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1

Nesterenkov, V. M., K. S. Khripko, and V. A. Matviichuk. "Electron beam technologies of welding, surfacing, prototyping: results and prospects." Paton Welding Journal 2018, no. 12 (December 28, 2018): 126–33. http://dx.doi.org/10.15407/tpwj2018.12.14.

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2

Semenov, Yu I., O. N. Alyakrinskiy, D. Yu Bolkhovityanov, T. A. Devyataykina, M. Yu Kosachev, P. V. Logachev, E. A. Cooper, et al. "Laser-heated cathode electron beam source for electron beam technologies." Welding International 36, no. 4 (February 23, 2022): 220–25. http://dx.doi.org/10.1080/09507116.2022.2033440.

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3

Nesterenkov, V. M., V. A. Matvejchuk, and M. O. Rusynik. "Manufacture of industrial products using electron beam technologies for 3D-printing." Paton Welding Journal 2018, no. 1 (January 28, 2018): 24–28. http://dx.doi.org/10.15407/tpwj2018.01.05.

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4

Alyackrinskiy, O. N., M. A. Batazova, D. Yu Bolkhovityanov, M. Yu Kosachev, P. V. Logatchov, A. M. Medvedev, Yu I. Semenov, M. M. Sizov, A. A. Starostenko, and A. S. Tsygunov. "Prototype of electron source with magnetic beam rotation for electron beam technologies." NAUCHNOE PRIBOROSTROENIE 29, no. 1 (February 25, 2019): 026–32. http://dx.doi.org/10.18358/np-29-1-i2632.

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5

Starkov, I. N., K. A. Rozhkov, T. V. Olshanskaya, D. N. Trushnikov, and I. A. Zubko. "Expansion of technological capabilities of the electron beam welding installation." Journal of Physics: Conference Series 2077, no. 1 (November 1, 2021): 012021. http://dx.doi.org/10.1088/1742-6596/2077/1/012021.

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Abstract The direction of electron beam technologies is promising and is rapidly developing. Quite recently, the electron beam was a tool for welding, and nowadays, electron-beam additive technologies and beam hardening technologies have become widespread. At the moment, there is no electron beam system that unites all these technologies. Expensive equipment has been developed to implement each technology. The article deals with expanding the technological capabilities of the 15E1000 electron-beam welding installation in order to implement new methods and techniques for processing metals with an electron beam.
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6

GOTOH, Yasuhito. "Expecting Further Development of Electron Beam Technologies." Vacuum and Surface Science 63, no. 1 (January 10, 2020): 2. http://dx.doi.org/10.1380/vss.63.2.

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7

Zaleski, V. G., I. L. Pobol, A. A. Bakinouski, and A. D. Gubko. "METAL PARTS MANUFACTURING BY ELECTRON BEAM ADDITIVE TECHNOLOGIES." Proceedings of the National Academy of Sciences of Belarus, Physical-Technical Series 63, no. 2 (July 3, 2018): 169–80. http://dx.doi.org/10.29235/1561-8358-2018-63-2-169-180.

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Анотація:
General information about development of additive technologies, as well as an overview of the main schema- tics of layer by layer manufacturing of metal products is presented. The technologies and equipment for electron beam layerby-layer production of metal products using wire and powder as a raw material is described. Experimental data obtained by the authors as a result of electron beam additive manufacturing of low-carbon steel, stainless austenitic steel and technical titanium samples are described. Relations between the product geometry and the electron beam main parameters are obtained. The analysis of microstructures is carried out. The main zones formed in the samples fabricated by this method are described. It is shown that typical microstructure of stainless steel samples consists of the large dendrites with main axes up to a few millimeters in the direction of heat sink. In a pure titanium, in addition to the characteristic coarse-grained (up to several millimeters in diameter) structure, there are zones where a lamellar structure with colonies of about 1 mm is observed, as well as a zone in the form of a strip about 1 mm wide along the walls, which is an acicular structure. This is obviously related to the cooling mode, since the character of the heat sink along the edges of the sample differs from the central zones. The analysis of electron beam additive technologies prospects is carried out. Examples of electron beam additive technology using in modern fabrication of accelerator technics, aircraft and machine building are demonstrated.
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8

Koshlakov, V. V., and R. N. Rizakhanov. "On the role of electron beam scattering in additive technologies." Physics and Chemistry of Materials Treatment, no. 3 (2020): 48–52. http://dx.doi.org/10.30791/0015-3214-2020-3-48-52.

