Literatura científica selecionada sobre o tema "Optical Interference Coating"
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Artigos de revistas sobre o assunto "Optical Interference Coating"
Journal, Baghdad Science. "Java Applet Technology for Design Interference Optical Coating". Baghdad Science Journal 8, n.º 2 (12 de junho de 2011): 495–502. http://dx.doi.org/10.21123/bsj.8.2.495-502.
Texto completo da fonteAL-gaffar, Alaa Nazar Abd. "Java Applet Technology for Design Interference Optical Coating". Baghdad Science Journal 8, n.º 2 (12 de junho de 2011): 495–502. http://dx.doi.org/10.21123/bsj.2011.8.2.495-502.
Texto completo da fonteSotsky, A. B., e E. A. Chudakov. "Reciprocity relations for interference coatings". Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series 59, n.º 2 (6 de julho de 2023): 158–67. http://dx.doi.org/10.29235/1561-2430-2023-59-2-158-167.
Texto completo da fonteYudin, Nikolay, Mikhail Zinovev, Vladimir Kuznetsov, Maxim Kulesh, Sergey Podzyvalov, Elena Slyunko, Hussein Baalbaki, Alexey Lysenko, Andrey Kalsin e Akmal Gabdrakhmanov. "Development of a dichroic mirror based on Nb2O5/SiO2 for LiDAR systems". BIO Web of Conferences 145 (2024): 04045. http://dx.doi.org/10.1051/bioconf/202414504045.
Texto completo da fonteBärtschi, Manuel, Daniel Schachtler, Silvia Schwyn-Thöny, Thomas Südmeyer e Roelene Botha. "Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films". EPJ Web of Conferences 255 (2021): 03005. http://dx.doi.org/10.1051/epjconf/202125503005.
Texto completo da fonteWei, David T. "Ion beam interference coating for ultralow optical loss". Applied Optics 28, n.º 14 (15 de julho de 1989): 2813. http://dx.doi.org/10.1364/ao.28.002813.
Texto completo da fonteLee, Cheng-Chung, Kai Wu e Meng-Yen Ho. "Reflection coefficient monitoring for optical interference coating depositions". Optics Letters 38, n.º 8 (12 de abril de 2013): 1325. http://dx.doi.org/10.1364/ol.38.001325.
Texto completo da fonteYUDIN, N. N., M. M. ZINOVIEV, S. N. PODZYVALOV, V. S. KUZNETSOV, E. S. SLYUNKO, A. SH GABDRAKHMANOV, A. B. LYSENKO e A. YU KALSIN. "MID-IR ANTIREFLECTIVE INTERFERENCE OXIDE COATINGS FOR SEMICONDUCTOR OPTICAL SUBSTRATES". Izvestiya vysshikh uchebnykh zavedenii. Fizika 67, n.º 5 (2024): 15–19. https://doi.org/10.17223/00213411/67/5/2.
Texto completo da fonteYudin, N. N., O. L. Antipov, A. I. Gribenyukov, V. V. Dyomin, M. M. Zinoviev, S. N. Podzivalov, E. S. Slyunko et al. "Influence of line-by-line processing technology on the optical breakthreshold of a ZnGeP2 single crystal". Izvestiya vysshikh uchebnykh zavedenii. Fizika, n.º 11 (2021): 102–7. http://dx.doi.org/10.17223/00213411/64/11/102.
Texto completo da fonteTay, Justin C.-K., Basil T. Wong e Kok Hing Chong. "The impact of anti-reflective coating and optical bandpass interference filter on solar cell electrical-thermal performance". Journal of Mechanical Engineering and Sciences 15, n.º 1 (9 de março de 2021): 7807–23. http://dx.doi.org/10.15282/jmes.15.1.2021.16.0616.
Texto completo da fonteTeses / dissertações sobre o assunto "Optical Interference Coating"
Womack, Gerald. "Anti-reflection coatings and optical interference in photovoltaics". Thesis, Loughborough University, 2017. https://dspace.lboro.ac.uk/2134/25529.
