate droplets of the micelle solution on surfaces, resulting in printed circles that contain patterns of gold nanoparticles with an interparticle spacing between 25 and 42 nm. We tested this method on different silicon and nickel–titanium surfaces and the generated patterns were found to depend on the material type and surface topography. Based on the presented strategy, we were able to achieve patterning times of a few seconds and produce quasi-hexagonal micro-nanopatterns of gold nanoparticles on smooth surfaces. Hence, this method is a high-throughput method that can be used to coat surfaces with nanoparticles in a user-defined pattern at the micrometer scale. As the nanoparticles provide a chemical contrast on the surface, they can be further functionalized and are therefore highly relevant for biological applications.
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2

Berry, I. L. "Programmable aperture plate for maskless high-throughput nanolithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 15, no. 6 (November 1997): 2382. http://dx.doi.org/10.1116/1.589652.

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3

Hakala, Tommi K., Veikko Linko, Antti-Pekka Eskelinen, J. Jussi Toppari, Anton Kuzyk, and Päivi Törmä. "Field-Induced Nanolithography for High-Throughput Pattern Transfer." Small 5, no. 23 (December 4, 2009): 2683–86. http://dx.doi.org/10.1002/smll.200901326.

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4

Schaper, Charles D. "Molecular transfer lithography for pseudomaskless, high-throughput, aligned nanolithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21, no. 6 (2003): 2961. http://dx.doi.org/10.1116/1.1621660.

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5

Zhang, Hua, Nabil A Amro, Sandeep Disawal, Robert Elghanian, Roger Shile, and Joseph Fragala. "High-Throughput Dip-Pen-Nanolithography-Based Fabrication of Si Nanostructures." Small 3, no. 1 (January 2, 2007): 81–85. http://dx.doi.org/10.1002/smll.200600393.

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6

WEI, J., and C. K. WONG. "PHYSICAL AND CHEMICAL NANOLITHOGRAPHY TECHNIQUES: CHALLENGES AND PROSPECTS." International Journal of Nanoscience 04, no. 04 (August 2005): 575–85. http://dx.doi.org/10.1142/s0219581x05003644.

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Анотація:
The fabrication of nanodevices and nanosystems having dimensions smaller than 100 nm requires the ability to produce, control, manipulate, and modify structures at the nanometer scale. Physical and chemical nanolithography techniques have been demonstrated to be promising because of the low cost and high throughput. Although the physical and chemical nanolithography techniques can pattern small features on single chips or across an entire wafer, there are considerable challenges when dealing with complex nanostructures, alignment and multilevel stacks. In this paper, the problems are reviewed and potential solutions suggested.
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7

LI, HAI, XIAO-DONG ZHANG, YI ZHANG, ZHEN-QIAN OUYANG, and JUN HU. "FABRICATION OF TRUE-COLOR MICROPATTERNS BY 2D STEPWISE CONTRACTION AND ADSORPTION NANOLITHOGRAPHY (SCAN)." Surface Review and Letters 14, no. 01 (February 2007): 129–34. http://dx.doi.org/10.1142/s0218625x07009141.

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Fabrication of structures on the micro- and nanometer scales is of great importance for both fundamental research and potential applications. While microlithography methods are relatively established, the production of multi-component micro- and nanostructures with high density still presents difficulties. In this paper, a novel strategy termed as two-dimensional (2D) stepwise contraction and adsorption nanolithography (SCAN) is used to fabricate true-color micropatterns through a series of size-reduction process based on the physical elasticity of elastomer. Faithful multicolor patterns with feature size about 30 times smaller than the initial ones can be fabricated by employing the 2D SCAN. The simplicity and high throughput capability of SCAN make it a competitive alternative to other micro- and nanolithography techniques.
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8

Lin, P. S. D. "High-throughput nanolithography using an oxygen-plasma resistant two-layer resist system." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 6, no. 6 (November 1988): 2290. http://dx.doi.org/10.1116/1.584072.

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9

Jones, Alexandra G., Claudio Balocco, Rosemary King, and Aimin M. Song. "Highly tunable, high-throughput nanolithography based on strained regioregular conducting polymer films." Applied Physics Letters 89, no. 1 (July 3, 2006): 013119. http://dx.doi.org/10.1063/1.2219094.

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10

Haaheim, Jason, and Omkar A. Nafday. "Dip Pen Nanolithography: A Desktop Nanofabrication Approach Using High-Throughput Flexible Nanopatterning." Microscopy Today 17, no. 2 (March 2009): 30–33. http://dx.doi.org/10.1017/s1551929500054468.

