Готові списки джерел за темами / Clean-room manufacturing

Добірка наукової літератури з теми "Clean-room manufacturing"

Автор: Grafiati
Опубліковано: 14 березня 2023
Оновлено: 1 грудня 2023

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Статті в журналах з теми "Clean-room manufacturing"

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TAKAHASHI, Kozo, and Katsuhito YAGI. "Super clean room system for semiconductor manufacturing." Journal of Environmental Conservation Engineering 14, no. 5 (1985): 416–21. http://dx.doi.org/10.5956/jriet.14.416.

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Quarini, G. L., and Y. C. Chang. "Experimental Measurements and Theoretical Predictions of the Thermohydraulic Performance of Clean Rooms for the Semi-Conductor Industry." Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering 210, no. 1 (February 1996): 9–18. http://dx.doi.org/10.1243/pime_proc_1996_210_288_02.

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There is a need to engineer working areas where air-borne pollution is below specified limits. This need arises from activities as diverse as food processing, semi-conductor manufacture and surgery. In this paper, detailed experimental measurements of flows in a semiconductor manufacturing room are reported. Computational fluid dynamics (CFD) has been used to study the flows within the room. Good agreement was found between the measured and predicted mean flow velocity distributions. Both the experimental measurements and the numerical predictions suggest that the ventilation system used in this room, which is of a common industrial design, does not produce ideal clean room conditions.
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Schneider, Germar, Thi Quynh Nguyen, Matthias Taubert, Julien Bounouar, Catherine Le-Guet, Andreas Leibold, Helene Richter, and Markus Pfeffer. "Contamination Control for Wafer Container Used within 300 mm Manufacturing for Power Microelectronics." Solid State Phenomena 255 (September 2016): 381–86. http://dx.doi.org/10.4028/www.scientific.net/ssp.255.381.

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This paper gives an overview about all activities performed within a common project between industrial and academic partners to define clean room concepts for the first worldwide high volume semiconductor front end facility IFD for 300 mm power semiconductors. The investigation within this study is the base for the 300 mm container strategy resulting in new innovative manufacturing and automation concepts.
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Roth, N., and B. Schneider. "Clean Room Industrial Robot for Handling and Assembly in Semiconductor Industry." CIRP Annals - Manufacturing Technology 42, no. 1 (January 1993): 21–24. http://dx.doi.org/10.1016/s0007-8506(07)62383-x.

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Wang, Fu Guo. "29.1: A Real‐time On‐line Illumination and Light Decline Monitoring Technology." SID Symposium Digest of Technical Papers 54, S1 (April 2023): 191–95. http://dx.doi.org/10.1002/sdtp.16261.