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The prospects of using combined-type installations equipped with laser and electron-beam sources in the field of additive technologies are shown. The problem of broadening of the electron beam acting on the surface of the workpiece in a vacuum medium due to its scattering by particles of the evaporating material is considered. An analytical solution is obtained of the paraxial equation of the envelope of an electron beam undergoing scattering in the atmosphere of evaporated particles. The conditions are established that ensure stable transportation of the electron beam to the surface to be treated.
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9

Nesterenkov, V. M., V. A. Matvejchuk, M. O. Rusynik, and A. V. Ovchinnikov. "Application of additive electron beam technologies for manufacture of parts of VT1-0 titanium alloy powders." Paton Welding Journal 2017, no. 3 (March 28, 2017): 2–6. http://dx.doi.org/10.15407/tpwj2017.03.01.

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10

Valkov, Stefan, Maria Ormanova, and Peter Petrov. "Electron-Beam Surface Treatment of Metals and Alloys: Techniques and Trends." Metals 10, no. 9 (September 10, 2020): 1219. http://dx.doi.org/10.3390/met10091219.

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During the last decades, electron-beam treatment technologies (EBTT) have been widely used for surface modification of metals and alloys. The EBT methods are known as accurate and efficient. They have many advantages in comparison with the conventional techniques, such as very short technological process time, uniform distribution of the energy of the electron beam, which allows a precise control of the beam parameters and formed structure and properties of the materials, etc. Moreover, electron-beam treatment technologies are a part of the additive techniques, which are known as modern methods for manufacturing of new materials with unique functional properties. Currently, modern trends in the surface treatment of metals and alloys are based on the combination of electron-beam technologies with other methods, such as thin film deposition, plasma nitriding, etc. This approach results in a significant improvement in the surface properties of the materials which opens new potential applications and can involve them into new industrial fields. This paper aims to summarize the topics related to the manufacturing and surface treatment of metals and alloys by means of electron-beam technologies. Based on a literature review, the development and growth of EBT are considered in details. The benefits of these technologies—as well as their combination with other methods—are extensively discussed.
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11

Antonovich, D., V. Gruzdev, V. Zalesski, I. Pobol, and Pavel Soldatenko. "PLASMA EMISSION SYSTEMS FOR ELECTRON- AND ION-BEAM TECHNOLOGIES." High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes 21, no. 2 (2017): 143–59. http://dx.doi.org/10.1615/hightempmatproc.2017024672.

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12

Buchwalder, Anja, and Rolf Zenker. "The application of modern high-energy electron beam technologies." International Journal of Microstructure and Materials Properties 12, no. 3/4 (2017): 288. http://dx.doi.org/10.1504/ijmmp.2017.091108.

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13

Zenker, Rolf, and Anja Buchwalder. "The application of modern high-energy electron beam technologies." International Journal of Microstructure and Materials Properties 12, no. 3/4 (2017): 288. http://dx.doi.org/10.1504/ijmmp.2017.10012159.

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14

WATANABE, MICHIO. "TECHNOLOGIES FOR THE FABRICATION OF NANOSCALE SUPERCONDUCTING CIRCUITS." Modern Physics Letters B 19, no. 09n10 (April 30, 2005): 405–24. http://dx.doi.org/10.1142/s0217984905008529.

