Artigos de revistas sobre o tema "Nanosecond laser annealing"
Crie uma referência precisa em APA, MLA, Chicago, Harvard, e outros estilos
Veja os 50 melhores artigos de revistas para estudos sobre o assunto "Nanosecond laser annealing".
Ao lado de cada fonte na lista de referências, há um botão "Adicionar à bibliografia". Clique e geraremos automaticamente a citação bibliográfica do trabalho escolhido no estilo de citação de que você precisa: APA, MLA, Harvard, Chicago, Vancouver, etc.
Você também pode baixar o texto completo da publicação científica em formato .pdf e ler o resumo do trabalho online se estiver presente nos metadados.
Veja os artigos de revistas das mais diversas áreas científicas e compile uma bibliografia correta.
Pilipovich, V. A., V. L. Malevich, G. D. Ivlev e V. V. Zhidkov. "Dynamics of nanosecond laser annealing of silicon". Journal of Engineering Physics 48, n.º 2 (fevereiro de 1985): 228–33. http://dx.doi.org/10.1007/bf00871878.
Texto completo da fonteCasiez, L., N. Bernier, J. Chrétien, J. Richy, D. Rouchon, M. Bertrand, F. Mazen et al. "Recrystallization of thick implanted GeSn layers with nanosecond laser annealing". Journal of Applied Physics 131, n.º 15 (21 de abril de 2022): 153103. http://dx.doi.org/10.1063/5.0085107.
Texto completo da fonteLarrey, Vincent, Arthur Arribehaute, Brendon Caulfield, Pablo Acosta Alba, Christophe Morales, Paul Noël, Mathieu Opprecht, Frank Fournel, Didier Landru e Francois Rieutord. "Nanosecond Laser Irradiation for Interface Bonding Characterization". ECS Meeting Abstracts MA2023-02, n.º 33 (22 de dezembro de 2023): 1589. http://dx.doi.org/10.1149/ma2023-02331589mtgabs.
Texto completo da fonteZhvavyi, S. P., e O. L. Sadovskaya. "Nanosecond Laser Annealing of Implanted Silicon: Simulation of Dynamics". Physica Status Solidi (a) 112, n.º 1 (16 de março de 1989): K19—K22. http://dx.doi.org/10.1002/pssa.2211120166.
Texto completo da fonteGerlinger, Kathinka, Bastian Pfau, Martin Hennecke, Lisa-Marie Kern, Ingo Will, Tino Noll, Markus Weigand et al. "Pump–probe x-ray microscopy of photo-induced magnetization dynamics at MHz repetition rates". Structural Dynamics 10, n.º 2 (março de 2023): 024301. http://dx.doi.org/10.1063/4.0000167.
Texto completo da fontePark, Sang Yeon, Younggon Choi, Yong Hyeok Seo, Hojun Kim, Dong Hyun Lee, Phuoc Loc Truong, Yongmin Jeon et al. "355 nm Nanosecond Ultraviolet Pulsed Laser Annealing Effects on Amorphous In-Ga-ZnO Thin Film Transistors". Micromachines 15, n.º 1 (5 de janeiro de 2024): 103. http://dx.doi.org/10.3390/mi15010103.
Texto completo da fonteAlloyeau, Damien, Christian Ricolleau, Cyril Langlois, Yann Le Bouar e Annick Loiseau. "Flash laser annealing for controlling size and shape of magnetic alloy nanoparticles". Beilstein Journal of Nanotechnology 1 (22 de novembro de 2010): 55–59. http://dx.doi.org/10.3762/bjnano.1.7.
Texto completo da fonteCoelho, João M. P., Catarina Silva, Andreia Ruivo e António Pires de Matos. "Infrared Nanosecond Laser Radiation in the Creation of Gold and Copper Nanoparticles". Materials Science Forum 730-732 (novembro de 2012): 915–19. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.915.
Texto completo da fonteDeng, Ying, Anthony Pelton e R. A. Mayanovic. "Comparison of Vanadium Oxide Thin Films Prepared Using Femtosecond and Nanosecond Pulsed Laser Deposition". MRS Advances 1, n.º 39 (2016): 2737–42. http://dx.doi.org/10.1557/adv.2016.311.
