Дисертації з теми "Chemical cleanings"
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Goujon, Christophe. "Conséquences des nettoyages chimiques sur la réactivité de la surface externe des tubes de générateurs de vapeur des centrales nucléaires à réacteur à eau sous pression." Thesis, Paris 6, 2014. http://www.theses.fr/2014PA066723.
Повний текст джерелаIn the secondary circuit of nuclear Pressurized Water Reactors, magnetite (Fe3O4) deposits lead to Steam Generator (SG) fouling, decreasing the thermal performance and possibly enhancing the risk of SG tube cracking. As a counteraction, chemical cleanings have become the primary strategy to remove oxide deposits in SGs of the EDF fleet. The aim of this study is to investigate the effect of chemical cleaning on SG tubes surface reactivity. First, an electrochemical study was performed to deposit magnetite on substrates made of Inconel 600 and 690 (SG tubes materials). Thermodynamic calculations, voltamperometric studies and deposit characterizations were performed to define the experimental protocol. Magnetite films with a thickness up to several dozen on micrometers were grown by cathodic electrodeposition. Then, SG tubes were fouled in a specific experimental loop, FORTRAND. In this device, magnetite and soluble iron were formed and released in solution by carbon steel pipes corrosion in feedwater circuit representative conditions. Then, corrosion products were flow-carried to the autoclave where their precipitation and deposition on heated SG tubes led to tubes fouling. To reproduce surface characteristics of SG tubes surface, a static oxidation step was first performed in FORTRAND autoclave and result in the formation of a fully covering passive layer on the SG tubes surface.Then in-situ fouling test was done by recirculation in FORTRAND test loop. The magnetite deposit formed on tubes was composed of a dense layer of small crystals. Second, chemical cleaning processes were applied on fouled substrates and tubes in a specific experimental device ECCLIPS designed for this purpose. SG industrial cleaning processes timing and thermochemical conditions were strictly respected during these operations and lead to the dissolution of most of the fouling deposit. The passive layer was still covering the whole surface of the tube and no variation in its thickness or composition was noticed which could indicate that chemical cleaning have no effect on the SG tubes integrity. Finally, cleaned tubes fouling was performed in FORTRAND in the same experimental conditions as before the cleaning test. It could be concluded that there is no effect of chemical cleaning on the fouling kinetics of SG tubes for a short period as the amount of deposit formed before and after cleaning was identical. Nevertheless, the small crystallite dense layer observed before cleaning was not present on cleaned tubes and the size of crystallites were bigger after cleaning. For a short period, this morphology could result in the formation of a fouling deposit with more porosity. As the increase of deposit porosity can impact the thermal transfer at the SG tube surface, morphology changes, hardly predictible, could be important for the SG thermal performance after chemical cleaning. For a longer period, frequent SG cleaning applications should prevent the densification of the deposit and thus delay performance loss over time
Bartlett, Meloney. "Chemical cleaning of fouled membrane systems." Thesis, University of Bath, 1998. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.285409.
Повний текст джерелаAbdullah, Syed Zaki. "Membrane ageing due to chemical cleaning agent." Thesis, University of British Columbia, 2014. http://hdl.handle.net/2429/46862.
Повний текст джерелаShorrock, Chris. "Membrane cleaning : cleaning-in-place of a microfiltration membrane fouled during yeast harvesting." Thesis, University of Bath, 1999. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.285410.
Повний текст джерелаBird, Michael Roger. "Cleaning of food process plant." Thesis, University of Cambridge, 1993. https://www.repository.cam.ac.uk/handle/1810/251541.
Повний текст джерелаPorcelli, Nicandro. "Chemical cleaning of potable microfiltration and ultrafiltration membranes." Thesis, Cranfield University, 2009. http://dspace.lib.cranfield.ac.uk/handle/1826/4659.
Повний текст джерелаMoitsheki, Lesego Johannes. "Nanofiltration : fouling and chemical cleaning / Lesego Johannes Moitsheki." Thesis, North-West University, 2003. http://hdl.handle.net/10394/391.
Повний текст джерелаThesis (M.Sc. (Chemistry))--North-West University, Potchefstroom Campus, 2004.
