Literatura científica selecionada sobre o tema "Quasi-vertical devices"
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Artigos de revistas sobre o assunto "Quasi-vertical devices"
Evans, Jon, Jash Patel, Ahmed Ben Khaial, Nicholas Burridge, Rhonda Hyndman, Finn Monaghan, Mike Jennings, Huma Ashraf, Rob Harper e Matthew Elwin. "Fabrication of Quasi-Vertical GaN-On-SiC Trench MOSFETs". Key Engineering Materials 945 (19 de maio de 2023): 61–66. http://dx.doi.org/10.4028/p-97g365.
Texto completo da fonteWeikle, Robert M., S. Nadri, C. M. Moore, N. D. Sauber, L. Xie, M. E. Cyberey, N. Scott Barker, A. W. Lichtenberger e M. Zebarjadi. "Thermal Characterization of Quasi-Vertical GaAs Schottky Diodes Integrated on Silicon Using Thermoreflectance and Electrical Transient Measurements". Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2019, DPC (1 de janeiro de 2019): 001293–310. http://dx.doi.org/10.4071/2380-4491-2019-dpc-presentation_tha3_009.
Texto completo da fonteZhu, Xiaoxiao, Wei Lu, Jing Ning, Jincheng Zhang, Dong Wang, Chi Zhang, Yanbo Wang et al. "A high-performance quasi-vertical MoSe2 photodiode with ultra-low dark current". Applied Physics Letters 121, n.º 14 (3 de outubro de 2022): 141103. http://dx.doi.org/10.1063/5.0104664.
Texto completo da fonteLiu, Cheng, Ming Li, Zhang Wen, Zhao-Yuan Gu, Ming-Chao Yang, Wei-Hua Liu, Chuan-Yu Han, Yong Zhang, Li Geng e Yue Hao. "Establishment of composite leakage model and design of GaN Schottky barrier diode with stepped field plate". Acta Physica Sinica 71, n.º 5 (2022): 057301. http://dx.doi.org/10.7498/aps.71.20211917.
Texto completo da fonteKhan, Sahanowaj, Aritra Acharyya, Hiroshi Inokawa, Hiroaki Satoh, Arindam Biswas, Rudra Sankar Dhar, Amit Banerjee e Alexey Y. Seteikin. "Terahertz Radiation from High Electron Mobility Avalanche Transit Time Sources Prospective for Biomedical Spectroscopy". Photonics 10, n.º 7 (10 de julho de 2023): 800. http://dx.doi.org/10.3390/photonics10070800.
Texto completo da fonteYadav, Sugandha, Poornima Mittal e Shubham Negi. "An In-Depth Analysis of Variation in Characteristic Performance of OLED with Respect to Position of Charge Generation Layer". ECS Journal of Solid State Science and Technology 12, n.º 10 (1 de outubro de 2023): 106001. http://dx.doi.org/10.1149/2162-8777/acfd5f.
Texto completo da fonteBriskin, E. S., L. D. Smirnaya e K. S. Artemyev. "On the Control of Traction Characteristics and Resistance to Movement of Mobile Robots with Walking Propulsion Devices". Mekhatronika, Avtomatizatsiya, Upravlenie 24, n.º 2 (6 de fevereiro de 2023): 101–6. http://dx.doi.org/10.17587/mau.24.101-106.
Texto completo da fonteCristoloveanu, Sorin, Joris Lacord, Sébastien Martinie, Carlos Navarro, Francisco Gamiz, Jing Wan, Hassan Dirani, Kyunghwa Lee e Alexander Zaslavsky. "A Review of Sharp-Switching Band-Modulation Devices". Micromachines 12, n.º 12 (11 de dezembro de 2021): 1540. http://dx.doi.org/10.3390/mi12121540.
Texto completo da fonteEyvazian, Arameh, Hozhabr Mozafari, Faris Tarlochan e Abdel Magid S. Hamouda. "Numerical and Experimental Investigation on Corrugation Geometry for Metallic Tubes under Lateral Loading". Materials Science Forum 916 (março de 2018): 226–31. http://dx.doi.org/10.4028/www.scientific.net/msf.916.226.
Texto completo da fonteSalgado, Ruben, Amirmahdi Mohammadzadeh, Fariborz Kargar, Adane Geremew, Chun-Yu Huang, Matthew A. Bloodgood, Sergey Rumyantsev, Tina T. Salguero e Alexander A. Balandin. "Low-frequency noise spectroscopy of charge-density-wave phase transitions in vertical quasi-2D 1T-TaS2 devices". Applied Physics Express 12, n.º 3 (15 de fevereiro de 2019): 037001. http://dx.doi.org/10.7567/1882-0786/ab0397.
Texto completo da fonteTeses / dissertações sobre o assunto "Quasi-vertical devices"
Kaltsounis, Thomas. "Épitaxie localisée de GaN sur silicium pour une nouvelle génération de transistors de puissance". Electronic Thesis or Diss., Université Côte d'Azur, 2024. http://www.theses.fr/2024COAZ5072.
