Щоб переглянути інші типи публікацій з цієї теми, перейдіть за посиланням: FABRICATING MONOLAYER.

Статті в журналах з теми "FABRICATING MONOLAYER"

Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями

Оберіть тип джерела:

Ознайомтеся з топ-50 статей у журналах для дослідження на тему "FABRICATING MONOLAYER".

Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.

Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.

Переглядайте статті в журналах для різних дисциплін та оформлюйте правильно вашу бібліографію.

1

Zhang, Ting, Jun Qian, Xinlin Tuo, Jun Yuan, and Xiaogong Wang. "Fabricating ordered porous monolayers from colloidal monolayer and multilayer." Colloids and Surfaces A: Physicochemical and Engineering Aspects 335, no. 1-3 (March 2009): 202–6. http://dx.doi.org/10.1016/j.colsurfa.2008.11.022.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
2

Chi, Xiannian, Jian Zhang, Jean Pierre Nshimiyimana, Xiao Hu, Pei Wu, Siyu Liu, Jia Liu, Weiguo Chu, and Lianfeng Sun. "Wettability of monolayer graphene/single-walled carbon nanotube hybrid films." RSC Adv. 7, no. 76 (2017): 48184–88. http://dx.doi.org/10.1039/c7ra09934g.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
3

Lei, Leyan, Xin Tang, Pingan Zhu, Zhanxiao Kang, Tiantian Kong, and Liqiu Wang. "Spreading-induced dewetting for monolayer colloidosomes with responsive permeability." Journal of Materials Chemistry B 5, no. 30 (2017): 6034–41. http://dx.doi.org/10.1039/c7tb01255a.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
4

Zhou, Jun, Xiaoqing Cao, Linlin Li, Xingcheng Cui, and Yu Fu. "A Novel Strategy for Fabricating a Strong Nanoparticle Monolayer and Its Enhanced Mechanism." Nanomaterials 9, no. 10 (October 16, 2019): 1468. http://dx.doi.org/10.3390/nano9101468.

Повний текст джерела
Анотація:
This work presents the preparation of cross-linking Au nanoparticle (NP) monolayer membranes by the thiol exchange reaction and their enhanced mechanical properties. Dithiol molecules were used as a cross-linking mediator to connect the adjacent nanoparticles by replacing the original alkanethiol ligand in the monolayer. After cross-linking, the membrane integrity was maintained and no significant fracture was observed, which is crucial for the membrane serving as a nanodevice. TEM (Transmission Electron Microscopy), UV–Vis absorption spectrum, and GISAXS (grazing incidence small angle X-ray scattering) were performed to characterize the nanostructure before and after cross-linking. All results proved that the interparticle distance in the monolayer was controllably changed by using dithiols of different lengths as the cross-linking agent. Moreover, the modulus of the cross-linking monolayer was measured by atomic force microscopy (AFM) and the result showed that the membrane with a longer dithiol molecule had a larger modulus, which might derive from the unbroken and intact structure of the cross-linking monolayer due to the selected appropriately lengthed dithiol. This study provides a new way of producing a nanoparticle monolayer membrane with enhanced mechanical properties.
Стилі APA, Harvard, Vancouver, ISO та ін.
5

OH, SE YOUNG, HANG SOK JIE, HYUNG SEOK CHOI, and JEONG WOO CHOI. "DEEP UV PHOTOPATTERNING OF SELF-ASSEMBLED MONOLAYER AND ITS APPLICATION IN BIOELECTRONIC DEVICE." International Journal of Nanoscience 01, no. 05n06 (October 2002): 611–16. http://dx.doi.org/10.1142/s0219581x02000759.

Повний текст джерела
Анотація:
The photopatterning process of self-assembled monolayer has been used as template for fabricating biomolecular microstructures. Alkanethiolates formed by the adsorption of 1-octanethiol molecules on a gold substrate were oxidized by the irradiation of deep UV light and then developed with deionized water. The resulting positive patterned substrate was immersed into a dilute ethanolic solution of 11-mercaptoundecanoic acid (11-MUDA). Cytochrome c monolayers were immobilized onto the patterned gold substrate by self-assembly technique and their electrochemical properties were investigated through the measurements of cyclic voltammetry. Also, I–V characteristics of biomolecular multilayers consisting of cytochrome c and green fluorescent protein (GFP) were studied with a scanning tunneling microscope (STM).
Стилі APA, Harvard, Vancouver, ISO та ін.
6

Borodin, Bogdan R., Fedor A. Benimetskiy, Valery Yu Davydov, Alexander N. Smirnov, Ilya A. Eliseyev, and Prokhor A. Alekseev. "Photoluminescence enhancement in multilayered MoSe2 nanostructures obtained by local anodic oxidation." 2D Materials 9, no. 1 (November 12, 2021): 015010. http://dx.doi.org/10.1088/2053-1583/ac325a.

Повний текст джерела
Анотація:
Abstract Monolayers of transition metal dichalcogenides (TMDCs) exhibit attractive properties and are promising for fabricating photonic and optoelectronic devices, while bulk multilayered structures based on the same materials only recently has revealed many properties useful for nanophotonics. In this regard, the combination of monolayer and multilayer properties in one device (on a single flake) is an important and fruitful task that needs to be solved. In this work, we demonstrate the use of local anodic oxidation to improve the optical properties of multilayer MoSe2 flakes on a gold-covered substrate. Using this method, we fabricated nanostructures demonstrating extraordinarily enhanced photoluminescence (PL), with an intensity up to three orders of magnitude compared to that of the original structure. Low-frequency Raman spectroscopy showed that the nature of this PL enhancement is that the bindings between the layers inside the nanostructures are severely disrupted. This means that the nanostructures consist of quasi-monolayers, which is in good agreement with the intensity and the position of PL peak. Here, we also propose a mechanism of forming these quasi-monolayers. Therefore, this method allows using multilayer TMDC flakes on a conductive substrate to fabricate areas with quasi-monolayer optical properties, exhibiting an enhanced PL intensity.
Стилі APA, Harvard, Vancouver, ISO та ін.
7

Zhou, Fu Fang, Qing Lan Ma, Yuan Ming Huang, Zhuo Ran She, and Chun Xu Pan. "Effects of Phosphoric Acid on the Photovoltaic Properties of Photovoltaic Cells with Laminated Polypyrrole-Fullerene Layers." Materials Science Forum 663-665 (November 2010): 861–64. http://dx.doi.org/10.4028/www.scientific.net/msf.663-665.861.

