Literatura científica selecionada sobre o tema "Ultrathin oxides"
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Artigos de revistas sobre o assunto "Ultrathin oxides"
Bec, Romulad B., Andrzej Jakubowsk, Lidia Łukasiak e Michał Korwin-Pawłowski. "Challenges in ultrathin oxide layers formation". Journal of Telecommunications and Information Technology, n.º 1 (30 de março de 2001): 27–34. http://dx.doi.org/10.26636/jtit.2001.1.46.
Texto completo da fonteTaylor, Seth T., John Mardinly e Michael A. O'Keefe. "HRTEM Image Simulations for the Study of Ultrathin Gate Oxides". Microscopy and Microanalysis 8, n.º 5 (outubro de 2002): 412–21. http://dx.doi.org/10.1017/s1431927602020123.
Texto completo da fonteMorgen, P., A. Bahari, U. Robenhagen, J. F. Andersen, J. K. Hansen, K. Pedersen, M. G. Rao e Z. S. Li. "Roads to ultrathin silicon oxides". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23, n.º 1 (janeiro de 2005): 201–7. http://dx.doi.org/10.1116/1.1842113.
Texto completo da fonteHuang, Feng, W. J. Liu, J. F. Sullivan, J. A. Barnard e M. L. Weaver. "Room-temperature oxidation of ultrathin TiB2 films". Journal of Materials Research 17, n.º 4 (abril de 2002): 805–13. http://dx.doi.org/10.1557/jmr.2002.0118.
Texto completo da fonteZhu, Jianhui, Jian Jiang, Wei Ai, Zhanxi Fan, Xintang Huang, Hua Zhang e Ting Yu. "Encapsulation of nanoscale metal oxides into an ultra-thin Ni matrix for superior Li-ion batteries: a versatile strategy". Nanoscale 6, n.º 21 (2014): 12990–3000. http://dx.doi.org/10.1039/c4nr03661a.
Texto completo da fonteWang, Kai, Bolong Huang, Weiyu Zhang, Fan Lv, Yi Xing, Wenshu Zhang, Jinhui Zhou et al. "Ultrathin RuRh@(RuRh)O2 core@shell nanosheets as stable oxygen evolution electrocatalysts". Journal of Materials Chemistry A 8, n.º 31 (2020): 15746–51. http://dx.doi.org/10.1039/d0ta03213a.
Texto completo da fonteTing, D. Z. Y. "Tunneling characteristics of nonuniform ultrathin oxides". Applied Physics Letters 73, n.º 19 (9 de novembro de 1998): 2769–71. http://dx.doi.org/10.1063/1.122585.
Texto completo da fonteLobinsky, A. A., e V. I. Popkov. "Ultrathin 2D nanosheets of transition metal (hydro)oxides as prospective materials for energy storage devices: A short review". Electrochemical Materials and Technologies 1, n.º 1 (2022): 20221008. http://dx.doi.org/10.15826/elmattech.2022.1.008.
Texto completo da fonteRotondaro, A. L. Pacheco, R. T. Laaksonen e S. P. Singh. "Impact of the Nitrogen Concentration of Sub-1.3 nm Gate Oxides on 65 nm Technology Transistor Parameters". Journal of Integrated Circuits and Systems 2, n.º 2 (17 de novembro de 2007): 63–66. http://dx.doi.org/10.29292/jics.v2i2.265.
Texto completo da fonteChari, K. S., e S. Kar. "Interface Characteristics of Metal‐Oxide‐Semiconductor Capacitors with Ultrathin Oxides". Journal of The Electrochemical Society 138, n.º 7 (1 de julho de 1991): 2046–49. http://dx.doi.org/10.1149/1.2085921.
Texto completo da fonteTeses / dissertações sobre o assunto "Ultrathin oxides"
Tolvaišienė, Sonata. "Transport of charge carriers in ultrathin films of manganese oxides". Doctoral thesis, Lithuanian Academic Libraries Network (LABT), 2009. http://vddb.library.lt/obj/LT-eLABa-0001:E.02~2009~D_20090218_143224-76401.
