Добірка наукової літератури з теми "Chemical patterning"
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Статті в журналах з теми "Chemical patterning"
Kuznetsov, A., K. Puchnin, and V. Grudtsov. "Methods of surface chemical patterning." Nanoindustry Russia 70, no. 8 (2016): 110–17. http://dx.doi.org/10.22184/1993-8578.2016.70.8.110.117.
Повний текст джерелаGuan, Yuduo, Bin Ai, Zengyao Wang, Chong Chen, Wei Zhang, Yu Wang, and Gang Zhang. "In Situ Chemical Patterning Technique." Advanced Functional Materials 32, no. 2 (October 7, 2021): 2107945. http://dx.doi.org/10.1002/adfm.202107945.
Повний текст джерелаOgaki, Ryosuke, Morgan Alexander, and Peter Kingshott. "Chemical patterning in biointerface science." Materials Today 13, no. 4 (April 2010): 22–35. http://dx.doi.org/10.1016/s1369-7021(10)70057-2.
Повний текст джерелаJACOBY, MITCH. "NANOSCALE PATTERNING." Chemical & Engineering News 82, no. 46 (November 15, 2004): 8. http://dx.doi.org/10.1021/cen-v082n046.p008.
Повний текст джерелаRodríguez González, Miriam C., Alessandra Leonhardt, Hartmut Stadler, Samuel Eyley, Wim Thielemans, Stefan De Gendt, Kunal S. Mali, and Steven De Feyter. "Multicomponent Covalent Chemical Patterning of Graphene." ACS Nano 15, no. 6 (May 28, 2021): 10618–27. http://dx.doi.org/10.1021/acsnano.1c03373.
Повний текст джерелаDupuis, A., J. Léopoldès, D. G. Bucknall, and J. M. Yeomans. "Control of drop positioning using chemical patterning." Applied Physics Letters 87, no. 2 (July 11, 2005): 024103. http://dx.doi.org/10.1063/1.1984098.
Повний текст джерелаLiao, W. S., S. Cheunkar, H. H. Cao, H. R. Bednar, P. S. Weiss, and A. M. Andrews. "Subtractive Patterning via Chemical Lift-Off Lithography." Science 337, no. 6101 (September 20, 2012): 1517–21. http://dx.doi.org/10.1126/science.1221774.
Повний текст джерелаSchift, H., L. J. Heyderman, C. Padeste, and J. Gobrecht. "Chemical nano-patterning using hot embossing lithography." Microelectronic Engineering 61-62 (July 2002): 423–28. http://dx.doi.org/10.1016/s0167-9317(02)00513-0.
Повний текст джерелаWosnick, Jordan H., and Molly S. Shoichet. "Three-dimensional Chemical Patterning of Transparent Hydrogels." Chemistry of Materials 20, no. 1 (January 2008): 55–60. http://dx.doi.org/10.1021/cm071158m.
Повний текст джерелаMourzina, Yulia, Dmitry Kaliaguine, Petra Schulte, and Andreas Offenhäusser. "Patterning chemical stimulation of reconstructed neuronal networks." Analytica Chimica Acta 575, no. 2 (August 2006): 281–89. http://dx.doi.org/10.1016/j.aca.2006.06.010.
Повний текст джерелаДисертації з теми "Chemical patterning"
Zhang, Feng. "Chemical Vapor Deposition of Silanes and Patterning on Silicon." BYU ScholarsArchive, 2010. https://scholarsarchive.byu.edu/etd/2902.
Повний текст джерелаNelson, Kyle A. "Chemical Templating by AFM Tip-Directed Nano-Electrochemical Patterning." BYU ScholarsArchive, 2011. https://scholarsarchive.byu.edu/etd/3188.
Повний текст джерелаChen, Xiao Hua. "Patterning etch masks via the "Grafting-from polymerization." Diss., Georgia Institute of Technology, 2000. http://hdl.handle.net/1853/30768.
Повний текст джерелаVuppalapati, Ragini. "Chemical Modification on Gold Slides to Gain Better Control of Patterning Techniques." TopSCHOLAR®, 2011. http://digitalcommons.wku.edu/theses/1129.
Повний текст джерелаCharest, Joseph Leo. "Topographic and chemical patterning of cell-surface interfaces to influence cellular functions." Diss., Atlanta, Ga. : Georgia Institute of Technology, 2007. http://hdl.handle.net/1853/24621.
Повний текст джерелаCommittee Chair: Dr. William P. King; Committee Member: Dr. Andres J. Garcia; Committee Member: Dr. F. Levent Degertekin; Committee Member: Dr. Hang Lu; Committee Member: Dr. Todd C. McDevitt.
