Статті в журналах з теми "DC Sputter Deposition"
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Thormählen, Lars, Dennis Seidler, Viktor Schell, Frans Munnik, Jeffrey McCord, and Dirk Meyners. "Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors." Sensors 21, no. 24 (December 15, 2021): 8386. http://dx.doi.org/10.3390/s21248386.
Повний текст джерелаSomekh, R. E., and Z. H. Barber. "UHV sputter deposition with a research-scale DC magnetron." Journal of Physics E: Scientific Instruments 21, no. 11 (November 1988): 1029–33. http://dx.doi.org/10.1088/0022-3735/21/11/005.
Повний текст джерелаKent, Karl, and Milutin Stoilovic. "Development of latent fingerprints using preferential DC sputter deposition." Forensic Science International 72, no. 1 (March 1995): 35–42. http://dx.doi.org/10.1016/0379-0738(94)01671-q.
Повний текст джерелаSonoda, Tsutomu, and Kiyotaka Katou. "Coating of Granular Polymeric Spacers with Copper by Sputter-Deposition for Enhancing Cell Wall Structure of Sintered Highly Porous Aluminum Materials." Materials Science Forum 660-661 (October 2010): 432–36. http://dx.doi.org/10.4028/www.scientific.net/msf.660-661.432.
Повний текст джерелаPark, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.
Повний текст джерелаKharrazi Olsson, M., K. Macák, U. Helmersson, and B. Hjörvarsson. "High rate reactive dc magnetron sputter deposition of Al2O3 films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 2 (March 1998): 639–43. http://dx.doi.org/10.1116/1.581081.
Повний текст джерелаTing, Jyh-Ming, and B. S. Tsai. "DC reactive sputter deposition of ZnO:Al thin film on glass." Materials Chemistry and Physics 72, no. 2 (November 2001): 273–77. http://dx.doi.org/10.1016/s0254-0584(01)00451-5.
Повний текст джерелаSchneider, R., J. Geerk, G. Linker, O. Meyer, and R. Smithey. "Effects of DC bias voltage in sputter deposition of YBaCuO films." Physica C: Superconductivity 235-240 (December 1994): 671–72. http://dx.doi.org/10.1016/0921-4534(94)91559-8.
Повний текст джерелаKoren, G. "DC sputter deposition of YBa2Cu3O7 thin films for two sided coating." Physica C: Superconductivity 209, no. 4 (May 1993): 369–72. http://dx.doi.org/10.1016/0921-4534(93)90547-4.
Повний текст джерелаKellett, B. J., та J. H. James. "Ion beam sputter deposition of YBa2Cu3O7−δ thin films". Journal of Materials Research 8, № 12 (грудень 1993): 3032–42. http://dx.doi.org/10.1557/jmr.1993.3032.
Повний текст джерелаDinh, Cam Thi Mong, Thang Bach Phan, and Hoang Thanh Nguyen. "Synthesis of ZnO nanowires on Ti/glass substrates by DC magnetron sputter deposition." Science and Technology Development Journal 17, no. 2 (June 30, 2014): 47–55. http://dx.doi.org/10.32508/stdj.v17i2.1314.
Повний текст джерелаWu, Wan-Yu, and Jyh-Ming Ting. "Effects of Process Conditions on the Synthesis and Microstructure of Nano-Scale Metal-Containing Amorphous Carbon Thin Films." Journal of Nanoscience and Nanotechnology 8, no. 5 (May 1, 2008): 2623–26. http://dx.doi.org/10.1166/jnn.2008.18294.
Повний текст джерелаSonoda, Tsutomu, Kiyotaka Katou, and Tadashi Asahina. "Porous Structure and Mechanical Properties of the Cellular Metallic Materials Fabricated by Sintering Al Powder Coated with Sn." Materials Science Forum 591-593 (August 2008): 277–81. http://dx.doi.org/10.4028/www.scientific.net/msf.591-593.277.
Повний текст джерелаSangwaranatee, N. W., N. Sangwaranatee, M. Horprathum, C. Chananonnawathorn, and M. Muntini. "DC reactive sputter deposition of CuO thin films at different operating pressures." Materials Today: Proceedings 5, no. 7 (2018): 15166–69. http://dx.doi.org/10.1016/j.matpr.2018.04.076.