Texto completo da fonteDisertacijoje nagrinėjami lantano manganitai, pasižymintys faziniu virsmu iš paramagnetinės į feromagnetinę būseną bei milžiniškos neigiamos magnetovar-žos efektu. Tiriami magnetovaržos ir jos anizotropijos efektai silpnuose (iki 0,5 T) magnetiniuose laukuose bei stiprių impulsinių srovių ir magnetinių laukų sukelti efektai plonuose epitaksiniuose manganitų sluoksniuose. Pateikiami pasiūlymai tyrimo rezultatus panaudoti kuriant magnetinio lauko jutiklius, spar-čiųjų elektrinių impulsų formuotuvus bei amplitudės moduliatorius. Tiriant sil-pnų magnetinių laukų poveikį ultraplonųjų La-Sr-MnO3 sluoksnių elektriniam laidumui, buvo nustatyta, kad magnetovaržos anizotropijos ženklas ir vertė šiuo-se laukuose priklauso nuo sluoksnio storio. Pateiktas modelis, paaiškinantis eks-perimentinius rezultatus, paremtas vidutinio lauko artiniu ir įskaitantis sluoksnio struktūros kitimą kintant jo storiui. Aptiktas ir ištirtas grįžtamasis termoelektrinis nestabilumas, išaiškintos šio reiškinio atsiradimo priežastys. Pasiūlytas ir ekspe-rimentiškai realizuotas naujas ns trukmės elektrinių impulsų amplitudės modulia-vimo išoriniu magnetiniu lauku būdas, naudojant epitaksinius La0,87Sr0,17MnO3 sluoksnius. Disertaciją sudaro reziumė lietuvių ir anglų kalbomis, įvadas, šeši skyriai, pagrindiniai rezultatai ir išvados, literatūros sąrašas, publikacijų disertacijos tema sąrašas. Įvadiniame skyriuje nagrinėjamas problemos aktualumas, formuluojamas darbo tikslas bei uždaviniai, aprašomas mokslinis... [toliau žr. visą tekstą]
Dragosavac, Marko. "Electron transport in ultrathin oxide silicon MOSFETs". Thesis, University of Cambridge, 2005. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.614808.
Texto completo da fonteMatharu, J. "Surface science of ultrathin metal oxide films". Thesis, University College London (University of London), 2011. http://discovery.ucl.ac.uk/1335900/.
Texto completo da fonteWlodarczyk, Radoslaw Stanislaw. "Surface structure predictions and development of global exploration tools". Doctoral thesis, Humboldt-Universität zu Berlin, Mathematisch-Naturwissenschaftliche Fakultät, 2015. http://dx.doi.org/10.18452/17207.
Texto completo da fonteThis work is a contribution in the field of theoretical chemistry and surface science. The joint computational and experimental studies investigated the atomic structure of ultrathin silica and iron-doped silica films formed on the Ru(0001) surface and water films formed on the MgO(001) surface. The atomic structure models were obtained using either the educated guess approach or the genetic algorithm that was designed and implemented within the DoDo package. The properties simulated for the resulting models are in a very good agreement with the experimental data (scanning tunnelling microscopy, infrared spectroscopy). The successful structure determination using the DoDo program shows that the genetic algorithm technique is capable of systematic and extensive exploration of the energy landscapes for 2D-periodic systems.
Grinter, D. C. "Surface studies of metal oxide catalysts and ultrathin films". Thesis, University College London (University of London), 2011. http://discovery.ucl.ac.uk/1334452/.
Texto completo da fonteBayat, Alireza [Verfasser]. "Composition and geometric structure of ultrathin oxide films / Alireza Bayat". Halle, 2018. http://d-nb.info/1175950572/34.
Texto completo da fonteGarza, Michelle. "Reactivity of Oxide Surfaces and Metal-Oxide Interfaces: Effects of Water Vapor Pressure on Ultrathin Aluminum Oxide Films, and Studies of Platinum Growth Modes on Ultrathin Oxide Films and Their Effects on Adhesion". Thesis, University of North Texas, 2004. https://digital.library.unt.edu/ark:/67531/metadc4517/.
Texto completo da fonteVarga, P., M. Schmid, S. Muto, K. Tatsumi, T. Matsui, D. Tajima e J. Yuhara. "Growth and structure of an ultrathin tin oxide film on Rh (111)". AIP Publishing, 2011. http://hdl.handle.net/2237/20826.
Texto completo da fonteMihaychuk, James Gordon. "Nonlinear optical studies of multiphoton photoemission in silicon covered by ultrathin oxide films". Thesis, National Library of Canada = Bibliothèque nationale du Canada, 1998. http://www.collectionscanada.ca/obj/s4/f2/dsk2/tape15/PQDD_0013/NQ35250.pdf.
Texto completo da fonteMartynova, Yulia [Verfasser], e Reinhard [Akademischer Betreuer] Schomäcker. "CO oxidation on metal supported ultrathin oxide films / Yulia Martynova. Betreuer: Reinhard Schomäcker". Berlin : Universitätsbibliothek der Technischen Universität Berlin, 2013. http://d-nb.info/1035767384/34.
