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Abusabee, K. M. "Thin film engineering for transparent thin film transistors". Thesis, Nottingham Trent University, 2014. http://irep.ntu.ac.uk/id/eprint/127/.
Pełny tekst źródłaMackay, Ian. "Thin film electroluminescence /". Online version of thesis, 1989. http://hdl.handle.net/1850/10551.
Pełny tekst źródłaHan, Sanggil. "Cu2O thin films for p-type metal oxide thin film transistors". Thesis, University of Cambridge, 2018. https://www.repository.cam.ac.uk/handle/1810/285099.
Pełny tekst źródłaHein, Moritz. "Organic Thin-Film Transistors". Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2017. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-167894.
Pełny tekst źródłaHu, Jingping. "Electronic Thin Film Materials". Thesis, University of Oxford, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.491618.
Pełny tekst źródłaZhu, Wen Wei. "Organic thin film transistors". Thesis, McGill University, 2003. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=19597.
Pełny tekst źródłaMcCaughan, Adam Nykoruk. "Superconducting thin film nanoelectronics". Thesis, Massachusetts Institute of Technology, 2015. http://hdl.handle.net/1721.1/101576.
Pełny tekst źródłaCataloged from PDF version of thesis.
Includes bibliographical references (pages 163-171).
Superconducting devices have found application in a diverse set of fields due to their unique properties which cannot be reproduced in normal materials. Although many of these devices rely on the properties of bulk superconductors, superconducting devices based on thin films are finding increasing application, especially in the realms of sensing and amplification. With recent advances in electron-beam lithography, superconducting thin films can be patterned into geometries with feature sizes at or below the characteristic length scales of the superconducting state. By patterning 2D geometries with features smaller than these characteristic length scales, we were able to use nanoscale phenomena which occur in thin superconducting films to create superconducting devices which performed useful tasks such as sensor amplification, logical processing, and fluxoid state sensing. In this thesis, I describe the development, characterization, and application of three novel superconducting nanoelectronic devices: the nTron, the yTron, and the current-controlled nanoSQUID. These devices derive their functionality from the exploitation of nanoscale superconducting effects such as kinetic inductance, electrothermal suppression, and current-crowding. Patterning these devices from superconducting thin-films has allowed them to be integrated monolithically with each other and other thin-film superconducting devices such as the superconducting nanowire single-photon detector.
by Adam Nykoruk McCaughan.
Ph. D.
Morasch, Kevin R. "Nanoindentation induced thin film fracture". Online access for everyone, 2005. http://www.dissertations.wsu.edu/Thesis/Spring2005/k%5Fmorasch%5F042605.pdf.
Pełny tekst źródłaGeddis, Demetris Lemarcus. "Single fiber bi-directional OE links using 3D stacked thin film emitters and detectors". Diss., Available online, Georgia Institute of Technology, 2004:, 2003. http://etd.gatech.edu/theses/available/etd-04082004-180141/unrestricted/geddis%5Fdemetris%5Fl%5F200312%5Fphd.pdf.
Pełny tekst źródłaRoos, Andreas. "Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys". Thesis, Uppsala universitet, Institutionen för fysik och astronomi, 2012. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-177674.
Pełny tekst źródłaMarinkovic, Marko [Verfasser]. "Contact resistance effects in thin film solar cells and thin film transistors / Marko Marinkovic". Bremen : IRC-Library, Information Resource Center der Jacobs University Bremen, 2013. http://d-nb.info/1037014243/34.
Pełny tekst źródłaMaka, Thorsten. "Thin film opal photonic crystals". [S.l.] : [s.n.], 2004. http://deposit.ddb.de/cgi-bin/dokserv?idn=974086991.
Pełny tekst źródłaBjurström, Johan. "Advanced Thin Film Electroacoustic Devices". Doctoral thesis, Uppsala universitet, Fasta tillståndets elektronik, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-7672.
Pełny tekst źródłaPanda, Durga Prasanna. "Nanocrystalline silicon thin film transistors". [Ames, Iowa : Iowa State University], 2006.
Znajdź pełny tekst źródłaQian, Feng. "Thin film transistors in polysilicon /". Full text open access at:, 1988. http://content.ohsu.edu/u?/etd,162.
Pełny tekst źródłaBjurström, Johan. "Advanced thin film electroacoustic devices /". Uppsala : Acta Universitatis Upsaliensis, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-7672.