Pérez, Mohedano Raúl. "Cleaning principles in automatic dishwashers." Thesis, University of Birmingham, 2016. http://etheses.bham.ac.uk//id/eprint/6590/.
Повний текст джерелаLawing, Andrew S. (Andrew Scott). "Gas-phase cleaning of silicon wafer surfaces." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/38852.
Повний текст джерелаGoode, Kylee Rebecca. "Characterising the cleaning behaviour of brewery foulants, to minimise the cost of cleaning in place operations." Thesis, University of Birmingham, 2012. http://etheses.bham.ac.uk//id/eprint/3908/.
Повний текст джерелаNg, Dedy. "Nanoparticles removal in post-CMP (Chemical-Mechanical Polishing) cleaning." Thesis, Texas A&M University, 2005. http://hdl.handle.net/1969.1/4159.
Повний текст джерелаMallon, James M. "Floc structure and the improvement of chemical water cleaning." Thesis, Queen's University Belfast, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.324839.
Повний текст джерелаDin, Rizwan. "Chemical cleaning of starch based deposits from hard surfaces." Thesis, University of Bath, 1999. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.311234.
Повний текст джерелаWeis, Andreas. "Fouling and cleaning synergy in ultrafiltration membrane systems : chemical cleaning after filtration of spent sulphite liquor." Thesis, University of Bath, 2004. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.425883.
Повний текст джерелаStephen, Christopher Mark. "Filtration and cleaning behaviour of rigid ceramic filters." Thesis, University of Surrey, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337002.
Повний текст джерелаHan, Yong-Pil 1962. "HF vapor etching and cleaning of silicon wafer surfaces." Thesis, Massachusetts Institute of Technology, 1999. http://hdl.handle.net/1721.1/32698.
Повний текст джерелаIncludes bibliographical references.
The objectives of this project are to understand the reaction mechanisms for oxide etching by both HF/H2 0 and HF/alcohol processes and to develop a vapor phase HF cleaning process to remove metallic contamination and native oxide on a silicon surface. Although the HF vapor process has been studied intensively for past several decades, the commercial application has not been very successful due to the unknown nature of the process. This study, performed at MIT, has emphasized on finding possible applications to the semiconductor industry as a replacement to the aqueous phase cleaning processes. The ultimate purpose of this project is to demonstrate feasibility of the HF vapor process for a vacuum compatible and clustered cleaning process. In this study, the etching experiments were carried out in a stainless steel vacuum chamber connected to a vacuum wafer transfer system. Samples were introduced through a load lock chamber and transferred to the HF vapor reaction chamber. The base pressure of the system was maintained under 10-7 Torr. The system can handle sample sizes between 1 cm square and 10 cm diameter silicon wafers. The etching rates were measured by an in situ ellipsometer installed on the HF vapor reactor. Ellipsometric measurements suggest that oxide etching can occur without a condensed layer or with a condensed layer on the oxide surface. The etching rates of oxide in the condensed regime were very high (3,000-12,000 A/min) compared to the gas phase regime (0-300 A/min). The etching regime in which a condensed layer is formed is a function of not only the partial pressures of HF and H 20 in the feed gas, but also a function of the mass transport of the products from the sample in the gas phase. We have categorized two different etching regimes: the gas phase regime and the condensed phase regime. In the gas phase etching regime, reactant molecules are adsorbed on the oxide surface in sub-monolayer, monolayer, or multilayer films. In the multilayer adsorption regime, the etching rate is usually low (typically 0-400 A/min) and is linearly proportional to the partial pressure of HF and H20. The etching rate in this regime is greatly affected by the temperature of the substrate. The mass transfer rate limits the etch rate of oxide in the multilayer adsorption regime. In the submonolayer or monolayer adsorption regime the etching rate is described by Langmuir- Hinshelwood kinetics. The etching rate is governed by surface kinetics in this regime. Advantages of this etching regime are: 1) smoother etched surface, 2) low selectivity to TEOS, 3) haze-free etched surface, 4) no metal attack, 5) perfect removal of native oxide, and 6) vacuum compatible process. The HF vapor process in this regime is an ideal process for contact cleaning and polymer removal after metal or via etching. Electrostatic charge on