Gotowa bibliografia na temat „Silica films”
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Artykuły w czasopismach na temat "Silica films"
Maier, Wilhelm F., Michael Wiedorn i Herbert O. Schramm. "Microporous Silica Films". Angewandte Chemie International Edition in English 30, nr 11 (listopad 1991): 1509–10. http://dx.doi.org/10.1002/anie.199115091.
Pełny tekst źródłaChien, Wen Chen, Yang Yen Yu i Shih Yu Chen. "Synthesis and Characterization of Photopolymerized Poly(acrylic)/Monodispersed Colloidal Silica Hybrid Thin Films". Advanced Materials Research 47-50 (czerwiec 2008): 662–65. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.662.
Pełny tekst źródłaDeschanels, X., S. Dourdain, C. Rey, G. Toquer, A. Grandjean, S. Pellet-Rostaing, O. Dugne, C. Grygiel, F. Duval i Y. Serruys. "Radiation damages on mesoporous silica thin films and bulk materials". MRS Proceedings 1514 (2013): 69–74. http://dx.doi.org/10.1557/opl.2013.386.
Pełny tekst źródłaLi, Yu, Yi He Zhang, Bo Shen i Feng Zhu Lv. "Preparation and Dielectric Properties of Polyimide Nanocomposite Films Based on Hollow Silica". Advanced Materials Research 217-218 (marzec 2011): 647–51. http://dx.doi.org/10.4028/www.scientific.net/amr.217-218.647.
Pełny tekst źródłaYu, Yang Yen, Wen Chen Chien i Tsung Wei Tsai. "Microstructure and Properties of Polyimide /Monodispersed Colloidal Silica Hybrid Films Prepared by Sol–Gel Process". Advanced Materials Research 47-50 (czerwiec 2008): 650–53. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.650.
Pełny tekst źródłaBreval, E., M. L. Mulvihill, J. P. Dougherty i R. E. Newnham. "Polyimide-silica microcomposite films". Journal of Materials Science 27, nr 12 (1992): 3297–300. http://dx.doi.org/10.1007/bf01116027.
Pełny tekst źródłaLoughlani, Rayane-Ichrak, Alonso Gamero-Quijano i Francisco Montilla. "Electroassisted Incorporation of Ferrocene within Sol–Gel Silica Films to Enhance Electron Transfer". Molecules 28, nr 19 (28.09.2023): 6845. http://dx.doi.org/10.3390/molecules28196845.
Pełny tekst źródłaHorikawa, Hajime, Takashi Ogihara, Akio Shimomura i Junko Shimomura. "Preparation and Characterization of Silica Film on PBT Substrate by Sol-Gel Method Using Perhydropolysilazane". Key Engineering Materials 421-422 (grudzień 2009): 161–64. http://dx.doi.org/10.4028/www.scientific.net/kem.421-422.161.
Pełny tekst źródłaZhang, Yi He, Qing Song Su, Li Yu, Hong Zheng, Hai Tao Huang, Guo Ge Zhang, Ying Bang Yao i Helen Lai Wah Chan. "Study on the Dielectric Properties of Hybrid and Porous Polyimide-Silica Films". Advanced Materials Research 47-50 (czerwiec 2008): 973–76. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.973.
Pełny tekst źródłaKubo, Tomoko, Eisuke Tadaoka i Hiromitsu Kozuka. "Formation of silica coating films from spin-on polysilazane at room temperature and their stability in hot water". Journal of Materials Research 19, nr 2 (luty 2004): 635–42. http://dx.doi.org/10.1557/jmr.2004.19.2.635.
Pełny tekst źródłaRozprawy doktorskie na temat "Silica films"
Campbell-Rance, Debbie. "Electrodeposited Silica Thin Films". VCU Scholars Compass, 2010. http://scholarscompass.vcu.edu/etd/2123.
Pełny tekst źródłaSpaargaren, Susan Marianne Rosemary. "Radiation effects on silica based waveguides". Thesis, Imperial College London, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.267942.
Pełny tekst źródłaKlichko, Yaroslav Vladimirovich. "Functional mesoporous silica films for nanosystems applications". Diss., Restricted to subscribing institutions, 2009. http://proquest.umi.com/pqdweb?did=1998520791&sid=1&Fmt=2&clientId=1564&RQT=309&VName=PQD.
