Rozprawy doktorskie na temat „Pulvérisation cathodique magnétron en atmosphère réactive”
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Gilbert, Benjamin. "Synthèse de films nanocomposites Ag/YSZ, Ag/CGO & Ag(Cu)/CGO par pulvérisation cathodique magnétron réactive pour l’électrocatalyse de l’éthylène en oxyde d’éthylène". Electronic Thesis or Diss., Université de Lorraine, 2020. http://www.theses.fr/2020LORR0257.
Pełny tekst źródłaEthylene oxide (EO) is an essential building block for the chemical industry. It is produced by the ethylene epoxidation reaction over a silver-based catalyst. Nevertheless, to achieve high selectivity, industrial processes use chloride additives in the gas phase and alkaline moderators on the catalyst. The aim of this study is to increase EO selectivity without chloride additives thanks to Ag/fluorite oxides electrocatalysts synthesized by reactive magnetron sputtering and incorporated in a 3-electrodes configuration cell designed for electrochemical promotion of catalysis, EPOC. Three porous systems (Ag/YSZ, Ag/GDC, Ag(Cu)/GDC) have been synthesized by reactive magnetron sputtering. Ag/YSZ 4 Pa 25 mA nanocomposite thin film exhibits a botryoidal microstructure characteristic of silver segregation inside the YSZ matrix. Ag/GDC 4 Pa 70 mA nanocomposite thin film exhibits a brain like-morphology with open nanoporosities. Ag(Cu)/GDC 4 Pa 70 mA nanocomposite thin film consists of multi-phase hydrophobic entropic nanowires. During catalytic tests under ethylene epoxidation conditions in reducing medium, Ag/GDC 4 Pa 70 mA showed the maximum EO selectivity of 16.55 % at 220 °C and, under polarization, selectivity boost of 2.78 % occur without the appearance of NEMCA effect
Batan, Abdelkrim. "Dépôt de films minces de silicium et de nitrures de silicium par pulvérisation cathodique réactive magnétron". Doctoral thesis, Universite Libre de Bruxelles, 2006. http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/210791.
Pełny tekst źródłaTernon, Céline. "Nanostructures luminescentes à base de silice et de silicium : de l'élaboration par pulvérisation magnétron réactive à la modélisation de la photoluminescence". Caen, 2002. http://www.theses.fr/2002CAEN2057.
Pełny tekst źródłaCombadière, Laurette. "Contribution à l'étude fondamentale de la pulvérisation cathodique magnétron réactive : application à la réalisation de couches minces de nitrure de titane". Limoges, 1992. http://www.theses.fr/1992LIMO0170.
Pełny tekst źródłaJin, Chengfei. "Dépôts de TaNx par pulvérisation cathodique magnétron à fort taux d'ionisation de la vapeur pulvérisée". Phd thesis, Université Paris Sud - Paris XI, 2011. http://tel.archives-ouvertes.fr/tel-00638786.
Pełny tekst źródłaBaraket, Mira. "Élaboration et caractérisation de revêtements nano-structurés à base de nitrure de chrome par pulvérisation cathodique magnétron en condition réactive : propriétés mécaniques et tribologiques". Besançon, 2008. http://www.theses.fr/2008BESA2049.
Pełny tekst źródłaThe present work deals with structural, mechanical and tribological characterization of nanostructured chromium nitride (CrN) based thin films for cutting tool applications. Coatings are deposited by DC reactive magnetron sputtering from metallic targets (Cr, Si and Ag) on static and rotating substrate holders with RF or DC bias. The influence pf plasma parameters (nitrogen partial pressure and substrate bias) on the mechanical properties of CrN is studied. In order to improve its mechanical properties, silicon is then introduced to CrN thanks to silicon coupons placed on the erosion track of Cr target or by cosputtering of Cr and Si targets; The fraction of silicon into the coatings is then increased in order to achieve the formation of NC-CrN/A-Si3N4 nanocomposite. Chemical, mechanical, tribological and structural properties are studied as a function of silicon content using GDOES, EPMA, nano and microindentation, pin on discs, scratch tests, XRD, SEM and TEM techniques. Si3N4 phase is detected from 1 at. % of silicon by XPS measurements. An increase of the hardness is observed while adding silicon to CrN with two maximum at 5 and 10 at. % of silicon. The resistance to oxidation at high temperature is also studied. To improve the tribological properties of the films, silver is introduced as a solid lubricant in a multilayer structure of CrN/Ag and CrSiN/Ag in the nanoscale range. Multilayers periodicity ranges from 8 to 24 nm. The silver nanolayer and the total coating thicknesses are maintained constant at 4 nm and 2 µm respectively for all the coatings. The nitride layer thickness is the only parameter that has been modified in the multilayer coatings. The influence of the thickness of CrN and CrSiN monolayers on the mechanical and tribological properties is presented and discussed. The resistance to oxidation at high temperatures of all coatings is also examined
Sayah, Imane. "Etude de revêtements photocatalytiques à base de dioxyde de titane nanostructuré élaborés par pulvérisation cathodique magnétron en condition réactive". Thesis, Belfort-Montbéliard, 2014. http://www.theses.fr/2014BELF0249/document.
