Gotowe bibliografie tematyczne / STM lithography

Gotowa bibliografia na temat „STM lithography”

Autor: Grafiati

Data publikacji: 4 czerwca 2021

Data aktualizacji: 19 lutego 2022

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Artykuły w czasopismach na temat "STM lithography"

Dobrik, G., L. Tapasztó, P. Nemes-Incze, Ph Lambin i L. P. Biró. "Crystallographically oriented high resolution lithography of graphene nanoribbons by STM lithography". physica status solidi (b) 247, nr 4 (15.01.2010): 896–902. http://dx.doi.org/10.1002/pssb.200982953.

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Marrian, C. R. K., i E. A. Dobisz. "High-resolution lithography with a vacuum STM". Ultramicroscopy 42-44 (lipiec 1992): 1309–16. http://dx.doi.org/10.1016/0304-3991(92)90440-u.

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Zhang, L. B., J. X. Shi, Ju Long Yuan, Shi Ming Ji i M. Chang. "The Advancement of SPM-Based Nanolithography". Materials Science Forum 471-472 (grudzień 2004): 353–57. http://dx.doi.org/10.4028/www.scientific.net/msf.471-472.353.

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Scanning probe microscopy (SPM) has proved to be a powerful tool not only for imaging but also for nanofabrication. SPM-based nanofabrication comprises manipulation of atoms or molecules and SPM-based nanolithography. SPM-based nanolithography, referred to as scanning probe lithography (SPL) in this review, holds good promise for fabrication of nanometer-scale patterns as an emerging generic lithography technique that STM, AFM, and SNOM are directly or otherwise used to pattern nanometer-scale features under appropriate conditions. Patterning methods including mechanical SPL, electrical SPL, thermal SPL, and optical SPL, are described in terms of SPL mechanisms. The newly developed variations of the above-mentioned SPL methods such as dip pen nanolithography, nanoshaving and nanografting, replacement lithography, constructive nanolithography, nanojet lithography, and electrostatic lithography, are also illustrated respectively. Analyses of prospective application of these SPL methods are presented finally.

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Yang, Ye, i Wan Sheng Zhao. "Fabrication of the Nanoscale Flat-Bottomed and Lamellar Structures on HOPG Surface by STM-Based Electric Lithography". Key Engineering Materials 562-565 (lipiec 2013): 45–51. http://dx.doi.org/10.4028/www.scientific.net/kem.562-565.45.

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The requirement for fabrication of the nanometer-scale structures has grown up recently due to the advance in the development of the nanoscale electronic-devices or bio-devices. Scanning tunneling microscope (STM)-based electric lithography is one of the potential fabrication approaches to produce nanoscale structures on a variety of materials. This study of the STM-based electric lithography intends to fabricate flat-bottomed and lamellar structures on the graphite surface, which differs from the conventionally fabricated tapered structures. The formation and the comparison of both the lamellar and tapered structures are obtained by applying distinct STM tip geometries in the STM-based electric lithography. On the basis of the experimental results, it is found that the formation of lamellar structures should be attributed to the local electrochemical reaction, while the generation of tapered structures is resulted from the dielectric breakdown in the tip-sample gap.

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Kleineberg, U., A. Brechling, M. Sundermann i U. Heinzmann. "STM Lithography in an Organic Self-Assembled Monolayer". Advanced Functional Materials 11, nr 3 (czerwiec 2001): 208–12. http://dx.doi.org/10.1002/1616-3028(200106)11:3<208::aid-adfm208>3.0.co;2-x.

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Vetrone, J., i Y. W. Chung. "Changes in tip structure measured during STM lithography". Applied Surface Science 78, nr 3 (lipiec 1994): 331–38. http://dx.doi.org/10.1016/0169-4332(94)90022-1.

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Dobrik, Gergely, Levente Tapasztó i László Biró. "Nanometer wide ribbons and triangles by STM lithography of graphene". Nanopages 7, nr 1 (czerwiec 2012): 1–7. http://dx.doi.org/10.1556/nano.2010.00001.