Pełny tekst źródłaFuentes, Iriarte Gonzalo. "AlN Thin Film Electroacoustic Devices". Doctoral thesis, Uppsala : Acta Universitatis Upsaliensis : Univ.-bibl. [distributör], 2003. http://publications.uu.se/theses/91-554-5557-3/.
Pełny tekst źródłaMurphy, Craig E. "Pyroelectric thin film composite materials". Thesis, University of Oxford, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.260162.
Pełny tekst źródłaGrief, Andrew. "Modelling of thin-film superconductors". Thesis, University of Oxford, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.432285.
Pełny tekst źródłaGuldeste, Ayhan. "Bismuth based thin film superconductors". Thesis, University of Oxford, 1994. http://ora.ox.ac.uk/objects/uuid:681efdc0-8cba-4b3d-83eb-e0021eea5135.
Pełny tekst źródłaShard, Alexander Gordon. "Plasma assisted thin film formation". Thesis, Durham University, 1992. http://etheses.dur.ac.uk/5736/.
Pełny tekst źródłaCastaldi, Lorenzo. "Thin film rare earth magnets". Thesis, University of Sheffield, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.289666.
Pełny tekst źródłaGillanders, Ross Neil. "Optically addressed thin film sensors". Thesis, University of Strathclyde, 2005. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.415379.
Pełny tekst źródłaLeslie, George Adam. "Thin-film flows on cylinders". Thesis, University of Strathclyde, 2012. http://oleg.lib.strath.ac.uk:80/R/?func=dbin-jump-full&object_id=18218.
Pełny tekst źródłaBauza, M. "Nanocrystalline silicon thin film transistors". Thesis, University College London (University of London), 2013. http://discovery.ucl.ac.uk/1385744/.
Pełny tekst źródłaMcKinley, Iain Stewart. "Studies in thin film flows". Thesis, University of Strathclyde, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.366911.
Pełny tekst źródłaAndreescu, Radu. "Exchange coupled thin film magnets /". Search for this dissertation online, 2004. http://wwwlib.umi.com/cr/ksu/main.
Pełny tekst źródłaTam, Dickson Tai Shun. "An investigation on effect of Mn-doping on dielectric property of barium strontium stannate titanate". access abstract and table of contents access full-text, 2005. http://libweb.cityu.edu.hk/cgi-bin/ezdb/dissert.pl?msc-ap-b21175135a.pdf.
Pełny tekst źródłaAt head of title: City University of Hong Kong, Department of Physics and Materials Science, Master of Science in materials engineering & nanotechnology dissertation. Title from title screen (viewed on Sept. 4, 2006) Includes bibliographical references.
Yeung, Kwok Fai. "An investigation on effect of Mn-doping on dielectric property of barium strontium stannate titanate". access abstract and table of contents access full-text, 2005. http://libweb.cityu.edu.hk/cgi-bin/ezdb/dissert.pl?msc-ap-b21175317a.pdf.
Pełny tekst źródłaAt head of title: City University of Hong Kong, Department of Physics and Materials Science, Master of Science in materials engineering & nanotechnology dissertation. Title from title screen (viewed on Sept. 4, 2006) Includes bibliographical references.
Suttle, Helene. "Thin film vapour barrier systems on vacuum-planarized polyester films". Thesis, University of Oxford, 2010. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.555308.
Pełny tekst źródłaBeringer, Douglas. "Thin Film Approaches to The Srf Cavity Problem: Fabrication and Characterization of Superconducting Thin Films". W&M ScholarWorks, 2016. https://scholarworks.wm.edu/etd/1499449840.
Pełny tekst źródłaRauschmayer, Joseph T. "A complementary thin film process for digital applications". Ohio : Ohio University, 1985. http://www.ohiolink.edu/etd/view.cgi?ohiou1184074634.
Pełny tekst źródłaXiong, Zhibin. "Novel scaled-down poly-Si thin-film transistor devices and technologies /". View abstract or full-text, 2005. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202005%20XIONG.
Pełny tekst źródłaChow, Thomas. "A conduction model for intrinsic polycrystalline silicon thin film transistor based on discrete grains /". View abstract or full-text, 2009. http://library.ust.hk/cgi/db/thesis.pl?ECED%202009%20CHOW.
Pełny tekst źródłaWang, Yongjian. "Dewetting instability of polymer thin film /". View abstract or full-text, 2006. http://library.ust.hk/cgi/db/thesis.pl?PHYS%202006%20WANG.