Texto completo da fonteLivros sobre o assunto "Ultrathin oxides"
1939-, King D. A., e Woodruff D. P, eds. Growth and properties of ultrathin epitaxial layers. Amsterdam: Elsevier, 1997.
Encontre o texto completo da fontePacchioni, Gianfranco, e Sergio Valeri, eds. Oxide Ultrathin Films. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2011. http://dx.doi.org/10.1002/9783527640171.
Texto completo da fonteFrei, Heinz, e Daniel Esposito, eds. Ultrathin Oxide Layers for Solar and Electrocatalytic Systems. Cambridge: Royal Society of Chemistry, 2022. http://dx.doi.org/10.1039/9781839163708.
Texto completo da fontePacchioni, Gianfranco, e Sergio Valeri. Oxide Ultrathin Films: Science and Technology. Wiley & Sons, Incorporated, John, 2012.
Encontre o texto completo da fontePacchioni, Gianfranco, e Sergio Valeri. Oxide Ultrathin Films: Science and Technology. Wiley & Sons, Limited, John, 2012.
Encontre o texto completo da fontePacchioni, Gianfranco, e Sergio Valeri. Oxide Ultrathin Films: Science and Technology. Wiley & Sons, Incorporated, John, 2012.
Encontre o texto completo da fontePacchioni, Gianfranco, e Sergio Valeri. Oxide Ultrathin Films: Science and Technology. Wiley & Sons, Incorporated, John, 2012.
Encontre o texto completo da fontePacchioni, Gianfranco, e Sergio Valeri. Oxide Ultrathin Films: Science and Technology. Wiley-VCH Verlag GmbH, 2011.
Encontre o texto completo da fonte(Editor), D. A. King, e D. P. Woodruff (Editor), eds. Oxide Surfaces - The Chemical Physics of Solid Surfaces : Growth and Properties of Ultrathin Epitaxial Layers. Elsevier Science Pub Co, 1997.
Encontre o texto completo da fonteFrei, Heinz, e Daniel Esposito. Ultrathin Oxide Layers for Solar and Electrocatalytic Systems. Royal Society of Chemistry, The, 2022.
Encontre o texto completo da fonteCapítulos de livros sobre o assunto "Ultrathin oxides"
Giordano, Livia, e Gianfranco Pacchioni. "Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit". In Oxide Ultrathin Films, 75–100. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch4.
Texto completo da fonteLuches, Paola, e Sergio D’Addato. "Reducible Oxides as Ultrathin Epitaxial Films". In Oxide Materials at the Two-Dimensional Limit, 119–48. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-28332-6_4.
Texto completo da fontePalmstrom, A. F., e M. O. Reese. "Chapter 3. Ultrathin Oxides for Solar Cells". In Energy and Environment Series, 27–69. Cambridge: Royal Society of Chemistry, 2022. http://dx.doi.org/10.1039/9781839163708-00027.
Texto completo da fonteLi, Qi, e H. S. Wang. "Strain and Magnetoresistance Anisotropy of PR0.7SR0.3MNO3 Ultrathin Films". In Nano-Crystalline and Thin Film Magnetic Oxides, 133–44. Dordrecht: Springer Netherlands, 1999. http://dx.doi.org/10.1007/978-94-011-4493-3_9.
Texto completo da fonteAkbari, Mohammad Karbalaei, e Serge Zhuiykov. "Self-Limiting Two-Dimensional Surface Oxides of Liquid Metals". In Ultrathin Two-Dimensional Semiconductors for Novel Electronic Applications, 79–110. First edition. | Boca Raton, FL: CRC Press, 2020.: CRC Press, 2020. http://dx.doi.org/10.1201/9780429316784-3.
Texto completo da fonteTerashima, T., K. Shimura, Y. Bando, Y. Matsuda, A. Fujiyama e S. Komiyama. "Ultrathin Films and Superlattices of High Temperature Superconducting Oxides". In Springer Proceedings in Physics, 25–31. Berlin, Heidelberg: Springer Berlin Heidelberg, 1992. http://dx.doi.org/10.1007/978-3-642-77154-5_3.
Texto completo da fonteHattori, Takeo. "Surface, Interface and Valence Band of Ultra-Thin Silicon Oxides". In Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices, 241–56. Dordrecht: Springer Netherlands, 1998. http://dx.doi.org/10.1007/978-94-011-5008-8_17.
Texto completo da fonteHirose, M., W. Mizubayashi, K. Morino, M. Fukuda e S. Miyazaki. "Tunneling Transport and Reliability Evaluation in Extremely Thin Gate Oxides". In Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices, 315–24. Dordrecht: Springer Netherlands, 1998. http://dx.doi.org/10.1007/978-94-011-5008-8_22.