Повний текст джерела
Анотація:
By applying phosphoric acid in dispersion of fullerene in the fabrication of polypyrrolefullerene photovoltaic cells we present laminated active structure of polypyrrole and subsequent fullerene layers, with two other reference methods to incorporate fullerene: (i) in a physically blended monolayer; and (ii) in a blend from chemical reaction. I-V characteristics show that a blend monolayer cell can display photosensitive effect however without photovoltaics; a bilayer cell displays photovoltaics either in dark or in illumination, with its VOC up to1V and its JSC up to12.5 μA cm-2 under AM1 105 mW cm-2 condition. The results demonstrate that phosphoric acid is effective in dispersion of fullerene as well as combining it with polypyrrole layer in a photovoltaic cell. The effects of phosphoric acid in fabricating a bilayered photovoltaic cell are discussed mainly in terms of H-bonding.
Стилі APA, Harvard, Vancouver, ISO та ін.
8

Balderas-Valadez, R. F., V. Agarwal, and C. Pacholski. "Fabrication of porous silicon-based optical sensors using metal-assisted chemical etching." RSC Advances 6, no. 26 (2016): 21430–34. http://dx.doi.org/10.1039/c5ra26816h.

Повний текст джерела
Анотація:
Metal-assisted chemical etching was exploited for fabricating a porous silicon double beam interferometer composed of pillars with large pores on top of a monolayer with smaller pores which can act as a sensing and reference channel, respectively.
Стилі APA, Harvard, Vancouver, ISO та ін.
9

Li, Man, Qiang Ma, Wei Zi, Xiaojing Liu, Xuejie Zhu, and Shengzhong (Frank) Liu. "Pt monolayer coating on complex network substrate with high catalytic activity for the hydrogen evolution reaction." Science Advances 1, no. 8 (September 2015): e1400268. http://dx.doi.org/10.1126/sciadv.1400268.

Повний текст джерела
Анотація:
A deposition process has been developed to fabricate a complete-monolayer Pt coating on a large-surface-area three-dimensional (3D) Ni foam substrate using a buffer layer (Ag or Au) strategy. The quartz crystal microbalance, current density analysis, cyclic voltammetry integration, and X-ray photoelectron spectroscopy results show that the monolayer deposition process accomplishes full coverage on the substrate and the deposition can be controlled to a single atomic layer thickness. To our knowledge, this is the first report on a complete-monolayer Pt coating on a 3D bulk substrate with complex fine structures; all prior literature reported on submonolayer or incomplete-monolayer coating. A thin underlayer of Ag or Au is found to be necessary to cover a very reactive Ni substrate to ensure complete-monolayer Pt coverage; otherwise, only an incomplete monolayer is formed. Moreover, the Pt monolayer is found to work as well as a thick Pt film for catalytic reactions. This development may pave a way to fabricating a high-activity Pt catalyst with minimal Pt usage.
Стилі APA, Harvard, Vancouver, ISO та ін.
10

Milyutin, Yana, Manal Abud-Hawa, Viki Kloper-Weidenfeld, Elias Mansour, Yoav Y. Broza, Gidi Shani, and Hossam Haick. "Fabricating and printing chemiresistors based on monolayer-capped metal nanoparticles." Nature Protocols 16, no. 6 (May 19, 2021): 2968–90. http://dx.doi.org/10.1038/s41596-021-00528-y.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
11

Lu, Ye, and Bing Yan. "A novel luminescent monolayer thin film based on postsynthetic method and functional linker." J. Mater. Chem. C 2, no. 28 (2014): 5526–32. http://dx.doi.org/10.1039/c4tc00578c.

Повний текст джерела
Анотація:
A novel strategy for fabricating a visible and near-infrared light-emitting monolayer thin film is displayed. Ln3+ (Ln = Eu, Tb and Yb) complex is introduced to metal–organic frameworks (MOFs) by PSM, and then the modified MOFs are assembled onto a quartz plate by a functional linker.
Стилі APA, Harvard, Vancouver, ISO та ін.
12

Li, Han, Xin Zheng, Yu Liu, Zhepeng Zhang, and Tian Jiang. "Ultrafast interfacial energy transfer and interlayer excitons in the monolayer WS2/CsPbBr3 quantum dot heterostructure." Nanoscale 10, no. 4 (2018): 1650–59. http://dx.doi.org/10.1039/c7nr05542k.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
13

Shang, Guang Rui, Qing Cheng Wang, and Xiao Dong Yang. "Theoretical Study of Wetting Transformation on Regularly Hexagonal Array of Copper Surface." Applied Mechanics and Materials 621 (August 2014): 56–60. http://dx.doi.org/10.4028/www.scientific.net/amm.621.56.

Повний текст джерела
Анотація:
In this thesis we provide the electrodeposition technology by means of monolayer templates for fabricating regularly hexagonal array of copper surface, predict the wetting transformation in theory. We report the result that original hydrophilic copper surface may turn to be hydrophobic surface by this kind of structurization. The apparent contact angle would convert from less thanto more than.
Стилі APA, Harvard, Vancouver, ISO та ін.
14

PENG, Z., and L. X. KONG. "THE APPLICATION OF SELF-ASSEMBLY MONOLAYER TECHNIQUE INTO FABRICATING MULTILAYER NANOFILM." International Journal of Nanoscience 03, no. 04n05 (August 2004): 649–54. http://dx.doi.org/10.1142/s0219581x04002486.

Повний текст джерела
Анотація:
Self-Assembly Monolayer (SAM) technique, as a novel and developing technique for fabricating layer-by-layer nanofilm on substrates of various sizes, shapes and materials, has received more and more attention in the areas of light-emitting devices, nonlinear optical materials, conductive films, permselective gas membranes, sensors, modification of electrodes, resistance and printing technique. In comparison with other traditional methods, SAM technique has many significant advantages, including simple process, universality, formation with densely packed, well defined, highly ordered surfaces. This paper will give a review on the recent development in SAM technique.
Стилі APA, Harvard, Vancouver, ISO та ін.
15

Choi, Inhee, Sung Koo Kang, Jeongjin Lee, Younghun Kim, and Jongheop Yi. "Fabrication of 3D Functionalized Microstructure via Scanning Probe Lithography and Self-Assembly Methods." Journal of Nanoscience and Nanotechnology 7, no. 11 (November 1, 2007): 4161–64. http://dx.doi.org/10.1166/jnn.2007.032.