Pełny tekst źródłaFogelström, Linda. "Polymer Nanocomposites in Thin Film Applications". Doctoral thesis, KTH, Ytbehandlingsteknik, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-12400.
Pełny tekst źródłaQC20100621
Inkoom, Godfred. "Ferromagnetic Resonance of LSMO Thin Film". Thesis, Norges teknisk-naturvitenskapelige universitet, Institutt for fysikk, 2011. http://urn.kb.se/resolve?urn=urn:nbn:no:ntnu:diva-12933.
Pełny tekst źródłaMa, Wen-Yuan, i 馬文元. "Transparent thin film transistors fabricated by amorphous InGaZnO4 thin films". Thesis, 2006. http://ndltd.ncl.edu.tw/handle/33645187712147492214.
Pełny tekst źródła國立交通大學
電子物理系所
94
In this thesis, we study the transparent thin film transistors fabricated by amorphous InGaZnO4 (a-IGZO) thin films. The Hall measurements indicate that the carrier concentration of a-IGZO film is between 1019~1021 cm-3, resistivity ρ is around 10-3 (Ω-cm), and electron mobility is between 20~25 cm2V-1s-1 repectively. Films were deposited with O2 pressure between 20~200 mtorr. The contact between film and metal as well as indium-tin oxide (ITO) all showed the Schottky contact behavior. The devices, fabricated by a bottom gate structure combined with lift-off process at room temperature, show an average transmission (λ=400~700 nm) of 86.3%, saturation mobility μsat=7~19 cm2V-1s-1, on-off ratio reaches ~106, and low off current around 10-12A. The performances of devices are satisfactory for flat panel display applications. However, the non-linear characteristics of I-V and the current decay in large bias regime remain to be explored and improved.
Lee, Chih-Hung, i 李至弘. "The Study of HfZnO Thin Film and Thin Film Transistor". Thesis, 2015. http://ndltd.ncl.edu.tw/handle/03339234857014398090.
Pełny tekst źródła國立臺灣大學
應用力學研究所
103
This thesis reports the properties of the HfxZn1-xO thin films deposited by rf-sputtering and sol-gel method. The sputter-deposited HfxZn1-xO thin films were then used as the active layers of thin film transistors (TFTs) on the glass substrates. The sputtering HfxZn1-xO thin films with various Hf contents are sputter-deposited on glass substrates from HfxZn1-xO (x = 0, 2.5, 5, 7.5 and 10 at%) targets at room temperature. The incorporation of Hf in the ZnO film leads to the amorphization of the materials. As the annealing temperature increases, the built-in stresses in the thin films are relaxed. The optical bandgap increases with the Hf content, yet it decreases with the annealing temperature. This can be attributed to the alteration of strain (stress) status in the films and the slight grain growth. Hf doping increases the resistivity of ZnO owing to the disorder of the material structure and the higher bandgap. The electrical properties of the rf-sputtered HfxZn1-xO/ZnO heterostructures were also investigated. A highly conductive interface is formed at the interface between HfxZn1-xO and ZnO thin films as the ZnO annealing temperature exceeds 500°C, leading to the apparent decrease of the electrical resistance. The resistance decreases with an increase of either thickness or Hf content of the HfxZn1-xO capping layer. The second part of thesis reports the characterization of sol-gel derived HfxZn1-xO thin films deposited on glass substrates. The incorporation of Hf in the films increases the crystallinity of the as-deposited films. The bandgap increases with the Hf content but reduces after thermal annealing because of the relaxation of built-in stress, atomic rearrangement, and precipitation of HfO2. The resistivity of ZnO decreases as the annealing temperature increases owing to the improvement of crystallinity and reduction of defect densities. On the contrary, the resistivity of HfxZn1-xO thin films increases with the annealing temperature owing to the precipitation of HfO2 and reduction of oxygen vacancies. The electrical properties of sol-gel derived Hf0.1Zn0.9O/ZnO and ZnO/HfxZn1-xO heterostructures were also investigated. The amount of resistance reduction increases as the bottom layer annealing temperature increases. According to the XPS result, the incorporation of Hf in the films improves the Zn-O bonding state, and thermal annealing enhances metal-oxygen bonding. Sputtered HfxZn1-xO (x=0.005, 0.01 and 0.025) is used as the channel layer of the bottom-gate TFT with MgO dielectric layer deposited by e-beam evaporation. The Hf0.005Zn0.995O shows the better device performance. The Vth, S.S., μlin and on-off ratio values for the Hf0.005Zn0.995O TFT were 4.1 V, 1.66 V/dec, 9.0 cm2/Vs and >107. In the top gate TFTs, Hf0.1Zn0.9O/ZnO hetertstructure is used as the channel of TFTs. The multilayer enhances the electrical properties of TFTs. The Vth, S.S., and μlin, values for the Hf0.1Zn0.9O/ZnO TFT were 0.38 V, 1.79 V/dec, and 158 cm2/Vs.