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Tucker, J. R., i T. C. Shen. "Prospects for atomically ordered device structures based on STM lithography". Solid-State Electronics 42, nr 7-8 (lipiec 1998): 1061–67. http://dx.doi.org/10.1016/s0038-1101(97)00302-x.

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KASU, Makoto, i Naoki KOBAYASHI. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Nanometer-scale GaAs Selective Growth Using STM Lithography." Hyomen Kagaku 19, nr 11 (1998): 734–41. http://dx.doi.org/10.1380/jsssj.19.734.

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Leuschner, R., E. Günther, G. Falk, A. Hammerschmidt, K. Kragler, I. W. Rangelow i J. Zimmermann. "Bilayer resist process for exposure with low-voltage electrons (STM-lithography)". Microelectronic Engineering 30, nr 1-4 (styczeń 1996): 447–50. http://dx.doi.org/10.1016/0167-9317(95)00284-7.

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Rozprawy doktorskie na temat "STM lithography"

Ruess, Frank Joachim Physics Faculty of Science UNSW. "Atomically controlled device fabrication using STM". Awarded by:University of New South Wales. Physics, 2006. http://handle.unsw.edu.au/1959.4/24855.

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We present the development of a novel, UHV-compatible device fabrication strategy for the realisation of nano- and atomic-scale devices in silicon by harnessing the atomic-resolution capability of a scanning tunnelling microscope (STM). We develop etched registration markers in the silicon substrate in combination with a custom-designed STM/ molecular beam epitaxy system (MBE) to solve one of the key problems in STM device fabrication ??? connecting devices, fabricated in UHV, to the outside world. Using hydrogen-based STM lithography in combination with phosphine, as a dopant source, and silicon MBE, we then go on to fabricate several planar Si:P devices on one chip, including control devices that demonstrate the efficiency of each stage of the fabrication process. We demonstrate that we can perform four terminal magnetoconductance measurements at cryogenic temperatures after ex-situ alignment of metal contacts to the buried device. Using this process, we demonstrate the lateral confinement of P dopants in a delta-doped plane to a line of width 90nm; and observe the cross-over from 2D to 1D magnetotransport. These measurements enable us to extract the wire width which is in excellent agreement with STM images of the patterned wire. We then create STM-patterned Si:P wires with widths from 90nm to 8nm that show ohmic conduction and low resistivities of 1 to 20 micro Ohm-cm respectively ??? some of the highest conductivity wires reported in silicon. We study the dominant scattering mechanisms in the wires and find that temperature-dependent magnetoconductance can be described by a combination of both 1D weak localisation and 1D electron-electron interaction theories with a potential crossover to strong localisation at lower temperatures. We present results from STM-patterned tunnel junctions with gap sizes of 50nm and 17nm exhibiting clean, non-linear characteristics. We also present preliminary conductance results from a 70nm long and 90nm wide dot between source-drain leads which show evidence of Coulomb blockade behaviour. The thesis demonstrates the viability of using STM lithography to make devices in silicon down to atomic-scale dimensions. In particular, we show the enormous potential of this technology to directly correlate images of the doped regions with ex-situ electrical device characteristics.

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Lakcher, Amine. "Nouvelles perspectives de métrologie dimensionnelle par imagerie de microscope électronique pour le contrôle de la variabilité des procédés de fabrication des circuits intégrés". Thesis, Université Grenoble Alpes (ComUE), 2018. http://www.theses.fr/2018GREAT052/document.