Повний текст джерела
Анотація:
A type of 2-dimensional planar pattern with spatial resolution can be easily produced using scanning probe lithography (SPL). However, it has not been used successfully for fabricating 3-dimensional (3D) structures due to the low aspect ratio of the resulting structure. Herein, we describe a method for fabricating a 3D functionalized structure via a combination of SPL and self-assembly techniques. In this study, a 3D structure was established on a Si surface with a passivated monolayer via SPL. The patterned layer was modified using a ω-functionalized organosilane. Lateral force microscopy (LFM) was applied to discriminate the chemical functionalities and gold nanoparticles were also used to clearly identify the modified layer.
Стилі APA, Harvard, Vancouver, ISO та ін.
16

Choi, Inhee, Sung Koo Kang, Jeongjin Lee, Younghun Kim, and Jongheop Yi. "Fabrication of 3D Functionalized Microstructure via Scanning Probe Lithography and Self-Assembly Methods." Journal of Nanoscience and Nanotechnology 7, no. 11 (November 1, 2007): 4161–64. http://dx.doi.org/10.1166/jnn.2007.18096.

Повний текст джерела
Анотація:
A type of 2-dimensional planar pattern with spatial resolution can be easily produced using scanning probe lithography (SPL). However, it has not been used successfully for fabricating 3-dimensional (3D) structures due to the low aspect ratio of the resulting structure. Herein, we describe a method for fabricating a 3D functionalized structure via a combination of SPL and self-assembly techniques. In this study, a 3D structure was established on a Si surface with a passivated monolayer via SPL. The patterned layer was modified using a ω-functionalized organosilane. Lateral force microscopy (LFM) was applied to discriminate the chemical functionalities and gold nanoparticles were also used to clearly identify the modified layer.
Стилі APA, Harvard, Vancouver, ISO та ін.
17

Yu, H. Z., J. W. Zhao, Y. Q. Wang, S. M. Cai, and Z. F. Liu. "Fabricating an azobenzene self-assembled monolayer via step-by-step surface modification of a cysteamine monolayer on gold." Journal of Electroanalytical Chemistry 438, no. 1-2 (November 1997): 221–24. http://dx.doi.org/10.1016/s0022-0728(97)00055-7.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
18

Su, Hong Hua, Hong Jun Xu, Bing Xiao, Yu Can Fu, and Jiu Hua Xu. "Study on Machining of Hard-Brittle Materials with Thin-Walled Monolayer Brazed Diamond Core Drill." Materials Science Forum 471-472 (December 2004): 287–91. http://dx.doi.org/10.4028/www.scientific.net/msf.471-472.287.

Повний текст джерела
Анотація:
A new method for fabricating the thin-walled diamond core drill by brazing technology and the optimum grain distribution was proposed in this paper. Machining performance experiments have been carried out, including contrast tests about drill life and machining efficiency for the thin- walled monolayer brazed diamond core drill and electroplated one. The testing results show that thin-walled monolayer brazed diamond core drill has certainly super-excellent machining performance. Wear mechanism of diamond grits was studied in tho se drilling processes. No pulling out for the thin-walled monolayer brazed diamond core drill grits is the key factor of its longer life, and the optimum grain distribution and less wear flat of grits during drilling decrease the drilling spindle direction force, and improve the machining efficiency. It can be concluded that the new technology can radically improve the bonding strength at the grains interface, and make every grain effective during drilling.
Стилі APA, Harvard, Vancouver, ISO та ін.
19

Chang, Sung-Il, Yun-Seok Choi, and Jun-Bo Yoon. "Self-assembled monolayer-assisted thin metal polishing for fabricating uniform 3D microstructures." Journal of Micromechanics and Microengineering 15, no. 5 (March 31, 2005): 1027–32. http://dx.doi.org/10.1088/0960-1317/15/5/019.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
20

Yun, Tinghe, Eliezer Estrecho, Andrew G. Truscott, Elena A. Ostrovskaya, and Matthias J. Wurdack. "Fabrication of high-quality PMMA/SiOx spaced planar microcavities for strong coupling of light with monolayer WS2 excitons." Applied Physics Letters 121, no. 8 (August 22, 2022): 081105. http://dx.doi.org/10.1063/5.0094982.

Повний текст джерела
Анотація:
Exciton polaritons in atomically thin transition metal dichalcogenide crystals (monolayer TMDCs) have emerged as a promising candidate to enable topological transport, ultra-efficient laser technologies, and collective quantum phenomena such as polariton condensation and superfluidity at room temperature. However, integrating monolayer TMDCs into high-quality planar microcavities to achieve the required strong coupling between the cavity photons and the TMDC excitons (bound electron–hole pairs) has proven challenging. Previous approaches to integration had to compromise between various adverse effects on the strength of light–matter interactions in the monolayer, the cavity photon lifetime, and the lateral size of the microcavity. Here, we demonstrate a scalable approach to fabricate high-quality planar microcavities with an integrated monolayer WS2 layer-by-layer by using polymethyl methacrylate/silicon oxide (PMMA/SiO x) as a cavity spacer. Because the exciton oscillator strength is well protected against the required processing steps by the PMMA layer, the microcavities investigated in this work, which have quality factors of above 103, can operate in the strong light–matter coupling regime at room temperature. This is an important step toward fabricating wafer-scale and patterned microcavities for engineering the exciton-polariton potential landscape, which is essential for enabling many proposed technologies.
Стилі APA, Harvard, Vancouver, ISO та ін.
21

ZHAO, Y. P., D. X. YE, PEI-I. WANG, G. C. WANG, and T. M. LU. "FABRICATION OF Si NANOCOLUMNS AND Si SQUARE SPIRALS ON SELF-ASSEMBLED MONOLAYER COLLOID SUBSTRATES." International Journal of Nanoscience 01, no. 01 (February 2002): 87–97. http://dx.doi.org/10.1142/s0219581x02000073.