Qin, Zhipei. "Thin film microextraction". Thesis, 2010. http://hdl.handle.net/10012/5170.
Pełny tekst źródłaCooper, Ryan Christopher. "Thin Film Mechanics". Thesis, 2014. https://doi.org/10.7916/D8PR7T1V.
Pełny tekst źródłaChang, Ya-Yun, i 鄭雅云. "Growth of TiN and ZrO2 Thin Films Using Thin Film Templates". Thesis, 2008. http://ndltd.ncl.edu.tw/handle/61382518230180369445.
Pełny tekst źródła國立清華大學
工程與系統科學系
97
This study developed a two-step method to control the growth of TiN and ZrO2 thin films using thin film templates and explored the effects of template on the structure and properties of the derivative thin films. The experiment was divided into two parts. The first part was to deposit TiN on TiN(111), TiN(200) and Ti(0002) templates. In the second part, ZrO2 thin films were grown by oxidizing ZrN thin films with different preferred orientations in Ar (99.99% purity) atmosphere, where ZrN (111) thin films were prepared by three deposition systems for examining the effect of different deposition methods. The texture of the top TiN thin films revealed by X-ray diffraction (XRD) changed from (111) to (200) as TiN(200) template was used. In the cases of using Ti(0002) or TiN(111) templates, the texture of the derivative TiN thin films switched from (200) to (111). The results indicated that templates were more effective on controlling texture of TiN thin film than adjusting deposition parameters. For the oxidation of ZrN thin film, monoclinic (m-ZrO2) and tetragonal (t-ZrO2) phases of ZrO2 were coexisted in all heat-treated specimens, and t-ZrO2 is the dominant phase in the ZrN specimen with higher N/Zr ratio while m-ZrO2 is prevailed in the ZrN specimens with lower N/Zr ratios. There was no substantial difference in the phase ratio and preferred orientation of m-ZrO2 grown from oxidation of ZrN specimens with different textures. Blisters were observed on the surface of the heat-treated ZrN specimens. A semi-quantitative analysis was proposed to examine the driving force of the blister formation, indicating that blisters may result from the compressive stress induced by the volume expansion from ZrN to m-ZrO2.
Cho, Sungmee. "Nanostructured Thin Film Electrolyte for Thin Film Solid Oxide Fuel Cells". Thesis, 2011. http://hdl.handle.net/1969.1/ETD-TAMU-2011-08-10145.
Pełny tekst źródła吳承哲. "Growth characterization of electrodeposited ZnO thin film on copper thin film". Thesis, 2010. http://ndltd.ncl.edu.tw/handle/68932165056020424540.
Pełny tekst źródła建國科技大學
機械工程系暨製造科技研究所
98
The study uses magnetron sputtering to produce a copper thin film deposited on silicon substrates to provide a copper thin film substrate. Then electrochemical methods are adopted to investigate the properties of ZnO thin films. Aiming to understand the ZnO thin film deposited on copper thin film substrate, the study conducts experiments on various electrochemical parameters of ZnO. ZnO thin films are obtained via electrochemical deposition with controlled parameters such as concentration of electrochemical solution, voltage and temperature. X-ray Diffraction and scanning electron microscope are employed to examine and observe the crystal structure and surface properties of the thin film. The structural advantages and disadvantages of ZnO thin films are determined using Debye-Scherrer formula and texture formula. The findings of the experiment indicate that the presence of the ZnO buffer layer in the sample facilitates the crystal growth of ZnO, and optimal ZnO thin films can be obtained with temperature at 90oC, the concentration of zinc nitrate at 0.02M and with the presence of ZnO buffer layer.
CHIU, YI-HSUN, i 邱奕勳. "Application of High Dielectric Hybrid Thin Films in Organic Thin Film Transistors". Thesis, 2017. http://ndltd.ncl.edu.tw/handle/76348811197882023705.