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Dans les noeuds technologiques avancés ainsi que les technologies dérivées, des règles de dessin de plus en plus aggressives sont nécessaires. Cela conduit à une complexification des structures dans les circuits intégrés actuels. De telles structures posent un défi important aux procédés de fabrication, notamment les étapes dites de patterning que sont la lithographie et la gravure. Afin d'améliorer et d'optimiser ces structures, les designers se basent sur les règles et connaissances qu’ont les ingénieurs de leurs procédés. Ces règles ont besoin d'être alimentées par des informations dimensionnelles et structurelles de plus en plus complexes : configurations de type bord arrondi, distance entre deux bouts de lignes, rétrecissement de ligne, etc. La métrologie doit évoluer afin que les ingénieurs soient capables de mesurer et quantifier les dimensions des structures les plus complexes dans le but d'estimer la variabilité de leur procédé. Actuellement la variabilité est principalement estimée à partir de données issues du suivi en ligne de structures simples car elles sont les seules à garantir une mesure robuste et reproductible. Mais, elles peuvent difficilement être considérées comme représentatives du procédé ou du circuit. Utiliser la métrologie par CD-SEM pour mesurer des structures complexes de manière robuste est un défi technique. La création de recettes de mesures est complexe, nécessite un temps non négligeable et ne garantit pas une mesure stable. Cependant, une quantité importante d'informations est contenue dans l'image SEM. Les outils d'analyses fournis par les équipementiers permettent aujourd'hui d'extraire les contours SEM d'une structure présente dans l’image. Ainsi, le CD-SEM prend des images et la partie métrologie est réalisée hors ligne afin d'estimer la variabilité. Cette thèse vise à proposer aux ingénieurs de nouvelles possibilités de métrologie dimensionnelle afin de l’appliquer pour le contrôle des structures les plus complexes. Les contours SEM sont utilisés comme source d’information et exploités pour générer de nouvelles métriques
In advanced technological nodes as well as derived technologies, aggressive design rules are needed. This leads to a complexity of structures in the current integrated circuits. Such structures pose a significant challenge to chip manufacturing processes, in particular patterning steps of lithography and etching. In order to improve and optimize these structures, designers need to rely on the rules and knowledge that engineers have about their processes. These rules need to be fed by complex dimensional and structural information: corner rounding, tip to tip distances, line end shortening, etc. Metrology must evolve so that engineers are able to measure and quantify the dimensions of the most complex structures in order to assess the process variability. Currently the variability is mainly quantified using data from the inline monitoring of simple structures as they are the only ones to guarantee a robust and reproducible measurement. But, they can hardly be considered as representative of the process or the circuit. Using CD-SEM metrology to measure complex structures in a robust way is a technical challenge. The creation of measurement recipes is complex, time consuming and does not guarantee a stable measurement. However, a significant amount of information is contained in the SEM image. The analysis tools provided by the equipment manufacturers allow to extract the SEM contours of a structure present in the image. Thus, the CD-SEM takes images and the metrology part is performed offline to estimate the variability.This thesis offers engineers new possibilities of dimensional metrology in order to apply it for process control of complex structures. SEM contours are used as a source of information and used to generate new metrics

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Konijn, Mark. "Multilevel Nanoengineering for Imprint Lithography". Thesis, University of Canterbury. Electrical and Computer Engineering, 2005. http://hdl.handle.net/10092/1071.

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The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increasingly difficult and expensive. Extreme ultra-violet lithography is an alternate method that has the potential to provide feature sizes down to 30 nm, however, it will come at an even greater cost. Nanoimprint lithography (NIL) is another lithographic technique which is promising to provide very high resolutions at a relatively low cost. Imprinting works by using a mold with a surface patterned with the required nano structures and pressing it into a substrate coated with a deformable polymer. Due to its direct pattern replication technique, it is very capable of reproducing three-dimensional structures, however limited research has been performed on this to date. In this study, investigations have been performed into developing a reliable process for creating SiN molds with sub-100 nm structures with variable height control. The process relies on a negative tone electron beam resist which can be patterned to various thicknesses by varying the exposure dosage. This allows for the creation of complex multi-layer structures in a single electron beam lithography step. These patterns then have been transferred into the SiN substrate by a single reactive ion etch. From here the mold is ready for use in imprinting. Study has also been performed into imprinting process as well. This includes the development of an imprint press, the manner in which NIL works. Investigations have been performed into the imprinting performance of 3D molds. Thermal expansion issues have been found and addressed, as have adhesion problems. Some other aspects of 3D NIL which have not been addressed in this study have been outlined in future work for further investigation.