Texto completo da fonteHigh-power devices and especially high-voltage ones are essential for the conversion and storage of electrical energy in applications such as photovoltaic systems and electric cars. Nowadays, silicon (Si)-based devices dominate the field of power electronics. Wide-bandgap semiconductors, such as Gallium Nitride (GaN), are excellent candidates to replace Si. Due to the excellent electrical properties of GaN, devices based on this semiconductor are more efficient than their Si-based counterparts and the energy lost occurring during conversion operation is much less. However, native GaN substrates have limited size and availability. The growth of GaN on 200 mm-diameter Si wafers is an attractive alternative because of their low cost and compatibility with a CMOS fabrication line. However, the lattice and coefficient thermal mismatch between GaN and Si generate a large tensile stress and limit the thickness of full-wafer GaN layers grown on Si wafers without cracking. Finally, the vertical configuration enhances the reliability of the devices by moving the maximum of the electric field away from the surface into the bulk of the devices. Thus, the trapping effects are reduced and the dynamic on-resistance decreases. The thermal management of the vertical devices is easier than that for the lateral ones.This dissertation explores the localized epitaxy of GaN as a solution to relax this stress in the regrown GaN layer and to grow thick layers with low net doping concentration required for the fabrication of high-power devices. There are four main points that are explored and crucial results are provided for the continuation of the research on the project: - First, a suitable mask material for the localized epitaxy with MOVPE is identified by investigating the unintentional doping concentration in the regrown layer, induced by the reaction of Ga atoms with the mask and the incorporation of dopant atoms from the mask.- Second, characterization techniques are pushed to the limits of measuring low doping concentrations. Scanning spreading resistance microscopy and scanning capacitance microscopy, combined with the ion-beam cross-section preparation technique are validated and for the first time are able to examine such low doping concentrations.- Third, through a mask designed specifically for the localized epitaxy, the scaling of crack-free structures that can be regrown is investigated, under growth conditions that have been already validated.- Fourth, quasi-vertical Schottky and p-n diodes are fabricated and their forward and reverse bias I-V behavior is investigated. The p-n diodes show relatively low on-resistance (Ron), considering that the mask is not optimized and the access resistance is large, and for the first time a 700 V breakdown voltage is measured on a p-n diode with no periphery protection.The current thesis shows remarkable results that have not been reported before in the literature and demonstrates the great potential that the localized epitaxy of GaN on Si wafers offers for high-power vertical devices
Chang, Meng-Sheng, e 張盟昇. "The Design and Analysis of Quasi-Vertical Devices for High Voltage ESD Protection Circuits". Thesis, 2009. http://ndltd.ncl.edu.tw/handle/89866408640434861071.
Texto completo da fonte國立清華大學
電子工程研究所
97
In this thesis, a novel quasi-vertical insulated gate bipolar transistor (VIGBT) and a quasi-vertical silicon controlled rectifier(VSCR) structure have been designed and fabricated for high voltage ESD protection circuit applications. In addition, a comparison is made among quasi-vertical MOSFETs, quasi-vertical IGBT and quasi-vertical SCR. The device characteristics are simulated using a semiconductor device simulator, MEDICI, to study the effects of device dimensions, then the devices were fabricated in a commercially available 0.5μm 100V process. Devices were then measured and analyzed. Measurement results indicate that, under the same condition, for the devices with 100μm channel width, VIGBT (2Sinker-1Channel)、(1Sikner -2Channel) can handle It2 of 7.22 amps and 9.48 amps. This is larger than It2 of 5.94 amps and 3.18 amps observed in VDMOS(2Sinker- 1Channel)、(1Sinker-2Channel). VIGBT outperforms VDMOS in the aspect of ESD current sustaining capability. For the devices with 200μm channel width, VSCR and VIGBT(1Sinker-2Channel) can handle It2 of 9.58 amps and 9.75 amps. This is larger than It2 of 6.13 amps achieved by VDMOS(1Sinker-2Channel). These results confirm that, due to the parasite PNPN structure, the ESD current sustaining capacity of VSCR and VIGBT is superior than VDMOS.
Liu, Chung-Min, e 劉中民. "Analysis of the Quasi-Saturation Behavior in the Power Vertical Double-Diffused Metal-Oxide-Semiconductor(DMOS) Devices". Thesis, 1997. http://ndltd.ncl.edu.tw/handle/80708280417525581150.
Texto completo da fonte國立臺灣大學
電機工程學系
85
In this thesis, the analytical model for the quasi-saturation behavior of aDMOS device by taking the cryogenic effects and the thermal effects into account, and the analyses of the capacitance characteristics and the transientbehavior for the DMOS device from the two-dimensional numerical simulation aredescribed. In Chapter 2, a simulation study on the 77K versus 300K operation in terms of the quasi-saturation behavior of a DMOS device usinglow-temperature PISCES is described. From the analysis, a closed-formanalytical quasi-saturation model for DMOS devices is derived. In Chapter 3,the analytical lattice temperature model and the quasi- saturation currentmodel considering heat flow for a DMOS device are derived. As verified by thePISCES results, a good prediction of the much worse quasi-saturation behavior due to the elevated lattice temperature can be observed. In Chapter 4, a simulation study on the capacitance overshoot behavior of a DMOS device operating in the quasi-saturation region is described. In this chapter, both of the incremental-charge-partitioning approach and the small- signal acadmittance matrix analysis are adopted for analyzing the DMOS capacitance. In addition, the turn-off transient analysis of a DMOS device considering the quasi-saturation behavior is also described.
