Artykuły w czasopismach na temat „Photolithographie UV”
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Ballandras, S., i D. Hauden. "Applications aux microtechniques de la photolithographie profonde par UV et par rayonnement synchrotron". Annales de Physique 19 (październik 1994): C1–73—C1–85. http://dx.doi.org/10.1051/anphys/1994022.
Pełny tekst źródłaCasalboni, M., L. Dominici, V. Foglietti, F. Michelotti, E. Orsini, C. Palazzesi, F. Stella i P. Prosposito. "Bragg Grating Optical Filters by UV Nanoimprinting". Journal of Nanomaterials 2012 (2012): 1–5. http://dx.doi.org/10.1155/2012/186429.
Pełny tekst źródłaGuijt, Rosanne M., i Michael C. Breadmore. "Maskless photolithography using UV LEDs". Lab on a Chip 8, nr 8 (2008): 1402. http://dx.doi.org/10.1039/b800465j.
Pełny tekst źródłaNoniewicz, Konrad, Zbigniew K. Brzozowski i Irmina Zadrozna. "UV-sensitive polyarylates as photolithographic emulsions". Journal of Applied Polymer Science 60, nr 7 (16.05.1996): 1071–82. http://dx.doi.org/10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3.
Pełny tekst źródłaMagklaras, Aris, Panayiotis Alefragis, Christos Gogos, Christos Valouxis i Alexios Birbas. "A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography". Information 14, nr 8 (28.07.2023): 428. http://dx.doi.org/10.3390/info14080428.
Pełny tekst źródłaGordillo, H., I. Suárez, R. Abargues, P. Rodríguez-Cantó, S. Albert i J. P. Martínez-Pastor. "Polymer/QDs Nanocomposites for Waveguiding Applications". Journal of Nanomaterials 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/960201.
Pełny tekst źródłaWu, Chun-Ying, Heng Hsieh i Yung-Chun Lee. "Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask". Micromachines 10, nr 8 (18.08.2019): 547. http://dx.doi.org/10.3390/mi10080547.
Pełny tekst źródłaCritchley, Kevin, Lixin Zhang, Hitoshi Fukushima, Masaya Ishida, Tatsuya Shimoda, Richard J. Bushby i Stephen D. Evans. "Soft-UV Photolithography using Self-Assembled Monolayers". Journal of Physical Chemistry B 110, nr 34 (sierpień 2006): 17167–74. http://dx.doi.org/10.1021/jp0630370.
Pełny tekst źródłaHoriuchi, S., T. Fujita, T. Hayakawa i Y. Nakao. "Micropatterning of Metal Nanoparticles via UV Photolithography". Advanced Materials 15, nr 17 (3.09.2003): 1449–52. http://dx.doi.org/10.1002/adma.200305270.
Pełny tekst źródłaZaki, M., Uda Hashim, Mohd Khairuddin Md Arshad, M. Nurfaiz, M. F. M. Fathil, A. H. Azman i R. M. Ayub. "Optimization on Conventional Photolithography Process of 0.98 μm Gap Design for Micro Gap Biosensor Application". Applied Mechanics and Materials 754-755 (kwiecień 2015): 524–29. http://dx.doi.org/10.4028/www.scientific.net/amm.754-755.524.
Pełny tekst źródłaLowe, Jimmy, Carl Bartels i Steven Holdcroft. "Synthesis and properties of a sterically encumbered poly(thienylene vinylene): poly[E-1,2-(4,4prime-dihexyl-2,2prime-dithienyl)ethylene]". Canadian Journal of Chemistry 76, nr 11 (1.11.1998): 1524–29. http://dx.doi.org/10.1139/v98-110.
Pełny tekst źródłaGoodall, F., RA Lawes i PH Sharp. "Excimer lasers as deep UV sources for photolithographic system". Microelectronic Engineering 5, nr 1-4 (grudzień 1986): 445–52. http://dx.doi.org/10.1016/0167-9317(86)90075-4.
Pełny tekst źródłaRoth, S., L. Dellmann, G.-A. Racine i N. F. de Rooij. "High aspect ratio UV photolithography for electroplated structures". Journal of Micromechanics and Microengineering 9, nr 2 (1.01.1999): 105–8. http://dx.doi.org/10.1088/0960-1317/9/2/001.
Pełny tekst źródłaMontague, Martha F., i Craig J. Hawker. "Secondary Patterning of UV Imprint Features by Photolithography". Chemistry of Materials 19, nr 3 (luty 2007): 526–34. http://dx.doi.org/10.1021/cm0622102.
