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Artykuły w czasopismach na temat "TCAD Design"
Bellini, Marco, i Lars Knoll. "Advanced TCAD Design Techniques for the Performance Improvement of SiC MOSFETs". Materials Science Forum 1004 (lipiec 2020): 865–71. http://dx.doi.org/10.4028/www.scientific.net/msf.1004.865.
Pełny tekst źródłaJohannesson, Daniel, Muhammad Nawaz i Hans Peter Nee. "TCAD Model Calibration of High Voltage 4H-SiC Bipolar Junction Transistors". Materials Science Forum 963 (lipiec 2019): 670–73. http://dx.doi.org/10.4028/www.scientific.net/msf.963.670.
Pełny tekst źródłaRehman, Atta Ur, Amna Siddiqui, Muhammad Nadeem i Muhammad Usman. "Improved PERC Solar Cell Design by TCAD Simulation". Proceedings of the Pakistan Academy of Sciences: A. Physical and Computational Sciences 58, nr 4 (28.03.2022): 61–67. http://dx.doi.org/10.53560/ppasa(58-4)637.
Pełny tekst źródłaPan, Zijin, Cheng Li, Mengfu Di, Feilong Zhang i Albert Wang. "3D TCAD Analysis Enabling ESD Layout Design Optimization". IEEE Journal of the Electron Devices Society 8 (2020): 1289–96. http://dx.doi.org/10.1109/jeds.2020.3027034.
Pełny tekst źródłaWoo, Sola, Juhee Jeon i Sangsig Kim. "Prediction of Device Characteristics of Feedback Field-Effect Transistors Using TCAD-Augmented Machine Learning". Micromachines 14, nr 3 (21.02.2023): 504. http://dx.doi.org/10.3390/mi14030504.
Pełny tekst źródłaSingh, Vivek. "Relevance of technology computer aided design (TCAD) to process-aware design". Journal of Micro/Nanolithography, MEMS, and MOEMS 1, nr 3 (1.10.2002): 290. http://dx.doi.org/10.1117/1.1508411.
Pełny tekst źródłaChen, Yu-Guang, Hui Geng, Kuan-Yu Lai, Yiyu Shi i Shih-Chieh Chang. "Multibit Retention Registers for Power Gated Designs: Concept, Design, and Deployment". IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 33, nr 4 (kwiecień 2014): 507–18. http://dx.doi.org/10.1109/tcad.2013.2293881.
Pełny tekst źródłaWang, Ke, Haodong Jiang, Yiming Liao, Yue Xu, Feng Yan i Xiaoli Ji. "Degradation Prediction of GaN HEMTs under Hot-Electron Stress Based on ML-TCAD Approach". Electronics 11, nr 21 (2.11.2022): 3582. http://dx.doi.org/10.3390/electronics11213582.
Pełny tekst źródłaMa, Qiang, i Evangeline F. Y. Young. "Multivoltage Floorplan Design". IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 29, nr 4 (kwiecień 2010): 607–17. http://dx.doi.org/10.1109/tcad.2010.2042895.
Pełny tekst źródłaNandi, Prajit, Hirak Talukdar, Dhiraj Kumar i Ashvin Kumar G. Katakwar. "A Novel Approach to Design SAR-ADC: Design Partitioning Method". IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 35, nr 3 (marzec 2016): 346–56. http://dx.doi.org/10.1109/tcad.2015.2474379.
Pełny tekst źródłaRozprawy doktorskie na temat "TCAD Design"
Quiroga, Andrés. "Investigation and development of advanced Si/SiGe and Si/SiGeC Heterojunction Bipolar Transistors by means of Technology Modeling". Thesis, Paris 11, 2013. http://www.theses.fr/2013PA112273/document.
