Статті в журналах з теми "Electromigration-thermomigration"
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Yang, D., Y. C. Chan, B. Y. Wu, and M. Pecht. "Electromigration and thermomigration behavior of flip chip solder joints in high current density packages." Journal of Materials Research 23, no. 9 (September 2008): 2333–39. http://dx.doi.org/10.1557/jmr.2008.0305.
Повний текст джерелаAbdulhamid, Mohd F., Cemal Basaran, and Yi-Shao Lai. "Thermomigration Versus Electromigration in Microelectronics Solder Joints." IEEE Transactions on Advanced Packaging 32, no. 3 (August 2009): 627–35. http://dx.doi.org/10.1109/tadvp.2009.2018293.
Повний текст джерелаShidong Li, Mohd F. Abdulhamid, and Cemal Basaran. "Simulating Damage Mechanics of Electromigration and Thermomigration." SIMULATION 84, no. 8-9 (August 2008): 391–401. http://dx.doi.org/10.1177/0037549708094856.
Повний текст джерелаYao, Wei, and Cemal Basaran. "Computational damage mechanics of electromigration and thermomigration." Journal of Applied Physics 114, no. 10 (September 14, 2013): 103708. http://dx.doi.org/10.1063/1.4821015.
Повний текст джерелаGu, Xin, and Y. C. Chan. "Thermomigration and electromigration in Sn58Bi solder joints." Journal of Applied Physics 105, no. 9 (May 2009): 093537. http://dx.doi.org/10.1063/1.3125458.
Повний текст джерелаGu, X., K. C. Yung, Y. C. Chan, and D. Yang. "Thermomigration and electromigration in Sn8Zn3Bi solder joints." Journal of Materials Science: Materials in Electronics 22, no. 3 (April 18, 2010): 217–22. http://dx.doi.org/10.1007/s10854-010-0116-9.
Повний текст джерелаDohle, Rainer, Stefan Härter, Andreas Wirth, Jörg Goßler, Marek Gorywoda, Andreas Reinhardt та Jörg Franke. "Electromigration Performance of Flip-Chips with Lead-Free Solder Bumps between 30 μm and 60 μm Diameter". International Symposium on Microelectronics 2012, № 1 (1 січня 2012): 000891–905. http://dx.doi.org/10.4071/isom-2012-wp41.
Повний текст джерелаShidong Li, M. F. Abdulhamid, and C. Basaran. "Damage Mechanics of Low Temperature Electromigration and Thermomigration." IEEE Transactions on Advanced Packaging 32, no. 2 (May 2009): 478–85. http://dx.doi.org/10.1109/tadvp.2008.2005840.
Повний текст джерелаLin, Y. H., C. M. Tsai, Y. C. Hu, Y. L. Lin, J. Y. Tsai, and C. R. Kao. "Electromigration Induced Metal Dissolution in Flip-Chip Solder Joints." Materials Science Forum 475-479 (January 2005): 2655–58. http://dx.doi.org/10.4028/www.scientific.net/msf.475-479.2655.
Повний текст джерелаSomaiah, Nalla, and Praveen Kumar. "Tuning electromigration-thermomigration coupling in Cu/W Blech structures." Journal of Applied Physics 124, no. 18 (November 14, 2018): 185102. http://dx.doi.org/10.1063/1.5045086.
Повний текст джерелаChen, Chih, H. M. Tong, and K. N. Tu. "Electromigration and Thermomigration in Pb-Free Flip-Chip Solder Joints." Annual Review of Materials Research 40, no. 1 (June 2010): 531–55. http://dx.doi.org/10.1146/annurev.matsci.38.060407.130253.
Повний текст джерелаBasaran, Cemal, and Mohd F. Abdulhamid. "Low temperature electromigration and thermomigration in lead-free solder joints." Mechanics of Materials 41, no. 11 (November 2009): 1223–41. http://dx.doi.org/10.1016/j.mechmat.2009.07.004.
Повний текст джерелаGu, X., K. C. Yung, and Y. C. Chan. "Thermomigration and electromigration in Sn58Bi ball grid array solder joints." Journal of Materials Science: Materials in Electronics 21, no. 10 (October 13, 2009): 1090–98. http://dx.doi.org/10.1007/s10854-009-9992-2.
Повний текст джерелаBasaran, C., H. Ye, D. C. Hopkins, D. Frear, and J. K. Lin. "Failure Modes of Flip Chip Solder Joints Under High Electric Current Density." Journal of Electronic Packaging 127, no. 2 (September 15, 2004): 157–63. http://dx.doi.org/10.1115/1.1898338.