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Researches on the fabrication of ~ 0.1 × 0.1 μ m 2 superconductor–insulator–superconductor (SIS) Josephson junctions are reviewed. Today, a typical dimension is 1–10 μm for Josephson junctions in superconducting integrated circuits. These Josephson junctions are defined by well-established photolithographic technology with reactive ion etching (RIE), and for the superconductor, Nb is almost always used. The merits of Nb include the facts that the superconducting transition temperature Tc of Nb (9.2 K ) is higher than the boiling point of He (4.2 K ), and that Nb has excellent stability against thermal cycling between room temperature and liquid- He temperature. For the fabrication of ~ 0.1 × 0.1 μ m 2 junctions, on the other hand, there is a standard process with electron-beam lithography, shadow evaporation, and lift-off. This process works well for Al (Tc = 1.2 K ), however, it is not ideal for Nb . The scope of this brief review is the nanoscale junction with Nb electrodes. We will look at the efforts of optimizing the standard lift-off process for Nb , electron-beam-lithographic versions of the Nb Josephson-junction technology, focused-ion-beam (FIB) etching as a convenient alternative to electron-beam lithography and RIE, etc. In order to characterize nanoscale tunnel junctions, the single-charge transistor has been often fabricated. Therefore, a summary of its theoretical transport properties is also included.
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15

Nesterenkov, V. M., K. S. Khripko, and V. A. Matviichuk. "Electron beam technologies of welding, surfacing, prototyping: results and prospects." Avtomatičeskaâ svarka (Kiev) 2018, no. 12 (December 28, 2018): 142–50. http://dx.doi.org/10.15407/as2018.12.14.

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16

Moriizumi, Koichi, Susumu Takeuchi, Takeshi Fujino, Satoshi Aoyama, Masahiro Yoneda, Hiroaki Morimoto, and Yaichiro Watakabe. "Electron Beam Direct Writing Technologies for 0.3-µm ULSI Devices." Japanese Journal of Applied Physics 29, Part 1, No. 11 (November 20, 1990): 2584–89. http://dx.doi.org/10.1143/jjap.29.2584.

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17

Wang, Shi Jiun, Chih-An Yang, Burn Jeng Lin, Chrong Jung Lin, and Ya-Chin King. "On-Wafer Electron Beam Detectors by Floating-Gate FinFET Technologies." IEEE Transactions on Electron Devices 68, no. 9 (September 2021): 4651–55. http://dx.doi.org/10.1109/ted.2021.3088393.

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18

Boyes, E. D. "LVEDS For Advanced Materials and Semiconductor Technologies." Microscopy and Microanalysis 5, S2 (August 1999): 314–15. http://dx.doi.org/10.1017/s1431927600014896.

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The need to analyze bulk samples containing features with submicron dimensions has driven revaluation of the processes controlling the interaction of electron beams with inorganic, polymer and semiconductor materials, and to development of LVEDS analysis at lower beam energies of E0 <5kV (1,2).It has previously been shown (1,2) that the physics is much as expected with the vertical penetration range (R) along the beam direction in many cases predicted quite accurately for beam energy E0 by the simple Bethe (e.g. in 3) power law with R = F(E0)5/3. These same factors are effective to varying degrees in all three dimensions. The strong dependence of the range on energy has practical importance for the identification of sub-micron particles, including to help to determine the root cause of a defect Fig. 1 is an example of the sequential analysis of the exact same sub-micron particle, with the very real potential for a processing disaster, on the surface of a silicon wafer. When this feature is analyzed with a 3kV electron beam we learn it is alumina (A12O3). The analysis comes only from the target particle and the data have a simple relationship to the chemistry and the sensitivity for the light element (O) is excellent, providing simple and direct qualitative identification of the oxide compound.
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19

Balayan, Marine H., Astghik Z. Pepoyan, Anahit M. Manvelyan, Vardan V. Tsaturyan, Bagrat Grigoryan, Arusyak Abrahamyan, and Michael L. Chikindas. "Combined use of eBeam irradiation and the potential probiotic Lactobacillus rhamnosus Vahe for control of foodborne pathogen Klebsiella pneumoniae." Annals of Microbiology 69, no. 13 (November 13, 2019): 1579–82. http://dx.doi.org/10.1007/s13213-019-01522-2.