Pełny tekst źródłaThe present work investigates the technology development of state-of-the-art SiGe and SiGeC Heterojunction Bipolar Transistors (HBT) by means of technology computer aided design (TCAD). The objective of this work is to obtain an advanced HBT very close to the real device not only in its process fabrication steps, but also in its physical behavior, geometric architecture, and electrical results. This investigation may lead to achieve the best electrical performances for the devices studied, in particular a maximum operating frequency of 500 GHz. The results of this work should help to obtain more physical and realistic simulations, a better understanding of charge transport, and to facilitate the development and optimization of SiGe and SiGeC HBT devices.The TCAD simulation kits for SiGe/SiGeC HBTs developed during our work have been carried out in the framework of the STMicroelectronics bipolar technology evolution. In order to achieve accurate simulations we have used, developed, calibrated and implemented adequate process models, physical models and extraction methodologies. To our knowledge, this work is the first approach developed for SiGe/SiGeC HBTs which takes into account the impact of the strain, and of the germanium and carbon content in the base, for both: process and electrical simulations.In this work we will work with the successive evolutions of B3T, B4T and B5T technologies. For each new device fMAX improves of 100 GHz, thus the technology B3T matches to 300 GHz, B4T and B5T to 400 and 500 GHz, respectively.Chapter one introduces the SiGe SiGeC heterojunction bipolar technologies and their operating principles. This chapter deals also with the high frequency AC transistor operation, the extraction methods for fMAX and the carrier transport in extremely scaled HBTs.Chapter two analyzes the physical models adapted to SiGeC strained alloys used in this work and the electrical simulation of HBT devices. This is also an important work of synthesis leading to the selection, implementation and development of dedicated models for SiGeC HBT simulation.Chapter three describes the B3T TCAD simulation platform developed to obtain an advanced HBT very close to the real device. In this chapter the process fabrication of the B3T technology is described together with the methodology developed to simulate advanced HBT SiGeC devices by means of realistic TCAD simulations.Chapter four describes the HBT architectures developed during this work. We will propose low-cost structures with less demanding performance requirements and highly performing structures but with a higher cost of production. The B4T architecture which has been manufactured in clean-room is deeply studied in this chapter. The impact of the main fabrication steps is analyzed in order to find the keys process parameters to increase fMAX without degrading other important electrical characteristics. At the end of this chapter the results obtained is used to elaborate a TCAD simulation platform taking into account the best trade-off of the different key process parameters to obtain a SiGeC HBT working at 500 GHz of fMAX
Lemoigne, Pascal. "Simulation de la variabilité du transistor MOS". Thesis, Aix-Marseille 1, 2011. http://www.theses.fr/2011AIX10214/document.
Pełny tekst źródłaContinuous improvement in integrated circuits density of integration lead us to study process-induced variations in the framework of the 45 nm node, and to determine their principal contributions with the ultimate goal being to allow an accurate simulation of both transistor and circuit level variability. This work starts with a study of the state of the art of variability sources of the MOS transistor and associated simulation means. Then it focuses on the fluctuations of the channel doping, which is a difficult factor to measure statistically.After that we study the 45 nm node through a design of experiment which let us learn about natural variations of process factors but mostly about electrical performances sensitivity to those factors.Thanks to that we could identify major causes of process-induced variability at this stage of this node development. At last, with respect to those experimental results, we propose to enhance the taking in account of process variations in Monte-Carlo and corner simulations applied to compact models
PEZZAROSSA, MICHELE. "The deep Al-based JTE: development and industrialization of a novel termination design for high-power semiconductor devices". Doctoral thesis, Politecnico di Torino, 2022. http://hdl.handle.net/11583/2964780.
Pełny tekst źródłaQuiroga, Andres. "Investigation and development of advanced Si/SiGe and Si/SiGeC Heterojunction Bipolar Transistors by means of Technology Modeling". Phd thesis, Université Paris Sud - Paris XI, 2013. http://tel.archives-ouvertes.fr/tel-00938619.
Pełny tekst źródłaCleveland, William Peter. "Improving pilot understanding of TCAS through the traffic situation display". Thesis, Georgia Institute of Technology, 2013. http://hdl.handle.net/1853/47726.