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Mask plays major role in the photolithography process during whole TFT manufacturing. The photolithography process transfers the desired pattern on mask into panel substrate, which forms some portions of device and performs some electric or optical functions. Due to pattern continuously duplicated, a correct pattern shape of mask is very important in the photolithography process. An abnormal pattern will results in huge loss of yield and cost.The haze, a foreign matter grown or deposited on the surface of mask, is already a prevalent phenomenon in TFT photolithography manufacturing or well known in semiconductor manufacturing. It is already well identified that it is highly related to the storage environment of mask, that is, the so called AMC (Airborne Molecular Contamination).A summarized mask haze classification based on past industrial service experience is proposed and a case study result with haze sampling at the site of mask manufacturer is followed in this review to show the understanding of the recently state of the art about mask haze in TFT industry.With the development of industrial technology, the clean room area of TFT panel and semiconductor plant construction project is getting larger and larger (a single clean area of 100,000 square meters), and the investment cost is getting higher and higher. The owners have higher and higher requirements on the cost control and intelligence of the project, including plant construction cost, operating cost and energy saving, which have been highly concerned by the owners. In the actual execution of TFT panels and semiconductor projects, owners often hear the problems about clean room lighting system, which are summarized as follows: The illumination required by the process is 400lux, and the initial design is 600lux. By artificially opening the number of lamps, the attenuation problem of the light source for a long time in the later period is compensated. The owner needs to close several circuits of lamps in the early stage to meet the illuminance requirements of the clean room. If the lamps and lanterns are not closed in the early stage, part of the operation cost and energy waste will be caused; With the passage of time, the illumination of clean room will also decrease with time, and when to what illumination should be opened several circuit lamps, in order to meet the needs of clean room process? But also not waste energy and so on; With the operation of the plant, when can the illumination of the clean room lamps and lanterns not meet the requirements of the process when they are all opened? And when do light fixtures need to be replaced? Part of the lamps are broken. Whether the illuminance of the clean room in this area is much lux, and whether it meets the illuminance demand of the process, etc.; In the illuminance test when the project is completed and handed over to the owner, it is usually done by outsourcing or management personnel at different points to measure manually on the spot, which consumes time and labor cost, and if the instrument measurement is wrong, the amount of newly measured works is relatively huge, etc. When do clean room lamps need to be replaced? The owner will normally deal with the above problems: If more experienced owners turn on or off the number of lamps and lanterns based on their experience, there are also risks of energy waste and insufficient illumination; All open to meet the illuminance demand, there is excessive waste of energy and operation costs; With the passage of time, light source attenuation, part of the lamps are broken, usually artificial field measurement, to confirm whether the lamps need to be replaced, time and labor costs; If the process department doubts the illuminance value of the factory department, it also needs to measure on site or find the data of the completed illuminance test before as the basis, especially the existing clean room renovation project; The measurement of completion acceptance is usually on‐site measurement or outsourcing can provide corresponding data to prove acceptance, etc.; According to the above problems, this paper describes a real‐ time online illuminance and light decline monitoring technology to deal with the actual problems of TFT panel and semiconductor. Automatic control is realized for the closing and opening of the owner's lamps through the cumulative average illuminance, etc., and the requirements of the process illuminance are met to save energy consumption and operating costs; The real‐time cumulative monitoring of the luminescence life curve of this technology is compared with the luminescence life curve provided or tested by the manufacturer, which can confirm the early warning and comparison of the deviation between the actual luminescence life and the luminescence life provided by the manufacturer, so that the owners can purchase or replace the number and area of the luminescence in advance;
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Berthod, Faustine, Lucie Bouchoud, Febronia Grossrieder, Ludivine Falaschi, Salim Senhaji, and Pascal Bonnabry. "Learning good manufacturing practices in an escape room: Validation of a new pedagogical tool." Journal of Oncology Pharmacy Practice 26, no. 4 (September 29, 2019): 853–60. http://dx.doi.org/10.1177/1078155219875504.

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Introduction Chemotherapies are handled using Good Manufacturing Practices, which ensure asepsis and high-quality production. Continuous education is compulsory and usually includes theoretical and practical exercises. Objectives This work aimed to validate an innovative method of teaching good manufacturing practices based on an escape room mixing simulation and gaming. Method Pairs of learners were locked in a simulated clean room (Esclean Room) and had 1 hour to produce a chemotherapy and escape by finding solutions to 23 “Good Manufacturing Practices mysteries” linked to combination locks. To measure the experiment’s impact on teaching, questionnaires including the 23 mysteries (in different orders) were filled in before, just after and one month after escape from the Esclean Room. Pharmacy staff’ degrees of certainty were noted for each question. A satisfaction survey was completed. Results Seventy-two learners (29% senior pharmacists, 14% junior pharmacists, and 57% pharmacy technicians) escaped the Esclean Room and 56 answered every questionnaire. The educational intervention resulted in increases in correct answers and certainty. Correct answers rose from 57% in the first questionnaire to 80% in the third ( p < 0.001). Certainty scores rose from 50% before the experiment to 70% one month afterwards ( p < 0.001). Despite 68% of learners having never taken part in an escape room game before, 79% liked this educational method. Conclusion This study built and tested a pedagogical escape room involving a high risk, professional, pharmacy process. The use of this pharmacy technology simulation had a positive impact on pharmacy staff theoretical knowledge.
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Li, Jianfeng, and Ya-Fei Zhou. "Occupational hazards control of hazardous substances in clean room of semiconductor manufacturing plant using CFD analysis." Toxicology and Industrial Health 31, no. 2 (January 4, 2013): 123–39. http://dx.doi.org/10.1177/0748233712469996.

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Syafei, M. Yani, and Tisa Lokadipati LS. "Improving Work System by Reducing Setup Time Activity in Drying Room in Pharmaceutical Industry with Single Minutes Exchange Die (SMED)." JIE Scientific Journal on Research and Application of Industrial System 3, no. 1 (November 12, 2018): 50. http://dx.doi.org/10.33021/jie.v3i1.497.