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Abstract Purpose The implementation of electron beam radiation coupled with the use of probiotics is one of the newest food processing technologies that may be used to ensure food safety and improve shelf life of food products. The purpose of this study was to evaluate the effect of 50–150-Gy electron beam irradiation on the antimicrobial activity of the putative probiotic strain Lactobacillus rhamnosus Vahe. Methods Low-dose electron beam irradiation of lactobacilli cells was performed using the Advanced Research Electron Accelerator Laboratory’s electron accelerator, and the agar well diffusion method and Verhulst logistic function were used to evaluate the effect of radiation on anti–Klebsiella pneumoniae activity of the cell free supernatant of L. rhamnosus Vahe cells in vitro. Results Our results suggest that 50–150-Gy electron beam irradiation decreases the viability of the investigated lactobacilli, but does not significantly change the probiotic’s activity against K. pneumoniae. Conclusions Results indicate that the combined use of irradiation and L. rhamnosus Vahe might be suggested for non-thermal food sterilizing technologies.
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20

Córdoba, Rosa. "Editorial for the Special Issue on Nanofabrication with Focused Electron/Ion Beam Induced Processing." Micromachines 12, no. 8 (July 28, 2021): 893. http://dx.doi.org/10.3390/mi12080893.

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21

Shibata, M., T. Obata, and H. Ohyi. "Nanodevice fabrication technologies with advanced high resolution electron beam lithography systems." Nanoindustry Russia, no. 3 (2015): 70–75. http://dx.doi.org/10.22184/1993-8578.2015.57.3.70.75.

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22

Pavlov, Y. S., A. M. Surma, P. B. Lagov, Y. L. Fomenko, and E. M. Geifman. "Accelerator-based electron beam technologies for modification of bipolar semiconductor devices." Journal of Physics: Conference Series 747 (September 2016): 012085. http://dx.doi.org/10.1088/1742-6596/747/1/012085.

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23

Crivello, James V. "Advanced curing technologies using photo- and electron beam induced cationic polymerization." Radiation Physics and Chemistry 63, no. 1 (January 2002): 21–27. http://dx.doi.org/10.1016/s0969-806x(01)00476-5.

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24

Nesterenkov, V. M., V. A. Matvejchuk, and M. O. Rusynik. "Manufacture of industrial products using electron beam technologies for 3D-printing." Автоматическая сварка 2018, no. 1 (January 28, 2018): 34–39. http://dx.doi.org/10.15407/as2018.01.05.

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25

Knyazeva, A. G., I. L. Pobol, and V. N. Demidov. "Mathematical modelling of thermal and kinetic phenomena in electron-beam technologies." IOP Conference Series: Materials Science and Engineering 140 (July 2016): 012021. http://dx.doi.org/10.1088/1757-899x/140/1/012021.

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26

Khin, Maung Htay, T. M. Vasilieva, L. A. Kuvschinova, and E. V. Udoratina. "Electron beam plasma systems - new opportunities for lignocellulosic biomass processing technologies." Proceedings of Moscow Institute of Physics and Technology 12, no. 2 (2020): 111–16. http://dx.doi.org/10.53815/20726759_2020_12_2_111.

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27

Yousefi, Mohammad, Masoud Aman Mohammadi, Maryam Zabihzadeh Khajavi, Ali Ehsani, and Vladimír Scholtz. "Application of Novel Non-Thermal Physical Technologies to Degrade Mycotoxins." Journal of Fungi 7, no. 5 (May 19, 2021): 395. http://dx.doi.org/10.3390/jof7050395.