Pełny tekst źródłaMusetha, Rendani D. "The design of CAN nodes for minimising cables on the SUNSAT's TCMD system". Thesis, Stellenbosch : Stellenbosch University, 2003. http://hdl.handle.net/10019.1/49793.
Pełny tekst źródłaENGLISH ABSTRACT: The aim of this thesis is to investigate a design of a microcontroller based embedded system that will be used to minimise cable harness on the SUNSAT micro-satellite. The system is called CAN node. The CAN node(s) implements CAN (Controller Area Network) serial bus architecture protocol. The protocol is implemented on the two nodes to transport data from the TCMD tot he 0 ther trays 0 f SUNSAT. CAN node( s) design proj ect focuses on the TCMD tray, because it is the central point for data communication in SUNSAT and it acts as the eyes and hands of the satellite's operator. As a result most of the communication cables are located at this tray. The two nodes are called TX-node and RX-nodes. The TX-node is used to collect data from the TCMD tray and transmits them serially to RX-node. The RX-nodes receives the TCMD data from TX-node and transmits these data to their respective nodes. In application RX-nodes need to be ten, but only one is used for testing purpose. The design had its shortcomings, of which they are discussed in this thesis. The recommendations of an ideal system are also given to elaborate how the system should behave in the real situation. Despite its shortcomings, the CAN node(s) project has successfully proven that cable harness on the TCMD tray of SUNSAT can be minimised by using CAN technology.
AFRIKAANSE OPSOMMING: Die doel van hierdie tesis is om die ontwerp van 'n mikro-beheerder gebaseerde stelsel wat die SUNSA T mikro-satelliet kabel harnas sal verklein, te ondersoek. Die stelsel word die CAN nodus genoem. Die CAN nodus implementeer die CAN (Controller Area Network) bus argitektuur protokol. Die protokol is op twee nodusse geïmplementeer om data vanaf die TCMD na ander laaie van SUNSAT te voer. Die CAN nodus ontwerp fokus op die TCMD laai, want dit is die sentrale punt vir data kommunikasie in SUNSA T en dit tree soos die oog en hande van die satelliet operateur op. As 'n gevolg, is die meeste van die kommunikasie kabels in hierdie laai. Die twee nodusse is genoem TXnodus en RX-nodus. TX-nodus word gebruik om die data van die TCMD af te kollekteer en dan versprei hulle tot hulle onderskeie nodusse. In die toepaslik moet daar tien RX-nodusse wees, maar net een is gebruik terwille van die toets. Die ontwerp het sy eie tekortkomings, wat in hierdie tesis bespreek word. Die rekommendasie van 'n ideale stelsel is ook gemaak om te bewys hoe die stelsel dit in 'n ware situasie moet gedra. Ongeag die tekortkomings daarvan, het die CAN-nodus projek suksesvol bewys dat die kabel harnas in die TCMD laai van SUNSAT kan verminder word deur die gebruik van die CAN tegnologie.
Rosenbaum, Tommy. "Performance prediction of a future silicon-germanium heterojunction bipolar transistor technology using a heterogeneous set of simulation tools and approaches". Thesis, Bordeaux, 2017. http://www.theses.fr/2017BORD0550/document.