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<p>Pharmaceutical industry especially that move in generic products, have many kinds of products to be manufactured in its production lines with the shortest possible time. This condition causes the frequent of changeover process. This cause requires the company to further improve the effectiveness of the machine by reducing the time of changeover process in terms of setup and clean-up machine. In order to reducing the time of setup and clean-up activity use the method of approaches the SMED analysis method to reduce unnecessary motion waste (value added and non-value added derived from lean manufacturing). Before conduct the research, in the 5th production line was not in the Kanban system. So, it often occurs the changeover process. The longest changeover time is in the drying room. After that conduct the Time and Motion Study in order to know the detail setup activities in the drying room. This is due to problems in the working methods and environment factors. Based on data from observations made on the engine FBD, there are 49 activities comprising 44 internal activities and 5 activities that can be converted to an external. Then from 44 internal activities, only 43 were able to be combined activity of up to 11 activities. Results from this study is able to decrease setup time and clean-up on the machine FBD by 62.18%. Based on this result also, this can increase the productivity of the production line.<br />Keywords: Unnecessary motion waste, Lean Manufacturing, Value added, Non-value added, Changeover process, SMED.</p>
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Amin, M. Ruhul, Azizul Haque, Avishek Biswas, and Taufiq Hassan Mozumder. "Preparation and labeling of technitium-99m kit In pharmaceutical grade clean room." Journal of Chemical Engineering 27, no. 2 (January 29, 2014): 31–35. http://dx.doi.org/10.3329/jce.v27i2.17798.

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Technetium-99m radiopharmaceuticals are in widespread use owing to the availability and affordability of 99Mo/99m-Tc generators and the variety of kits for formulating the desired products. Together, they provide an array of specific tools for diagnosing a large number of diseases affecting the bones and major organs of the body such as the heart, brain, liver, kidney and thyroid. Nuclear medicine requires high quality radiopharmaceuticals and kits that are safe for administration and efficacious for a given application. In Bangladesh, no commercial production was done before this. This paper presents the theoretical basis of and describes the procedures for preparing three selected kits. Details of the ingredients are also included. The procedures described here can be used to develop manuals and standard operating procedures in Bangladesh. This report is expected to serve as a guide to radiopharmaceutical manufacturing centers and centralized pharmacies involved in the production of such kits in the current environment of Bangladesh. It will be a useful resource for many hospital radio pharmacy departments that routinely use the kits to compound 99m-Tc radiopharmaceuticals. Three kits namely: MDP, DMSA and DTPA were prepared. Paper Chromatography was involved to disparate the polar and non-polar part of the kit-solution and finally gamma spectrometry (HPGe) to deduce the Radiochemical Purity (RCP). By reviewing purity values, it was found that only DMSA has passed the 95% barrier which is the required percentage for safe application. This paper suggests that the findings require more practice and involve such exquisite points, which will contribute in the production of Tc-99m vivo-kits at Radioisotope Production Division (RIPD), AERE, INST and in their projected future mass production successfully. DOI: http://dx.doi.org/10.3329/jce.v27i2.17798 Journal of Chemical Engineering, IEB Vol. ChE. 27, No. 2, December 2012: 31-35
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Mishra, Devendra Kumar, and Shubham Shukla. "A Concept of Process Validation in Pharmaceutical Industries." International Journal of Innovative Science and Research Technology 5, no. 6 (July 15, 2020): 1427–31. http://dx.doi.org/10.38124/ijisrt20jun1073.

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The aim of the article is to provide a brief presentation and general review on the criticalness of technical support of the pharmaceutical collecting strategy to ensure the security and minimization of the microbial turn of events. The process validation in the manufacturing unit is highly important to verify the surety at each and every stage of production. The microbial danger to aseptically created things in pharmaceutical clean rooms can be reviewed by the use of significant conditions that model the dispersing, move and explanation of microbial contamination, and the usage of numerical characteristics or risk descriptors. This should be conceivable in two-stages, with the primary stage used to overview the trading of contamination from the whole of the sources inside the clean room suite and the resulting stage used to assess both air and surface contact pollution inside fundamental creation locales. These two systems can be used to assess and diminish microbial danger at the basic structure period of the clean room and related collecting processor, brilliantly, for a developed gathering movement. Along these lines, underwriting is a basic piece of value confirmation. This separates the need for pharmaceutical and underwriting, the different ways of thinking, methods, and steps to be checked during the gathering process.
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Дисертації з теми "Clean-room manufacturing"

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PEZZAROSSA, MICHELE. "The deep Al-based JTE: development and industrialization of a novel termination design for high-power semiconductor devices." Doctoral thesis, Politecnico di Torino, 2022. http://hdl.handle.net/11583/2964780.