Pełny tekst źródłaKokan, Julie Runyan. "Processing of low permittivity silica thin films". Thesis, Georgia Institute of Technology, 1994. http://hdl.handle.net/1853/20032.
Pełny tekst źródłaGeite, Patrik. "Medical Implant Applications of Mesoporous Silica Films". Thesis, Linköpings universitet, Nanostrukturerade material, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-154463.
Pełny tekst źródłaWooten, Mary K. "NANOFILTRATION MEMBRANES FROM ORIENTED MESOPOROUS SILICA THIN FILMS". UKnowledge, 2014. http://uknowledge.uky.edu/cme_etds/28.
Pełny tekst źródłaBragg, Donald. "Photocatalytic Oxidation of Carbon Monoxide Using Sputter Deposited Molybdenum Oxide Thin Films on a Silicon Dioxide Substrate". Fogler Library, University of Maine, 2007. http://www.library.umaine.edu/theses/pdf/BraggD2007.pdf.
Pełny tekst źródłaBasnig, Deomila. "Élaboration de films minces de silice pour des applications en chimie analytique". Electronic Thesis or Diss., Université de Lorraine, 2021. http://www.theses.fr/2021LORR0102.
Pełny tekst źródłaOriented mesoporous silica-based film on FTO electrode was prepared via electrochemically-assisted self-assembly approach (EASA). A potential of -1.5V was applied to the FTO electrode containing a prehydrolyzed silica precursor, (e.g. tetraethyl orthosilicate), in the presence of a template (e.g. cetrimonium bromide) and electrolyte. This approach could generate vertically-aligned silica nanochannels with pore sizes adjustable between 2 and 3 nm, depending on the template. This work showed the voltammetric behavior and the selectivity of the mesoporous silica film towards various positively-charged cations of different nature, size, and charge. Results showed an accumulation and selectivity favoring the least positive charged ion: MB⁺ > PQ²⁺ > DQ²⁺ > Ru(bpy)₃²⁺ > Ru(NH₃)₆³⁺. The enhancement of the voltammetric signals relative to the bare FTO electrode was strongly dependent on the probe type. The accumulation of the different redox probe is attributed to the due to the vertical orientation of the nanochannel favoring fast transport and diffusion unto the electrode surface. Further electrochemical characterization showed an interplay of the suface-controlled and diffusion-controlled process, wherein adsorbed species is more prominent in diluted media. Results showed that changing the debye length and electrokinetic radius of the silica nanochannel due to the ionic strength or nanochannel diameter also affects the transport and electrochemical detection of the paraquat analyte. Mesoporous silica films having different pore size, prepared using different alkyl ammonium bromide as template, yield different sensitivities, which could be due to the difference in electrochemical charge of the silica surface, as well as the distribution of ions in the nanochannel. Finally, an attempt to modify the surface of silica wall using zirconia was also made to study the transport of cations, which could pave a way for an improved stability of the mesoporous film
CHAKRAVARTY, SRINIVAS L. N. "DEVELOPMENT OF SCRATCH RESISTANT PECVD SILICA-LIKE FILMS". University of Cincinnati / OhioLINK, 2000. http://rave.ohiolink.edu/etdc/view?acc_num=ucin973542599.
Pełny tekst źródłaMoskowitz, Steven. "Atomic force miscroscopy [sic] study of SiO₂/Si(111)--(7x7) grown via atomic oxygen plasma /". Thesis, Connect to this title online; UW restricted, 2005. http://hdl.handle.net/1773/11556.
Pełny tekst źródłaKsiążki na temat "Silica films"
Innocenzi, Plinio. Mesoporous Ordered Silica Films. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.
Pełny tekst źródłaCenter, Lewis Research, red. Mechanical protection of DLC films on fused silica slides. Cleveland, Ohio: Lewis Research Center, 1985.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1999.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2003.
Znajdź pełny tekst źródłaAngeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Pennington, NJ: Electrochemical Society, 2005.
Znajdź pełny tekst źródłaInternational Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Redaktorzy Massoud Hisham Z, Poindexter Edward H i Helms C. Robert. Pennington, NJ: Electrochemical Society, 1996.