Повний текст джерелаTu, K. N., and A. N. Gusak. "Mean-Time-To-Failure Equations for Electromigration, Thermomigration, and Stress Migration." IEEE Transactions on Components, Packaging and Manufacturing Technology 10, no. 9 (September 2020): 1427–31. http://dx.doi.org/10.1109/tcpmt.2020.3003003.
Повний текст джерелаIchinokawa, T., C. Haginoya, D. Inoue, and H. Itoh. "Electromigration and thermomigration of metallic islands on the Si(100) surface." Journal of Physics: Condensed Matter 5, no. 33A (August 16, 1993): A405—A406. http://dx.doi.org/10.1088/0953-8984/5/33a/152.
Повний текст джерелаChiu, Tsung-Chieh, and Kwang-Lung Lin. "Electromigration behavior of the Cu/Au/SnAgCu/Cu solder combination." Journal of Materials Research 23, no. 1 (January 2008): 264–73. http://dx.doi.org/10.1557/jmr.2008.0036.
Повний текст джерелаSomaiah, Nalla, and Praveen Kumar. "Effect of Thermomigration–Electromigration Coupling on Mass Transport in Cu Thin Films." Journal of Electronic Materials 49, no. 1 (September 23, 2019): 96–108. http://dx.doi.org/10.1007/s11664-019-07634-4.
Повний текст джерелаFeng, Dandan, Fengjiang Wang, Dongyang Li, Bin Wu, and Luting Liu. "Atomic migration on Cu in Sn-58Bi solder from the interaction between electromigration and thermomigration." Materials Research Express 6, no. 4 (January 7, 2019): 046301. http://dx.doi.org/10.1088/2053-1591/aaf91c.
Повний текст джерелаZhang, Peng, Songbai Xue, and Jianhao Wang. "New challenges of miniaturization of electronic devices: Electromigration and thermomigration in lead-free solder joints." Materials & Design 192 (July 2020): 108726. http://dx.doi.org/10.1016/j.matdes.2020.108726.
Повний текст джерелаShen, Yu-An, and John A. Wu. "Effect of Sn Grain Orientation on Reliability Issues of Sn-Rich Solder Joints." Materials 15, no. 14 (July 21, 2022): 5086. http://dx.doi.org/10.3390/ma15145086.
Повний текст джерелаBecker, H., D. Heger, A. Leineweber, and David Rafaja. "Modification of the Diffusion Process in the Iron-Aluminum System via Spark Plasma Sintering/Field Assisted Sintering Technology." Defect and Diffusion Forum 367 (April 2016): 1–9. http://dx.doi.org/10.4028/www.scientific.net/ddf.367.1.
Повний текст джерелаBaek, Sung-Min, Yujin Park, Cheolmin Oh, Eun-Joon Chun, and Namhyun Kang. "Modeling and Experimental Verification of Intermetallic Compounds Grown by Electromigration and Thermomigration for Sn-0.7Cu Solders." Journal of Electronic Materials 48, no. 1 (November 26, 2018): 142–51. http://dx.doi.org/10.1007/s11664-018-6786-4.
Повний текст джерелаYao, Wei, and Cemal Basaran. "Damage mechanics of electromigration and thermomigration in lead-free solder alloys under alternating current: An experimental study." International Journal of Damage Mechanics 23, no. 2 (May 6, 2013): 203–21. http://dx.doi.org/10.1177/1056789513488396.
Повний текст джерелаKim, Seung-Hyun, Gyu-Tae Park, Jong-Jin Park, and Young-Bae Park. "Effects of Annealing, Thermomigration, and Electromigration on the Intermetallic Compounds Growth Kinetics of Cu/Sn-2.5Ag Microbump." Journal of Nanoscience and Nanotechnology 15, no. 11 (November 1, 2015): 8593–600. http://dx.doi.org/10.1166/jnn.2015.11502.
Повний текст джерелаChen, Hsiao-Yun, and Chih Chen. "Thermomigration of Cu–Sn and Ni–Sn intermetallic compounds during electromigration in Pb-free SnAg solder joints." Journal of Materials Research 26, no. 8 (March 30, 2011): 983–91. http://dx.doi.org/10.1557/jmr.2011.25.