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Perring, Mathew Ian. "Functionalization and patterning of monolayers on silicon(111) and polydicyclopentadiene". Diss., University of Iowa, 2010. https://ir.uiowa.edu/etd/722.

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The formation of a functional surfaces combines the properties of a substrate and monolayer to produce a new hybrid that can combine aspects of each. Monolayers can be made on many surfaces, and well defined functionalized monolayers were assembled on for silicon(111) and polydicyclopentadiene (PDCPD). Acid terminated monolayers were assembled on silicon(111) and their functionalization chemistry explored. It was shown that using trifluoroacetic anhydride to generate an intermediate reactive anhydride, the surface could be functionalized with amines. It was further shown that using soft lithography these functionalized surfaces could be patterned. Mixed monolayers of methyl and olefin terminated surfaces on silicon(111) were used to develop a new soft lithographic technique with polydimethylsiloxane (PDMS). PDMS can be controllably etched using fluoride species. The surface is first activated by the attachment of the Grubbs' 1st generation catalyst. A PDMS microfluidic device is then placed on the surface. By using a cross metathesis reaction, the exposed channel can be pacified. The next step, a fluoride etchant is used to remove PDMS, exposing an unreacted surface. Polymer brushes were then grown by ring opening metathesis polymerization (ROMP) in this region. Functionalization of the emerging polymer PDCPD was conducted through two different routes. ROMP formed PDCPD has double bonds that can be functionalized. In the first process, the double bonds were reacted with bromine. This is a rapid reaction and proceeds to a significant depth in the material. Bromines can then be displaced with amines in a substitution reaction. This was demonstrated with a fluorinated amine that when examined by XPS were shown to be present only at the surface, further more we were able to pattern this surface too. Secondly, a process using epoxides was developed. The epoxidation reaction could not be quantified, but formation in the second step of an amine functionalized surfaces was observed by XPS. Further reaction of surface hydroxyls was also observed. This was also used to grow polyethylimine from the surface to sufficient thickness that it became observable by infrared spectroscopy.

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Costa, Juliano Nunes. "Projeto, fabricação e teste de uma microbomba sem valvulas". [s.n.], 2006. http://repositorio.unicamp.br/jspui/handle/REPOSIP/264091.

