Добірка наукової літератури з теми "Diblock copolymer (DBC) lithography"
Оформте джерело за APA, MLA, Chicago, Harvard та іншими стилями
Ознайомтеся зі списками актуальних статей, книг, дисертацій, тез та інших наукових джерел на тему "Diblock copolymer (DBC) lithography".
Біля кожної праці в переліку літератури доступна кнопка «Додати до бібліографії». Скористайтеся нею – і ми автоматично оформимо бібліографічне посилання на обрану працю в потрібному вам стилі цитування: APA, MLA, «Гарвард», «Чикаго», «Ванкувер» тощо.
Також ви можете завантажити повний текст наукової публікації у форматі «.pdf» та прочитати онлайн анотацію до роботи, якщо відповідні параметри наявні в метаданих.
Статті в журналах з теми "Diblock copolymer (DBC) lithography"
Chervanyov, A. I. "Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks." Polymers 12, no. 8 (July 25, 2020): 1659. http://dx.doi.org/10.3390/polym12081659.
Повний текст джерелаPermyakova, N. M., T. B. Zheltonozhskaya, V. I. Karpovskyi, R. V. Postoi, V. I. Maksin, S. V. Partsevskaya, L. M. Grishchenko, D. O. Klymchuk та V. V. Klepko. "Composition of α-tocopheryl acetate with micellar nanocarriers and the possibility of its use as a biologically active additive". Polymer journal 42, № 4 (10 грудня 2020): 292–306. http://dx.doi.org/10.15407/polymerj.42.04.292.
Повний текст джерелаKuech, Thomas F., and Luke J. Mawst. "Nanofabrication of III–V semiconductors employing diblock copolymer lithography." Journal of Physics D: Applied Physics 43, no. 18 (April 21, 2010): 183001. http://dx.doi.org/10.1088/0022-3727/43/18/183001.
Повний текст джерелаMuramatsu, Makoto. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development." Journal of Micro/Nanolithography, MEMS, and MOEMS 11, no. 3 (July 9, 2012): 031305. http://dx.doi.org/10.1117/1.jmm.11.3.031305.
Повний текст джерелаKunitskaya, Larisa, Tatyana Zheltonozhskaya, Rostyslav Stoika, and Dmytro Klymchuk. "Compositions of Anticancer Drug with Micellar Nanocarriers and Their Cytotoxicity." French-Ukrainian Journal of Chemistry 5, no. 2 (2017): 103–20. http://dx.doi.org/10.17721/fujcv5i2p103-120.
Повний текст джерелаPark, J. H., J. Kirch, L. J. Mawst, C. C. Liu, P. F. Nealey, and T. F. Kuech. "Controlled growth of InGaAs/InGaAsP quantum dots on InP substrates employing diblock copolymer lithography." Applied Physics Letters 95, no. 11 (September 14, 2009): 113111. http://dx.doi.org/10.1063/1.3224916.
Повний текст джерелаYoshida, Shinya, Takahito Ono, and Masayoshi Esashi. "Conductive polymer patterned media fabricated by diblock copolymer lithography for scanning multiprobe data storage." Nanotechnology 19, no. 47 (October 29, 2008): 475302. http://dx.doi.org/10.1088/0957-4484/19/47/475302.
Повний текст джерелаTerekhin, V. V., O. V. Dement’eva, A. V. Zaitseva, and V. M. Rudoy. "Diblock copolymer micellar lithography: 1. Intermicellar interactions and pathways for control of monomicellar film structure." Colloid Journal 73, no. 5 (October 2011): 697–706. http://dx.doi.org/10.1134/s1061933x11050152.
Повний текст джерелаTerekhin, V. V., O. V. Dement’eva, and V. M. Rudoy. "Diblock copolymer micellar lithography: 2. Formation of highly ordered nanoparticle ensembles with controlled geometric characteristics." Colloid Journal 73, no. 5 (October 2011): 707–16. http://dx.doi.org/10.1134/s1061933x11050164.
Повний текст джерелаKim, Honghyuk, Jonathan Choi, Zachary Lingley, Miles Brodie, Yongkun Sin, Thomas F. Kuech, Padma Gopalan, and Luke J. Mawst. "Selective growth of strained (In)GaAs quantum dots on GaAs substrates employing diblock copolymer lithography nanopatterning." Journal of Crystal Growth 465 (May 2017): 48–54. http://dx.doi.org/10.1016/j.jcrysgro.2017.02.046.
