Увійти

Готові списки джерел за темами / Floating Gate Memory / Статті в журналах

Статті в журналах з теми "Floating Gate Memory"

Щоб переглянути інші типи публікацій з цієї теми, перейдіть за посиланням: Floating Gate Memory.

Автор: Grafiati

Опубліковано: 6 вересня 2023

Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями

Оберіть тип джерела:

Ознайомтеся з топ-50 статей у журналах для дослідження на тему "Floating Gate Memory".

Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.

Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.

Переглядайте статті в журналах для різних дисциплін та оформлюйте правильно вашу бібліографію.

1

Rajput, Renu, and Rakesh Vaid. "Flash memory devices with metal floating gate/metal nanocrystals as the charge storage layer: A status review." Facta universitatis - series: Electronics and Energetics 33, no. 2 (2020): 155–67. http://dx.doi.org/10.2298/fuee2002155r.

Повний текст джерела

Анотація:

Traditional flash memory devices consist of Polysilicon Control Gate (CG) - Oxide-Nitride-Oxide (ONO - Interpoly Dielectric) - Polysilicon Floating Gate (FG) - Silicon Oxide (Tunnel dielectric) - Substrate. The dielectrics have to be scaled down considerably in order to meet the escalating demand for lower write/erase voltages and higher density of cells. But as the floating gate dimensions are scaled down the charge stored in the floating gate leak out more easily via thin tunneling oxide below the floating gate which causes serious reliability issues and the whole amount of stored charge carrying information can be lost. The possible route to eliminate this problem is to use high-k based interpoly dielectric and to replace the polysilicon floating gate with a metal floating gate. At larger physical thickness, these materials have similar capacitance value hence avoiding tunneling effect. Discrete nanocrystal memory has also been proposed to solve this problem. Due to its high operation speed, excellent scalability and higher reliability it has been shown as a promising candidate for future non-volatile memory applications. This review paper focuses on the recent efforts and research activities related to the fabrication and characterization of non-volatile memory device with metal floating gate/metal nanocrystals as the charge storage layer.

Стилі APA, Harvard, Vancouver, ISO та ін.

2

Li, Bei, Jianlin Liu, G. F. Liu, and J. A. Yarmoff. "Ge∕Si heteronanocrystal floating gate memory." Applied Physics Letters 91, no. 13 (September 24, 2007): 132107. http://dx.doi.org/10.1063/1.2793687.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

3

Al-shawi, Amjad, Maysoon Alias, Paul Sayers, and Mohammed Fadhil Mabrook. "Improved Memory Properties of Graphene Oxide-Based Organic Memory Transistors." Micromachines 10, no. 10 (September 25, 2019): 643. http://dx.doi.org/10.3390/mi10100643.

Повний текст джерела

Анотація:

To investigate the behaviour of the organic memory transistors, graphene oxide (GO) was utilized as the floating gate in 6,13-Bis(triisopropylsilylethynyl)pentacene (TIPS-pentacene)-based organic memory transistors. A cross-linked, off-centre spin-coated and ozone-treated poly(methyl methacrylate) (cPMMA) was used as the insulating layer. High mobility and negligible hysteresis with very clear transistor behaviour were observed for the control transistors. On the other hand, memory transistors exhibited clear large hysteresis which is increased with increasing programming voltage. The shifts in the threshold voltage of the transfer characteristics as well as the hysteresis in the output characteristics were attributed to the charging and discharging of the floating gate. The counter-clockwise direction of hysteresis indicates that the process of charging and discharging the floating gate take place through the semiconductor/insulator interface. A clear shift in the threshold voltage was observed when different voltage pulses were applied to the gate. The non-volatile behaviour of the memory transistors was investigated in terms of charge retention. The memory transistors exhibited a large memory window (~30 V), and high charge density of (9.15 × 1011 cm−2).

Стилі APA, Harvard, Vancouver, ISO та ін.