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Orientador: Euripedes Guilherme de Oliveira Nobrega
Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Mecanica
Made available in DSpace on 2018-08-06T12:28:24Z (GMT). No. of bitstreams: 1 Costa_JulianoNunes_M.pdf: 1943364 bytes, checksum: 37bfdc87a8b3b47e435c8aadfe91806a (MD5) Previous issue date: 2006
Resumo: Hoje em dia, os microssistemas eletromecânicos (MEMS) constituem uma das áreas mais promissoras e de rápido crescimento entre as novas tecnologias. Uma área de destaque na utilização de MEMS é a microfluídica, onde diversos tipos de equipamentos miniaturizados são necessários. As microbombas têm um papel fundamental neste tipo de microdispositivos, devido a sua função de prover quantidades muito pequenas de fluidos de maneira segura e uniforme. O presente trabalho apresenta o processo de desenvolvimento de uma microbomba de diafragma oscilante sem válvulas e com atuação pneumática. Para se construir a microbomba sem válvulas, primeiramente foi feito um estudo sobre os elementos bocaljdifusor, que representam na microbomba o papel das válvulas. Com o objetivo de se analisar o comportamento da microbomba, foi feita uma simulação numérica utilizando-se a analogia por circuitos elétricos equivalentes, reconhecidamente um método simples e eficiente' de simulação de sistemas multidomínios, onde a grande maioria dos microdispositivos podem ser classificados. Por fim, foram projetados e montados protótipos da microbomba utilizahdo-se a tecnologia de microfabricação Litografia Profunda em polímeros flexográficos, onde se faz o uso de radiação ultravioleta. Tal opção se deve a que esta é uma tecnologia de baixo custo e de fácil utilização. Foi feito em seguida o levantamento de desempenho da microbomba, onde vários testes foram realizados para se conhecer a relação de pressão versus vazão
Abstract: Nowadays, Micro-Electromechanical systems (MEMS) constitute one of the most promising and fast expanding fields among the new technologies. Microfiuidic systems are a noteworthy sub-area of MEMS, demanding several types of microdevices to be developed. Micropumps have a fundamental role in thee systems, due to the need of supplying minimal amounts of fiuid in a guaranteed and uniform way. This work presents the process of development of. prototypes of aval veless micropump based upon reciprocating diaphragm and pneumatic actuation. To construct the valveless micropump, firstly it was made a study on the nozzlej diffuser elements, which represent in these micropumps the valve function. Aiming to analyse the behavior of the micropump, a numeric simulation was studied using electrical equivalent networks, known as a simple and eflicient method of simulation of multidomain systems, a classification most MEMS follow. Finally, it was designed and constructed prototypes of the micropumps using the Deep Lithography in fiexographics polymers micro-manufacture technology. This option is due to the low cost characteristic of this technology and also because it is very easy to learn how to produce the prototypes. ln the sequence, the nerformance of the micropump was studied through several experimental tests in order to know its pressure and fiow behavior
Mestrado
Mecanica dos Sólidos e Projeto Mecanico
Mestre em Engenharia Mecânica

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Kim, Eun Jung. "Surface Microtopography Modulation of Biomaterials for Bone Tissue Engineering Applications". Cleveland State University / OhioLINK, 2010. http://rave.ohiolink.edu/etdc/view?acc_num=csu1273557062.

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Cheng, Zhe Annie. "Biological multi-functionalization and surface nanopatterning of biomaterials". Thesis, Bordeaux 1, 2013. http://www.theses.fr/2013BOR15202/document.

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Le but de la conception d’un biomatériau est de mimer les modèles qui puissent être représentatifs de la matrice extracellulaire (MEC) existant in vivo. Cet objectif peut être atteint en associant une combinaison de cellules et des facteurs biologiques à un biomatériau sur lequel ces cellules peuvent se développer pour reconstruire le tissu natif. Dans cet étude, nous avons crée des surfaces bioactives nanostructurées en combinant la nanolithographie et la fonctionnalisation de surface, en greffant un peptide RGD ou BMP-2 (bone morphogenetic protein 2). Nous avons étudié l’effet de cette nanodistribution sur le comportement des cellules souches mésenchymateuses en analysant leur adhésion et différentiation. Nous notons que la nanodistribution des peptides induit une bioactivité qui a un impact sur l’organisation du cytosquelette, la conformation des fibres de stresse de l’actin, la maturation des adhésions focales (AFs), et le commitment des cellules souches. En particulier, l’aire, la distribution, et la conformation des AFs sont affectes par la présence des nanopatterns. En plus, le RGD et le BMP-2 changent le comportement cellulaire par des voies et des mécanismes différents en variant l’organisation des cellules souches et la maturation de leurs AFs. La nanodistribution influence de façon évidente les cellules souches en modifiant leur comportement (adhésion et différenciation) ce qui a contribué et ce qui contribuera à améliorer la compréhension des interactions des cellules avec la MEC
The aim of biomaterials design is to create an artificial environment that mimics the in vivo extracellular matrix for optimized cell interactions. A precise synergy between the scaffolding material, bioactivity, and cell type must be maintained in an effective biomaterial. In this work, we present a technique of nanofabrication that creates chemically nanopatterned bioactive silicon surfaces for cell studies. Using nanoimprint lithography, RGD and mimetic BMP-2 peptides were covalently grafted onto silicon as nanodots of various dimensions, resulting in a nanodistribution of bioactivity. To study the effects of spatially distributed bioactivity on cell behavior, mesenchymal stem cells (MSCs) were cultured on these chemically modified surfaces, and their adhesion and differentiation were studied. MSCs are used in regenerative medicine due to their multipotent properties, and well-controlled biomaterial surface chemistries can be used to influence their fate. We observe that peptide nanodots induce differences in MSC behavior in terms of cytoskeletal organization, actin stress fiber arrangement, focal adhesion (FA) maturation, and MSC commitment in comparison with homogeneous control surfaces. In particular, FA area, distribution, and conformation were highly affected by the presence of peptide nanopatterns. Additionally, RGD and mimetic BMP-2 peptides influenced cellular behavior through different mechanisms that resulted in changes in cell spreading and FA maturation. These findings have remarkable implications that contribute to the understanding of cell-extracellular matrix interactions for clinical biomaterials applications