Pełny tekst źródłaThe development of supported photocatalysts thin films is of major interest allowing an efficient separation of the reaction products, in spite of their specific area reduction compared to nanometric scale powders. The synthesis of TiO2 coatings by reactive magnetron sputtering is the subject of intensive researches. This technique allows, trough the control of the deposition parameters, to manage the structure and the physicochemical and photocatalytic properties of the coatings. In order to hinder the sodium contamination of the catalyst from the glass substrate, either during in situ or ex situ heating of the coating, a SiNx diffusion barrier is intercalated with a fixed thickness. Different layers of TiO2 were prepared at high pressure in a reactor equipped with a closed-loop control system based on optical emission spectroscopy. The influence of the in situ crystallization at different temperatures on the properties of the TiO2 coatings was studied. These properties were compared with those of samples synthesized ex situ and at the same temperatures. Finally, first studies on the influence of silver enrichment at different contents on photocatalytic activity under visible light of TiO2 layers crystallized in situ and ex situ, are presented
Benzeggouta, Dhafira. "Etude de procédés de dépôts de films minces par décharge magnétron fortement ionisée". Paris 11, 2008. http://www.theses.fr/2008PA112090.
Pełny tekst źródłaLn modern techniques of thin film deposition it is necessary to improve the quality of the deposited thin film, to achieve a better control of the energy deposited to the growing thin film and to permit the deposition of thin films on complex shape substrates of with good step coverage. The main drawback of convention al De magnetron sputtering is that emitted metal particles are mainly neutrals. It this condition, it is difficult to guide. Their pathway and to control their energy. An improvement of sputtering process consists in iO[1izing the emitted vapour by adding a second discharge between the target and the substrate. This technique is usually called IPVD (Ionized Physical Vapor Deposition) in which frequently a second Radio-Frequency (RF) discharge is used (RF-IPVD). A second alternative method developed more recently, ca lied HPPMS (High Power Pulsed Magnetron Sputtering), uses high power pulses applied directly on the magnetron cathode. During the,pulse. An important ionization degree of sputtered species (> 50 %) is achieved. The two techniques have been used for the case of reactive sputtering for the deposition of RU02 oxide. A very few works have developed till now for this reactive conditions. A large part of this thesis is devoted to the study of the influence of the introduction of O2 on the discharge behaviour in the two RF-IPVD and HPPMS processes. We also studied the possibility of depositing dielectric thin films BaSrTi03 using a ceramics target and the RF-IPVD process. Results obtained within this thesis open new perspectives for the use of the HPPMS technique for the development of new material having specifie properties
Jin, Chengfei. "Dépôts de TaNx par pulvérisation cathodique magnétron à fort taux d’ionisation de la vapeur pulvérisée". Thesis, Paris 11, 2011. http://www.theses.fr/2011PA112212/document.
Pełny tekst źródłaThanks to their excellent physical and chimical characteristics such as good stability with temperature, good conductor of heat and electricity, ductility, hardness, chemical inertness and good corrosion resistance, tantalum and its nitride are used in a wide variety of applications such as wear and corrosion-resistant materials, thin film transistors, diffusion barrier for copper and for carbon nanotube grown by CCVD process (catalytically chemical vapor deposition). For some recent industrial demand, it is necessary to deposit on substrates with complex shape. The main disadvantage of the conventional magnetron sputtering (CMS) is that most of the sputtered particles are neutral. To controle the energy and the path of sputtered particles, new magnetron sputtering techniques have been developed for ionizing a significant fraction of sputtered material. A new sputtering process called RF-IPVD consists in ionizing the sputtered vapor by adding second plasma by a RF coil between the target and the substrate. Another method called HIPIMS (High Power Impulsed Magnetron Sputtering), uses high power impulse instead of DC power. During the impulse, the sputtered Ta atoms are ionized in the dense plasma. We have deposited Ta thin films by CMS, RF-IPVD and HIPIMS and TaNx thin films by CMS and HIPIMS. The objective of this thesis is to compare the properties of discharges and thin films deposited by these different techniques
Sanchette, Fredéric. "Synthèse et caractérisation de dépôts Al-Cr-(N) et Al-Ti-(N) obtenus par pulvérisation cathodique magnétron en condition réactive". Vandoeuvre-les-Nancy, INPL, 1996. http://www.theses.fr/1996INPL057N.