4

Noor, Fatimah Arofiati, Gilang Mardian Kartiwa, and Muhammad Amin Sulthoni. "Studi Elektrostatik Elektroda Runcing dan Aplikasinya pada Perangkat Floating Gate Memory." POSITRON 11, no. 1 (October 15, 2021): 1. http://dx.doi.org/10.26418/positron.v11i1.44881.

Повний текст джерела

Анотація:

Pada penelitian ini, potensial elektrostatik dari struktur floating gate runcing dalam sel memori split gate dipelajari secara analitik dan numerik. Penelitian ini bertujuan memberikan pendekatan sederhana untuk mempelajari diagram pita energi pada perangkat memori. Diagram energi yang dihasilkan dapat digunakan untuk mempelajari transmitansi elektron dan rapat arus terobosan. Pada studi ini, floating gate runcing dimodelkan sebagai elektroda berbentuk segitiga. Profil potensial elektrostatik elektroda segitiga ini dihitung secara analitik dengan menyelesaikan nilai batas dari persamaan Laplace dalam koordinat polar. Profil potensial dari perhitungan analitik ini lalu dibandingkan dengan profil potensial dari simulasi numerik. Dari hasil perhitungan diperoleh bahwa profil diagram energi yang dihitung secara analitik cukup sesuai dengan yang diperoleh dari simulasi numerik. Adapun terdapat sedikit perbedaan antara profil diagram pita analitik dan numerik dikarenakan elektroda segitiga diasumsikan terbuat dari logam sehingga pembentukan sumur kuantum pada permukaan floating gate diabaikan. Dari hasil permodelan analitik diperoleh bahwa sumur kuantum yang terbentuk pada tegangan sekitar 10 V (sesuai dengan tegangan hapus perangkat memori flash) adalah cukup dangkal, sehingga profil potensial yang terbentuk menjadi sangat mendekati hasil simulasi numerik. Dari hasil perhitungan diperoleh pula bahwa rapat arus terobosan yang dihitung menggunakan model kami memberikan hasil yang sangat dekat dengan hasil perhitungan dari model injektor silinder yang digunakan oleh peneliti dari Silicon Storage Technology (SST) sebagai produsen produk flash memory dengan floating gate berbentuk runcing.

Стилі APA, Harvard, Vancouver, ISO та ін.

5

Lingalugari, Murali, Evan Heller, Barath Parthasarathy, John Chandy, and Faquir Jain. "Quantum Dot Floating Gate Nonvolatile Random Access Memory Using Ge Quantum Dot Channel for Faster Erasing." International Journal of High Speed Electronics and Systems 27, no. 01n02 (March 2018): 1840006. http://dx.doi.org/10.1142/s0129156418400062.

Повний текст джерела

Анотація:

This paper presents an approach to enhance floating gate quantum dot nonvolatile random access memory (QDNVRAM) cells in terms of higher-speed and lower-voltage Erase not possible with conventional floating gate nonvolatile memories. It is achieved by directly accessing the floating gate layer with a Ge quantum dot access channel via an additional drain (D2) during the Erase and/or Write operation. Quantum mechanical simulations in GeOx-cladded Ge quantum dot layers functioning as the floating gate as well access channel to facilitate Erase and Write are presented. Experimental data on fabricated long channel nonvolatile random access memory cell with SiOx-cladded Si dots is presented. Quantum simulations show lower voltage operation for GeOx-cladded Ge QD floating gate than SiOx-cladded Si dots. The Erase time is orders of magnitude faster than flash and is comparable to competing NVRAMs.

Стилі APA, Harvard, Vancouver, ISO та ін.

6

Zhang, Pengfei, Dong Li, Mingyuan Chen, Qijun Zong, Jun Shen, Dongyun Wan, Jingtao Zhu, and Zengxing Zhang. "Floating-gate controlled programmable non-volatile black phosphorus PNP junction memory." Nanoscale 10, no. 7 (2018): 3148–52. http://dx.doi.org/10.1039/c7nr08515j.

Повний текст джерела

Анотація:

By designing and tailoring the structure of the floating gate, a special floating-gate field-effect transistor configuration has been proposed for the design of programmable non-volatile black phosphorus PNP junction memory.

