Статті в журналах з теми "Deposited Substrate"
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Panitchakan, H., and Pichet Limsuwan. "The Properties of Al2O3 Films Deposited onto Al2O3-TiC and Si Substrates by RF Diode Sputtering." Applied Mechanics and Materials 313-314 (March 2013): 126–30. http://dx.doi.org/10.4028/www.scientific.net/amm.313-314.126.
Повний текст джерелаde la Garza, María, Israel López, and Idalia Gómez. "In SituSynthesis and Deposition of Gold Nanoparticles with Different Morphologies on Glass and ITO Substrate by Ultrasonic Spray Pyrolysis." Advances in Materials Science and Engineering 2013 (2013): 1–5. http://dx.doi.org/10.1155/2013/916908.
Повний текст джерелаKumar, Varun S., and Murali Sundaram. "A mathematical model for the estimation of hardness of electrochemical deposits." Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering 232, no. 1 (September 28, 2016): 23–28. http://dx.doi.org/10.1177/0954408916671973.
Повний текст джерелаHwang, Cheol Seong, Mark D. Vaudin, and Gregory T. Stauf. "Influence of substrate annealing on the epitaxial growth of BaTiO3 thin films by metal-organic chemical vapor deposition." Journal of Materials Research 12, no. 6 (June 1997): 1625–33. http://dx.doi.org/10.1557/jmr.1997.0222.
Повний текст джерелаZhang, Junze, Hanwen Xu, Zhuanghao Zheng, Cong Wang, Xinru Li, Fu Li, Ping Fan, and Yue-Xing Chen. "Effects of Si Substrates with Variable Initial Orientations on the Growth and Thermoelectric Properties of Bi-Sb-Te Thin Films." Nanomaterials 13, no. 2 (January 7, 2023): 257. http://dx.doi.org/10.3390/nano13020257.
Повний текст джерелаWang, Xin Chang, Bin Shen, and Fang Hong Sun. "Deposition and Characterization of Boron-Doped HFCVD Diamond Films on Ti, SiC, Si and Ta Substrates." Applied Mechanics and Materials 217-219 (November 2012): 1062–67. http://dx.doi.org/10.4028/www.scientific.net/amm.217-219.1062.
Повний текст джерелаSindhu, H. S., Sumanth Joishy, B. V. Rajendra, and P. D. Babu. "Influence of Precursor Solution Concentration on Structure and Magnetic Properties of Zinc Oxide Thin Films." Key Engineering Materials 724 (December 2016): 43–47. http://dx.doi.org/10.4028/www.scientific.net/kem.724.43.
Повний текст джерелаMeng, Fan Tao, Shan Yi Du, and Yu Min Zhang. "Characterization of Silicon Carbide Films Prepared by Chemical Vapor Deposition." Advanced Materials Research 177 (December 2010): 78–81. http://dx.doi.org/10.4028/www.scientific.net/amr.177.78.
Повний текст джерелаTsai, Fa Ta, Chin Tun Chuang, Tsai Cheng Li, and Pei Chi Yu. "Study of Parylene-C Thin Film Deposited on Flat Substrates." Applied Mechanics and Materials 217-219 (November 2012): 1077–82. http://dx.doi.org/10.4028/www.scientific.net/amm.217-219.1077.
Повний текст джерелаYu, J., and S. Matsumoto. "Growth of cubic boron nitride films on tungsten carbide substrates by direct current jet plasma chemical vapor deposition." Journal of Materials Research 19, no. 5 (May 2004): 1408–12. http://dx.doi.org/10.1557/jmr.2004.0188.
Повний текст джерелаSantos, Edson Costa, Katsuyuki Kida, Phil Carroll, and Rui Vilar. "Optimization of Laser Deposited Ni-Based Single Crystal Superalloys Microstructure." Advanced Materials Research 154-155 (October 2010): 1405–14. http://dx.doi.org/10.4028/www.scientific.net/amr.154-155.1405.
Повний текст джерелаIkenaga, Noriaki, Yoichi Kishi, Zenjiro Yajima, and Noriyuki Sakudo. "Influence of Substrate Temperature on Texture for Deposited TiNi Films." Advances in Science and Technology 59 (September 2008): 30–34. http://dx.doi.org/10.4028/www.scientific.net/ast.59.30.
Повний текст джерелаPico, Carey A., and Tom D. Bonifield. "Microstructural characterization of Al98.5wt. %Si1.0wt. %Cu0.5wt. % on chemical-vapor-deposited W." Journal of Materials Research 8, no. 5 (May 1993): 1001–9. http://dx.doi.org/10.1557/jmr.1993.1001.