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Raddenzati, Aurélien. "Optimisation du transport électronique dans le silicium cristallin (c-Si) en présence de nanostructures." Electronic Thesis or Diss., Mulhouse, 2017. https://www.learning-center.uha.fr/.

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Une des limitations dans l'exploitation généralisée de l'énergie photonique principalement d'origine solaireest la limitation du rendement des cellules photovoltaiques (pv) qui ne peut être améliorée aujourd’hui au planindustriel, qu’en utilisant des matériaux chers, rares voire dangereux. Le matériau le plus abondant le moinstoxique à la fabrication et au recyclage, qui aujourd’hui est le moins cher et le mieux maîtriséindustriellement est le silicium, mais la part du spectre lumineux convertible en électricité reste incomplètece qui pour conséquence de limiter le rendement.L’introduction de la nanotechnologie photonique permet par un effet de photoconversion multi-étage horsbandgap d'augmenter le rendement de photoconversion en élargissant le spectre photoconvertible du silicumnatif. La nano-unité opérationnelle du silicium cristallin dans ce cas, est nommée "Segton" qui est unevariante de bilacune organisée en couche enterrée et située à l'interface créé artificiellement entre du siliciumamorphe et du silicium cristallin.Ces travaux font le point sur les démonstrateurs réalisés de cellules à photoconversion géante en particuliersur les derniers moyens technologiques pré-industriels exploités pour ces fabrications notamment a ceux misen œuvre avec différents laboratoires.La thèse propose de nouveaux moyens de caractérisation adaptés à la photoconversion en utilisant laphotoluminescence à basse température.Enfin, un bilan est détaillé sur les activités de simulation, de fabrication et de caractérisation se terminant parune présentation prospective de futures productions industrielles
One of the limitations to the widespread use of photonic energy is the limited efficiency of photovoltaic (PV) cells, which can only be improved industrially today by using expensive, rare and toxic materials or fragile devices. Silicon is the most abundant material, the least toxic to manufacture and recycle. It is also the cheapest and the best mastered industrially. However, the proportion of the light spectrum that can be converted into electricity remains incomplete, which limits its efficiency. The introduction of photonic nanotechnology has made it possible to increase photoconversion efficiency by broadening the photoconvertible spectrum of native silicon and by using a multistage photoconversion effect outside the band gap. The operational nano-unit of crystalline silicon in this case is the "Segton", which is avariant of the divacancy organized as a buried layer and located at the artificially created interface between amorphous and crystalline silicon. This work provides an update on the demonstrators of giânt photoconversion cells, and in particular on the latest pre-industrial technological resources used for this type of production. This was implemented incollaboration with various laboratories. This thesis proposes new characterization methods adapted to photoconversion using the low-temperature photoluminescence spectra in order to detect the good generation of divacancies due to the implementation steps during the fabrication. Finally, the simulation, the manufacturing and the characterization activities are reviewed in detail, ending with a prospective to future industrial production
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Частини книг з теми "Clean-room manufacturing"

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"Essential Clean-Room Design Elements." In Handbook of Pharmaceutical Manufacturing Formulations, Second Edition, Vol 6–109—Vol 6–128. CRC Press, 2009. http://dx.doi.org/10.1201/b14437-110.

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Niazi, Sarfaraz K. "Essential Clean-Room Design Elements." In Handbook of Pharmaceutical Manufacturing Formulations, Third Edition, 109–31. CRC Press, 2019. http://dx.doi.org/10.1201/9781315102498-11.

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Viner, Andrew S. "Predicted and Measured Clean-Room Contamination." In Particle Control for Semiconductor Manufacturing, 129–41. Routledge, 2018. http://dx.doi.org/10.1201/9780203744307-8.

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"Essential Clean-Room Design Elements 111." In Handbook of Pharmaceutical Manufacturing Formulations, 131–50. CRC Press, 2016. http://dx.doi.org/10.3109/9781420081312-16.

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Makimoto, Hiroyuki, Tadashi Ojiro, Mai Shiraishi, Takeshi Hoh, and Kazuo Aoyama. "Development of a Screw Tightening Machine for Elastic Parts on Clean Room Environment." In Robotics, Mechatronics and Manufacturing Systems, 521–27. Elsevier, 1993. http://dx.doi.org/10.1016/b978-0-444-89700-8.50086-5.