Повний текст джерела
Анотація:
Amorphous silicon nanocolumns, square nanospirals, and multilayer spiral/column rods are fabricated on bare Si substrates and monolayer colloid substrates by glancing angle deposition. The grown films are studied by scanning electron microscopy and transmission electron microscopy. The size of the deposited Si columns and spirals increases with the size of colloid particles for fixed incident angle of deposition flux. The feasibility of fabricating separated, well-ordered square spirals provides a cost effective and simple way to fabricate photonic crystals.
Стилі APA, Harvard, Vancouver, ISO та ін.
22

Lee, Jian-Hong, Ing-Chi Leu, Yi-Wen Chung, and Min-Hsiung Hon. "Morphology-Controlled 2D Ordered Microstructure Arrays by Surface Modification of Colloidal Template." Journal of Nanoscience and Nanotechnology 8, no. 9 (September 1, 2008): 4436–40. http://dx.doi.org/10.1166/jnn.2008.265.

Повний текст джерела
Анотація:
In this paper, we describe a convenient approach for fabricating two-dimensional, ordered TiO2 bowl-like structure and inverted-bowl-like structure patterns consisting of submicrometer arrays on a self-assembled monolayer film, for the first time using a surface-modified polystyrene colloidal monolayer as the template. Typically, the well-ordered two-dimensional TiO2 bowl-like structures were obtained by liquid phase deposition within the interstitial voids in assemblies of polystyrene spheres followed by the dissolution of the polystyrene template with dichloromethane. Otherwise, through a simple wet treatment by immersing in the sulfuric acid at 50 °C, the surface characteristics of polystyrene were turned from hydrophobic to hydrophilic. The ordered inverted-bowl-like structures could be prepared on this treated surface. We believe that this method could be extendable to colloidal template with smaller dimensions, and to periodic arrays made of other materials.
Стилі APA, Harvard, Vancouver, ISO та ін.
23

Zou, Gang, Hideki Kohn, Yuki Ohshima, Takaaki Manaka, and Mitsumasa Iwamoto. "Fabricating chiral polydiacetylene film by monolayer compression and circularly polarized ultra-violet light." Chemical Physics Letters 442, no. 1-3 (July 2007): 97–100. http://dx.doi.org/10.1016/j.cplett.2007.05.059.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
24

Fang, Jau-Shiung, Yu-Fei Sie, Yi-Lung Cheng, and Giin-Shan Chen. "A New Alternative Electrochemical Process for a Pre-Deposited UPD-Mn Mediated the Growth of Cu(Mn) Film by Controlling the Time during the Cu-SLRR." Coatings 10, no. 2 (February 11, 2020): 164. http://dx.doi.org/10.3390/coatings10020164.

Повний текст джерела
Анотація:
A layer-by-layer deposition is essential for fabricating the Cu interconnects in a nanoscale-sized microelectronics because the gap-filling capability limits the film deposition step coverage on trenches/vias. Conventional layer-by-layer electrochemical deposition of Cu typically works by using two electrolytes, i.e., a sacrificial Pb electrolyte and a Cu electrolyte. However, the use of a Pb electrolyte is known to cause environmental issues. This study presents an Mn monolayer, which mediated the electrochemical growth of Cu(Mn) film through a sequence of alternating an underpotential deposition (UPD) of Mn, replacing the conventionally used UPD-Pb, with a surface-limited redox replacement (SLRR) of Cu. The use of the sacrificial Mn monolayer uniquely provides redox replacement by Cu2+ owing to the standard reductive potential differences. Repeating the sequence of the UPD-Mn followed by the SLRR-Cu enables Cu(Mn) film growth in an atomic layer growth manner. Further, controlling the time of open circuit potential (OCP) during the Cu-SLRR yields a technique to control the content of the resultant Cu(Mn) film. A longer OCP time caused more replacement of the UPD-Mn by the Cu2+, thus resulting in a Cu(Mn) film with a higher Cu concentration. The proposed layer-by-layer growth method offers a wet, chemistry-based deposition capable of fabricating Cu interconnects without the use of the barrier layer and can be of interest in microelectronics.
Стилі APA, Harvard, Vancouver, ISO та ін.
25

Shin, Jin Yong, Young Taek Oh, Simon Kim, Hoe Yeon Lim, Bom Lee, Young Chun Ko, Shin Park, et al. "Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches." Polymers 13, no. 4 (February 13, 2021): 553. http://dx.doi.org/10.3390/polym13040553.

Повний текст джерела
Анотація:
We study the orientation and ordering of nanodomains of a thickness-modulated lamellar block copolymer (BCP) thin film at each thickness region inside a topological nano/micropattern of bare silicon wafers without chemical pretreatments. With precise control of the thickness gradient of a BCP thin film and the width of a bare silicon trench, we successfully demonstrate (i) perfectly oriented lamellar nanodomains, (ii) pseudocylindrical nanopatterns as periodically aligned defects from the lamellar BCP thin film, and (iii) half-cylindrical nanostructure arrays leveraged by a trench sidewall with the strong preferential wetting of the PMMA block of the BCP. Our strategy is simple, efficient, and has an advantage in fabricating diverse nanopatterns simultaneously compared to conventional BCP lithography utilizing chemical pretreatments, such as a polymer brush or a self-assembled monolayer (SAM). The proposed self-assembly nanopatterning process can be used in energy devices and biodevices requiring various nanopatterns on the same device and as next-generation nanofabrication processes with minimized fabrication steps for low-cost manufacturing techniques.
Стилі APA, Harvard, Vancouver, ISO та ін.
26

Chen, Po-Chun, Chih-Pin Lin, Chuan-Jie Hong, Chih-Hao Yang, Yun-Yan Lin, Ming-Yang Li, Lain-Jong Li, et al. "Effective N-methyl-2-pyrrolidone wet cleaning for fabricating high-performance monolayer MoS2 transistors." Nano Research 12, no. 2 (October 5, 2018): 303–8. http://dx.doi.org/10.1007/s12274-018-2215-5.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
27

An, Hyeun Hwan, Jung Hoon Kim, Seung Jae Lee, Won Bae Han, Jong Ho Lee, Hee-Soo Kim, Sang Hee Suh, Im Taek Yoon, Yoon Shon, and Chong Seung Yoon. "Facile method of fabricating Sn nanoparticle monolayer using solid-supported liquid–crystalline phospholipid membrane." Applied Surface Science 257, no. 20 (August 2011): 8702–11. http://dx.doi.org/10.1016/j.apsusc.2011.05.051.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
28

Nie, Guoyan, Peng Li, Jin-Xia Liang, and Chun Zhu. "Theoretical investigation on the photocatalytic activity of the Au/g-C3N4 monolayer." Journal of Theoretical and Computational Chemistry 16, no. 02 (March 2017): 1750013. http://dx.doi.org/10.1142/s0219633617500134.