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Анотація:
Mycotoxins cause adverse effects on human health. Therefore, it is of the utmost importance to confront them, particularly in agriculture and food systems. Non-thermal plasma, electron beam radiation, and pulsed light are possible novel non-thermal technologies offering promising results in degrading mycotoxins with potential for practical applications. In this paper, the available publications are reviewed—some of them report efficiency of more than 90%, sometimes almost 100%. The mechanisms of action, advantages, efficacy, limitations, and undesirable effects are reviewed and discussed. The first foretastes of plasma and electron beam application in the industry are in the developing stages, while pulsed light has not been employed in large-scale application yet.
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28

Endo, J., T. Kawasaki, T. Masuda, and A. Tonomura. "Development of 350-KV holography electron microscope equipped with magnetic type field-emission electron gun." Proceedings, annual meeting, Electron Microscopy Society of America 47 (August 6, 1989): 104–5. http://dx.doi.org/10.1017/s0424820100152495.

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A field-emission electron gun is one of the most epoch-making technologies in an electron microscopic world. In a transmission electron microscope, a high brightness of this beam has been effectively employed for electron-holographic measurements, though the value is not still high enough. Development of a higher brightness beam will promise to open up unattained application possibilities of electron holography such as high resolution and high sensitivity interferometry.We developed the field emission electron microscope for electron holographic applications. Special attentions were paid for high brightness, large beam current and easy operation. Figure 1 is a schematic diagram of the electron gun. In order not to deteriorate the original high-brightness feature of the beam by the aberrations in the gun and the condenser lenses, a magnetic lens was installed between the tip and the extraction anode so that the total aberration effect might be minimized. Field emitted electron beam is converged by the magnetic and the electrostatic lenses, and accelerated in a ten-stage accelerator which is made of porcelain.
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29

Rathkey, Doug. "Evolution and Comparison of Electron Sources." Microscopy Today 1, no. 4 (June 1993): 16–17. http://dx.doi.org/10.1017/s1551929500067432.

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Over the years, we've seen major developments in electron source technologies in response to the demands for better performance. This article presents a brief overview of the cathode technologies in use today.Two types of electron sources are used in commercially available scanning electron microscopes (SEMs), transmission electron microscopes (TEMs), scanning Auger microprobes, and electron beam lithography systems: thermionic and field emission electron cathodes. Thermionic cathodes reiease electrons from the cathode material when they are heated while field emission cathodes rely on a high electric field to draw electrons from the cathode material.
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30

Węglowski, Marek St, Robert Jachym, Krzysztof Krasnowski, Krzysztof Kwieciński, Janusz Pikuła, and Piotr Śliwiński. "Electron Beam Melting of Thermally Sprayed Layers – Overview." Biuletyn Instytutu Spawalnictwa, no. 3 (June 2021): 7–19. http://dx.doi.org/10.17729/ebis.2021.3/1.

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Thermal spraying is one of the most common methods enabling the deposition of variously-purposed layers on surfaces of structural elements. However, in certain cases, the process of spraying itself is ineffective in terms of the stability and properties of protective layers. One of the possible solutions making it possible to reduce the porosity and improve the adhesion of surfaced layers involves their melting using the concentrated electron beam. The article contains an overview of reference publications concerning electron beam melting technologies.
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31

Koike, Mari, Preston Greer, Kelly Owen, Guo Lilly, Lawrence E. Murr, Sara M. Gaytan, Edwin Martinez, and Toru Okabe. "Evaluation of Titanium Alloys Fabricated Using Rapid Prototyping Technologies—Electron Beam Melting and Laser Beam Melting." Materials 4, no. 10 (October 10, 2011): 1776–92. http://dx.doi.org/10.3390/ma4101776.

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32

Novembre, Anthony E., Regine G. Tarascon, Steven D. Berger, Chris J. Biddick, Myrtle I. Blakey, Kevin J. Bolan, Linus A. Fetter, et al. "Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies." Journal of Photopolymer Science and Technology 9, no. 4 (1996): 663–75. http://dx.doi.org/10.2494/photopolymer.9.663.

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33

Micollet, D., and B. Courtois. "Design methods of electron beam sensitive devices in NMOS and CMOS technologies." Microelectronic Engineering 7, no. 2-4 (January 1987): 419–26. http://dx.doi.org/10.1016/s0167-9317(87)80038-2.