Повний текст джерелаPrasad, Beesabathina D., L. Salamanca-Riba, S. N. Mao, X. X. Xi, T. Venkatesan, and X. D. Wu. "Effect of substrate materials on laser deposited Nd1.85Ce0.15CuO4−y films." Journal of Materials Research 9, no. 6 (June 1994): 1376–83. http://dx.doi.org/10.1557/jmr.1994.1376.
Повний текст джерелаMilosevic, Nenad. "Optimal parameterization in the measurements of the thermal diffusivity of thermal barrier coatings." Thermal Science 11, no. 1 (2007): 137–56. http://dx.doi.org/10.2298/tsci0701137m.
Повний текст джерелаMittra, Joy, Geogy Jiju Abraham, Manoj Kesaria, Sumit Bahl, Aman Gupta, Sonnada M. Shivaprasad, Chebolu Subrahmanya Viswanadham, Ulhas Digambar Kulkarni, and Gautam Kumar Dey. "Role of Substrate Temperature in the Pulsed Laser Deposition of Zirconium Oxide Thin Film." Materials Science Forum 710 (January 2012): 757–61. http://dx.doi.org/10.4028/www.scientific.net/msf.710.757.
Повний текст джерелаSawa, Sayuki, and Shinzo Yoshikado. "Evaluation of Planar-Type Thin Film ZnO Varistors Fabricated Using Pulsed Laser Ablation." Key Engineering Materials 320 (September 2006): 109–12. http://dx.doi.org/10.4028/www.scientific.net/kem.320.109.
Повний текст джерелаNAWAZ. RIZWAN, M., M. A. KALYAR, C. BELL, M. ANWAR-UL-HAQ, and A. R. MAKHDOOM. "NICKEL THIN FILMS GROWN BY PULSED LASER DEPOSITION: INFLUENCE OF SUBSTRATE AND SUBSTRATE TEMPERATURE." Digest Journal of Nanomaterials and Biostructures 15, no. 4 (December 2020): 1141–51. http://dx.doi.org/10.15251/djnb.2020.154.1141.
Повний текст джерелаMerie, Violeta V., Nicolae V. Burnete, Corina Bîrleanu, and Marius Pustan. "Nanocharacterization of metallic thin films deposited on different substrates." Materials Science-Poland 38, no. 1 (March 1, 2020): 8–16. http://dx.doi.org/10.2478/msp-2019-0095.
Повний текст джерелаJung, Hun Chae, Han Ki Yoon, and Yun Sik Yu. "Mechanical Properties and Process of ZnO Deposited Various Substrates." Key Engineering Materials 297-300 (November 2005): 533–38. http://dx.doi.org/10.4028/www.scientific.net/kem.297-300.533.
Повний текст джерелаLee, Jaeyeong, Kyungchan Min, Youngho Kim, and Hak Ki Yu. "Surface-Enhanced Raman Spectroscopy (SERS) Study Using Oblique Angle Deposition of Ag Using Different Substrates." Materials 12, no. 10 (May 14, 2019): 1581. http://dx.doi.org/10.3390/ma12101581.
Повний текст джерелаHuang, Jen Ching, Yi Chia Liao, Huail Siang Liu, and Fu Jen Cheng. "The Study on Deposition Process and Mechanical Properties of Deposited Cu Thin Films Using Molecular Dynamics." Advanced Materials Research 684 (April 2013): 37–41. http://dx.doi.org/10.4028/www.scientific.net/amr.684.37.
Повний текст джерелаMeyer, Duane E., Natale J. Ianno, John A. Woollam, A. B. Swartzlander, and A. J. Nelson. "Growth of diamond by rf plasma-assisted chemical vapor deposition." Journal of Materials Research 3, no. 6 (December 1988): 1397–403. http://dx.doi.org/10.1557/jmr.1988.1397.
Повний текст джерелаSacken, U. von, and D. E. Brodie. "Structure of vacuum-deposited Zn3P2 films." Canadian Journal of Physics 64, no. 10 (October 1, 1986): 1369–73. http://dx.doi.org/10.1139/p86-243.
Повний текст джерелаFisher, Idajean M., and David A. Smith. "Grain Boundary Migration and the Texture of Films." Textures and Microstructures 13, no. 2-3 (January 1, 1991): 91–99. http://dx.doi.org/10.1155/tsm.13.91.
Повний текст джерелаChen, Yu Ju, and Wen Cheng J. Wei. "Investigation of YSZ Thin Films on Silicon Wafer and NiO/YSZ Deposited by Ion Beam Sputtering Deposition (IBSD)." Key Engineering Materials 336-338 (April 2007): 1788–90. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.1788.
