Статті в журналах з теми "Diblock copolymer (DBC) lithography"
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Ознайомтеся з топ-26 статей у журналах для дослідження на тему "Diblock copolymer (DBC) lithography".
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Chervanyov, A. I. "Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks." Polymers 12, no. 8 (July 25, 2020): 1659. http://dx.doi.org/10.3390/polym12081659.
Повний текст джерелаPermyakova, N. M., T. B. Zheltonozhskaya, V. I. Karpovskyi, R. V. Postoi, V. I. Maksin, S. V. Partsevskaya, L. M. Grishchenko, D. O. Klymchuk та V. V. Klepko. "Composition of α-tocopheryl acetate with micellar nanocarriers and the possibility of its use as a biologically active additive". Polymer journal 42, № 4 (10 грудня 2020): 292–306. http://dx.doi.org/10.15407/polymerj.42.04.292.
Повний текст джерелаKuech, Thomas F., and Luke J. Mawst. "Nanofabrication of III–V semiconductors employing diblock copolymer lithography." Journal of Physics D: Applied Physics 43, no. 18 (April 21, 2010): 183001. http://dx.doi.org/10.1088/0022-3727/43/18/183001.
Повний текст джерелаMuramatsu, Makoto. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development." Journal of Micro/Nanolithography, MEMS, and MOEMS 11, no. 3 (July 9, 2012): 031305. http://dx.doi.org/10.1117/1.jmm.11.3.031305.
Повний текст джерелаKunitskaya, Larisa, Tatyana Zheltonozhskaya, Rostyslav Stoika, and Dmytro Klymchuk. "Compositions of Anticancer Drug with Micellar Nanocarriers and Their Cytotoxicity." French-Ukrainian Journal of Chemistry 5, no. 2 (2017): 103–20. http://dx.doi.org/10.17721/fujcv5i2p103-120.
Повний текст джерелаPark, J. H., J. Kirch, L. J. Mawst, C. C. Liu, P. F. Nealey, and T. F. Kuech. "Controlled growth of InGaAs/InGaAsP quantum dots on InP substrates employing diblock copolymer lithography." Applied Physics Letters 95, no. 11 (September 14, 2009): 113111. http://dx.doi.org/10.1063/1.3224916.
Повний текст джерелаYoshida, Shinya, Takahito Ono, and Masayoshi Esashi. "Conductive polymer patterned media fabricated by diblock copolymer lithography for scanning multiprobe data storage." Nanotechnology 19, no. 47 (October 29, 2008): 475302. http://dx.doi.org/10.1088/0957-4484/19/47/475302.
Повний текст джерелаTerekhin, V. V., O. V. Dement’eva, A. V. Zaitseva, and V. M. Rudoy. "Diblock copolymer micellar lithography: 1. Intermicellar interactions and pathways for control of monomicellar film structure." Colloid Journal 73, no. 5 (October 2011): 697–706. http://dx.doi.org/10.1134/s1061933x11050152.
Повний текст джерелаTerekhin, V. V., O. V. Dement’eva, and V. M. Rudoy. "Diblock copolymer micellar lithography: 2. Formation of highly ordered nanoparticle ensembles with controlled geometric characteristics." Colloid Journal 73, no. 5 (October 2011): 707–16. http://dx.doi.org/10.1134/s1061933x11050164.
Повний текст джерелаKim, Honghyuk, Jonathan Choi, Zachary Lingley, Miles Brodie, Yongkun Sin, Thomas F. Kuech, Padma Gopalan, and Luke J. Mawst. "Selective growth of strained (In)GaAs quantum dots on GaAs substrates employing diblock copolymer lithography nanopatterning." Journal of Crystal Growth 465 (May 2017): 48–54. http://dx.doi.org/10.1016/j.jcrysgro.2017.02.046.
Повний текст джерелаChang, Chun-Chieh, Dan Botez, Lei Wan, Paul F. Nealey, Steven Ruder, and Thomas F. Kuech. "Fabrication of large-area, high-density Ni nanopillar arrays on GaAs substrates using diblock copolymer lithography and electrodeposition." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 31, no. 3 (May 2013): 031801. http://dx.doi.org/10.1116/1.4798464.
Повний текст джерелаDirani, Ali, Fabrice Stehlin, Ihab Dika, Arnaud Spangenberg, Nathan Grumbach, Jean-Louis Gallani, Bertrand Donnio, et al. "Orienting the Demixion of a Diblock-copolymer Using 193 nm Interferometric Lithography for the Controlled Deposition of Nanoparticles." Macromolecular Rapid Communications 32, no. 20 (August 16, 2011): 1627–33. http://dx.doi.org/10.1002/marc.201100399.
Повний текст джерелаMastari, Marouane, Matthew Charles, Patricia Pimenta-Barros, Maxime Argoud, Raluca Tiron, Anne-Marie Papon, Nicolas Chevalier, et al. "Ge Nano-Heteroepitaxy: From Nano-Pillars to Thick Coalesced Layers." ECS Transactions 109, no. 4 (September 30, 2022): 317–28. http://dx.doi.org/10.1149/10904.0317ecst.