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34

Murr, Lawrence E., Sara M. Gaytan, Diana A. Ramirez, Edwin Martinez, Jennifer Hernandez, Krista N. Amato, Patrick W. Shindo, Francisco R. Medina, and Ryan B. Wicker. "Metal Fabrication by Additive Manufacturing Using Laser and Electron Beam Melting Technologies." Journal of Materials Science & Technology 28, no. 1 (January 2012): 1–14. http://dx.doi.org/10.1016/s1005-0302(12)60016-4.

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35

Radchenko, M. V., V. G. Radchenko, Yu O. Shevtsov, and K. S. Krovyakov. "Using electron beam technologies for welding, hardening and surfacing in diesel engineering." Welding International 22, no. 2 (February 2008): 118–21. http://dx.doi.org/10.1080/09507110801990884.

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36

Chen, Kuo-Shen, I.-Kuan Lin, and Fu-Hsang Ko. "Fabrication of 3D polymer microstructures using electron beam lithography and nanoimprinting technologies." Journal of Micromechanics and Microengineering 15, no. 10 (August 19, 2005): 1894–903. http://dx.doi.org/10.1088/0960-1317/15/10/015.

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37

Chen, K.-S., I.-K. Lin, and F.-H. Ko. "Fabrication of 3D polymer microstructures using electron beam lithography and nanoimprinting technologies." Journal of Micromechanics and Microengineering 16, no. 7 (June 8, 2006): 1431. http://dx.doi.org/10.1088/0960-1317/16/7/c01.

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38

GOTOH, Yasuhito. "Report of the Workshop on “Electron Beam Technologies and Their Recent Evolution”." Vacuum and Surface Science 62, no. 10 (October 10, 2019): 646. http://dx.doi.org/10.1380/vss.62.646.

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39

Aulenbacher, Kurt, Eugene Chudakov, David Gaskell, Joseph Grames, and Kent D. Paschke. "Precision electron beam polarimetry for next generation nuclear physics experiments." International Journal of Modern Physics E 27, no. 07 (July 2018): 1830004. http://dx.doi.org/10.1142/s0218301318300047.

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Polarized electron beams have played an important role in scattering experiments at moderate to high beam energies. Historically, these experiments have been primarily targeted at studying hadronic structure — from the quark contribution to the spin structure of protons and neutrons, to nucleon elastic form factors, as well as contributions to these elastic form factors from (strange) sea quarks. Other experiments have aimed to place constraints on new physics beyond the Standard Model. For most experiments, knowledge of the magnitude of the electron beam polarization has not been a limiting systematic uncertainty, with only moderately precise beam polarimetry requirements. However, a new generation of experiments will require extremely precise measurements of the beam polarization, significantly better than 1%. This paper will review standard electron beam polarimetry techniques and possible future technologies, with an emphasis on the ever-improving precision that is being driven by the requirements of electron scattering experiments.
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40

Grechanyuk, N. I., P. P. Kucherenko, A. G. Melnik, I. N. Grechanyuk, Yu A. Smashnyuk, and V. G. Grechanyuk. "New electron beam equipment and technologies for producing of advanced materials using vacuum melting and evaporation methods developed at SPE «Eltekhmash»." Paton Welding Journal 2016, no. 6 (June 28, 2016): 48–55. http://dx.doi.org/10.15407/tpwj2016.06.08.

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41

Koptioug, Andrey, Lars Erik Rännar, Mikael Bäckström, and Zhi Jian Shen. "New Metallurgy of Additive Manufacturing in Metal: Experiences from the Material and Process Development with Electron Beam Melting Technology (EBM)." Materials Science Forum 879 (November 2016): 996–1001. http://dx.doi.org/10.4028/www.scientific.net/msf.879.996.