Стилі APA, Harvard, Vancouver, ISO та ін.

7

Lee, Boong-Joo. "Operating characteristics of Floating Gate Organic Memory." Journal of the Korea Academia-Industrial cooperation Society 15, no. 8 (August 31, 2014): 5213–18. http://dx.doi.org/10.5762/kais.2014.15.8.5213.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

8

Park, Byoungjun, Kyoungah Cho, Sungsu Kim, and Sangsig Kim. "Transparent nano-floating gate memory on glass." Nanotechnology 21, no. 33 (July 26, 2010): 335201. http://dx.doi.org/10.1088/0957-4484/21/33/335201.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

9

Cellere, G., P. Pellati, A. Chimenton, J. Wyss, A. Modelli, L. Larcher, and A. Paccagnella. "Radiation effects on floating-gate memory cells." IEEE Transactions on Nuclear Science 48, no. 6 (2001): 2222–28. http://dx.doi.org/10.1109/23.983199.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

10

Lee, Jang-Sik. "Review paper: Nano-floating gate memory devices." Electronic Materials Letters 7, no. 3 (September 2011): 175–83. http://dx.doi.org/10.1007/s13391-011-0901-5.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

11

Jang, Sukjae, Euyheon Hwang, Jung Heon Lee, Ho Seok Park, and Jeong Ho Cho. "Graphene-Graphene Oxide Floating Gate Transistor Memory." Small 11, no. 3 (August 28, 2014): 311–18. http://dx.doi.org/10.1002/smll.201401017.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

12

Nagashio, Kosuke. "(Invited, Digital Presentation) 50 Ns Ultrafast Memory Operation in 2D Heterostructured Non-Volatile Memory Device." ECS Meeting Abstracts MA2022-01, no. 10 (July 7, 2022): 785. http://dx.doi.org/10.1149/ma2022-0110785mtgabs.

Повний текст джерела

Анотація:

2D heterostructures have been extensively investigated as next-generation non-volatile memory (NVM) devices. In the last decade, drastic performance improvements and further advanced functionalities have been demonstrated. However, this progress is not sufficiently supported by the understanding of their operations, obscuring the material and device structure design policy. Here, detailed operation mechanisms are elucidated by exploiting the floating gate voltage (V FG) trajectory measurements [1,2]. Systematic comparisons of MoTe2, WSe2, and MoS2 channel devices revealed that the tunneling behavior between the channel and FG is controlled by three kinds of current-limiting paths, i.e., tunneling barrier, 2D/metal contact, and pn junction in the channel. Based on the understanding of the memory operation mechanism through the V FG trajectory measurement, we propose the best all 2D NVM device structure with a direct tunneling path between source/drain electrodes and floating gate for ultrafast memory operation. Indeed, a 50 ns program/erase operation is successfully achieved [3]. Moreover, we examined the dielectric breakdown strength (E BD) of h-BN under short voltage pulses for the origin for this ultrafast operation, because a high dielectric breakdown strength allows a large tunneling current. Surprisingly, an E BD = 26.1 MV/cm for h-BN is realized under short voltage pulses, largely exceeding the E BD = ~12 MV/cm from the DC measurement. This suggests that the high E BD of h-BN can be the physical origin of the ultrafast operations. In this talk, I would like to discuss the future perspective of 2D NVM application. [1] T. Sasaki, KN, et al., "Understanding the Memory Window Overestimation of 2D Materials Based Floating Gate Type Memory Devices by Measuring Floating Gate Voltage", Small, 2020, 16, 2004907. [2] T. Sasaki, KN, et al., "Material and Device Structure Designs for 2D Memory Devices Based on the Floating Gate Voltage Trajectory", ACS nano, 2021, 15, 6658. [3] T. Sasaki, KN, et al., "Ultrafast Operation of All 2D-Heterostructured Nonvolatile Memory Devices Provided by the Strong Short-Time Dielectric Breakdown Strength of h-BN", Adv. Funct. Mater. (under revision).

Стилі APA, Harvard, Vancouver, ISO та ін.