Texto completo da fontede Silva, Milantha, Seiji Ishikawa, Takamaro Kikkawa e Shinichiro Kuroki. "Low Resistance Ohmic Contact Formation on 4H-SiC C-Face with NbNi Silicidation Using Nanosecond Laser Annealing". Materials Science Forum 858 (maio de 2016): 549–52. http://dx.doi.org/10.4028/www.scientific.net/msf.858.549.
Texto completo da fonteAcosta Alba, Pablo, Joris Aubin, Sylvain Perrot, Fulvio Mazzamuto, Adeline Grenier e Sébastien Kerdilès. "Solid phase recrystallization induced by multi-pulse nanosecond laser annealing". Applied Surface Science Advances 3 (março de 2021): 100053. http://dx.doi.org/10.1016/j.apsadv.2020.100053.
Texto completo da fonteBhaumik, Anagh, e Jagdish Narayan. "Nano-to-micro diamond formation by nanosecond pulsed laser annealing". Journal of Applied Physics 126, n.º 12 (28 de setembro de 2019): 125307. http://dx.doi.org/10.1063/1.5118890.
Texto completo da fonteMariño, Mariana, Philippe Breuil, Mathilde Rieu, Damien Jamon, Jean-Michel Rampnoux, Jean-Paul Viricelle e Florence Garrelie. "Simulation of nanosecond IR laser annealing of cerium gadolinium oxide". Journal of the European Ceramic Society 38, n.º 11 (setembro de 2018): 3875–80. http://dx.doi.org/10.1016/j.jeurceramsoc.2018.04.035.
Texto completo da fonteKovalenko, A. F. "Annealing of Glassy and Ceramic Materials by Nanosecond Laser Pulses". Glass and Ceramics 75, n.º 5-6 (setembro de 2018): 242–45. http://dx.doi.org/10.1007/s10717-018-0064-z.
Texto completo da fontePyo, Jeongsang, Hyun Yeol Ryu, Jinhong Park, Minbaek Lee e Han-Youl Ryu. "Laser-Power Dependence of Poly-Silicon Crystallization Using 355-nm Nanosecond Laser Annealing". Journal of the Korean Physical Society 76, n.º 12 (junho de 2020): 1116–20. http://dx.doi.org/10.3938/jkps.76.1116.
Texto completo da fonteLevytskyi, S. M. "MECHANISMS OF INDIUM MASS TRANSFER IN Cd(Zn)Te UNDER THE ACTION OF NANOSECOND LASER PULSES". Optoelektronìka ta napìvprovìdnikova tehnìka 58 (21 de dezembro de 2023): 178–86. http://dx.doi.org/10.15407/iopt.2023.58.178.
Texto completo da fonteRuffino, F., L. Romano, E. Carria, M. Miritello, M. G. Grimaldi, V. Privitera e F. Marabelli. "A Combined Ion Implantation/Nanosecond Laser Irradiation Approach towards Si Nanostructures Doping". Journal of Nanotechnology 2012 (2012): 1–6. http://dx.doi.org/10.1155/2012/635705.
Texto completo da fonteNikov, Ru, Ro Nikov, N. Nedyalkov, A. Dikovska e K. Grochowska. "Laser annealing of bimetal porous structures produced by PLD in open air". Journal of Physics: Conference Series 2240, n.º 1 (1 de março de 2022): 012045. http://dx.doi.org/10.1088/1742-6596/2240/1/012045.
Texto completo da fonteEliceiri, Matthew, Yoonsoo Rho, Runxuan Li e Costas P. Grigoropoulos. "Pulsed laser induced atomic layer etching of silicon". Journal of Vacuum Science & Technology A 41, n.º 2 (março de 2023): 022602. http://dx.doi.org/10.1116/6.0002399.
Texto completo da fonteNedyalkov, Nikolay, Mihaela Koleva, Nadya Stankova, Rosen Nikov, Mitsuhiro Terakawa, Yasutaka Nakajima, Lyubomir Aleksandrov e Reni Iordanova. "Laser-assisted fabrication of gold nanoparticle-composed structures embedded in borosilicate glass". Beilstein Journal of Nanotechnology 8 (21 de novembro de 2017): 2454–63. http://dx.doi.org/10.3762/bjnano.8.244.