Повний текст джерелаBorah, Dipu, Cian Cummins, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Mathieu Salaun, Marc Zelsmann, George Liontos, Konstantinos Ntetsikas, Apostolos Avgeropoulos, and Michael Morris. "Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography." Nanomaterials 8, no. 1 (January 9, 2018): 32. http://dx.doi.org/10.3390/nano8010032.
Повний текст джерелаKim, Honghyuk, Wei Wei, Thomas F. Kuech, Padma Gopalan, and Luke J. Mawst. "Impact of InGaAs carrier collection quantum well on the performance of InAs QD active region lasers fabricated by diblock copolymer lithography and selective area epitaxy." Semiconductor Science and Technology 34, no. 2 (January 14, 2019): 025012. http://dx.doi.org/10.1088/1361-6641/aaf8e8.
Повний текст джерелаPrausnitz, John M. "Thermodynamics of structured fluids. Hard science for soft materials." Pure and Applied Chemistry 72, no. 10 (January 1, 2000): 1819–34. http://dx.doi.org/10.1351/pac200072101819.
Повний текст джерелаCao, Wei, Senlin Xia, Michael Appold, Nitin Saxena, Lorenz Bießmann, Sebastian Grott, Nian Li, Markus Gallei, Sigrid Bernstorff, and Peter Müller-Buschbaum. "Self-Assembly in ultrahigh molecular weight sphere-forming diblock copolymer thin films under strong confinement." Scientific Reports 9, no. 1 (December 2019). http://dx.doi.org/10.1038/s41598-019-54648-3.
Повний текст джерелаAlabi, Taiwo R., Dajun Yuan, and Suman Das. "Photopatterneable Block Co-Polymers for Laser Interference Lithography." MRS Proceedings 1412 (2012). http://dx.doi.org/10.1557/opl.2012.1258.
Повний текст джерелаLiu, Guangyu, Hongping Zhao, Jing Zhang, Joo Hyung Park, Luke J. Mawst, and Nelson Tansu. "Selective area epitaxy of ultra-high density InGaN quantum dots by diblock copolymer lithography." Nanoscale Research Letters 6, no. 1 (April 15, 2011). http://dx.doi.org/10.1186/1556-276x-6-342.
Повний текст джерела"InGaAs/InP Quantum Dot Formation Employing Diblock Copolymer Lithography and Selective Growth - Invited Talk." ECS Meeting Abstracts, 2009. http://dx.doi.org/10.1149/ma2009-02/29/2280.
Повний текст джерелаChevalier, Xavier, Gwenaelle Pound-Lana, Cindy Gomes Correia, Sébastien Cavalaglio, Benjamin Cabannes-Boué, Frederic Restagno, Guillaume Miquelard-Garnier, et al. "Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography." Nanotechnology, January 19, 2023. http://dx.doi.org/10.1088/1361-6528/acb49f.
Повний текст джерелаYoshida, Hiroshi, Hirofumi Kitano, Satoshi Akasaka, Tomohiro Inoue, Mikihito Taknaka, Hirokazu Hasegawa, and Hideki Nagano. "Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application." MRS Proceedings 961 (2006). http://dx.doi.org/10.1557/proc-0961-o17-01.
Повний текст джерелаZhang, Yuan, Simone Raoux, Daniel Krebs, Leslie E. Krupp, Teya Topuria, Jean Jordan-Sweet, Marissa Caldwell, Philip Rice, Delia J. Milliron, and H. S. Philip Wong. "Crystallization Characteristics Of Phase Change Nanoparticle Arrays Fabricated By Self-Assembly Based Lithography." MRS Proceedings 1072 (2008). http://dx.doi.org/10.1557/proc-1072-g08-05.
Повний текст джерелаBorah, Dipu, Sozaraj Rasappa, Barbara Kosmala, Justin D. Holmes, and Michael A. Morris. "Block Copolymer Self-assembly on Ethylene Glycol (EG) Self-assembled Monolayer (SAM) for Nanofabrication." MRS Proceedings 1450 (2012). http://dx.doi.org/10.1557/opl.2012.1224.
Повний текст джерелаRamanathan, Muruganathan, Seth B. Darling, Anirudha V. Sumant, and Orlando Auciello. "Self-Assembly of Cylinder-Forming Block Copolymers on Ultrananocrystalline Diamond (UNCD) Thin Films for Lithographic Applications." MRS Proceedings 1203 (2009). http://dx.doi.org/10.1557/proc-1203-j17-15.
Повний текст джерелаPark, Joo Hyung, Anish Khandekar, Sang-Min Park, Luke Mawst, Thomas Kuech, and Paul Nealey. "Selective GaAs Quantum Dot Array Growth using Dielectric and AlGaAs Masks Pattern-Transferred from Diblock Copolymer." MRS Proceedings 1014 (2007). http://dx.doi.org/10.1557/proc-1014-aa07-15.
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