the wafer surface affects the etching reaction significantly in the non-condensed regimes. A positively charged surface enhanced the etching reaction in the submonolayer and monolayer etching regimes. Direct ionization of HF on the oxide surface is responsible for the enhancement in this regime. A negatively charged surface mainly enhanced the etching in the multilayer regime. A thicker multilayer, induced by the formation of fluorosilicate, is responsible for the etching enhancement in this regime. We have demonstrated a successful removal of sodium from both oxide and silicon surfaces using HF/H2 0, HF/IPA, and HF/H20/SiF4 processes in reduced pressure operation. All experiments were performed in a vacuum environment and in-situ XPS was used to measure the surface concentration of sodium. The sodium contamination on oxide surface was successfully removed by both HF/H 20 and HF/IPA processes. The HF/H 20 process could not remove all of sodium contamination on a silicon surface. The addition of SiF4 in the HF/H 20 process greatly enhances the cleaning effect, reducing Na contamination below the detection limit of our XPS, even on a silicon surface. Based on our study, we have reported a true gas phase and vacuum compatible HF vapor process, operated in the monolayer adsorption regime at elevated temperature. A successful removal of RIE residue was performed with a combined cleaning procedure of HF vapor and ashing process. This combined process is a perfect dry cleaning process for contact cleaning method. This process sequence is ideal for a vacuum cluster configuration in which a single wafer is processed at a time and is not exposed in the ambient.
by Yong-Pil Han.
Ph.D.
Puspitasari, Vera Liany Chemical Sciences & Engineering Faculty of Engineering UNSW. "Membrane cleaning and ageing effect by chemical and enzymatic agents." Awarded by:University of New South Wales. Chemical Sciences & Engineering, 2009. http://handle.unsw.edu.au/1959.4/43731.
Повний текст джерелаUl, Hai Irfan. "Bubbling fluidized bed biomass gasification and product gas cleaning." Thesis, University of Nottingham, 2017. http://eprints.nottingham.ac.uk/43678/.
Повний текст джерелаMacDonald, John. "The effects of commercial chemical cleaning processes on sandstones in Scotland." Thesis, Robert Gordon University, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.386363.
Повний текст джерелаKent, Anthony Clifford. "The mechanics of abrasion relating to household cleaning." Thesis, University of Birmingham, 2016. http://etheses.bham.ac.uk//id/eprint/6954/.
Повний текст джерелаAn, Ju Jin. "Study of surface kinetics in PECVD chamber cleaning using remote plasma source." Thesis, Massachusetts Institute of Technology, 2008. http://hdl.handle.net/1721.1/43204.
Повний текст джерелаIncludes bibliographical references (p. 132-136).
The scope of this research work is to characterize the Transformer Coupled Toroidal Plasma (TCTP); to understand gas phase reactions and surface reactions of neutrals in the cleaning chamber by analyzing the concentration of neutrals in downstream cleaning process chamber; and to make a global model that predicts the partial pressure of active species in the cleaning chamber. The final goal is to set-up an optimal cleaning process using the results from the experiment and the global model. The first object is to characterize the TCTP and the power consumed by plasma is measured as one approach to the characterization of plasma. MKS Astex plasma source has a very high power density. Compared to a typical industrial plasma source, the power density of the TCTP source is two orders of magnitude higher. The extremely high power density makes the plasma source very unique and its parameters very different from other plasma sources. It is discussed that there are several factors that affect the plasma power consumption. One factor is the flow rate of inlet gas and the elevated pressure due to the high flow rate of inlet gas increases the power consumption. Experimentally it is observed that the plasma power is linearly dependent upon the plasma source pressure, not upon the process chamber pressure. Another factor of controlling the power consumption is the resistivity of gases. For example, the bonding energy of N-F in NF3 gas is different from the bonding energy of C-F bonding in C2F6. Experimental result shows that C2F6 + 02 gas requires more power than NF3 gas to dissociate in the plasma due to the different resistivity. The second object is to understand gas phase reactions and surface reactions among neutrals in the cleaning chamber. The effect of nitric oxide as a silicon nitride etching enhancement factor is discussed.