Pełny tekst źródłaStauder, Bruno. "Synthèse et caractérisation de films Al-O, Al-N et Zr-O prépares par pulvérisation cathodique magnétron en condition réactive". Vandoeuvre-les-Nancy, INPL, 1994. http://www.theses.fr/1994INPL080N.
Pełny tekst źródłaGutier, Patrick. "Pulvérisation cathodique magnétron en condition réactive et propriétés mécaniques de revêtements duplex d'acier inoxydable enrichis en azote, carbone et oxygène". Vandoeuvre-les-Nancy, INPL, 2000. http://www.theses.fr/2000INPL042N.
Pełny tekst źródłaThis work deals with the synthesis, the physico-chemical and mechanical caracterisation of coatings obtained by cathodic magnetron sputtering of a metallic austenitic stainless steel target in different argon - reactive gas (nitrogen, methan or oxygen) mixtures. The metastable solid solutions which are nitrogen, carbon or oxygen supersatured, as weIl as the ceramic compound of oxide type (Fe, Cr, Ni)₃O₄, with their different crystalline or amorphous structures are studied by means of the main diffraction techniques of structural analysis and physical methods of chemical analysis. The second part of this work aims to point out the complete mechanical properties of the different coatings and composite (coating + substrat). The intrinsic properties of the different coatings were first studied in relation with the elaboration parameters and structural properties. Vickers indentation as well as single pass and triboscopic multipass scratch testing were then performed on the three type of N, C, 0 doped coatings, in order to establish a relation between the brittleness or ductility and the tribological behaviour (friction, wear)
Marlot, André. "Synthèse par pulvérisation cathodique magnétron et caractérisation de revêtement d'oxydes biocompatibles pour application aux implants dentaires en alliage de titane". Thesis, Université de Lorraine, 2012. http://www.theses.fr/2012LORR0319/document.
Pełny tekst źródłaThe vapor deposition processes are particularly successful for the synthesis of coatings with tuneable properties. More specifically, this research deals with the development of biocompatible coatings on titanium alloys TA6V obtained by magnetron sputtering in reactive conditions. At first, we described the processes to design the commercial medical implants to be able to reproduce them within the laboratory. In the second, we focused our study on the effect of the crystallographic structure of zirconia-based coatings on their biocompatible character from cell cultures of fibroblasts. The results obtained demonstrate a significant variation of cell behavior for the three the zirconia structures: monoclinic, tetragonal or cubic. In the purpose to bring relevant information that allow discussing these effects, another series of ceramic coatings were developed as for instance amorphous oxides of titanium or zirconium, yttrium oxide,, aluminum oxide or amorphous carbon. The cell response on these samples demonstrates to the biocompatible properties of the yttrium oxide, excluding any harmful effect of this element in the doped zirconia
Zairi, Amel. "Elaboration et Caractérisation de revêtements à base de nitrure de chrome par pulvérisation cathodique magnétron en condition réactive : Propriétés mécaniques et tribologiques". Phd thesis, Ecole nationale supérieure d'arts et métiers - ENSAM, 2013. http://pastel.archives-ouvertes.fr/pastel-00996656.
Pełny tekst źródłaSun, Hui. "Synthèse par co-pulvérisation cathodique magnétron en condition réactive et caractérisation de revêtements d’oxydes conducteurs transparents à base de CuCrO2 de structure délafossite". Thesis, Belfort-Montbéliard, 2016. http://www.theses.fr/2016BELF0292/document.