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Scott, Kevin. "Fabrication and Characterization of Magnetic Nanostructures". Scholar Commons, 2014. https://scholarcommons.usf.edu/etd/5437.

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Magnetic permalloy nanostructures were fabricated onto a silicon wafer using electron beam lithography and a liftoff process. The lithography was performed with a Hitachi SU-70 SEM retrofitted with a Nabity NPGS lithography conversion kit. PMMA of 950kDa molecular weight was used as the photoresist. Features were either nanowires, nanodots, or elliptical or rectangular nanostructures. The nanowires had dimensions of 15µm x 200nm x 40nm, the nanodots had diameters of 145nm and thickness of 12nm, and the ellipses and rectangles had dimensions of 110nm x 50nm x 13nm. Characterization of the nanostructures was performed using the same Hitachi SEM as well as a Digital Instruments DI 3100 Nanoscope IIIa AFM used in magnetic force imaging mode. The SEM was used to measure lateral dimensions of the features and to capture images of features for proper documentation and for external simulation studies. The MFM was used to capture magnetic images of the samples to determine the magnetic state of the nanowires or arrays.

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Blom, Tobias. "Fabrication and Applications of a Focused Ion Beam Based Nanocontact Platform for Electrical Characterization of Molecules and Particles". Doctoral thesis, Uppsala universitet, Experimentell fysik, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-122940.

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The development of new materials with novel properties plays an important role in improving our lives and welfare. Research in Nanotechnology can provide e.g. cheaper and smarter materials in applications such as energy storage and sensors. In order for this development to proceed, we need to be able to characterize the material properties at the nano-, and even the atomic scale. The ultimate goal is to be able to tailor them according to our needs. One of the great challenges concerning the characterization of nano-sized objects is how to achieve the physical contact to them. This thesis is focused on the contacting of nanoobjects with the aim of electrically characterizing them and subsequently understanding their electrical properties. The analyzed nanoobjects are carbon nanosheets, nanotetrapods, nanoparticles and molecular systems. Two contacting strategies were employed in this thesis. The first strategy involved the development of a focused ion beam (FIB) based nanocontact platform. The platform consists of gold nanoelectrodes, having nanogaps of 10-30 nm, on top of an insulating substrate. Gold nanoparticles, double-stranded DNA and cadmium telluride nanotetrapods have been trapped in the gaps by using dielectrophoresis. In certain studies, the gold electrodes have also been coated with conducting or non-conducting molecules, prior to the trapping of gold nanoparticles, in order to form molecular junctions. These junctions were subsequently electrically characterized to evaluate the conduction properties of these molecular systems. For the purpose of better controlling the attachment of molecules to the nanoelectrodes, a novel route to synthesize alkanedithiol coated gold nanoparticles was developed. The second contacting strategy was based on the versatility of the FIB instrument as a platform for in-situ manipulation and electrical characterization of non-functionalized and functionalized carbon nanosheets, where it was found that the functionalized samples had an increased conductivity by more than one order of magnitude. Both contacting strategies proved to be valuable for building knowledge around contacting and electrical characterization of nanoobjects

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Cheng, Zhe. "Biological multi-functionalization and surface nanopatterning of biomaterials". Phd thesis, Université Sciences et Technologies - Bordeaux I, 2013. http://tel.archives-ouvertes.fr/tel-01016695.