13

Chen, Yi-Yueh, Feng-Ming Lee, Yu-Yu Lin, Chih-Hsiung Lee, Wei-Chen Chen, Che-Kai Shu, Su-Jien Lin, Shou-Yi Chang, and Chih-Yuan Lu. "New n-p Junction Floating Gate to Enhance the Operation Performance of a Semiconductor Memory Device." Materials 15, no. 10 (May 19, 2022): 3640. http://dx.doi.org/10.3390/ma15103640.

Повний текст джерела

Анотація:

To lower the charge leakage of a floating gate device and improve the operation performance of memory devices toward a smaller structure size and a higher component capability, two new types of floating gates composed of pn-type polysilicon or np-type polysilicon were developed in this study. Their microstructure and elemental compositions were investigated, and the sheet resistance, threshold voltages and erasing voltages were measured. The experimental results and charge simulation indicated that, by forming an n-p junction in the floating gate, the sheet resistance was increased, and the charge leakage was reduced because of the formation of a carrier depletion zone at the junction interface serving as an intrinsic potential barrier. Additionally, the threshold voltage and erasing voltage of the np-type floating gate were elevated, suggesting that the performance of the floating gate in the operation of memory devices can be effectively improved without the application of new materials or changes to the physical structure.

Стилі APA, Harvard, Vancouver, ISO та ін.

14

Sasaki, Taro, Keiji Ueno, Takashi Taniguchi, Kenji Watanabe, Tomonori Nishimura, and Kosuke Nagashio. "Understanding the Memory Window Overestimation of 2D Materials Based Floating Gate Type Memory Devices by Measuring Floating Gate Voltage." Small 16, no. 47 (November 2020): 2004907. http://dx.doi.org/10.1002/smll.202004907.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

15

Pei, Yan Li, Tatsuro Hiraki, Toshiya Kojima, Takafumi Fukushima, Mitsumasa Koyanagi, and Tetsu Tanaka. "Energy Band Engineering of Metal Nanodots for High Performance Nonvolatile Memory Application." Key Engineering Materials 470 (February 2011): 140–45. http://dx.doi.org/10.4028/www.scientific.net/kem.470.140.

Повний текст джерела

Анотація:

In this work, high density and small size metal nanodots (MND) with different work-functions were fabricated as a floating gate of nonvolatile memory (NVM) devices by self-assembled nanodot deposition (SAND). The energy band engineering of NVM was demonstrated through controlling MND work-function. For single MND layer floating gate NVM, the retention time was improved by choosing high work-function MND. Furthermore, we proposed a new type NVM with a double stacked MND floating gate. Here, the high work-function MND are placed on the top layer and the low work-function MND are placed on the bottom layer. A large memory window and long retention time were obtained. However, the thermal electron excitation is dominant for the electron discharge process during retention. How to reduce the defects in MND layer is important for further improving of memory characteristics.

Стилі APA, Harvard, Vancouver, ISO та ін.

16

Jang, Sukjae, Euyheon Hwang, and Jeong Ho Cho. "Graphene nano-floating gate transistor memory on plastic." Nanoscale 6, no. 24 (2014): 15286–92. http://dx.doi.org/10.1039/c4nr04117h.

Повний текст джерела

Анотація:

A transparent flexible graphene nano-floating gate transistor memory (NFGTM) device was developed by combining a single-layered graphene active channel with gold nanoparticle (AuNP) charge trap elements.

Стилі APA, Harvard, Vancouver, ISO та ін.