Повний текст джерела
Анотація:
Two-dimensional optical catalysis materials have a wonderful potential application. Here, a new two-dimensional material consisting of the supported single-atom Au on a graphite carbon nitride (g-C3N[Formula: see text] single layer has been designed and its electronic and optical properties have been characterized by density functional calculations. The bandgap of 1.82[Formula: see text]eV calculated by the hybrid functional HSE06 shows that the Au/g-C3N4 is an indirect semiconductor, and the electron can easily be excited from the single-atom Au to the bottom of the conduction band. This material therefore has relatively strong optical properties in the visible region. Moreover, the process of Au insertion into the cavity of g-C3N4 single layer is energy-favorable. This work may provide insights and a new avenue for fabricating supported Au catalysts with high stability.
Стилі APA, Harvard, Vancouver, ISO та ін.
29

Zhu, Kejing, Heng Wang, Yuying Zhu, Yunyi Zang, Yang Feng, Bingbing Tong, Dapeng Zhao, et al. "Stoichiometric Growth of Monolayer FeSe Superconducting Films Using a Selenium Cracking Source." Crystals 12, no. 6 (June 17, 2022): 853. http://dx.doi.org/10.3390/cryst12060853.

Повний текст джерела
Анотація:
As a novel interfacial high-temperature superconductor, monolayer FeSe on SrTiO3 has been intensely studied in the past decade. The high selenium flux involved in the traditional growth method complicates the film’s composition and entails more sample processing to realize the superconductivity. Here we use a Se cracking source for the molecular beam epitaxy growth of FeSe films to boost the reactivity of the Se flux. Reflection high-energy electron diffraction shows that the growth rate of FeSe increases with the increasing Se flux when the Fe flux is fixed, indicating that the Se over-flux induces Fe vacancies. Through careful tuning, we find that the proper Se/Fe flux ratio with Se cracked that is required for growing stoichiometric FeSe is close to 1, much lower than that with the uncracked Se flux. Furthermore, the FeSe film produced by the optimized conditions shows high-temperature superconductivity in the transport measurements without any post-growth treatment. Our work reinforces the importance of stoichiometry for superconductivity and establishes a simpler and more efficient approach to fabricating monolayer FeSe superconducting films.
Стилі APA, Harvard, Vancouver, ISO та ін.
30

Zhang, Shichao, Feng Gao, Wei Feng, Huihui Yang, Yunxia Hu, Jia Zhang, Haiying Xiao, Zhonghua Li, and PingAn Hu. "High-responsivity photodetector based on scrolling monolayer MoS2 hybridized with carbon quantum dots." Nanotechnology 33, no. 10 (December 13, 2021): 105301. http://dx.doi.org/10.1088/1361-6528/ac3ce1.

Повний текст джерела
Анотація:
Abstract The monolayer MoS2 based photodetectors have been widely investigated, which show limited photoelectric performances due to its low light absorption and uncontrollable adsorbates. In this paper, we present a MoS2-based hybrid nanoscrolls device, in which one-dimensional nanoscrollsof MoS2 is hybridized with carbon quantum dots (CQDs). This device architecture effectively enhanced the photodetection performance. The photoresponsivity and detectivity values of MoS2/CQDs-NS photodetectors are respectively 1793 A W−1 and 5.97 × 1012 Jones, which are 830-fold and 268-fold higher than those of pristine MoS2 under 300 nm illumination at V ds = 5 V. This research indicates a significant progress in fabricating high-performance MoS2 photodetectors.
Стилі APA, Harvard, Vancouver, ISO та ін.
31

Lee, Dong-Yun, A. K. M. Kafi, Won-Suk Choi, Sang-Hyun Park, and Young-Soo Kwon. "Glucose Sensor Based on Glucose Oxidase-Lipid LB Film Immobilized in Prussian Blue Layer." Journal of Nanoscience and Nanotechnology 8, no. 9 (September 1, 2008): 4543–47. http://dx.doi.org/10.1166/jnn.2008.ic04.

Повний текст джерела
Анотація:
The structure and dynamic organization of a mixed Langmuir film of glucose oxidase (GOx) and lipid at the air–water interface were studied. The film was transferred onto the Prussian Blue (PB)-modified Pt electrode for biosensor preparation. The PB modified electrode showed well defined redox peaks in 0.1 M PBS electrolyte. The Langmuir film was characterized at the air–water interface by π-A isotherms. The mixed monolayer was formed by spreading GOx on the LB trough covered with lipid. Time-pressure results show that at least 90 minutes are required to reach the equilibrium state of GOx-lipid film. The monolayer was transferred onto the PB-modified electrode when surface pressure was 40 mN/m. This sensor was characterized by a very low detection limit and a wide linear range. The optimal conditions for both fabricating and response of the sensor were investigated. The proposed biosensor showed a linear calibration range from 5 × 10−6 to 6 × 10−5 M. The detection limit was determined to be 1.5 × 10−6 M.
Стилі APA, Harvard, Vancouver, ISO та ін.
32

Xu, Qing, Zhao Ting Yang, Chao Rong Li, Ben Yong Chen, and Wen Jun Dong. "A New Approach for Colloidal Crystal Fabrication with the Template of Reversible Stress Wrinkle." Advanced Materials Research 418-420 (December 2011): 651–55. http://dx.doi.org/10.4028/www.scientific.net/amr.418-420.651.