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Анотація:
Dip Pen Nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope tip is used to transfer molecules to a surface via a solvent meniscus. This technique allows surface patterning on scales of under 100 nanometres. DPN is the nanotechnology analog of the dip pen (also called the quill pen), where the tip of an atomic force microscope cantilever acts as a “pen,” which is coated with a chemical compound or mixture acting as an “ink,” and put in contact with a substrate, the “paper.”DPN enables direct deposition of nanoscale materials onto a substrate in a flexible manner. The vehicle for deposition can include pyramidal scanning probe microscope tips, hollow tips, and even tips on thermally actuated cantilevers. Recent advances have demonstrated massively parallel patterning using two-dimensional arrays of 55,000 tips, depicted below. Applications of this technology currently range through chemistry, materials science, and the life sciences, and include such work as ultra high density biological nanoarrays, additive photomask repair, and brand protection for pharmaceuticals.
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Більше джерел

Частини книг з теми "High-throughput nanolithography"

1

Pan, Liang. "Plasmonic Lenses for High-Throughput Nanolithography." In Plasmonics and Super-Resolution Imaging, 333–59. Taylor & Francis Group, 6000 Broken Sound Parkway NW, Suite 300, Boca Raton, FL 33487-2742: CRC Press, 2017. http://dx.doi.org/10.4324/9781315206530-11.

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2

Pan, Liang. "Plasmonic Lenses for High-Throughput Nanolithography." In Plasmonics and Super-Resolution Imaging, 333–59. Jenny Stanford Publishing, 2017. http://dx.doi.org/10.1201/9781315206530-10.

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Тези доповідей конференцій з теми "High-throughput nanolithography"

1

Schaper, Charles D. "MxL: pseudo-maskless high-throughput nanolithography." In Microlithography 2003, edited by Roxann L. Engelstad. SPIE, 2003. http://dx.doi.org/10.1117/12.484420.

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2

Haaheim, J. R., E. R. Tevaarwerk, J. Fragala, and R. Shile. "Commercially available high-throughput Dip Pen Nanolithography." In SPIE Defense and Security Symposium, edited by Thomas George and Zhongyang Cheng. SPIE, 2008. http://dx.doi.org/10.1117/12.777219.

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3

Haaheim, J. R., E. R. Tevaarwerk, J. Fragala, and R. Shile. "Dip Pen Nanolithography: a maturing technology for high-throughput flexible nanopatterning." In Defense and Security Symposium, edited by Thomas George and Zhongyang Cheng. SPIE, 2007. http://dx.doi.org/10.1117/12.719707.

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4

Hwang, Hyunwoo, Won-Sup Lee, No-Cheol Park, Hyunseok Yang, Young-Pil Park, and Kyoung-Su Park. "Enhanced Air-Gap Control for High-Speed Plasmonic Lithography Using Solid Immersion Lens With Sharp-Ridge Nanoaperture." In ASME 2011 International Mechanical Engineering Congress and Exposition. ASMEDC, 2011. http://dx.doi.org/10.1115/imece2011-63336.

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Анотація:
Recently, plasmonic nanolithography is studied by many researchers (1, 2 and 3). This presented a low-cost and high-throughput approach to maskless nanolithography technique that uses a metallic sharp-ridge nanoaperture with a high strong nanometer-sized optical spot induced by surface plasmon resonance. However, these nanometer-scale spots generated by metallic nanoapertures are formed in only the near-field region, which makes it very difficult to pattern above the photoresist surface at high-speeds.
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5

Li, Y. F., Y. Tomizawa, A. Koga, M. Sugiyama, and H. Fujita. "Multiple antiwear probes for stable and high throughput scanning probe microscope nanolithography." In 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII). IEEE, 2013. http://dx.doi.org/10.1109/transducers.2013.6627189.

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6

Wang, Yuan, Mohamed E. Saad, Kang Ni, Yen Chi Chang, Cheng-Wei Chen, Chen Chen, Liang Pan, et al. "Scalable Plasmonic Nanolithography: Prototype System Design and Construction." In ASME 2016 11th International Manufacturing Science and Engineering Conference. American Society of Mechanical Engineers, 2016. http://dx.doi.org/10.1115/msec2016-8671.