(cont.) It is shown that only 4.5% of additives (02, CO and CO2) into NF3 discharge doubles nitride etching rate and the enhancement of etching rate occurs regardless of the additive types. The enhancement results from the production of NO in the discharge of NF3 gas mixture. As the amount of oxygen containing additive increases, the amount of NO increases. However, atomic fluorine decreases as the amount of oxygen containing additive increases because the additive dilutes NF3 plasma. At low process chamber pressure, the effect of NO is offset by the dilution effect of atomic fluorine. At high pressure, addition of oxygen enhances the recombination of atomic fluorine and 25% of 02 in NF3 discharge decreases 54% of atomic fluorine. Therefore, the effect of a decrease in atomic fluorine is remarkably higher than the effect of increase in the concentration of NO by adding 02 at high pressure, which leads to a decrease of nitride etching rate at 5torr. Also, the nitride etching rates of NF3 plasma and NF3/C2F/O2 plasma are compared and it is shown that NF3/C2F/O02 plasma brings better performance than NF3 plasma in increasing the nitride etching rate. The main reason why the nitride etching rate of NF3/C2F6/02 plasma is higher than that of NF3 plasma is because nitric oxide is formed in the gas phase of NF3/C2FdO2 plasma and the nitric oxide reacts with the nitrogen atom on the silicon nitride surface producing N20 or N2, while nitrogen is substituted by oxygen on the surface by the reaction. Removing nitrogen atom from silicon nitride substrate is assumed to be the rate-limiting step in the fluorine base etching of silicon nitride film. In summary, the nitric oxide makes it easier to remove the nitrogen atom from silicon nitride surface in the presence of atomic fluorine, which is the rate-limiting step for nitride etching with F base gas, therefore enhancing silicon nitride etching rate. The last object is to make a global model to predict the partial pressure of neutrals in downstream.
(cont.) It is shown that incorporating kinetics into the global modeling of PECVD chamber cleaning system successfully enables the prediction of the partial pressure of atomic fluorine in NF3/N2 and NF3/02 discharge, which is crucial in estimating cleaning rate of TEOS film. First of all, effect of nitrogen addition in NF3 discharge is experimentally investigated by measuring the etching rates of TEOS film and the partial pressure of neutral species. Both modeling results and experimental results make a good agreement that the addition of nitrogen in NF3 has advantage in increasing TEOS etching rate at high chamber pressure. In other words, at high chamber pressure, TEOS etching rate is increased by adding nitrogen in NF3 plasma. Then, the effect of oxygen in NF3 discharge is studied. TEOS film etching rates and partial pressure of atomic fluorine in the gas phase shows that adding oxygen in NF3 discharge increases F-F recombination, which lowers TEOS etching rate. By incorporating the above kinetics information in the global model, the partial pressure of neutral species in NF3/02 discharge is successfully predicted by the global model.
by Ju Jin An.
Ph.D.
Alharthi, Majed. "Fouling and cleaning studies of protein fouling at pasteurisation temperatures." Thesis, University of Birmingham, 2014. http://etheses.bham.ac.uk//id/eprint/4892/.
Повний текст джерелаBenjamin, Michael L. "Cleaning Product Chemical Exposures Measured in a Simulated Home Healthcare Work Environment." University of Cincinnati / OhioLINK, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1573224213774289.
Повний текст джерелаReza, Humayun. "Cleaning and restoring old masonry buildings : investigations of physical and chemical characteristics of masonry stones and clay bricks during cleaning." Thesis, Edinburgh Napier University, 2014. http://researchrepository.napier.ac.uk/Output/8851.
Повний текст джерелаDomingues, Joana Andreia Lameiras. "Spectroscopy studies on conservation issues in modern and contemporary paintings." Master's thesis, Faculdade de Ciências e Tecnologia, 2010. http://hdl.handle.net/10362/4480.