17

Chen, C. D., Y. Nakamura, and J. S. Tsai. "Aluminum single-electron nonvolatile floating gate memory cell." Applied Physics Letters 71, no. 14 (October 6, 1997): 2038–40. http://dx.doi.org/10.1063/1.119780.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

18

Snyder, E. S., P. J. McWhorter, T. A. Dellin, and J. D. Sweetman. "Radiation response of floating gate EEPROM memory cells." IEEE Transactions on Nuclear Science 36, no. 6 (1989): 2131–39. http://dx.doi.org/10.1109/23.45415.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

19

Hasaneen, El-Sayed, E. Heller, R. Bansal, W. Huang, and F. Jain. "Modeling of nonvolatile floating gate quantum dot memory." Solid-State Electronics 48, no. 10-11 (October 2004): 2055–59. http://dx.doi.org/10.1016/j.sse.2004.05.073.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

20

Martins, Rodrigo, P. Barquinha, L. Pereira, N. Correia, G. Gonçalves, I. Ferreira, and E. Fortunato. "Selective floating gate non-volatile paper memory transistor." physica status solidi (RRL) - Rapid Research Letters 3, no. 9 (October 9, 2009): 308–10. http://dx.doi.org/10.1002/pssr.200903268.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

21

Wang, Shuopei, Congli He, Jian Tang, Xiaobo Lu, Cheng Shen, Hua Yu, Luojun Du, et al. "New Floating Gate Memory with Excellent Retention Characteristics." Advanced Electronic Materials 5, no. 4 (January 18, 2019): 1800726. http://dx.doi.org/10.1002/aelm.201800726.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

22

Sun, Sheng, and Shengdong Zhang. "Nanoparticle floating-gate transistor memory based on solution-processed ambipolar organic semiconductor." E3S Web of Conferences 185 (2020): 04071. http://dx.doi.org/10.1051/e3sconf/202018504071.

Повний текст джерела

Анотація:

Organic thin-film transistor memory based on nano-floating-gate nonvolatile memory was demonstrated by a simple method. The gold nanoparticle that fabricated by thermally evaporated acted as the floating gate. Spin coated PMMA film acted as the tunneling layer. A solution-processed ambipolar semiconductor acted as the active layer. Because of the existence of both hole and electron carriers in bipolar semiconductor materials, it is more conducive to the editing and erasing of memories under positive and negative pressure. The memory based on metal nanoparticles and organic bipolar semiconductor shows good read-write function.

Стилі APA, Harvard, Vancouver, ISO та ін.

23

Dolicanin, Edin. "Gamma ray effects on flash memory cell arrays." Nuclear Technology and Radiation Protection 27, no. 3 (2012): 284–89. http://dx.doi.org/10.2298/ntrp1203284d.

Повний текст джерела

Анотація:

Information stored in flash memories is physically represented by the absence or presence of charge on electrically isolated floating gates. Interaction of gamma rays with the insulators surrounding the floating gate produces effects that degrade the properties of memory cells, possibly leading to the corruption of the stored content. The cumulative nature of these effects is expressed through the total ionizing dose deposited by the gamma rays in the insulators surrounding the floating gate. Relying on both theory and experiment, we examine how the properties of cells in commercially available flash memories affect their sensitivity to gamma rays. Memory samples from several manufacturers, currently available on the market, can be compared with respect to data retention under gamma ray exposure.

Стилі APA, Harvard, Vancouver, ISO та ін.

24

Gan, Lu-Rong, Ya-Rong Wang, Lin Chen, Hao Zhu, and Qing-Qing Sun. "A Floating Gate Memory with U-Shape Recessed Channel for Neuromorphic Computing and MCU Applications." Micromachines 10, no. 9 (August 23, 2019): 558. http://dx.doi.org/10.3390/mi10090558.

Повний текст джерела

Анотація:

We have simulated a U-shape recessed channel floating gate memory by Sentaurus TCAD tools. Since the floating gate (FG) is vertically placed between source (S) and drain (D), and control gate (CG) and HfO2 high-k dielectric extend above source and drain, the integrated density can be well improved, while the erasing and programming speed of the device are respectively decreased to 75 ns and 50 ns. In addition, comprehensive synaptic abilities including long-term potentiation (LTP) and long-term depression (LTD) are demonstrated in our U-shape recessed channel FG memory, highly resembling the biological synapses. These simulation results show that our device has the potential to be well used as embedded memory in neuromorphic computing and MCU (Micro Controller Unit) applications.

Стилі APA, Harvard, Vancouver, ISO та ін.