Pełny tekst źródłaTransparent conductive oxides (TCOs) can be widely used in various domains from electrochromics to photovoltaicsowing to their unique optoelectronic properties. During the history of the development of TCOs, most attention hasbeen focused on n-type TCOs, while p-type TCOs have made slow progress. Recently, the studies on p-type TCOsraised many interest especially due to their potential application in the fabrication of transparent p-n junctions.Based on the theory of chemical method of valance band, CuCrO2 compound with delafossite structure isconsidered as an interesting candidate for p-type TCOs. The objective of this work is to synthesize CuCrO2-basedthin films with acceptable optical transmittance and high p-type electrical conductivity in order to explore thepossibility of fabrication of transparent p-n junctions for various applications.In this work, CuCrO2 films were deposited by reactive sputtering from metallic targets. Then, partial Cr substitutionby Mg was performed into CuCrO2 films and the influence of the films thickness on its optoelectronic properties wasstudied. Finally, sandwich architectural coatings of CuCrO2 :Mg/Ag/CuCrO2 :Mg were designed in order to improvethe films optoelectronic performances
Lapostolle, Frédéric. "Caractérisation de revêtements TiOx (0[inférieur ou égal] x [inférieur ou égal] 2) élaborés sur métal ou sur verre par pulvérisation cathodique magnétron en condition réactive". Vandoeuvre-les-Nancy, INPL, 2001. http://www.theses.fr/2001INPL046N.
Pełny tekst źródłaCorvisier, Alan. "Élaboration par pulvérisation magnétron réactive d'une couche thermochrome à base de dioxyde de vanadium. Application à la régulation passive de la température de panneaux solaires". Thesis, Université de Lorraine, 2014. http://www.theses.fr/2014LORR0024/document.
Pełny tekst źródłaThis work is incorporated within the framework of a Cifre thesis with the partnership of the VIESSMANN Faulquemont SAS society to end in a new generation of absorbent layer in order to regulate the temperature of a solar cell in a passive and reversible way. This absorbent layer is based on vanadium dioxide (VO2), this thermochromic material exhibits a phase semiconductor to metal transition depending on its temperature. In a first step, the synthesis of VO2 films at 500 °C will be exposed and then we will present a new process to obtain a pure VO2 phase with a film deposited at room temperature. The study in temperature of the optical and electrical properties of these two kinds of coatings will be discussed, same as the effects on the phase transition of parameters such as the grain size or the internal stresses. Eventually, we will study the physical properties of a VO2+V4O9 two-phase system as an absorbent layer which is, in fine, very beneficial for the thermal regulation of a solar panel
Gui, Yunfang. "Mise au point par pulvérisation cathodique magnétron en condition réactive et caractérisations mécaniques et tribologiques de revêtements de phases Magnéli de titane (TinO2n-1)". Thesis, Belfort-Montbéliard, 2014. http://www.theses.fr/2014BELF0235/document.
Pełny tekst źródłaThe present work deals with the synthesis and the structural, mechanical and tribological characterization of titanium Magnéli phases (TinO2n-1) coatings for tribological application. The thin films were prepared by reactive magnetron sputtering from titanium target in a reactive O2/Ar gas mixture using a rotating and heating substrate holder.The first part of the study is based on the synthesis of titanium Magneli phase monolayers. The influence of the main synthesis parameters (oxygen flow rate, temperature of the substrate holder) was analyzed in relation with the structure and the morphology of the synthesized coatings. Then TinO2n-1/AlTiN bilayers were synthesized by the reactive magnetron sputtering and the low pressure electric arc techniques, respectively. The phase and the thickness of the top layer of titanium oxide and the thickness of the under layer AlTiN were selected as the parameters to be studied.The second part concerns the mechanical properties (nano hardness instrumented, elasticity modulus, Mercedes test and scratch test) and tribological properties (pin on disc test) of the monolayer and bilayer coatings. Particular attention was paid to the influence of the friction test temperature on the bilayer coatings wear rates
Aubry, Éric. "Étude des relations entre les propriétés physicochimiques et photocatalytiques de revêtements nanostructurés de dioxyde de titane synthétisés par pulvérisation cathodique magnétron en condition réactive". Thesis, Vandoeuvre-les-Nancy, INPL, 2007. http://www.theses.fr/2007INPL104N/document.