Texto completo da fonteBarutcu, Burcu. "The Design And Production Of Interference Edge Filters With Plasma Ion Assisted Deposition Technique For A Space Camera". Master's thesis, METU, 2012. http://etd.lib.metu.edu.tr/upload/12614574/index.pdf.
Texto completo da fonteRavinet, Nolann. "Développement de revêtements interférentiels pour des imageurs X à haute résolution". Electronic Thesis or Diss., université Paris-Saclay, 2024. http://www.theses.fr/2024UPASP127.
Texto completo da fonteInertial Confinement Fusion (ICF) is a preferred experimental approach to access extreme matter conditions, through the implosion of a laser-driven target. To characterize the implosion symmetry, a micrometer-resolution microscope, operating in the hard X-ray range, is being developed by the CEA (Commissariat à l'énergie atomique). TXI (Toroidal X-ray Imager), which will be installed at the NIF (National Ignition Facility), is a Wolter-type X-ray diagnostic where conical mirrors are replaced by toroidal mirrors. It is also a multi-channel diagnostic, operating at a nominal grazing angle of 0.6°, allowing imaging at 8.7 keV, 13 keV, and 17.5 keV. The required thicknesses of the multilayer coatings must become increasingly thin to image these energies. Different multilayer formulas (alternating two materials whose total period allows reflection of a certain wavelength, according to Bragg's law) have been optimized to meet TXI's specifications. The instrument's optical response was simulated using ray-tracing software. The coatings were then produced by sputtering deposition. For the next phase of the thesis, a preliminary study was conducted on designing an imager capable of operating up to 60 keV, as well as a pre-study on HiPIMS (High Power Impulse Magnetron Sputtering) technology to assess its benefits for thin-film quality
Bhattarai, Khagendra Prasad. "Interference of Light in Multilayer Metasurfaces: Perfect Absorber and Antireflection Coating". Scholar Commons, 2017. http://scholarcommons.usf.edu/etd/6680.
Texto completo da fonteAydogdu, Selcuk. "Near Infrared Interference Filter Design And The Production Withion-assisted Deposition Techniques". Master's thesis, METU, 2012. http://etd.lib.metu.edu.tr/upload/12614092/index.pdf.
Texto completo da fonteCheng, Wei-Chung. "Fabrication of Phase Masks by Immersion Interference Lithography and Study of Bottom Antireflective Coating Layers for Optical Lithography". 2004. http://www.cetd.com.tw/ec/thesisdetail.aspx?etdun=U0001-3007200417014500.
Texto completo da fonteCheng, Wei-Chung, e 鄭惟中. "Fabrication of Phase Masks by Immersion Interference Lithography and Study of Bottom Antireflective Coating Layers for Optical Lithography". Thesis, 2004. http://ndltd.ncl.edu.tw/handle/56259446045176173923.
Texto completo da fonte國立臺灣大學
光電工程學研究所
92
In this thesis, our study contains three parts. The first part is the study of utilizing hexamethyldisiloxane (HMDSO) film as the bottom antireflective coating (BARC) layer for deep ultraviolet (DUV) and vacuum ultraviolet (VUV) lithographies. We report a novel tri-layer bottom antireflective coating (BARC) design based on hexamethyldisiloxane (HMDSO) films working simultaneously at 157, 193 and 248nm wavelengths and a single-layer BARC film working in water at 193 nm wavelength. The required optical constant for each layer can be tuned by varying the gas flow rate ratio of oxygen to HMDSO in an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) process The swing effect in the resist is experimentally shown to be reduced significantly by adding this BARC structure. A novel method for producing durable fused silica self-interference phase mask is described in the second part. The grating pattern is formed into I line positive photoresist (EPG510, Everlight) by 351 nm Ar+ laser interference lithography exposure and is transferred to a thin chromium layer via wet etching solution CR7, then reactive ion etching in CHF3/O2 plasma is used to etch the fused silica substrate. For phase masks working in 248 nm wavelength can be generated by using interferometric lithography. The optimized fabrication process allows phase mask of sub-micron period, centimeter long, with the zero-order intensity suppressed down to 8%. For the demonstration of its practicality, one optimized phase mask with 1.08 μm period and 5% zero-order diffraction efficiency is shown capable of fabricating fiber Bragg gratings with 7 dB transmission loss at 1.563 μm wavelength. Furthermore, another 0.44 μm period phase mask is used to produce a photoresist pattern with halved period. For phase masks working in 157 nm wavelength can be made from modified fused silica with 180 nm period by using immersion interference photolithography. The fabrication process of the phase mask is optimized to generate the largest intensity ratio of diffracted ±1-order to zero-order. The phase mask is demonstrated to produce a photoresist pattern with halved period (90 nm) when illuminated with a laser of 157 nm wavelength. The phase masks are also capable of generating two-dimensional patterns of holes and dots and serving as molds for imprint applications. The third part of this thesis is the study of the bubble effect for 193 nm wavelength immersion interference lithography.