Pełny tekst źródłaBipolar complementary metal-oxide-semiconductor (BiCMOS) processescan be considered as the most general solution for RF products, as theycombine the mature manufacturing tools of CMOS with the speed and drivecapabilities of silicon-germanium (SiGe) heterojunction bipolar transistors(HBTs). HBTs in turn are major contenders for partially filling the terahertzgap, which describes the range in which the frequencies generated bytransistors and lasers do not overlap (approximately 0.3THz to 30 THz). Toevaluate the capabilities of such future devices, a reliable prediction methodologyis desirable. Using a heterogeneous set of simulation tools and approachesallows to achieve this goal successively and is beneficial for troubleshooting.Various scientific fields are combined, such as technology computer-aided design(TCAD), compact modeling and parameter extraction.To create a foundation for the simulation environment and to ensure reproducibility,the used material models of the hydrodynamic and drift-diffusionapproaches are introduced in the beginning of this thesis. The physical modelsare mainly based on literature data of Monte Carlo (MC) or deterministicsimulations of the Boltzmann transport equation (BTE). However, the TCADdeck must be calibrated on measurement data too for a reliable performanceprediction of HBTs. The corresponding calibration approach is based onmeasurements of an advanced SiGe HBT technology for which a technology specific parameter set of the HICUM/L2 compact model is extracted for thehigh-speed, medium-voltage and high-voltage transistor versions. With thehelp of the results, one-dimensional transistor characteristics are generatedthat serve as reference for the doping profile and model calibration. By performingelaborate comparisons between measurement-based reference dataand simulations, the thesis advances the state-of-the-art of TCAD-based predictionsand proofs the feasibility of the approach.Finally, the performance of a future technology in 28nm is predicted byapplying the heterogeneous methodology. On the basis of the TCAD results,bottlenecks of the technology are identified
Bipolare komplementäre Metall-Oxid-Halbleiter (BiCMOS) Prozesse bietenhervorragende Rahmenbedingungen um Hochfrequenzanwendungen zurealisieren, da sie die fortschrittliche Fertigungstechnik von CMOS mit derGeschwindigkeit und Treiberleistung von Silizium-Germanium (SiGe) Heterostruktur-Bipolartransistoren (HBTs) verknüpfen. Zudem sind HBTs bedeutendeWettbewerber für die teilweise Überbrückung der Terahertz-Lücke, derFrequenzbereich zwischen Transistoren (< 0.3 THz) und Lasern (> 30 THz).Um die Leistungsfähigkeit solcher zukünftigen Bauelemente zu bewerten, isteine zuverlässige Methodologie zur Vorhersage notwendig. Die Verwendungeiner heterogenen Zusammenstellung von Simulationstools und Lösungsansätzenerlaubt es dieses Ziel schrittweise zu erreichen und erleichtert die Fehler-_ndung. Verschiedene wissenschaftliche Bereiche werden kombiniert, wie zumBeispiel der rechnergestützte Entwurf für Technologie (TCAD), die Kompaktmodellierungund Parameterextraktion.Die verwendeten Modelle des hydrodynamischen Simulationsansatzes werdenzu Beginn der Arbeit vorgestellt, um die Simulationseinstellung zu erläuternund somit die Nachvollziehbarkeit für den Leser zu verbessern. Die physikalischenModelle basieren hauptsächlich auf Literaturdaten von Monte Carlo(MC) oder deterministischen Simulationen der Boltzmann-Transportgleichung(BTE). Für eine zuverlässige Vorhersage der Eigenschaften von HBTs muss dieTCAD Kon_guration jedoch zusätzlich auf der Grundlage von Messdaten kalibriertwerden. Der zugehörige Ansatz zur Kalibrierung beruht auf Messungeneiner fortschrittlichen SiGe HBT Technologie, für welche ein technologiespezifischer HICUM/L2 Parametersatz für die high-speed, medium-voltage undhigh-voltage Transistoren extrahiert wird. Mit diesen Ergebnissen werden eindimensionaleTransistorcharakteristiken generiert, die als Referenzdaten fürdie Kalibrierung von Dotierungspro_len und physikalischer Modelle genutztwerden. Der ausführliche Vergleich dieser Referenz- und Messdaten mit Simulationengeht über den Stand der Technik TCAD-basierender Vorhersagenhinaus und weist die Machbarkeit des heterogenen Ansatzes nach.Schlieÿlich wird die Leistungsfähigkeit einer zukünftigen Technologie in28nm unter Anwendung der heterogenen Methodik vorhergesagt. Anhand derTCAD Ergebnisse wird auf Engpässe der Technologie hingewiesen
Gnawali, Krishna Prasad. "EMERGING MEMORY-BASED DESIGNS AND RESILIENCY TO RADIATION EFFECTS IN ICS". OpenSIUC, 2020. https://opensiuc.lib.siu.edu/dissertations/1863.