Pełny tekst źródłaAThe photocatalysis is a new way of organic pollutants treatments which needs a low energy supplied under light wave. The use of supported catalyst allows an efficient separation of the reaction products, in spite of their specific area reduction. Owing to the advantages that offers reactive sputtering (good mechanical adhesion, synthesis on cold substrates, easy control of the microstructure, …), the synthesis by this technique of the most promising semiconductor photocatalyst, namely the titanium dioxide, is the subject of intensive researchs. After a description of the mechanisms occurring during a photocatalytic reaction, the physical phenomena at the origin of the ceramic coating synthesis are detailed. In order to hinder the sodium contamination of the catalyst from the glass substrate, a SiNx diffusion barrier is intercalated. The influences of the substrate position relatively to the metallic flux, the annealing temperature, the total pressure and the TiO2 coating thickness on the physico-chemical and photocatalytic properties are investigated allowing the formulation of hypothetic relations combining them. Finally, first studies on in situ crystallized TiO2-xNy photocatalyst deposited at high pressure are presented
Brahim, Cyrine. "Conception et performances électrochimiques de matériaux nanostructurés pour piles à combustible à oxyde solide". Phd thesis, Paris 6, 2006. http://pastel.archives-ouvertes.fr/pastel-00002545.
Pełny tekst źródłaRodríguez, Martínez Yerila. "Plasmonic Cu nanoparticles inclusion in ZnO and Cu2O matrices for enhanced photoconversion of all-oxide optoelectronics". Electronic Thesis or Diss., Université de Lorraine, 2023. http://www.theses.fr/2023LORR0208.
Pełny tekst źródłaIn this work we present the results on in-situ growth of plasmonic copper (Cu) nanoparticles (NPs) into a p-Cu2O matrix by using reactive magnetron sputtering of a Cu target and adjusting the oxygen flowrate. It was possible to observe, for oxygen-poor conditions, the formation of CuNPs-Cu2O composites presenting the signature of the localized surface plasmon resonance (LSPR) phenomenon. Devices based on the studied nanocomposites interfaced with zinc oxide (ZnO) were characterized by J-V and spectral photocurrent measurements, showing a photocurrent density increase under optical illumination as a result of the plasmonic particles incorporation and consequent hot carriers injection. In the second part of the manuscript, the results about the rapid thermal annealing (RTA) of the CuNPs-Cu2O composites under oxygen-poor conditions and their properties evolution when temperature increases are presented. At temperature higher than 150 ºC it was possible to see a copper segregation towards the surface, increase in the crystal preferential orientation of Cu2O and improvement of the LSPR signal. Electrical response of devices constituted by the composite layers interfaced with ZnO and annealed at 200 ºC showed a further increase in the photocurrent resulting from the LSPR of Cu NPs at the devices surface. Finally, the synthesis of Cu nanoparticles through a gas aggregation source (GAS) and the subsequent fabrication of ZnO-CuNPs multilayer structure with plasmonic response were studied. The resulted composite revealed LSPR response and the presence of Cu particles acting as nucleation points for highly oriented ZnO conical grains
Khelidj, Hamza. "Elaboration de films minces semi-conducteurs Ge1-xSnx et leurs contacts ohmiques". Electronic Thesis or Diss., Aix-Marseille, 2021. http://www.theses.fr/2021AIXM0406.
Pełny tekst źródłaThe aim of this thesis is to study the fabrication of Ge1–xSnx thin films semiconductors by magnetron sputtering and their ohmic contacts by reactive diffusion. The crystallization and the crystalline growth of Ge1–xSnx were studied. The crystallization of an amorphous Ge1–xSnx layer deposited at room temperature leads to a polycrystalline growth. In addition, the competition between Ge / Sn phase separation and Ge1–xSnx growth prevents the formation of large-grain Sn-rich Ge1–xSnx films without the formation of β-Sn islands on the surface. However, the growth at T = 360 ° C of a highly relaxed pseudo-coherent Ge0.9Sn0.1 film on Si(100) with a low concentration of impurities (< 2 × 1019 cm–3) and an electrical resistivity four orders of magnitude smaller than undoped Ge was obtained. We have shown that the measurement of the Seebeck coefficient for Ge and Ge1–xSnx thin films allows the determination of the type of doping, the concentration of the charge carriers and the variation of the scattering mechanisms. The solid state reaction of Ni /Ge0.9Sn0.1 shows a sequential growth of two phases. The first phase to form was the Ni5(GeSn)3 phase, which is stable up to 290 ° C. Then, at 275 ° C, the Ni(GeSn) phase was observed. This phase is stable up to 430 ° C. A delay in the formation of the Ni(GeSn) phase compared to the NiGe phase was observed. In addition, the thermal stability of the NiGe phase is highly affected by the addition of Sn. The phase growth kinetics as well as the Sn segregation kinetics in the Ni(GeSn) phase were studied