Znajdź pełny tekst źródłaCzęści książek na temat "Silica films"
Gonçalves, M. Clara, i George S. Attard. "Nanostructured Mesoporous Silica Films". W Nanostructured Materials and Coatings for Biomedical and Sensor Applications, 159–68. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-010-0157-1_16.
Pełny tekst źródłaShaikhutdinov, Shamil. "Water Adsorption on Silica Films". W Introduction to Ultrathin Silica Films Silicatene and Others, 271–91. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-8.
Pełny tekst źródłaShaikhutdinov, Shamil. "Ultrathin Silica Films on Metals". W Introduction to Ultrathin Silica Films Silicatene and Others, 107–65. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-4.
Pełny tekst źródłaShaikhutdinov, Shamil. "Silica and Silicates". W Introduction to Ultrathin Silica Films Silicatene and Others, 1–30. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-1.
Pełny tekst źródłaAlexander, John Callum. "TiO2 Thin Films on Fused Silica". W Springer Theses, 221–59. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-34229-0_7.
Pełny tekst źródłaBersuker, Gennadi, Keith McKenna i Alexander Shluger. "Silica and High-k Dielectric Thin Films in Microelectronics". W Oxide Ultrathin Films, 101–18. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch5.
Pełny tekst źródłaHolt, S. A., K. J. Edler i C. Fernandez-Martin. "Formation of surfactant–silica mesophase films at a silica interface". W Surface and Colloid Science, 169–74. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/b97126.
Pełny tekst źródłaKhabibullin, Amir, i Ilya Zharov. "Responsive Nanoporous Silica Colloidal Films and Membranes". W Intelligent Stimuli-Responsive Materials, 265–91. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118680469.ch8.
Pełny tekst źródłaShaikhutdinov, Shamil. "Defects in Ultrathin Silica Films on Metals". W Introduction to Ultrathin Silica Films Silicatene and Others, 167–90. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-5.
Pełny tekst źródłaShaikhutdinov, Shamil. "Thin Silica Films on Si and SIC". W Introduction to Ultrathin Silica Films Silicatene and Others, 69–106. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-3.
Pełny tekst źródłaStreszczenia konferencji na temat "Silica films"
Hur, Soojung C., Laurent Pilon, Adam Christensen i Samuel Graham. "Thermal Conductivity of Cubic Mesoporous Silica Thin Films". W ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-43016.
Pełny tekst źródłaCoquil, Thomas, Neal Hutchinson, Laurent Pilon, Erik Richman i Sarah Tolbert. "Thermal Conductivity of Cubic and Hexagonal Mesoporous Silica Thin Films". W ASME 2009 Heat Transfer Summer Conference collocated with the InterPACK09 and 3rd Energy Sustainability Conferences. ASMEDC, 2009. http://dx.doi.org/10.1115/ht2009-88256.
Pełny tekst źródłaPoulsen, Christian V., Mikael Svalgaard i Ove Poulsen. "Photosensitivity in germania-doped silica films". W The European Conference on Lasers and Electro-Optics. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/cleo_europe.1994.cmm5.
Pełny tekst źródłaKobavashi, Junva, Tohru Maruno, Yasuhiro Hida, Tohru Matsuura i Shigekuni Sasaki. "Thermooptic switches using fluorinated polyimide waveguides". W Organic Thin Films for Photonic Applications. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/otfa.1997.fa.4.
Pełny tekst źródłaMelninkaitis, Andrius, Algirdas Selskis, Rytis Buzelis, Lina Mažule, Tomas Tolenis, Lina Grineviciute i Ramutis Drazdys. "New generation all-silica based optical elements for high power laser systems". W Nanostructured Thin Films X, redaktorzy Tom G. Mackay, Akhlesh Lakhtakia i Yi-Jun Jen. SPIE, 2017. http://dx.doi.org/10.1117/12.2272952.
Pełny tekst źródłaGrineviciute, Lina, Lukas Ramalis, Rytis Buzelis i Tomas Tolenis. "Highly resistant all-silica polarizers for normal incidence applications". W Advances in Optical Thin Films VII, redaktorzy Michel Lequime i Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597136.