Sajid, N. "Chemical patterning and nano-mechanical measurements for understanding and controlling nerve growth." Thesis, University of Sheffield, 2014. http://etheses.whiterose.ac.uk/6976/.
Повний текст джерелаHendricks, Troy Richard. "Polyelectrolyte multilayer coatings for conductive nanomaterials patterning and anti-wrinkling applications." Diss., Connect to online resource - MSU authorized users, 2008.
Знайти повний текст джерелаCai, Yangjun. "Simple Alternative Patterning Techniques for Selective Protein Adsorption." University of Akron / OhioLINK, 2009. http://rave.ohiolink.edu/etdc/view?acc_num=akron1257386752.
Повний текст джерелаTuft, Bradley William. "Photopolymerized materials and patterning for improved performance of neural prosthetics." Diss., University of Iowa, 2014. https://ir.uiowa.edu/etd/1410.
Повний текст джерелаParry, Kristina Louise. "A novel plasma source for surface chemical patterning and spatial control of cell adhesion." Thesis, University of Sheffield, 2004. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.408370.
Повний текст джерелаКниги з теми "Chemical patterning"
Spruell, Jason M. The Power of Click Chemistry for Molecular Machines and Surface Patterning. New York, NY: Springer Science+Business Media, LLC, 2011.
Знайти повний текст джерелаYu, Shufang. Nanostructure fabrication and patterning for use in chemical separations and sensors. 2003.
Знайти повний текст джерелаSpruell, Jason M. The Power of Click Chemistry for Molecular Machines and Surface Patterning. Springer, 2011.
Знайти повний текст джерелаMcGuiness, C. L., R. K. Smith, M. E. Anderson, P. S. Weiss, and D. L. Allara. Nanolithography using molecular films and processing. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.23.
Повний текст джерелаЧастини книг з теми "Chemical patterning"
Gölzhäuser, Armin. "Chemical Nanolithography: Patterning and Chemical Functionalization of Molecular Monolayers." In Functional Micro- and Nanosystems, 23–34. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-07322-3_4.
Повний текст джерелаCurtis, Adam, and Stephen Britland. "Surface Modification of Biomaterials by Topographic and Chemical Patterning." In Advanced Biomaterials in Biomedical Engineering and Drug Delivery Systems, 158–62. Tokyo: Springer Japan, 1996. http://dx.doi.org/10.1007/978-4-431-65883-2_30.
Повний текст джерелаTadanaga, Kiyoharu, and Mohammad S. M. Saifullah. "UV and E-Beam Direct Patterning of Photosensitive CSD Films." In Chemical Solution Deposition of Functional Oxide Thin Films, 483–515. Vienna: Springer Vienna, 2013. http://dx.doi.org/10.1007/978-3-211-99311-8_20.
Повний текст джерелаMinko, Sergiy, Marcus Müller, Valeriy Luchnikov, Mikhail Motomov, Denys Usov, Leonid Ionov, and Manfred Stamm. "Mixed Polymer Brushes: Switching of Surface Behavior and Chemical Patterning at the Nanoscale." In Polymer Brushes, 403–25. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603824.ch20.
Повний текст джерела"Chemical Patterning." In Encyclopedia of Microfluidics and Nanofluidics, 422. New York, NY: Springer New York, 2015. http://dx.doi.org/10.1007/978-1-4614-5491-5_200350.
Повний текст джерелаVenkata Satya Siva Srikanth, Vadali. "Unique Surface Modifications on Diamond Thin Films." In Engineering Applications of Diamond. IntechOpen, 2021. http://dx.doi.org/10.5772/intechopen.98186.
Повний текст джерелаSeo, Seung-Kwon, Du-Hyeon Cho, Youngsub Lim, and Chul-Jin Lee. "Application of Genetic Algorithm to Layer Patterning of Plate Fin Heat Exchanger." In Computer Aided Chemical Engineering, 2185–90. Elsevier, 2017. http://dx.doi.org/10.1016/b978-0-444-63965-3.50366-4.
Повний текст джерелаSekiguchi, A., and H. Masuhara. "Micrometer patterning of organic materials by selective chemical vapor deposition." In Microchemistry, 147–58. Elsevier, 1994. http://dx.doi.org/10.1016/b978-0-444-81513-2.50016-8.
Повний текст джерелаMaji, Debashis, and Soumen Das. "Buckling-assisted thin-film deposition and lithographic strategies for flexible device patterning." In Chemical Solution Synthesis for Materials Design and Thin Film Device Applications, 309–47. Elsevier, 2021. http://dx.doi.org/10.1016/b978-0-12-819718-9.00001-7.
