Artigos de revistas sobre o tema "Nano imprint lithographie"
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Yang, Ki Yeon, Sung Hoon Hong, Heon Lee e Jeong Woo Choi. "Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography". Materials Science Forum 510-511 (março de 2006): 446–49. http://dx.doi.org/10.4028/www.scientific.net/msf.510-511.446.
Texto completo da fonteYan, Le, Lei Yin e Hong Zhong Liu. "Nanoimprint Lithography of Multistep Loading". Advanced Materials Research 383-390 (novembro de 2011): 7214–19. http://dx.doi.org/10.4028/www.scientific.net/amr.383-390.7214.
Texto completo da fonteChoi, Su Hyun, Do Hyeog Kim, Seonjun Kim, Woo Young Kim, Seok Kim e Young Tae Cho. "Tulip-Shaped Pattern Imprinting for Omni-Phobic Surfaces Using Partially Cured Photopolymer". Applied Sciences 11, n.º 4 (16 de fevereiro de 2021): 1747. http://dx.doi.org/10.3390/app11041747.
Texto completo da fonteRessier, L., E. Palleau e S. Behar. "Electrical nano-imprint lithography". Nanotechnology 23, n.º 25 (31 de maio de 2012): 255302. http://dx.doi.org/10.1088/0957-4484/23/25/255302.
Texto completo da fonteLee, Heon, Ki Yeon Yang e Sung Hoon Hong. "Fabrication of 100nm Sized Patterns on Flexible Polyethylene-Terephthalate Substrate Using Monomer Based Thermal Curing Nanoimprint Lithography". Solid State Phenomena 121-123 (março de 2007): 657–60. http://dx.doi.org/10.4028/www.scientific.net/ssp.121-123.657.
Texto completo da fonteLöber, Dennis, Subhayan Dey, Burhan Kaban, Fabian Roesler, Martin Maurer, Hartmut Hillmer e Rudolf Pietschnig. "3D Micro/Nanopatterning of a Vinylferrocene Copolymer". Molecules 25, n.º 10 (23 de maio de 2020): 2438. http://dx.doi.org/10.3390/molecules25102438.
Texto completo da fonteCrespo-Monteiro, Nicolas, Arnaud Valour, Victor Vallejo-Otero, Marie Traynar, Stéphanie Reynaud, Emilie Gamet e Yves Jourlin. "Versatile Zirconium Oxide (ZrO2) Sol-Gel Development for the Micro-Structuring of Various Substrates (Nature and Shape) by Optical and Nano-Imprint Lithography". Materials 15, n.º 16 (15 de agosto de 2022): 5596. http://dx.doi.org/10.3390/ma15165596.
Texto completo da fonteHirai, Yoshihiko, e Yoshio Tanaka. "Application of Nano-imprint Lithography." Journal of Photopolymer Science and Technology 15, n.º 3 (2002): 475–80. http://dx.doi.org/10.2494/photopolymer.15.475.
Texto completo da fonteBottein, Thomas, Olivier Dalstein, Magali Putero, Andrea Cattoni, Marco Faustini, Marco Abbarchi e David Grosso. "Environment-controlled sol–gel soft-NIL processing for optimized titania, alumina, silica and yttria-zirconia imprinting at sub-micron dimensions". Nanoscale 10, n.º 3 (2018): 1420–31. http://dx.doi.org/10.1039/c7nr07491c.
Texto completo da fonteKim, Hyong-Jun, Wanseo Kim e Hwanhee Cho. "Lambertian Extraction of Light from Organic Light-Emitting Devices Using Randomly Dispersed Sub-Wavelength Pillar Arrays". Journal of Nanoscience and Nanotechnology 21, n.º 7 (1 de julho de 2021): 3909–13. http://dx.doi.org/10.1166/jnn.2021.19229.
Texto completo da fonteAltun, Ali Ozhan, Jun-Ho Jeong, Sung-Un Jung, Ki-Don Kim, Dae-Geun Choi, Jun-Hyuk Choi, Jong-Youp Shim, Dong-II Lee e Eung-Sug Lee. "Stamping-Based Planarization of Flexible Substrate for Low-Pressure UV Nanoimprint Lithography". Journal of Nanoscience and Nanotechnology 8, n.º 11 (1 de novembro de 2008): 5673–77. http://dx.doi.org/10.1166/jnn.2008.254.
Texto completo da fonteLee, Jihoon, Sung Ho Lee e Moon Kyu Kwak. "Durable Soft Mold for Imprinting of High-Adhesive Resin". Coatings 11, n.º 2 (27 de janeiro de 2021): 137. http://dx.doi.org/10.3390/coatings11020137.