Повний текст джерелаKlein, P., B. Gottwald, T. Frauenheim, C. Köhler, and A. Gemmler. "Residual stresses modelled by MD simulation applied to PVD DC sputter deposition." Surface and Coatings Technology 200, no. 5-6 (November 2005): 1600–1603. http://dx.doi.org/10.1016/j.surfcoat.2005.08.120.
Повний текст джерелаR. Agool, Ibrahim, Mohammed K. Khalaf, Shaimaa H. Abd Muslim, and Riyadh N. Talaq. "Reactive DC magnetron sputter deposition and structural properties of NiO thin films." Engineering and Technology Journal 33, no. 6B (July 1, 2015): 1082–92. http://dx.doi.org/10.30684/etj.2015.116476.
Повний текст джерелаShen, Yi, and Ruo He Yao. "Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition." Advanced Materials Research 662 (February 2013): 413–16. http://dx.doi.org/10.4028/www.scientific.net/amr.662.413.
Повний текст джерелаAkhtar, Pervez, T. J. Ali, and R. Mahmud. "An Investigation into the Effects of Substrate Temperature on Magnetic Properties of RF Sputtered NiFe Films." Key Engineering Materials 442 (June 2010): 109–15. http://dx.doi.org/10.4028/www.scientific.net/kem.442.109.
Повний текст джерелаMadsen, N. D., B. H. Christensen, S. Louring, A. N. Berthelsen, K. P. Almtoft, L. P. Nielsen, and J. Bøttiger. "Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina." Surface and Coatings Technology 206, no. 23 (July 2012): 4850–54. http://dx.doi.org/10.1016/j.surfcoat.2012.05.070.
Повний текст джерелаPrabaswara, Aditya, Jens Birch, Muhammad Junaid, Elena Alexandra Serban, Lars Hultman, and Ching-Lien Hsiao. "Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy." Applied Sciences 10, no. 9 (April 27, 2020): 3050. http://dx.doi.org/10.3390/app10093050.
Повний текст джерелаDeshmukh, Pratap, Sergey Yarmolenko, Sudheer Neralla, and Jagannathan Sankar. "Corrosion Analysis of Mg/Al2O3 Bio-Degradable Nanolaminate Thin-Films Fabricated Using DC/Pulsed DC Magnetron-Sputtering Technique." ECS Meeting Abstracts MA2022-02, no. 14 (October 9, 2022): 2596. http://dx.doi.org/10.1149/ma2022-02142596mtgabs.
Повний текст джерелаHoon, Jian Wei, Kah Yoong Chan, and Cheng Yang Low. "XRD Investigations on Film Thickness and Substrate Temperature Effects of DC Magnetron Sputtered ZnO Films." Advanced Materials Research 845 (December 2013): 241–45. http://dx.doi.org/10.4028/www.scientific.net/amr.845.241.
Повний текст джерелаDENG, JINXIANG, GUANGHUA CHEN, and XUEMEI SONG. "CHARACTERIZATION OF CUBIC BORON NITRIDE THIN FILMS DEPOSITED BY RF SPUTTER." International Journal of Modern Physics B 16, no. 28n29 (November 20, 2002): 4339–42. http://dx.doi.org/10.1142/s021797920201539x.
Повний текст джерелаChen, Le, Michael E. Graham, Gonghu Li, and Kimberly A. Gray. "Fabricating highly active mixed phase TiO2 photocatalysts by reactive DC magnetron sputter deposition." Thin Solid Films 515, no. 3 (November 2006): 1176–81. http://dx.doi.org/10.1016/j.tsf.2006.07.094.
Повний текст джерелаFischer, Maria, Mathis Trant, Kerstin Thorwarth, Jörg Patscheider, and Hans Josef Hug. "A setup for arc-free reactive DC sputter deposition of Al-O-N." Surface and Coatings Technology 362 (March 2019): 220–24. http://dx.doi.org/10.1016/j.surfcoat.2019.01.082.
Повний текст джерелаde Jong, Michiel, Victor E. van Enter, and Erik van der Kolk. "DC/RF magnetron sputter deposition and characterisation of Ca3Si2N2O4:Eu2+ luminescent thin films." Journal of Luminescence 164 (August 2015): 52–56. http://dx.doi.org/10.1016/j.jlumin.2015.03.008.