Повний текст джерелаXu, Fang Chao, and Kazuhiro Kusukawa. "Adhesion Strength of BNT Films Hydrothermally Deposited on Titanium Substrates." Advanced Materials Research 123-125 (August 2010): 399–402. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.399.
Повний текст джерелаNan, Junyi, Min Li, Ling Zhang, Shuai Yuan, Boqu He, and Heping Zeng. "Terahertz and Photoelectron Emission from Nanoporous Gold Films on Semiconductors." Nanomaterials 9, no. 3 (March 12, 2019): 419. http://dx.doi.org/10.3390/nano9030419.
Повний текст джерелаZhang, Xiaolin, Yi Ding, Honglu Ma, Ruibin Zhao, Liangquan Wang, and Fanyong Zhang. "Microstructure and Mechanical Properties of Co-Deposited Ti-Ni Films Prepared by Magnetron Sputtering." Coatings 13, no. 3 (February 27, 2023): 524. http://dx.doi.org/10.3390/coatings13030524.
Повний текст джерелаTiwari, Ruchi, and Sudhir Chandra. "Effect of Substrate Temperature on Properties of Silicon Nitride Films Deposited by RF Magnetron Sputtering." Advanced Materials Research 254 (May 2011): 187–90. http://dx.doi.org/10.4028/www.scientific.net/amr.254.187.
Повний текст джерелаYan, Bao Jun, Shu Lin Liu, Xiao Wei Liu, and Ting Ting Jiang. "Effect of Hydrogen Dilution Ratio and Substrate Roughness on the Microstructure of Intrinsic Microcrystalline Silicon Thin Films." Advanced Materials Research 936 (June 2014): 202–6. http://dx.doi.org/10.4028/www.scientific.net/amr.936.202.
Повний текст джерелаMartinschitz, K. J., E. Eiper, S. Massl, H. Köstenbauer, R. Daniel, G. Fontalvo, C. Mitterer, and J. Keckes. "Rapid determination of stress factors and absolute residual stresses in thin films." Journal of Applied Crystallography 39, no. 6 (November 10, 2006): 777–83. http://dx.doi.org/10.1107/s002188980603322x.
Повний текст джерелаMahamood, RM, JO Aweda, KR Ajao, S. AbdulKareem, and HA Ajimotokan. "SCANNING SPEED INFLUENCE ON THE PHYSICAL PROPERTIES OF LASER METAL DEPOSITION TITANIUM ALLOY." Nigerian Journal of Technology 36, no. 1 (December 29, 2016): 132–37. http://dx.doi.org/10.4314/njt.v36i1.17.
Повний текст джерелаHasan, M. K., M. N. A. Shafi, M. N. A. Siddiquy, M. A. Rahim, and M. J. Islam. "Electrical, Magnetic and Morphological Properties of E-Beam Evaporated Ni Thin Films." Journal of Scientific Research 8, no. 1 (January 1, 2016): 21–28. http://dx.doi.org/10.3329/jsr.v8i1.24492.
Повний текст джерелаBrankovic, Zorica, G. Brankovic, A. Tucic, A. Radojkovic, E. Longo, and J. A. Varela. "Aerosol deposition of Ba0.8Sr0.2TiO3 thin films." Science of Sintering 41, no. 3 (2009): 303–8. http://dx.doi.org/10.2298/sos0903303b.
Повний текст джерелаKaludjerovic, Branka V., Vladislava M. Jovanovic, Sanja I. Stevanovic, Zarko D. Bogdanov, Sanja S. Krstic, and Vladimir Dodevski. "Characterization of carbon fibrous material from platanus achenes as platinum catalysts support." Metallurgical and Materials Engineering 26, no. 4 (December 31, 2020): 375–83. http://dx.doi.org/10.30544/588.
Повний текст джерелаSato, Yuichi, Toshifumi Suzuki, Hiroyuki Mogami, Fumito Otake, Hirotoshi Hatori, and Suguru Igarashi. "Solid Phase Growth of some Metal and Metal Oxide Thin Films on Sapphire and Quartz Glass Substrates." Materials Science Forum 753 (March 2013): 505–9. http://dx.doi.org/10.4028/www.scientific.net/msf.753.505.
Повний текст джерелаDe Riccardis, Maria Federica, Daniela Carbone, Emanuela Piscopiello, Antonella Rizzo, and Marco Vittori Antisari. "Sintering of EPD Ceramic Coatings by Electron Beam." Advances in Science and Technology 45 (October 2006): 1200–1205. http://dx.doi.org/10.4028/www.scientific.net/ast.45.1200.