Faiz, Fairuza. "Detection of Perfluoroalkyl Compounds with Polyvinylidene Fluoride Coated Optical Fibre". Thesis, 2019. https://vuir.vu.edu.au/40594/.
Texto completo da fonteLivros sobre o assunto "Optical Interference Coating"
Kaiser, Norbert, e Hans K. Pulker, eds. Optical Interference Coatings. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6.
Texto completo da fonteAmerica, Optical Society of, ed. Optical interference coatings: Postconference digest. Washington, DC: Optical Society of America, 2001.
Encontre o texto completo da fonteF, Abelès, Society of Photo-optical Instrumentation Engineers. e France. Ministère de la défense. Direction des recherches, études et techniques., eds. Optical interference coatings: 6-10 June 1994, Grenoble, France. Bellingham, Wash., USA: SPIE, 1994.
Encontre o texto completo da fonteOptical Interference Coatings Topical Meeting (1988 Tucson, Ariz.). Optical interference coatings: Summaries of papers presented at the Optical Interference Coatings Topical Meeting, April 12-15,1988, Tucson, Arizona. Washington, D.C: OSA, 1988.
Encontre o texto completo da fonteOptical Interference Coatings Topical Meeting (1992 Tucson, Ariz.). Optical interference coatings: Summaries of papers presented at the Optical Interference Coatings Topical Meeting, June 1-5, 1992, Tucson, Arizona. Washington, DC: Optical Society of America, 1992.
Encontre o texto completo da fonteOptical Interference Coatings Topical Meeting (1995 Tucson, Ariz.). Optical interference coatings: Summaries of the papers presented at the topical meeting, June 5-9, 1995, Tucson, Arizona. Washington, DC: OSA, 1995.
Encontre o texto completo da fonteAmerica, Optical Society of, ed. Optical interference coatings: June 7-12, 1998, Loews Ventana Canyon Resort, Tucson, Arizona. Washington, D.C: Optical Society of America, 1998.
Encontre o texto completo da fonteClaude, Amra, Macleod H. A, European Optical Society, European Commission. Directorate-General XII, Science, Research, and Development. e Society of Photo-optical Instrumentation Engineers., eds. Advances in optical interference coatings: 25-27 May 1999, Berlin, Germany. Bellingham, Wash., USA: SPIE, 1999.
Encontre o texto completo da fonteOptica, Robert Sargent e Anna Sytchkova. Optica Optical Interference Coatings Conference 2022. Optical Society of America, 2022.
Encontre o texto completo da fonteKaiser, Norbert, e Hans K. Pulker. Optical Interference Coatings. Springer, 2013.
Encontre o texto completo da fonteCapítulos de livros sobre o assunto "Optical Interference Coating"
Friz, Martin, e Friedrich Waibel. "Coating Materials". In Optical Interference Coatings, 105–30. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_5.
Texto completo da fonteVukusic, Peter. "Natural Coatings". In Optical Interference Coatings, 1–34. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_1.