Pełny tekst źródłaKao, Chih-cheng, B. Gallas i J. Rivory. "Study of Erbium Doped Silica Films Containing Silicon Nanograins". W 2007 IEEE Conference on Electron Devices and Solid-State Circuits. IEEE, 2007. http://dx.doi.org/10.1109/edssc.2007.4450187.
Pełny tekst źródłaFardad, M. A., Eric M. Yeatman i Emma J. Dawnay. "Porous films for nonlinear silica-on-silicon integrated optics". W SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, redaktor John D. Mackenzie. SPIE, 1994. http://dx.doi.org/10.1117/12.188938.
Pełny tekst źródłaSwab, P., i R. E. Klinger. "Physical microstructure of evaporated titania-silica and zirconia-silica multilayer thin films". W OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1985. http://dx.doi.org/10.1364/oam.1985.thv1.
Pełny tekst źródłaRamalis, Lukas, Ugnė Norkutė, Rytis Buzelis, Algirdas Selskis i Tomas Tolenis. "Sculptured thin film based all-silica mirrors for high power lasers". W Advances in Optical Thin Films VII, redaktorzy Michel Lequime i Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597151.
Pełny tekst źródłaRaporty organizacyjne na temat "Silica films"
Smith, W. L., T. A. Michalske i R. R. Rye. The deposition of boron nitride and carbon films on silica glass fibers. Office of Scientific and Technical Information (OSTI), listopad 1993. http://dx.doi.org/10.2172/10110580.
Pełny tekst źródłaKalnitsky, A., S. P. Tay, J. P. Ellul, J. W. Andrews, E. A. Irene i S. Chongsawagvirod. Measurements and Modelling of Thin Silicon Dioxide Films on Silicon. Fort Belvoir, VA: Defense Technical Information Center, maj 1989. http://dx.doi.org/10.21236/ada207853.
Pełny tekst źródłaMecholsky, Jr, Tsai J. J., Drawl Y. L. i W. R. Fracture Studies of Diamond Films on Silicon. Fort Belvoir, VA: Defense Technical Information Center, sierpień 1991. http://dx.doi.org/10.21236/ada240978.
Pełny tekst źródłaMartin U. Pralle i James E. Carey. Black Silicon Enhanced Thin Film Silicon Photovoltaic Devices. Office of Scientific and Technical Information (OSTI), lipiec 2010. http://dx.doi.org/10.2172/984305.
Pełny tekst źródłaIrene, Eugene A. Silicon Oxidation Studies on Thin Film Silicon Oxidation Formation. Fort Belvoir, VA: Defense Technical Information Center, marzec 1989. http://dx.doi.org/10.21236/ada206835.
Pełny tekst źródłaBerman, G. P., G. D. Doolen, R. Mainieri, D. K. Campbell i V. A. Luchnikov. Molecular dynamics simulations of grain boundaries in thin nanocrystalline silicon films. Office of Scientific and Technical Information (OSTI), październik 1997. http://dx.doi.org/10.2172/292865.
Pełny tekst źródłaGallagher, A., D. Doughty i J. Doyle. Diagnostics of glow discharges used to produce hydrogenated amorphous silicon films. Office of Scientific and Technical Information (OSTI), maj 1990. http://dx.doi.org/10.2172/6910198.
Pełny tekst źródłaKeyes, Brian. National solar technology roadmap: Film-silicon PV. Office of Scientific and Technical Information (OSTI), czerwiec 2007. http://dx.doi.org/10.2172/1217298.
Pełny tekst źródłaBenziger, Jay B. Surface Intermediates in Thin Film Deposition on Silicon. Fort Belvoir, VA: Defense Technical Information Center, sierpień 1989. http://dx.doi.org/10.21236/ada216662.
Pełny tekst źródłaHall, R. B., C. Bacon, V. DiReda, D. H. Ford, A. E. Ingram, S. M. Lampo, J. A. Rand, T. R. Ruffins i A. M. Barnett. Silicon-film{trademark} on ceramic solar cells. Final report. Office of Scientific and Technical Information (OSTI), luty 1993. http://dx.doi.org/10.2172/10135001.
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