Повний текст джерелаModern and contemporary paintings are one of today’s grand challenges in conservation of cultural heritage. Particularly, these paintings have often been retouched using materials rather similar to originals, thus, compromising the reversibility of the overpainting. In this work, FTIR and Raman spectroscopies, assisted by optical microscopy, were used to evaluate the effectiveness and harmfulness of chemical and laser cleaning methods for the removal of overpaints. Representative mock-ups prepared with commercial paint formulations were used. The laser cleaning experiment was part of an interdisciplinary study which aims the evaluation of method’s limitations by using the most aggressive cleaning parameters. The combined use of FTIR and Raman spectroscopies could identify constituent materials of modern paints, controlling their behaviour under cleaning, while optical microscopy allowed the evaluation on surface morphology. In addition, equivalent portable equipments from MOLAB were covered as a preparation for in situ analysis. Several problems in the selective removal of overpaints were found with chemical cleaning. The laser cleaning showed better efficiency in removing them, although, some alterations occurred upon laser irradiation, for instance, binder degradation with carbon formation and titanium white alteration. The proposed spectroscopic protocol was considered useful for controlling different cleaning methods in modern and contemporary paintings.
Palabiyik, Ibrahim. "Investigation of fluid mechanical removal in the cleaning process." Thesis, University of Birmingham, 2013. http://etheses.bham.ac.uk//id/eprint/4593/.
Повний текст джерелаMacháček, Martin. "Měření doby života nosičů proudu ve strukturách křemíkových solárních článků." Master's thesis, Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií, 2009. http://www.nusl.cz/ntk/nusl-217834.
Повний текст джерелаNovak, Maria L. "Optimal Strategy to Develop Cleaning Procedures for Filling Machines Equipped with Clean-in-Place (CIP) Technology." University of Cincinnati / OhioLINK, 2020. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1613747962470201.
Повний текст джерелаDieudonne, Vincent. "Chemical and Electrochemical Coal Cleaning in acidic medium application and analysis of the process." Thesis, Virginia Tech, 1988. http://hdl.handle.net/10919/43846.
Повний текст джерелаCole, Pamela Anne. "Cleaning of toothpaste from process equipment by fluid flow at laboratory and pilot scales." Thesis, University of Birmingham, 2013. http://etheses.bham.ac.uk//id/eprint/4128/.
Повний текст джерелаStefanov, Bozhidar. "Photocatalytic TiO2 thin films for air cleaning : Effect of facet orientation, chemical functionalization, and reaction conditions." Doctoral thesis, Uppsala universitet, Fasta tillståndets fysik, 2015. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-265056.
Повний текст джерелаGRINDOOR
Emmerich, Jodi. "Cost analysis on the use of chamber cleaning agents nitrogen trifluoride and chlorine trifluoride in the semiconductor industry." Online version, 1999. http://www.uwstout.edu/lib/thesis/1999/1999emmerichj.pdf.
Повний текст джерелаLütkenhaus, Davidson. "Engineering understanding of cleaning : effect of chemistry and mechanical forces on soil removal." Thesis, University of Birmingham, 2017. http://etheses.bham.ac.uk//id/eprint/7929/.
Повний текст джерелаPeng, Hui. "The treatment of bilge water using a MF/UF hybrid membrane system: Membrane fouling, cleaning and the effect of constituents on flux decline." Thesis, University of Ottawa (Canada), 2002. http://hdl.handle.net/10393/6110.
Повний текст джерелаYoung, Maureen Elinor. "Biological growths and their relationship to the physical and chemical characteristics of sandstones before and after cleaning." Thesis, Robert Gordon University, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.336619.
Повний текст джерелаHan, Zhenxing. "Particle Removal and Feature Damage Reduction Using Carbonated Ammonia Solutions for Enhanced Megasonic Cleaning Processes." Diss., The University of Arizona, 2013. http://hdl.handle.net/10150/306364.
Повний текст джерелаGilabert, Oriol Guillem. "Optimization of ultrafiltration membrane cleaning processes. Pretreatment for reverse osmosis in seawater desalination plants." Doctoral thesis, Universitat Rovira i Virgili, 2013. http://hdl.handle.net/10803/108954.
Повний текст джерелаThis thesis gives an overview on how to improve efficiency of the ultrafiltration filtration process in seawater desalination. This is achieved by optimizing different cleaning processes such as the backwash and the chemical enhanced backwash. Key success factors rely on reducing the number of backwash steps, improving the backwash frequency, using reverse osmosis brine for backwashing and reducing the chemical consumption. A new methodology to analyze these cleanings cycles is proposed through modeling the process. Different fibers types are also analyzed according to its permeability and its fouling tolerance. A methodology to prevent reverse osmosis chlorination from upstream chemical enhanced backwash cleaning is presented. All the findings are validated through real plant operating data. The proposed improvements increase the process efficiency to 98% and lead to a 7% cost reduction in the ultrafiltration process.
