Статті в журналах з теми "He thin film"
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Cieslikowski, D., P. Leiderer, and A. J. Dahm. "Mobility oscillations of electrons on thin He films." Canadian Journal of Physics 65, no. 11 (November 1, 1987): 1525–31. http://dx.doi.org/10.1139/p87-243.
Повний текст джерелаMILLER, M. D., and E. KROTSCHECK. "THEORY OF THIRD SOUND AND STABILITY OF THIN 3He–4He SUPERFLUID FILMS." International Journal of Modern Physics B 21, no. 13n14 (May 30, 2007): 2091–102. http://dx.doi.org/10.1142/s021797920704349x.
Повний текст джерелаKROTSCHECK, E., and M. D. MILLER. "GENERIC ELECTRON MOBILITY IN SURFACE STATES ON HELIUM FILMS." International Journal of Modern Physics B 21, no. 13n14 (May 30, 2007): 2103–14. http://dx.doi.org/10.1142/s0217979207043506.
Повний текст джерелаStanford, Michael G., Joo Hyon Noh, Kyle Mahady, Anton V. Ievlev, Peter Maksymovych, Olga S. Ovchinnikova, and Philip D. Rack. "Room-Temperature Activation of InGaZnO Thin-Film Transistors via He+ Irradiation." ACS Applied Materials & Interfaces 9, no. 40 (September 28, 2017): 35125–32. http://dx.doi.org/10.1021/acsami.7b10449.
Повний текст джерелаKurokawa, Mao, Takao Shimizu, Mutsuo Uehara, Atsuo Katagiri, Kensuke Akiyama, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, and Hiroshi Funakubo. "Control ofp- andn-type Conduction in Thermoelectric Non-doped Mg2Si Thin Films Prepared by Sputtering Method." MRS Advances 3, no. 24 (2018): 1355–59. http://dx.doi.org/10.1557/adv.2018.150.
Повний текст джерелаUEMURA, Y. J. "WHAT CAN WE LEARN FROM COMPARISON BETWEEN CUPRATES AND HE FILMS?: PHASE SEPARATION AND FLUCTUATING SUPERFLUIDITY." International Journal of Modern Physics B 14, no. 29n31 (December 20, 2000): 3703–10. http://dx.doi.org/10.1142/s0217979200004258.
Повний текст джерелаMiyaguchi, Kazuya, Shin Kajita, Hirohiko Tanaka, and Noriyasu Ohno. "Fabrication of nanostructured Ti thin film with Ti deposition in He plasmas." Japanese Journal of Applied Physics 60, no. 3 (February 19, 2021): 038004. http://dx.doi.org/10.35848/1347-4065/abe3a5.
Повний текст джерелаEl Hog, Sahbi, and H. T. Diep. "Tricriticality of the Blume–Emery–Griffiths model in thin films of stacked triangular lattices." Modern Physics Letters B 30, no. 07 (March 20, 2016): 1650071. http://dx.doi.org/10.1142/s0217984916500718.
Повний текст джерелаLee, Baek-Ju, Yoo-Seong Kim, Dong-Won Seo, and Jae-Wook Choi. "The Effect of Deposition Temperature of TiN Thin Film Deposition Using Thermal Atomic Layer Deposition." Coatings 13, no. 1 (January 5, 2023): 104. http://dx.doi.org/10.3390/coatings13010104.
Повний текст джерелаXiang, Xuepeng, Jingjing Rao, Zuyun He, Mengzhen Zhou, Qicheng Huang, Yuan Gao, Zhen Fan, Xinwei Wang, and Yan Chen. "Tailoring resistive switching in epitaxial SrCoO2.5 films by irradiation induced uniaxial strain." Journal of Applied Physics 132, no. 3 (July 21, 2022): 035304. http://dx.doi.org/10.1063/5.0099200.
Повний текст джерелаChiriaev, Serguei, Luciana Tavares, Vadzim Adashkevich, Arkadiusz J. Goszczak, and Horst-Günter Rubahn. "Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams." Beilstein Journal of Nanotechnology 11 (November 6, 2020): 1693–703. http://dx.doi.org/10.3762/bjnano.11.151.
Повний текст джерелаWoo, Jong-Chang, Young-Hee Joo, Jung-Soo Park, and Chang-Il Kim. "A Study of the Dry Etching Properties of TiN Thin Film in He/BCl3/Cl2Inductively Coupled Plasma." Journal of the Korean Institute of Electrical and Electronic Material Engineers 24, no. 9 (September 1, 2011): 718–22. http://dx.doi.org/10.4313/jkem.2011.24.9.718.