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The aim of biomaterials design is to create an artificial environment that mimics the in vivo extracellular matrix for optimized cell interactions. A precise synergy between the scaffolding material, bioactivity, and cell type must be maintained in an effective biomaterial. In this work, we present a technique of nanofabrication that creates chemically nanopatterned bioactive silicon surfaces for cell studies. Using nanoimprint lithography, RGD and mimetic BMP-2 peptides were covalently grafted onto silicon as nanodots of various dimensions, resulting in a nanodistribution of bioactivity. To study the effects of spatially distributed bioactivity on cell behavior, mesenchymal stem cells (MSCs) were cultured on these chemically modified surfaces, and their adhesion and differentiation were studied. MSCs are used in regenerative medicine due to their multipotent properties, and well-controlled biomaterial surface chemistries can be used to influence their fate. We observe that peptide nanodots induce differences in MSC behavior in terms of cytoskeletal organization, actin stress fiber arrangement, focal adhesion (FA) maturation, and MSC commitment in comparison with homogeneous control surfaces. In particular, FA area, distribution, and conformation were highly affected by the presence of peptide nanopatterns. Additionally, RGD and mimetic BMP-2 peptides influenced cellular behavior through different mechanisms that resulted in changes in cell spreading and FA maturation. These findings have remarkable implications that contribute to the understanding of cell-extracellular matrix interactions for clinical biomaterials applications.

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Książki na temat "STM lithography"

Sam, Francis. Sam Francis: Special proofs 1959-1990 : lithographs and screenprints from the estate of the artist. London: Alan Cristea Gallery in association with Jonathan Novak Contemporary Art, 2001.

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Części książek na temat "STM lithography"

Koops, H. W. P., M. Rudolph, J. Kretz i M. Weber. "Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 87–93. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_10.

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Marrian, C. R. K., F. K. Perkins, S. L. Brandow, T. S. Koloski, E. A. Dobisz i J. M. Calvert. "Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 175–88. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_18.

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Heyvaert, I., E. Osquiguil, C. Van Haesendonck i Y. Bruynseraede. "Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 207–12. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_21.

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Langheinrich, Wolfram, i Heinz Beneking. "Sub-10nm Electron Beam Lithography: -AIF3-Doped Lithium Fluoride as a Resist". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 53–66. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_5.

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Ils, P., M. Michel, A. Forchel, I. Gyuro, P. Speier i E. Zielinski. "Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 77–80. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_8.

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Schmidt, A., F. Faller i A. Forchel. "Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 73–76. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_7.

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Stockman, L., C. Haesendonck, G. Neuttiens i Y. Bruynseraede. "SUB-20 nm Lithographic Patterning with the STM". W NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies, 197–205. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-015-8261-2_20.

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Li, Ning, Siming Guo i Michael A. Sutton. "Recent Progress in E-Beam Lithography for SEM Patterning". W MEMS and Nanotechnology, Volume 2, 163–66. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-8825-6_23.

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Cheng, Z. A., O. F. Zouani, K. Glinel, A. M. Jonas i M. C. Durrieu. "Bioactive Nanoimprint Lithography: A Study of Human Mesenchymal Stem Cell Behavior and Fate". W IFMBE Proceedings, 1817–20. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-00846-2_448.

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Krishnan, Kannan M. "Scanning Probe Microscopy". W Principles of Materials Characterization and Metrology, 745–802. Oxford University Press, 2021. http://dx.doi.org/10.1093/oso/9780198830252.003.0011.