Texto completo da fonteSchift, Helmut, Sunggook Park e Jens Gobrecht. "Nano-Imprint-Molding Resists for Lithography". Journal of Photopolymer Science and Technology 16, n.º 3 (2003): 435–38. http://dx.doi.org/10.2494/photopolymer.16.435.
Texto completo da fonteMarín, Jose Manuel Román, Henrik Koblitz Rasmussen e Ole Hassager. "3D Simulation of Nano-Imprint Lithography". Nanoscale Research Letters 5, n.º 2 (13 de novembro de 2009): 274–78. http://dx.doi.org/10.1007/s11671-009-9475-7.
Texto completo da fonteLi, Mingjie, Yulong Chen, Wenxin Luo e Xing Cheng. "Interfacial Interactions during Demolding in Nanoimprint Lithography". Micromachines 12, n.º 4 (24 de março de 2021): 349. http://dx.doi.org/10.3390/mi12040349.
Texto completo da fonteShin, Ju-Hyeon, Bit-Na Go, Hak-Jong Choi, Joong-Yeon Cho, Albert Sung Soo Lee, Seung Sang Hwang, Hyuk Jin Cha e Heon Lee. "Fabrication of functional nanosized patterns with UV-curable polysilsesquioxane on photovoltaic protective glass substrates using hybrid nano-imprint lithography". J. Mater. Chem. C 2, n.º 29 (2014): 5864–69. http://dx.doi.org/10.1039/c4tc00101j.
Texto completo da fonteLee, Taeksu, Sanghee Jung, Soongeun Kwon, Woochang Kim, Jinsung Park, Hyungjun Lim e JaeJong Lee. "Formation of Interstitial Hot-Spots Using the Reduced Gap-Size between Plasmonic Microbeads Pattern for Surface-Enhanced Raman Scattering Analysis". Sensors 19, n.º 5 (1 de março de 2019): 1046. http://dx.doi.org/10.3390/s19051046.
Texto completo da fonteLee, HeeJung, Seungmin Hyun, HakJoo Lee, DaeGeun Choi, DongIl Lee e EungSug Lee. "P-37 A study of adhesion force characteristics using rhombus-shaped AFM probe for nano-imprint lithography". Abstracts of ATEM : International Conference on Advanced Technology in Experimental Mechanics : Asian Conference on Experimental Mechanics 2007.6 (2007): _P—37–1_—_P—37–4_. http://dx.doi.org/10.1299/jsmeatem.2007.6._p-37-1_.
Texto completo da fonteHIRAI, Yoshihiko. "Fine Pattern Fabrication by Nano Imprint Lithography". Kobunshi 52, n.º 8 (2003): 568. http://dx.doi.org/10.1295/kobunshi.52.568.
Texto completo da fonteYang, Ki Yeon, Jong Woo Kim, Sung Hoon Hong e Heon Lee. "Patterning of the Self-Assembled Monolayer Using the Zero Residual Nano-Imprint Lithography". Solid State Phenomena 124-126 (junho de 2007): 523–26. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.523.
Texto completo da fonteOKAZAKI, SHINJI. "CURRENT ISSUES AND FUTURE PROSPECTS OF LITHOGRAPHY". International Journal of High Speed Electronics and Systems 16, n.º 01 (março de 2006): 375–87. http://dx.doi.org/10.1142/s0129156406003709.
Texto completo da fonteLee, Jae Jong, Seung Woo Lee, Hyun Taek Cho, Gee Hong Kim e Kee Bong Choi. "Single-Step UV Nanoimprinting Lithography with Multi-Head Imprinting System and Its Applications". Key Engineering Materials 326-328 (dezembro de 2006): 441–44. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.441.
Texto completo da fonteZhang, Yuan, Sherjang Singh, Ssuwei Chen, Peter Dress e Uwe Dietze. "Mask Cleaning in EUV and Nano-Imprint Lithography". ECS Transactions 27, n.º 1 (17 de dezembro de 2019): 467–72. http://dx.doi.org/10.1149/1.3360661.
Texto completo da fonteMoran, Isaac W., Alejandro L. Briseno, Stephen Loser e Kenneth R. Carter. "Device Fabrication by Easy Soft Imprint Nano-Lithography". Chemistry of Materials 20, n.º 14 (julho de 2008): 4595–601. http://dx.doi.org/10.1021/cm800480z.
Texto completo da fonteDiBiase, T., M. Ahamdian e I. Malik. "Comprehensive defect analysis methodology for nano imprint lithography". Microelectronic Engineering 84, n.º 5-8 (maio de 2007): 989–93. http://dx.doi.org/10.1016/j.mee.2007.01.080.