Pełny tekst źródłaGuyonneau, David. "Contribution à la détermination de surfaces conjuguées pour la transmission de puissance". Thesis, Aix-Marseille, 2013. http://www.theses.fr/2013AIXM4134.
Pełny tekst źródłaThe work described in the present manuscript is part of exploratory researches dealing with gears meshing surfaces optimization. After a short study of gears used in an aeronautical environment, the development of an innovative tool for tooth profile design is defined. Then, the specific behavior of a gear mesh within a helicopter main gearbox (MGB) is evaluated.A VBA software has been coded under MS Excel to generate conjugated and optimized gear tooth profiles. It advantageously defines and uses several physical parameters with their analytical formulation. The software provides at the user optimized tooth profiles according to a couple of criteria. The two “objective” functions evaluated are the efficiency and the Hertz equivalent stress within the contact using the Von Mises criterion.The work has been focused on three aspects:- The design of conjugated tooth profiles by contact sharing,- The definition of the relevant physical parameters,- The optimization of tooth profiles using Monte Carlo SimulationEventually, a generic method to design gear profiles, taking into account any physical parameters related to a gear mesh, could be expected as a future of this thesis work
Delomier, Florent. "Jeux pédagogiques collaboratifs situés : conception et mise en oeuvre dirigées par les modèles". Phd thesis, Ecole Centrale de Lyon, 2013. http://tel.archives-ouvertes.fr/tel-00995808.
Pełny tekst źródłaKsiążki na temat "TCAD Design"
K, Maiti C., i Institution of Engineering and Technology, red. TCAD for Si, SiGe and GaAs integrated circuits. London: Institution of Engineering and Technology, 2007.
Znajdź pełny tekst źródłaSaad, Yves. TCAD-based three-dimensional modeling of nonvolatile memories. Konstanz: Hartung-Gorre, 2010.
Znajdź pełny tekst źródłaHellings, Geert. High Mobility and Quantum Well Transistors: Design and TCAD Simulation. Dordrecht: Springer Netherlands, 2013.
Znajdź pełny tekst źródłaGappisch, Steffen. TCAD-based development of a flash-EPROM technology. Konstanz: Hartung-Gorre, 1996.
Znajdź pełny tekst źródłaGull, Ronald Dumeng. TCAD based development of a polysilicon emitter transistor in a BiCMOS technology. Konstanz: Hartung-Gorre, 1997.
Znajdź pełny tekst źródłaMaiti, Chinmay K. Introducing Technology Computer-Aided Design (TCAD). Jenny Stanford Publishing, 2017. http://dx.doi.org/10.1201/9781315364506.
Pełny tekst źródłaHellings, Geert, i Kristin De Meyer. High Mobility and Quantum Well Transistors: Design and TCAD Simulation. Springer, 2013.
Znajdź pełny tekst źródłaHellings, Geert, i Kristin De Meyer. High Mobility and Quantum Well Transistors: Design and TCAD Simulation. Springer Netherlands, 2015.
Znajdź pełny tekst źródłaLi, Simon, i Suihua Li. 3D TCAD Simulation for Semiconductor Processes, Devices and Optoelectronics. Springer, 2011.
Znajdź pełny tekst źródłaLi, Simon, i Suihua Li. 3D TCAD Simulation for Semiconductor Processes, Devices and Optoelectronics. Springer, 2016.
Znajdź pełny tekst źródłaCzęści książek na temat "TCAD Design"
Masuda, H., H. Pimingstorfer, H. Sato, K. Tsuneno, K. Ichikawa, H. Tobe, H. Miyazawa i in. "Applied TCAD in Mega-Bits Memory Design". W Simulation of Semiconductor Devices and Processes, 21–24. Vienna: Springer Vienna, 1993. http://dx.doi.org/10.1007/978-3-7091-6657-4_4.