Повний текст джерела
Анотація:
Wrinkle is a favorable template for patterning cells or particles. A new approach is developed to control and fabricate PS colloidal crystals with the reversible wrinkle on PDMS substrate/Pt film stressed system. The obtained structure is characterized by optical microscope and scanning electron microscope. It demonstrates that the settlement of colloids can be regulated by the buckling wavelength which can be tuned by varying the film thickness and substrate mixture mass ratio. Compared with monolayer PS film patterned on herringbones pattern wrinkle, the film on stripes pattern wrinkle always has low defect rate. It is meaningful for fabricating large-scale regular spacing and high-ordered PS colloid films.
Стилі APA, Harvard, Vancouver, ISO та ін.
33

Tseng, Shao-Ze, Chang-Rong Lin, Hung-Sen Wei, Chia-Hua Chan, and Sheng-Hui Chen. "Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering." International Journal of Photoenergy 2014 (2014): 1–10. http://dx.doi.org/10.1155/2014/707543.

Повний текст джерела
Анотація:
This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si : H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.
Стилі APA, Harvard, Vancouver, ISO та ін.
34

Ortiz, Deliris N., Josee Vedrine, Nicholas J. Pinto, Carl H. Naylor, and A. T. Charlie Johnson. "Monolayer WS2 crossed with an electro-spun PEDOT-PSS nano-ribbon: Fabricating a Schottky diode." Materials Science and Engineering: B 214 (December 2016): 68–73. http://dx.doi.org/10.1016/j.mseb.2016.09.003.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
35

Wang, Haidong, Kosaku Kurata, Takanobu Fukunaga, Hiroki Ago, Hiroshi Takamatsu, Xing Zhang, Tatsuya Ikuta, Koji Takahashi, Takashi Nishiyama, and Yasuyuki Takata. "A general method of fabricating free-standing, monolayer graphene electronic device and its property characterization." Sensors and Actuators A: Physical 247 (August 2016): 24–29. http://dx.doi.org/10.1016/j.sna.2016.05.002.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
36

Li, Tie Sheng, Wen Jian Xu, Hui Ying Jia, Yang Jie Wu, and Tokuji Miyashita. "Micropatterning of Schiff Bases Polymer Langmuir-Blodgett (LB) Films." Advanced Materials Research 239-242 (May 2011): 1998–2001. http://dx.doi.org/10.4028/www.scientific.net/amr.239-242.1998.

Повний текст джерела
Анотація:
A series of novel copolymers poly (AOBDA-co-DNMMA)s containing 2-Allyloxy-N-benzyl- idene dodecylamine (AOBDA) and 1.4-dioxaspiro[4.4] nonane-2-methyl methacrylate (DNMMA) were synthesized. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates successively. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 40 layers were obtained by deep UV irradiation, followed by developing in acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV, IR and GPC.
Стилі APA, Harvard, Vancouver, ISO та ін.
37

Rahman, M. Tofizur, Hao Wang, and Jian-Ping Wang. "Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area." Journal of Nanotechnology 2011 (2011): 1–5. http://dx.doi.org/10.1155/2011/961630.

Повний текст джерела
Анотація:
We have explored the direct use of anodized alumina (AAO) fabricated on an Si wafer as a mold for the nanoimprint lithography (NIL). The AAO mold has been fabricated over more than 10 cm2area with two different pore diameters of163±24 nm and73±7 nm. One of the key challenges of the lack of bonding between the antisticking self-assembled monolayer (SAM) and the AAO has been overcome by modifying the surface chemistry of the fabricated AAO mold by coating it with thin SiO2layer. Then we have applied the commonly used silane-based self-assembled monolayer (SAM) on these SiO2-coated AAO molds and achieved successful imprinting of resist pillars with feature size of172±25 nm by using the mold with a pore diameter of163±24 nm. Finally, we have achieved (001) oriented L10FePt patterned structure with a dot diameter of42±4 nm by using a AAO mold with a pore diameter of73±7 nm. The perpendicularHcof the unpatterned and patterned FePt is about 3.3 kOe and 12 kOe, respectively. These results indicate that AAO mold can potentially be used in NIL for fabricating patterned nanostructures over large area.
Стилі APA, Harvard, Vancouver, ISO та ін.
38

Li, Qiongyu, Fang Li, You Li, Yongping Du, Tien-Mo Shih, and Erjun Kan. "Hydrogen Induced Etching Features of Wrinkled Graphene Domains." Nanomaterials 9, no. 7 (June 28, 2019): 930. http://dx.doi.org/10.3390/nano9070930.

Повний текст джерела
Анотація:
Wrinkles are observed commonly in CVD (chemical vapor deposition)-grown graphene on Cu and hydrogen etching is of significant interest to understand the growth details, as well as a practical tool for fabricating functional graphene nanostructures. Here, we demonstrate a special hydrogen etching phenomenon of wrinkled graphene domains. We investigated the wrinkling of graphene domains under fast cooling conditions and the results indicated that wrinkles in the monolayer area formed more easily compared to the multilayer area (≥two layers), and the boundary of the multilayer area tended to be a high density wrinkle zone in those graphene domains, with a small portion of multilayer area in the center. Due to the site-selective adsorption of atomic hydrogen on wrinkled regions, the boundary of the multilayer area became a new initial point for the etching process, aside from the domain edge and random defect sites, as reported before, leading to the separation of the monolayer and multilayer area over time. A schematic model was drawn to illustrate how the etching of wrinkled graphene was generated and propagated. This work may provide valuable guidance for the design and growth of nanostructures based on wrinkled graphene.
Стилі APA, Harvard, Vancouver, ISO та ін.
39

Chaji, Sarah, Jenna Al-Saleh, and Cheryl T. Gomillion. "Bioprinted Three-Dimensional Cell-Laden Hydrogels to Evaluate Adipocyte-Breast Cancer Cell Interactions." Gels 6, no. 1 (March 24, 2020): 10. http://dx.doi.org/10.3390/gels6010010.