Texto completo da fonteWang, Li, Bing-heng Lu, Yu-cheng Ding, Zhi-hui Qiu e Hong-zhong Liu. "A nano-scale alignment method for imprint lithography". Frontiers of Mechanical Engineering in China 1, n.º 2 (junho de 2006): 157–61. http://dx.doi.org/10.1007/s11465-006-0014-2.
Texto completo da fonteDrieschner, Simon, Fabian Kloiber, Marc Hennemeyer, Jan J. Klein e Manuel W. Thesen. "High quality diffractive optical elements (DOEs) using SMILE imprint technique". Advanced Optical Technologies 10, n.º 1 (25 de janeiro de 2021): 11–16. http://dx.doi.org/10.1515/aot-2020-0053.
Texto completo da fonteGoto, Kohei, e Jun Taniguchi. "Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography". Advanced Optical Technologies 8, n.º 3-4 (26 de junho de 2019): 289–97. http://dx.doi.org/10.1515/aot-2019-0017.
Texto completo da fonteByeon, Kyeong Jae, Sung Hoon Hong, Ki Yeon Yang, Deok Kee Kim e Heon Lee. "Embossing on Epoxy Thermoset Polymer Using SiO2 Coated Nickel Template". Materials Science Forum 539-543 (março de 2007): 3580–85. http://dx.doi.org/10.4028/www.scientific.net/msf.539-543.3580.
Texto completo da fonteByeon, Kyeong Jae, Sung Hoon Hong, Ki Yeon Yang, Deok Kee Kim e Heon Lee. "Embossing on Epoxy Thermoset Polymer Using SiO2 Coated Nickel Template". Materials Science Forum 539-543 (março de 2007): 968–73. http://dx.doi.org/10.4028/www.scientific.net/msf.539-543.968.
Texto completo da fontePark, Kyoung Hoon, Jun Hong Park e Dong Pyo Kim. "Fabrication of Nanoscale SiC-Based Ceramic Patterns with Near-Zero Residual Layers by Using Imprinting Technique and Reactive Ion Etching". Materials Science Forum 510-511 (março de 2006): 766–69. http://dx.doi.org/10.4028/www.scientific.net/msf.510-511.766.
Texto completo da fonteNagase, Kenichi, Risa Shukuwa, Takahiro Onuma, Masayuki Yamato, Naoya Takeda e Teruo Okano. "Micro/nano-imprinted substrates grafted with a thermoresponsive polymer for thermally modulated cell separation". Journal of Materials Chemistry B 5, n.º 30 (2017): 5924–30. http://dx.doi.org/10.1039/c7tb01251a.
Texto completo da fonteRenn, Jyh Chyang, Yi An Yang e Cherng Shyong Chan. "Developing a Moving-Coil Actuator for Nano-Imprint Lithography System". Materials Science Forum 505-507 (janeiro de 2006): 1027–32. http://dx.doi.org/10.4028/www.scientific.net/msf.505-507.1027.
Texto completo da fonteKim, Jung Yup, Jae Hyun Kim e Byung Ik Choi. "Mechanical Behavior Simulation of PMMA for Nano Imprint Lithography Using Molecular Dynamics". Key Engineering Materials 345-346 (agosto de 2007): 979–82. http://dx.doi.org/10.4028/www.scientific.net/kem.345-346.979.
Texto completo da fonteLi, Changhe, YuPing Wei e Sheng Wang. "Developments and Recent Patents on Nano-Imprint Lithography Techniques". Recent Patents on Mechanical Engineering 6, n.º 1 (1 de dezembro de 2012): 37–47. http://dx.doi.org/10.2174/2212797611206010004.
Texto completo da fonteHan, Kang-Soo, Sung-Hoon Hong, Kang-In Kim, Joong-Yeon Cho, Kyung-woo Choi e Heon Lee. "Fabrication of 3D nano-structures using reverse imprint lithography". Nanotechnology 24, n.º 4 (4 de janeiro de 2013): 045304. http://dx.doi.org/10.1088/0957-4484/24/4/045304.
Texto completo da fonteDauksher, W. J., N. V. Le, E. S. Ainley, K. J. Nordquist, K. A. Gehoski, S. R. Young, J. H. Baker, D. Convey e P. S. Mangat. "Nano-imprint lithography: Templates, imprinting and wafer pattern transfer". Microelectronic Engineering 83, n.º 4-9 (abril de 2006): 929–32. http://dx.doi.org/10.1016/j.mee.2006.01.075.