Повний текст джерелаGuo, Fu, Qian Liu, Limin Ma, and Yong Zuo. "Diffusion behavior of Sn atoms in Sn58Bi solder joints under the coupling effect of thermomigration and electromigration." Journal of Materials Research 31, no. 12 (April 15, 2016): 1793–800. http://dx.doi.org/10.1557/jmr.2016.145.
Повний текст джерелаKimura, Yasuhiro, and Yang Ju. "Equilibrium current density balancing two atomic flows in coupled problems of electromigration and thermomigration in unpassivated gold film." AIP Advances 10, no. 8 (August 1, 2020): 085125. http://dx.doi.org/10.1063/5.0011417.
Повний текст джерелаTu, K. N., and A. M. Gusak. "A unified model of mean-time-to-failure for electromigration, thermomigration, and stress-migration based on entropy production." Journal of Applied Physics 126, no. 7 (August 21, 2019): 075109. http://dx.doi.org/10.1063/1.5111159.
Повний текст джерелаHuang, Annie T., K. N. Tu, and Yi-Shao Lai. "Effect of the combination of electromigration and thermomigration on phase migration and partial melting in flip chip composite SnPb solder joints." Journal of Applied Physics 100, no. 3 (August 2006): 033512. http://dx.doi.org/10.1063/1.2227621.
Повний текст джерелаSung, Po-Hsien, and Tei-Chen Chen. "Material Properties of Zr–Cu–Ni–Al Thin Films as Diffusion Barrier Layer." Crystals 10, no. 6 (June 24, 2020): 540. http://dx.doi.org/10.3390/cryst10060540.
Повний текст джерелаLi, Feng, Andrew W. Owens, and Qianyi Li. "Microbump Processing for 3D IC Integration." Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2019, DPC (January 1, 2019): 001028–49. http://dx.doi.org/10.4071/2380-4491-2019-dpc-presentation_wp2_049.
Повний текст джерелаDomenicucci, A. G., B. Cunningham, and P. Tsang. "Characterization of Electrically Pulsed Chromium Disilicide Fusible Links." MRS Proceedings 523 (1998). http://dx.doi.org/10.1557/proc-523-103.
Повний текст джерелаCui, Zhen, Xuejun Fan, Yaqian Zhang, Sten Vollebregt, Jiajie Fan, and Guoqi Zhang. "Coupling Model of Electromigration and Experimental Verification – Part II: Impact of Thermomigration." Journal of the Mechanics and Physics of Solids, March 2023, 105256. http://dx.doi.org/10.1016/j.jmps.2023.105256.
Повний текст джерелаChen, Liang, Sheldon X. D. Tan, Zeyu Sun, Shaoyi Peng, Min Tang, and Junfa Mao. "A Fast Semi-Analytic Approach for Combined Electromigration and Thermomigration Analysis for General Multi-Segment Interconnects." IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2020, 1. http://dx.doi.org/10.1109/tcad.2020.2994271.
Повний текст джерела"Abstracts: General References: Diffusion Processes, Electromigration, Thermomigration, Point Defects, Linear Defects, Planar Defects, Irradiation Effects, Ionic Conduction." Defect and Diffusion Forum 51-52 (January 1987): 275–310. http://dx.doi.org/10.4028/www.scientific.net/ddf.51-52.275.
Повний текст джерела"General References, Diffusion Processes, Electromigration, Thermomigration, Point Deffects, Linear Defects, Planar Defects, Irradiation Effects and Ionic Conduction." Defect and Diffusion Forum 61 (January 1988): 189–232. http://dx.doi.org/10.4028/www.scientific.net/ddf.61.189.
Повний текст джерела"General References, Diffusion Processes, Electromigration, Thermomigration, Point Defects, Linear Effects, Planar Defects, Irradiation Effects and Ionic Conduction." Defect and Diffusion Forum 64-65 (January 1989): 321–58. http://dx.doi.org/10.4028/www.scientific.net/ddf.64-65.321.
Повний текст джерела"General References, Diffusion Processes, Electromigration, Thermomigration, Point Defects, Linear Defects, Planar Defects, Irradiation Effects and Ionic Conduction." Defect and Diffusion Forum 72-73 (January 1990): 265–88. http://dx.doi.org/10.4028/www.scientific.net/ddf.72-73.265.
Повний текст джерелаSemenov, A. S., J. Trapp, M. Nöthe, B. Kieback, and T. Wallmersperger. "Multi‐physics simulation and experimental investigation of the densification of metals by spark plasma sintering." Advanced Engineering Materials, August 9, 2023. http://dx.doi.org/10.1002/adem.202300764.
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