Pełny tekst źródłaLópez-Serrano, José, i Andrzej J. Strojwas. "Layout Design Rule Generation with TCAD Tools for Manufacturing". W Simulation of Semiconductor Devices and Processes, 62–65. Vienna: Springer Vienna, 1995. http://dx.doi.org/10.1007/978-3-7091-6619-2_14.
Pełny tekst źródłaMiura, N., H. Hayashi, H. Komatsubara, M. Mochizuki, H. Matsuhashi, Y. Kajita i K. Fukuda. "Tcad Driven Process Design of 0.15μm Fully-Depleted Soi Transistor for Low Power Applications". W Simulation of Semiconductor Processes and Devices 2001, 284–87. Vienna: Springer Vienna, 2001. http://dx.doi.org/10.1007/978-3-7091-6244-6_63.
Pełny tekst źródłaSrivastava, Ajay Kumar. "Si Detector for HEP and Photon Science Experiments: How to Design Detectors by TCAD Simulation". W Si Detectors and Characterization for HEP and Photon Science Experiment, 149–72. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-19531-1_11.
Pełny tekst źródłaMalavena, Gerardo. "Modeling of GIDL–Assisted Erase in 3–D NAND Flash Memory Arrays and Its Employment in NOR Flash–Based Spiking Neural Networks". W Special Topics in Information Technology, 43–53. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-85918-3_4.
Pełny tekst źródłaJin, Du Seok, Jung-lok Yu, Jun-hyung Lee, Jongsuk Ruth Lee, Kumwon Cho i Hoon Ryu. "On Development of an Open Platform for High Performance Computing Services: Design of TCAD Meta-Data Schema and Its Application to Computational Nanoelectronics". W Lecture Notes in Electrical Engineering, 921–29. Dordrecht: Springer Netherlands, 2013. http://dx.doi.org/10.1007/978-94-007-6516-0_101.
Pełny tekst źródłaHuang, Yi, Peng Wen, Bo Song i Yan Li. "An Auto TCD Probe Design and Visualization". W Brain Informatics, 486–95. Cham: Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-030-05587-5_46.
Pełny tekst źródłaLuo, Donghua, Junling Pan i Xingwei Zhou. "Design of TCD Spectrum Analysis System Based on FPGA and ARM9". W The 2021 International Conference on Machine Learning and Big Data Analytics for IoT Security and Privacy, 746–52. Cham: Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-89508-2_96.
Pełny tekst źródłaLi, Jie, Xianfen Diao, Kai Zhan i Zhengdi Qin. "A Full Digital Design of TCD Ultrasound System Using Normal Pulse and Coded Excitation". W IFMBE Proceedings, 136–39. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-12262-5_38.
Pełny tekst źródłaGhosh, Puja, i P. Rangababu. "Design and Implementation of Ternary Content Addressable Memory (TCAM) Based Hierarchical Motion Estimation for Video Processing". W Communications in Computer and Information Science, 557–69. Singapore: Springer Singapore, 2017. http://dx.doi.org/10.1007/978-981-10-7470-7_54.
Pełny tekst źródłaStreszczenia konferencji na temat "TCAD Design"
Singh, Vivek K., i Jorge Garcia-Colevatti. "Relevance of TCAD to process-aware design". W Design, Process Integration, and Characterization for Microelectronics, redaktorzy Alexander Starikov i Kenneth W. Tobin, Jr. SPIE, 2002. http://dx.doi.org/10.1117/12.475675.
Pełny tekst źródłaMassey, J. Greg, Lan Luo, Peter Smith i Richard Wachnik. "Large-Scale Thermal TCAD Simulations of 7nm Circuits". W 2021 IEEE Microelectronics Design & Test Symposium (MDTS). IEEE, 2021. http://dx.doi.org/10.1109/mdts52103.2021.9476141.
Pełny tekst źródłaTriltsch, U., i S. Buttgenbach. "Next generation of TCAD environments for MEMS design". W 2008 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (MEMS/MOEMS). IEEE, 2008. http://dx.doi.org/10.1109/dtip.2008.4752959.