Texto completo da fonteMeda, L., e G. F. Cerofolini. "Local Tunnel Emission Assisted by Inclusions Contained in Buried Oxides". In Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices, 493–502. Dordrecht: Springer Netherlands, 1998. http://dx.doi.org/10.1007/978-94-011-5008-8_37.
Texto completo da fonteLu, Z. H. "Synchrotron and Conventional Photoemission Studies of Oxides and N20 Oxynitrides". In Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices, 49–63. Dordrecht: Springer Netherlands, 1998. http://dx.doi.org/10.1007/978-94-011-5008-8_4.
Texto completo da fonteTrabalhos de conferências sobre o assunto "Ultrathin oxides"
Hirose, M., W. Mizubayashi, M. Fukuda e S. Miyazaki. "Characterization of ultrathin gate oxides for advanced MOSFETs". In CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY. ASCE, 1998. http://dx.doi.org/10.1063/1.56852.
Texto completo da fonteMizubayashi, Wataru, Hiroshi Itokawa, Seiichi Miyazaki e Masataka Hirose. "Modeling of Soft Breakdown in Ultrathin Gate Oxides". In 1999 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1999. http://dx.doi.org/10.7567/ssdm.1999.a-10-2.
Texto completo da fonteMizubayashi, W., Y. Yoshida, M. Narasaki, S. Miyazaki e M. Hirose. "Temperature-Dependent Soft Breakdown in Ultrathin Gate Oxides". In 2000 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2000. http://dx.doi.org/10.7567/ssdm.2000.b-6-3.
Texto completo da fonteLin, H. C., M. F. Wang, C. C. Chen, S. K. Hsien, C. H. Chien, T. Y. Huang, C. Y. Chang e T. S. Chao. "Characterization of plasma charging damage in ultrathin gate oxides". In 1998 IEEE International Reliability Physics Symposium Proceedings 36th Annual. IEEE, 1998. http://dx.doi.org/10.1109/relphy.1998.670662.
Texto completo da fonteJoshi, Atul B., G. Q. Lo, J. Ahn, Windsor Ting e Dim-Lee Kwong. "Chemically modified ultrathin oxides fabricated by rapid thermal processing". In Rapid thermal and Integrated Processing, editado por Mehrdad M. Moslehi, Rajendra Singh e Dim-Lee Kwong. SPIE, 1992. http://dx.doi.org/10.1117/12.56674.
Texto completo da fonteMoon, Dae Won, Hyun Kyong Kim, Hwack Joo Lee, Yong Jai Cho e Hyun Mo Cho. "Thickness evaluation of ultrathin gate oxides at the limit". In CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY. ASCE, 1998. http://dx.doi.org/10.1063/1.56794.
Texto completo da fonteHattangady, Sunil, D. T. Grider, Robert Kraft, Wei-Tsun Shiau, Monte A. Douglas, P. Nicollian, Mark Rodder et al. "Remote plasma nitrided oxides for ultrathin gate dielectric applications". In Microelectronic Manufacturing, editado por David Burnett, Dirk Wristers e Toshiaki Tsuchiya. SPIE, 1998. http://dx.doi.org/10.1117/12.323956.
Texto completo da fonteField, Alan H. "Process monitoring of ultrathin oxides using surface charge analysis". In Microelectronic Manufacturing, editado por Damon K. DeBusk e Sergio A. Ajuria. SPIE, 1997. http://dx.doi.org/10.1117/12.284682.
Texto completo da fonteSytchkova, A., D. Zola, M. L. Grilli, A. Piegari, M. Fang, H. He e J. Shao. "Interface plasmonic properties of silver coated by ultrathin metal oxides". In SPIE Optical Systems Design, editado por Michel Lequime, H. Angus Macleod e Detlev Ristau. SPIE, 2011. http://dx.doi.org/10.1117/12.896769.
Texto completo da fonteNishioka, Yasushiro, Kenji Namba, Mieko Matsumura, Tomoyuki Sakoda, Yoshinao Kumagai, Tadahiro Komeda, Hikaru Kobayashi, Tyuji Hoshino, Atsushi Ando e Kazushi Miki. "Surface Preparation, Growth, and Interface Control of Ultrathin Gate Oxides". In 1998 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1998. http://dx.doi.org/10.7567/ssdm.1998.b-4-2.
Texto completo da fonteRelatórios de organizações sobre o assunto "Ultrathin oxides"
Ludeke, R. Spatially Resolved Transport Studies and Microscopy of Ultrathin Metal-Oxide-Semiconductor Structures. Fort Belvoir, VA: Defense Technical Information Center, agosto de 1997. http://dx.doi.org/10.21236/ada329531.
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