Повний текст джерелаHashimoto, Mituru, Hong Qiu, Tatsuya Ohbuchi, Miklos Adamik, Hisashi Nakai, Arpad Barna, and Peter B. Barna. "Characterization of cobalt films grown on MgO(001) by dc-biased-sputter deposition." Journal of Crystal Growth 166, no. 1-4 (September 1996): 792–97. http://dx.doi.org/10.1016/0022-0248(95)00495-5.
Повний текст джерелаLee, Hanbin, Minjeong Park, Minhyon Jeon, and Byeongcheol Kim. "Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source." Crystals 10, no. 6 (May 26, 2020): 424. http://dx.doi.org/10.3390/cryst10060424.
Повний текст джерелаKrumme, J.-P., V. Doormann, F. Welz, O. Dösssel та H. van Hal. "Ion-beam sputter deposition process for Y1Ba2Cu3O7-δ thin-film structures". Journal of Materials Research 9, № 11 (листопад 1994): 2747–60. http://dx.doi.org/10.1557/jmr.1994.2747.
Повний текст джерелаKaufholz, Marthe, Bärbel Krause, Sunil Kotapati, Martin Köhl, Miguel F. Mantilla, Michael Stüber, Sven Ulrich, Reinhard Schneider, Dagmar Gerthsen, and Tilo Baumbach. "Monitoring the thin film formation during sputter deposition of vanadium carbide." Journal of Synchrotron Radiation 22, no. 1 (January 1, 2015): 76–85. http://dx.doi.org/10.1107/s1600577514024412.
Повний текст джерелаChang, Chi-Lung, Tz-Heng Chiou, Pin-Hung Chen, Wei-Chih Chen, Chun-Ta Ho, and Wan-Yu Wu. "Characteristics of TiN/W 2 N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers." Surface and Coatings Technology 303 (October 2016): 25–31. http://dx.doi.org/10.1016/j.surfcoat.2016.03.086.
Повний текст джерелаWu, Wan Yu, Chia Wei Hsu, and Jyh Ming Ting. "Nanoscaled C, Ni, Pt Thin Films." Journal of Nano Research 6 (June 2009): 29–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.6.29.
Повний текст джерелаAleman, Angel, Chao Li, Hicham Zaid, Hanna Kindlund, Joshua Fankhauser, Sergey V. Prikhodko, Mark S. Goorsky, and Suneel Kodambaka. "Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36, no. 3 (May 2018): 030602. http://dx.doi.org/10.1116/1.5021609.
Повний текст джерелаKharrazi, M., L. Kullman, and C. G. Granqvist. "High-rate dual-target DC magnetron sputter deposition of “blue” electrochromic Mo oxide films." Solar Energy Materials and Solar Cells 53, no. 3-4 (June 1998): 349–56. http://dx.doi.org/10.1016/s0927-0248(98)00033-6.
Повний текст джерелаLöbl, H. P., and M. Huppertz. "Thermal stability of nonstoichiometric silicon nitride films made by reactive dc magnetron sputter deposition." Thin Solid Films 317, no. 1-2 (April 1998): 153–56. http://dx.doi.org/10.1016/s0040-6090(97)00512-9.
Повний текст джерелаMilitello, Maria C., Stephen W. Gaarenstroom, and Steven J. Simko. "Epitaxial Aluminum Nitride Film on Silicon(111) Grown by Reactive DC Magnetron Sputter Deposition." Surface Science Spectra 1, no. 1 (March 1992): 3–7. http://dx.doi.org/10.1116/1.1247668.
Повний текст джерелаSivakumar, Kousik, and S. M. Rossnagel. "Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28, no. 4 (July 2010): 515–22. http://dx.doi.org/10.1116/1.3425640.
Повний текст джерелаBosworth, David, Nadia Stelmashenko, and Zoe H. Barber. "Structural Control of Carbon Nickel Thin Films Without Substrate Heating." MRS Proceedings 1451 (2012): 145–50. http://dx.doi.org/10.1557/opl.2012.1251.
Повний текст джерелаSakkas, Charalampos, Jean-Marc Cote, Joseph Gavoille, Jean-Yves Rauch, Pierre-Henri Cornuault, Anna Krystianiak, Olivier Heintz, and Nicolas Martin. "Tunable Electrical Properties of Ti-B-N Thin Films Sputter-Deposited by the Reactive Gas Pulsing Process." Coatings 12, no. 11 (November 9, 2022): 1711. http://dx.doi.org/10.3390/coatings12111711.