25

Jang, Sukjae, Euyheon Hwang, Jung Heon Lee, Ho Seok Park, and Jeong Ho Cho. "Memory: Graphene-Graphene Oxide Floating Gate Transistor Memory (Small 3/2015)." Small 11, no. 3 (January 2015): 261. http://dx.doi.org/10.1002/smll.201570014.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

26

ZHANG, YUEGANG. "CARBON NANOTUBE BASED NONVOLATILE MEMORY DEVICES." International Journal of High Speed Electronics and Systems 16, no. 04 (December 2006): 959–75. http://dx.doi.org/10.1142/s0129156406004107.

Повний текст джерела

Анотація:

The technology progress and increasing high density demand have driven the nonvolatile memory devices into nanometer scale region. There is an urgent need of new materials to address the high programming voltage and current leakage problems in the current flash memory devices. As one of the most important nanomaterials with excellent mechanical and electronic properties, carbon nanotube has been explored for various nonvolatile memory applications. While earlier proposals of "bucky shuttle" memories and nanoelectromechanical memories remain as concepts due to fabrication difficulty, recent studies have experimentally demonstrated various prototypes of nonvolatile memory cells based on nanotube field-effect-transistor and discrete charge storage bits, which include nano-floating gate memory cells using metal nanocrystals, oxide-nitride-oxide memory stack, and more simpler trap-in-oxide memory devices. Despite of the very limited research results, distinct advantages of high charging efficiency at low operation voltage has been demonstrated. Single-electron charging effect has been observed in the nanotube memory device with quantum dot floating gates. The good memory performance even with primitive memory cells is attributed to the excellent electrostatic coupling of the unique one-dimensional nanotube channel with the floating gate and the control gate, which gives extraordinary charge sensibility and high current injection efficiency. Further improvement is expected on the retention time at room temperature and programming speed if the most advanced fabrication technology were used to make the nanotube based memory cells.

Стилі APA, Harvard, Vancouver, ISO та ін.

27

Gong, Liang, Rui Ming Li, Qi Xiong, and Shao Hua Zhou. "The Equivalent Circuit Model of Floating-Gate Single-Electron Memorizer." Applied Mechanics and Materials 416-417 (September 2013): 1721–25. http://dx.doi.org/10.4028/www.scientific.net/amm.416-417.1721.

Повний текст джерела

Анотація:

Based on the introduction of floating-gate silicon quantum dot single-electron memorizers structure and working principle, this paper builds corresponding lumping current and capacitance model to calculate the current with memory in the circumstance of linearity, saturation and sub-threshold. Taking advantage of the single-electron devices Threshold Voltage Shift educes different storage condition of nanostorage with different threshold voltage. The simulation shows, this model can precisely simulate memorys read and write state.

Стилі APA, Harvard, Vancouver, ISO та ін.

28

Hu, Hongsheng, Zhongyuan Ma, Xinyue Yu, Tong Chen, Chengfeng Zhou, Wei Li, Kunji Chen, Jun Xu, and Ling Xu. "Controlling the Carrier Injection Efficiency in 3D Nanocrystalline Silicon Floating Gate Memory by Novel Design of Control Layer." Nanomaterials 13, no. 6 (March 7, 2023): 962. http://dx.doi.org/10.3390/nano13060962.

Повний текст джерела

Анотація:

Three-dimensional NAND flash memory with high carrier injection efficiency has been of great interest to computing in memory for its stronger capability to deal with big data than that of conventional von Neumann architecture. Here, we first report the carrier injection efficiency of 3D NAND flash memory based on a nanocrystalline silicon floating gate, which can be controlled by a novel design of the control layer. The carrier injection efficiency in nanocrystalline Si can be monitored by the capacitance–voltage (C–V) hysteresis direction of an nc-Si floating-gate MOS structure. When the control layer thickness of the nanocrystalline silicon floating gate is 25 nm, the C–V hysteresis always maintains the counterclockwise direction under different step sizes of scanning bias. In contrast, the direction of the C–V hysteresis can be changed from counterclockwise to clockwise when the thickness of the control barrier is reduced to 22 nm. The clockwise direction of the C–V curve is due to the carrier injection from the top electrode into the defect state of the SiNx control layer. Our discovery illustrates that the thicker SiNx control layer can block the transfer of carriers from the top electrode to the SiNx, thereby improving the carrier injection efficiency from the Si substrate to the nc-Si layer. The relationship between the carrier injection and the C–V hysteresis direction is further revealed by using the energy band model, thus explaining the transition mechanism of the C–V hysteresis direction. Our report is conducive to optimizing the performance of 3D NAND flash memory based on an nc-Si floating gate, which will be better used in the field of in-memory computing.