Texto completo da fonteBugaev, Kirill O., Anastasia A. Zelenina e Vladimir A. Volodin. "Vibrational Spectroscopy of Chemical Species in Silicon and Silicon-Rich Nitride Thin Films". International Journal of Spectroscopy 2012 (2 de outubro de 2012): 1–5. http://dx.doi.org/10.1155/2012/281851.
Texto completo da fonteFrauenrath, Marvin, Pablo Acosta Alba, Anne-Marie Papon e Jean-Michel Hartmann. "Nanosecond Laser Annealing of In-Situ Boron-Doped Ge Layers for Dopant Activation". ECS Transactions 109, n.º 4 (30 de setembro de 2022): 303–16. http://dx.doi.org/10.1149/10904.0303ecst.
Texto completo da fonteKlinger, D., E. Łusakowska e D. Żymierska. "Nano-structure formed by nanosecond laser annealing on amorphous Si surface". Materials Science in Semiconductor Processing 9, n.º 1-3 (fevereiro de 2006): 323–26. http://dx.doi.org/10.1016/j.mssp.2006.01.027.
Texto completo da fonteZhou, Yigang, Jiantao Zhou, Zhiqiang Tian, Fang Dong, Sheng Liu e Jiangang Wang. "Improving the crystal quality of AlN films by nanosecond laser annealing". Journal of Manufacturing Processes 84 (dezembro de 2022): 1519–25. http://dx.doi.org/10.1016/j.jmapro.2022.11.009.
Texto completo da fonteFrauenrath, M., P. Acosta Alba, O. Concepción, J. H. Bae, N. Gauthier, E. Nolot, M. Veillerot, N. Bernier, D. Buca e J. M. Hartmann. "Nanosecond laser annealing of pseudomorphic GeSn layers: Impact of Sn content". Materials Science in Semiconductor Processing 163 (agosto de 2023): 107549. http://dx.doi.org/10.1016/j.mssp.2023.107549.
Texto completo da fonteNtemogiannis, Dimitrios, Panagiotis Floropoulos, Vagelis Karoutsos, Spyridon Grammatikopoulos, Panagiotis Poulopoulos e Dimitris Alexandropoulos. "Plasmonic Nanostructuring by Means of Industrial-Friendly Laser Techniques". Photonics 10, n.º 4 (30 de março de 2023): 384. http://dx.doi.org/10.3390/photonics10040384.
Texto completo da fonteSilva, Catarina, João M. P. Coelho, Andreia Ruivo, Maria Luísa Botelho e António Pires de Matos. "Nanosecond Near-Infrared Laser Discoloration of Gamma Irradiated Silicate Glasses". Materials Science Forum 730-732 (novembro de 2012): 123–28. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.123.
Texto completo da fonteВолодин, В. А., Г. К. Кривякин, Г. Д. Ивлев, С. Л. Прокопьев, С. В. Гусакова e А. А. Попов. "Кристаллизация плeнок аморфного германия и многослойных структур a-Ge/a-Si под действием наносекундного лазерного излучения". Физика и техника полупроводников 53, n.º 3 (2019): 423. http://dx.doi.org/10.21883/ftp.2019.03.47298.8997.
Texto completo da fonteDaubriac, R., P. Acosta Alba, C. Marcenat, S. Lequien, T. D. Vethaak, F. Nemouchi, F. Lefloch e S. Kerdilès. "Superconducting Polycrystalline Silicon Layer Obtained by Boron Implantation and Nanosecond Laser Annealing". ECS Journal of Solid State Science and Technology 10, n.º 1 (1 de janeiro de 2021): 014004. http://dx.doi.org/10.1149/2162-8777/abdc41.
Texto completo da fonteKerdilès, Sébastien, Pablo Acosta-Alba, Anne-Sophie Royet, Jessica Lassarre, Cédric Perrot, François Aussenac, Laurent Brunet e Claire Fenouillet-Beranger. "Ultraviolet Nanosecond Laser Annealing for Low Temperature 3D-Sequential Integration Gate Stack". ECS Transactions 93, n.º 1 (22 de outubro de 2019): 19–22. http://dx.doi.org/10.1149/09301.0019ecst.