Texto completo da fonteHirai, Yoshihiko, Satoshi Harada, Satoshi Isaka, Michio Kobayashi e Yoshio Tanaka. "Nano-Imprint Lithography Using Replicated Mold by Ni Electroforming". Japanese Journal of Applied Physics 41, Part 1, No. 6B (30 de junho de 2002): 4186–89. http://dx.doi.org/10.1143/jjap.41.4186.
Texto completo da fonteTsai, Hung Yin, Ching Wen Liu e Chia Jen Ting. "Fabrication of AR Film Using Nano-Imprint Process with a Diamond Mold". Advanced Materials Research 512-515 (maio de 2012): 2072–75. http://dx.doi.org/10.4028/www.scientific.net/amr.512-515.2072.
Texto completo da fonteVigneswaran, N., Fahmi Samsuri, Balu Ranganathan e Padmapriya. "Recent Advances in Nano Patterning and Nano Imprint Lithography for Biological Applications". Procedia Engineering 97 (2014): 1387–98. http://dx.doi.org/10.1016/j.proeng.2014.12.420.
Texto completo da fonteLee, Heon, Ki Yeon Yang, Sung Hoon Hong, C. D. Schaper e Gun Young Jung. "Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template". Solid State Phenomena 121-123 (março de 2007): 661–64. http://dx.doi.org/10.4028/www.scientific.net/ssp.121-123.661.
Texto completo da fonteHu, Guo Lin, Ming Syuan Chen, Chien Chung Chen, Hung Shan Chen, Chueh Ju Chen, Chang Chiang Cheng e Yu Cheng Lin. "80‐2: Liquid Crystal Surface Relief Diffractive Lens for Presbyopia". SID Symposium Digest of Technical Papers 54, n.º 1 (junho de 2023): 1125–27. http://dx.doi.org/10.1002/sdtp.16770.
Texto completo da fonteDănilă, Octavian, Doina Mănăilă-Maximean, Ana Bărar e Valery A. Loiko. "Non-Layered Gold-Silicon and All-Silicon Frequency-Selective Metasurfaces for Potential Mid-Infrared Sensing Applications". Sensors 21, n.º 16 (19 de agosto de 2021): 5600. http://dx.doi.org/10.3390/s21165600.
Texto completo da fonteSon, Ji Won, Nam Ho Song, Sung Han Rhim e Soo Ik Oh. "Prediction of Defects in Nano-Imprint Lithography Using FEM Simulation". Key Engineering Materials 345-346 (agosto de 2007): 665–68. http://dx.doi.org/10.4028/www.scientific.net/kem.345-346.665.
Texto completo da fonteSekiguchi, Atsushi, Yoshiyuki Kono e Yoshihiko Hirai. "Study on Polymer Materials Evaluation System for Nano-Imprint Lithography". Journal of Photopolymer Science and Technology 18, n.º 4 (2005): 543–49. http://dx.doi.org/10.2494/photopolymer.18.543.
Texto completo da fonteChoi, Kee-Bong, e Jae Jong Lee. "Passive compliant wafer stage for single-step nano-imprint lithography". Review of Scientific Instruments 76, n.º 7 (julho de 2005): 075106. http://dx.doi.org/10.1063/1.1948401.
Texto completo da fonteYang, Mei, Li-Hua Liu, Lu-Hui Ning, Yi-Rong Jin, Hui Deng, Jie Li, Yang Li e Dong-Ning Zheng. "Fabrication of superconducting NbN meander nanowires by nano-imprint lithography". Chinese Physics B 25, n.º 1 (janeiro de 2016): 017401. http://dx.doi.org/10.1088/1674-1056/25/1/017401.
Texto completo da fonteHan, Ting, Steve Madden, Douglas Bulla e Barry Luther-Davies. "Low loss Chalcogenide glass waveguides by thermal nano-imprint lithography". Optics Express 18, n.º 18 (26 de agosto de 2010): 19286. http://dx.doi.org/10.1364/oe.18.019286.
Texto completo da fonteTakei, Satoshi. "Ultraviolet Nano Imprint Lithography Using Fluorinated Silicon-Based Resist Materials". Applied Physics Express 3, n.º 2 (12 de fevereiro de 2010): 025203. http://dx.doi.org/10.1143/apex.3.025203.
Texto completo da fonteLi, Guijun, Qingchen Dong, Jianzhuo Xin, C. W. Leung, P. T. Lai, Wai-Yeung Wong e Philip W. T. Pong. "Patterning micro- and nano-structured FePt by direct imprint lithography". Microelectronic Engineering 110 (outubro de 2013): 192–97. http://dx.doi.org/10.1016/j.mee.2013.03.135.
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