Повний текст джерелаMüller, F. J., J. C. Gallop, J. R. Laverty, M. A. Angadi, A. D. Caplin, S. Labdi, and H. Raffy. "Patterning of Bi-Sr-Ca-Cu-O thin films by wet chemical etching in EDTA." In High Tc Superconductor Thin Films, 587–91. Elsevier, 1992. http://dx.doi.org/10.1016/b978-0-444-89353-6.50095-6.
Повний текст джерелаТези доповідей конференцій з теми "Chemical patterning"
Katakamsetty, Ushasree, Stefan Voykov, Sascha Bott, Sam Nakagawa, Tamba Gbondo-Tugbawa, Aaron Gower-Hall, Brian Lee, et al. "Wafer level analysis and simulation of back end of line chemical mechanical polishing processes." In DTCO and Computational Patterning, edited by Neal V. Lafferty and Ryoung-Han Kim. SPIE, 2022. http://dx.doi.org/10.1117/12.2616078.
Повний текст джерелаChen, Lu, Nikolaos Bekiaris, Timothy Michaelson, and Glen Mori. "Improved CD uniformity for chemical shrink patterning." In SPIE Advanced Lithography, edited by Clifford L. Henderson. SPIE, 2009. http://dx.doi.org/10.1117/12.814359.
Повний текст джерелаCheng, Q., and K. Komvopoulos. "Surface Chemical Patterning for Controlled Cell Adhesion." In ASME/STLE 2009 International Joint Tribology Conference. ASMEDC, 2009. http://dx.doi.org/10.1115/ijtc2009-15134.
Повний текст джерелаvan Es, Maarten H., Mehmet Selman Tamer, Robbert Bloem, Elfi van Zeijl, Jacques C. J. Verdonck, Adam Chuang, and Diederik J. Maas. "Highly spatially resolved chemical metrology on latent resist images." In Advances in Patterning Materials and Processes XXXIX, edited by Douglas Guerrero and Daniel P. Sanders. SPIE, 2022. http://dx.doi.org/10.1117/12.2614293.
Повний текст джерелаHou, Xisen, Cong Liu, Kevin Rowell, Irvinder Kaur, Mingqi Li, Paul Baranowski, Jong Park, and Cheng Bai Xu. "Chemical trimming overcoat: an advanced composition and process for photoresist enhancement in lithography." In Advances in Patterning Materials and Processes XXXV, edited by Christoph K. Hohle and Roel Gronheid. SPIE, 2018. http://dx.doi.org/10.1117/12.2307674.
Повний текст джерелаVesters, Yannick, Atish Rathore, Pieter Vanelderen, John Petersen, Danilo De Simone, Geert Vandenberghe, and Ivan Pollentier. "Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure." In Advances in Patterning Materials and Processes XXXV, edited by Christoph K. Hohle and Roel Gronheid. SPIE, 2018. http://dx.doi.org/10.1117/12.2299593.
Повний текст джерелаPapis-Polakowska, Ewa, Anna Piotrowska, E. Kaminska, M. Guziewicz, Tadeusz T. Piotrowski, Andrzej Kudla, and A. Wawro. "Chemical processing of GaSb related to surface preparation and patterning." In International Conference on Solid State Crystals 2000, edited by Jaroslaw Rutkowski, Jakub Wenus, and Leszek Kubiak. SPIE, 2001. http://dx.doi.org/10.1117/12.425408.
Повний текст джерелаFujimori, Toru. "Negative-tone imaging (NTI) process for ArF immersion and EUV lithography to improve ‘Chemical Stochastic’." In 2021 International Workshop on Advanced Patterning Solutions (IWAPS). IEEE, 2021. http://dx.doi.org/10.1109/iwaps54037.2021.9671060.
Повний текст джерелаNagahara, Seiji, Cong Que Dinh, Keisuke Yoshida, Gosuke Shiraishi, Yoshihiro Kondo, Kosuke Yoshihara, Kathleen Nafus, et al. "EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity." In Advances in Patterning Materials and Processes XXXVII, edited by Roel Gronheid and Daniel P. Sanders. SPIE, 2020. http://dx.doi.org/10.1117/12.2552166.
Повний текст джерелаMulholland, Matthew M., Shida Tan, Muhammad Usman Raza, Matthew Levesque, Jordan Furlong, Christopher G. L. Ferri, Robert Chivas, Michael DiBattista, and Scott Silverman. "Laser Chemical Etching Trench Refinements for Backside Debug Journey to the Circuit Layer." In ISTFA 2020. ASM International, 2020. http://dx.doi.org/10.31399/asm.cp.istfa2020p0357.
Повний текст джерела