Van, Dyke Stephanie A. "An analysis of chlorine trifluoride as an effective substitute for nitrogen triflouride in the chemical vapor deposition reactor cleaning process." Online version, 1998. http://www.uwstout.edu/lib/thesis/1998/1998vandykes.pdf.
Повний текст джерелаFrýba, Lukáš. "Analýza alternativ odstraňování PCDD/F při spalování odpadů." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2011. http://www.nusl.cz/ntk/nusl-229471.
Повний текст джерелаPeck, Oliver. "An investigation into the strength and thickness of biofouling deposits to optimise chemical, water and energy use in industrial process cleaning." Thesis, University of Bath, 2017. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.723340.
Повний текст джерелаGupta, Apoorv. "Vätgaslagring, -distribution och -rening." Thesis, KTH, Skolan för kemivetenskap (CHE), 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-213674.
Повний текст джерелаElfverson, Cajsa. "Analysis of physical and chemical properties of fractionated grains and seeds with an emphasis on barley /." Uppsala : Swedish Univ. of Agricultural Sciences (Sveriges lantbruksuniv.), 1999. http://epsilon.slu.se/avh/1999/91-576-5708-4.pdf.
Повний текст джерелаStanton, David. "Coloured, photocatalytic coatings for self-cleaning and architectural glazing applications : precursors and processes for the aerosol-assisted chemical vapour deposition of functional coatings on glass." Thesis, University of Bath, 2016. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.681056.
Повний текст джерелаFlückiger, Peter Henri. "The use of life-cycle assessment and product risk assessment within application development of chemicals : a case study of perchloroethylene use in dry cleaning /." [S.l.] : [s.n.], 1999. http://e-collection.ethbib.ethz.ch/show?type=diss&nr=13047.
Повний текст джерелаMonteiro, Patricia Guerreiro. "Análise da limpeza dentinária em canais radiculares preparados com um sistema rotatório e diferentes substâncias químicas." Universidade de São Paulo, 2007. http://www.teses.usp.br/teses/disponiveis/23/23145/tde-11042008-110242/.
Повний текст джерелаThe development of nickel-titanium (NiTi) endodontic instruments results in more quickness during the root canal shaping phase that induce us to discuss if really would be the chemical substances are having opportunities to act properly, considering that the time of action of the same was significantly reduced. The object of this research was evaluate, using the scanning electron microscopy (SEM) and computerized analysis, the cleaning on root canal walls in coronal, middle and apical thirds in mandibular human incisives prepared with K3 NiTi rotary instruments and different chemical substances: 2,5% sodium hypochlorite (pH 11,0), Endo PTC cream at normal consistency (Endo PTC-N) neutralized by 0,5% sodium hypochlorite (pH 11,0), Endo PTC cream with lower density (Endo PTC-L) neutralized by 0,5% sodium hypochlorite (pH 11,0) and chlorhexidine gel (Endogel). Concluded the cleaning and shaping phase, all the groups received a final irrigation with of 0,5% sodium hypochlorite solution (pH 11,0) followed by 17% EDTA-T solution, except the Endogel group that received two different regimens of final irrigation, one group with 20 ml of physiological serum and another with the 17% EDTA-T solution. The samples were prepared for the SEM analysis and the images obtained were analyzed using the Scion Image program. The results showed a significant difference between the groups tested seeing that the Endo PTC-L group, in middle and apical thirds and Endogel followed by the final irrigation with EDTA-T group, in middle third were superiors in comparation with the other groups.
Patel, Ankit Arvind. "Novel P-(SBMA) Grafted Glass Fiber Filters and Glass Slides for Oil-Water Separation and Underwater Self-Cleaning Applications." University of Akron / OhioLINK, 2012. http://rave.ohiolink.edu/etdc/view?acc_num=akron1353362655.