Pełny tekst źródłaKalaivani, R., J. Charles Pravin, S. Ashok Kumar i R. Sridevi. "Design and Simulation of 22nm FinFET Structure Using TCAD". W 2020 5th International Conference on Devices, Circuits and Systems (ICDCS). IEEE, 2020. http://dx.doi.org/10.1109/icdcs48716.2020.243600.
Pełny tekst źródłaLi, Cheng, Zijin Pan, Mengfu Di, Feilong Zhang, Zhiguo Li, Ning Jiang i Albert Wang. "ESD Device Layout Design Guidelines by 3D TCAD Simulation". W 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM). IEEE, 2020. http://dx.doi.org/10.1109/edtm47692.2020.9117912.
Pełny tekst źródłaLiu, Kaiping, Jeff Z. Wu, Jihong Chen, Amitabh Jain i Manoj Mehrotra. "Improving device performance and process manufacturability through the use of TCAD". W Design, Process Integration, and Characterization for Microelectronics, redaktorzy Alexander Starikov i Kenneth W. Tobin, Jr. SPIE, 2002. http://dx.doi.org/10.1117/12.475676.
Pełny tekst źródłaAsenov, Asen, Karim El Sayed, Ricardo Borges, Plamen Asenov, Campbell Millar i Terry Ma. "TCAD based Design-Technology Co-Optimisations in advanced technology nodes". W 2017 International Symposium on VLSI Design, Automation and Test (VLSI-DAT). IEEE, 2017. http://dx.doi.org/10.1109/vlsi-dat.2017.7939691.
Pełny tekst źródłaSanudin, Rahmat, Muhammad Suhaimi Sulong, Marlia Morsin i Mohd Helmy Abd Wahab. "Simulation study on NMOS gate length variation using TCAD tool". W 2009 1st Asia Symposium on Quality Electronic Design (ASQED 2009). IEEE, 2009. http://dx.doi.org/10.1109/asqed.2009.5206255.
Pełny tekst źródłaHong, Teoh Chin, i Razali Ismail. "Device Design Consideration for Nanoscale MOSFET Using Semiconductor TCAD Tools". W 2006 IEEE International Conference on Semiconductor Electronics. IEEE, 2006. http://dx.doi.org/10.1109/smelec.2006.380770.
Pełny tekst źródłaLim, W. H., A. L. Ziebell, I. Cornelius, M. I. Reinhard, D. A. Prokopovich, A. S. Dzurak i A. B. Rosenfeld. "Cylindrical silicon-on-insulator microdosimeter: Design, fabrication and TCAD modeling". W 2007 IEEE Nuclear Science Symposium Conference Record. IEEE, 2007. http://dx.doi.org/10.1109/nssmic.2007.4437312.
Pełny tekst źródłaRaporty organizacyjne na temat "TCAD Design"
Klein, J. E. Conceptual Design for Consolidation TCAP. Office of Scientific and Technical Information (OSTI), luty 1999. http://dx.doi.org/10.2172/4820.
Pełny tekst źródłaKoomar, Saalim, Winston Massam, Kristeen Chachage, Gervace Anthony, WinifridaJacob Mrope, Mustafa Malibiche, Emmanuel Mutura i in. TCPD in Tanzania: Design-Based Implementation Research Cycle 1 Recommendations Policy Brief. EdTech Hub, maj 2023. http://dx.doi.org/10.53832/edtechhub.0166.
Pełny tekst źródłaSHOWALTER, STEVEN K., DOLORES CRUZ, FRED GELBARD, RONALD P. MANGINELL, DOUGLAS R. ADKINS, RICHARD KOTTENSTETTE, KIM S. RAWLINSON, GEORGE R. DULLECK, JR, DANIEL S. HORSCHEL i WAYNE EINFELD. Design and Testing of a Micro Thermal Conductivity Detector (TCD) System. Office of Scientific and Technical Information (OSTI), marzec 2003. http://dx.doi.org/10.2172/809627.
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