Повний текст джерелаMio, Norikatsu, Mei-Fei Ko, Wei-Tou Ni, Sheau-shi Pan, Akito Araya, Shigenori Moriwaki, and Kimio Tsubono. "Design of a stabilized He–Ne laser by using a thin-film heater." Applied Optics 32, no. 30 (October 20, 1993): 5944. http://dx.doi.org/10.1364/ao.32.005944.
Повний текст джерелаSaitoh, Motohiko. "Melting temperature of two-dimensional electron crystals trapped on thin-film liquid He." Physical Review B 40, no. 1 (July 1, 1989): 810–12. http://dx.doi.org/10.1103/physrevb.40.810.
Повний текст джерелаYotoriyama, Tasuku, Yoshiaki Suzuki, Takaya Mise, Takeyo Tsukamoto, and Masaya Iwaki. "Surface characterization of thin film induced by He+ ion-beam irradiation into PLLA." Surface and Coatings Technology 196, no. 1-3 (June 2005): 383–88. http://dx.doi.org/10.1016/j.surfcoat.2004.08.157.
Повний текст джерелаEggenkamp, M. E. W., H. Khalil, J. P. Laheurte, J. C. Noiray, and J. P. Romagnan. "Heat Diffusion through a Glass Substrate Coated by a Thin 4 He Film." Europhysics Letters (EPL) 21, no. 5 (February 10, 1993): 587–92. http://dx.doi.org/10.1209/0295-5075/21/5/014.
Повний текст джерелаTakechi, Kazushige, Yuya Kuwahara, Jun Tanaka, and Hiroshi Tanabe. "Depth-profiling XPS analysis of He-plasma treated amorphous InGaZnO thin films for use in top-gate coplanar thin-film transistors." Japanese Journal of Applied Physics 58, no. 3 (February 11, 2019): 038005. http://dx.doi.org/10.7567/1347-4065/aafed3.
Повний текст джерелаGrigorian, Galina, Izabela Konkol, and Adam Cenian. "In Situ Analyses of Surface-Layer Composition of CxNy Thin Films Using Methods Based on Penning Ionization Processes—Introductory Investigations." Materials 14, no. 24 (December 17, 2021): 7812. http://dx.doi.org/10.3390/ma14247812.
Повний текст джерелаHuang, T. C. "Correlations Between X-Ray Microstructures and Magnetic Properties of CoCrTa Alloy thin Films." Advances in X-ray Analysis 31 (1987): 107–12. http://dx.doi.org/10.1154/s037603080002190x.
Повний текст джерелаJoyce, Bruce A., and Michael J. Stowell. "Donald William Pashley. 21 April 1927 — 16 May 2009." Biographical Memoirs of Fellows of the Royal Society 56 (January 2010): 317–40. http://dx.doi.org/10.1098/rsbm.2010.0009.
Повний текст джерелаIslam, Ahatashamul, Fariha Tasneem, Zulfiqar Hasan Khan, Asif Rakib, Syed Farid Uddin Farhad, Aminul I. Talukder, AFM Yusuf Haider, and Md Wahadoszamen. "Economically reproducible surface-enhanced Raman spectroscopy of different compounds in thin film." Journal of Bangladesh Academy of Sciences 45, no. 1 (July 15, 2021): 1–11. http://dx.doi.org/10.3329/jbas.v45i1.54255.
Повний текст джерелаKuo, Yue. "(Invited) Plasma-Based Thin Film Technology in Fabrication of Nano- to Giga-Sized Electronics." ECS Meeting Abstracts MA2022-02, no. 30 (October 9, 2022): 1106. http://dx.doi.org/10.1149/ma2022-02301106mtgabs.
Повний текст джерелаSREEKUMAR, J., and V. M. NANDAKUMARAN. "TWO DIMENSIONAL LARGE AMPLITUDE QUASI SOLITONS IN THIN HELIUM FILMS." Modern Physics Letters B 04, no. 01 (January 10, 1990): 47–51. http://dx.doi.org/10.1142/s0217984990000088.
Повний текст джерелаKim, In kyo, Jong Hyeuk Lim, and Geun Young Yeom. "Characteristics of hydrogenated silicon thin film deposited by RF-PECVD using He–SiH4 mixture." Vacuum 86, no. 1 (July 2011): 82–86. http://dx.doi.org/10.1016/j.vacuum.2011.04.018.
Повний текст джерелаKakiuchi, Hiroaki, Hiromasa Ohmi, Seiya Takeda, and Kiyoshi Yasutake. "Improvement of deposition characteristics of silicon oxide layers using argon-based atmospheric-pressure very high-frequency plasma." Journal of Applied Physics 132, no. 10 (September 14, 2022): 103302. http://dx.doi.org/10.1063/5.0101596.