Повний текст джерелаErsoz, Tugce Irfan. "Application Of Semi Conductor Films Over Glass/ceramic Surfaces And Their Low Temperature Photocatalytic Activity." Master's thesis, METU, 2009. http://etd.lib.metu.edu.tr/upload/3/12610377/index.pdf.
Повний текст джерелаtitanium dioxide (TiO2), tin oxide (SnO2) and their binary mixtures (TiO2-SnO2) are selected because of their abundancy, non toxic properties, stability and the ability of absorbing light close to visible range. Also the effect of metal dopants such as praseodymium (Pr), palladium (Pd), silver (Ag) and iron (Fe) was examined with these metal oxides. The colloidal solutions were synthesized by using sol-gel method in order to apply the developed method to industrial usage as applying on large surfaces. The glass substrates were coated with the colloidal solutions by dip coating and the dried samples were calcined under air flow. The best calcination condition for pure TiO2 coated thin film was determined as 400oC for 45 minutes. Surface characterization studies were performed by using UV-Visible Spectrophotometer for band gap measurement, CAM for contact angle measurement, SEM for surface morphology and tophology. The methylene blue adsorption tests were carried out and the effective surface area of the samples were predicted by the Langmuir adsorption isotherm of samples. The photocatalytic activities of the coated thin films were measured with the degradation of organic materials as red wine and methylene blue, and with the antimicrobial activity tests as counting the number of viable E.coli cells. 61.2% deactivation of methylene blue stain was achieved over SnO2 coated thin films while this was 22.1% over TiO2 coated thin films after irradiation for 180 minutes. The superior photocatalytic activity was observed with TiO2 samples doped with Pd and Ag ions. The TiO2-SnO2 coated samples performed limited photocatalytic activity which is less than the activity of SnO2 coated samples which was confirmed with surface area measurements as SnO2 coated samples had higher surface area (9.81 cm2/cm2) than TiO2-SnO2 coated samples. Surface area increased with increasing the amount of SnO2 and it was in the following order: SnO2 >
80% SnO2 + 20% TiO2 >
50% SnO2 + 50%TiO2 >
35% SnO2 + 65%TiO2 >
20% SnO2 + 80% TiO2 >
TiO2.
Costa, Thiago Ranzani da. "Estudos de biofilmes microbianos em membranas de osmose reversa." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/42/42132/tde-09032017-145456/.
Повний текст джерелаSystems of filter membranes, especially reverse osmosis, are being increasingly used in various segments of companies (pharmaceutical, water treatment, food and chemical industries) due to the decrease in the price of the filter elements and high quality of the product. The biofouling corresponds to a type of inevitable fouling characterized by growth of microorganisms on the surface of the membrane and release of EPS by them; so a better understanding of these structures is necessary. This study aimed to characterize the biofouling in different reverse osmosis membranes addressed from different industries by the technique of autopsy and compared with results obtained with pure culture biofilms in reverse osmosis membranes; and to verify the influence of biofilms in the deposition of salts and action of chemical compounds used in chemical cleaning of membranes in them. The autopsy of clogged elements showed a lot of viable cells but with very low carbohydrate concentrations; unlike what occurred when biofilms isolated pure culture of these membranes were analyzed, showing strong correlation between number of viable cells and macromolecules such as proteins and especially carbohydrates. Regarding the influence of biofilms in the deposition of salts, two of the four pure culture biofilms showed barium incorporation in its structure (revealed by fluorescence analysis X-ray), this merger probably occurred by ion exchange and not by deposition barium sulfate. Compounds such as sodium hydroxide (pH = 12) and hydrochloric acid (pH = 2) showed good results in the decrease of viable cells however, the recovery of microorganisms was lower with use of the acid. EDTA and SDS compounds were not effective in reducing viable.
Gupta, Vipul. "Deposition and Characterization of Hydrophobic Coatings." BYU ScholarsArchive, 2012. https://scholarsarchive.byu.edu/etd/3859.
Повний текст джерелаBayless, Lynette Vera. "Photocatalytic oxidation of volatile organic compounds for indoor air applications." Thesis, Manhattan, Kan. : Kansas State University, 2009. http://hdl.handle.net/2097/1496.
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