Texto completo da fonteGupta, Siddharth, Ritesh Sachan, Anagh Bhaumik e Jagdish Narayan. "Enhanced mechanical properties of Q-carbon nanocomposites by nanosecond pulsed laser annealing". Nanotechnology 29, n.º 45 (11 de setembro de 2018): 45LT02. http://dx.doi.org/10.1088/1361-6528/aadd75.
Texto completo da fonteSADRNEZHAAD, S. K., NOUSHIN YASAVOL, MANSOUREH GANJALI e SOHRAB SANJABI. "Property change during nanosecond pulse laser annealing of amorphous NiTi thin film". Bulletin of Materials Science 35, n.º 3 (junho de 2012): 357–64. http://dx.doi.org/10.1007/s12034-012-0293-7.
Texto completo da fonteIvlev, G. D., e V. L. Malevich. "On Phase Transitions Stimulated in Amorphized Silicon by Nanosecond Pulsed Laser Annealing". Physica Status Solidi (a) 103, n.º 2 (16 de outubro de 1987): K87—K91. http://dx.doi.org/10.1002/pssa.2211030244.
Texto completo da fonteScandurra, Antonino, Francesco Ruffino e Maria Grazia Grimaldi. "Graphene Paper-Gold Nanostructured Electrodes Obtained by Laser Dewetting for High Sensitive Non-Enzymatic Glucose Sensing". Proceedings 15, n.º 1 (19 de junho de 2019): 1. http://dx.doi.org/10.3390/proceedings2019015001.
Texto completo da fonteCHEN, Cui-fen, Tie-min ZHANG, Zi-lin WANG, Lian-cong GAO, Chang SU, Ke WANG, An-chen WANG, Zhong-mei HUANG, Wei-qi HUANG e Hong-yan PENG. "Annealing effect on photoluminescence in silicon quantum dots prepared by nanosecond pulsed laser". Chinese Journal of Liquid Crystals and Displays 37, n.º 6 (2022): 703–8. http://dx.doi.org/10.37188/cjlcd.2022-0078.
Texto completo da fonteBhaumik, Anagh, e Jagdish Narayan. "Direct conversion of carbon nanofibers into diamond nanofibers using nanosecond pulsed laser annealing". Physical Chemistry Chemical Physics 21, n.º 13 (2019): 7208–19. http://dx.doi.org/10.1039/c9cp00063a.
Texto completo da fonteKlinger, D., J. Auleytner, D. Żymierska, B. Kozankiewicz, A. Barcz, L. Nowicki e A. Stonert. "Evolution of defect structure of Ge-implanted Si crystal during nanosecond laser annealing". European Physical Journal Applied Physics 27, n.º 1-3 (julho de 2004): 149–53. http://dx.doi.org/10.1051/epjap:2004133.
Texto completo da fonteFrauenrath, Marvin, Pablo Acosta Alba, Anne-Marie Papon e Jean-Michel Hartmann. "Nanosecond Laser Annealing of In-Situ Boron-Doped Ge Layers for Dopant Activation". ECS Meeting Abstracts MA2022-02, n.º 32 (9 de outubro de 2022): 1228. http://dx.doi.org/10.1149/ma2022-02321228mtgabs.
Texto completo da fonteFrechilla, Alejandro, Mari Napari, Nives Strkalj, Eduardo Barriuso, Kham Niang, Markus Hellenbrand, Pavel Strichovanec et al. "Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing". Applied Materials Today 36 (fevereiro de 2024): 102033. http://dx.doi.org/10.1016/j.apmt.2023.102033.
Texto completo da fonteNemoto, Keisuke, e Yasutaka Hanada. "Etching-Assisted Ablation of the UV-Transparent Fluoropolymer CYTOP Using Various Laser Pulse Widths and Subsequent Microfluidic Applications". Micromachines 9, n.º 12 (15 de dezembro de 2018): 662. http://dx.doi.org/10.3390/mi9120662.