Повний текст джерела
Анотація:
Three-dimensional (3D) bioprinting, although still in its infancy as a fabrication tool, has the potential to effectively mimic many biological environments. Cell-laden 3D printed structures have demonstrated to be an improvement from the widely used monolayer platforms, largely because of recapitulation of native tissue architecture with the 3D structures. Thus, 3D in vitro models have been increasingly investigated for improved modeling of cell and disease systems, such as for breast cancer. In the present work, multicellular cell-laden hydrogels comprised of adipocytes and breast cancer cells were bioprinted and evaluated. An ideal bioink of 3:2 5% alginate was determined to mimic the tissue stiffness observed in a physiological breast cancer tumor environment. Rheological characterization and degradation studies were performed to verify the stability of the artificial breast hydrogel environment. It was found that both the breast cancer cells and adipocytes remained viable directly after printing and throughout the 10-day culture period within the printed hydrogels. Direct printing of the cells in co-culture resulted in morphology changes and variations in cell localization within printed structures. Overall, the feasibility of efficiently fabricating multicellular cell-laden bioprinted models of the breast tumor microenvironment was established.
Стилі APA, Harvard, Vancouver, ISO та ін.
40

Wang, Yongxin, Wenbin Zhong, Nan Jiang, and Wantai Yang. "Directly Fabricating Monolayer Nanoparticles on a Polymer Surface by UV-Induced MMA/DVB Microemulsion Graft Polymerization." Macromolecular Rapid Communications 26, no. 2 (January 21, 2005): 87–92. http://dx.doi.org/10.1002/marc.200400488.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
41

Tang, Jiao, Yunyang Ye, Jiao Xu, Zhiwei Zheng, Xiangliang Jin, Leyong Jiang, Jie Jiang, and Yuanjiang Xiang. "High-Sensitivity Terahertz Refractive Index Sensor in a Multilayered Structure with Graphene." Nanomaterials 10, no. 3 (March 10, 2020): 500. http://dx.doi.org/10.3390/nano10030500.

Повний текст джерела
Анотація:
In this paper, we propose a high-sensitivity optical sensor at terahertz frequencies based on a composite structure containing a one-dimensional photonic crystal (1D PC) coated with a layer of monolayer graphene. Between the 1D PC and the graphene there is a sensing medium. This high-sensitivity phenomenon originates from the excitation of optical resonance between the graphene and the 1D PC. The proposed sensor is highly sensitive to the Fermi energy of graphene, the thickness and refractive index of the sensing medium, and the number of graphene layers. By selecting appropriate parameters, the maximum sensitivity ( 407.36 ∘ / RIU ) is obtained. We believe the proposed configuration is promising for fabricating graphene-based biosensor- or gas-sensor devices and other related applications in the terahertz band.
Стилі APA, Harvard, Vancouver, ISO та ін.
42

Liu, Wenjing, Zhurun Ji, Yuhui Wang, Gaurav Modi, Minsoo Hwang, Biyuan Zheng, Volker J. Sorger, Anlian Pan, and Ritesh Agarwal. "Generation of helical topological exciton-polaritons." Science 370, no. 6516 (October 8, 2020): 600–604. http://dx.doi.org/10.1126/science.abc4975.

Повний текст джерела
Анотація:
Topological photonics in strongly coupled light-matter systems offer the possibility for fabricating tunable optical devices that are robust against disorder and defects. Topological polaritons, i.e., hybrid exciton-photon quasiparticles, have been proposed to demonstrate scatter-free chiral propagation, but their experimental realization to date has been at deep cryogenic temperatures and under strong magnetic fields. We demonstrate helical topological polaritons up to 200 kelvin without external magnetic field in monolayer WS2 excitons coupled to a nontrivial photonic crystal protected by pseudo time-reversal symmetry. The helical nature of the topological polaritons, where polaritons with opposite helicities are transported to opposite directions, is verified. Topological helical polaritons provide a platform for developing robust and tunable polaritonic spintronic devices for classical and quantum information-processing applications.
Стилі APA, Harvard, Vancouver, ISO та ін.
43

Dong, Lei, Jianqun Yang, Xiaodong Xu, Xiaoqing Yue, Shangli Dong, Gang Lv, and Xingji Li. "Effect of fluorine ion irradiation on the properties of monolayer molybdenum disulfide." Journal of Applied Physics 132, no. 22 (December 14, 2022): 225107. http://dx.doi.org/10.1063/5.0114012.

Повний текст джерела
Анотація:
Two-dimensional molybdenum disulfide (2D MoS2) has great application prospects in the field of optoelectronic devices. Defect engineering is an effective way to regulate the electronic and optical properties of 2D MoS2. However, defect controlling on 2D materials remains a major challenge. Fluorine, as the most electronegative element, may cause many interesting phenomena after doping in 2D materials. So far, there have been no reports on the effect of fluoride ion (F− ion) irradiation on 2D material properties. In this paper, the monolayer MoS2 (ML-MoS2) synthesized by the chemical vapor deposition method was taken as the research object, and defects with controllable densities were produced by 30 keV F− ion irradiation, in which the defects were dominated by S vacancies. Based on Raman, photoluminescence, and x-ray photoelectron spectroscopy, it is shown that the ion irradiation-induced defects significantly affect the optoelectronic properties of MoS2. We also observed the p-doping of ML-MoS2, which is attributed to the introduction of F− ions and the electron transfer from MoS2 to O2 at defect adsorption sites. This study reveals that 2D materials could be effectively doped or compensated using irradiation technology, potentially fabricating novel 2D electrical devices through defect engineering.
Стилі APA, Harvard, Vancouver, ISO та ін.
44

Huang, Cheng, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim, and Thomas Schimmel. "Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers." Beilstein Journal of Nanotechnology 3 (September 4, 2012): 620–28. http://dx.doi.org/10.3762/bjnano.3.71.

Повний текст джерела
Анотація:
A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This “monolayer copy” of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiO x . The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures Bauermann, L. P.; Gerstel, P.; Bill, J.; Walheim, S.; Huang, C.; Pfeifer, J.; Schimmel, T. Langmuir 2010, 26, 3774–3778. doi:10.1021/la903636k.
Стилі APA, Harvard, Vancouver, ISO та ін.
45

Chen, Hongjun, Yuling Wang, Shaojun Dong, and Erkang Wang. "An approach for fabricating self-assembled monolayer of Ag nanoparticles on gold as the SERS-active substrate." Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy 64, no. 2 (May 2006): 343–48. http://dx.doi.org/10.1016/j.saa.2005.07.058.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
46

Sakai, Yusuke, Makiko Koike, Hideko Hasegawa, Kosho Yamanouchi, Akihiko Soyama, Mitsuhisa Takatsuki, Tamotsu Kuroki, Kazuo Ohashi, Teruo Okano, and Susumu Eguchi. "Rapid Fabricating Technique for Multi-Layered Human Hepatic Cell Sheets by Forceful Contraction of the Fibroblast Monolayer." PLoS ONE 8, no. 7 (July 26, 2013): e70970. http://dx.doi.org/10.1371/journal.pone.0070970.