Pełny tekst źródłaLamprecht, B., E. Kraker, G. Weirum, H. Ditlbacher, G. Jakopic, G. Leising i J. R. Krenn. "Organic optoelectronic device fabrication using standard UV photolithography". physica status solidi (RRL) – Rapid Research Letters 2, nr 1 (styczeń 2008): 16–18. http://dx.doi.org/10.1002/pssr.200701250.
Pełny tekst źródłaTam, Joyce, i Ozlem Yasar. "Multi Material 3D Scaffold Printing with Maskless Photolithography". MRS Advances 2, nr 24 (2017): 1303–8. http://dx.doi.org/10.1557/adv.2017.21.
Pełny tekst źródłaAraki, Hitoshi, Akira Shimada, Hisashi Ogasawara, Masaya Jukei, Takenori Fujiwara i Masao Tomikawa. "Low Temperature Curable Low Dk & Df Polyimide for Antenna in Package". International Symposium on Microelectronics 2021, nr 1 (1.10.2021): 000130–35. http://dx.doi.org/10.4071/1085-8024-2021.1.000130.
Pełny tekst źródłaTyagi, Pawan, Edward Friebe, Beachrhell Jacques, Tobias Goulet, Stanley Travers i Francisco J. Garcia-Moreno. "Taguchi Design of Experiment Enabling the Reduction of Spikes on the Sides of Patterned Thin Films for Tunnel Junction Fabrication". MRS Advances 2, nr 52 (2017): 3025–30. http://dx.doi.org/10.1557/adv.2017.456.
Pełny tekst źródłaKaltashov, Alexander, Prabu Karthick Parameshwar, Nicholas Lin i Christopher Moraes. "Accessible, large-area, uniform dose photolithography using a moving light source". Journal of Micromechanics and Microengineering 32, nr 2 (20.12.2021): 027001. http://dx.doi.org/10.1088/1361-6439/ac4005.
Pełny tekst źródłaLin, Hung Yi, Yong Shan Sun, Shih Liang Chen i Mao Kuo Wei. "Microlens Array Fabrication by 3D Diffuser Lithography for Light Enhancement of Organic Light-Emitting Devices". Key Engineering Materials 625 (sierpień 2014): 430–36. http://dx.doi.org/10.4028/www.scientific.net/kem.625.430.
Pełny tekst źródłaReynolds, David Eun, Olivia Lewallen, George Galanis i Jina Ko. "A Customizable and Low-Cost Ultraviolet Exposure System for Photolithography". Micromachines 13, nr 12 (1.12.2022): 2129. http://dx.doi.org/10.3390/mi13122129.
Pełny tekst źródłaLIAO, K. J., W. L. WANG, C. Z. CAI, X. S. WANG i C. Y. KONG. "UV PHOTODETECTORS OF c-BN FILMS". International Journal of Modern Physics B 16, nr 06n07 (20.03.2002): 1115–19. http://dx.doi.org/10.1142/s0217979202010968.
Pełny tekst źródłaToyama, Yoshisuke, i Hirokazu Ikeda. "13‐2: Invited Paper: Advanced Patterning Method Exceeding a Limitation of Lithography with Resolution Enhancement Technology (RET)". SID Symposium Digest of Technical Papers 54, nr 1 (czerwiec 2023): 158–61. http://dx.doi.org/10.1002/sdtp.16513.
Pełny tekst źródłaBeck, Anthony, Franziska Obst, Mathias Busek, Stefan Grünzner, Philipp Mehner, Georgi Paschew, Dietmar Appelhans, Brigitte Voit i Andreas Richter. "Hydrogel Patterns in Microfluidic Devices by Do-It-Yourself UV-Photolithography Suitable for Very Large-Scale Integration". Micromachines 11, nr 5 (2.05.2020): 479. http://dx.doi.org/10.3390/mi11050479.
Pełny tekst źródłaPrashad, Ramesh, i Ozlem Yasar. "Three-Dimensional Scaffold Fabrication with Inverse Photolithography". MRS Advances 2, nr 19-20 (15.12.2016): 1071–75. http://dx.doi.org/10.1557/adv.2016.620.
Pełny tekst źródłaSuwandi, Dedi, Yudan Whulanza i Jos Istiyanto. "Visible Light Maskless Photolithography for Biomachining Application". Applied Mechanics and Materials 493 (styczeń 2014): 552–57. http://dx.doi.org/10.4028/www.scientific.net/amm.493.552.