Pełny tekst źródła明志科技大學
材料工程系碩士班
105
Organic thin film transistors (OTFTs) based on pentacene and hydroxyl-containing polyimide(PI)-SiO2-TiO2 hybrid films were fabricated on silicon substrate as the semiconductor and the gate dielectrics, respectively.The precursor was used to synthesize nano-sized SiO2-TiO2 colloid through the hydrolysis and condensation reaction in a sol-gel process. Then, PI-SiO2-TiO2 hybrid solution was synthesized from a condensation reaction between hydroxyl-containing SiO2-TiO2 and polyimide, followed by a spin coating to form the PI- SiO2-TiO2 dielectric composites. Cyclic olefin copolymer (COC) as a modify layer to modified the interface between the semiconductor and the dielectric layer. In addition, PffBT4T-2OD replace Pentacene as semiconductor, expect a good performance on device. The thermal, optical, surface, dielectric, and electrical properties of the PI-SiO2-TiO2 dielectric composites were investigated and correlated to the content of SiO2-TiO2, due to the dispersion and aggregation behaviors of the nanoparticles. The PI-SiO2-TiO2 hybrid dielectrics showed the tunable insulating properties, including high dielectric constants, high capacitances, and low leakage current densities. In addition, the bottom-gate top-contact OTFTs based on the PI-SrO2-TiO2 hybrid dielectrics showed the best performance with the near zero threshold voltage, PST40% and PST40%-COC showed the field-effect mobility (μ) about 7.39 cm2V-1s-1 and 9.72 cm2V-1s-1 and the current on/off ratio (Ion/ Ioff) about 2.5x104 and 1.4x104, respectively. Based on the above results, we are succeeded in the synthetic organic/inorganic hybrid thin film and the PST40% is the best performance among the films.
Hsu, Chin-Tsar, i 許清茶. "The Study of Green Thin Film Electroluminescent Devices and ZnSe Thin Films". Thesis, 1993. http://ndltd.ncl.edu.tw/handle/73390181103205789568.
Pełny tekst źródła國立成功大學
電機工程研究所
82
In this thesis, the high luminous efficiency thin film electroluminescent devices and the characteristics of ZnSe thin films were investigated. The Ta2O5 and Al2O3 insulating have high resistivity that to act as current limiter. The HfO2 and BaTiO3 insulating have low resistivity that to act carrier injector. Crystallinity of the ZnS:Tb,F films deposited by RF- magnetron sputtering were studied by X-ray diffraction. The intensive diffraction line, which arises from (111) plane of zincblende structure, has been observed at around 28.5°. The spacing of (111) plane and latice constant of ZnS:Tb,F film are 3.12 A and 5.41 A, respectively. In order to evalute the interface properties of thin film electroluminescent device with stacked layer insulator structure, four kinds of samples with different insulating layers have been prepared. We found that that the EL device with a glass/indium tin oxide/BaTiO3/ ZnS:TbF3/HfO2/Ta2O5/HfO2/ Al structure exhibited higher brightness and higher efficiency than the other devices, because it has larger density of interface states and deeper interface states at HfO2/ZnS and BaTiO3/ZnS interfaces. The highest luminous efficiency and brightness of 0.9 lm/W and 1000 cd/㎡ were obtained, respectively, by applying a 1Khz sinusoidal wave viltage. The crystallinity of ZnSe thin films grown by MOCVD, which depends on the [H2Se]/[DMZn] mole ratio and substrate temperature was investigated. The full width at half maximum (FWHM) of X-ray Cu-Kα (111) ZnSe diffraction reaches the minimum value of 0.17°at optimal deposition condition. In this experiment, the optimal growth condition of ZnSe films are 300 ℃, 5 Torr and VI/II ratio of about 4. The latice constant and energy gap of ZnSe thin film obtained were 5.69 A and 2.70 eV, respectively. Absorption-edge shifts produced by an applied electric field (Franz-Keldysh) in ZnSe thin films have been studied. As a result, the absorption edge is shifted by about 33 meV toward longer wavelength.
Tsai, Li-Shiuan, i 蔡立軒. "Nitrogen incorporated Hafnium Dioxide dielectric thin film For Organic Thin Film Transistors". Thesis, 2009. http://ndltd.ncl.edu.tw/handle/05427454364168925544.