Повний текст джерела
Стилі APA, Harvard, Vancouver, ISO та ін.
47

Yao, Ziyun, Wenqi Zhang, and Xinying Yu. "Fabricating Porous Carbon Materials by One-Step Hydrothermal Carbonization of Glucose." Processes 11, no. 7 (June 26, 2023): 1923. http://dx.doi.org/10.3390/pr11071923.

Повний текст джерела
Анотація:
The present study concerned the production of glucose-based porous carbon materials by a one-step acid-catalyzed HTC. The samples were characterized by elemental analysis (EA), scanning electron microscope (SEM), Brunauer–Emmett–Teller (BET), Fourier transform infrared (FTIR) and point of zero charge (pzc). Experimental results showed that the addition of sulfuric acid (SA) with different dosages in the HTC system could improve the yield of products and reduce chemical oxygen demand (COD) of the process water. When the glucose and acid was at a mass ratio of 1:4 (glucose: SA = 1:4), the hydrochar obtained (H-G9) had a larger specific surface area (SBET = 296.71 m2/g) and higher abundance of functional groups on the surface than that of other samples, such as sulfur-containing functional groups and carboxylic groups, belonged to the mesoporous material with highly negatively surface charged. H-G9 exhibited the optimum adsorption for methylene blue (MB). H-G9 adsorbed MB with an initial concentration of 10 mg/L at pH 6 and 25 °C. The adsorption isotherm of MB on H-G9 demonstrated that Freundlich isotherm could be better applied. Regeneration efficiency of 88% was achieved by HTC process for saturated H-G9. This study prepared a porous carbon material by the simple one-step hydrothermal carbonization of glucose in the presence of SA. The maximum monolayer adsorption capacity as high as 332.46 mg/g for MB, which was well beyond that of commercial activated carbon (259.37 mg/g). This indicates that H-G9 has great potential for the removal of MB from wastewater.
Стилі APA, Harvard, Vancouver, ISO та ін.
48

Wang, Qiu Ling, Yong Na Li, Hui Ying Jia, Yong Ze Wei, Hui Fan Du, Tie Sheng Li, Wen Jian Xu, Yang Jie Wu, and Tokuji Miyashita. "Nanosheet Films of Schiff Bases Polymer for Micropatterning." Applied Mechanics and Materials 488-489 (January 2014): 260–64. http://dx.doi.org/10.4028/www.scientific.net/amm.488-489.260.

Повний текст джерела
Анотація:
A series of novel copolymers [p (AOBHA-co-NPMA)] containing 2-Allyloxy-N-benzylidene hexadecylamine (AOBHA) as film formation material and β-naphtayl methacrylate (NPMA) as photosensitive group were synthesized by free-radical polymerization. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 35 layers were fabricated by deep UV irradiation, followed by developing with acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV and GPC, in which showed that the scission of main and side chain of p (AOBHA-co-NPMA) LB films occurred at the same time.
Стилі APA, Harvard, Vancouver, ISO та ін.
49

Kaushik, Priya Darshni, Gholam Reza Yazdi, Garimella Bhaskara Venkata Subba Lakshmi, Grzegorz Greczynski, Rositsa Yakimova, and Mikael Syväjärvi. "Structural Modifications in Epitaxial Graphene on SiC Following 10 keV Nitrogen Ion Implantation." Applied Sciences 10, no. 11 (June 10, 2020): 4013. http://dx.doi.org/10.3390/app10114013.

Повний текст джерела
Анотація:
Modification of epitaxial graphene on silicon carbide (EG/SiC) was explored by ion implantation using 10 keV nitrogen ions. Fragments of monolayer graphene along with nanostructures were observed following nitrogen ion implantation. At the initial fluence, sp3 defects appeared in EG; higher fluences resulted in vacancy defects as well as in an increased defect density. The increased fluence created a decrease in the intensity of the prominent peak of SiC as well as of the overall relative Raman intensity. The X-ray photoelectron spectroscopy (XPS) showed a reduction of the peak intensity of graphitic carbon and silicon carbide as a result of ion implantation. The dopant concentration and level of defects could be controlled both in EG and SiC by the fluence. This provided an opportunity to explore EG/SiC as a platform using ion implantation to control defects, and to be applied for fabricating sensitive sensors and nanoelectronics devices with high performance.
Стилі APA, Harvard, Vancouver, ISO та ін.
50

Mondal, Manodeep, Chandan K. Mishra, Rajdeep Banerjee, Shobhana Narasimhan, A. K. Sood, and Rajesh Ganapathy. "Cooperative particle rearrangements facilitate the self-organized growth of colloidal crystal arrays on strain-relief patterns." Science Advances 6, no. 10 (March 2020): eaay8418. http://dx.doi.org/10.1126/sciadv.aay8418.

Повний текст джерела
Анотація:
Strain-relief pattern formation in heteroepitaxy is well understood for particles with long-range attraction and is a routinely exploited organizational principle for atoms and molecules. However, for particles with short-range attraction such as colloids and nanoparticles, which form brittle assemblies, the mechanism(s) of strain-relief is not known. Here, we found that for colloids with short-range attraction, monolayer films on substrates with square symmetry could accommodate large compressive misfit strains through locally dewetted hexagonally ordered stripes. Unexpectedly, over a window of compressive strains, cooperative particle rearrangements first resulted in a periodic strain-relief pattern, which then guided the growth of laterally ordered defect-free colloidal crystals. Particle-resolved imaging of monomer dynamics on strained substrates also helped uncover cooperative kinetic pathways for surface transport. These processes, which substantially influenced the film morphology, have remained unobserved in atomic heteroepitaxy studies hitherto. Leaning on our findings, we developed a heteroepitaxy approach for fabricating hierarchically ordered surface structures.
Стилі APA, Harvard, Vancouver, ISO та ін.
Ми пропонуємо знижки на всі преміум-плани для авторів, чиї праці увійшли до тематичних добірок літератури. Зв'яжіться з нами, щоб отримати унікальний промокод!

До бібліографії