Pełny tekst źródłaSEKIGUCHI, Ten, Ryo ICHIGE, Hidetaka UENO i Takaaki SUZUKI. "Shape Evaluation of UV-PDMS Microstructures Made by Using Photolithography". Proceedings of the Conference on Information, Intelligence and Precision Equipment : IIP 2022 (2022): IIP1R1—E06. http://dx.doi.org/10.1299/jsmeiip.2022.iip1r1-e06.
Pełny tekst źródłaLiu, Junbo, Shaolin Zhou, Song Hu, Hongtao Gao, Yu He i Yiguang Cheng. "Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF". IEEE Photonics Technology Letters 27, nr 20 (15.10.2015): 2201–4. http://dx.doi.org/10.1109/lpt.2015.2456184.
Pełny tekst źródłaHemanth, Suhith, Thomas A. Anhøj, Claudia Caviglia i Stephan S. Keller. "Suspended microstructures of epoxy based photoresists fabricated with UV photolithography". Microelectronic Engineering 176 (maj 2017): 40–44. http://dx.doi.org/10.1016/j.mee.2017.01.026.
Pełny tekst źródłaLu, Yang, Jinbao Guo, Hao Wang i Jie Wei. "Flexible Bistable Smectic-A Liquid Crystal Device Using Photolithography and Photoinduced Phase Separation". Advances in Condensed Matter Physics 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/843264.
Pełny tekst źródłaFantino, Erika, Alessandra Vitale, Marzia Quaglio, Matteo Cocuzza, Candido F. Pirri i Roberta Bongiovanni. "Blue and UV combined photolithographic polymerization for the patterning of thick structures". Chemical Engineering Journal 267 (maj 2015): 65–72. http://dx.doi.org/10.1016/j.cej.2014.12.088.
Pełny tekst źródłaGupta, Ishi, Manika Choudhury, G. Harish Gnanasambanthan i Debashis Maji. "Optimization of Microstructure Patterning for Flexible Bioelectronics Application". International Journal of Electrical and Electronics Research 11, nr 3 (20.09.2023): 738–42. http://dx.doi.org/10.37391/ijeer.110315.
Pełny tekst źródłaKang, Myeongwoo, Jae Hwan Byun, Sangcheol Na i Noo Li Jeon. "Fabrication of functional 3D multi-level microstructures on transparent substrates by one step back-side UV photolithography". RSC Advances 7, nr 22 (2017): 13353–61. http://dx.doi.org/10.1039/c6ra28812j.
Pełny tekst źródłaSun, Ke, Gai Wu, Kang Liang, Bin Sun i Jian Wang. "Investigation into Photolithography Process of FPCB with 18 µm Line Pitch". Micromachines 14, nr 5 (10.05.2023): 1020. http://dx.doi.org/10.3390/mi14051020.
Pełny tekst źródłaNaggay, Benjamin K., Kerstin Frey, Markus Schneider, Kiriaki Athanasopulu, Günter Lorenz i Ralf Kemkemer. "Low-cost photolithography system for cell biology labs". Current Directions in Biomedical Engineering 7, nr 2 (1.10.2021): 550–53. http://dx.doi.org/10.1515/cdbme-2021-2140.
Pełny tekst źródłaLi, Bo. "Low-stress ultra-thick SU-8 UV photolithography process for MEMS". Journal of Micro/Nanolithography, MEMS, and MOEMS 4, nr 4 (1.10.2005): 043008. http://dx.doi.org/10.1117/1.2117108.
Pełny tekst źródłaKim, Pan Kyeom, Sung-Il Chung, Tae-Gyu Ha i Myung Yung Jeong. "The Fabrication of a Cylindrical Nano Mold Based on UV Photolithography". Science of Advanced Materials 12, nr 3 (1.03.2020): 407–11. http://dx.doi.org/10.1166/sam.2020.3652.
Pełny tekst źródłaWhitfield, Michael D., Stuart P. Lansley, Olivier Gaudin, Robert D. McKeag, Nadeem Rizvi i Richard B. Jackman. "Diamond photodetectors for next generation 157-nm deep-UV photolithography tools". Diamond and Related Materials 10, nr 3-7 (marzec 2001): 693–97. http://dx.doi.org/10.1016/s0925-9635(00)00518-5.