Повний текст джерелаBeyer, W., W. Hilgers, D. Lennartz, F. C. Maier, N. H. Nickel, F. Pennartz, and P. Prunici. "Microstructure Characterization of Amorphous Silicon Films by Effusion Measurements of Implanted Helium." MRS Proceedings 1536 (2013): 175–80. http://dx.doi.org/10.1557/opl.2013.746.
Повний текст джерелаWu, Xuelian, Cui Ying Toe, Chenliang Su, Yun Hau Ng, Rose Amal, and Jason Scott. "Preparation of Bi-based photocatalysts in the form of powdered particles and thin films: a review." Journal of Materials Chemistry A 8, no. 31 (2020): 15302–18. http://dx.doi.org/10.1039/d0ta01180k.
Повний текст джерелаKelman, Maxim B., Paul C. McIntyre, Bryan C. Hendrix, Steven M. Bilodeau, Jeffrey F. Roeder, and Sean Brennan. "Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr0.35Ti0.65)O3 thin films." Journal of Materials Research 18, no. 1 (January 2003): 173–79. http://dx.doi.org/10.1557/jmr.2003.0024.
Повний текст джерелаIonescu, Mihail, Bryce Richards, Keith McIntosh, R. Siegele, E. Stelcer, D. D. Cohen, and Tara Chandra. "Hydrogen Measurements in SiNx: H/Si Thin Films by ERDA." Materials Science Forum 539-543 (March 2007): 3551–56. http://dx.doi.org/10.4028/www.scientific.net/msf.539-543.3551.
Повний текст джерелаChecchetto, Riccardo. "Experimental Study on the Transport of Light Gas Molecules through Low-Density Polyethylene Films." International Journal of Polymer Science 2018 (October 25, 2018): 1–9. http://dx.doi.org/10.1155/2018/4903904.
Повний текст джерелаTAKAHASHI, Masao, Hideyuki SUGIYAMA, Shinichi KIKKAWA, Fumikazu KANAMARU, Makoto HARADA, and Iwao WATANABE. "Local Structure Analysis of Sputter-Deposited Metal Nitride Thin Film Using He Ion Yield XAFS." Journal of the Society of Materials Science, Japan 47, no. 6 (1998): 580–85. http://dx.doi.org/10.2472/jsms.47.580.
Повний текст джерелаBackmeister, Lucas, Bernd Aichner, Max Karrer, Katja Wurster, Reinhold Kleiner, Edward Goldobin, Dieter Koelle та Wolfgang Lang. "Ordered Bose Glass of Vortices in Superconducting YBa2Cu3O7−δ Thin Films with a Periodic Pin Lattice Created by Focused Helium Ion Irradiation". Nanomaterials 12, № 19 (6 жовтня 2022): 3491. http://dx.doi.org/10.3390/nano12193491.
Повний текст джерелаKraszewski, Maciej, and Robert Bogdanowicz. "Laser Reflectance Interferometry System with a 405 Nm Laser Diode for in Situ Measurements of CVD Diamond Thickness." Metrology and Measurement Systems 20, no. 4 (December 1, 2013): 543–54. http://dx.doi.org/10.2478/mms-2013-0046.
Повний текст джерелаJeong, Ho-young, Bok-young Lee, Young-jang Lee, Jung-il Lee, Myoung-su Yang, In-byeong Kang, Mallory Mativenga, and Jin Jang. "Coplanar amorphous-indium-gallium-zinc-oxide thin film transistor with He plasma treated heavily doped layer." Applied Physics Letters 104, no. 2 (January 13, 2014): 022115. http://dx.doi.org/10.1063/1.4862320.
Повний текст джерелаKim, Y. S., J. H. Lee, J. T. Lim, J. B. Park, and G. Y. Yeom. "Atmospheric pressure PECVD of SiO2 thin film at a low temperature using HMDS/O2/He/Ar." Thin Solid Films 517, no. 14 (May 2009): 4065–69. http://dx.doi.org/10.1016/j.tsf.2009.01.137.
Повний текст джерелаBryk, V. V., R. L. Vasilenko, A. V. Goncharov, T. K. Grogorova, A. G. Guglya, V. G. Kolobrodov, M. L. Litvinenko, et al. "Formation mechanism, structure and adsorption characteristics of microporous nanocrystalline thin-film (V, Ti)-N-He composites." Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques 5, no. 3 (June 2011): 566–74. http://dx.doi.org/10.1134/s1027451011060061.
Повний текст джерелаMa, Yujie, Senhua Lin, Yizhi Qiu, Xinzhi Zheng, Mingyoung Yu, Bingxi Xiang, Fang Xu, Fei Lu, Cangtao Zhou, and Shuangchen Ruan. "Radiation effects on He+- and H+-implantation for ion slicing of rutile titanium dioxide thin film." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 533 (December 2022): 1–8. http://dx.doi.org/10.1016/j.nimb.2022.10.013.