Texto completo da fonteDaubriac, Richard, Rémi Demoulin, Sebastien Kerdiles, Pablo Acosta Alba, Jean-Michel Hartmann, Jean-Paul Barnes, Pawel Michałowski et al. "Impact of Nanosecond Laser Annealing on the Electrical Properties of Highly Boron-Doped Ultrathin Strained Si0.7Ge0.3 Layers". ECS Meeting Abstracts MA2022-01, n.º 29 (7 de julho de 2022): 1279. http://dx.doi.org/10.1149/ma2022-01291279mtgabs.
Texto completo da fonteSafronov, Ivan S., Aleksandra A. Neplueva e Ivan V. Ushakov. "Mechanical Properties of Laser Treated Thin Sample of an Amorphous-Nanocrystalline Metallic Alloy Depending on the Initial Annealing Temperature". Defect and Diffusion Forum 410 (17 de agosto de 2021): 489–94. http://dx.doi.org/10.4028/www.scientific.net/ddf.410.489.
Texto completo da fonteTabata, Toshiyuki. "Nucleation and crystal growth in HfO2 thin films by UV nanosecond pulsed laser annealing". Applied Physics Express 13, n.º 1 (9 de dezembro de 2019): 015509. http://dx.doi.org/10.7567/1882-0786/ab5ce2.
Texto completo da fonteKim, Jin-Hyun, Hyung-Min Ji, Manh-Cuong Nguyen, An Hoang-Thuy Nguyen, Sang-Woo Kim, Jong-Yeon Baek, Jiyoung Kim e Rino Choi. "Low-temperature dopant activation using nanosecond ultra-violet laser annealing for monolithic 3D integration". Thin Solid Films 735 (outubro de 2021): 138864. http://dx.doi.org/10.1016/j.tsf.2021.138864.
Texto completo da fonteDagault, Lea, Pablo Acosta-Alba, Sébastien Kerdilès, Jean-Paul Barnes, Jean-Michel Hartmann, Patrice Gergaud, Than Tra Nguyen, Adeline Grenier, Joris Aubin e Fuccio Cristiano. "Composition and Strain Evolution of Undoped Si0.8Ge0.2 Layers Submitted to UV-Nanosecond Laser Annealing". ECS Transactions 86, n.º 7 (20 de julho de 2018): 29–39. http://dx.doi.org/10.1149/08607.0029ecst.
Texto completo da fonteNedyalkov, N., N. E. Stankova, M. E. Koleva, R. Nikov, M. Grozeva, E. Iordanova, G. Yankov, L. Aleksandrov, R. Iordanova e D. Karashanova. "Optical properties modification of gold doped glass induced by nanosecond laser radiation and annealing". Optical Materials 75 (janeiro de 2018): 646–53. http://dx.doi.org/10.1016/j.optmat.2017.10.032.
Texto completo da fonteBoneberg, J., J. Bischof e P. Leiderer. "Nanosecond time-resolved reflectivity determination of the melting of metals upon pulsed laser annealing". Optics Communications 174, n.º 1-4 (janeiro de 2000): 145–49. http://dx.doi.org/10.1016/s0030-4018(99)00660-4.
Texto completo da fonteLi, C. I., N. Breil, T. Y. Wen, S. Y. Liu, M. S. Hsieh, S. J. Yen, C. W. Chang et al. "p-Type MOSFET Contact Resistance Improvement by Conformal Plasma Doping and Nanosecond Laser Annealing". IEEE Electron Device Letters 40, n.º 2 (fevereiro de 2019): 307–9. http://dx.doi.org/10.1109/led.2019.2890950.
Texto completo da fonteChun, Doo-Man, Chi-Vinh Ngo e Kyong-Min Lee. "Fast fabrication of superhydrophobic metallic surface using nanosecond laser texturing and low-temperature annealing". CIRP Annals 65, n.º 1 (2016): 519–22. http://dx.doi.org/10.1016/j.cirp.2016.04.019.
Texto completo da fonteShin, Hyunsu, Minhyung Lee, Eunjung Ko, Hwa-yoen Ryu, Seran Park, Eunha Kim e Dae-Hong Ko. "Dopant Activation of In Situ Phosphorus‐Doped Silicon Using Multi‐Pulse Nanosecond Laser Annealing". physica status solidi (a) 217, n.º 12 (5 de março de 2020): 1900988. http://dx.doi.org/10.1002/pssa.201900988.
Texto completo da fonte