Pełny tekst źródłaBing, Chu Yih, Ajay Achath Mohanan, Tridib Saha, Ramakrishnan Nagasundara Ramanan, R. Parthiban i N. Ramakrishnan. "Microfabrication of surface acoustic wave device using UV LED photolithography technique". Microelectronic Engineering 122 (czerwiec 2014): 9–12. http://dx.doi.org/10.1016/j.mee.2014.03.011.
Pełny tekst źródłaShao, Dongbing, i Shaochen Chen. "Surface plasmon assisted contact scheme nanoscale photolithography using an UV lamp". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 26, nr 1 (2008): 227. http://dx.doi.org/10.1116/1.2834688.
Pełny tekst źródłaSekiguchi, Ten, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi i Takaaki Suzuki. "UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials". Sensors and Materials 35, nr 6 (27.06.2023): 1995. http://dx.doi.org/10.18494/sam4351.
Pełny tekst źródłaHuang, Wenhai, Taige Liu, Zhe Wang, Xiangdong Yuan, Bo Zhang, Chai Hu, Kewei Liu, Jiashuo Shi i Xinyu Zhang. "Flexible refractive and diffractive micro-optical films shaped by fitting aspherical microprofiles with featured aperture and depth and their spatial arrangement for imaging applications". Journal of Vacuum Science & Technology B 40, nr 2 (marzec 2022): 022804. http://dx.doi.org/10.1116/6.0001586.
Pełny tekst źródłaNothdurft, Philipp, Jörg Schauberger, Gisbert Riess i Wolfgang Kern. "Preparation of a Water-Based Photoreactive Azosulphonate-Doped Poly(Vinyl Alcohol) and the Investigation of Its UV Response". Polymers 11, nr 1 (18.01.2019): 169. http://dx.doi.org/10.3390/polym11010169.
Pełny tekst źródłaLiang, Banglong, Zili Wang, Cheng Qian, Yi Ren, Bo Sun, Dezhen Yang, Zhou Jing i Jiajie Fan. "Investigation of Step-Stress Accelerated Degradation Test Strategy for Ultraviolet Light Emitting Diodes". Materials 12, nr 19 (25.09.2019): 3119. http://dx.doi.org/10.3390/ma12193119.
Pełny tekst źródłaHu, Haikun, Zhou Lu, Jiasheng Li i Zongtao Li. "P‐11.3: Manufacturing Quantum Dot Pixel Array via Self‐Assembling on Hydrophobic‐Hydrophilic Transformation Substrate". SID Symposium Digest of Technical Papers 54, S1 (kwiecień 2023): 836–40. http://dx.doi.org/10.1002/sdtp.16428.
Pełny tekst źródłaKasi, Dhanesh G., Mees N. S. de Graaf, Paul A. Motreuil-Ragot, Jean-Phillipe M. S. Frimat, Michel D. Ferrari, Pasqualina M. Sarro, Massimo Mastrangeli, Arn M. J. M. van den Maagdenberg, Christine L. Mummery i Valeria V. Orlova. "Rapid Prototyping of Organ-on-a-Chip Devices Using Maskless Photolithography". Micromachines 13, nr 1 (29.12.2021): 49. http://dx.doi.org/10.3390/mi13010049.
Pełny tekst źródłaWu, Yu, i Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7.07.2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Pełny tekst źródłaNiu, Xi-Zhi, Richard D. Pepel, Rodrigo Paniego, Jim A. Field, Jon Chorover, Leif Abrell, A. Eduardo Sáez i Reyes Sierra-Alvarez. "Photochemical fate of sulfonium photoacid generator cations under photolithography relevant UV irradiation". Journal of Photochemistry and Photobiology A: Chemistry 416 (lipiec 2021): 113324. http://dx.doi.org/10.1016/j.jphotochem.2021.113324.
Pełny tekst źródłaYasar, Ozlem, i Binil Starly. "Fabrication of Lindenmayer System-Based Designed Engineered Scaffolds Using UV-Maskless Photolithography". MRS Advances 1, nr 11 (2016): 749–54. http://dx.doi.org/10.1557/adv.2016.223.
Pełny tekst źródłaThackeray, James W., George W. Orsula, Dianne Canistro i Amanda K. Berry. "Evaluation of deep UV ANR photoresists for 248.4 nm. excimer laser photolithography." Journal of Photopolymer Science and Technology 2, nr 3 (1989): 429–43. http://dx.doi.org/10.2494/photopolymer.2.429.
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