Повний текст джерелаДисертації з теми "Diblock copolymer (DBC) lithography"
DIALAMEH, MASOUD. "Fabrication and characterization of reference nano and micro structures for 3D chemical analysis." Doctoral thesis, Politecnico di Torino, 2019. http://hdl.handle.net/11583/2742524.
Повний текст джерелаXiao, Qijun. "Hierarchical multiple bit clusters and patterned media enabled by novel nanofabrication techniques – High resolution electron beam lithography and block polymer self assembly." 2010. https://scholarworks.umass.edu/dissertations/AAI3397756.
Повний текст джерелаТези доповідей конференцій з теми "Diblock copolymer (DBC) lithography"
Kihara, Naoko, Kazutaka Takizawa, and Hiroyuki Hieda. "Fabrication of sub-10-nm pattern using diblock copolymer." In SPIE Advanced Lithography, edited by Frank M. Schellenberg and Bruno M. La Fontaine. SPIE, 2009. http://dx.doi.org/10.1117/12.812210.
Повний текст джерелаChang, Li-Wen, Marissa A. Caldwell, and H. S. Philip Wong. "Diblock copolymer directed self-assembly for CMOS device fabrication." In SPIE Advanced Lithography, edited by Frank M. Schellenberg. SPIE, 2008. http://dx.doi.org/10.1117/12.772000.
Повний текст джерелаHong, Yang, Li-Wen Chang, Albert Lin, and H. S. Philip Wong. "SLICE image analysis for diblock copolymer characterization and process optimization." In SPIE Advanced Lithography, edited by Daniel J. C. Herr. SPIE, 2010. http://dx.doi.org/10.1117/12.848378.
Повний текст джерелаMuramatsu, Makoto, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, and Tsukasa Azuma. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development." In SPIE Advanced Lithography, edited by Daniel J. C. Herr. SPIE, 2011. http://dx.doi.org/10.1117/12.878931.
Повний текст джерелаKihara, Naoko, Hiroyuki Hieda, and Katsuyuki Naito. "NIL mold manufacturing using self-organized diblock copolymer as patterning template." In SPIE Advanced Lithography, edited by Frank M. Schellenberg. SPIE, 2008. http://dx.doi.org/10.1117/12.771630.
Повний текст джерелаChang, Li-Wen, and H. S. Philip Wong. "Diblock copolymer directed self-assembly for CMOS device fabrication." In SPIE 31st International Symposium on Advanced Lithography, edited by Alfred K. K. Wong and Vivek K. Singh. SPIE, 2006. http://dx.doi.org/10.1117/12.661028.
Повний текст джерелаChirasatitsin, Somyot, Priyalakshmi Viswanathan, Giuseppe Battaglia, and Adam J. Engler. "Directing Stem Cell Fate in 3D Through Cell Inert and Adhesive Diblock Copolymer Domains." In ASME 2013 Summer Bioengineering Conference. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/sbc2013-14442.
Повний текст джерелаIzumi, Kenichi, Bongkeun Kim, Nabil Laachi, Kris T. Delaney, Michael Carilli, and Glenn H. Fredrickson. "Barriers to defect melting in chemo-epitaxial directed self-assembly of lamellar-forming diblock copolymer/homopolymer blends." In SPIE Advanced Lithography, edited by Douglas J. Resnick and Christopher Bencher. SPIE, 2015. http://dx.doi.org/10.1117/12.2085685.
Повний текст джерелаBlack, C. T., and R. Ruiz. "Self assembly in semiconductor microelectronics: self-aligned sub-lithographic patterning using diblock copolymer thin films." In SPIE 31st International Symposium on Advanced Lithography, edited by Qinghuang Lin. SPIE, 2006. http://dx.doi.org/10.1117/12.659252.
Повний текст джерелаPeters, Andrew J., Richard A. Lawson, Peter J. Ludovice та Clifford L. Henderson. "Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers". У SPIE Advanced Lithography, редактори William M. Tong та Douglas J. Resnick. SPIE, 2013. http://dx.doi.org/10.1117/12.2021443.
Повний текст джерела