Повний текст джерелаKang, Seunghun, Woo-Sung Jang, Anna N. Morozovska, Owoong Kwon, Yeongrok Jin, Young-Hoon Kim, Hagyoul Bae, et al. "Highly enhanced ferroelectricity in HfO 2 -based ferroelectric thin film by light ion bombardment." Science 376, no. 6594 (May 13, 2022): 731–38. http://dx.doi.org/10.1126/science.abk3195.
Повний текст джерелаChuang, Wei Ching, Ching Kong Chao, Wen Chung Chang, and Chi Ting Ho. "Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process." Key Engineering Materials 364-366 (December 2007): 280–83. http://dx.doi.org/10.4028/www.scientific.net/kem.364-366.280.
Повний текст джерелаKim, Nam-Hoon, Ju-Sun Park, and Woo-Sun Lee. "Effective Ag Doping by He-Ne Laser Exposure to Improve the Electrical and the Optical Properties of CdTe Thin Films for Heterostructured Thin Film Solar Cells." Journal of the Korean Physical Society 59, no. 3 (September 15, 2011): 2286–90. http://dx.doi.org/10.3938/jkps.59.2286.
Повний текст джерелаKhan, Saleem. "Investigation and Comparison of Optical Properties of Nickel Nanowires and Nickel Thin Film Using He-Ne Laser." International Journal on Organic Electronics 1, no. 2 (October 31, 2012): 15–22. http://dx.doi.org/10.5121/ijoe.2012.1203.
Повний текст джерелаHäberlen, Maik, Brian Murphy, Bernd Stritzker, and Jörg K. N. Lindner. "Decoupling of a strained 3C-SiC(111) thin film on silicon by He+ and O+ ion implantation." physica status solidi (c) 8, no. 3 (January 20, 2011): 944–47. http://dx.doi.org/10.1002/pssc.201000342.
Повний текст джерелаSaidani, Fatma, Dominic Rochefort, and Mohamed Mohamedi. "Carbon Monoxide Oxidation on Nanostructured Pt Thin Films Synthesized by Pulsed Laser Deposition: Insights into the Morphology Effects." Laser Chemistry 2010 (November 4, 2010): 1–7. http://dx.doi.org/10.1155/2010/143684.
Повний текст джерелаCastillo, Virgil Christian G., Ted Limpoco, and Erwin P. Enriquez. "Detection of Nitrogen in Layer-by-Layer Polymeric Films by Energy Dispersive X-Ray Spectroscopy." Key Engineering Materials 913 (March 18, 2022): 87–97. http://dx.doi.org/10.4028/p-9yin9g.
Повний текст джерелаEt al., Jassim. "Synthesis, Characteristics and Study the Photoluminscience of the CdSxSe1-x Nanocrystaline Thin Film." Baghdad Science Journal 17, no. 1 (March 1, 2020): 0116. http://dx.doi.org/10.21123/bsj.2020.17.1.0116.
Повний текст джерелаCamacho, C. S., P. F. P. Fichtner, F. C. Zawislak, and G. Feldmann. "Microstructure and He Bubble Effects on Al-Cu Thin Films." MRS Proceedings 792 (2003). http://dx.doi.org/10.1557/proc-792-r7.10.
Повний текст джерелаHan, Sang-Myeon, Joong-Hyun Park, Hye-Jin Lee, Kwang-Sub Shin, and Min-Koo Han. "Nanocrystalline-Si Thin Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition (ICP-CVD) at 150°C." MRS Proceedings 862 (2005). http://dx.doi.org/10.1557/proc-862-a19.9.
Повний текст джерелаSimion, B. M., R. Ramesh, V. G. Keramidas, R. L. Pfeffer, G. Thomas, and E. Marinero. "Epitaxial Magnetic Garnet Thin Films and Heterostructures by Pulsed Laser Deposition." MRS Proceedings 341 (1994). http://dx.doi.org/10.1557/proc-341-65.
Повний текст джерелаCatalan, Gustau, J. Marty Gregg, and Pavlo Zubko. "James Floyd Scott. 4 May 1942—6 April 2020." Biographical Memoirs of Fellows of the Royal Society, August 3, 2022. http://dx.doi.org/10.1098/rsbm.2021.0048.
Повний текст джерелаMassimo, Maurice, Walter Varhue, Edward Adams, and Stephen Titcomb. "Chemical Beam Deposition of Y2O3 Thin Films with An Ecr." MRS Proceedings 249 (1991). http://dx.doi.org/10.1557/proc-249-233.
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