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Анотація:
Maskless nanolithography is an agile and cost effective approach if their throughputs can be scaled for mass production purposes. Using plasmonic nanolithography (PNL) approach, direct pattern writing was successfully demonstrated with around 20 nm half-pitch at high speed. Here, we report our recent efforts of implementing a high-throughput PNL prototype system with unique metrology and control features, which are designed to use an array of plasmonic lenses to pattern sub-100 nm features on a rotating substrate. Taking the advantage of air bearing surface techniques, the system can expose the wafer pixel by pixel with a speed of ∼10 m/s, much faster than any conventional scanning based lithography system. It is a low-cost, high-throughput maskless approach for the next generation lithography and also for the emerging nanotechnology applications, such as nanoscale metrology and imaging.
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7

Haaheim, J. R., O. A. Nafday, T. Levesque, J. Fragala, and R. Shile. "MEMS-enabled Dip Pen Nanolithography for directed nanoscale deposition and high-throughput nanofabrication." In SPIE MOEMS-MEMS: Micro- and Nanofabrication, edited by Wanjun Wang. SPIE, 2009. http://dx.doi.org/10.1117/12.817396.

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8

Wang, Zhihua, and Qingze Zou. "Iterative-Control-Based High-Speed Direct Mask Fabrication via Ultrasonic-Vibration-Assisted Mechanical Plowing." In ASME 2013 Dynamic Systems and Control Conference. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/dscc2013-3945.

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Анотація:
Mechanical indentation and plowing is one of the most widely used methods in probe-based nanolithography. Compared to other probe-based nanolithography techniques such as the Dip-pen and the milliped, mechanical plowing is not restrictive to conductive materials and/or soft materials. However, like other probe-based nanolithgraphy techniques, the low-throughput has hindered the implementation of this technique in practices. The fabrication throughput, although can be increased via parallel-probe, is ultimately limited by the tracking precision of the probe relative to the sample during the plowing process. In this paper, a new iterative learning control technique is proposed and utilized to account for the adverse effects encountered in high-speed, large-range mechanical plowing nanolithography, including the hysteresis, the vibrational dynamics, and the cross-axis dynamics-coupling effects. Moreover, vertical (normal) ultrasonic vibration of the cantilever is introduced during the fabrication process to improve the fabrication quality. This approach is implemented to directly fabricate patterns on a mask with a tungsten layer deposited on a silicon dioxide substrate. The experimental results demonstrated that a relatively large-size pattern of four grooves (20 μm in length) can be fabricated at a high-speed of ∼5 mm/sec, with the line width and line depth at ∼95 nm and 2 nm, respectively. A fine pattern of the word ‘NANO’ is also achieved at the speed of ∼5 mm/sec. Such a high-speed direct lithography of mask with nanoscale line width and depth points the use of mechanical-plowing technique in strategic-important applications such as mask lithography for semiconductor industry.
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9

Bonakdar, Alireza, Sung Jun Jang, and Hooman Mohseni. "Tilted exposure microsphere nanolithography for high-throughput and mask-less fabrication of plasmonic molecules." In SPIE NanoScience + Engineering, edited by Eva M. Campo, Elizabeth A. Dobisz, and Louay A. Eldada. SPIE, 2013. http://dx.doi.org/10.1117/12.2025099.

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10

Du, Zhidong, Chen Chen, and Liang Pan. "Plasmonic Nanofocusing in Deep and Extreme Sub-Wavelength Scale for Scalable Nanolithography." In ASME 2017 12th International Manufacturing Science and Engineering Conference collocated with the JSME/ASME 2017 6th International Conference on Materials and Processing. American Society of Mechanical Engineers, 2017. http://dx.doi.org/10.1115/msec2017-2680.

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Анотація:
Maskless nanolithography is an agile and cost effective approach if their throughputs can be scaled for mass production purposes. Using plasmonic nanolithography approach, direct pattern writing was successfully demonstrated with 22 nm half-pitch at high speed. Plasmonic nanolithography uses an array of plasmonic lenses to directly pattern features on a rotating substrate. Taking the advantage of air bearing surface techniques, the system can expose the wafer pixel by pixel with a speed of ∼10 m/s, much faster than any conventional scanning based lithography system. It is a low-cost, high-throughput maskless approach for the next generation lithography and also for the emerging nanotechnology applications, such as nanoscale metrology and imaging. A critical part of the PNL is to use plasmonic lens to deliver highly concentrated optical power at nanoscale. We have demonstrated such nanoscale process and achieved 22 nm resolution. Here, we report our recent efforts of designing new plasmonic nanofocusing structures that is capable of achieving optical confinement below 20 nm which can potentially support direct patterning at sub-10nm resolution.
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