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Анотація:
Additive manufacturing (AM) is becoming one of the most discussed modern technologies. Significant achievements of the AM in metals today are mainly connected to the unprecedented freedom of component shapes this technology allows. But full potential of these methods lies in the development of new materials designed to be used specifically with AM. Proper understanding of the AM process will open up new possibilities, where material and component properties can be specifically tailored by controlling the parameters throughout the whole manufacturing process. Present paper discusses the issues related to the beam melting technologies AM and electron beam welding (EBW). We are speaking of new direction in material science that can be termed “non-stationary metallurgy”, using the examples from material and process development for EBW, electron beam melting (EBM®) and other additive manufacturing methods.
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42

Qu, Kenan, Sebastian Meuren, and Nathaniel J. Fisch. "Collective plasma effects of electron–positron pairs in beam-driven QED cascades." Physics of Plasmas 29, no. 4 (April 2022): 042117. http://dx.doi.org/10.1063/5.0078969.

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Understanding the interplay of strong-field QED and collective plasma effects is important for explaining extreme astrophysical environments like magnetars. It has been shown that QED pair plasma can be produced and observed by passing a relativistic electron beam through an intense laser field. This paper presents in detail multiple sets of 3D QED-particle-in-cell simulations to show the creation of pair plasma in the QED cascade. The beam driven method enables a high pair particle density and also a low particle Lorentz factor, which both play equal roles on exhibiting large collective plasma effects. Finite laser frequency upshift is observed with both ideal parameters (24 PW laser colliding with a 300 GeV electron beam) and with existing technologies (3 PW laser colliding with a 30 GeV electron beam).
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43

Tongov, Manahil. "SURFACING – TECHNOLOGIES AND LAYER PROPERTIES (A REVIEW)." ENVIRONMENT. TECHNOLOGIES. RESOURCES. Proceedings of the International Scientific and Practical Conference 3 (June 20, 2019): 229. http://dx.doi.org/10.17770/etr2019vol3.4180.

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The overview includes the basic methods for obtaining surface layers: arc surfacing - submerged arc surfacing (SAS), tungsten inert gas arc surfacing (TIGS), metal gas surfacing (MIG/MAG), plasma surfacing (PS); electron beam surfacing (EBS); laser surfacing (LS); electroless cladding (ELC); friction stir surfacing (FSS). Layers are applied on carbon steels, low alloyed steels, highly alloyed steels, aluminium alloys, titanium alloys or ductile cast iron substrates. The data on the additive materials used are provided and data on the hardness and wear resistance of the layers is given.
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44

Seniutinas, Gediminas, Armandas Balčytis, Ignas Reklaitis, Feng Chen, Jeffrey Davis, Christian David, and Saulius Juodkazis. "Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies." Nanophotonics 6, no. 5 (June 17, 2017): 923–41. http://dx.doi.org/10.1515/nanoph-2017-0008.

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AbstractThe evolution of optical microscopy from an imaging technique into a tool for materials modification and fabrication is now being repeated with other characterization techniques, including scanning electron microscopy (SEM), focused ion beam (FIB) milling/imaging, and atomic force microscopy (AFM). Fabrication and in situ imaging of materials undergoing a three-dimensional (3D) nano-structuring within a 1−100 nm resolution window is required for future manufacturing of devices. This level of precision is critically in enabling the cross-over between different device platforms (e.g. from electronics to micro-/nano-fluidics and/or photonics) within future devices that will be interfacing with biological and molecular systems in a 3D fashion. Prospective trends in electron, ion, and nano-tip based fabrication techniques are presented.
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45

Neijssen, William, Ben Lich, and Pete Carleson. "Low Vacuum SEMs: Latest Generation Technologies and Applications." Microscopy Today 15, no. 4 (July 2007): 20–25. http://dx.doi.org/10.1017/s1551929500055681.