Texto completo da fonteStolz, Christopher J., e François Y. Génin. "Laser Resistant Coatings". In Optical Interference Coatings, 309–33. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_13.
Texto completo da fonteEscoubas, Ludovic, e Francois Flory. "Optical Thin Films for Micro-Components". In Optical Interference Coatings, 231–55. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_10.
Texto completo da fonteThielsch, Roland. "Optical Coatings for the DUV / VUV". In Optical Interference Coatings, 257–79. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_11.
Texto completo da fonteYulin, Sergey. "Multilayer Coatings for EUV/Soft X-ray Mirrors". In Optical Interference Coatings, 281–307. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_12.
Texto completo da fonteGatto, Alexandre. "Coatings for UV- Free Electron Lasers". In Optical Interference Coatings, 335–58. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_14.
Texto completo da fonteMartinu, Ludvik, e Jolanta E. Klemberg-Sapieha. "Optical Coatings on Plastics". In Optical Interference Coatings, 359–91. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_15.
Texto completo da fonteTempea, Gabriel, Vladislav Yakovlev e Ferenc Krausz. "Interference Coatings for Ultrafast Optics". In Optical Interference Coatings, 393–422. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_16.
Texto completo da fonteLi, Li. "Optical Coatings for Displays". In Optical Interference Coatings, 423–54. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-36386-6_17.
Texto completo da fonteTrabalhos de conferências sobre o assunto "Optical Interference Coating"
Herrmann, R., R. Goetzelmann e R. Schneider. "Stability of Dielectric Multilayer Coatings Produced by Different Coating Technologies". In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1988. http://dx.doi.org/10.1364/oic.1988.thd11.
Texto completo da fonteCole, C., e J. W. Bowen. "Synthesis method for visible and infrared broadband spaceflight anti reflection coatings". In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1995. http://dx.doi.org/10.1364/oic.1995.mb9.
Texto completo da fonteSchulz, U., N. Kaiser e A. Zöller. "Plasma Surface Modification and Coating of PMMA". In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.tuf.2.
Texto completo da fonteHussmann, Eckart K., Nanning J. Arfsten, Hans-Ulrich Heusler, Peter H. Roehlen e Hermann J. Piehlke. "Antireflective coatings on very large substrates by the dip coating process". In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1988. http://dx.doi.org/10.1364/oic.1988.thd10.
Texto completo da fonteLubezky, I., e I. Szafranek. "AR coating design: An efficient coating for germanium in the 7.5-12.5μm region". In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1988. http://dx.doi.org/10.1364/oic.1988.fa1.
Texto completo da fonteMartinu, Ludvik. "Optical coating on plastics". In Optical Interference Coatings. Washington, D.C.: OSA, 2001. http://dx.doi.org/10.1364/oic.2001.mf1.
Texto completo da fonteHarry, G. M., H. Armandula, L. Zhang, G. Billingsley, D. Coyne e D. Shoemaker. "Advanced LIGO coating research". In Optical Interference Coatings. Washington, D.C.: OSA, 2004. http://dx.doi.org/10.1364/oic.2004.fb5.
Texto completo da fontesamori, shingo, T. Sugawara, S. Agatsuma, M. Ishida, S. Yamamoto, M. Miyauchi, Y. Jiang e E. Nagae. "RAS Bias Voltage Coating". In Optical Interference Coatings. Washington, D.C.: OSA, 2013. http://dx.doi.org/10.1364/oic.2013.wc.3.
Texto completo da fontePoitras, Daniel. "Facet Coating Design Robustness". In Optical Interference Coatings. Washington, D.C.: OSA, 2019. http://dx.doi.org/10.1364/oic.2019.tc.4.
Texto completo da fonteGeorge, Linu, Sumedha e R. Vijaya. "Improving Antireflection by Double-sided Coating on Common Substrates for NIR range". In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 2022. http://dx.doi.org/10.1364/oic.2022.td.8.
Texto completo da fonte