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Sem, Gilmore J. "The Dynamics of Aerosols in Clean-Room Environments: Implications for Monitoring and Control of Airborne Particles and their Sources." In Particle Control for Semiconductor Manufacturing, 143–57. Routledge, 2018. http://dx.doi.org/10.1201/9780203744307-9.

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Тези доповідей конференцій з теми "Clean-room manufacturing"

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Brennan, Bill, Kin Sang Lam, Pete Beckage, and Bryon Hance. "Clean room Airborne Molecular Contamination (AMC) on damascene Cu interconnects." In 2007 International Symposium on Semiconductor Manufacturing. IEEE, 2007. http://dx.doi.org/10.1109/issm.2007.4446892.

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Zajic, I., K. J. Burnham, D. Hill, and T. Larkowski. "Temperature model of clean room manufacturing area for control analysis." In UKACC International Conference on CONTROL 2010. Institution of Engineering and Technology, 2010. http://dx.doi.org/10.1049/ic.2010.0460.

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Qian, Wang, and Meng Qinglin. "A New Energy-Saving Air Handling Unit for Clean Operating Room." In 2010 International Conference on Digital Manufacturing and Automation (ICDMA). IEEE, 2010. http://dx.doi.org/10.1109/icdma.2010.321.

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Fukuda, Soji, Tadahiro Ohmi, and Shigetoshi Sugawa. "Development and Practical Application of High-efficiency Fire Control System for the Clean Room." In 2006 International Symposium on Semiconductor Manufacturing (ISSM). IEEE, 2006. http://dx.doi.org/10.1109/issm.2006.4493073.

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Chien, C. C., C. N. Chang, Jefferson Shyu, Eric Hsiao, B. S. Tang, and Liang-Kun Zhu. "Innovative precise-environment design and technology of removing the pollutant from a clean room." In 2013 e-Manufacturing & Design Collaboration Symposium (eMDC). IEEE, 2013. http://dx.doi.org/10.1109/emdc.2013.6756037.

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Giallorenzo, Vito, and Pat Banerjee. "A Virtual Reality Enabling Parameterization of CFD Simulations for Non-Empty Room Layout Design." In ASME 1999 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 1999. http://dx.doi.org/10.1115/imece1999-0176.

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Abstract In this paper, a new approach of establishing the Computational Fluid Dynamics (CFD) - Virtual Reality (VR) design interface is described. Near optimal configuration of all the parameters affecting the contaminant removal is the most important factor that determines the effectiveness of the cleanliness of the indoor air. The main limitation encountered in applying VR to CFD aided design is due to complex and time consuming setup and computation steps of a CFD analysis. Consequently a CFD computation of the airflow pattern is done separately with a traditional CFD solver and then the data is imported in VR. This makes it infeasible to use CFD/VR to analyze a large number of layout design alternatives. A novel method for overcoming this problem has been conceptualized by using a VR preprocessing step. A mathematical expression of the dependence of the contaminant removal effectiveness on room parameters has been developed based on the experimental result. In this way, the selected set of preferred solutions is selected among the enormous number of possible alternatives. The restricted set of room layouts is further investigated by VR analysis of the CFD simulation. This provides insight for an effective positioning of all parameters for room air cleanliness. This two step CFD/VR aided design technique allows overcoming the problems that affect the integration of CFD and VR technique in design of contaminant-free environments. The methodology is well suited for the design of special indoor environments such as tuberculosis hospital facilities, clean rooms and certain electronic, pharmaceutical and chemical manufacturing facility rooms with special contamination control requirements.
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Hawryluk, Andrew M., Gilbert Shelden, and Patrick Troccolo. "EUVL Reticle Factory Model and Reticle Cost Analysis." In Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1996. http://dx.doi.org/10.1364/eul.1996.r54.