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Streszczenie:

Scanning probe microscopy (SPM) scans a fine tip close to a surface and measures the tunneling current (STM) or force (SFM), based on many possible tip-surface interactions. STM provides atomic resolution imaging, or the local electronic structure (spectroscopy) as a function of bias voltage, and is also used to manipulate adsorbed atoms on a clean surface. STM operates in two modes— constant current or height—and requires a conducting specimen. SFM uses a cantilever (force sensor) to measure short range (< 1 nm) chemical, and a variety of long-range (< 100 nm) forces, depending on the tip and the specimen; a conducting specimen is not required. In static mode, the tip height is controlled to maintain a constant force, and measure surface topography. In dynamic mode, changes in the vibrational properties of the cantilever are measured using frequency, amplitude, or phase modulation as feedback to control the tip-surface distance and form the image. Dynamic imaging includes contact and non-contact modes, but intermittent contact or tapping mode is common. SPMs measure properties (optical, acoustic, conductance, electrochemical, capacitance, thermal, magnetic, etc.) using appropriate tips, and find applications in the physical and life sciences. They are also used for nanoscale lithography.

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Streszczenia konferencji na temat "STM lithography"

Marrian, C. R. K., E. A. Dobisz i R. J. Colton. "Lithography with a Vacuum STM". W Scanned probe microscopy. AIP, 1991. http://dx.doi.org/10.1063/1.41387.

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Li, Nan, Tatsuo Yoshinobu i Hiroshi Iwasaki. "STM Nano-Lithography with SiO2 Mask". W 1998 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1998. http://dx.doi.org/10.7567/ssdm.1998.c-2-3.

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McCord, Mark A., i Roger Fabian W. Pease. "Principles and techniques of STM lithography". W SPIE Institutes for Advanced Optical Technologies 10, redaktor Christie R. K. Marrian. SPIE, 1993. http://dx.doi.org/10.1117/12.183194.

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Chang, T. H. Philip, Lawrence P. Muray, Urs Staufer, Mark A. McCord i Dieter P. Kern. "Arrayed lithography using STM-based microcolumns". W SPIE Institutes for Advanced Optical Technologies 10, redaktor Christie R. K. Marrian. SPIE, 1993. http://dx.doi.org/10.1117/12.183200.

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Marrian, Christie R., Elizabeth A. Dobisz i John A. Dagata. "Low voltage E-beam lithography with the STM". W SPIE Institutes for Advanced Optical Technologies 10, redaktor Christie R. K. Marrian. SPIE, 1993. http://dx.doi.org/10.1117/12.183196.

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Sob, Wilder, Atalar i Quate. "Fabrication Of 100 nm pMOSFETS With Hybrid AFW / STM Lithography". W Symposium on VLSI Technology. IEEE, 1997. http://dx.doi.org/10.1109/vlsit.1997.623732.

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Lott, Travis, i Russell J. Elias. "Sub-nanometer CD- SEM matching". W Advanced Lithography, redaktor Chas N. Archie. SPIE, 2007. http://dx.doi.org/10.1117/12.712213.

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Bunday, Benjamin, John Allgair, Bryan J. Rice, Jeff Byers, Yohanan Avitan, Ram Peltinov, Maayan Bar-zvi, Ofer Adan, John Swyers i Roni Z. Shneck. "SEM metrology for advanced lithographies". W Advanced Lithography, redaktor Chas N. Archie. SPIE, 2007. http://dx.doi.org/10.1117/12.714203.

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Lawson, Richard A., i Clifford L. Henderson. "Investigating SEM metrology effects using a detailed SEM simulation and stochastic resist model". W SPIE Advanced Lithography, redaktorzy Jason P. Cain i Martha I. Sanchez. SPIE, 2015. http://dx.doi.org/10.1117/12.2086051.

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Levitov, F., A. Karabekov, G. Eytan i G. Golan. "Charging measurement using SEM embedded energy filter". W Advanced Lithography, redaktor Chas N. Archie. SPIE, 2007. http://dx.doi.org/10.1117/12.711747.

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