Capítulos de livros sobre o assunto "Quasi-vertical devices"
Warrick, Arthur W. "One-Dimensional Absorption". In Soil Water Dynamics. Oxford University Press, 2003. http://dx.doi.org/10.1093/oso/9780195126051.003.0009.
Texto completo da fonteTrabalhos de conferências sobre o assunto "Quasi-vertical devices"
Michel, Ancy, Binola K. Jebalin I.V, Navin M. George, Angelin Delighta A e D. Nirmal. "Quasi Vertical FinFET with Step Graded Doping for Obtaining 0.037 mΩ.cm2 ON Resistance". In 2024 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON), 353–57. IEEE, 2024. https://doi.org/10.1109/edkcon62339.2024.10870763.
Texto completo da fontePan, Zeyu, Harish Subbaraman, Yi Zou, Xingyu Zhang, Cheng Zhang, Qiaochu Li, L. Jay Guo e Ray T. Chen. "High optical coupling efficiency quasi-vertical taper for polymer waveguide devices". In SPIE OPTO, editado por Henning Schröder e Ray T. Chen. SPIE, 2015. http://dx.doi.org/10.1117/12.2078560.
Texto completo da fonteLiu, Chao, Riyaz Abdul Khadar e Elison Matioli. "645 V quasi-vertical GaN power transistors on silicon substrates". In 2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD). IEEE, 2018. http://dx.doi.org/10.1109/ispsd.2018.8393647.
Texto completo da fonteYoder, P. D., E. J. Flynn e S. Sridharan. "Vertical-illumination InGaAs/InP quasi-unipolar photodetector with high bandwidth, quantum efficiency, and resistance to bandwidth collapse". In Integrated Optoelectronic Devices 2007, editado por Marek Osinski, Fritz Henneberger e Yasuhiko Arakawa. SPIE, 2007. http://dx.doi.org/10.1117/12.699707.
Texto completo da fonteTsai, Ying-Chieh, Jeng Gong, W. C. Chan, S. Y. Wu e C. H. Lien. "Design and analysis of a double RESURF 700V LIGBT with quasi-vertical DMOSFET in junction isolation technology". In 2014 IEEE 26th International Symposium on Power Semiconductor Devices & IC's (ISPSD). IEEE, 2014. http://dx.doi.org/10.1109/ispsd.2014.6855997.
Texto completo da fonteZhou, Feng, Weizong Xu, Fangfang Ren, Dunjun Chen, Rong Zhang, Youdou Zheng, Tinggang Zhu e Hai Lu. "High Performance Quasi-Vertical GaN Junction Barrier Schottky Diode with Zero Reverse Recovery and Rugged Avalanche Capability". In 2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD). IEEE, 2021. http://dx.doi.org/10.23919/ispsd50666.2021.9452308.
Texto completo da fonteWu, Tuanzhuang, Jiaxing Wei, Weidong Wang, Xiaonan Lin, Jie Ma, Sheng Li, Ran Ye et al. "Influence of Structure Parameters on the RoN, sp of Quasi- Vertical Power DMOS Compatible with 0.18μm BCD Process". In 2024 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD). IEEE, 2024. http://dx.doi.org/10.1109/ispsd59661.2024.10579557.
Texto completo da fonteChen, Jiabo, Zhihong Liu, Zhaoke Bian, Haiyong Wang, Xiaoling Duan, Jing Ning, Jincheng Zhang e Yue Hao. "Nearly ideal quasi-vertical GaN Schottky barrier diode with 1010 high on/off ratio and ultralow turn on voltage via post anode annealing". In 2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM). IEEE, 2021. http://dx.doi.org/10.1109/edtm50988.2021.9421063.
Texto completo da fonteFesta, Oscar, Susan Gourvenec e Adam Sobey. "Analytical Model of Non-Linear Load Reduction Devices for Catenary Moorings". In ASME 2023 42nd International Conference on Ocean, Offshore and Arctic Engineering. American Society of Mechanical Engineers, 2023. http://dx.doi.org/10.1115/omae2023-100845.
Texto completo da fonteSefat, Sina Mirzaei, e Antonio Carlos Fernandes. "Stability Analysis Hinged Vertical Flat Plate Rotation in a Uniform Flow". In ASME 2012 31st International Conference on Ocean, Offshore and Arctic Engineering. American Society of Mechanical Engineers, 2012. http://dx.doi.org/10.1115/omae2012-84020.
Texto completo da fonteRelatórios de organizações sobre o assunto "Quasi-vertical devices"
Wu, Yingjie, Selim Gunay e Khalid Mosalam. Hybrid Simulations for the Seismic Evaluation of Resilient Highway Bridge Systems. Pacific Earthquake Engineering Research Center, University of California, Berkeley, CA, novembro de 2020. http://dx.doi.org/10.55461/ytgv8834.
Texto completo da fonte