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Анотація:
Since becoming popular more than a decade ago, low vacuum scanning electron microscopes (SEM) have continued to evolve. The latest systems offer uncompromised performance over an unprecedented range of sample chamber vacuum conditions. Instruments are now available that provide near-nanometer resolution in all vacuum modes and the ability to operate at pressures as high as 4000 Pascals (~30 Torr). Low vacuum operation eliminates much of the sample preparation required for conventional (high vacuum) SEM. Insulating samples can be imaged without conductive coatings. Wet, dirty, outgassing samples can be examined without drying and fixing. Systems can also be configured with a wide range of ancillary capabilities for imaging, analysis, and sample manipulation, including advanced secondary, backscattered, and transmitted electron detection, X-ray spectrometry, electron backscatter diffraction, and focused ion beam (FIB) manipulation. The current generation of systems combine speed, flexibility, repeatability, and ease of use, making them the ideal solution for any laboratory that must satisfy a wide range of imaging and analytical demands.
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46

Olson, N. H., U. Lücken, S. B. Walker, M. T. Otten, and T. S. Baker. "Cryoelectron microscopy and image reconstruction of spherical viruses with spot scan and FEG technologies." Proceedings, annual meeting, Electron Microscopy Society of America 53 (August 13, 1995): 1086–87. http://dx.doi.org/10.1017/s0424820100141809.

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The field emission gun electron microscope (FEG) is a tool that has the potential to achieve near atomic resolution information of biological macromolecules. The FEG provides a beam with higher spatial and temporal coherence and a better phase contrast transfer function than do microscopes with either tungsten or LaB6 filaments. The FEG is also ideal for spot scan imaging applications because it can produce a small, coherent and very bright spot. In spot scan mode the specimen is exposed to an array of nonoverlapping spots rather man a flood beam. This significantly reduces beam-induced specimen drift.Frozen-hydrated samples of cowpea chlorotic mottle (CCMV, Fig. 1A) and cowpea severe mosaic virus (CPSMV, Fig. IB) were examined on a Philips CM12 transmission electron microscope equipped with a standard LaB6 gun and on a Philips CM200 equipped with a field emission gun, respectively. The CM12 was operated at 120kV and was externally controlled by means of a spot scan imaging program which produced a series of 250 nm diameter spots on Kodak SO-163 sheet film.
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47

Hashimoto, Eiko, Tomohiko Yamamoto, Takuya Natsui, Kazuyoshi Koyama, Kazuyuki Demachi, Mitsuru Uesaka, Naoki Nakamura, Masashi Yamamoto, and Eiji Tanabe. "Medical and Nuclear Applications of Micro Electron-Beam Linear Accelerator X-Ray Sources." International Journal of Automation Technology 3, no. 5 (September 5, 2009): 523–32. http://dx.doi.org/10.20965/ijat.2009.p0523.

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Our group is engaged in creating an innovative system in which an X-band linac X-ray source and 12TW50fs laser technologies are applied to medical and nano-technical uses. As pioneers in medical physics for reliable and safe medical radiology, we have endeavored to develop advanced laser beam technologies for cross-sectional and fused applications in the humanities and natural sciences to yield new synergies. This paper describes the developmental outcomes we have achieved to date.
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48

Czvikovszky, T. "Application of Low-Energy Electron-Beam Curing in Plastics Processing and Coating Technologies." Isotopenpraxis Isotopes in Environmental and Health Studies 21, no. 11 (January 1985): 379–83. http://dx.doi.org/10.1080/10256018508623555.

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49

Czvikovszky, T. "Application of low-energy electron-beam curing in plastics processing and coating technologies." Radiation Physics and Chemistry (1977) 26, no. 5 (January 1985): 547–53. http://dx.doi.org/10.1016/0146-5724(85)90207-9.

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50

Bárta, Jozef, Katarína Bártová, Ladislav Schwarz, and Peter Krampoťák. "Electron Beam Welding of Duplex Stainless Steel with Regulated Heat Input." Advanced Materials Research 811 (September 2013): 163–68. http://dx.doi.org/10.4028/www.scientific.net/amr.811.163.

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This paper analyses the current state of welding duplex stainless steel (DSS). Despite of well-known procedures of welding DSS by standard methods, nowadays modern technologies brings several issues. Electron beam welding showed the problems with achieving the similar phase composition to base metal. By changing the focusing distance and using the post-heating it was possible to bring extra heat input to weld joint what promoted the creation of austenite. Post-heating was performed by additional electron beam pass. By modification of welding procedure it was possible to obtain the phase composition very similar to base metal.
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