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The key issues in reticle manufacturing are cost and delivery time, both of which are dependent upon the yield of the process line. To estimate the cost and delivery time for EUVL reticles in commercial manufacturing, we have developed the first model for an EUV reticle factory which includes all the tools required for a presumed EUVL reticle fabrication process. This model includes the building, support tools and sufficient “in-line” process tools for the manufacture of (more than) 2500 reticles per year. Industry specifications for the tool performance are used to determine the number of tools required per process step and the average number of reticles fabricated per year. Building and capital equipment depreciation costs, tool installation costs, tool maintenance costs, labor, clean room costs, process times and process yields are estimated and used to calculate the yearly operating cost of the reticle factory and the average reticle fabrication cost. We estimate the sales price of an EUV reticle to be $60K for non-critical levels and $120K for “leading-edge. The average reticle fabrication time is calculated for three different process-line yields.
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Share, Dylan, Lakshmi Krishnan, David Lesperence, Daniel Walczyk, and Raymond Puffer. "Cold Pressing of Membrane Electrode Assemblies for High-Temperature PEM Fuel Cells." In ASME 2010 8th International Conference on Fuel Cell Science, Engineering and Technology. ASMEDC, 2010. http://dx.doi.org/10.1115/fuelcell2010-33230.

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With the current economic and environmental situation, the development of affordable and clean energy sources is receiving much attention. One leading area of promise is PEM fuel cells. Presently, manufacture of high temperature Polybenzimidizole (PBI) based PEM Membrane Electrode Assemblies (MEAs) is usually performed by sealing in a thermal press. A typical sealing process requires heated tooling to press electrode-subgasket assemblies into a sol-gel PBI membrane. MEAs designed for transportation purposes have a large active area that requires expensive heated tooling, which in turn requires significant power to operate. A previous Design of Experiments (DoE) and analysis revealed that sealing temperature is a statistically insignificant sealing parameter with respect to MEA performance. To further investigate the effects of sealing temperature on MEA performance in hopes of reducing manufacturing costs, an additional DoE was performed in which MEAs were manufactured with the tooling at room temperature. This paper examines the effect of thermal sealing process parameters, namely: (1) sealing temperature; (2) percent compression, and; (3) seal time on the fuel cell performance. MEAs were manufactured using three different thickness membranes with these input process parameters. Polarization behavior during single cell operation, internal cell resistance and catalyst utilization were analyzed as performance parameters. This data is compared to MEAs made with traditional heated tooling. The analysis reveals the insignificance of sealing temperature on the initial performance of the MEA.
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Perez-Diaz, J. L., I. Valiente-Blanco, E. Diez-Jimenez, J. Sanchez-Garcia-Casarrubios, M. A. Alvarez-Valenzuela, C. Cristache, J. Serrano, et al. "Contactless Superconducting Magnetic Instrument for Precise Positioning in Cryogenic Environments." In ASME 2013 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/imece2013-63742.

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Анотація:
There is an increasing demand of nanotechnology and nano-devices in microelectronics, optics, biomedical and precision engineering industries. In this context, a wide range of applications require micrometer/nanometer positioning within a long range. Ultra precision manufacturing and inspection systems in micro-automating semiconductor fabrication, nanopositioning and nanomeasuring machines (NPM-Machine), development of MEMS and NEMS, copying machines, stepper stages for photolithography, small-scale measuring machines (CMMs) for large area scanning or surface imaging in scanning probe microscopy (SPM) are a few examples of these applications. In some applications, cryogenic environments (temperatures below 120 K) are a desirable or mandatory condition. The sensitivity of a large number of sensors is greatly increased when they are at cryogenics temperatures, like for example, those required for far infrared interferometer spectroscopy. The operating conditions in these environments include very low temperatures but also high vacuum. In this context, it is challenging for mechanisms to overcome all the tribological problems associated with these conditions. In addition very low energy consumption is also desirable in cryogenic environments. The invention here presented is a contactless linear slider that gets benefit of superconducting magnetic levitation to obtain a nanometer resolution within a long stroke (∼ 15 mm), minimizing run-outs of the slider (in the micron scale). Moreover, due to self-stable levitation and guidance of the slider, the complexity of the control is significantly reduced and the power consumption minimized (of the order of mW). The linear slider can be divided in two subsystems: the guidance system and the actuating system. The guidance system is composed of a static guideline, made of two superconducting disks and a slider composed of a long permanent magnet. Due to the high translational symmetry of the magnetic field generated by the PM, a contactless sliding kinematic pair is established between the PM and the superconductors in the sliding DoF. Thus, the slider is able to be moved in the sliding direction with very low resistance. However, greater restoring forces appear if the PM is moved in any other direction. Due to the lack of contact between the moving parts is also suitable for operation in clean-room applications, like in semiconductor manufacturing industry. Ultimately, the device was designed, built and tested in a relevant cryogenic environment (15 K and high vacuum) and the results introduced and discussed.
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