Стилі APA, Harvard, Vancouver, ISO та ін.

29

Chen, Hongye, Ye Zhou, and Su‐Ting Han. "Recent advances in metal nanoparticle‐based floating gate memory." Nano Select 2, no. 7 (January 29, 2021): 1245–65. http://dx.doi.org/10.1002/nano.202000268.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

30

Jiyan Y. Dai and Pui-Fai Lee. "Recent Patents in Semiconductor Nanocluster Floating Gate Flash Memory." Recent Patents on Nanotechnology 1, no. 2 (June 1, 2007): 91–97. http://dx.doi.org/10.2174/187221007780859636.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

31

Kim, H. S., B. J. Lee, and P. K. Shin. "Floating Gate Organic Memory Device with Tunneling Layer's Thickness." Journal of the Korean Vacuum Society 21, no. 6 (November 30, 2012): 354–61. http://dx.doi.org/10.5757/jkvs.2012.21.6.354.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

32

Li, Bei, and Jianlin Liu. "Nonvolatile Memory With Ge/Si Heteronanocrystals as Floating Gate." IEEE Transactions on Nanotechnology 10, no. 2 (March 2011): 284–90. http://dx.doi.org/10.1109/tnano.2009.2039488.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

33

Chan, K. C., P. F. Lee, and J. Y. Dai. "Mesoscopic phenomena in Au nanocrystal floating gate memory structure." Applied Physics Letters 95, no. 11 (September 14, 2009): 113109. http://dx.doi.org/10.1063/1.3229885.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

34

Chen, F. Y., Y. K. Fang, M. J. Sun, and Jiann‐Ruey Chen. "A nonvolatile ferroelectric memory device with a floating gate." Applied Physics Letters 69, no. 21 (November 18, 1996): 3275–76. http://dx.doi.org/10.1063/1.118034.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

35

Bleiker, C., and H. Melchior. "A four-state EEPROM using floating-gate memory cells." IEEE Journal of Solid-State Circuits 22, no. 3 (June 1987): 460–63. http://dx.doi.org/10.1109/jssc.1987.1052751.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

36

Yin, Cheng-Kuan, Ji-Chel Bea, Youn-Gi Hong, Takafumi Fukushima, Masanobu Miyao, Kenji Natori, and Mitsumasa Koyanagi. "New Magnetic Flash Memory with FePt Magnetic Floating Gate." Japanese Journal of Applied Physics 45, no. 4B (April 25, 2006): 3217–21. http://dx.doi.org/10.1143/jjap.45.3217.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

37

Wang, Wei, Jiawei Shi, and Dongge Ma. "Organic Thin-Film Transistor Memory With Nanoparticle Floating Gate." IEEE Transactions on Electron Devices 56, no. 5 (May 2009): 1036–39. http://dx.doi.org/10.1109/ted.2009.2016031.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

38

Wang, Wei, Dongge Ma, and Qiang Gao. "Organic thin-film transistor memory with Ag floating-gate." Microelectronic Engineering 91 (March 2012): 9–13. http://dx.doi.org/10.1016/j.mee.2011.11.006.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

39

Carley, L. R. "Trimming analog circuits using floating-gate analog MOS memory." IEEE Journal of Solid-State Circuits 24, no. 6 (1989): 1569–75. http://dx.doi.org/10.1109/4.44992.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