Pełny tekst źródła國立清華大學
材料科學工程學系
97
Hafnium oxide is a high-k dielectric material which have dielectric constant of 25,high-k dielectric material use to be a gate oxide can decrease the threshold voltage and device scale for low voltage and microelectronics. Organic thin film transistors has been used to fabricate soft electronics devices. The active layers for OTFTs is numerous, pentacene for our research is one of most used OTFTs active layers. In this thesis, we fabricate the HfO2 and HfON thin film by RF Reactive Magnetron Sputter System. The target is Hf metal for 99.99%, and we use Mass Flow Controller to put the Ar-O2-N2 mix gas in the chamber.HfO2 or HfON thin film would deposit on the substrate by Hf sputtering atoms react for O2 and N2.We deposit different recipes film to research their properties. Before depositing the dielectric film, we pre-deposit a Hf thin film. The thin film can decrease roughness for dielectric film, surface roughness decrease from Ra=1.972nm without Hf pre-sputtered to Ra=1.414nm with Hf pre-sputtered, this fabrication increase the device characteristics ,mobility increase from 0.086 cm2/V.s to 0.174 cm2/V.s, threshold voltage decrease from -0.7V to -0.31V,on-off ratio increase from 0.9x103 to 3.2x103, subthreshold swing decrease from -0.368 V/dec to -0.209 V/dec. In our research, a low surface energy dielectric film would have better device characteristics of pentacene based OTFTs. In this thesis, we deposit HfON thin film by Reactive Magnetron Sputter System, and make a OTFT device which have a better characteristics.
TSAI, HUEI-JEN, i 蔡惠甄. "Characteristic Study of ITO Thin Film Etching and Cr Thin Film Evaporation". Thesis, 2006. http://ndltd.ncl.edu.tw/handle/15506805664270546929.
Pełny tekst źródła南台科技大學
機械工程系
94
Abstract This study consists of two parts. The first part is to investigate four kinds of commonly used etching liquids to etch the thin film of indium tin oxide (ITO), and then compares the differences among them. When the ITO film is etched, the photo resistant layer usually serves as an etching mask to etch the required pattern. Therefore, it is necessary to find out the fastest way to etch the ITO film but almost not to etch the photo resistant layer. This study not only compares the etching rate of ITO film by four kinds of etching liquids at different temperatures and concentrations, but also measures the roughness of etched surface by an atomic force microscopy (AFM). Four kinds of etching liquids used in this study are HCl, HCl+H2O2, HCl+FeCl3 and (COOH)2·2H2O+H2O. Experimental results show that the four kinds of etching liquids have a faster etching rate at about 80°C and the highest concentration; their averages are 600, 450, 900, 37.5 nm/min, respectively. All etching liquids with lowest concentration lead to better surface roughness. The etching liquids HCl+H2O and HCl+H2O2 have better surface roughness of 0.4 nm and 0.6 nm, respectively, at 50°C; while (COOH)2·2H2O+H2O and FeCl3+HCl have better surface roughness of 0.03 nm and 0.5 nm at 80°C. The results of this study could be applied to the surface treatment of biochips that commonly use the ITO film as an electrode and to the combination of PDMS and ITO film glass. The second part of this study is to investigate metals as electrodes or conducting layers which are common used in the processes of micro-electro-mechanic-system (MEMS). Since the common used gold (Au) is difficult to affix on glass while evaporating, it needs a sticking layer to make gold adhere on glass. Therefore, common used metal chromium (Cr) is selected as sticking layers in this study. Evaporating rate, chamber temperature, and chamber vacuum are chosen as factors and an orthogonal array L9 with three levels is designed by Taguchi method. The changes of thin film characteristics and the quality of evaporated gold are examined by varying the parameters. Experimental results show that the condition of evaporating rate 0.5 Å/s, chamber temperature 21°C, and chamber vacuum 4.0´10-7 torr has better quality of thin film. Keywords: etching of ITO film, etching rate, roughness of etched surface, e-beam, evaporation, sticking layer, Taguchi method
Rao, K. Yellareswara. "Sputter Deposited Thin Film Cathodes from Powder Target for Micro Battery Applications". Thesis, 2015. http://etd.iisc.ac.in/handle/2005/3825.
Pełny tekst źródłaRao, K. Yellareswara. "Sputter Deposited Thin Film Cathodes from Powder Target for Micro Battery Applications". Thesis, 2015. http://etd.iisc.ernet.in/2005/3825.
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