Повний текст джерелаJärrendahl, K., I. Ivanov, J.-E. Sundgren, G. Radnóczi, Zs Czigany, and J. E. Greene. "Microstructure evolution in amorphous Ge/Si multilayers grown by magnetron sputter deposition." Journal of Materials Research 12, no. 7 (July 1997): 1806–15. http://dx.doi.org/10.1557/jmr.1997.0249.
Повний текст джерелаMurray, Jack, Wayne Huebner, Matthew J. O’Keefe, Kristina Wilder, Ryan Eatinger, William Kuhn, Daniel S. Krueger, and J. Ambrose Wolf. "Sputter deposition of thin film MIM capacitors on LTCC substrates for RF bypass and filtering applications." International Symposium on Microelectronics 2011, no. 1 (January 1, 2011): 000747–52. http://dx.doi.org/10.4071/isom-2011-wp3-paper3.
Повний текст джерелаAuret, F. D. "Characterization of defects introduced during dc magnetron sputter deposition of Ti–W on n-Si." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 4, no. 5 (September 1986): 1168. http://dx.doi.org/10.1116/1.583477.
Повний текст джерелаAoi, Takafumi, Nobuto Oka, Yasushi Sato, Ryo Hayashi, Hideya Kumomi, and Yuzo Shigesato. "DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction." Thin Solid Films 518, no. 11 (March 2010): 3004–7. http://dx.doi.org/10.1016/j.tsf.2009.09.176.
Повний текст джерелаPachlhofer, Julia M., Aitana Tarazaga Martín-Luengo, Robert Franz, Enrico Franzke, Harald Köstenbauer, Jörg Winkler, Alberta Bonanni, and Christian Mitterer. "Non-reactive dc magnetron sputter deposition of Mo-O thin films from ceramic MoOx targets." Surface and Coatings Technology 332 (December 2017): 80–85. http://dx.doi.org/10.1016/j.surfcoat.2017.07.083.
Повний текст джерелаSelinder, T. I., G. Larsson, U. Helmersson, S. Rudner, and I. Petrov. "The dc magnetron sputter deposition process of YBa 2 Cu 3 O x thin films." Physica C: Superconductivity and its Applications 162-164 (December 1989): 599–600. http://dx.doi.org/10.1016/0921-4534(89)91166-0.
Повний текст джерелаMeng, Lingling, Qufu Wei, Yueli Li, and Wenzheng Xu. "Effects of plasma pre-treatment on surface properties of fabric sputtered with copper." International Journal of Clothing Science and Technology 26, no. 1 (February 25, 2014): 96–104. http://dx.doi.org/10.1108/ijcst-06-2012-0028.
Повний текст джерелаSonoda, Tsutomu, Akira Watazu, Kazumi Kato, and Tadashi Asahina. "Deposition of Sn-Al Onto Aluminum Powder in Its Self-Convective Motion by DC Sputtering." Materials Science Forum 498-499 (November 2005): 23–27. http://dx.doi.org/10.4028/www.scientific.net/msf.498-499.23.
Повний текст джерелаBecerril-Gonzalez, J. J., A. M. Castro-Chong, G. Oskam, and O. Arés-Muzio. "Sputter deposition of Mo-alumina cermet solar selective coatings: Interrelation between residual oxygen incorporation, structure and optical properties." Materials Research Express 8, no. 10 (October 1, 2021): 105506. http://dx.doi.org/10.1088/2053-1591/ac3042.
Повний текст джерелаSonoda, Tsutomu, Akira Watazu, Kiyotaka Katou, and Tadashi Asahina. "AES Studies on the Ti/N Compositionally Gradient Film Deposited onto Ti-6Al-4V Alloy by Reactive DC Sputtering." Microscopy and Microanalysis 12, no. 4 (July 14, 2006): 356–61. http://dx.doi.org/10.1017/s1431927606060478.
Повний текст джерелаBelkind, A., W. Zhu, J. Lopez, and K. Becker. "Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2thin films." Plasma Sources Science and Technology 15, no. 2 (April 24, 2006): S17—S25. http://dx.doi.org/10.1088/0963-0252/15/2/s03.
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