40

Yamauchi, Yoshimitsu, Yoshinari Kamakura, and Toshimasa Matsuoka. "Scalable Virtual-Ground Multilevel-Cell Floating-Gate Flash Memory." IEEE Transactions on Electron Devices 60, no. 8 (August 2013): 2518–24. http://dx.doi.org/10.1109/ted.2013.2270565.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

41

Bagatin, Marta, and Simone Gerardin. "Soft errors in floating gate memory cells: A review." Microelectronics Reliability 55, no. 1 (January 2015): 24–30. http://dx.doi.org/10.1016/j.microrel.2014.10.016.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

42

Zhu, Yan, Dengtao Zhao, Ruigang Li, and Jianlin Liu. "Threshold voltage shift of heteronanocrystal floating gate flash memory." Journal of Applied Physics 97, no. 3 (February 2005): 034309. http://dx.doi.org/10.1063/1.1847700.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

43

Kuruoğlu, Furkan, Murat Çalışkan, Merih Serin, and Ayşe Erol. "Well-ordered nanoparticle arrays for floating gate memory applications." Nanotechnology 31, no. 21 (March 9, 2020): 215203. http://dx.doi.org/10.1088/1361-6528/ab7043.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

44

Cellere, G., L. Larcher, A. Paccagnella, A. Visconti, and M. Bonanomi. "Radiation induced leakage current in floating gate memory cells." IEEE Transactions on Nuclear Science 52, no. 6 (December 2005): 2144–52. http://dx.doi.org/10.1109/tns.2005.860725.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

45

Fujita, O., and Y. Amemiya. "A floating-gate analog memory device for neural networks." IEEE Transactions on Electron Devices 40, no. 11 (1993): 2029–35. http://dx.doi.org/10.1109/16.239745.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

46

Makwana, J. J., and D. K. Schroder. "Nonvolatile floating-gate memory programming enhancement using well bias." IEEE Transactions on Electron Devices 53, no. 2 (February 2006): 258–62. http://dx.doi.org/10.1109/ted.2005.861723.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

47

Lisoni, Judit G., Laurent Breuil, Pieter Blomme, Johan Meersschaut, Andreas Bergmaier, Günther Dollinger, Geert Van den bosch, and Jan Van Houdt. "Material selection for hybrid floating gate NAND memory applications." physica status solidi (a) 213, no. 2 (January 28, 2016): 237–44. http://dx.doi.org/10.1002/pssa.201532829.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

48

QIN, Shi-xian, Chao MA, Jun-jie XING, Bo-wen LI, and Guo-cheng ZHANG. "Transparent organic memory based on quantum dots floating gate." Chinese Journal of Liquid Crystals and Displays 38, no. 7 (2023): 919–25. http://dx.doi.org/10.37188/cjlcd.2023-0041.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

49

Yoon, Jong-Hwan. "Memory properties of Al-based nanoparticle floating gate for nonvolatile memory applications." Journal of the Korean Physical Society 61, no. 5 (September 2012): 799–802. http://dx.doi.org/10.3938/jkps.61.799.

Повний текст джерела

Стилі APA, Harvard, Vancouver, ISO та ін.

50

Jin, Risheng, Jin Wang, Keli Shi, Beibei Qiu, Lanchao Ma, Shihua Huang, and Zhengquan Li. "Multilevel storage and photoinduced-reset memory by an inorganic perovskite quantum-dot/polystyrene floating-gate organic transistor." RSC Advances 10, no. 70 (2020): 43225–32. http://dx.doi.org/10.1039/d0ra08021g.

Повний текст джерела

Анотація:

A novel floating-gate organic transistor memory with photoinduced-reset and multilevel storage function is demonstrated. The device has a large memory window (≈90 V), ultrahigh memory on/off ratio (over 10⁷) and long retention time (over 10 years).

Стилі APA, Harvard, Vancouver, ISO та ін.

Ми пропонуємо знижки на всі преміум-плани для авторів, чиї праці увійшли до тематичних добірок літератури. Зв'яжіться з нами, щоб отримати унікальний промокод!