Повний текст джерелаWang, Y. L., M. C. Li, X. K. Chen, G. Wu, J. P. Yang, R. Wang, and L. C. Zhao. "Nano-Polycrystalline Vanadium Oxide Thin Films Prepared by Pulsed Laser Deposition." Journal of Nanoscience and Nanotechnology 8, no. 5 (May 1, 2008): 2604–8. http://dx.doi.org/10.1166/jnn.2008.18290.
Повний текст джерелаGillispie, Meagen A., Maikel F. A. M. van Hest, Matthew S. Dabney, John D. Perkins, and David S. Ginley. "Sputtered Nb- and Ta-doped TiO2 transparent conducting oxide films on glass." Journal of Materials Research 22, no. 10 (October 2007): 2832–37. http://dx.doi.org/10.1557/jmr.2007.0353.
Повний текст джерелаMalshe, A. P., S. M. Chaudhari, S. M. Kanetkar, S. B. Ogale, S. V. Rajarshi, and S. T. Kshirsagar. "Properties of carbon films deposited by pulsed laser vaporization from pyrolytic graphite." Journal of Materials Research 4, no. 5 (October 1989): 1238–42. http://dx.doi.org/10.1557/jmr.1989.1238.
Повний текст джерелаYi, Jiyong, Yinchao Xu, Zhixiong Liu, and Lijuan Xiao. "Effect of TiC Content and TaC Addition in Substrates on Properties and Wear Behavior of TiAlN-Coated Tools." Coatings 12, no. 12 (December 7, 2022): 1911. http://dx.doi.org/10.3390/coatings12121911.
Повний текст джерелаKishi, Yoichi, Noriaki Ikenaga, Noriyuki Sakudo, and Zenjiro Yajima. "Low Temperature Crystallization of Sputter-Deposited TiNi Films." Advances in Science and Technology 78 (September 2012): 81–86. http://dx.doi.org/10.4028/www.scientific.net/ast.78.81.
Повний текст джерелаHAMZAH, ESAH, MUBARAK ALI, and MOHD RADZI HJ MOHD TOFF. "EFFECT OF SUBSTRATE BIAS ON FRICTION COEFFICIENT, ADHESION STRENGTH AND HARDNESS OF TiN-COATED TOOL STEEL." Surface Review and Letters 13, no. 06 (December 2006): 763–71. http://dx.doi.org/10.1142/s0218625x06008827.
Повний текст джерелаNehate, Shraddha Dhanraj, Ashwin Kumar Saikumar, and Kalpathy B. Sundaram. "Influence of Substrate Temperature on Electrical and Optical Properties of Hydrogenated Boron Carbide Thin Films Deposited by RF Sputtering." Coatings 11, no. 2 (February 9, 2021): 196. http://dx.doi.org/10.3390/coatings11020196.
Повний текст джерелаMueller, C. H., P. H. Holloway, J. D. Budai, F. A. Miranda, and K. B. Bhasin. "YBa2Cu3O7−x films on off-axis Y-ZrO2 substrates using Y-ZrO2 or Y2O3 barrier layers." Journal of Materials Research 10, no. 4 (April 1995): 810–16. http://dx.doi.org/10.1557/jmr.1995.0810.
Повний текст джерелаShyju, T. S., S. Anandhi, R. Sivakumar, and R. Gopalakrishnan. "Studies on Lead Sulfide (PbS) Semiconducting Thin Films Deposited from Nanoparticles and Its NLO Application." International Journal of Nanoscience 13, no. 01 (February 2014): 1450001. http://dx.doi.org/10.1142/s0219581x1450001x.
Повний текст джерелаKassem, Wassim, Malek Tabbal, and Mohamad Roumie. "Pulsed Laser Deposition of Tungsten Thin Films on Graphite." Advanced Materials Research 324 (August 2011): 77–80. http://dx.doi.org/10.4028/www.scientific.net/amr.324.77.
Повний текст джерелаSilva de Medeiros, Waléria, Luiz Carlos Pereira, Robson Pacheco Pereira, and Marize Varella de Oliveira. "Characterization of CaP Coating Deposited on Porous Titanium." Key Engineering Materials 396-398 (October 2008): 307–10. http://dx.doi.org/10.4028/www.scientific.net/kem.396-398.307.
Повний текст джерелаSaliy, Ya P., and L. I. Nykyruy. "Influence of surface morphology on electrophysical properties of PbTe: Sb films." Physics and Chemistry of Solid State 22, no. 3 (July 16, 2021): 415–19. http://dx.doi.org/10.15330/pcss.22.3.415-419.
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